JPH08228056A - Metal base circuit board - Google Patents

Metal base circuit board

Info

Publication number
JPH08228056A
JPH08228056A JP3205595A JP3205595A JPH08228056A JP H08228056 A JPH08228056 A JP H08228056A JP 3205595 A JP3205595 A JP 3205595A JP 3205595 A JP3205595 A JP 3205595A JP H08228056 A JPH08228056 A JP H08228056A
Authority
JP
Japan
Prior art keywords
protrusion
circuit
metal
circuit board
ground circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3205595A
Other languages
Japanese (ja)
Inventor
Yutaka Ogino
裕 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP3205595A priority Critical patent/JPH08228056A/en
Publication of JPH08228056A publication Critical patent/JPH08228056A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate

Abstract

PURPOSE: To reduce contact electric resistance by increasing the area of a contact portion of a crushed protruding member with an upper side of a ground circuit to be greater than the area of a contact portion of a lateral side of the ground circuit with the protrusion. CONSTITUTION: A metal plate 1 is electrically connected with a ground circuit 4 in two ways. On one hand, a part of the ground circuit 4 is pushed out together with a protrusion 5 in forming the protrusion 5, and the other part remains to form a lateral side. The lateral side of the ground circuit 4 contacts the protrusion 5 to form an electric circuit. On the other hand, a part of the metal plate 1 constituting the protrusion 5 is deformed by crushing the protrusion 5 so that the deformed part contacts the surface of the ground circuit 4. The area of the lateral side of the ground circuit 4 is limited by the thickness of the conductor and the size of the protrusion 5. Therefore, by increasing the area of the protrusion 5 crushed for positively using the upper side of the ground circuit, contact electric resistance can be reduced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は電気機器、通信機、自動
車等に用いられる半導体搭載回路基板に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor-mounted circuit board used in electric equipment, communication equipment, automobiles and the like.

【0002】[0002]

【従来の技術】金属ベ−ス回路基板が、その熱放散性に
優れるとの理由から、高密度実装を必要とする分野で使
用されているが、とりわけ金属板にアルミニウムあるい
はアルミニウム合金を用いるものが多用されてきてい
る。
2. Description of the Related Art A metal-based circuit board is used in a field requiring high-density mounting because it is excellent in heat dissipation. Especially, a metal plate using aluminum or aluminum alloy. Has been used a lot.

【0003】金属ベース回路基板においては、高周波に
よる誘導電流が金属板内に発生し、回路基板の電気特性
を悪化させることが知られている。この現象を防ぐため
に、従来から、ア−ス回路と金属板を電気的に接続する
ことが行われてきた。
It is known that, in a metal base circuit board, an induction current due to a high frequency is generated in the metal plate to deteriorate the electrical characteristics of the circuit board. In order to prevent this phenomenon, conventionally, an earth circuit and a metal plate have been electrically connected.

【0004】金属板とアース回路との電気的接続方法と
しては、エンドミル、或いはドリル等の工具を用いて切
削加工により前記金属板の表面に存在する絶縁層を除去
してア−ス接続点を形成し、しかる後に超音波ワイヤ−
ボンデイングを行うか又は導電ペ−ストを塗布すること
が公知である。
As a method for electrically connecting the metal plate and the earth circuit, an insulating layer existing on the surface of the metal plate is removed by cutting with a tool such as an end mill or a drill to form an earth connection point. Form and then ultrasonic wire
It is known to perform bonding or to apply a conductive paste.

【0005】或いは、ア−ス回路の裏面の金属板を裏面
から押し出し突起部の側面と、あるいは、押し出した突
起部を表面から僅かに押し潰して突起部の側面と、銅箔
からなるアース回路とを前記のワイヤーボンディングの
方法や導電ペーストを使用することにより電気的に接続
させていた(実開平1−110495号公報)。
Alternatively, the metal plate on the back surface of the ground circuit is pushed out from the back surface to the side surface of the protruding portion, or the pushed protruding portion is slightly crushed from the surface to the side surface of the protruding portion, and the earth circuit made of copper foil. And were electrically connected by using the above wire bonding method or a conductive paste (Japanese Utility Model Laid-Open No. 11010495).

【0006】しかし、工具を用いる切削加工する方法
は、アルミニウムあるいはアルミニウムを主成分とする
合金が切削しにくい性質を有するので切削速度が遅く、
また、一箇所毎の切削加工となるために、生産効率は極
めて低い欠点がある。
However, the cutting method using a tool has a slow cutting speed because aluminum or an alloy containing aluminum as a main component has a property of being difficult to cut,
In addition, since the cutting process is performed for each location, the production efficiency is extremely low.

【0007】一方、実開平1−110495号公報開示
の方法では、生産効率が高い利点はあるものの、得られ
た金属ベース回路基板を実使用した際に、圧し潰した部
分とアース回路との接触電気抵抗が経時変化により高く
なる欠点があった。この欠点は、特に高温水蒸気に曝さ
れた時や、ヒ−トショック環境下、或いは半田バスによ
る温度履歴を受ける時に顕著になる。
On the other hand, the method disclosed in Japanese Utility Model Laid-Open No. 11010495 has an advantage of high production efficiency, but when the obtained metal base circuit board is actually used, the crushed portion and the ground circuit are brought into contact with each other. There is a drawback that the electric resistance increases with the lapse of time. This drawback becomes remarkable especially when exposed to high temperature steam, under a heat shock environment, or when subjected to a temperature history by a solder bath.

【0008】[0008]

【発明が解決しようとする課題】本発明はかかる問題点
に鑑みてなされたものであって、ア−ス回路の裏面金属
板を裏面から押し出した突起部を表面から圧し潰してア
−ス回路と金属板を電気的に接続させた金属ベ−ス回路
基板に於いて、接触電気抵抗が小さく、しかも、長期間
の実使用においても接触電気抵抗が増大せず、電気的に
信頼性の高い金属ベース回路基板を提供することにあ
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and the rear portion of the metal plate of the earth circuit is extruded from the rear surface. In a metal-based circuit board in which a metal plate and a metal plate are electrically connected, the contact electric resistance is small, and the contact electric resistance does not increase even in actual use for a long period of time, and the electric reliability is high. It is to provide a metal-based circuit board.

【0009】[0009]

【課題を解決するための手段】本発明は、金属板上の少
なくとも一主面に絶縁層を介して金属箔からなるアース
回路を有し、該アース回路下の金属板の一部をアース回
路に対する側から押し出し突起部を形成した後、次にア
ース回路側から該突起部を圧し潰すことでアース回路と
金属板を電気的に接続させた金属ベース回路基板におい
て、潰された突起部とアース回路上面との接触する部分
の面積がアース回路の側面と突起部に接する部分との面
積よりも大きいことを特徴とする金属ベース回路基板で
あり、より具体的には、前記突起部を潰した部分の直径
が該突起部の金属基板内にある部分の直径に対して1.05
倍以上1.5倍以下であることを特徴とする金属ベース回
路基板である。
According to the present invention, there is provided a ground circuit made of metal foil on at least one main surface of a metal plate with an insulating layer interposed therebetween, and a part of the metal plate under the ground circuit is grounded. On the metal base circuit board in which the ground circuit and the metal plate are electrically connected by pressing the projection from the ground circuit side and then crushing it after forming the projection from the The metal base circuit board is characterized in that the area of the portion in contact with the circuit upper surface is larger than the area of the side surface of the ground circuit and the portion in contact with the protrusion, and more specifically, the protrusion is crushed. The diameter of the portion is 1.05 with respect to the diameter of the portion inside the metal substrate of the protrusion.
It is a metal-based circuit board characterized by being more than twice and less than 1.5 times.

【0010】又、本発明は、金属板が、引張強さ試験に
おける破断時の伸びが5%以上のアルミニウム又はアル
ミニウムを主成分とする合金であることを特徴とする金
属ベース回路基板であり、前記金属箔の少なくとも潰さ
れた突起部との接触部分の表面について、その表面粗さ
が0.5μm以上2.5μm以下(Rz)である金属ベース回
路基板、或いは、前記金属箔が、少なくも潰された突起
部との接触部分において、CuにNiを積層した複合箔
又はCuにAlを積層した複合箔であることを特徴とす
る金属ベース回路基板である。
Further, the present invention is a metal base circuit board, wherein the metal plate is aluminum or an alloy containing aluminum as a main component and having an elongation at break of 5% or more in a tensile strength test, A metal base circuit board having a surface roughness of 0.5 μm or more and 2.5 μm or less (Rz) on at least the surface of the contact portion of the metal foil with the crushed protrusion, or the metal foil is crushed at least. The metal-based circuit board is characterized in that it is a composite foil in which Ni is laminated on Cu or a composite foil in which Al is laminated on Cu at the contact portion with the protruding portion.

【0011】以下、本発明について図を用いて詳細に説
明する。
The present invention will be described in detail below with reference to the drawings.

【0012】図1は、本発明の金属ベ−ス回路基板の一
例を示す模式図である。(a)〜(d)は、多数個配置
での加工の工程を順次示したもので、(a)は加工前の
平面図、(b)は加工前の断面図であり、(c)はアー
ス回路の裏側から突起物を押し出した状況を、(d)
は、更に、表側より突起物を圧し潰した状況を示してい
る。又、(e)は、(a)平面図内の点線で区分された
回路個片の拡大図であり、(f)は、一つの回路個片の
拡大断面図であり、(g)は、圧し潰した突起部を更に
拡大図示したものである。
FIG. 1 is a schematic view showing an example of a metal-based circuit board of the present invention. (A)-(d) shows sequentially the process of processing in many pieces arrangement | positioning, (a) is a top view before processing, (b) is a sectional view before processing, (c) is (c). When the protrusion is pushed out from the back side of the ground circuit, (d)
Further, shows a situation in which the protrusion is pressed and crushed from the front side. Further, (e) is an enlarged view of a circuit piece sectioned by a dotted line in (a) plan view, (f) is an enlarged sectional view of one circuit piece, and (g) is The crushed protrusion is further enlarged and illustrated.

【0013】図1(g)に例示されているように、金属
板板1とアース回路4との電気的な接続は2つの経路を
経て行われる。経路の一つは、アース回路4の側面部で
ある。即ち、突起部5を形成する時に、アース回路4の
一部は突起部5とともに押し出され、他の部分はそのま
ま残り、側面部が形成される。このアース回路4の側面
部は、すぐに金属板と同一材質の突起部5と接し、電気
的な経路を形成する。経路の他の一つは突起部5を圧し
潰すことで突起部5を構成している金属板1の一部が変
形されてアース回路4の表面と接する部分である。
As illustrated in FIG. 1 (g), the electrical connection between the metal plate 1 and the earth circuit 4 is made via two paths. One of the paths is a side surface portion of the ground circuit 4. That is, when the protrusion 5 is formed, a part of the ground circuit 4 is extruded together with the protrusion 5, and the other part is left as it is to form the side surface. The side surface of the ground circuit 4 immediately contacts the protrusion 5 made of the same material as the metal plate to form an electrical path. The other one of the paths is a portion in which a portion of the metal plate 1 forming the protrusion 5 is deformed by pressing and crushing the protrusion 5 and comes into contact with the surface of the ground circuit 4.

【0014】本発明者は、アース回路5の側面部の面積
がアース回路4を構成する導体の厚みと突起部5の大き
さでほぼ決定されるので充分に広い面積を確保すること
には限界があるのに対し、アース回路の上面を電気的接
続部に積極的に用いる時、格段に広い接触面積を確保で
き、電気抵抗が小さくしかも安定な電気的接続が容易に
達成できるという知見を得て、本発明に至ったものであ
る。
Since the area of the side surface portion of the earth circuit 5 is substantially determined by the thickness of the conductor forming the earth circuit 4 and the size of the protrusion 5, the inventor has a limit in securing a sufficiently large area. On the other hand, when the upper surface of the earth circuit is positively used for the electrical connection part, it is possible to secure a remarkably large contact area, and it is easy to achieve stable electrical connection with low electrical resistance. As a result, the present invention has been achieved.

【0015】本発明では、潰された突起部5とアース回
路4の上面とが接触する部分の面積がアース回路4の側
面と突起部5とが接する部分の面積よりも大きいことが
必須である。突起部5とアース回路4の上面とが接触す
る部分の面積が小さい場合には、金属板1とアース回路
4との電気抵抗を低減する効果は生じるとしても、全体
の電気抵抗を充分に低減させるまでには至らない。全体
の電気抵抗を充分に低下させ、しかも安定した電気接続
状況を確保するためには、潰された突起部5とアース回
路4の上面とが接触する部分の面積がアース回路4の側
面と突起部5とが接する部分の面積よりも大きくなけれ
ばならない。
In the present invention, it is essential that the area of the contact between the crushed protrusion 5 and the upper surface of the earth circuit 4 is larger than the area of the contact between the side surface of the earth circuit 4 and the protrusion 5. . If the area of the contact portion between the projection 5 and the upper surface of the ground circuit 4 is small, the electrical resistance between the metal plate 1 and the ground circuit 4 may be reduced, but the overall electrical resistance is sufficiently reduced. I can't get it to happen. In order to sufficiently reduce the electric resistance of the whole and to secure a stable electric connection state, the area of the contact portion between the crushed protrusion 5 and the upper surface of the earth circuit 4 is the side surface of the earth circuit 4 and the protrusion. It must be larger than the area of the part in contact with the part 5.

【0016】突起部5の潰れた部分の直径は、該突起部
5の金属板1内にある部分の直径に対して1.05倍以上で
あることが必要であり、1.10倍以上であることが好まし
い。
The diameter of the crushed portion of the protrusion 5 must be 1.05 times or more, and preferably 1.10 times or more, the diameter of the portion of the protrusion 5 inside the metal plate 1. .

【0017】突起部5の形状は、それを押し出す金型の
形状により決定されるが、一般的には、直径2mm程度
の円柱形状のものが多い。この突起部と電気的接続を行
おうとしているアース回路4の一般的な厚みは35μm程
度である。従って、突起部5とアース回路4の側面部と
の接触する面積は、2×π×35×10-3(=0.22)mm2の程
度の大きさである。一方、突起部5の潰される前の直径
は、突起部5の金属板1内にある部分と一致し、その大
きさは2×2×π/4(=3.14)mm2の程度である。
The shape of the protruding portion 5 is determined by the shape of the die for pushing it out, but in general, it is often a cylindrical shape having a diameter of about 2 mm. The general thickness of the earth circuit 4 which is to be electrically connected to the protrusion is about 35 μm. Therefore, the contact area between the protrusion 5 and the side surface of the ground circuit 4 is about 2 × π × 35 × 10 −3 (= 0.22) mm 2 . On the other hand, the diameter of the protrusion 5 before being crushed matches the portion of the protrusion 5 inside the metal plate 1, and the size thereof is about 2 × 2 × π / 4 (= 3.14) mm 2 .

【0018】前記突起部5の潰れた部分の直径が、該突
起部5の金属板1内にある部分の直径に対し1.05倍未満
では、潰された突起部5とアース回路4の上面に接する
部分の面積が、アース回路4の側面部と接する部分の面
積よりも必ずしも大きく出来ない。従って、突起部5の
潰れた部分の直径は、該突起部5の金属板1内にある部
分の直径に対して1.05倍以上であることが必要であり、
1.10倍以上であれば充分に安定な電気的接触状態を得る
ことができ好ましい。
When the diameter of the crushed portion of the protrusion 5 is less than 1.05 times the diameter of the portion of the protrusion 5 inside the metal plate 1, the crushed protrusion 5 and the upper surface of the ground circuit 4 are in contact with each other. The area of the portion cannot necessarily be larger than the area of the portion in contact with the side surface portion of the earth circuit 4. Therefore, the diameter of the crushed portion of the protrusion 5 needs to be 1.05 times or more the diameter of the portion of the protrusion 5 inside the metal plate 1.
If it is 1.10 times or more, a sufficiently stable electrical contact state can be obtained, which is preferable.

【0019】一方、突起部5の潰れた部分の直径が、該
突起部5の金属板1内にある部分の直径に対して1.5倍
を越える場合には、突起部5を潰す操作において、金属
板1が変形したり、アース回路4の周囲の他の回路を損
傷したりし易くなる等の問題が発生し、実用的でない。
又、圧し潰した後の突起部の高さは実装段階で組立作業
に支障がないように、一般的には0.8〜1.2mm程度とな
るように調整することが望ましい。
On the other hand, when the diameter of the crushed portion of the protrusion 5 exceeds 1.5 times the diameter of the portion of the protrusion 5 inside the metal plate 1, the metal is This is not practical because problems such as deformation of the plate 1 and damage to other circuits around the earth circuit 4 occur.
Further, it is desirable to adjust the height of the protrusions after crushing so that it is generally about 0.8 to 1.2 mm so as not to hinder the assembly work at the mounting stage.

【0020】突起部5の形状は、プレス金型ポンチ断面
形状によって決まるもので円形、正方形、長方形その他
の多角形であってもなんら差し支えなく、任意に選定で
きるし、また、突起部5を形成する位置は、ア−ス回路
4と接続できる範囲内であればいずれでもよく、好まし
くはア−ス回路4の一部を押し出してア−ス接続用突起
部5を形成させると良好なア−ス接続性が得られる。
The shape of the projecting portion 5 is determined by the cross-sectional shape of the punch of the press die, and may be circular, square, rectangular or any other polygonal shape, and can be arbitrarily selected, and the projecting portion 5 is formed. Any position may be used as long as it can be connected to the ground circuit 4, and it is preferable that a part of the ground circuit 4 is extruded to form the ground connection projection 5. Connectivity is obtained.

【0021】金属板1は、アルミニウム又はアルミニウ
ムを主成分とする合金が用いられる。アルミニウム及び
アルミニウムを主成分とする合金は、その化学組成と熱
処理条件により多種類のものが入手可能であるが、本発
明では、引っ張り試験(JIS H4000)実施時の破断時伸び
が5%以上有する塑性変形能に優れるものが好ましい。
引っ張り試験実施時の破断時伸びが5%未満のアルミニ
ウム又はアルミニウムを主成分とする合金を用いた場合
には、突起部5を圧し潰す際に、突起部5の一部が容易
に変形せずに、結果的に、突起部5を潰した部分の直径
が該突起部の金属基板内にある部分の1.1倍以上にする
ことが出来なかったり、かりに達成することができても
金型の消耗が激しい等の問題があるからである。尚、金
属板1の厚みは、通常1.0mmから5.0mmの範囲のもの
を用いることができる。
The metal plate 1 is made of aluminum or an alloy containing aluminum as a main component. Although various kinds of aluminum and alloys containing aluminum as a main component are available depending on their chemical composition and heat treatment conditions, the present invention has an elongation at break of 5% or more when a tensile test (JIS H4000) is carried out. Those having excellent plastic deformability are preferable.
When aluminum or an alloy containing aluminum as a main component, which has an elongation at break of less than 5% when a tensile test is performed, part of the protrusion 5 is not easily deformed when the protrusion 5 is crushed. As a result, the diameter of the crushed portion of the protrusion 5 cannot be 1.1 times or more that of the portion of the protrusion 5 in the metal substrate, or even if it can be achieved, the wear of the mold is reduced. Because there are problems such as severe. The thickness of the metal plate 1 can be normally 1.0 mm to 5.0 mm.

【0022】アース回路4の表面粗さは、突起部5と電
気的に接するので適当な粗さの範囲を持つことが重要で
あり、本発明者らの検討結果、Rz(JIS B0601)で0.5μ
m以上2.5μm以下であることが好ましい。0.5μm未満
でも、或いは、2.5μmを越えるいずれかの場合でも電
気的接触状況が良くなく、結果として、当初目的を達成
できない。
It is important that the surface roughness of the earth circuit 4 has an appropriate range of roughness because it makes electrical contact with the protrusion 5, and as a result of the study by the present inventors, it is 0.5 in Rz (JIS B0601). μ
It is preferably at least m and not more than 2.5 μm. If it is less than 0.5 μm or more than 2.5 μm, the electrical contact condition is not good, and as a result, the initial purpose cannot be achieved.

【0023】アース回路4には、銅箔、アルミニウム
箔、ニッケル箔等の金属箔を単独、或いは接合したも
の、さらには、表面に金めっき等のめっきを施したもの
を用いることができる。このうち、突起部5を構成する
アルミニウム或いはアルミニウムを主成分とする合金と
の接合のし易さから、表面が銅、アルミニウム、ニッケ
ルの場合が好ましい。
For the ground circuit 4, a metal foil such as a copper foil, an aluminum foil, or a nickel foil may be used alone or bonded, and further, a surface of which is plated with gold or the like may be used. Of these, the case where the surface is copper, aluminum, or nickel is preferable in terms of easiness of bonding with aluminum or an alloy containing aluminum as a main component that constitutes the protrusion 5.

【0024】導電回路3となる導電性金属箔は銅箔、ア
ルミニウム箔、ニッケル箔、等の箔を単独、あるいは接
合したもの、表面にニッケルめっき、金めっきをしたも
の等のいずれも採用できる。
The conductive metal foil to be the conductive circuit 3 may be a copper foil, an aluminum foil, a nickel foil or the like, which may be used alone or in combination, or may have a nickel-plated or gold-plated surface.

【0025】絶縁層2としては、絶縁性を有する材質で
あればいずれも採用でき、例えばエポキシ樹脂、フエノ
−ル樹脂、不飽和ポリエステル樹脂、ポリイミド樹脂等
をガラス布に含浸させたもの、無機フイラ−を充填した
もの、樹脂層のみで形成したもの、フイルム状に接着し
たものなどがある。
As the insulating layer 2, any material having an insulating property can be used. For example, an epoxy resin, a phenol resin, an unsaturated polyester resin, a polyimide resin or the like impregnated in a glass cloth, an inorganic filler. There are those filled with −, those formed only with a resin layer, those adhered in a film shape, and the like.

【0026】[0026]

【実施例】本発明を実施例をもって更に詳細に説明す
る。 (実施例1)板厚1.5mmのアルミニウム板(JIS H400
0、A1050P-H24;引っ張り試験時破断時の伸び20%)を準
備し、これに厚さ80μmの酸化アルミニウム含有エポキ
シ樹脂を絶縁層として用い、35μmの銅箔を接着し、エ
ッチング処理して導電回路及びアース回路を形成した。
このアース回路を形成しているCu表面の粗さは、Rz
で2.3μmであった。ついでアース回路のある部分のア
ルミニウム板の裏面から直径2.0mmのプレス金型で高
さ0.75mmだけ押し出し、ア−ス接続用の突起部を形成
した。そして、ア−ス接続用の突起部を表面からプレス
金型で直径3.0mmまで圧し潰し、ア−ス回路とアルミ
ニウム板を電気的に接続した。
EXAMPLES The present invention will be described in more detail with reference to Examples. (Example 1) Aluminum plate having a thickness of 1.5 mm (JIS H400
0, A1050P-H24; elongation at break during tensile test 20%) is prepared, and an aluminum oxide-containing epoxy resin with a thickness of 80 μm is used as an insulating layer, and a copper foil with a thickness of 35 μm is adhered to it and then conductive by etching. A circuit and a ground circuit were formed.
The roughness of the Cu surface forming this earth circuit is Rz
Was 2.3 μm. Then, a height of 0.75 mm was extruded from the back surface of the aluminum plate at the portion where the earth circuit was provided by a press die having a diameter of 2.0 mm to form a protrusion for ground connection. Then, the protrusion for connecting the earth was crushed from the surface by a press die to a diameter of 3.0 mm, and the earth circuit and the aluminum plate were electrically connected.

【0027】このようにして得られた金属ベ−ス回路基
板に関して、ア−ス回路と金属基板との間の接触抵抗を
以下の方法で、高温環境下に曝したり、ヒートショック
を加えた後、更に半田バスにて加熱した後ついて評価し
た。結果は、表1に示すように、高温環境下に於いて
も、又ヒートショック後においても、更に半田バス加熱
後においても抵抗値の上昇は無く、良好であった。
With respect to the metal base circuit board thus obtained, after the contact resistance between the ground circuit and the metal board was exposed to a high temperature environment or a heat shock was applied by the following method. After further heating in a solder bath, evaluation was performed. The results were good, as shown in Table 1, with no increase in resistance value even under high temperature environment, after heat shock, and further after heating the solder bath.

【0028】<接触抵抗の測定方法>図2に、概略接続
図にて示したように、ア−ス接続用の突起部の縁から3
mm離れた位置のア−ス回路と裏面金属板(アルミニウ
ム又はアルミニウム合金)の間を抵抗測定器(A&D
社、AD−58111 DIGITAL LOW OH
MMETER)のレンジ200mΩ及び2Ωで測定す
る。
<Method of measuring contact resistance> As shown in the schematic connection diagram of FIG. 2, 3 from the edge of the protrusion for ground connection.
A resistance measuring device (A & D) between the ground circuit and the back metal plate (aluminum or aluminum alloy) at a distance of mm.
, AD-58111 DIGITAL LOW OH
MMETER) range of 200 mΩ and 2 Ω.

【0029】(実施例2)圧し潰し後の直径を2.4mm
まで圧し潰したこと以外は、実施例1と同一の操作で金
属ベース回路基板を得た。この金属ベース回路基板につ
いて、実施例1と同じくアース回路と金属板との間の接
触抵抗を評価した。結果は、表1に示すように、高温環
境下に於いても、ヒートショック後においても、又、半
田バス加熱後においても抵抗値の上昇は無く、良好であ
った。
Example 2 The diameter after crushing is 2.4 mm.
A metal base circuit board was obtained by the same operation as in Example 1 except that the metal base circuit board was crushed. For this metal base circuit board, the contact resistance between the ground circuit and the metal plate was evaluated as in Example 1. The results were good, as shown in Table 1, with no increase in resistance value even under high temperature environment, after heat shock, and after heating the solder bath.

【0030】(実施例3)板厚1.5mmのアルミニウム
合金板(JIS H4000、A5052P-H34;引っ張り試験時破断時
の伸び13%)を準備し、これに厚さ80μmの酸化アルミ
ニウム含有エポキシ樹脂を絶縁層として用い、35μmの
銅箔を接着し、エッチング処理して導電回路及びアース
回路を形成した。ついでアース回路のある部分のアルミ
ニウム板の裏面から直径2.0mmのプレス金型で高さ0.7
5mmだけ押し出し、ア−ス接続用の突起部を形成し
た。そして、ア−ス接続用の突起部を表面からプレス金
型で直径2.2mmまで圧し潰し、ア−ス回路とアルミニ
ウム板を電気的に接続した。このようにして得られた金
属ベ−ス回路基板に関して、実施例1と同じ評価をした
結果、表1に示すように、高温環境下に於いても、ヒー
トショック後においても、又半田バス加熱後においても
抵抗値の上昇は無く、良好であった。
(Example 3) An aluminum alloy plate having a thickness of 1.5 mm (JIS H4000, A5052P-H34; elongation at break at a tensile test of 13%) was prepared, and an epoxy resin containing aluminum oxide having a thickness of 80 μm was prepared. Using as an insulating layer, a copper foil of 35 μm was adhered and etched to form a conductive circuit and a ground circuit. Then, from the back surface of the aluminum plate where the earth circuit is located, use a press die with a diameter of 2.0 mm to achieve a height of 0.7.
Only 5 mm was extruded to form a protrusion for connecting the ground. Then, the protrusion for earth connection was crushed from the surface by a press die to a diameter of 2.2 mm and crushed to electrically connect the earth circuit and the aluminum plate. The metal-based circuit board thus obtained was evaluated in the same manner as in Example 1. As a result, as shown in Table 1, the solder bath heating was performed both in a high temperature environment and after heat shock. There was no increase in the resistance value after that, which was good.

【0031】(実施例4)銅箔に替えて、厚み10μmの
Alを積層した銅箔(全体の厚みが35μm)を用いたこと
以外は、実施例3の操作により金属ベース回路基板を得
た。尚、突起部を押し出す工程の直前において、アース
回路の表面のアルミニウムの表面粗さはRzで、0.6μ
mであった。この金属ベース回路基板について、実施例
1と同じ評価をした結果、表1に示すように、高温環境
下に於いても、ヒートショック後においても、又半田バ
ス加熱後においても抵抗値の上昇は無く、良好であっ
た。
Example 4 A metal base circuit board was obtained by the operation of Example 3 except that a 10 μm thick Al laminated copper foil (total thickness of 35 μm) was used in place of the copper foil. . Immediately before the step of extruding the protruding portion, the surface roughness of aluminum on the surface of the ground circuit is Rz, 0.6 μ.
It was m. This metal base circuit board was evaluated in the same manner as in Example 1. As a result, as shown in Table 1, the resistance value did not rise even under a high temperature environment, after a heat shock, or after heating the solder bath. None was good.

【0032】(実施例5)実施例1において、突起部を
圧し潰した後の直径を2.1mmとしたこと以外は、実施
例1と同一の操作をして得た金属ベース回路基板につい
て、実施例1と同じ評価をした。その結果、表1に示す
ように、高温環境下に於いても、ヒートショック後にお
いても、又半田バス加熱後においても抵抗値の上昇は無
く、良好であった。
(Embodiment 5) A metal base circuit board obtained in the same manner as in Embodiment 1 except that the diameter after the projections are pressed and crushed is 2.1 mm. The same evaluation as in Example 1 was made. As a result, as shown in Table 1, there was no increase in the resistance value even in a high temperature environment, after heat shock, and after heating the solder bath, which was good.

【0033】(比較例1)実施例1において、突起部を
圧し潰した後の直径を2.06mmとしたこと以外は、実施
例1と同一の操作をして得た金属ベース回路基板につい
て、実施例1と同じ評価をした。その結果、表1に示す
ように、高温環境下、ヒートショック後、更に半田バス
加熱後の抵抗値が著しく上昇していた。
Comparative Example 1 A metal base circuit board obtained in the same manner as in Example 1 except that the diameter of the protrusion after crushing was 2.06 mm. The same evaluation as in Example 1 was made. As a result, as shown in Table 1, the resistance value after the heat shock in the high temperature environment and further after the solder bath heating was significantly increased.

【0034】[0034]

【表1】 [Table 1]

【0035】[0035]

【発明の効果】本発明の金属ベース回路基板は、接触抵
抗が低く、しかも経時変化が少ない高信頼性のア−ス接
続が実現されるので、接触抵抗が経時上昇して電子回路
が正常に機能しないという欠点が解消され、高温下でも
安定した電子回路の機能が得られる。
The metal base circuit board of the present invention realizes a highly reliable ground connection which has a low contact resistance and a small change with time, so that the contact resistance rises with time and the electronic circuit operates normally. The defect that it does not work is solved, and stable electronic circuit functions can be obtained even at high temperatures.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の金属ベ−ス回路基板の一例を示す模式
図である。(a)〜(d)は、本発明になる多数個配置
での加工の工程を順次示したもので、(a)は加工前の
平面図、(b)は加工前の断面図、(c)はアース回路
の裏側から突起物を押し出した状況を、(d)は、更
に、表側より突起物を圧し潰した状況を示している。
又、(e)は、(a)平面図内の点線で区分された回路
個片の拡大図、(f)は、個片に分割拡大した断面図、
(g)は、圧し潰した突起物の部分を更に拡大図示した
図である。
FIG. 1 is a schematic view showing an example of a metal-based circuit board of the present invention. (A)-(d) shows sequentially the process of the process by many arrangement | positioning which becomes this invention, (a) is a top view before process, (b) is sectional drawing before process, (c). ) Shows a situation in which the protrusion is pushed out from the back side of the ground circuit, and (d) shows a situation in which the protrusion is further pressed and crushed from the front side.
Further, (e) is an enlarged view of a circuit piece sectioned by a dotted line in the (a) plan view, and (f) is a sectional view in which the circuit piece is divided and enlarged.
(G) is the figure which expanded and illustrated the part of the protrusion which was crushed.

【図2】ア−ス回路と金属基板との間の接触抵抗を測定
する概略接続図
FIG. 2 is a schematic connection diagram for measuring a contact resistance between an earth circuit and a metal substrate.

【符号の説明】[Explanation of symbols]

1 :金属板 2 :絶縁層 3 :導電回路 4 :ア−ス回路 5 :ア−ス接続用の突起部 7 :抵抗測定器 8 :測定プロ−ブ 1: Metal plate 2: Insulating layer 3: Conductive circuit 4: Earth circuit 5: Projection for earth connection 7: Resistance measuring device 8: Measurement probe

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】金属板上の少なくとも一主面に絶縁層を介
して金属箔からなるアース回路を有し、該アース回路下
の金属板の一部をアース回路に対する側から押し出し突
起部を形成した後、次にアース回路側から該突起部を潰
すことでアース回路と金属板を電気的に接続させた金属
ベース回路基板において、潰された突起部とアース回路
上面とが接触する部分の面積がアース回路の側面と突起
部とが接する部分の面積よりも大きいことを特徴とする
金属ベース回路基板。
1. A grounding circuit made of metal foil is provided on at least one main surface of a metal plate via an insulating layer, and a part of the metal plate under the grounding circuit is extruded from the side with respect to the grounding circuit to form a protrusion. Then, in the metal base circuit board in which the ground circuit and the metal plate are electrically connected by crushing the protrusion from the ground circuit side, the area of the portion where the crushed protrusion and the upper surface of the ground circuit contact each other. Is larger than the area of the portion where the side surface of the ground circuit and the protrusion contact each other.
【請求項2】前記突起部を潰した部分の直径が該突起部
の金属板内にある部分の直径に対して1.05倍以上1.5倍
以下であることを特徴とする請求項1記載の金属ベース
回路基板。
2. The metal base according to claim 1, wherein the diameter of the portion where the protrusion is crushed is 1.05 times or more and 1.5 times or less the diameter of the portion of the protrusion that is inside the metal plate. Circuit board.
【請求項3】前記金属板が、引張強さ試験における破断
時の伸びが5%以上のアルミニウム又はアルミニウムを
主成分とする合金であることを特徴とする請求項1記載
の金属ベース回路基板。
3. The metal-based circuit board according to claim 1, wherein the metal plate is aluminum or an alloy containing aluminum as a main component, which has an elongation at break of 5% or more in a tensile strength test.
【請求項4】前記アース回路の少なくとも潰された突起
部との接触部分となる表面について、該表面の粗さが0.
5μm以上2.5μm以下(Rz)であることを特徴とする
請求項1記載の金属ベース回路基板。
4. The roughness of the surface of the surface of the ground circuit, which is the contact portion with at least the crushed protrusion, is 0.
The metal base circuit board according to claim 1, wherein the metal base circuit board has a thickness of 5 μm or more and 2.5 μm or less (Rz).
【請求項5】前記アース回路が、少なくも潰された突起
部と接触する部分において、CuにNiを積層した複合
箔又はCuにAlを積層した複合箔からなることを特徴
とする請求項4記載の金属ベース回路基板。
5. The ground circuit is made of a composite foil in which Ni is laminated on Cu or a composite foil in which Al is laminated on Cu, at least at a portion contacting the crushed protrusion. The metal-based circuit board described.
JP3205595A 1995-02-21 1995-02-21 Metal base circuit board Pending JPH08228056A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3205595A JPH08228056A (en) 1995-02-21 1995-02-21 Metal base circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3205595A JPH08228056A (en) 1995-02-21 1995-02-21 Metal base circuit board

Publications (1)

Publication Number Publication Date
JPH08228056A true JPH08228056A (en) 1996-09-03

Family

ID=12348195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3205595A Pending JPH08228056A (en) 1995-02-21 1995-02-21 Metal base circuit board

Country Status (1)

Country Link
JP (1) JPH08228056A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1395100A1 (en) * 2002-08-29 2004-03-03 Ascom AG Process for treating and manufacturing of circuit boards and such a circuit board
WO2004027866A2 (en) * 2002-09-23 2004-04-01 Johnson Controls Technology Company Method for creating a link in an integrated metal substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373594A (en) * 1989-08-15 1991-03-28 Denki Kagaku Kogyo Kk Metal plate base circuit board and manufacture thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373594A (en) * 1989-08-15 1991-03-28 Denki Kagaku Kogyo Kk Metal plate base circuit board and manufacture thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1395100A1 (en) * 2002-08-29 2004-03-03 Ascom AG Process for treating and manufacturing of circuit boards and such a circuit board
WO2004027866A2 (en) * 2002-09-23 2004-04-01 Johnson Controls Technology Company Method for creating a link in an integrated metal substrate
WO2004027866A3 (en) * 2002-09-23 2004-08-19 Johnson Controls Tech Co Method for creating a link in an integrated metal substrate

Similar Documents

Publication Publication Date Title
DE4017697C2 (en) Electronic component, process for its production and use
US6204065B1 (en) Conduction assist member and manufacturing method of the same
EP1132961A1 (en) Circuit substrate for mounting a semiconductor element
JPH0737942A (en) Connector for inspection and its manufacture
WO1991011823A1 (en) Lead and socket structures with reduced self-inductance
JP2000174399A (en) Stereoscopic wiring board, its manufacture and insulating material for board
US6847116B2 (en) Chip-type semiconductor light-emitting device
JPH0846116A (en) Lead frame and its manufacture
JPH053052A (en) Detachable package
US20210084763A1 (en) Methods of manufacturing circuit substrate and component-mounted substrate
JPH08228056A (en) Metal base circuit board
KR910002453B1 (en) Bonding process
JP3724061B2 (en) Metal substrate and manufacturing method thereof
JP2640780B2 (en) Interlayer connection method for metal substrates
EP1336993B1 (en) Assembly structure for electronic power integrated circuit formed on a semiconductor die and corresponding manufacturing process
JP5376540B2 (en) Lead frame and semiconductor device
JPH11284335A (en) Metal-based circuit board and manufacture thereof
JP2640009B2 (en) Interlayer connection method for metal substrates
CN101990791A (en) Printed circuit board and method of manufacturing the same
JP3889710B2 (en) Hybrid integrated circuit device
JP2007294932A (en) Metal core printed wiring board and its manufacturing method
JPH0373594A (en) Metal plate base circuit board and manufacture thereof
JP3401891B2 (en) Lead frame manufacturing method
JPS5828379Y2 (en) printed wiring board
JPH03142862A (en) Lead frame