JPH0824617A - Particle processing apparatus - Google Patents

Particle processing apparatus

Info

Publication number
JPH0824617A
JPH0824617A JP16081694A JP16081694A JPH0824617A JP H0824617 A JPH0824617 A JP H0824617A JP 16081694 A JP16081694 A JP 16081694A JP 16081694 A JP16081694 A JP 16081694A JP H0824617 A JPH0824617 A JP H0824617A
Authority
JP
Japan
Prior art keywords
ring
gas flow
shaped gap
flow
air guide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16081694A
Other languages
Japanese (ja)
Other versions
JP3633958B2 (en
Inventor
Yoshiro Funakoshi
嘉郎 船越
Heiji Sakamoto
平治 坂本
Tamotsu Kurihara
保 栗原
Isato Mitsuki
勇人 三ツ木
Masashi Konishi
将史 小西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KYOTO FUNTAI GIJUTSU KENKYUSHO
KYOTO FUNTAI GIJUTSU KENKYUSHO KK
Powrex KK
Original Assignee
KYOTO FUNTAI GIJUTSU KENKYUSHO
KYOTO FUNTAI GIJUTSU KENKYUSHO KK
Powrex KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KYOTO FUNTAI GIJUTSU KENKYUSHO, KYOTO FUNTAI GIJUTSU KENKYUSHO KK, Powrex KK filed Critical KYOTO FUNTAI GIJUTSU KENKYUSHO
Priority to JP16081694A priority Critical patent/JP3633958B2/en
Publication of JPH0824617A publication Critical patent/JPH0824617A/en
Application granted granted Critical
Publication of JP3633958B2 publication Critical patent/JP3633958B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To adjust easily a rolling action caused by a rotary table and a flowing action caused by upward gas flow at an optimum balance regardless of dimensions of a processing container and the rotary table. CONSTITUTION:A protruding part 6 is mounted on the upper face of the center of a rotary table 2 arranged on the bottom part of a processing container 1 and an injection hole 11 is provided between the lower face of this protruding part 6 and the upper face of the rotary table 2 toward the outer diameter side. This injection hole 11 is communicated with a gas conduit 30 wherein the flow rate is adjustable independently of the upward gas flow introduced into a ring- like gap 5 in the periphery of the rotary table 2 to eject a gas flow in the radial direction from the ejection hole 11.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、医薬、農薬、食品、電
子材料、化成品等の製造分野で粒子加工を目的として使
用される粒子加工装置に関し、詳しくは各種原料粒子に
造粒・コーティング等の粒子加工を施して粉体粒子の付
加価値を向上させるための装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a particle processing apparatus used for the purpose of particle processing in the fields of manufacturing pharmaceuticals, agricultural chemicals, foods, electronic materials, chemical products, etc., and more specifically, granulating and coating various raw material particles. The present invention relates to a device for improving the added value of powder particles by performing particle processing such as.

【0002】[0002]

【従来の技術】原料粉体粒子に造粒、コーティング等の
加工を施すための装置として、遠心転動流動式と呼ばれ
る粒子加工装置が従来から多数提案されている。これら
の装置は、円筒状の加工容器の下部に水平回転する円形
の回転盤を設けると共に、この回転盤と加工容器との間
に形成されたリング状の隙間から主に垂直方向のガス流
を噴出させる点を要旨とするものである。
2. Description of the Related Art As a device for performing processing such as granulation and coating on raw material powder particles, a number of particle processing devices called centrifugal tumbling flow type have been conventionally proposed. In these devices, a circular rotary disk that horizontally rotates is provided in the lower part of a cylindrical processing container, and a gas flow in the vertical direction is mainly generated from a ring-shaped gap formed between the rotary disk and the processing container. The gist is the point of ejection.

【0003】具体的にこの装置の作用を説明すると、加
工容器内に供給された粉体粒子は、回転盤の回転に伴う
遠心力により、回転盤上を転動しながら径方向に移動す
る。次に粒子は、リング状の隙間を通過した上昇空気流
に吹き上げられて加工容器の内径面に沿って上昇流動し
つつ適当に乾燥され、やがて、加工容器内の中心付近に
向かって落下する。こうして転動及び流動を規則正しく
繰り返す循環流動が行なわれる。このような粒子の転動
・流動中に、加工容器内の所定位置に設けたスプレーノ
ズルからバインダー液やコーティング液を噴霧すること
により、粒子の造粒・コーティング等の加工作業がなさ
れる。
The operation of this apparatus will be described in detail. The powder particles supplied into the processing container move in the radial direction while rolling on the rotary disk due to the centrifugal force generated by the rotation of the rotary disk. Next, the particles are appropriately dried while being blown up by an ascending air flow passing through the ring-shaped gap and ascendingly flown along the inner diameter surface of the processing container, and eventually fall toward the vicinity of the center in the processing container. In this way, a circulating flow in which rolling and flow are regularly repeated is performed. During such rolling / flowing of particles, a binder nozzle or a coating liquid is sprayed from a spray nozzle provided at a predetermined position in a processing container to perform processing operations such as granulation / coating of particles.

【0004】同タイプの装置の一例として、特公平6-16
827 号(特開昭62−68536 号)及び特公平6−187号(特
開昭62−68535 号)には、環状通気部材を介して相互に
所定間隔で多層に配置した回転盤を有する装置が開示さ
れている。この装置は、環状通気部材を通して半径方向
外方にガスを噴出させ、このガス流の作用と回転盤の回
転による遠心転動作用との協働により、粒子を加工容器
の内壁方向に押圧しながら粒子処理を行なうものであ
る。
As an example of a device of the same type, Japanese Patent Publication No. 6-16
827 (Japanese Patent Laid-Open No. 62-68536) and Japanese Patent Publication No. 6-187 (Japanese Patent Laid-Open No. 62-68535) disclose a device having rotating disks arranged in multiple layers at predetermined intervals via an annular ventilation member. Is disclosed. This device ejects gas radially outward through an annular ventilation member, and the action of this gas flow and the centrifugal rotation for rotation of the turntable cooperate with each other while pressing the particles toward the inner wall of the processing container. Particle processing is performed.

【0005】[0005]

【発明が解決しようとする課題】ところで、遠心転動流
動式の加工装置は、主に、粒子が回転盤上を転動する際
に受ける面剪断による転動作用と、リング状隙間を通じ
て吹き込まれた上昇ガス流による流動作用とを利用して
粒子を加工するものである。従って、当該加工装置の開
発にあたっては、加工条件に合致する最適な転動作用及
び流動作用を繰り返す最適転動流動状態を実現すること
が重要である。
By the way, the centrifugal rolling flow type processing apparatus is mainly used for rolling motion due to surface shearing which particles receive when rolling on a rotating disk, and is blown through a ring-shaped gap. The particles are processed by utilizing the flow action of the rising gas flow. Therefore, in developing the processing apparatus, it is important to realize an optimal rolling motion state in which the rolling motion and the flow action that are optimum for the processing conditions are repeated.

【0006】ここで、上昇ガス流による流動作用を調整
するには、上昇ガス流の流量を増減さればよい。一方、
回転盤による転動作用を調整するには、回転盤上の転動
部の面積、回転速度及び半径方向に噴出するガス流の流
量のすべて、またはその何れかを調整すればよい。ここ
で重要となるのは、転動作用を付与する転動面を確保す
ることである。
Here, in order to adjust the flow action by the rising gas flow, the flow rate of the rising gas flow may be increased or decreased. on the other hand,
In order to adjust the rolling motion of the rotary disk, the area of the rolling portion on the rotary disk, the rotation speed, and / or the flow rate of the gas flow ejected in the radial direction may be adjusted. What is important here is to secure a rolling surface for imparting rolling motion.

【0007】しかし、特公平6−16827号及び特公平6−1
87号では、転動の助勢という立場を殆ど考慮せず、多層
になった回転盤間の隙間から多重にガス吹き込みが行な
われている。従って、容器内が流動支配になると共に、
規則正しい循環流動は行なわれ難い。また、該公報で
は、回転盤と容器の間を通して吹き込まれる垂直方向の
ガス流路と、環状通気部材を通して吹き込まれる半径方
向のガス流路とが、回転盤下部に位置する同一のガス室
に接続されているため、両ガス流路を流れるガス流量を
独立して調整できない。このため、回転盤による転動作
用と上昇ガス流による流動作用とを独自に調整すること
はできず、最適な転動流動状態を得るのは困難である。
However, Japanese Patent Publication No. 6-16827 and Japanese Patent Publication No. 6-1
In No. 87, almost no consideration was given to the role of assisting rolling, and multiple gas injections were made through the gaps between the multi-layered turntables. Therefore, while the inside of the container becomes fluid,
Regular circulation is difficult to carry out. Further, in this publication, a vertical gas flow path blown through between the rotary disk and the container and a radial gas flow path blown through the annular ventilation member are connected to the same gas chamber located under the rotary disk. Therefore, the flow rate of gas flowing through both gas flow paths cannot be adjusted independently. For this reason, it is impossible to independently adjust the rolling operation by the rotating disk and the flow action by the rising gas flow, and it is difficult to obtain an optimum rolling flow state.

【0008】その一方、本出願人は、粒子のクロスコン
タミネーションを確実に防止すると共に、粒子の流動状
態をより活発化させる目的で、リング状隙間の直下部
に、リング状隙間との対向部位を開口させたリング状ダ
クトを設け、このリング状ダクトに接線方向で且つ回転
盤の回転方向と同一方向に向けて下部ノズルを装着した
粒子処理装置を開示している(特願平4-249380号)。
On the other hand, the applicant of the present invention, in order to surely prevent cross-contamination of particles and to further activate the flow state of particles, directly below the ring-shaped gap, facing the ring-shaped gap. Disclosed is a particle processing apparatus in which a ring-shaped duct having an opening is provided, and a lower nozzle is attached to the ring-shaped duct in a tangential direction and in the same direction as the rotating direction of a turntable (Japanese Patent Application No. 4-249380). issue).

【0009】しかし、この装置では、容器をスケールア
ップやスケールダウンする場合に不具合が生じる。即
ち、リング状隙間の幅を一定にしたまま容器の径を変更
させると、回転盤の面積が容器の相当径の二乗に比例す
るのに対し、リング状隙間の面積は容器の相当径の一乗
に比例する。このため、転動作用の変化量と流動作用の
変化量に大きな差異が生じ、そのままでは最適な流動転
動状態を得ることができない。このような点から、従来
装置では、スケールアップ等する際に容器や回転盤の寸
法決定に多大な労力を要する点が問題となっていた。
However, this device has a problem when the container is scaled up or down. That is, if the diameter of the container is changed while keeping the width of the ring-shaped gap constant, the area of the rotating disk is proportional to the square of the equivalent diameter of the container, while the area of the ring-shaped gap is the square of the equivalent diameter of the container. Proportional to. Therefore, a large difference occurs between the rolling operation change amount and the flow action change amount, and the optimum flow rolling state cannot be obtained as it is. From such a point, the conventional apparatus has a problem that a great amount of labor is required for determining the dimensions of the container and the turntable when scaling up or the like.

【0010】そこで、本発明は、ガス流による流動作用
が殆どない転動作用域を確保しながら、粒子群の循環流
動を粒子の加工目的に合った最適状態に調整することが
できる粒子加工装置の提供を目的とする。
In view of the above, the present invention is directed to a particle processing apparatus capable of adjusting the circulating flow of a particle group to an optimum state suitable for the purpose of particle processing, while ensuring a rolling operation area where there is almost no flow action due to a gas flow. For the purpose of providing.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するた
め、本発明では、略円筒状の加工容器と、この加工容器
内の底部近傍で水平回転する回転盤とを有し、系外より
回転盤の下方に供給されたガス流を、回転盤の外径面と
これに対向する加工容器の内径面との間に形成されたリ
ング状隙間から上方に噴出させ、この上昇ガス流と回転
盤の回転運動との相乗作用により、加工容器内の粒子に
転動流動を行なわせて造粒・コーティング等の粒子加工
を施す装置において、前記回転盤の中央上面に隆起部を
突設して転動作用域を確保すると共に、この隆起部と回
転盤上面との間に外径側に向けて噴出口を設け、この噴
出口に前記リング状隙間に導入されるガス流とは独立し
て流量調整可能とした導気路を連通させることとした。
In order to achieve the above object, the present invention has a substantially cylindrical processing container and a turntable that horizontally rotates in the vicinity of the bottom of the processing container, and rotates from outside the system. The gas flow supplied below the disk is jetted upward from a ring-shaped gap formed between the outer diameter surface of the rotary disk and the inner diameter surface of the processing container facing the rotary disk, and this rising gas flow and the rotary disk In a device for performing particle processing such as granulation and coating by causing the particles in the processing container to rotatively flow by a synergistic effect with the rotating motion of In addition to securing an operating area, a jet outlet is provided between the raised portion and the upper surface of the turntable toward the outer diameter side, and the flow rate is independent of the gas flow introduced into the ring-shaped gap at the jet outlet. It was decided to connect the adjustable air duct.

【0012】導気路には、リング状隙間に導入されたガ
ス流の一部を分流させるとよい。
A part of the gas flow introduced into the ring-shaped gap may be diverted to the air guide passage.

【0013】回転盤の下方に昇降部材を配置してこの昇
降部材の上面と回転盤の下面との間に導気路を形成する
と共に、この導気路を回転盤に設けた貫通孔を介して噴
出口に連通させ、昇降部材の昇降動作により導気路の幅
を変化させて当該導気路のガス分流量を調整してもよ
い。
An elevating member is disposed below the rotary disk to form an air guide path between an upper surface of the elevating member and a lower surface of the rotary disk, and the air guide path is provided through a through hole provided in the rotary disk. Alternatively, the width of the air guiding passage may be changed by raising and lowering the elevating member to adjust the gas flow rate of the air guiding passage.

【0014】導気路に、リング状隙間に導入されるガス
流とは独立した別系統のガス供給系を接続してもよい。
A gas supply system of another system independent of the gas flow introduced into the ring-shaped gap may be connected to the air guide passage.

【0015】リング状隙間の直下部に、リング状隙間と
の対向部位を開口させたリング状ダクトを設け、このリ
ング状ダクトに、接線方向で且つ前記回転盤の回転方向
と同一方向に向けて導気する気流取入口を設けてもよ
い。
Immediately below the ring-shaped gap, a ring-shaped duct having an opening facing the ring-shaped gap is provided, and the ring-shaped duct is directed tangentially and in the same direction as the rotating direction of the rotary disk. An airflow inlet for introducing air may be provided.

【0016】[0016]

【作用】回転盤中央部に適当な裾野を有する隆起部を設
けることによって隆起部外周面で粒子に転動作用を与え
ることができる。さらに、隆起部下面と回転盤上面との
間に容器半径方向にガスを噴出する噴出口を設け、この
噴出口から外径側に向けてガス流を噴出することによっ
て、隆起部で転動作用を受けた粒子に回転盤の回転運動
とガス流との協働によって転動流動を及ぼすことができ
る。噴出口にリング状隙間に導入されるガス流(上昇ガ
ス流)とは独立して流量調整可能とした導気路を連通さ
せれば、最適流量に調整した径方向ガス流を噴出するこ
とができ、上昇ガス流との協働で理想的な転動流動状態
を実現することが可能となる。
By providing a raised portion having an appropriate skirt in the central portion of the turntable, particles can be given a rolling action on the outer peripheral surface of the raised portion. Furthermore, an ejection port for ejecting gas in the radial direction of the container is provided between the lower surface of the raised portion and the upper surface of the turntable. Rolling flow can be exerted on the received particles by the cooperation of the rotational movement of the turntable and the gas flow. If a gas flow path whose flow rate can be adjusted independently of the gas flow (rising gas flow) introduced into the ring-shaped gap is connected to the jet port, the radial gas flow adjusted to the optimum flow rate can be jetted. It is possible to realize an ideal rolling flow state in cooperation with the rising gas flow.

【0017】導気路にリング状隙間に導入されたガス流
の一部を分流させれば、単一のガス流供給源で上昇ガス
流と径方向ガス流の二種類のガス流を得ることができ
る。
By dividing a part of the gas flow introduced into the ring-shaped gap in the air guide passage, it is possible to obtain two kinds of gas flows, an ascending gas flow and a radial gas flow, with a single gas flow supply source. You can

【0018】回転盤の下方に昇降部材を配置してこの昇
降部材の上面と回転盤の下面との間に導気路を形成する
と共に、この導気路を回転盤に設けた貫通孔を介して噴
出口に連通させ、昇降部材の昇降動作により導気路の幅
を変化させると、その流路面積が変化する。従って、径
方向ガス流の流量調整が可能となる。
An elevating member is disposed below the rotary disk to form an air guide path between the upper surface of the elevating member and the lower surface of the rotary disk, and the air guide path is provided through a through hole provided in the rotary disk. When the width of the air guide passage is changed by the elevating operation of the elevating member, the flow passage area changes. Therefore, the flow rate of the radial gas flow can be adjusted.

【0019】導気路に、リング状隙間に導入されるガス
流とは独立した別系統のガス供給系を接続すれば、上昇
ガス流と径方向ガス流の流量をそれぞれ完全に独立して
調整することができ、最適な流動転動状態を容易に実現
することができる。
If a gas supply system of a separate system independent of the gas flow introduced into the ring-shaped gap is connected to the air guide passage, the flow rates of the rising gas flow and the radial gas flow can be adjusted completely independently of each other. Therefore, the optimum flow rolling state can be easily realized.

【0020】リング状隙間の直下部に、リング状隙間と
の対向部位を開口させたリング状ダクトを設け、このリ
ング状ダクトに、接線方向で且つ前記回転盤の回転方向
と同一方向に向けて導気する気流取入口を設ければ、サ
イクロン効果によってリング状ダクト内に粒子は落下す
ることなく、またリング状隙間から容器内に入ったガス
流は旋回流となって加工容器内を上昇する。
Immediately below the ring-shaped gap, a ring-shaped duct having an opening facing the ring-shaped gap is provided, and the ring-shaped duct is directed tangentially and in the same direction as the rotation direction of the rotary disk. If an airflow inlet for introducing air is provided, particles will not fall into the ring-shaped duct due to the cyclone effect, and the gas flow entering the container through the ring-shaped gap will become a swirl flow and rise in the processing container. .

【0021】即ち、本発明によれば、隆起部形状、噴出
口からのガス流及びリング状隙間からのガス流を、それ
ぞれ最適値に調整することによって粒子加工に重要な、
転動−転動流動−流動−転動−転動流動−…の最適循環
流動が容易に実現できる。
That is, according to the present invention, it is important for particle processing by adjusting the shape of the ridge, the gas flow from the jet port and the gas flow from the ring-shaped gap to optimum values.
Optimal circulation flow of rolling-rolling flow-flow-rolling-rolling flow -... can be easily realized.

【0022】[0022]

【実施例】以下、本発明装置の実施例を図1乃至図5に
基づいて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the device of the present invention will be described below with reference to FIGS.

【0023】図1は、本発明にかかる粒子加工装置の断
面図である。但し、図1では、排気設備や、粒子の供給
口及び排出口等の図示が省略されている。
FIG. 1 is a sectional view of a particle processing apparatus according to the present invention. However, in FIG. 1, the exhaust equipment, the particle supply port and the particle discharge port, etc. are omitted.

【0024】加工容器(1)は、導電性の金属材料でほ
ぼ円筒状に形成されており、その底部には、円形の回転
盤(2)が水平に配置されている。この回転盤(2)
は、無断可変速式の式のモータ(図示省略)に連結した
垂直方向の回転軸(3)に固定されており、任意の速度
で一定方向、例えば右回りに回転する。
The processing container (1) is formed of a conductive metal material in a substantially cylindrical shape, and a circular rotary disk (2) is horizontally arranged at the bottom thereof. This turntable (2)
Is fixed to a vertical rotation shaft (3) connected to a motor (not shown) of a variable speed type without permission, and rotates at a given speed in a fixed direction, for example, clockwise.

【0025】回転盤(2)は、加工容器(1)の内径よ
りも小さい径寸法とされており、この回転盤(2)の外
径面と、加工容器(1)の内径面との間には、上昇ガス
流の導入路となる断面三角形型のリング状隙間(5)が
形成されている。
The rotating disk (2) has a diameter smaller than the inner diameter of the processing container (1), and is between the outer diameter surface of the rotating disk (2) and the inner diameter surface of the processing container (1). A ring-shaped gap (5) having a triangular cross-section, which serves as an introduction path for an ascending gas flow, is formed therein.

【0026】回転盤(2)の中心部には、上部を切除し
た形状の略円錐型をなし且つ内部を中空とした隆起部材
(6)が装着される。この隆起部材(6)は、回転軸
(3)の上端部に螺合した締付ナット(7)によって回
転軸(3)に締付け固定されている。隆起部材(6)の
外周面は、粒子に転動作用を付与する転動部となる。
At the center of the rotating disk (2), a protruding member (6) having a substantially conical shape with its upper part cut off and having a hollow inside is mounted. The raised member (6) is fastened and fixed to the rotary shaft (3) by a tightening nut (7) screwed onto the upper end of the rotary shaft (3). The outer peripheral surface of the raised member (6) serves as a rolling portion that imparts rolling motion to the particles.

【0027】回転盤(2)上面のうち隆起部材(6)の
下面直下の円周等配位置には、複数のスペーサ(9)が
装着されている。このスペーサ(9)により、回転盤
(2)の上面と隆起部材(6)の下面との間に、隆起部
材(6)の中空部(10)と連通する複数の噴出口(11)
が形成される。回転盤(2)の円周等配位置で且つ隆起
部材(6)の下面よりも内径側には、円弧状の貫通孔
(12)が複数個形成されている。回転盤(2)の下面に
は、内径側及び外径側に離隔させて一対の環状突出部
(14)(15)が装着若しくは一体成形されており、両突
出部(14)(15)の下面は同一高さに設定されている。
(16)は、回転盤(2)の取り外し時に当該回転盤
(2)を持ち上げるために取付けられた把手(16)であ
る。
A plurality of spacers (9) are mounted on the upper surface of the turntable (2) at equidistantly circumferential positions directly below the lower surface of the raised member (6). By this spacer (9), a plurality of ejection ports (11) communicating with the hollow portion (10) of the raised member (6) between the upper surface of the turntable (2) and the lower surface of the raised member (6).
Is formed. A plurality of arc-shaped through holes (12) are formed at positions equidistantly arranged on the circumference of the rotating disk (2) and on the inner diameter side of the lower surface of the protruding member (6). On the lower surface of the turntable (2), a pair of annular protrusions (14) (15) are attached or integrally formed so as to be separated from each other on the inner diameter side and the outer diameter side. The bottom surface is set to the same height.
Reference numeral (16) is a handle (16) attached to lift the turntable (2) when the turntable (2) is removed.

【0028】回転盤の下方には、上面を開放させ且つ内
壁面を滑らかな連続曲面上に形成したリング状ダクト
(19)が配置される。このリング状ダクト(19)は、環
状の隙間構成部材(20)及び取付け部材(21)を介して
加工容器(1)の底部に固定されており、その外径側の
内壁面は、回転盤(2)の外周面の略直下に位置してい
る。リング状ダクト(19)の内径面は、その内径側に配
した昇降部材(22:後述する)の外径面に対して摺動自
在であり、両部材(19)(22)の摺動面は、Oリング
(25)で気密にシールされている。
A ring-shaped duct (19) whose upper surface is open and whose inner wall surface is formed into a smooth continuous curved surface is arranged below the turntable. The ring-shaped duct (19) is fixed to the bottom of the processing container (1) via an annular gap forming member (20) and a mounting member (21), and the inner wall surface on the outer diameter side thereof is a turntable. It is located just below the outer peripheral surface of (2). The inner diameter surface of the ring-shaped duct (19) is slidable with respect to the outer diameter surface of the elevating member (22: described later) disposed on the inner diameter side, and the sliding surface of both members (19) (22). Is hermetically sealed with an O-ring (25).

【0029】リング状ダクト(19)には、その接線方向
に向けて且つ回転盤(2)の回転方向と同方向に向け
て、一つ若しくは複数個の気流取入口(図示省略)が設
けられる。この気流取入口から導入されたガス流(例え
ば、空気流)は、リング状ダクト(19)内を回転盤
(2)と同方向に旋回し、リング状隙間(5)及び導気
路(30:後述する)にそれぞれ分流する。リング状隙間
(5)に流入したガス流は、旋回流となって加工容器
(1)内を上昇し、粒子の流動運動を活発化させる。
The ring-shaped duct (19) is provided with one or a plurality of airflow inlets (not shown) in the tangential direction thereof and in the same direction as the rotating direction of the turntable (2). . A gas flow (for example, an air flow) introduced from the airflow inlet swirls in the ring-shaped duct (19) in the same direction as that of the rotating disk (2), and the ring-shaped gap (5) and the air guide path (30). : See below). The gas flow that has flowed into the ring-shaped gap (5) becomes a swirl flow and rises in the processing container (1), activating the flow motion of particles.

【0030】流動中にリング状隙間(5)を通ってリン
グ状ダクト(19)内に落下した粒子は、気流取入口から
導入された旋回ガス流にのってダクト(19)内で旋回
し、次いで、リング状隙間(5)を通って加工容器
(1)内に戻される。このように、リング状隙間(5)
から落下した粒子がリング状ダクト(19)内で停留する
ことなく速やかに加工容器(1)内に戻されるので、処
理する粒子を異種粒子に交換した場合も、残留粒子が異
種粒子中に混入するいわゆるクロスコンタミネーション
を招くことはなく、GMP(Good Manufacturing Pract
ice )的に優れた特性を有するものとなる。
The particles that have fallen into the ring-shaped duct (19) through the ring-shaped gap (5) during the flow are swirled in the duct (19) by the swirling gas flow introduced from the air flow inlet. Then, it is returned into the processing container (1) through the ring-shaped gap (5). Thus, the ring-shaped gap (5)
Since the particles that fall from the device are quickly returned to the processing container (1) without stopping in the ring-shaped duct (19), residual particles are mixed in the different particles even when the particles to be treated are replaced with different particles. GMP (Good Manufacturing Pract.
It has excellent characteristics in terms of ice).

【0031】昇降部材(22)は、上面を平面とする中空
状をなし、回転軸(3)の周囲にドーナツ状に形成され
ている。この昇降部材(22)は、モータやシリンダ等か
らなる昇降駆動源(図示省略)に駆動されて昇降する。
昇降部材(22)の内径面には、舌片状のシール部材(2
3)が装着されており、このシール部材(23)は、回転
盤(2)の内径部に装着され且つ回転軸(3)に嵌合さ
せた基部(24)の外径面に接触して昇降時には当該基部
(24)の外径面と気密に摺接する。昇降部材(22)の外
径面には、外径側に屈曲させた段部(26)を有する係止
部材(27)が装着される。この係止部材(27)の内径面
と昇降部材(22)の外径面との間には、下部を開口させ
た袋状の収容部(28)が環状に形成されており、この収
容部(28)には、リング状ダクト(19)の内径側の壁面
上部に設けた係合部(29)が収容されている。昇降部材
(22)を降下させると、係合部(29)の上端部がこれに
対向する係止部材(27)の内壁面と当接し、これによ
り、昇降部材(22)のそれ以上の降下動作が規制される
(図1に示す)。一方、昇降部材(22)を上昇させる
と、その上面が回転盤(2)の下面に設けた両突出部
(14)(15)と当接し、これにより昇降部材(22)の上
昇動作が規制される。
The elevating member (22) has a hollow shape whose upper surface is a flat surface, and is formed in a donut shape around the rotating shaft (3). The elevating member (22) is driven up and down by an elevating drive source (not shown) including a motor and a cylinder.
The tongue-shaped seal member (2
3) is attached, and this seal member (23) is attached to the inner diameter portion of the rotating disk (2) and comes into contact with the outer diameter surface of the base portion (24) fitted to the rotating shaft (3). When going up and down, it makes airtight sliding contact with the outer diameter surface of the base (24). A locking member (27) having a step portion (26) bent to the outer diameter side is attached to the outer diameter surface of the elevating member (22). Between the inner diameter surface of the locking member (27) and the outer diameter surface of the elevating member (22), a bag-shaped accommodating portion (28) having an open lower portion is formed in an annular shape. The engagement portion (29) provided in the upper part of the wall surface on the inner diameter side of the ring-shaped duct (19) is accommodated in the (28). When the raising / lowering member (22) is lowered, the upper end of the engaging portion (29) comes into contact with the inner wall surface of the locking member (27) facing the engaging portion (29), whereby the lifting / lowering member (22) is further lowered. The operation is restricted (shown in FIG. 1). On the other hand, when the raising / lowering member (22) is raised, its upper surface comes into contact with both protrusions (14) and (15) provided on the lower surface of the turntable (2), whereby the raising movement of the raising / lowering member (22) is restricted. To be done.

【0032】回転盤(2)の下面と昇降部材(22)の上
面との間には、リング状ダクト(19)と連通し且つ貫通
孔(12)を介して隆起部材(6)の中空部(10)と連通
するリング状の導気路(30)が形成される。リング状ダ
クト(19)から導気路(30)内に分流したガス流は、貫
通孔(12)及び隆起部材(6)内の中空部(10)を経て
隆起部材(6)の裾に設けられた噴出口(11)から半径
方向に噴出し、回転盤(2)上を転動する粒子を外径方
向に吹き飛ばす。
Between the lower surface of the turntable (2) and the upper surface of the elevating member (22), the hollow portion of the rising member (6) communicates with the ring-shaped duct (19) and through the through hole (12). A ring-shaped air guide passage (30) communicating with (10) is formed. The gas flow branched from the ring-shaped duct (19) into the air guide passage (30) is provided at the skirt of the raised member (6) through the through hole (12) and the hollow portion (10) in the raised member (6). The particles ejected in the radial direction from the ejected outlet (11) blown off on the rotating disk (2) in the outer diameter direction.

【0033】この導気路(30)を流れるガス流の流量調
整は、昇降部材(22)を昇降させて昇降部材(22)の上
面と、外径側の突出部(14)下面との間の距離を変更す
ることによって行なわれる。具体的には、昇降部材(2
2)を降下させ、突出部(14)と昇降部材(22)の上面
との間の隙間を大きくすれば、流路断面積が増大するた
め、ガス流量を増加させることができ、その逆に、昇降
部材(22)を上昇させて当該隙間を小さくすれば、ガス
流量を減少させることができる。そして、昇降部材(2
2)の上面を突出部(14)の下面に当接させれば、ガス
流量を殆ど無くすることができる。
The flow rate of the gas flow flowing through the air guide passage (30) is adjusted by moving the elevating member (22) up and down so that it is between the upper surface of the elevating member (22) and the lower surface of the protruding portion (14) on the outer diameter side. This is done by changing the distance of. Specifically, the lifting member (2
By lowering 2) and increasing the gap between the protrusion (14) and the upper surface of the elevating member (22), the cross-sectional area of the flow passage increases, so that the gas flow rate can be increased, and vice versa. The gas flow rate can be reduced by raising the elevating member (22) to reduce the gap. Then, the lifting member (2
By bringing the upper surface of 2) into contact with the lower surface of the protrusion (14), the gas flow rate can be almost eliminated.

【0034】このようにリング状隙間(5)に上昇ガス
流を導入すると共に、回転盤(2)上に外径方向に向け
て径方向ガス流を導入することにより、粒子は、加工容
器(1)を旋回しながら上下に流動し、全体として見れ
ば加工容器(1)の底部で縄をよじったような流動層が
形成される。この流動層中にスプレーノズル(32)から
バインダー液やコーティング液等の加工液を噴霧するこ
とにより、造粒やコーティング等の所定の粒子加工がな
される。加工容器(1)の中心部では、粒子がガス流の
影響を殆ど受けずに隆起部材(6)の外周面を転動する
ので、流動作用の殆ど作用しない転動作用域が確保され
る。
In this way, by introducing the rising gas flow into the ring-shaped gap (5) and introducing the radial gas flow toward the outer radial direction on the rotating disk (2), the particles are collected in the processing container ( While turning 1), it flows up and down to form a fluid bed like a twisted rope at the bottom of the processing container (1) as a whole. By spraying a processing liquid such as a binder liquid or a coating liquid from the spray nozzle (32) into the fluidized bed, predetermined particle processing such as granulation or coating is performed. In the central part of the processing container (1), the particles roll on the outer peripheral surface of the raised member (6) with little influence of the gas flow, so that a rolling operation area where almost no flow action acts is secured.

【0035】本発明では、隆起部材(6)下面と回転盤
(2)上面との間に外径側に向けて噴出口(11)を設け
ると共に、この噴出口(11)に、リング状隙間(5)に
導入されるガス流とは独立して流量調整可能とした導気
路(30)を連通させているので、最適流量に調整した径
方向ガス流を噴出することができる。従って、容器や回
転盤の寸法とは無関係に、理想的な転動流動状態を実現
することが可能となる。また、上述のように、導気路
(30)に、リング状ダクト(19)に導入されたガス流の
一部を分流させれば、単一のガス流供給源で二方向のガ
ス流を得ることができ、構造の簡素化が図れるようにな
る。
According to the present invention, the ejection port (11) is provided between the lower surface of the raised member (6) and the upper surface of the rotating disk (2) toward the outer diameter side, and the ring-shaped gap is formed in the ejection port (11). Since the air guide passage (30) whose flow rate is adjustable independently of the gas flow introduced into (5) is communicated, the radial gas flow adjusted to the optimum flow rate can be ejected. Therefore, it is possible to realize an ideal rolling flow state regardless of the dimensions of the container and the turntable. Further, as described above, if a part of the gas flow introduced into the ring-shaped duct (19) is diverted to the air guide path (30), the gas flow in two directions can be generated by a single gas flow supply source. Therefore, the structure can be simplified.

【0036】図2は、本発明の他の実施例であり、導気
路(30)に、前記リング状隙間(5)に導入されるガス
流とは独立した別系統のガス供給系(35)を接続したこ
とを特徴とするものである。具体的に説明すると、回転
盤(2)の下方に、前記昇降部材(22)と同形状であり
且つ上面の複数箇所に開口部(36)を設けたリング状の
導気ダクト(37)を配置し、この導気ダクト(37)を、
その上面を回転盤(2)の突出部(14)(15)に接触さ
せて図示しない静止部材に固定する。導気ダクト(37)
には、経路途中に流量制御弁等の流量制御手段を設けた
供給管(図示省略)を接続する。
FIG. 2 shows another embodiment of the present invention, in which a gas supply system (35) is provided in the air guide passage (30) as a separate system independent of the gas flow introduced into the ring-shaped gap (5). ) Is connected. Specifically, a ring-shaped air guide duct (37) having the same shape as the elevating member (22) and having openings (36) at a plurality of positions on the upper surface is provided below the turntable (2). Place this air duct (37),
The upper surface is brought into contact with the protrusions (14) and (15) of the turntable (2) and fixed to a stationary member (not shown). Air duct (37)
A supply pipe (not shown) provided with a flow rate control means such as a flow rate control valve is connected to the path.

【0037】このような構成により、流量制御手段を制
御すれば、導気路(30)に導入されるガス流を独立して
最適量に調整することができ、図1に示す装置と同様
に、上昇ガス流との協働で最適な転動流動状態を実現す
ることができる。図1に示す装置では、昇降部材(22)
を昇降させてガス流の分流量調整を行なうと、これに連
動して上昇ガス流の流量も変化するため、きめ細かな流
量調整を行なうことが困難であるが、図2に示す装置で
は、上昇ガス流と径方向ガス流のガス流量を完全に独立
して制御できるので、このような不具合は生じず、容易
に最適な転動流動状態を実現することができる。
With such a structure, the gas flow introduced into the air guide passage (30) can be independently adjusted to an optimum amount by controlling the flow rate control means, and like the device shown in FIG. The optimum rolling flow state can be realized in cooperation with the rising gas flow. In the device shown in FIG. 1, the lifting member (22)
When the partial flow rate of the gas flow is adjusted by moving up and down, the flow rate of the rising gas flow also changes in conjunction with this, so it is difficult to perform fine flow rate adjustment, but with the device shown in FIG. Since the gas flow rate of the gas flow and the gas flow rate of the radial direction gas can be controlled completely independently, such a problem does not occur, and the optimum rolling flow state can be easily realized.

【0038】図5(a)(b)は、噴出口(11)の形状
の他の実施例である。このうち、(a)図は、隆起部材
(6)の下端部を水平方向に延設して環状の延在部(3
8)を形成すると共に、貫通孔(12)よりも内径側にス
ペーサ(9)を介在させて噴出口(11)をリング状に形
成したものである。一方、(b)図は、延在部(38)に
上方外径側に向けて斜めに丸穴若しくは楕円穴等を穿設
して第2の噴出口(39)を形成したもので、特に大型の
装置に有効な構成である。この構成によれば、経方向の
ガス流に加えて第2の噴出口(39)から上方外径側に向
けてガス流が供給されるので、加工容器(1)内の流動
状態をより一層多様化させることが可能となる。
5 (a) and 5 (b) show another embodiment of the shape of the ejection port (11). Of these, Fig. (A) shows that the lower end portion of the raised member (6) is extended in the horizontal direction to form an annular extended portion (3).
8) is formed, the spacer (9) is interposed on the inner diameter side of the through hole (12), and the ejection port (11) is formed in a ring shape. On the other hand, FIG. 6B shows a second ejection port (39) formed by obliquely forming a round hole, an elliptical hole, or the like in the extending portion (38) toward the upper outer diameter side. This configuration is effective for large-scale devices. According to this configuration, the gas flow is supplied from the second jet port (39) toward the upper outer diameter side in addition to the gas flow in the longitudinal direction, so that the flow state in the processing container (1) is further improved. It is possible to diversify.

【0039】加工容器(1)の側面底部には、粒子の加
工状況を検出する検出器(40)が組み込まれる。この検
出器(40)は、図3に示すように、加工容器(1)の側
面壁に嵌め込まれたゴム等の弾性を有し且つ絶縁性を有
する基体(41)と、両端部を突出させて基体(41)に水
平に挿通した棒状の受圧体(42)と、加工容器(1)外
に配置され、一端部を静止部材(43)に連結すると共
に、他端部を受圧体(42)の外径側端部に連結した弾性
部材(44)(バネ)とで構成される。受圧体(42)は、
導電性及び耐蝕性に優れた材料、例えばステンレスで形
成され、その内径側端部は、粒子の流動域内に突出する
よう加工容器(1)の内部で且つ回転盤(2)よりも僅
かに上方に配置されている。受圧体(42)と加工容器
(1)との間には、抵抗計が電気的に接続され、また、
加工容器(1)外には、受圧体(42)の外径側端部の位
置変位を検知する変位検出手段(例えば距離センサ)が
配置されている(前記抵抗計及び変位検出手段の図示は
省略する)。
At the bottom of the side surface of the processing container (1), a detector (40) for detecting the processing status of particles is incorporated. As shown in FIG. 3, the detector (40) includes a base body (41) having elasticity and insulating properties such as rubber, which is fitted into a side wall of the processing container (1), and has both end portions projected. And a rod-shaped pressure receiving body (42) horizontally inserted through the base body (41), and is arranged outside the processing container (1). One end of the pressure receiving body is connected to the stationary member (43) and the other end is connected to the pressure receiving body (42). ) And an elastic member (44) (spring) connected to the outer diameter side end portion of the. The pressure receiver (42) is
It is made of a material having excellent conductivity and corrosion resistance, for example, stainless steel, and the inner diameter side end portion thereof is inside the processing container (1) and slightly above the rotating disk (2) so as to project into the flow region of particles. It is located in. An ohmmeter is electrically connected between the pressure receiving body (42) and the processing container (1), and
Displacement detecting means (for example, a distance sensor) for detecting the positional displacement of the outer diameter side end of the pressure receiving body (42) is arranged outside the processing container (1) (the resistance meter and the displacement detecting means are not shown in the drawing. Omitted).

【0040】この検出器(40)は、粒子表面の湿潤度を
検出する湿潤度検出器として、また、団粒の発生や回転
盤(2)上への粒子の付着といったトラブルを検出する
検出器として機能する。以下、それぞれの場合につい
て、この検出器(40)の作用を説明する。
The detector (40) is a wetness detector for detecting the wettability of the particle surface, and a detector for detecting troubles such as the generation of aggregates and the adhesion of particles on the rotating disk (2). Function as. The operation of the detector (40) in each case will be described below.

【0041】加工容器(1)内では、湿潤粒子が流動し
ているため、導電材料で形成された加工容器(1)及び
受圧体(42)間はある程度の電流が流れ得る状態になっ
ている。この場合において、粒子表面の湿潤度Aと加工
容器(1)及び受圧体間の抵抗値Rとの間には、図4に
示すように双曲線的関係が成り立ち、また、表面水分量
の僅かな相違によっても抵抗値が大きく変化する。従っ
て、抵抗計の指す抵抗値から粒子表面の相対的な湿潤度
を正確に特定することが可能となる。検知した湿潤度に
過不足がある場合は、作業者の手作業で上昇ガス流や径
方向ガス流の流量、さらにはスプレーノズル(32)から
の液体噴霧量等を調節して粒子の湿潤度をコントロール
し、粉体飛散、団粒の発生や粒子の器壁付着といったト
ラブルを未然に回避する。さらには、抵抗計の検出デー
タを制御装置にフィードバックさせ、当該制御装置で湿
潤度が一定値になるよう径方向ガス流や上昇ガス流、若
しくは加工液供給量等をシーケンス制御すれば作業者の
経験や勘に頼ることなく製品の湿潤度を上記トラブルの
生じない最適値に自動的に維持することが可能となる。
Since the wet particles are flowing in the processing container (1), a certain amount of current can flow between the processing container (1) made of a conductive material and the pressure receiving body (42). . In this case, the wettability A of the particle surface and the resistance value R between the processing container (1) and the pressure receiving body have a hyperbolic relationship as shown in FIG. 4, and the surface water content is small. The resistance value also changes significantly depending on the difference. Therefore, the relative wettability of the particle surface can be accurately specified from the resistance value indicated by the resistance meter. If there is an excess or deficiency in the detected wetness, the wetness of the particles can be adjusted manually by the operator by adjusting the flow rate of the rising gas flow or radial gas flow, and the amount of liquid sprayed from the spray nozzle (32). To prevent problems such as powder scattering, agglomeration, and particle adhesion to the vessel wall. Furthermore, if the detection data of the resistance meter is fed back to the control device, and the control device performs sequence control of the radial gas flow, the rising gas flow, or the machining liquid supply amount so that the wetness becomes a constant value, the operator's It is possible to automatically maintain the wettability of the product at an optimum value that does not cause the above troubles without relying on experience and intuition.

【0042】加工容器(1)内に団粒が発生したり、回
転盤(2)上に多量の粒子が付着すると、受圧体(42)
に団粒や付着粒子が衝突する。受圧体(42)は、図3に
示すように、衝突時の衝撃力に応じて水平面上で傾動
し、団粒等の通過後にバネ(44)の弾性力で初期位置に
弾性復帰する。受圧体(42)が傾動すると、その外径側
端部に位置変位が生じるので、この変位量を変位検出手
段で計測し、当該計測値が設定値よりも大きければ団粒
の発生とみて検知信号を発し、作業者に警告する。これ
により作業者は、装置内に手を入れたり、サンプリング
することなく団粒の発生等を認識することができ、作業
者に過度の負担を強いることなく迅速にトラブルに対処
することが可能となる。
When aggregated particles are generated in the processing container (1) or a large amount of particles are attached to the rotating disk (2), the pressure receiving body (42).
Aggregates and adhered particles collide with. As shown in FIG. 3, the pressure receiving body (42) tilts on a horizontal plane according to the impact force at the time of collision, and elastically returns to the initial position by the elastic force of the spring (44) after passing through aggregates. When the pressure receiving body (42) tilts, a position displacement occurs at the outer diameter side end portion, so this displacement amount is measured by the displacement detecting means, and if the measured value is larger than the set value, it is detected as aggregated particles are detected. Give a signal to warn the operator. This allows the operator to recognize the occurrence of aggregated particles without putting hands in the device or sampling, and it is possible to quickly deal with trouble without imposing an excessive burden on the operator. Become.

【0043】この他、受圧体(42)に歪みゲージを貼着
し、この歪みゲージで団粒衝突に伴う受圧体(42)の撓
み量を測定しても同様の作用効果を得ることができる。
In addition, a similar effect can be obtained by attaching a strain gauge to the pressure receiving body (42) and measuring the amount of deflection of the pressure receiving body (42) due to the collision of aggregates with this strain gauge. .

【0044】[0044]

【発明の効果】以上述べたように、本発明によれば、回
転盤の中央上面に隆起部を突設して転動部を形成すると
共に、この隆起部下面と回転盤上面との間に外径側に向
けて噴出口を設け、この噴出口に前記リング状隙間に導
入されるガス流とは独立して流量調整可能とした導気路
を連通させているので、最適流量に調整した径方向ガス
流を噴出することができ、加工容器や回転盤の寸法とは
無関係に簡単に理想的な転動流動状態を実現できる。従
って、加工容器や回転盤の寸法決定作業を簡略化するこ
とができ、装置のスケールアップやスケールダウンにも
容易に対応可能となる。また、隆起部の外周面が流動作
用の殆ど作用しない転動作用域となるので、粒子群の最
適循環流動を実現することができる。
As described above, according to the present invention, a protruding portion is provided on the upper surface of the center of the rotating disk to form a rolling portion, and between the lower surface of the protruding portion and the upper surface of the rotating disk. An outlet is provided toward the outer diameter side, and an air guide passage whose flow rate can be adjusted independently of the gas flow introduced into the ring-shaped gap is connected to this outlet, so that the flow rate is adjusted to the optimum value. A radial gas flow can be ejected, and an ideal rolling flow state can be easily realized regardless of the dimensions of the processing container or the turntable. Therefore, it is possible to simplify the work of determining the dimensions of the processing container and the turntable, and it is possible to easily deal with scale-up and scale-down of the apparatus. Further, since the outer peripheral surface of the raised portion serves as a rolling operation area in which almost no flow action is exerted, optimum circulation flow of the particle group can be realized.

【0045】導気路にリング状隙間に導入されたガス流
の一部を分流させれば、単一のガス流供給源で上昇ガス
流と径方向ガス流の二種類のガス流を得ることができ、
構造の簡素化が図れる。
By splitting a part of the gas flow introduced into the ring-shaped gap in the air guide passage, it is possible to obtain two kinds of gas flows, an ascending gas flow and a radial gas flow, with a single gas flow supply source. Can
The structure can be simplified.

【0046】導気路に、リング状隙間に導入されるガス
流とは独立した別系統のガス供給系を接続すれば、上昇
ガス流と径方向ガス流の流量をそれぞれ完全に独立して
調整することができ、最適な流動転動状態を容易に実現
することができる。この場合には、径方向ガス流の流量
調整によって上昇ガス流の流量が影響を受けることもな
いので、よりきめ細やかな流量調整が行なえる。
If a gas supply system of another system independent of the gas flow introduced into the ring-shaped gap is connected to the air guide passage, the flow rates of the rising gas flow and the radial gas flow can be adjusted completely independently of each other. Therefore, the optimum flow rolling state can be easily realized. In this case, the flow rate of the ascending gas flow is not affected by the adjustment of the flow rate of the radial gas flow, so that finer flow rate adjustment can be performed.

【0047】リング状隙間の直下部に、リング状隙間と
の対向部位を開口させたリング状ダクトを設け、このリ
ング状ダクトに、接線方向で且つ前記回転盤の回転方向
と同一方向に向けて導気する気流取入口を設ければ、単
に垂直方向のガス流のみを作用させる場合に比べて粒子
の流動運動を活発化させることができ、径方向ガス流と
の相乗作用によってより活発な流動運動を実現すること
が可能となる。また、クロスコンタミネーションも確実
に防止することができ、GMP的にも優れたものとな
る。
Immediately below the ring-shaped gap, a ring-shaped duct having an opening facing the ring-shaped gap is provided, and the ring-shaped duct is directed tangentially and in the same direction as the rotation direction of the rotary disk. By providing an airflow inlet for guiding air, it is possible to activate the flow motion of particles as compared with the case where only a vertical gas flow is acted, and a more active flow due to a synergistic effect with the radial gas flow. It becomes possible to realize exercise. In addition, cross contamination can be surely prevented, which is excellent in terms of GMP.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明装置の垂直断面図である。FIG. 1 is a vertical sectional view of a device of the present invention.

【図2】本発明装置の他の実施例を示す垂直断面図であ
る。
FIG. 2 is a vertical sectional view showing another embodiment of the device of the present invention.

【図3】検出器の水平断面図である。FIG. 3 is a horizontal sectional view of a detector.

【図4】水分量と抵抗値の関係を示すグラフである。FIG. 4 is a graph showing the relationship between water content and resistance value.

【図5】噴出口の他の実施例を示す垂直断面図である。FIG. 5 is a vertical sectional view showing another embodiment of the ejection port.

【符号の説明】[Explanation of symbols]

1 加工容器 2 回転盤 5 リング状隙間 6 隆起部材 11 噴出口 12 貫通孔 22 昇降部材 30 導気路 1 Processing Container 2 Rotating Disk 5 Ring-shaped Gap 6 Raised Member 11 Spout 12 Through Hole 22 Lifting Member 30 Air Guide

───────────────────────────────────────────────────── フロントページの続き (72)発明者 栗原 保 埼玉県川越市吉田新町1−2−2−5− 206号 (72)発明者 三ツ木 勇人 埼玉県春日部市武里団地6−9−106 (72)発明者 小西 将史 千葉県印旛郡栄町安倉台6−4−8 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tamotsu Kurihara 1-2-2-5-206, Yoshidashinmachi, Kawagoe City, Saitama Prefecture (72) Inventor Hayato Mitsugi 6-9-106 Kasukabe City, Saitama Prefecture 72) Inventor Masashi Konishi 6-4-8 Asakuradai, Sakae-cho, Inba-gun, Chiba Prefecture

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 略円筒状の加工容器と、この加工容器内
の底部近傍で水平回転する回転盤とを有し、系外より回
転盤の下方に供給されたガス流を、回転盤の外径面とこ
れに対向する加工容器の内径面との間に形成されたリン
グ状隙間から上方に噴出させ、この上昇ガス流と回転盤
の回転運動との相乗作用により、加工容器内の粒子に転
動流動を行なわせて造粒・コーティング等の粒子加工を
施す装置において、 前記回転盤の中央上面に隆起部を突設して転動部を形成
すると共に、隆起部と回転盤上面との間に外径側に向け
て噴出口を設け、この噴出口に前記リング状隙間に導入
されるガス流とは独立して流量調整可能とした導気路を
連通させたことを特徴とする粒子加工装置。
1. A processing container having a substantially cylindrical shape and a turntable that horizontally rotates in the vicinity of the bottom of the work vessel. A gas flow supplied from outside the system below the turntable is supplied to the outside of the turntable. It is jetted upward from the ring-shaped gap formed between the radial surface and the inner diameter surface of the processing container facing it, and due to the synergistic effect of this rising gas flow and the rotary motion of the rotating disk, In a device for performing particle processing such as granulation and coating by performing tumbling flow, a protruding portion is formed on a central upper surface of the rotating disk to form a rolling portion, and the protruding portion and the upper surface of the rotating disk are formed. Particles characterized in that a jetting port is provided between them toward the outer diameter side, and an air guiding passage whose flow rate can be adjusted independently of the gas flow introduced into the ring-shaped gap is communicated with the jetting port. Processing equipment.
【請求項2】 前記導気路に、前記リング状隙間に導入
されたガス流の一部を分流させることを特徴とする請求
項1記載の粒子加工装置。
2. The particle processing apparatus according to claim 1, wherein a part of the gas flow introduced into the ring-shaped gap is diverted to the air guide passage.
【請求項3】 前記回転盤の下方に昇降部材を配置して
この昇降部材の上面と回転盤の下面との間に導気路を形
成すると共に、この導気路を回転盤に設けた貫通孔を介
して前記噴出口に連通させ、前記昇降部材の昇降動作に
より導気路の幅を変化させて当該導気路のガス分流量を
調整することを特徴とする請求項2記載の粒子加工装
置。
3. An elevating member is disposed below the rotary disk to form an air guide path between an upper surface of the elevating member and a lower surface of the rotary disk, and the air guide path is provided on the rotary disk. 3. The particle processing according to claim 2, wherein the particle discharge flow rate is adjusted by communicating the jet port through a hole and changing the width of the air guide passage by the raising and lowering operation of the elevating member. apparatus.
【請求項4】 前記導気路に、前記リング状隙間に導入
されるガス流とは独立した別系統のガス供給系を接続す
ることを特徴とする請求項1記載の粒子加工装置。
4. The particle processing apparatus according to claim 1, wherein a gas supply system of a separate system independent of a gas flow introduced into the ring-shaped gap is connected to the air guide passage.
【請求項5】 前記リング状隙間の直下部に、リング状
隙間との対向部位を開口させたリング状ダクトを設け、
このリング状ダクトに、接線方向で且つ前記回転盤の回
転方向と同一方向に向けて導気する気流取入口を設けた
ことを特徴とする請求項1〜4何れか記載の粒子加工装
置。
5. A ring-shaped duct having an opening at a portion facing the ring-shaped gap is provided immediately below the ring-shaped gap,
5. The particle processing device according to claim 1, wherein the ring-shaped duct is provided with an airflow inlet that guides air in a tangential direction and in the same direction as the rotation direction of the rotary disk.
JP16081694A 1994-07-13 1994-07-13 Particle processing equipment Expired - Fee Related JP3633958B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16081694A JP3633958B2 (en) 1994-07-13 1994-07-13 Particle processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16081694A JP3633958B2 (en) 1994-07-13 1994-07-13 Particle processing equipment

Publications (2)

Publication Number Publication Date
JPH0824617A true JPH0824617A (en) 1996-01-30
JP3633958B2 JP3633958B2 (en) 2005-03-30

Family

ID=15723047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16081694A Expired - Fee Related JP3633958B2 (en) 1994-07-13 1994-07-13 Particle processing equipment

Country Status (1)

Country Link
JP (1) JP3633958B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114749097A (en) * 2022-03-29 2022-07-15 浙江小伦智能制造股份有限公司 Wet drying integral type granulator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114749097A (en) * 2022-03-29 2022-07-15 浙江小伦智能制造股份有限公司 Wet drying integral type granulator

Also Published As

Publication number Publication date
JP3633958B2 (en) 2005-03-30

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