JPH08233670A - Semiconductor pressure sensor - Google Patents

Semiconductor pressure sensor

Info

Publication number
JPH08233670A
JPH08233670A JP6167595A JP6167595A JPH08233670A JP H08233670 A JPH08233670 A JP H08233670A JP 6167595 A JP6167595 A JP 6167595A JP 6167595 A JP6167595 A JP 6167595A JP H08233670 A JPH08233670 A JP H08233670A
Authority
JP
Japan
Prior art keywords
pressure
medium
case
measured
diaphragm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6167595A
Other languages
Japanese (ja)
Inventor
Michio Nemoto
道夫 根本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP6167595A priority Critical patent/JPH08233670A/en
Publication of JPH08233670A publication Critical patent/JPH08233670A/en
Pending legal-status Critical Current

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  • Measuring Fluid Pressure (AREA)

Abstract

PURPOSE: To stably detect pressure of a corrosive and high temperature pressure measuring object medium by filling a pressure transmitting flow medium in an airtight space surrounded by a case, and slidably installing a pressure transmitting part in a pressure introducing port to be measured. CONSTITUTION: A detecting element part 10 is formed by joining a silicon substrate 1 having a diaphragm part 11 deformed by pressure to be measured and an insulating board 2 where an electrode part 31 is formed on a surface opposed to the diaphragm part 11 by electrostatic coupling. The whole element part 10 is adhered to a lower inner wall surface of a lower side case 5 by an adhesive 90, and the upper and lower cases 4 and 5 are joined together by ultrasonic welding or the like, and a pressure transmitting medium 7 is filled in an airtight space 70. A pressure transmitting slidingly movable member 6 is installed in a pressure introducing port 41 of the case 4, and prevents the medium 7 from leaking to a measuring object side medium 12. Pressure of the medium 12 applies pressure to a member 6, and this pressure is transmitted to the medium 7, and the diaphragm 11 of the substrate 1 of the element 10 is deformed by this pressure, and capacitance of the element 10 is changed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、自動車内で使用される
各種圧力検出、及び産業用、家電機器等の圧力検出に使
用される半導体式圧力センサに関するものであって、特
に、圧力伝達構造の改善に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor type pressure sensor used for detecting various pressures used in automobiles and pressure detection for industrial and home electric appliances. Regarding the improvement of.

【0002】[0002]

【従来の技術】図2に、従来の容量式半導体圧力センサ
の1例を示す。下側ケース5に、検出素子部10が、接
着剤等によって接合されており、検出素子部10は、被
測定圧力により変形するダイヤフラム部11を有するシ
リコン基板1と絶縁基板2とが静電接合の手段によって
対向するように接合されて、検出素子部10が形成され
る。ここで、絶縁基板2には、シリコン基板1のダイア
フラム部11と対向して空気コンデンサ部を構成するた
めの電極である電極部31が形成され、かつ基準圧力P
2を検出するための貫通穴9が開けられている。
2. Description of the Related Art FIG. 2 shows an example of a conventional capacitive semiconductor pressure sensor. The detection element unit 10 is joined to the lower case 5 with an adhesive or the like. In the detection element unit 10, the silicon substrate 1 having the diaphragm portion 11 that is deformed by the measured pressure and the insulating substrate 2 are electrostatically joined. The detection element section 10 is formed by being joined so as to face each other. Here, the insulating substrate 2 is provided with an electrode portion 31 which is an electrode for forming an air condenser portion so as to face the diaphragm portion 11 of the silicon substrate 1 and has a reference pressure P.
A through hole 9 for detecting 2 is opened.

【0003】シリコン基板1のダイヤフラム11が、圧
力差(ΔP=P1−P2)を受けて変形することにより、
シリコン基板1と電極部2間とで形成される空気コンデ
ンサの静電容量値が変化し、この容量の変化を後段の処
理回路(容量−周波数変換回路)の出力とする。ここ
で、P1は被測定媒体の圧力であり、P2は基準圧力を表
している。
The diaphragm 11 of the silicon substrate 1 is deformed by receiving a pressure difference (ΔP = P 1 -P 2 ).
The capacitance value of the air capacitor formed between the silicon substrate 1 and the electrode portion 2 changes, and this change in capacitance is used as the output of the subsequent processing circuit (capacitance-frequency conversion circuit). Here, P 1 is the pressure of the medium to be measured, and P 2 is the reference pressure.

【0004】[0004]

【発明が解決しようとする課題】上述した従来の方式に
は、以下の問題点がある。従来例の構造は、被測定圧力
として、腐食性のない気体等(一般の空気等)に限って
検出が可能であり、他の腐食性のガス、あるいは一般の
液体(水等)については、著しく検出の信頼性が低下し
てしまうという問題点がある。その理由は、腐食性ガ
ス、あるいは水等の液体が、上・下ケースで形成した気
密空間に入ると、検出素子部の、特に、電極部31の端
部32とボンディングワイヤ33との電極接続部分(図
3参照)を腐食させ、断線等の致命欠陥を引き起こすた
めである。
The above-mentioned conventional method has the following problems. The structure of the conventional example can detect only the non-corrosive gas etc. (general air etc.) as the pressure to be measured, and other corrosive gas or general liquid (water etc.), There is a problem that the reliability of detection is significantly reduced. The reason is that when a corrosive gas or a liquid such as water enters the airtight space formed by the upper and lower cases, the electrode connection of the detection element part, particularly the end 32 of the electrode part 31 and the bonding wire 33 is performed. This is because the portion (see FIG. 3) is corroded and a fatal defect such as disconnection is caused.

【0005】一方、被測定媒体の温度上限についても、
上述の検出素子部の電極接続部分の耐熱性によって制限
されてしまい、通常は、約150℃が限界であった。従
って、より高温の媒体については測定不可能となってい
た。
On the other hand, regarding the upper limit of the temperature of the medium to be measured,
It is limited by the heat resistance of the electrode connection part of the above-mentioned detection element part, and the limit is usually about 150 ° C. Therefore, it was impossible to measure the higher temperature medium.

【0006】[0006]

【課題を解決するための手段】上述の問題点を解決する
ために、本発明の圧力センサでは、上・下ケースで形成
する気密空間内に、耐腐食性、及び耐熱性の優れた圧力
伝達用液状媒体を充満させ、かつ上ケースの圧力導入口
の内壁部分には、外部の被測定圧力媒体の圧力を気密空
間内の圧力伝達用媒体に伝達するための摺動部材を装着
している。
In order to solve the above-mentioned problems, in the pressure sensor of the present invention, pressure transmission excellent in corrosion resistance and heat resistance is carried out in the airtight space formed by the upper and lower cases. A sliding member for filling the liquid medium for use and for transmitting the pressure of the external pressure medium to be measured to the pressure transmitting medium in the airtight space is attached to the inner wall portion of the pressure introducing port of the upper case. .

【0007】[0007]

【作用】図1に示すように、被測定媒体12の圧力P1
は、圧力導入口41の圧力伝達用の摺動部材6に圧力を
印加し、その圧力は、圧力伝達用媒体7に伝達され、最
終的に、検出素子10のシリコン基板のダイヤフラム1
1を変形させて検出素子部のコンデンサ容量の変化とし
て検出される。ここで、圧力伝達用媒体に耐腐食性、耐
熱性に優れた液体を使用することにより、電極接続部分
を腐蝕性の媒体から、また高温の媒体から遮断すること
になり、腐蝕性および高温の被圧力測定媒体の圧力検出
が安定に行える。
As shown in FIG. 1, the pressure P1 of the measured medium 12 is
Applies a pressure to the sliding member 6 for pressure transmission of the pressure introducing port 41, and the pressure is transmitted to the medium 7 for pressure transmission, and finally, the diaphragm 1 of the silicon substrate of the detection element 10 is
1 is deformed and detected as a change in the capacitance of the capacitor of the detection element section. Here, by using a liquid having excellent corrosion resistance and heat resistance as the pressure transmitting medium, the electrode connection portion is shielded from the corrosive medium and from the high temperature medium, and the corrosive and high temperature The pressure of the medium to be pressure-measured can be stably detected.

【0008】[0008]

【実施例】図1に、本発明による半導体圧力センサの1
実施例を示す。検出素子部10は、被測定圧力により変
形するダイヤフラム部11を有するシリコン基板1と、
ダイヤフラム部に対向する面に電極部31が形成された
絶縁基板2とが静電接合によって接合されて形成されて
いる。検出素子部10全体は、接着剤90によって、下
側ケースの下部内壁面に接着されている。上・下ケース
4と5は、超音波溶着等の手段によって接合されてお
り、その気密空間70には圧力伝達用媒体7が充填さ
れ、かつ上ケースの圧力導入口41には圧力伝達用摺動
部材6が装着されており、圧力伝達用媒体7が被測定側
媒体12に漏れるのを防ぐ。
1 shows a semiconductor pressure sensor according to the present invention.
An example will be described. The detection element section 10 includes a silicon substrate 1 having a diaphragm section 11 that is deformed by a measured pressure,
The insulating substrate 2 having the electrode portion 31 formed on the surface facing the diaphragm portion is joined by electrostatic joining. The entire detection element unit 10 is adhered to the lower inner wall surface of the lower case with an adhesive 90. The upper and lower cases 4 and 5 are joined by means such as ultrasonic welding, the airtight space 70 is filled with the pressure transmitting medium 7, and the pressure introducing port 41 of the upper case is provided with a pressure transmitting slide. The moving member 6 is mounted to prevent the pressure transmitting medium 7 from leaking to the medium 12 to be measured.

【0009】圧力検出の原理を図1を使って、以下に説
明する。被測定媒体12(液体、あるいは気体)と、圧
力伝達用摺動部材6の外部先端部とは接触しており、被
測定媒体12の圧力は、圧力伝達用摺動部材6に圧力を
加え、この圧力が圧力伝達用媒体7に伝達され、この圧
力によって、検出素子10のシリコン基板1のダイヤフ
ラム11を変形させ、検出素子の静電容量を変化させ、
この容量変化を後段の処理回路にて検出し、前記被測定
媒体12の圧力を検出する。ここで、圧力伝達用媒体7
は、シリコーンオイル等、検出素子部分の露出している
部分の各材質に影響を与えないような、耐腐食性、耐高
温特性の優れた液状媒体が選択されている。また、圧力
伝達用摺動部材6は、耐腐食性、耐高温特性の優れた金
属材料(ステンレス等)あるいは樹脂材料(PBT、P
DS等)で形成され、上ケース4の圧力導入口41の内
壁で摺動できるように装着されている。
The principle of pressure detection will be described below with reference to FIG. The medium to be measured 12 (liquid or gas) is in contact with the outer tip of the pressure transmitting sliding member 6, and the pressure of the medium to be measured 12 applies pressure to the pressure transmitting sliding member 6. This pressure is transmitted to the pressure transmitting medium 7, and this pressure deforms the diaphragm 11 of the silicon substrate 1 of the detection element 10 to change the capacitance of the detection element,
This change in capacitance is detected by the processing circuit in the subsequent stage, and the pressure of the medium to be measured 12 is detected. Here, the pressure transmitting medium 7
Is selected as a liquid medium having excellent corrosion resistance and high temperature resistance, such as silicone oil, which does not affect the respective materials of the exposed portion of the detection element portion. Further, the pressure transmitting sliding member 6 is made of a metal material (stainless steel or the like) or a resin material (PBT, PBT) having excellent corrosion resistance and high temperature resistance.
It is formed of DS or the like) and is mounted so as to be slidable on the inner wall of the pressure introduction port 41 of the upper case 4.

【0010】[0010]

【発明の効果】以上、本発明によれば、検出素子部を腐
蝕性および高温の被測定媒体から保護することにより、
従来、安定に測定することが不可能であった、腐食性の
気体および液体の安定な圧力検出が可能となり、また、
高温度の気体および液体の圧力についても、安定に検出
できる半導体圧力センサを提供できる。
As described above, according to the present invention, by protecting the detection element portion from the corrosive and high temperature medium to be measured,
Stable pressure detection of corrosive gases and liquids, which was previously impossible to measure stably, is now possible.
It is possible to provide a semiconductor pressure sensor that can stably detect the pressure of high temperature gas and liquid.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による圧力センサの1実施例の構造を示
す断面図。
FIG. 1 is a sectional view showing the structure of an embodiment of a pressure sensor according to the present invention.

【図2】従来の圧力センサの1例の構造を示す断面図。FIG. 2 is a cross-sectional view showing the structure of an example of a conventional pressure sensor.

【図3】検出素子部の外観斜視図。FIG. 3 is an external perspective view of a detection element unit.

【符号の説明】 1 シリコン基板 2 絶縁基板 4 上ケース 5 下ケース 6 摺動部材 7 圧力伝達用媒体 8 リード端子 9 貫通孔 10 検出素子部 11 ダイヤフラム部 12 被測定媒体(液体、気体) 31 電極部 32 (電極部の)端部 33 ボンディングワイヤ 41 圧力導入口 70 気密空間 90 接着剤[Explanation of Codes] 1 Silicon substrate 2 Insulating substrate 4 Upper case 5 Lower case 6 Sliding member 7 Pressure transmitting medium 8 Lead terminal 9 Through hole 10 Detection element section 11 Diaphragm section 12 Medium to be measured (liquid, gas) 31 Electrode Part 32 End part (of electrode part) 33 Bonding wire 41 Pressure inlet 70 Airtight space 90 Adhesive

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ダイヤフラム部を有するシリコン基板と
電極部が形成された絶縁基板とが接合されて構成された
検出素子部と、前記検出素子部を収納するためのケース
とで構成された半導体圧力センサにおいて、前記ケース
で囲まれた気密空間に圧力伝達用の液状の媒体が充填さ
れ、又、前記ケースに設けられた被測定圧力導入口には
圧力伝達用の部材が摺動可能に装着されたことを特徴と
する半導体圧力センサ。
1. A semiconductor pressure device comprising: a detection element portion formed by joining a silicon substrate having a diaphragm portion and an insulating substrate formed with an electrode portion; and a case for housing the detection element portion. In the sensor, a liquid medium for pressure transmission is filled in an airtight space surrounded by the case, and a member for pressure transmission is slidably attached to a measured pressure introduction port provided in the case. A semiconductor pressure sensor characterized in that
【請求項2】 請求項1記載の圧力伝達用の媒体は、耐
腐食性および耐高温特性に優れた液体であることを特徴
とする半導体圧力センサ。
2. The semiconductor pressure sensor according to claim 1, wherein the medium for pressure transmission is a liquid having excellent corrosion resistance and high temperature resistance.
【請求項3】 請求項1記載の圧力伝達用の摺動部材
は、耐腐食性および耐高温特性に優れた材料からなるこ
とを特徴とする半導体圧力センサ。
3. The semiconductor pressure sensor according to claim 1, wherein the sliding member for pressure transmission is made of a material having excellent corrosion resistance and high temperature resistance.
JP6167595A 1995-02-24 1995-02-24 Semiconductor pressure sensor Pending JPH08233670A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6167595A JPH08233670A (en) 1995-02-24 1995-02-24 Semiconductor pressure sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6167595A JPH08233670A (en) 1995-02-24 1995-02-24 Semiconductor pressure sensor

Publications (1)

Publication Number Publication Date
JPH08233670A true JPH08233670A (en) 1996-09-13

Family

ID=13178072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6167595A Pending JPH08233670A (en) 1995-02-24 1995-02-24 Semiconductor pressure sensor

Country Status (1)

Country Link
JP (1) JPH08233670A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018107522A1 (en) * 2016-12-13 2018-06-21 美的集团股份有限公司 Pressure detection device and cooking appliance having same
CN109264663A (en) * 2018-09-27 2019-01-25 中北大学 High-temp pressure sensor rear end encapsulating structure and its packaging method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018107522A1 (en) * 2016-12-13 2018-06-21 美的集团股份有限公司 Pressure detection device and cooking appliance having same
CN109264663A (en) * 2018-09-27 2019-01-25 中北大学 High-temp pressure sensor rear end encapsulating structure and its packaging method
CN109264663B (en) * 2018-09-27 2020-04-24 中北大学 High-temperature pressure sensor rear end packaging structure and packaging method thereof

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