JPH08227676A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- JPH08227676A JPH08227676A JP7032125A JP3212595A JPH08227676A JP H08227676 A JPH08227676 A JP H08227676A JP 7032125 A JP7032125 A JP 7032125A JP 3212595 A JP3212595 A JP 3212595A JP H08227676 A JPH08227676 A JP H08227676A
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- electrode
- electrodes
- divided
- insulating spacer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 claims abstract description 64
- 125000006850 spacer group Chemical group 0.000 claims abstract description 27
- 230000001133 acceleration Effects 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 239000006091 Macor Substances 0.000 claims description 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 abstract description 20
- 239000007789 gas Substances 0.000 abstract description 5
- 238000009413 insulation Methods 0.000 abstract description 5
- 238000000605 extraction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はイオン源に係り、特にイ
オンを引き出すための少なくとも２個重ね配置されか
つ、複数個に分割されたイオン源電極を有するイオン源
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion source, and more particularly to an ion source having at least two ion source electrodes which are arranged in a stacked manner and which are divided into a plurality of portions for extracting ions.
【０００２】[0002]
【従来の技術】従来から既に知られているイオン源電極
の大形化，大口径化に関する施策としては特公平５−７
４９０１号公報に記載の如く、２個以上にイオン源電極
を分割する方式が知られている。2. Description of the Related Art As a measure for increasing the size and diameter of an ion source electrode, which has been already known, Japanese Patent Publication No. 5-7
As described in Japanese Patent No. 4901, a method of dividing an ion source electrode into two or more is known.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、イオン
源電極の基本構成における詳細構造など大形化（大口径
化）への対応については、その電極の組合せ構造や熱影
響の排除などの点について配慮が欠けていた。特に、大
形化（大口径化）に伴なうフイラメントやアーク電源よ
りイオン源電極に供給される輻射熱と、それに伴ない生
ずる温度上昇と、イオン源電極が受ける熱変形によりイ
オンビーム引き出し電流が不均一になり、また電極間絶
縁スペーサのスパッタ物付着（汚損）による絶縁低下を
生じる等の問題があった。However, in order to cope with the large size (large diameter) such as the detailed structure of the basic structure of the ion source electrode, consideration should be given to the combination structure of the electrodes and the elimination of heat influence. Was missing. In particular, the radiation heat that is supplied to the ion source electrode from the filament and arc power sources that accompanies the larger size (larger diameter), the temperature rise that accompanies it, and the thermal deformation that the ion source electrode experiences There are problems such as non-uniformity and deterioration of insulation due to adhesion (contamination) of sputtered matter on the inter-electrode insulating spacer.
【０００４】本発明はこのような事情に鑑みてなされた
ものであり、均一で安定なイオンビーム電流の引き出し
を可能にする大口径のイオン源電極を有するイオン源を
提供することを目的とする。The present invention has been made in view of the above circumstances, and an object thereof is to provide an ion source having a large-diameter ion source electrode that enables uniform and stable extraction of an ion beam current. .
【０００５】[0005]
【課題を解決するための手段】本発明に係るイオン源電
極は、上記目的を達成するため、イオン源電極の分割さ
れた各ブロック間に形成されるギャップを、２個重ね配
置された加速，減速の両面側より十文字形の押え金具を
配置し、ふさぐことにより、イオン源電極の各ブロック
の熱変形を、一定方向に押えることができ達成できる。
また各ブロック毎に構成された２個重ね配置された、加
速，減速中央部（組合せた電極の中心部）の両電極を絶
縁スペーサで連結することにより、両電極のビーム引き
出し部の熱変形に伴なう位置ずれを防止し、本発明の目
的を達成することができる。In order to achieve the above-mentioned object, an ion source electrode according to the present invention has an acceleration in which two gaps formed between each divided block of the ion source electrode are overlapped with each other. By arranging and closing the cross-shaped holding metal fittings from both sides of the deceleration, the thermal deformation of each block of the ion source electrode can be held in a fixed direction and can be achieved.
In addition, by connecting two electrodes of the acceleration and deceleration center part (center part of the combined electrode), which are arranged in a stack for each block, with an insulating spacer, thermal deformation of the beam extraction part of both electrodes can be achieved. It is possible to prevent the positional displacement that accompanies it and achieve the object of the present invention.
【０００６】[0006]
【作用】この目的を達成するため、イオン源電極は、少
なくとも２個以上に分割されて個々の温度上昇、熱変形
を独立させるブロック化した電極構造とする。In order to achieve this object, the ion source electrode has a blocked electrode structure which is divided into at least two or more pieces so that each temperature rise and thermal deformation are independent.
【０００７】ブロック化された電極のブロック間に形成
されるギャップから、加速電極・減速電極間に電圧が印
加するためイオンビームは引き出される。Since a voltage is applied between the acceleration electrode and the deceleration electrode from the gap formed between the blocks of the blocked electrodes, the ion beam is extracted.
【０００８】しかし、このブロック化した個々の電極は
その電極毎に入射熱の影響により任意に変形する。この
ためブロック間に形成されるギャップ部のビームは各ブ
ロック毎に引き出されるビームと異なり方向の定まらぬ
イオンビームとなり、このイオン源を用いたイオンビー
ム加工装置の加工精度に悪影響を及ぼす。However, each of the blocked electrodes is arbitrarily deformed due to the effect of incident heat. Therefore, the beam in the gap formed between the blocks becomes an ion beam whose direction is different from the beam extracted for each block, which adversely affects the processing accuracy of the ion beam processing apparatus using this ion source.
【０００９】このため本発明では上記ブロック間に形成
されるギャップを加速電極、減速電極の双方の側より十
文字形の押え金具で塞ぎ、悪影響を及ぼすイオンビーム
の射出を防止するようにしたこの押え金具は各ブロック
の２枚の重ね合わせた電極の変形も一様の方向に保持さ
せる働きをしてイオンビームの方向性を決定づける。ま
たイオン源電極中央部に設置された２枚の電極間に設け
られた絶縁スペーサ１３は上記電極の２枚の重ね合され
た電極の引き出し孔が常時、一定になるように保持され
るため、２枚の電極の輻射熱による温度差が生じても、
引き出し孔の位置がずれることはない。このため均一で
かつ放電特性の安定なイオンビーム電流が得られ、均一
な微細加工が可能なイオン源を得ることができる。Therefore, in the present invention, the gap formed between the blocks is closed by a cross-shaped retainer from both sides of the accelerating electrode and the decelerating electrode to prevent the ion beam from being adversely affected. The metal fitting also holds the deformation of the two superposed electrodes of each block in a uniform direction and determines the directionality of the ion beam. Further, since the insulating spacer 13 provided between the two electrodes installed in the central portion of the ion source electrode is held so that the lead-out holes of the two stacked electrodes of the above electrodes are always constant, Even if there is a temperature difference due to radiant heat between the two electrodes,
The position of the extraction hole does not shift. Therefore, a uniform ion beam current with stable discharge characteristics can be obtained, and an ion source capable of uniform fine processing can be obtained.
【００１０】[0010]
【実施例】以下、本発明の実施例を図面を参照して説明
する。図１は本発明に係るイオン源に用いられるイオン
源電極の平面図、図２はその正面図、図３はその背面
図、図４は分割されたイオン源電極の中央部詳細図、図
５は電極中央部のＢーＢ断面図、図６はイオン源の側面
断面図である。Embodiments of the present invention will be described below with reference to the drawings. 1 is a plan view of an ion source electrode used in an ion source according to the present invention, FIG. 2 is a front view thereof, FIG. 3 is a rear view thereof, FIG. 4 is a detailed view of a central portion of a divided ion source electrode, and FIG. Is a sectional view taken along the line BB of the central portion of the electrode, and FIG. 6 is a side sectional view of the ion source.
【００１１】図６に示す如く、プラズマ室１には、フイ
ラメント電流を導きフイラメント２を加熱するための電
流導入端子３と、アルゴンガスなどのガスを導入するた
めのガス導入口４が設けられている。As shown in FIG. 6, the plasma chamber 1 is provided with a current introducing terminal 3 for introducing a filament current to heat the filament 2 and a gas inlet 4 for introducing a gas such as argon gas. There is.
【００１２】一方、イオンを加減速するための加速電極
５、減速電極６は、その間をセラミックスなどで形成さ
れた絶縁スペーサ７、８でギャップを保ちながら電極支
持金具９に固定されている。On the other hand, the accelerating electrode 5 and the decelerating electrode 6 for accelerating and decelerating the ions are fixed to the electrode support fitting 9 while maintaining a gap between them by insulating spacers 7 and 8 made of ceramics or the like.
【００１３】イオン源電極、すなわち、加速電極５、減
速電極６は、イオンビーム加工装置の被加工物の処理枚
数の増加や処理基板の大形化に伴ない大口径化した時、
（１）電極材が１枚の材料でとれなくなる可能性あるこ
と、（２）イオン源のフイラメントの輻射熱の増加によ
り、１枚の電極では変形量が大きく、均一な微細加工が
できなくなること、等を防止するため図１に示すよう
に、加速されるイオンビームと直角方向の平面について
複数個に分割し、かつ分割された加速電極５、減速電極
６の各ブロックは、分割された各電極が組合わされて独
立している状態を保持するように構成されている。この
電極の組立てはイオン源電極指示金具９を下面にして、
分割された加速電極５及び減速電極６を設置し、その間
にはギャップを保持するためにの絶縁スペーサ７、８が
配置されている。When the ion source electrode, that is, the acceleration electrode 5 and the deceleration electrode 6 have a large diameter due to an increase in the number of workpieces to be processed by the ion beam processing apparatus and an increase in the size of a processing substrate,
(1) There is a possibility that the electrode material cannot be removed with a single sheet of material, and (2) The amount of deformation is large with one sheet of electrode due to an increase in radiant heat of filament of the ion source, and uniform fine processing cannot be performed. In order to prevent the above, as shown in FIG. 1, each block of the accelerating electrode 5 and the decelerating electrode 6 is divided into a plurality of parts on a plane perpendicular to the accelerated ion beam, and each divided electrode is a divided electrode. Are configured to remain combined and independent. To assemble this electrode, place the ion source electrode indicator metal fitting 9 on the bottom
The divided acceleration electrode 5 and deceleration electrode 6 are provided, and insulating spacers 7 and 8 for holding a gap are arranged between them.
【００１４】絶縁スペーサ８は電極周辺方向に、絶縁ス
ペーサ７は電極中央部に、それぞれ配置されているが、
電極の全周方向に比較し中央部はその員数が減じられて
いる。 また減速電極６の上面にはシールド１０が配置
され、電極周辺に配置された絶縁スペーサ８の汚損を防
止し、接地側との電界を緩和するように機能する。The insulating spacer 8 is arranged in the peripheral direction of the electrode, and the insulating spacer 7 is arranged in the central part of the electrode.
The number of members is reduced in the central portion as compared with the entire circumferential direction of the electrode. Further, a shield 10 is arranged on the upper surface of the deceleration electrode 6, and functions to prevent the insulating spacer 8 arranged around the electrode from being contaminated and to mitigate the electric field with the ground side.
【００１５】このように構成された電極において、複数
個に分割された電極のとなり合うブロック間に形成され
るギャップは通常１〜２mmであり、このギャップにより
電極は独立状態となる。In the electrode thus constructed, the gap formed between the adjacent blocks of the plurality of divided electrodes is usually 1 to 2 mm, and the electrodes are in an independent state due to this gap.
【００１６】しかし、分割されたイオン源電極の中央部
は、フイラメント２から放射される熱電子により一番加
熱され易く、かつ輻射熱が多く入射するため、温度が最
も高くなり、熱変形も受け易くなる。このような状態下
でイオン源電極よりイオンビームを引き出した場合、イ
オンビームはイオン源電極の各ブロックの電極内の他
に、各ブロック間のスリット状のギャップからもイオン
ビームビームは引き出される。However, the central portion of the divided ion source electrode is most easily heated by the thermoelectrons emitted from the filament 2, and a large amount of radiant heat is incident, so that the temperature becomes the highest and is susceptible to thermal deformation. Become. When the ion beam is extracted from the ion source electrode under such a condition, the ion beam is extracted not only in the electrode of each block of the ion source electrode, but also from the slit-shaped gaps between the blocks.
【００１７】このスリット状のギャップより引き出され
たイオンビームは、上記の如く分割された各電極が独立
しているため、各々ブロック毎の熱変形の影響を受け、
非常に不均一なビームとなり、このようなイオン源を加
工装置に使用した場合に微細均一加工ができない欠点と
なっていた。The ion beam extracted from the slit-shaped gap is affected by thermal deformation of each block because each electrode divided as described above is independent.
The beam becomes extremely non-uniform, which is a drawback that fine uniform processing cannot be performed when such an ion source is used in a processing apparatus.
【００１８】そこで図１及び図３に示すように、分割さ
れた加速電極５、減速電極６の各ブロック間のスリット
状のギャップを各々加速電極５、減速電極６の両面側よ
り十文字の形状をした押え金具１１、１２で塞ぐことに
より、この十文字の押え金具の剛性により、各ブロック
に属する分割された加速電極５、減速電極６は、熱変形
を受けても上記押え金具により一部拘束されるために、
かなりの変形量を低減することができる。Therefore, as shown in FIGS. 1 and 3, slit-shaped gaps between the divided blocks of the acceleration electrode 5 and the deceleration electrode 6 are formed in a cross shape from both sides of the acceleration electrode 5 and the deceleration electrode 6, respectively. Due to the rigidity of the cross-shaped holding metal fittings 11, 12, the divided acceleration electrode 5 and deceleration electrode 6 belonging to each block are partially restrained by the above-mentioned holding metal fittings even if they are thermally deformed. In order to
A considerable amount of deformation can be reduced.
【００１９】またこの押え金具１１、１２の十文字部の
取付穴を長穴とすることにより、熱変形を吸収できるよ
うな構造となるため、電極の変形をより低減でき、微細
加工が更に容易となった。Further, by making the mounting holes of the cross-shaped portions of the pressing fittings 11 and 12 oblong, the structure can absorb the thermal deformation, so that the deformation of the electrode can be further reduced and the fine processing is further facilitated. became.
【００２０】更に不必要なイオンビームが電極より射出
されないため、イオンビームにより削られるスパッタ量
が低減でき、絶縁スペーサの汚損や、スパッタ物の付着
に起因する電極間のブレークダウンの頻度が低減される
等、直接的な効果は非常に大きく、安定したイオン源電
極の製作が可能となった。Furthermore, since an unnecessary ion beam is not emitted from the electrodes, the amount of sputter scraped by the ion beam can be reduced, and the frequency of breakdown between electrodes due to contamination of the insulating spacer and adhesion of sputtered substances is reduced. The direct effect is extremely large, and it has become possible to manufacture a stable ion source electrode.
【００２１】また一方、各ブロックに分割された加速電
極５、減速電極６は、全周方向に配置された絶縁スペー
サ８の数に比較し、電極中央部の分割部（図４に示す部
分）に配置された絶縁スペーサ７の数は少なく、前述の
フライメント２による輻射熱の影響をまともに受け、加
速電極５、減速電極６の温度差により両電極間の孔ずれ
を生ずる。On the other hand, the acceleration electrode 5 and the deceleration electrode 6 divided into blocks are compared with the number of the insulating spacers 8 arranged in the entire circumferential direction, and the divided portion at the center of the electrode (the portion shown in FIG. 4). The number of the insulating spacers 7 arranged in is small, and the influence of the radiant heat from the above-mentioned freight element 2 is directly exerted, and the difference in temperature between the acceleration electrode 5 and the deceleration electrode 6 causes a gap between the electrodes.
【００２２】我々の行なった実験によれば、１バッチ１
時間程度のイオンビームを引き出したあと、更に２〜５
バッチを連続運転すると、イオンビームの均一性（加工
の均一性）はかなりずれていきて、加工精度が当初±
３．０％と満足していたものが、数回の実験で±６．０
％，±８．０％と順次低下し、一様に再現しないという
ことが明確になった。According to our experiments, 1 batch 1
After pulling out the ion beam for about 2 hours, 2-5 more
When the batch is continuously operated, the ion beam uniformity (processing uniformity) shifts considerably, and the processing accuracy is initially ±
What was satisfied with 3.0% was ± 6.0 in several experiments.
%, ± 8.0%, and it became clear that they did not reproduce uniformly.
【００２３】これらを対策するため、分割されたイオン
源電極の中央部に、図４、図５に示すようにイオン源電
極の各ブロック毎に最低２個の絶縁スペーサ１３を入れ
るように配置した。このように加速，減速電極５、６の
中央部に電極孔と同程度の大きさの孔をあけ、この孔と
同等の半径を有した絶縁スペーサ１３を両電極間に捜入
することにより、上記の孔ずれは防止可能となる。絶縁
スペーサ１３の中央部には断面がテーパ状に形成された
円周状突起１３ａが設けられている。この円周状突起１
３ａはスパッタ物が絶縁スペーサ１３に付着した場合に
おいても加速電極５と減速電極６との間で絶縁スペーサ
１３を介して絶縁破壊が生じにくくする機能を有してい
る。In order to solve these problems, at least two insulating spacers 13 are arranged in the central portion of the divided ion source electrode for each block of the ion source electrode as shown in FIGS. 4 and 5. . In this way, by forming a hole having the same size as the electrode hole in the central portion of the acceleration / deceleration electrodes 5 and 6, and by searching the insulating spacer 13 having the same radius as the hole between both electrodes, The above-mentioned hole shift can be prevented. At the center of the insulating spacer 13, a circumferential protrusion 13a having a tapered cross section is provided. This circumferential protrusion 1
3a has a function of preventing dielectric breakdown between the acceleration electrode 5 and the deceleration electrode 6 through the insulating spacer 13 even when the sputtered material adheres to the insulating spacer 13.
【００２４】またイオン源電極の各ブロックの電極中央
部は、輻射熱の影響を受けにくく、電極の熱変形を低下
させるため、各ブロック間を薄板のマスク板１４、１５
で塞いでいる。Further, the central portion of the electrode of each block of the ion source electrode is not easily affected by the radiant heat, and the thermal deformation of the electrode is reduced, so that the mask plates 14 and 15 are thin plates between the blocks.
It is closing with.
【００２５】絶縁スペーサ１３の材質は通常アルミナや
ＳｉＯ2などのセラミックスを使用するが、特にガラス
マコール（切削性ガラス）を使用すると、スパッタ物な
どが付着しても紙やすりなどを使用し簡単に清掃などで
きる利点がある。Ceramics such as alumina and SiO 2 are usually used as the material of the insulating spacer 13. Especially, when glass macor (cutting glass) is used, even if spatter is attached, it is easy to use sandpaper or the like. It has the advantage that it can be cleaned.
【００２６】[0026]
【発明の効果】以上説明したように本発明によれば、イ
オン源電極を分割、独立させ、かつ分割された電極のブ
ロック間を十文字形の押え金具で塞ぎ、かつ分割された
電極の中央部に、両電極間を絶縁スペーサで連結するこ
とにより、イオン源電極の各ブロックの熱変形を一定方
向に押えることができると共に、加速電極、減速電極の
中央部の熱変形に伴なう位置ずれを防止することができ
る。As described above, according to the present invention, the ion source electrode is divided and made independent, and a block of the divided electrode is closed by a cross-shaped holding metal fitting, and the central portion of the divided electrode. In addition, by connecting the two electrodes with an insulating spacer, it is possible to suppress the thermal deformation of each block of the ion source electrode in a certain direction, and the positional displacement due to the thermal deformation of the central portions of the acceleration electrode and the deceleration electrode. Can be prevented.
【００２７】この結果より熱変形の少ない電極面積（従
来の４〜５倍）の大きい大口径イオン源電極を製作で
き、かつイオンビーム電流の均一な（従来のビーム分布
の１／３〜１／５均一性向上）ビーム分布を得ることが
できる。これによって同時多量処理によるイオンビ−ム
加工の生産性向上が図られ、微細加工が可能なイオンビ
ーム加工装置の性能向上を図ることができる。As a result, it is possible to manufacture a large-diameter ion source electrode having a large electrode area (4 to 5 times as large as that in the prior art) which is less likely to be thermally deformed, and has a uniform ion beam current (1/3 to 1/1 / the conventional beam distribution). 5 Improvement of uniformity) A beam distribution can be obtained. As a result, the productivity of ion beam processing by simultaneous large-volume processing is improved, and the performance of the ion beam processing apparatus capable of fine processing can be improved.
【図１】本発明に係るイオン源に用いられるイオン源電
極の一実施例の構成を示す平面図である。FIG. 1 is a plan view showing the configuration of an embodiment of an ion source electrode used in an ion source according to the present invention.
【図２】本発明に係るイオン源に用いられるイオン源電
極の一実施例の構成を示す正面図である。FIG. 2 is a front view showing the configuration of an embodiment of an ion source electrode used in the ion source according to the present invention.
【図３】本発明に係るイオン源に用いられるイオン源電
極の一実施例の構成を示す背面図である。FIG. 3 is a rear view showing the configuration of an embodiment of an ion source electrode used in the ion source according to the present invention.
【図４】本発明に係るイオン源に用いられるイオン源電
極の一実施例の構成を示す中央部詳細図である。FIG. 4 is a detailed view of a central portion showing a configuration of an embodiment of an ion source electrode used in the ion source according to the present invention.
【図５】図４におけるＢ−Ｂ線による断面図である。5 is a sectional view taken along line BB in FIG.
【図６】本発明に係るイオン源の一実施例の構成を示す
側面断面図である。FIG. 6 is a side sectional view showing the configuration of an embodiment of the ion source according to the present invention.
１ プラズマ室 ２ フイラメント ３ 電流導入端子 ４ ガス導入口 ５ 加速電極 ６ 減速電極 ７ 絶縁スペーサ ８ 絶縁スペーサ ９ 電極支持金具 １０ シールド １１ 押え金具 １２ 押え金具 １３ 絶縁スペーサ １３ａ 円周状突起 １４ マスク １５ マスク DESCRIPTION OF SYMBOLS 1 Plasma chamber 2 Filament 3 Current introduction terminal 4 Gas introduction port 5 Acceleration electrode 6 Deceleration electrode 7 Insulation spacer 8 Insulation spacer 9 Electrode support fitting 10 Shield 11 Holding fitting 12 Holding fitting 13 Insulation spacer 13a Circular protrusion 14 Mask 15 Mask
Claims (7)
するプラズマ室と、該プラズマ室よりイオンを引き出す
ための少なくとも２個重ね配置され、かつ各々複数個に
分割され、分割された各ブロックは組合わされ独立する
ように構成されたイオン源電極とを備えたイオン源にお
いて、 前記分割された電極のとなり合うブロック間に形成され
るギャップを、電極押え金具で塞いだことを特徴とする
イオン源。1. A plasma chamber for introducing gas or the like to turn it into plasma and at least two plasma chambers for drawing out ions from the plasma chamber, and each of which is divided into a plurality of portions. An ion source having an ion source electrode configured to be combined and independent from each other, wherein a gap formed between adjacent blocks of the divided electrodes is closed by an electrode pressing metal fitting. Ion source.
ロック間に形成されるギャップを塞ぐ前記電極押え金具
は、少なくとも２個重ね配置され、かつ複数個に分割さ
れた各グロックの加速電極側及び減速電極側より塞ぐよ
うに構成されたことを特徴とする請求項１に記載のイオ
ン源。2. The at least two electrode pressing fittings for closing a gap formed between adjacent blocks of the respective divided electrodes are arranged in an overlapping manner, and are divided into a plurality of accelerating electrode sides of each glock. The ion source according to claim 1, wherein the ion source is configured to be closed from the deceleration electrode side.
イオン源電極において、電極中央部の各ブロックの加速
電極及び減速電極間を絶縁スペーサで連結したことを特
徴とする請求項１または２のいずれかに記載のイオン
源。3. The ion source electrodes, which are divided and arranged in two layers, are connected by an insulating spacer between the acceleration electrode and the deceleration electrode of each block in the central part of the electrode. The ion source according to any one of 1.
形成された円周状突起を有することを特徴とする請求項
３に記載のイオン源。4. The ion source according to claim 3, wherein the insulating spacer has a circumferential protrusion having a tapered cross section.
ナを使用したことを特徴とする請求項３または４のいず
れかに記載のイオン源。5. The ion source according to claim 3, wherein alumina is used as a material for the insulating spacer.
を使用したことを特徴とする請求項３または４のいずれ
かに記載のイオン源。6. SiO 2 as the insulating spacer material
The ion source according to claim 3, wherein the ion source is used.
マコールを使用したことを特徴とする請求項３または４
のいずれかに記載のイオン源。7. The glass macor is used as a material of the insulating spacer.
The ion source according to any one of 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03212595A JP3318854B2 (en) | 1995-02-21 | 1995-02-21 | Ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03212595A JP3318854B2 (en) | 1995-02-21 | 1995-02-21 | Ion source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08227676A true JPH08227676A (en) | 1996-09-03 |
| JP3318854B2 JP3318854B2 (en) | 2002-08-26 |
Family
ID=12350173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03212595A Expired - Fee Related JP3318854B2 (en) | 1995-02-21 | 1995-02-21 | Ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3318854B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010056028A (en) * | 2008-08-29 | 2010-03-11 | Shimadzu Corp | Ion beam treatment device |
-
1995
- 1995-02-21 JP JP03212595A patent/JP3318854B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010056028A (en) * | 2008-08-29 | 2010-03-11 | Shimadzu Corp | Ion beam treatment device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3318854B2 (en) | 2002-08-26 |
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