JPH08226949A - Power supply control element and power supplying method for inspecting substrate, and substrate inspecting apparatus - Google Patents

Power supply control element and power supplying method for inspecting substrate, and substrate inspecting apparatus

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Publication number
JPH08226949A
JPH08226949A JP7057949A JP5794995A JPH08226949A JP H08226949 A JPH08226949 A JP H08226949A JP 7057949 A JP7057949 A JP 7057949A JP 5794995 A JP5794995 A JP 5794995A JP H08226949 A JPH08226949 A JP H08226949A
Authority
JP
Japan
Prior art keywords
power supply
circuit pattern
inspected
pulse
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7057949A
Other languages
Japanese (ja)
Other versions
JP2660497B2 (en
Inventor
Hideji Yamaoka
秀嗣 山岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OKANO HIGHTECH KK
Original Assignee
OKANO HIGHTECH KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OKANO HIGHTECH KK filed Critical OKANO HIGHTECH KK
Priority to JP7057949A priority Critical patent/JP2660497B2/en
Priority to US08/512,066 priority patent/US5747999A/en
Publication of JPH08226949A publication Critical patent/JPH08226949A/en
Application granted granted Critical
Publication of JP2660497B2 publication Critical patent/JP2660497B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

PURPOSE: To improve a power supply system to individually supply powers to circuit patterns to be inspected by emitting a pulse-modulation laser beam to an electrostatic capacity coupling part (power supply controller) disposed at the power supply side. CONSTITUTION: A substrate inspecting apparatus Y comprises power supply control means 1 (X) for applying a voltage to a circuit pattern 5 to be inspected by electrostatic capacity coupling, pulse modulation laser beam emitting means 2, signal detecting means 3 for detecting a voltage change on the pattern 5 to be inspected by the capacity coupling, and waveform processing means 4 for waveform processing the detection signal. A pulse modulation laser beam 6 of sufficiently smaller spot than the pitch of the patterns 5 to be inspected is scanned at the transparent electrode of the power supply controller (X) and individually supplied to the patterns 5. The element structure of the controller X for inspecting a substrate has the laminated layer order of a glass base, the transparent electrode, a photoconductive or resistance film including an insulating gap, an anisotropic conductor and an insulator.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶ガラス基板、セラ
ミック積層ICパッケージ、積層基板等の電子回路基板
に形成された回路パターンの短絡,断線等の不良箇所や
パターンに接続された回路部品の実装不良を検出するた
めに、パルス変調レーザー光を照射して検査対象回路パ
ターンに個別給電すべく給電方式を改善した基板検査用
給電制御素子及び基板検査における給電方法並びに基板
検査装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defective part such as a short circuit or a disconnection of a circuit pattern formed on an electronic circuit board such as a liquid crystal glass substrate, a ceramic laminated IC package or a laminated substrate, or a circuit component connected to the pattern. The present invention relates to a power supply control element for board inspection, a power supply method in board inspection, and a board inspection apparatus, in which a power supply method is improved so as to individually supply power to a circuit pattern to be inspected by irradiating pulse-modulated laser light in order to detect a mounting defect.

【0002】[0002]

【従来の技術】従来の電子回路基板等の検査方法又は装
置は、検査対象電極のそれぞれに給電用と受電用の接続
ピンをたて、給電及び受電をおこなって個々の検査対象
電極から信号がでているかどうかを検査していた。ま
た、このプロービングを確実におこなうために位置決め
装置が必要であった。
2. Description of the Related Art In a conventional method or apparatus for inspecting an electronic circuit board, a power supply and a power receiving connection pin are provided on each of the electrodes to be inspected, power is supplied and power is received, and a signal is output from each of the electrodes to be inspected. I was checking if I was out. In addition, a positioning device was necessary to ensure this probing.

【0003】近年、電子機器の小型化,軽量化に伴って
電子回路基板(被検査基板)の高密度化,搭載ICの狭
ピッチ化等が急速に進展し、これらに相応した基板検査
に係る作業性、信頼性及びコスト等の要請も重大性を増
してきている。
In recent years, as electronic devices have become smaller and lighter, the density of electronic circuit boards (boards to be inspected) and the pitch of mounted ICs have been rapidly increasing. Requests for workability, reliability, and cost are becoming more important.

【0004】[0004]

【発明が解決しようとする課題】ここでは、回路パター
ンのピッチが狭くなればなるほど入出力点数が増し、検
査治具を複雑かつ高精度にする必要があり、高価なもの
となっていた。
Here, as the pitch of the circuit pattern becomes narrower, the number of input / output points increases, and the inspection jig needs to be complicated and highly accurate, which is expensive.

【0005】こうしたなかで、接触式又は非接触式に大
別される検査方式に共通する問題は、給電方式とリンク
するプロービングの問題として考慮されており、電子回
路基板の進化に応じた新たな給電方式(手段)の改善が
望まれている。
[0005] Under these circumstances, a problem common to the inspection methods roughly classified into a contact type and a non-contact type is considered as a problem of probing linked to a power supply method, and a new one corresponding to the evolution of electronic circuit boards. Improvement of the power supply method (means) is desired.

【0006】本発明はこのような事情に鑑みなされたも
のであって、上記課題を解消し、レーザー光を利用する
非接触式基板検査においてその給電方式を改善すること
により、高密度の回路パターンを有する電子回路基板の
短絡,断線等の不良箇所やパターンに接続された回路部
品の実装不良の検査を効率よくおこない、しかも接続ピ
ン等の装置構成を不要として製品の立ち上げ早期化及び
検査(装置)の低コスト化を実現した基板検査用給電制
御素子及び基板検査における給電方法並びに基板検査装
置を提供することを目的とするものである。
The present invention has been made in view of the above circumstances, and solves the above problems and improves the power supply method in a non-contact type substrate inspection using a laser beam to obtain a high density circuit pattern. Efficiently inspects for defective parts such as short circuits and disconnections of electronic circuit boards that have the following, and for mounting defects of circuit components connected to patterns, and further speeds up product startup and inspection without the need for device configurations such as connecting pins. It is an object of the present invention to provide a power supply control element for substrate inspection, a power supply method in substrate inspection, and a substrate inspection device that realize a cost reduction of the device).

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に本発明は、パルス変調レーザー光を照射して検査対象
回路パターン上に電圧を印加するために、検査対象回路
パターンとの間に静電容量結合部を形成して個別給電す
るようにした基板検査用給電制御素子であって、素子構
造が、パルス変調レーザー光照射側に対向するガラス基
台(11)と回路パターン側に対向する絶縁体(16)との
間に、透明電極(12)及び光導電膜(13)からなる積層
部と透明電極(12)及び抵抗膜(14)からなる積層部と
を並設するとともにそれぞれの端面を離間させて絶縁ギ
ャップ(17)を設け、この絶縁ギャップ(17)の絶縁体
(16)側に異方性導電体(15)を設けて絶縁ギャップ
(17)の一端を塞ぎ、ガラス基台(11)、透明電極(1
2)、絶縁ギャップ(17)を含む光導電膜(13)ないし
は抵抗膜(14)、異方性導電体(15)及び絶縁体(16)
の積層順を有してなることを特徴とするものである。
In order to achieve the above object, the present invention provides a method of applying a voltage to a circuit pattern to be inspected by irradiating a pulse-modulated laser beam with a laser beam. A power supply control element for inspecting a substrate, wherein a power supply control element is formed by forming a capacitive coupling portion, and the element structure is opposed to a glass base (11) facing a pulse modulation laser beam irradiation side and a circuit pattern side. Between the insulator (16), a laminated portion composed of the transparent electrode (12) and the photoconductive film (13) and a laminated portion composed of the transparent electrode (12) and the resistive film (14) are arranged side by side. An insulating gap (17) is provided with the end faces separated, and an anisotropic conductor (15) is provided on the insulator (16) side of the insulating gap (17) to close one end of the insulating gap (17), Table (11), transparent electrode (1
2), photoconductive film (13) or resistance film (14) including insulating gap (17), anisotropic conductor (15) and insulator (16)
In the order of lamination.

【0008】また、検査対象回路パターンの両端に各々
静電容量結合部を形成して給電側と検出側を構成し、給
電側の静電容量結合部を介してパルス変調レーザー光を
照射することによりこの検査対象回路パターン上に電圧
を印加するようにした基板検査における給電方法であっ
て、検査対象回路パターンの一端に請求項1記載の給電
制御素子を配置し、その透明電極に検査対象回路パター
ンのピッチより十分小さいスポットのパルス変調レーザ
ー光を走査して検査対象回路パターンに個別給電するこ
とを特徴とするものである。
Further, a capacitance coupling portion is formed at each end of the circuit pattern to be inspected to form a power supply side and a detection side, and a pulse-modulated laser beam is irradiated through the capacitance coupling portion on the power supply side. A power supply control element according to claim 1, wherein a voltage is applied to the circuit pattern to be inspected, wherein the power supply control element according to claim 1 is disposed at one end of the circuit pattern to be inspected, and the circuit to be inspected is provided on its transparent electrode. The present invention is characterized in that a pulse-modulated laser beam of a spot sufficiently smaller than a pattern pitch is scanned to individually supply power to a circuit pattern to be inspected.

【0009】また、検査対象回路パターンの両端に各々
静電容量結合部を形成して給電側と検出側を構成し、給
電側の静電容量結合部を介してパルス変調レーザー光を
照射することにより検査対象回路パターン上に電圧を印
加し、検出側の静電容量結合部に受電して信号検出及び
波形処理するようにした基板検査装置であって、静電容
量結合により検査対象回路パターン(5)上に電圧を印
加するための給電制御手段(1)と、前記給電制御手段
(1)に検査対象回路パターン(5)のピッチより十分
小さいスポットのパルス変調レーザー光(6)を照射す
るためのパルス変調レーザー光照射手段(2)と、静電
容量結合により検査対象回路パターン上の電圧変化を検
出するための信号検出手段(3)と、前記信号検出手段
(3)における検出信号を波形処理するための波形処理
手段(4)を具備したことを特徴とするものである。
Further, a capacitive coupling portion is formed at each end of the circuit pattern to be inspected to form a power supply side and a detection side, and a pulse-modulated laser beam is irradiated through the capacitive coupling portion on the power supply side. A substrate inspection apparatus which applies a voltage to a circuit pattern to be inspected by the method described above, receives a capacitance at a capacitive coupling portion on the detection side, and performs signal detection and waveform processing. 5) Power supply control means (1) for applying a voltage thereon, and the power supply control means (1) is irradiated with pulse-modulated laser light (6) of a spot sufficiently smaller than the pitch of the circuit pattern (5) to be inspected. Modulated laser light irradiation means (2), signal detection means (3) for detecting a voltage change on a circuit pattern to be inspected by capacitive coupling, and detection by the signal detection means (3). Is characterized in that comprises a waveform processing means (4) for waveform processing the signal.

【0010】ここで、給電制御手段(1)が請求項1記
載の給電制御素子であり、パルス変調レーザー光照射手
段(2)がレーザー光スキャンコントローラ(21)及び
パルス変調回路(22)であり、信号検出手段(3)が検
査対象回路パターン(5)と導電板(31a)の間に絶縁
体(31b)を介して形成されたコンデンサ部(31)であ
り、波形処理手段(4)が波形処理回路(41)である。
Here, the power supply control means (1) is the power supply control element according to claim 1, and the pulse modulation laser light irradiation means (2) is the laser light scan controller (21) and the pulse modulation circuit (22). The signal detection means (3) is a capacitor section (31) formed between the inspection target circuit pattern (5) and the conductive plate (31a) via the insulator (31b), and the waveform processing means (4) is It is a waveform processing circuit (41).

【0011】さらに、上記基板検査装置(Y)は、レー
ザー光スキャンコントローラ(21)及び波形処理回路
(41)に接続され、パルス変調レーザー光(6)の照射
制御とデータ処理を含む波形処理の二次処理系を構成す
る外部コンピュータ(7)を具備する場合がある。
Further, the substrate inspection apparatus (Y) is connected to a laser light scan controller (21) and a waveform processing circuit (41), and controls the irradiation of the pulse modulated laser light (6) and performs waveform processing including data processing. An external computer (7) constituting a secondary processing system may be provided.

【0012】[0012]

【作用】レーザー光スキャンコントローラをコンピュー
タ制御し、給電制御素子の透明電極面にパルス変調レー
ザー光を照射すると、給電制御素子の光導電膜の抵抗が
パルス変調レーザー光のスポットが当たった場所だけパ
ルス変調レーザー光のパルス変調に応じて変化し、この
挙動とともに給電制御素子の抵抗膜と光導電膜との絶縁
ギャップの一端を塞ぐように積層配置された異方性導電
体に電圧変化が生じ、静電容量結合によってこの異方性
導電体に近接した直下の回路パターンに給電、すなわち
検査対象回路パターン上に電圧が印加される。
[Function] When the laser light scan controller is computer-controlled to irradiate the transparent electrode surface of the power feeding control element with pulse-modulated laser light, the resistance of the photoconductive film of the power feeding control element is pulsed only at the spot hit by the pulse-modulated laser light. It changes according to the pulse modulation of the modulated laser light, and along with this behavior, a voltage change occurs in the anisotropic conductor laminated so as to close one end of the insulation gap between the resistance film of the power feeding control element and the photoconductive film, By capacitive coupling, power is supplied to the circuit pattern immediately below the anisotropic conductor, that is, a voltage is applied to the circuit pattern to be inspected.

【0013】そして、検出側の回路パターン上にコンデ
ンサ部を形成して、検査対象回路パターン上の電圧変化
を静電容量結合により信号検出し、波形処理することに
より、不良判断が可能となる。
By forming a capacitor portion on the circuit pattern on the detection side, detecting a signal of a voltage change on the circuit pattern to be inspected by capacitive coupling, and performing waveform processing, a defect can be determined.

【0014】ここで、短絡がない場合は、電流がどの回
路パターンにも同じだけの電圧変化が検出される。ま
た、短絡箇所がある場合は、コンデンサ部の面積が増す
ことになり、単位時間当たりの電流量が増加し、検出電
圧が増加する。さらに、断線箇所がある場合は電圧変化
は検出されない。
Here, when there is no short circuit, the same voltage change is detected in any circuit pattern as the current. If there is a short-circuited portion, the area of the capacitor section increases, the amount of current per unit time increases, and the detection voltage increases. Further, if there is a disconnection, no voltage change is detected.

【0015】[0015]

【実施例】本発明の一実施例を添付図面にしたがって以
下説明する。
An embodiment of the present invention will be described below with reference to the accompanying drawings.

【0016】図1は給電制御素子の素子構造を示す説明
図である。図中、11がガラス基台、12が透明電極、13が
光導電膜、14が抵抗膜、15が異方性導電体、16が絶縁
体、17が絶縁ギャップ及びXが基板検査用給電制御素子
である。
FIG. 1 is an explanatory view showing the element structure of the power feeding control element. In the figure, 11 is a glass base, 12 is a transparent electrode, 13 is a photoconductive film, 14 is a resistive film, 15 is an anisotropic conductor, 16 is an insulator, 17 is an insulating gap, and X is a power supply control for substrate inspection. It is an element.

【0017】図示するように、基板検査用給電制御素子
(X)の素子構造が、パルス変調レーザー光照射側に対
向するガラス基台(11)と回路パターン側に対向する絶
縁体(16)との間に、透明電極(12)及び光導電膜(1
3)からなる積層部と透明電極(12)及び抵抗膜(14)
からなる積層部とを並設するとともにそれぞれの端面を
離間させて絶縁ギャップ(17)を設け、この絶縁ギャッ
プ(17)の絶縁体(16)側に異方性導電体(15)を設け
て絶縁ギャップ(17)の一端を塞ぎ、ガラス基台(1
1)、透明電極(12)、絶縁ギャップ(17)を含む光導
電膜(13)ないしは抵抗膜(14)、異方性導電体(15)
及び絶縁体(16)の積層順を有したものである。
As shown in the drawing, the element structure of the board inspection power supply control element (X) includes a glass base (11) facing the pulse modulation laser beam irradiation side and an insulator (16) facing the circuit pattern side. Between the transparent electrode (12) and the photoconductive film (1
Laminated part consisting of 3), transparent electrode (12) and resistance film (14)
An insulating gap (17) is provided by arranging the laminated part consisting of and the end faces thereof apart from each other, and an anisotropic conductor (15) is provided on the insulator (16) side of the insulating gap (17). Block one end of the insulation gap (17) to remove the glass base (1
1), transparent electrode (12), photoconductive film (13) or resistive film (14) including insulating gap (17), anisotropic conductor (15)
And a stacking order of the insulator (16).

【0018】そして、上記給電制御素子(X)を使用し
た給電方法は、検査対象回路パターンの一端に上記給電
制御素子(X)を配置し、この回路パターンとの間に静
電容量結合部を形成する。そして、その透明電極(12)
に回路パターンのピッチより十分小さいスポットのパル
ス変調レーザー光を走査して回路パターンに個別給電す
る、すなわち検査対象回路パターン上に電圧を印加する
ものである。
In the power supply method using the power supply control element (X), the power supply control element (X) is disposed at one end of a circuit pattern to be inspected, and a capacitance coupling portion is provided between the power supply control element (X) and the circuit pattern. Form. And the transparent electrode (12)
In addition, the pulse-modulated laser light having a spot sufficiently smaller than the pitch of the circuit pattern is scanned to individually feed power to the circuit pattern, that is, a voltage is applied to the circuit pattern to be inspected.

【0019】また、上記給電方法を給電手段として構成
した基板検査装置は、検査対象回路パターンの両端に各
々静電容量結合部を形成して給電側と検出側を構成し、
給電側の静電容量結合部を介してパルス変調レーザー光
を照射することにより検査対象回路パターン上に電圧を
印加し、検出側の静電容量結合部に受電して信号検出及
び波形処理するようにしたものである。
Further, in the board inspecting apparatus having the above-mentioned power feeding method as the power feeding means, the capacitive coupling portions are formed at both ends of the circuit pattern to be inspected to form the power feeding side and the detection side, respectively.
A voltage is applied to the circuit pattern to be inspected by irradiating a pulse-modulated laser beam through a capacitive coupling portion on a power supply side, and a signal is detected and a waveform process is performed by receiving power at the capacitive coupling portion on a detection side. It was made.

【0020】図2に装置構成概略図及び図3に等価回路
図を示す。ここで各図に共通して、1が給電制御手段、
2がパルス変調レーザー光照射手段、3が信号検出手
段、4が波形処理手段、5が検査対象回路パターン、6
がパルス変調レーザー光、7が外部コンピュータ、21が
レーザー光スキャンコントローラー、22がパルス変調回
路、31がコンデンサ部、31aが導電板、31bが絶縁体、
41が波形処理回路(オシロスコープ)及びYが基板検査
装置である。
FIG. 2 shows a schematic diagram of the apparatus configuration and FIG. 3 shows an equivalent circuit diagram. Here, 1 is a power supply control means,
2 is a pulse modulated laser beam irradiation means, 3 is a signal detection means, 4 is a waveform processing means, 5 is a circuit pattern to be inspected, 6
Is a pulse modulated laser light, 7 is an external computer, 21 is a laser light scan controller, 22 is a pulse modulation circuit, 31 is a capacitor part, 31a is a conductive plate, 31b is an insulator,
Reference numeral 41 is a waveform processing circuit (oscilloscope), and Y is a substrate inspection device.

【0021】その構成は、検査対象回路パターン(5)
の一端で上記給電制御素子(X)を介して静電結合によ
り検査対象回路パターン(5)上に電圧を印加するため
の給電制御手段(1)と、前記給電制御素子(X)の透
明電極(12)に検査対象回路パターン(5)のピッチよ
り十分小さいスポットのパルス変調レーザー光(6)を
照射するためのパルス変調レーザー光照射手段(2)
と、検査対象回路パターン(5)の他端で静電容量結合
により検査対象回路パターン(5)上の電圧変化を検出
するための信号検出手段(3)と、前記信号検出手段
(3)における検出信号を波形処理するための波形処理
手段(4)を具備している。
The structure of the circuit pattern to be inspected (5)
Power supply control means (1) for applying a voltage on the circuit pattern to be inspected (5) by electrostatic coupling at one end of the power supply control element (X), and a transparent electrode of the power supply control element (X) (12) a pulse-modulated laser beam irradiating means (2) for irradiating a pulse-modulated laser beam (6) of a spot sufficiently smaller than the pitch of the circuit pattern to be inspected (5)
A signal detecting means (3) for detecting a voltage change on the circuit pattern to be inspected (5) by capacitive coupling at the other end of the circuit pattern to be inspected (5); A waveform processing means (4) for waveform-processing the detection signal is provided.

【0022】ここで、パルス変調レーザー光照射手段
(2)がレーザー光スキャンコントローラ(21)及びパ
ルス変調回路(22)であり、信号検出手段(3)が検出
対象回路パターン(5)と導電板(31a)の間に絶縁体
(31b)を介して形成されたコンデンサ部(31)であ
り、波形処理手段(4)が波形処理回路(41)である。
通常、波形処理回路(41)にはオシロスコープを使用す
る。
Here, the pulse-modulated laser light irradiation means (2) is the laser light scan controller (21) and the pulse modulation circuit (22), and the signal detection means (3) is the detection target circuit pattern (5) and the conductive plate. The capacitor section (31) is formed between the (31a) and the insulator (31b), and the waveform processing means (4) is the waveform processing circuit (41).
Normally, an oscilloscope is used for the waveform processing circuit (41).

【0023】さらに、上記基板検査装置(Y)は、レー
ザー光スキャンコントローラ(21)及び波形処理回路
(41)に接続され、パルス変調レーザー光(6)の照射
制御とデータ処理を含む波形処理の二次処理系を構成す
る外部コンピュータ(7)を具備する場合がある。この
実施例ブロック図を図4に示す。図中、7が外部コンピ
ュータである。
Further, the substrate inspection apparatus (Y) is connected to a laser light scan controller (21) and a waveform processing circuit (41), and performs waveform processing including irradiation control of pulse modulated laser light (6) and data processing. An external computer (7) forming a secondary processing system may be provided. FIG. 4 shows a block diagram of this embodiment. In the figure, 7 is an external computer.

【0024】いま、レーザー光スキャンコントローラを
コンピュータ制御し、給電制御素子の透明電極面にパル
ス変調レーザー光を照射すると、検査対象回路パターン
上に電圧が印加され、検出側のコンデンサ部で検査対象
回路パターン上の電圧変化が検出される。
Now, when the laser light scan controller is computer-controlled to irradiate the transparent electrode surface of the power feeding control element with pulse-modulated laser light, a voltage is applied to the circuit pattern to be inspected, and the circuit to be inspected is detected by the capacitor section on the detection side. A voltage change on the pattern is detected.

【0025】この検出信号は波形処理され、コンピュー
タのCRT画面で不良形態特有のそれぞれの出力波形が
表示されるので目視判断が可能となる。
This detection signal is subjected to waveform processing, and the output waveforms specific to the defect form are displayed on the CRT screen of the computer, so that visual judgment can be made.

【0026】図5(a)(b)(c)に出力波形(波形
処理後)を示す。
FIGS. 5A, 5B and 5C show output waveforms (after waveform processing).

【0027】ここで、短絡がない場合は、電流がどの回
路パターンにも同じだけの電圧変化が検出され、図中
(a)の波形を示す。また、短絡箇所がある場合は、コ
ンデンサ部の面積が増大する(単位時間当たりの電流量
が増加する。)ことになり、検出電圧が増加して、図中
(b)の波形を示す。さらに、断線箇所がある場合
(c)は、電圧変化は検出されず、図中(c)の波形を
示す。
Here, when there is no short circuit, the same voltage change is detected in any circuit pattern as the current, and the waveform shown in FIG. When there is a short-circuited portion, the area of the capacitor section increases (the amount of current per unit time increases), the detection voltage increases, and the waveform shown in FIG. Further, when there is a broken portion (c), no voltage change is detected, and the waveform shown in FIG.

【0028】[0028]

【発明の効果】本発明は以上の構成よりなるものであ
り、これによれば給電側の対象電極と給電制御素子間で
静電容量結合部を手段構成しパルス変調レーザー光を照
射することにより非接触個別給電するようにしているの
で、高密度の回路パターンを有する電子回路基板の非接
触基板検査に適用できる。
According to the present invention, there is provided the above-mentioned structure. According to this structure, a means for forming a capacitive coupling section between a target electrode on the power supply side and a power supply control element and irradiating a pulse-modulated laser beam is provided. Since non-contact individual power is supplied, it can be applied to non-contact board inspection of an electronic circuit board having a high-density circuit pattern.

【0029】この給電方式の改善は、近年の電子回路基
板の開発動向とニーズに沿ってプロービングの問題点を
解消するものであり、高密度の回路パターンを有する電
子回路基板の短絡,断線等の不良箇所やパターンに接続
された回路部品の実装不良のの検出において、接続ピン
及び位置決め装置等が不要となるので、容易かつ短時間
に信頼性の高い基板検査をおこなうことができる。しか
も、装置構成の簡素化により製造コストの低減が図れ
る。
The improvement of the power supply system solves the problem of probing in accordance with the development trend and needs of electronic circuit boards in recent years. In detecting a mounting failure of a circuit component connected to a defective portion or a pattern, a connection pin, a positioning device, and the like are not required, so that a highly reliable board inspection can be performed easily and in a short time. In addition, the manufacturing cost can be reduced by simplifying the device configuration.

【0030】また、検出側では波形処理により不良形態
特有の波形パターンをCRT画面で目視判断するように
しているので、不良箇所の把握が極めて容易である。
Further, since a waveform pattern peculiar to the defect form is visually judged on the CRT screen by the waveform processing on the detection side, it is extremely easy to grasp the defective portion.

【図面の簡単な説明】[Brief description of drawings]

【図1】給電制御素子の素子構造を示す説明図である。FIG. 1 is an explanatory diagram showing an element structure of a power supply control element.

【図2】装置構成概略図である。FIG. 2 is a schematic diagram of an apparatus configuration.

【図3】本発明装置の等価回路である。FIG. 3 is an equivalent circuit of the device of the present invention.

【図4】外部コンピュータを接続した実施例ブロック図
である。
FIG. 4 is a block diagram of an embodiment in which an external computer is connected.

【図5】出力波形(波形処理後)の説明図である。FIG. 5 is an explanatory diagram of an output waveform (after waveform processing).

【符号の説明】[Explanation of symbols]

1 給電制御手段 2 パルス変調レーザー光照射手段 3 信号検出手段 4 波形処理手段 5 検査対象回路パターン 6 パルス変調レーザー光 7 外部コンピュータ 11 ガラス基台 12 透明電極 13 光導電膜 14 抵抗膜 15 異方性導電体 16 絶縁体 17 絶縁ギャップ 21 レーザー光スキャンコントローラー 22 パルス変調回路 31 コンデンサ部 31a 導電板 31b 絶縁体 41 波形処理回路(オシロスコープ) X 基板検査用給電制御素子 Y 基板検査装置 DESCRIPTION OF SYMBOLS 1 Power supply control means 2 Pulse modulation laser light irradiation means 3 Signal detection means 4 Waveform processing means 5 Circuit pattern to be inspected 6 Pulse modulation laser light 7 External computer 11 Glass base 12 Transparent electrode 13 Photoconductive film 14 Resistive film 15 Anisotropy Conductor 16 Insulator 17 Insulation gap 21 Laser light scan controller 22 Pulse modulation circuit 31 Capacitor part 31a Conductive plate 31b Insulator 41 Waveform processing circuit (oscilloscope) X Power supply control element for board inspection Y Board inspection device

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基板に形成された回路パターンの短絡,
断線等の不良箇所やパターンに接続された回路部品の実
装不良を非接触検出するための基板検査装置の給電手段
の改善において、パルス変調レーザー光を照射して検査
対象回路パターン上に電圧を印加するために、検査対象
回路パターンとの間に静電容量結合部を形成して個別給
電するようにした基板検査用給電制御素子であって、素
子構造が、パルス変調レーザー光照射側に対向するガラ
ス基台(11)と回路パターン側に対向する絶縁体(16)
との間に、透明電極(12)及び光導電膜(13)からなる
積層部と透明電極(12)及び抵抗膜(14)からなる積層
部とを並設するとともにそれぞれの端面を離間させて絶
縁ギャップ(17)を設け、この絶縁ギャップ(17)の絶
縁体(16)側に異方性導電体(15)を設けて絶縁ギャッ
プ(17)の一端を塞ぎ、ガラス基台(11)、透明電極
(12)、絶縁ギャップ(17)を含む光導電膜(13)ない
しは抵抗膜(14)、異方性導電体(15)及び絶縁体(1
6)の積層順を有してなることを特徴とする基板検査用
給電制御素子。
1. A short circuit of a circuit pattern formed on a substrate,
Applying voltage to the circuit pattern to be inspected by irradiating pulse-modulated laser light in improving the power supply means of the board inspection device for non-contact detection of defective parts such as disconnection and mounting failure of circuit components connected to the pattern A power supply control element for substrate inspection in which an electrostatic capacitance coupling portion is formed between the circuit pattern to be inspected and an individual power supply, and the element structure faces the pulse modulation laser light irradiation side. Glass base (11) and insulator (16) facing the circuit pattern side
Between the transparent electrode (12) and the photoconductive film (13), the transparent electrode (12) and the resistive film (14). An insulating gap (17) is provided, an anisotropic conductor (15) is provided on the insulator (16) side of the insulating gap (17) to close one end of the insulating gap (17), and a glass base (11), A transparent electrode (12), a photoconductive film (13) or a resistive film (14) including an insulating gap (17), an anisotropic conductor (15), and an insulator (1
6) A power supply control element for inspecting a substrate, wherein the power supply control element has a stacking order of 6).
【請求項2】 基板に形成された回路パターンの短絡,
断線等の不良箇所やパターンに接続された回路部品の実
装不良を非接触検出するための基板検査方法の改善にお
いて、検査対象回路パターンの両端に各々静電容量結合
部を形成して給電側と検出側を構成し、給電側の静電容
量結合部を介してパルス変調レーザー光を照射すること
によりこの検査対象回路パターン上に電圧を印加するよ
うにした基板検査における給電方法であって、検査対象
回路パターンの一端に請求項1記載の給電制御素子を配
置し、その透明電極に検査対象回路パターンのピッチよ
り十分小さいスポットのパルス変調レーザー光を走査し
て検査対象回路パターンに個別給電することを特徴とす
る基板検査における給電方法。
2. Short circuit of a circuit pattern formed on a substrate,
In the improvement of the board inspection method for non-contact detection of defective parts such as disconnection and mounting defects of circuit components connected to the pattern, capacitive coupling parts are formed at both ends of the circuit pattern to be inspected to connect to the power supply side. A power supply method in a board inspection in which a voltage is applied to a circuit pattern to be inspected by radiating pulse-modulated laser light through a capacitive coupling section on the power supply side, which constitutes a detection side, The power supply control element according to claim 1 is disposed at one end of the target circuit pattern, and the transparent electrode is scanned with a pulse-modulated laser beam of a spot sufficiently smaller than the pitch of the target circuit pattern to individually supply power to the target circuit pattern. A power supply method in board inspection.
【請求項3】 基板に形成された回路パターンの短絡,
断線等の不良箇所やパターンに接続された回路部品の実
装不良を非接触検出するための基板検査装置の改善にお
いて、検査対象回路パターンの両端に各々静電容量結合
部を形成して給電側と検出側を構成し、給電側の静電容
量結合部を介してパルス変調レーザー光を照射すること
により検査対象回路パターン上に電圧を印加し、検出側
の静電容量結合部に受電して信号検出及び波形処理する
ようにした基板検査装置であって、静電容量結合により
検査対象回路パターン(5)上に電圧を印加するための
給電制御手段(1)と、前記給電制御手段(1)に検査
対象回路パターン(5)のピッチより十分小さいスポッ
トのパルス変調レーザー光(6)を照射するためのパル
ス変調レーザー光照射手段(2)と、静電容量結合によ
り検査対象回路パターン上の電圧変化を検出するための
信号検出手段(3)と、前記信号検出手段(3)におけ
る検出信号を波形処理するための波形処理手段(4)を
具備したことを特徴とする基板検査装置。
3. A short circuit of a circuit pattern formed on a substrate,
In the improvement of the board inspection device for non-contact detection of defective parts such as disconnection or mounting failure of circuit components connected to the pattern, capacitance coupling parts are formed at both ends of the circuit pattern to be inspected and the power supply side is formed. The detection side is configured, a voltage is applied to the circuit pattern to be inspected by irradiating a pulse-modulated laser beam through the capacitance coupling portion on the power supply side, and the capacitance is coupled to the detection side to receive a signal. A board inspection apparatus configured to perform detection and waveform processing, wherein power supply control means (1) for applying a voltage to a circuit pattern to be inspected (5) by capacitive coupling, and said power supply control means (1) A pulse-modulated laser beam irradiating means (2) for irradiating a pulse-modulated laser beam (6) of a spot sufficiently smaller than the pitch of the circuit pattern to be inspected (5) with the circuit pattern to be inspected by capacitive coupling. A signal detecting means (3) for detecting a voltage change on the signal line, and a waveform processing means (4) for subjecting the detection signal of the signal detecting means (3) to waveform processing. Inspection equipment.
【請求項4】 給電制御手段(1)が請求項1記載の給
電制御素子であり、パルス変調レーザー光照射手段
(2)がレーザー光スキャンコントローラ(21)及びパ
ルス変調回路(22)であり、信号検出手段(3)が検査
対象回路パターン(5)と導電板(31a)の間に絶縁体
(31b)を介して形成されたコンデンサ部(31)であ
り、波形処理手段(4)が波形処理回路(41)である請
求項3記載の基板検査装置。
4. The power supply control means (1) is the power supply control element according to claim 1, and the pulse-modulated laser light irradiation means (2) is a laser light scan controller (21) and a pulse modulation circuit (22); The signal detecting means (3) is a capacitor section (31) formed between the circuit pattern to be inspected (5) and the conductive plate (31a) via an insulator (31b), and the waveform processing means (4) is a waveform processing means (4). The substrate inspection apparatus according to claim 3, which is a processing circuit (41).
【請求項5】 レーザー光スキャンコントローラ(21)
及び波形処理回路(41)に接続され、パルス変調レーザ
ー光(6)の照射制御とデータ処理を含む波形処理の二
次処理系を構成する外部コンピュータ(7)を具備した
請求項3又は4記載の基板検査装置。
5. A laser light scan controller (21)
5. An external computer (7), which is connected to the waveform processing circuit (41) and constitutes a secondary processing system for waveform processing including irradiation control of pulse-modulated laser light (6) and data processing. Board inspection device.
JP7057949A 1994-08-15 1995-02-21 Power supply control element for substrate inspection, power supply method in substrate inspection, and substrate inspection device Expired - Fee Related JP2660497B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7057949A JP2660497B2 (en) 1995-02-21 1995-02-21 Power supply control element for substrate inspection, power supply method in substrate inspection, and substrate inspection device
US08/512,066 US5747999A (en) 1994-08-15 1995-07-07 Feed control element used in substrate inspection and method and apparatus for inspecting substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7057949A JP2660497B2 (en) 1995-02-21 1995-02-21 Power supply control element for substrate inspection, power supply method in substrate inspection, and substrate inspection device

Publications (2)

Publication Number Publication Date
JPH08226949A true JPH08226949A (en) 1996-09-03
JP2660497B2 JP2660497B2 (en) 1997-10-08

Family

ID=13070294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7057949A Expired - Fee Related JP2660497B2 (en) 1994-08-15 1995-02-21 Power supply control element for substrate inspection, power supply method in substrate inspection, and substrate inspection device

Country Status (1)

Country Link
JP (1) JP2660497B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201398B1 (en) 1996-03-28 2001-03-13 Oht Inc. Non-contact board inspection probe
JP2002365325A (en) * 2001-06-11 2002-12-18 Oht Inc Circuit pattern inspection device, circuit pattern inspection method and storage medium
WO2006112543A1 (en) * 2005-04-19 2006-10-26 Oht Inc. Inspection device and conductive pattern inspection method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201398B1 (en) 1996-03-28 2001-03-13 Oht Inc. Non-contact board inspection probe
US6373258B2 (en) 1996-03-28 2002-04-16 Naoya Takada Non-contact board inspection probe
JP2002365325A (en) * 2001-06-11 2002-12-18 Oht Inc Circuit pattern inspection device, circuit pattern inspection method and storage medium
WO2006112543A1 (en) * 2005-04-19 2006-10-26 Oht Inc. Inspection device and conductive pattern inspection method

Also Published As

Publication number Publication date
JP2660497B2 (en) 1997-10-08

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