JPH08243476A - Method for coating of glass substrate by die coater - Google Patents
Method for coating of glass substrate by die coaterInfo
- Publication number
- JPH08243476A JPH08243476A JP5101795A JP5101795A JPH08243476A JP H08243476 A JPH08243476 A JP H08243476A JP 5101795 A JP5101795 A JP 5101795A JP 5101795 A JP5101795 A JP 5101795A JP H08243476 A JPH08243476 A JP H08243476A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- coating
- die coater
- gap
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、ダイコータによるガラ
ス基板への塗布方法、特に、2.00mm以下の比較的
薄いガラス基板上に、ダイコータにより10μm以下の
薄膜を塗布する塗布方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of coating a glass substrate with a die coater, and more particularly to a method of coating a thin film of 10 μm or less with a die coater on a relatively thin glass substrate of 2.00 mm or less. .
【0002】[0002]
【従来の技術】従来、ガラス基板上にフォトレジスト液
等塗料を塗布する方法として、ガラス基板を回転させて
塗料を塗布するスピンコータ方式がある。しかし、この
方法では塗料の約95%が再利用されず廃棄されるため
経済的に非常に不利である。そこで、塗布液を有効に利
用する塗布方式として、ダイコータによるものが着目さ
れている。2. Description of the Related Art Conventionally, as a method of applying a coating material such as a photoresist liquid on a glass substrate, there is a spin coater method in which the coating material is applied by rotating a glass substrate. However, this method is very economically disadvantageous because about 95% of the paint is discarded without being reused. Therefore, a coating method using a die coater has attracted attention as a coating method for effectively using a coating liquid.
【0003】ところで、ガラス基板には、基板自体が有
する“うねり”、“そり”および“厚みむら”にテーブ
ルの“うねり”等が加わるため、ダイコータでこのよう
なガラス基板上に10μm以下の薄膜を塗布する場合、
前記“そり”等によるギャップの変化により塗膜に濃淡
の縞が発生していた。On the other hand, a glass substrate is provided with a "undulation", "sludge" and "thickness unevenness" of the substrate itself, and "undulations" of a table. Therefore, a thin film of 10 μm or less is formed on such a glass substrate by a die coater. When applying
A change in the gap due to the above-mentioned "warp" or the like has caused light and shade stripes in the coating film.
【0004】一方、ダイコータの下端とガラス基板との
間に形成されるビードのガラス基板搬送方向の上流側と
下流側とにおいて圧力差を設けると、塗膜の厚さを、ダ
イコータの下端とガラス基板とのギャップの1/2〜1
/7とすることができることが知られている。つまり、
前記ギャップを塗膜厚さの2〜7倍とし、ギャップを拡
げることにより、前記“うねり”等によるギャップ変化
を実質的に小さくして、ギャップ変化が塗布膜厚の均一
性に与える影響を緩和するようにしている。そして、前
記圧力差を発生させるため、図3,図4に示す手段が採
用されている。On the other hand, if a pressure difference is provided between an upstream side and a downstream side in the glass substrate transport direction of a bead formed between the lower end of the die coater and the glass substrate, the thickness of the coating film is reduced by the lower end of the die coater and the glass. 1/2 to 1 of gap with substrate
It is known that it can be / 7. That is,
By making the gap 2 to 7 times the coating thickness and widening the gap, the gap change due to the "waviness" or the like is substantially reduced, and the effect of the gap change on the uniformity of the coating film thickness is mitigated. I am trying to do it. Then, in order to generate the pressure difference, the means shown in FIGS. 3 and 4 is adopted.
【0005】すなわち、図3においては、ダイコータa
のガラス基板Wの搬送方向上流側にエアチャンバーcを
付設し、エアチャンバーc内を吸引することにより、ダ
イコータaの下流側との間に圧力差を設けるものであ
り、図4においては、ダイコータaのガラス基板Wの搬
送方向下流側にノズルdを付設し、このノズルdから塗
布部に気体を吹き付けて圧力差を設ける方法である。な
お、前記記載ではガラス基板Wを移動させるようにした
が、逆にダイコータを移動させるものであってもよい。That is, in FIG. 3, the die coater a
An air chamber c is attached to the upstream side in the transport direction of the glass substrate W, and a pressure difference is provided between the air chamber c and the downstream side of the die coater a by sucking the inside of the air chamber c. In FIG. In this method, a nozzle d is attached to the downstream side of the glass substrate W in the transport direction of a, and a gas is blown from the nozzle d to the application portion to provide a pressure difference. In the above description, the glass substrate W is moved, but the die coater may be moved on the contrary.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、前者の
場合、エアチャンバーcはダイコータaの外方に付設し
ているため、ダイコータaの塗料用ノズルbからエアチ
ャンバーcの後端間の距離Lが必然的に大きくなる。そ
のため、矢印方向に搬送されるガラス基板Wの後端部
が、ダイコータaに近づくと、エアチャンバーcの下方
が大きく開放され、この部分におけるシール性が保持で
きないため充分な圧力差が生じず、その部分では塗膜は
厚くなり所定厚が維持できなくなる。したがって、前記
チャンバーcがシール性を確保し、充分な圧力差を保持
できる範囲が非常に狭くなり、ガラス基板W全体に所望
の膜厚を形成するのが困難になるという課題を有してい
た。However, in the former case, since the air chamber c is provided outside the die coater a, the distance L between the paint nozzle b of the die coater a and the rear end of the air chamber c is reduced. Inevitably grows. Therefore, when the rear end portion of the glass substrate W conveyed in the direction of the arrow approaches the die coater a, the lower part of the air chamber c is largely opened, and the sealability at this portion cannot be maintained, so that a sufficient pressure difference does not occur. At that portion, the coating film becomes thick and the predetermined thickness cannot be maintained. Therefore, there is a problem that the range in which the chamber c can secure a sealing property and a sufficient pressure difference can be extremely narrowed, and it is difficult to form a desired film thickness over the entire glass substrate W. .
【0007】一方、後者の場合、ガラス基板Wの先端部
において、ノズルdからの気流がガラス基板Wの厚みに
よる段差などで乱れるため、所定の膜厚が得られない。
また、膜厚を薄くするためにノズルdからの吹付圧を高
くして圧力差を大きくすると、塗料が途切れたり、塗膜
面が波立って塗装不良をおこす。さらに、塗料が低粘度
(約20CPS以下)である場合、塗液が飛散して塗装
が困難になる等の問題を有していた。なお、この方式に
おいては、ノズルdから供給する気体の動圧を利用して
いるため、塗料用ノズルbに形成されたビードの全巾に
わたって均一に圧力を付与することが非常に難しいとい
う課題も有していた。On the other hand, in the latter case, a predetermined film thickness cannot be obtained at the tip of the glass substrate W because the airflow from the nozzle d is disturbed by a step due to the thickness of the glass substrate W.
Further, if the spray pressure from the nozzle d is increased to increase the pressure difference in order to reduce the film thickness, the paint may be interrupted or the coating surface may become wavy, resulting in coating failure. Further, when the coating material has a low viscosity (about 20 CPS or less), there is a problem that the coating liquid is scattered and the coating becomes difficult. In this method, since the dynamic pressure of the gas supplied from the nozzle d is used, it is very difficult to apply pressure uniformly over the entire width of the bead formed on the coating nozzle b. Had.
【0008】本発明者らは、前記ダイコータによる塗布
方法における課題を解決するべく種々検討した結果、図
2に示すキャピラリー数Caと無次元最小塗布膜厚(無
次元塗布膜厚比)tとの関係から、キャピラリー数Ca
が臨界値である0.1以下の範囲では、キャピラリー数
Caと無次元最小塗布膜厚tとは比例関係にあることを
知見した。キャピラリー数Caが該比例域にある場合、
塗布液の物性値および塗布速度を(数1)にあてはめて
求めたキャピラリー数Caより決まる無次元最小塗布膜
厚tを(数2)にあてはめて求めた最大ギャップと、キ
ャピラリー数Caの臨界値0.1から決まる無次元最小
塗布膜厚tを(数2)にあてはめて求めた最小ギャップ
との間に、ガラス基板のそりや厚みむらによるギャップ
の変動を含めたギャップの設定値が存在していれば、従
来のようにチャンバーを付設しなくても所定の塗布膜厚
で塗布できることを見出した。As a result of various studies to solve the problems in the coating method using the die coater, the present inventors found that the number of capillaries Ca and the dimensionless minimum coating film thickness (dimensionalless coating film thickness ratio) t shown in FIG. From the relationship, the number of capillaries Ca
It was found that the capillary number Ca and the dimensionless minimum coating film thickness t are in a proportional relationship in a range of 0.1 or less, which is a critical value. When the capillary number Ca is in the proportional range,
The dimensionless minimum coating film thickness t determined from the capillary number Ca determined by applying the physical properties and the coating speed of the coating liquid to (Equation 1), the maximum gap determined by applying (Equation 2) to the critical value of the capillary number Ca A gap setting value including a gap variation due to warpage or uneven thickness of the glass substrate exists between the dimensionless minimum coating film thickness t determined from 0.1 and the minimum gap obtained by applying the equation (2). It has been found that the coating can be performed at a predetermined coating film thickness without providing a chamber as in the related art.
【数1】Ca=μU/σ[Equation 1] Ca = μU / σ
【数2】t=h/H なお、μ: 粘度(Pa・S) U: 塗布速度(m/s) σ: 表面張力(N/m) h: 最小塗布膜厚(μm) H: ギャップ(μm)である。 したがって、本発明は前記知見により前述したダイコー
タによる課題を解決できるダイコータによるガラス基板
への塗布方法を提供することを目的とする。T = h / H, μ: viscosity (Pa · S) U: coating speed (m / s) σ: surface tension (N / m) h: minimum coating film thickness (μm) H: gap ( μm). Therefore, an object of the present invention is to provide a method for coating a glass substrate using a die coater, which can solve the above-described problems of the die coater based on the above knowledge.
【0009】[0009]
【課題を解決するための手段】本発明は、前記目的を達
成するために、請求項1においては、ダイコータにより
ガラス基板上に塗布を行うに際し、吸引機構を有し、か
つ、平坦度が2μm以下のテーブル上に前記ガラス基板
を吸着保持し、前記ダイコータとテーブルとを相対的に
移動させ、ダイコータによりガラス基板上に塗布するも
のである。また、請求項2においては、塗布液の粘度、
塗布液の表面張力および塗布速度から算出されるキャピ
ラリー数が0.1以下となる領域から得られたギャップ
をもってダイコータを設置し、ガラス基板上に塗布する
ものである。According to the present invention, in order to achieve the above object, in claim 1, when a glass substrate is coated with a die coater, it has a suction mechanism and a flatness of 2 μm. The glass substrate is adsorbed and held on the following table, the die coater and the table are moved relative to each other, and the glass substrate is coated with the die coater. Further, in claim 2, the viscosity of the coating liquid,
A die coater is installed with a gap obtained from a region where the number of capillaries calculated from the surface tension and the coating speed of the coating liquid is 0.1 or less, and coating is performed on a glass substrate.
【0010】[0010]
【実施例】つぎに、本発明の一実施例を図にしたがって
説明する。図1において、ダイコータ1はダイヘッド2
および該ヘッド2に塗布液であるフォトレジスト液を供
給する塗布液供給ポンプ4および塗布液タンク5からな
る。6はガラス基板Wを載置する移動テーブルで、該移
動テーブル6の上面は2μmの平坦度を有し、かつ、そ
の上面に格子状に溝8が設けられ、この各溝8は貫通孔
7を介して真空ポンプ(図示せず)に連通している。そ
して、前記ガラス基板Wを前記移動テーブル6上に載置
し、真空ポンプで吸引することによりガラス基板Wを移
動テーブル6上に吸着保持し、矢印方向に移動させなが
らフォトレジスト液をダイヘッド2のスリット3から流
出させて塗布するものである。Next, an embodiment of the present invention will be described with reference to the drawings. In FIG. 1, a die coater 1 has a die head 2
And a coating liquid supply pump 4 for supplying a photoresist liquid as a coating liquid to the head 2 and a coating liquid tank 5. Reference numeral 6 denotes a moving table on which the glass substrate W is placed. The upper surface of the moving table 6 has a flatness of 2 μm, and grooves 8 are formed in a grid on the upper surface. Through a vacuum pump (not shown). Then, the glass substrate W is placed on the moving table 6, and the glass substrate W is sucked and held on the moving table 6 by suction with a vacuum pump. It is applied by flowing out of the slit 3.
【0011】いま、フォトレジスト液の物性値を粘度:
0.06Pa・S、表面張力:30×10-3N/m、ガ
ラス基板の精度を“そり”:500μm、厚み:1.1
mm±10μm、塗布条件を塗布速度:10mm/s、
塗布膜厚:10μmとする。この場合、ギャピラリー数
Caは前述の数1から0.02であり、図2から無次元
最小塗布膜厚tは約0.15である。塗布条件より、塗
布膜厚hが10μmであるため、(数2)からギャップ
Hは約66μmとなる。また、前記のようにキャピラリ
ー数Caの臨界値0.1付近でギャップHが最小となる
ことから、図2よりキャピラリー数Caが0.1のとき
の無次元最小塗布膜厚tは約0.6となり、塗布膜厚が
10μmであることから(数2)より最小ギャップHは
約16μmとなる。したがって、ガラス基板Wの基準面
とダイコータ1の下端との距離が前記計算により得たギ
ャップ16μmから66μmの範囲内にあり、しかも、
ガラス基板Wの厚みむら等によるギャップの変動があっ
ても前記ギャップ範囲内に入っていれば塗布膜厚10μ
mは得られる。Now, the physical property value of the photoresist solution is determined by the viscosity:
0.06 Pa · S, surface tension: 30 × 10 −3 N / m, precision of glass substrate “sludge”: 500 μm, thickness: 1.1
mm ± 10 μm, application conditions: application speed: 10 mm / s,
Coating thickness: 10 μm. In this case, the capillary number Ca is from the above-mentioned number 1 to 0.02, and from FIG. 2, the dimensionless minimum coating film thickness t is about 0.15. Since the coating thickness h is 10 μm according to the coating conditions, the gap H is about 66 μm from (Equation 2). In addition, since the gap H is minimized near the critical value 0.1 of the capillary number Ca as described above, the dimensionless minimum coating film thickness t when the capillary number Ca is 0.1 is about 0. The minimum gap H is about 16 μm from (Equation 2) because the coating film thickness is 10 μm. Therefore, the distance between the reference surface of the glass substrate W and the lower end of the die coater 1 is in the range of the gap 16 μm to 66 μm obtained by the above calculation, and
Even if the gap fluctuates due to uneven thickness of the glass substrate W, etc., if the gap is within the gap range, the applied film thickness is 10 μm.
m is obtained.
【0012】一方、前記基板Wの“そり”は、ガラス基
板Wが移動テーブル6に吸着されて矯正されているた
め、ガラス基板Wには“厚みむら”±10μmが生じる
のみであり、かつ、移動テーブル6の平坦度は±1μm
以下であるため、ガラス基板Wの上面は基準面から±1
1μmの差が生じる。しかしながら、ダイコータ1の下
端とガラス基板Wの基準面との距離(ギャップH)は前
記16μmから66μmの範囲で調整できるので、ギャ
ップHを55μmにすれば変動によりギャップが大きく
なって基板Wから最も離れても55+11=66μmで
前記範囲内にあり、逆に基板Wに最も接近しても55−
11=44μmとなり、塗布膜厚10μmを考慮して
も、ダイコータ1の下端と塗布膜表面との間に44−1
0=34μmの空間が形成されており、塗布に支障はな
い。また、ギャップHの設定値を前記範囲内で最大にし
ておくことにより、厚みむらの影響を少しでも小さくす
ることができる。On the other hand, the "warp" of the substrate W is caused by the glass substrate W being attracted to the moving table 6 and corrected, so that "thickness unevenness" of ± 10 μm occurs only on the glass substrate W, and The flatness of the moving table 6 is ± 1 μm
Therefore, the upper surface of the glass substrate W is ± 1 from the reference plane.
A difference of 1 μm results. However, the distance (gap H) between the lower end of the die coater 1 and the reference surface of the glass substrate W can be adjusted in the range of 16 μm to 66 μm. 55 + 11 = 66 μm, which is within the above range even if it is far away.
11 = 44 μm, and even if the coating film thickness of 10 μm is taken into consideration, 44-1 is provided between the lower end of the die coater 1 and the coating film surface.
A space of 0 = 34 μm is formed, and there is no problem in application. Further, by setting the set value of the gap H to the maximum value within the above range, the influence of the thickness unevenness can be reduced as much as possible.
【0013】なお、前記説明では、キャピラリー数Ca
を利用してダイコータとガラス基板とのギャップを定め
たが、場合によっては、ガラス基板を移動テーブル上に
吸着保持してガラス基板の“うねり”、“そり”を矯正
するだけで、ダイコータをキャピラリー数Caに関係な
くギャップを設定して塗布してもよい。In the above description, the number of capillaries Ca
Was used to determine the gap between the die coater and the glass substrate. However, in some cases, simply holding the glass substrate on a moving table to correct the "undulation" or "sludge" of the glass substrate would cause the die coater to become capillary. A gap may be set and applied regardless of the number Ca.
【0014】[0014]
【発明の効果】以上の説明で明らかなように、請求項1
の発明では、ガラス基板を平坦度2μm以下のテーブル
に吸着保持するため、ガラス基板の“うねり”、“そ
り”は無視でき、ガラス基板の“厚みむら”とテーブル
の平坦度2μmがダイコータとガラス基板とのギャップ
変化として現われるのみであり、このギャップ変化は比
較的小さいので、ダイコータに圧力チャンバーを設ける
ことなくガラス基板に所望の薄膜を塗布することができ
る。また、請求項2によれば、塗布液の粘度、塗布液の
表面張力および塗布速度から算出されるキャピラリー数
を0.1以下となるように設定すれば、ダイコータとガ
ラス基板とのギャップを大きくとれ、ガラス基板に所望
の薄膜を塗布することができる。As is apparent from the above description, claim 1
According to the invention, since the glass substrate is held by suction on a table having a flatness of 2 μm or less, the “undulation” and “sludge” of the glass substrate can be ignored. It only appears as a gap change with the substrate, and since this gap change is relatively small, a desired thin film can be applied to a glass substrate without providing a pressure chamber in the die coater. According to the second aspect, the gap between the die coater and the glass substrate can be increased by setting the capillary number calculated from the viscosity of the coating solution, the surface tension of the coating solution and the coating speed to be 0.1 or less. Thus, a desired thin film can be applied to the glass substrate.
【図1】 本発明を実施するダイコータ装置の断面図。FIG. 1 is a sectional view of a die coater device embodying the present invention.
【図2】 キャピラリー数Caと無次元最小塗布膜厚t
との関係を示すグラフ。FIG. 2 Capillary number Ca and dimensionless minimum coating thickness t
A graph showing the relationship with.
【図3】 従来のダイコータを示す断面図。FIG. 3 is a sectional view showing a conventional die coater.
【図4】 従来のダイコータを示す断面図。FIG. 4 is a sectional view showing a conventional die coater.
1…ダイコータ、2…ダイヘッド、3…スリット、6…
移動テーブル、7…貫通孔、8…溝、W…ガラス基板。1 ... Die coater, 2 ... Die head, 3 ... Slit, 6 ...
Moving table, 7: through hole, 8: groove, W: glass substrate.
Claims (2)
行うに際し、吸引機構を有し、かつ、平坦度が2μm以
下のテーブル上に前記ガラス基板を吸着保持し、前記ダ
イコータとテーブルとを相対的に移動させ、ダイコータ
によりガラス基板上に塗布することを特徴とするダイコ
ータによるガラス基板への塗布方法。1. When coating a glass substrate with a die coater, the glass substrate is suction-held on a table having a suction mechanism and a flatness of 2 μm or less, and the die coater and the table are relatively held. A method of coating on a glass substrate by a die coater, which comprises moving and coating on a glass substrate by a die coater.
塗布速度から算出されるキャピラリー数が0.1以下と
なる領域から得られたギャップをもってダイコータを設
置し、ガラス基板上に塗布することを特徴とする前記請
求項1に記載のダイコータによるガラス基板への塗布方
法。2. A die coater is installed with a gap obtained from a region where the number of capillaries calculated from the viscosity of the coating liquid, the surface tension of the coating liquid and the coating speed is 0.1 or less, and coating is performed on a glass substrate. A coating method for a glass substrate by the die coater according to claim 1, wherein
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5101795A JP2644457B2 (en) | 1995-03-10 | 1995-03-10 | Coating method on glass substrate by die coater |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5101795A JP2644457B2 (en) | 1995-03-10 | 1995-03-10 | Coating method on glass substrate by die coater |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08243476A true JPH08243476A (en) | 1996-09-24 |
JP2644457B2 JP2644457B2 (en) | 1997-08-25 |
Family
ID=12875029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5101795A Expired - Lifetime JP2644457B2 (en) | 1995-03-10 | 1995-03-10 | Coating method on glass substrate by die coater |
Country Status (1)
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JP (1) | JP2644457B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002248399A (en) * | 2001-02-27 | 2002-09-03 | Toray Ind Inc | Method and apparatus for manufacturing coating member |
KR100763169B1 (en) * | 2001-09-24 | 2007-10-08 | 엘지.필립스 엘시디 주식회사 | Structure of vacuum chuck for adsorbing substrate |
JP2009262154A (en) * | 2002-07-26 | 2009-11-12 | Dainippon Printing Co Ltd | Method of forming coating film |
JP2011146592A (en) * | 2010-01-15 | 2011-07-28 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus and method |
CN103447193A (en) * | 2012-05-31 | 2013-12-18 | 松下电器产业株式会社 | Coating apparatus |
WO2015177963A1 (en) * | 2014-05-20 | 2015-11-26 | デクセリアルズ株式会社 | Coating method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004157229A (en) * | 2002-11-05 | 2004-06-03 | Shin Etsu Chem Co Ltd | Pellicle for lithography and its manufacturing method |
-
1995
- 1995-03-10 JP JP5101795A patent/JP2644457B2/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002248399A (en) * | 2001-02-27 | 2002-09-03 | Toray Ind Inc | Method and apparatus for manufacturing coating member |
KR100763169B1 (en) * | 2001-09-24 | 2007-10-08 | 엘지.필립스 엘시디 주식회사 | Structure of vacuum chuck for adsorbing substrate |
JP2009262154A (en) * | 2002-07-26 | 2009-11-12 | Dainippon Printing Co Ltd | Method of forming coating film |
JP2011146592A (en) * | 2010-01-15 | 2011-07-28 | Dainippon Screen Mfg Co Ltd | Substrate processing apparatus and method |
CN103447193A (en) * | 2012-05-31 | 2013-12-18 | 松下电器产业株式会社 | Coating apparatus |
CN103447193B (en) * | 2012-05-31 | 2015-11-18 | 松下电器产业株式会社 | Apparatus for coating |
WO2015177963A1 (en) * | 2014-05-20 | 2015-11-26 | デクセリアルズ株式会社 | Coating method |
Also Published As
Publication number | Publication date |
---|---|
JP2644457B2 (en) | 1997-08-25 |
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