JPH08246190A - Anodically oxidized film and its formation - Google Patents

Anodically oxidized film and its formation

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Publication number
JPH08246190A
JPH08246190A JP7820795A JP7820795A JPH08246190A JP H08246190 A JPH08246190 A JP H08246190A JP 7820795 A JP7820795 A JP 7820795A JP 7820795 A JP7820795 A JP 7820795A JP H08246190 A JPH08246190 A JP H08246190A
Authority
JP
Japan
Prior art keywords
pore radius
range
radius distribution
temp
sealing treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7820795A
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Japanese (ja)
Other versions
JP3154638B2 (en
Inventor
Hideo Kameyama
秀雄 亀山
Satoshi Terai
聡 寺井
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Individual
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Individual
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  • Catalysts (AREA)

Abstract

PURPOSE: To obtain an appropriate pore radius distribution of the anodically oxidized film as a caralyst carrier surface by controlling the treating temp. at the time of subjecting an alumina coating film, that is formed through subjecting aluminum, an aluminum alloy or the like to anodic oxidation, to hydration sealing treatment. CONSTITUTION: In this formation, hydration sealing treatment of an alumina film after anodic oxidation of aluminum or the like is performed at a temp. within the range of 5 to 45 deg.C for several minutes to several hours by using deaerated water having a >=2×10<5> Ω specific resistance and then, the treated coating film is calcined at a temp. within the range of 300 to 500 deg.C. By performing this treatment, an oxide coating film having at least one peak of the pore radius distribution within the range of 25 to 250Å is formed. As the water used for the hydration sealing treatment, deionized water is desired because of the easiness of its production. In this sealing treatment, the lower the treating temp. and the longer the treating time, the more closely the pore radius distribution in the range of 25 to 250Å approaches a flat and on the other hand, the higher the treating temp., the more the tendency of having a maximum of the pore radius distribution within the range of 25 to 250Å becomes noticeable and also, even a pore size distribution curve having two maxima within the range of 20 to 300Å can easily be obtained. Therefore, the treating temp. and treating time are adjusted so as to obtain a desired pore radius distribution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は陽極酸化皮膜及びそれを
形成させる方法に関し、特に25Å〜250Åの間に細
孔半径分布のピークを少なくとも一つ有する陽極酸化皮
膜及びそれを形成させる方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anodized film and a method for forming the same, and more particularly to an anodized film having at least one peak of pore radius distribution between 25Å to 250Å and a method for forming the anodized film.

【0002】[0002]

【従来の技術】アルミニウムの陽極酸化技術によって得
られた多孔質アルミナ皮膜は公知であり、電解コンデン
サの絶縁皮膜、アルミサッシや装飾品の表面処理、車体
や機体などの表面の防蝕処理、カーテンウォールの発色
等、様々な用途に利用されている。一方、陽極酸化によ
って得られる多孔質酸化皮膜の細孔半径は300Å程度
と大きいため、BET表面積が小さく、触媒の担体とし
ては不十分であった。
2. Description of the Related Art Porous alumina coatings obtained by anodic oxidation technology of aluminum are known, and are used as insulating coatings for electrolytic capacitors, surface treatment of aluminum sashes and ornaments, anticorrosion treatment of surfaces such as car bodies and aircraft, and curtain walls. It is used for various purposes such as color development. On the other hand, since the porous oxide film obtained by anodization has a large pore radius of about 300 Å, the BET surface area is small and it is insufficient as a catalyst carrier.

【0003】これに対し、近年、陽極酸化皮膜を50℃
以上の水又は蒸気で熱水処理した場合には、細孔半径が
20Å程度となり、その結果BET表面積が著しく増大
し、触媒担体表面として十分に使用することのできるこ
とが判明した(特開平2−144154及び同40−2
00745号公報)。しかしながら、これらの熱水処理
によっては20Å以上の細孔半径分布を持たせることは
できなかった(アルトピア、10巻、9〜12頁(19
93))。
On the other hand, in recent years, anodic oxide films have been formed at 50 ° C.
In the case of hot water treatment with water or steam as described above, the pore radius becomes about 20Å, and as a result, the BET surface area is remarkably increased, and it has been found that it can be sufficiently used as a catalyst carrier surface (JP-A-2- 144154 and 40-2
No. 00475). However, it was not possible to have a pore radius distribution of 20 Å or more by these hot water treatments (Altopia, vol. 10, pp. 9-12 (19).
93)).

【0004】[0004]

【発明が解決しようとする課題】上記の熱水処理は、技
術的にはアルミナ細孔の水和封孔処理であるが、本発明
者らは、10℃以下の低温でも、時間さえかければ水和
封孔処理が可能であること、及び、処理温度が45℃以
下である場合にはアルミナの細孔半径を広く制御するこ
とができることを見出し、本発明に到達した。
The above-mentioned hot water treatment is technically a hydration sealing treatment of alumina pores, but the present inventors have found that even at a low temperature of 10 ° C. or lower, it takes a long time. The present inventors have found that hydration sealing treatment is possible, and that the pore radius of alumina can be widely controlled when the treatment temperature is 45 ° C. or lower, and thus reached the present invention.

【0005】従って、本発明の第1の目的は、25Å〜
250Åの間に細孔半径分布のピークを少なくとも1つ
有する陽極酸化皮膜を提供することにある。本発明の第
2の目的は、25Å〜250Åの間に細孔半径分布のピ
ークが少なくとも1つある陽極酸化皮膜を表面に有する
金属基体を提供することにある。本発明の第3の目的
は、25Å〜250Åの間に細孔半径分布のピークを少
なくとも1つ有する陽極酸化皮膜を形成させる方法を提
供することにある。
Therefore, the first object of the present invention is to obtain 25Å ~
An object of the present invention is to provide an anodized film having at least one peak of pore radius distribution between 250Å. A second object of the present invention is to provide a metal substrate having on its surface an anodized film having at least one peak of pore radius distribution between 25Å and 250Å. A third object of the present invention is to provide a method for forming an anodized film having at least one peak of pore radius distribution between 25Å and 250Å.

【0006】[0006]

【課題を解決するための手段】本発明の上記の諸目的は
25Å〜250Åの間に細孔半径分布のピークを少なく
とも1つ有する陽極酸化皮膜及びそれを形成させる方法
によって達成された。本発明においては、陽極酸化皮膜
を形成し得る限り、対象とする金属に特に制限はない
が、一般的には、アルミニウム単体、アルミニウム層を
設けた金属、または60重量%以上のアルミニウム含む
ジュラルミン等の合金である。
The above objects of the present invention have been achieved by an anodized film having at least one peak of pore radius distribution between 25Å to 250Å and a method for forming the anodized film. In the present invention, the target metal is not particularly limited as long as it can form an anodized film, but in general, aluminum alone, a metal provided with an aluminum layer, or duralumin containing 60% by weight or more of aluminum, etc. Is an alloy of.

【0007】陽極酸化皮膜を設けた基体はいかなる形状
でも良く、用途や使用方法に応じて、板状、シート状、
リボン状、管状、ハニカム状などの形状とすることがで
きる。この場合、陽極酸化皮膜を設けた基体は、前記金
属表面を陽極酸化したままのものであってもよいが、後
述する如く、一度、陽極酸化皮膜のみを製造し、これを
例えば、プラスチックシートや紙或いは多孔質ゼオライ
ト表面に粘着したものであっても良い。
The substrate provided with the anodic oxide film may have any shape, and may have a plate shape, a sheet shape, a
The shape may be ribbon, tubular, honeycomb, or the like. In this case, the substrate provided with the anodic oxide coating may be the one on which the metal surface is still anodized, but as will be described later, only the anodic oxide coating is produced once, and the anodic oxide coating is applied to, for example, a plastic sheet or It may be one that adheres to the surface of paper or porous zeolite.

【0008】本発明における陽極酸化は公知の方法によ
って行えば良く、処理液としては、例えばクロム酸水溶
液、シュウ酸水溶液、硫酸水溶液等を使用することがで
きる。それらの処理液のpHや溶液の温度、あるいは酸
の種類によって、300Åから最大数百μmの多孔アル
ミナ皮膜が形成される。
The anodic oxidation in the present invention may be carried out by a known method, and as the treatment liquid, for example, a chromic acid aqueous solution, an oxalic acid aqueous solution, a sulfuric acid aqueous solution or the like can be used. Depending on the pH of the treating solution, the temperature of the solution, and the type of acid, a porous alumina film of 300 Å to a maximum of several hundred μm is formed.

【0009】本発明では陽極酸化後、比抵抗が2×10
5 Ωcm以上であって脱気処理された5℃〜45℃の水
を用い、水和封孔処理することによって、25Å〜25
0Åの間に細孔半径分布のピークを少なくとも1つ有す
る陽極酸化皮膜を形成させた後、300℃〜500℃で
焼成することによって、この細孔半径分布を有する陽極
酸化皮膜を固定する。
In the present invention, after anodic oxidation, the specific resistance is 2 × 10.
Five Degassed water at 5 ° C to 45 ° C that is Ωcm or more
Å ~ 25 by hydration sealing treatment using
Have at least one pore radius distribution peak between 0 and
After forming the anodic oxide film,
By firing, an anode having this pore radius distribution
Fix the oxide film.

【0010】水和封孔処理温度が5℃以下では必要な処
理時間が長くなり過ぎ、又、45℃を越えると水和封孔
反応が速すぎて細孔半径が略20Åとなるので、その分
布を制御することが困難となる。また、比抵抗が2×1
5 Ωcm以上の水は、蒸留やイオン交換法によって容
易に得ることができるが、特に、製造容易性の観点から
イオン交換水を使用することが好ましい。
If the hydration sealing treatment temperature is 5 ° C. or lower, necessary treatment is required.
If the processing time becomes too long, and if it exceeds 45 ° C, the hydration sealing will occur.
Since the reaction is too fast and the pore radius becomes about 20Å,
The fabric becomes difficult to control. Moreover, the specific resistance is 2 × 1.
0Five Water above Ωcm should be removed by distillation or ion exchange method.
It can be easily obtained, but especially from the viewpoint of manufacturability.
It is preferable to use ion-exchanged water.

【0011】低温で長時間水和封孔処理する程、25Å
〜250Åの細孔半径分布が平坦に近くなる一方、温度
を上げる程、前記細孔半径範囲内に極大値を有する様に
なり、極大値を20Å〜300のÅの間に2箇所持たせ
ることも容易である。処理時間は、水和封孔処理する温
度、及び、所望する細孔半径分布によって、数分〜数時
間の範囲で適宜調整すれば良い。
The longer the hydration sealing treatment is performed at low temperature, the longer 25 Å
While the pore radius distribution of ~ 250Å becomes nearly flat, the higher the temperature, the more it has a maximum value within the pore radius range, and the maximum value should be set at two points between 20Å ~ 300Å. Is also easy. The treatment time may be appropriately adjusted within the range of several minutes to several hours depending on the temperature for the hydration sealing treatment and the desired pore radius distribution.

【0012】処理条件によって、2つのピークが25Å
〜250Åの間に入るようにすることも、1つのピーク
のみが25Å〜250Åの間に入るようにすることもで
きる。尚、本発明における細孔半径は、窒素脱離法又は
水銀圧入法によって測定される。また、陽極酸化皮膜を
単独に得る場合には、例えば、公知の塩酸/塩化銅溶液
法(市村ら、化学工学第59年会、J123、1994
年)に従えば良い。
Two peaks are 25 Å depending on the processing conditions.
It is also possible to make it fall within the range of ~ 250Å or only one peak can fall within the range of 25Å to 250Å. The pore radius in the present invention is measured by the nitrogen desorption method or the mercury intrusion method. Further, when the anodic oxide film is obtained alone, for example, the known hydrochloric acid / copper chloride solution method (Ichimura et al., Chemical Engineering 59th Annual Meeting, J123, 1994) is used.
Year).

【0013】本発明の陽極酸化皮膜は、それが有する細
孔半径分布によって、例えば、分子篩いとして機能する
分離膜として応用することができる。本発明の陽極酸化
皮膜を有する基体は、高伝熱触媒担体として、細孔中に
金属を析出させて高密度磁気膜として、細孔中に蛍光体
をドーピングさせてEL素子として、或いは従来にはな
い色調を有する装飾品等として応用することができる。
The anodic oxide coating of the present invention can be applied, for example, as a separation membrane functioning as a molecular sieve, depending on the distribution of pore radius. The substrate having an anodized film of the present invention can be used as a high heat transfer catalyst carrier, as a high-density magnetic film by depositing a metal in pores, as an EL device by doping a phosphor in the pores, or conventionally. It can be applied as a decorative article or the like having a dark color tone.

【0014】[0014]

【発明の効果】本発明の細孔構造を有する陽極酸化皮膜
は、その細孔半径分布に従って、種々の用途に応用する
ことができる。又、本発明の陽極酸化皮膜表面を有する
基体は、複数の反応に対応する触媒担体として用いた
り、従来と異なった色調の装飾品を実現することもでき
る。また、本発明の陽極酸化皮膜の細孔半径分布制御方
法は、5℃〜45℃のイオン交換水等で処理するという
簡単なものであるので、工業化も極めて容易である。
The anodic oxide film having a pore structure of the present invention can be applied to various uses according to the pore radius distribution. Further, the substrate having an anodized film surface of the present invention can be used as a catalyst carrier corresponding to a plurality of reactions or can realize a decorative article having a color tone different from the conventional one. Further, the method of controlling the pore radius distribution of the anodic oxide coating of the present invention is a simple method of treating with ion-exchanged water or the like at 5 ° C to 45 ° C, so that industrialization is extremely easy.

【0015】[0015]

【実施例】以下、本発明を実施例によって更に詳述する
が、本発明はこれによって限定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the invention is limited thereto.

【0016】実施例1〜3と比較例1.JIS−A10
50規格の、厚さ0.3mmのアルミニウムを20重量
%水酸化ナトリウム水溶液中で3分間洗浄した後、30
重量%の硝酸水溶液中で1分間中和処理する前処理を行
った。次いで20℃、4重量%のシュウ酸水溶液中に
て、電流密度を50A/m2とし、16時間掛けて陽極
酸化処理をした。
Examples 1 to 3 and Comparative Example 1. JIS-A10
After washing 50 standard aluminum having a thickness of 0.3 mm in a 20 wt% sodium hydroxide aqueous solution for 3 minutes, 30
A pretreatment was performed in which a neutralization treatment was performed for 1 minute in a nitric acid aqueous solution of wt%. Then, the current density was set to 50 A / m 2 in a 4 wt% oxalic acid aqueous solution at 20 ° C., and anodization treatment was performed for 16 hours.

【0017】次いで陽極酸化されたアルミニウム表面
を、比抵抗が約106 Ωcmであって脱気処理された4
0℃のイオン交換水を用いて、それぞれを0時間(陽極
酸化のみ、比較例1)、1時間(実施例1)、 1.5
時間(実施例2)及び 2時間(実施例3)水和封孔処
理した後、450℃で3時間空気焼成して、多孔質陽極
酸化皮膜を形成した。得られた陽極酸化皮膜の細孔半径
分布を、窒素脱離法によって測定した結果は図1に示し
た通りである。
Then anodized aluminum surface
The specific resistance is about 106 Ωcm and degassed 4
Using ion-exchanged water at 0 ° C for 0 hours (anode
Oxidation only, Comparative Example 1), 1 hour (Example 1), 1.5
Time (Example 2) and 2 hours (Example 3) Hydration sealing treatment
Then, air calcination is performed at 450 ° C for 3 hours to obtain a porous anode.
An oxide film was formed. Pore radius of the obtained anodized film
The results of the distribution measured by the nitrogen desorption method are shown in Fig. 1.
That's right.

【0018】比較例2.水和封孔処理を、50℃で15
分間行った他は実施例1と全く同様にしたところ、陽極
酸化皮膜の細孔半径は20Åであり、水和封孔反応が極
めて速いため、20Åの細孔半径しか形成されないこと
が確認された。得られた陽極酸化皮膜の細孔半径分布
は、図2に示した通りである。
Comparative Example 2. Hydration and sealing treatment at 50 ° C for 15
The same procedure as in Example 1 was carried out except that the heating was carried out for a minute, and it was confirmed that the pore radius of the anodized film was 20Å and the hydration sealing reaction was extremely fast, so that only the pore radius of 20Å was formed. . The pore radius distribution of the obtained anodized film is as shown in FIG.

【0019】比較例3.水和封孔処理を、4℃で3時間
行った他は実施例1と全く同様にしたところ、陽極酸化
皮膜の細孔半径は280Åであり、水和封孔処理の進行
が極めて遅く、実用的でないことが確認された。得られ
た陽極酸化皮膜の細孔半径分布は図3に示した通りであ
る。
Comparative Example 3. The hydration sealing treatment was carried out in the same manner as in Example 1 except that the hydration sealing treatment was carried out at 4 ° C. for 3 hours. The pore radius of the anodized film was 280Å, and the progress of the hydration sealing treatment was extremely slow. It was confirmed that it was not appropriate. The pore radius distribution of the obtained anodized film is as shown in FIG.

【0020】これらの結果から、本発明の陽極酸化皮膜
は25Å〜250Åの間に細孔半径分布のピークを少な
くとも1つ有すること、及び、水和封孔処理の適当な温
度が5℃〜45℃の範囲であることが実証された。尚、
これらのデータは陽極酸化後のSEM写真による観察デ
ータとも一致した。
From these results, the anodic oxide coating of the present invention has at least one peak of pore radius distribution between 25Å to 250Å, and the suitable temperature for the hydration sealing treatment is 5 ° C to 45 ° C. It was demonstrated to be in the range of ° C. still,
These data were in agreement with the observation data by SEM photographs after anodization.

【図面の簡単な説明】[Brief description of drawings]

【図1】40℃で水和封孔処理を行った場合の細孔半径
分布曲線
FIG. 1 Pore radius distribution curve when hydration sealing treatment was performed at 40 ° C.

【図2】50℃で水和封孔処理を行った場合の細孔半径
分布曲線
FIG. 2 Pore radius distribution curve when hydration sealing treatment is performed at 50 ° C.

【図3】4℃で水和封孔処理を行った場合の細孔半径分
布曲線
FIG. 3 Pore radius distribution curve when hydration sealing treatment is performed at 4 ° C.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 25Å〜250Åの間に細孔半径分布の
ピークを少なくとも一つ有することを特徴とする陽極酸
化皮膜。
1. An anodized film having at least one peak of pore radius distribution between 25Å and 250Å.
【請求項2】 20Å〜300Åの間に細孔半径分布の
ピークを2つ有する請求項1に記載された陽極酸化皮
膜。
2. The anodic oxide film according to claim 1, which has two peaks of pore radius distribution between 20Å and 300Å.
【請求項3】 請求項1又は2の何れかに記載された陽
極酸化皮膜を表面に有する金属基体。
3. A metal substrate having the anodized film according to claim 1 or 2 on its surface.
【請求項4】 陽極酸化された金属表面を、比抵抗が2
×105 Ωcm以上であって脱気処理された5℃〜45
℃の水を用い、数分〜数時間水和封孔処理した後、30
0℃〜500℃で焼成することを特徴とする、25Å〜
250Åの間に細孔半径分布のピークを少なくとも一つ
有する陽極酸化皮膜を形成させる方法。
4. The anodized metal surface has a specific resistance of 2
× 10Five 5 ° C to 45 degassed and above Ωcm
After hydrating and sealing with water at ℃ for several minutes to several hours, 30
25 Å ~ characterized by baking at 0 ° C to 500 ° C
At least one peak of pore radius distribution between 250Å
A method of forming an anodized film having.
JP07820795A 1995-03-08 1995-03-08 Anodized film and method for forming the same Expired - Fee Related JP3154638B2 (en)

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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JPH08246190A true JPH08246190A (en) 1996-09-24
JP3154638B2 JP3154638B2 (en) 2001-04-09

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JP2008127673A (en) * 2006-11-24 2008-06-05 Fujifilm Corp Method of manufacturing fine structure and fine structure
JP2015088572A (en) * 2013-10-30 2015-05-07 株式会社日立ハイテクノロジーズ Vacuum processing apparatus
WO2021049038A1 (en) * 2019-09-13 2021-03-18 日立化成株式会社 Treatment member, treatment method, and treatment device

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