JPH08225480A - Production of synthetic intermediate for vitamin d derivative - Google Patents

Production of synthetic intermediate for vitamin d derivative

Info

Publication number
JPH08225480A
JPH08225480A JP10817195A JP10817195A JPH08225480A JP H08225480 A JPH08225480 A JP H08225480A JP 10817195 A JP10817195 A JP 10817195A JP 10817195 A JP10817195 A JP 10817195A JP H08225480 A JPH08225480 A JP H08225480A
Authority
JP
Japan
Prior art keywords
compound
group
formula
general formula
compound represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10817195A
Other languages
Japanese (ja)
Inventor
Akito Dan
亮人 團
Masahiko Ikeda
雅彦 池田
Emu Torosuto Barii
エム. トロスト バリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Pharmaceuticals Co Ltd
Original Assignee
Sumitomo Pharmaceuticals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Pharmaceuticals Co Ltd filed Critical Sumitomo Pharmaceuticals Co Ltd
Priority to JP10817195A priority Critical patent/JPH08225480A/en
Publication of JPH08225480A publication Critical patent/JPH08225480A/en
Pending legal-status Critical Current

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE: To obtain an ene-yne compound useful as a synthetic intermediate of an active form of a vitamin D3 derivative in an effective manner by reacting an optically active alcohol derivative with an ethylene metal salt and subsequently reducing the obtained reaction product. CONSTITUTION: An enone compound of formula II is obtained by reacting a compound of formula I (R is H or a blocking group for OH; Y is H or a substituted silyl) with a metal salt of ethylene (e.g. halogenated vinylmagnesium) in a solvent (e.g. THF) at 0-50 deg.C. Subsequently, after blocking or deblocking is optionally carried out for a hydroxy group, the compound of formula II is reduced in a diastereo-selectively by a general method to obtain an ene-yne compound of formula III. Use of a compound of formula III as a raw material enables the easy synthesis of 23-hydroxy(or oxo)vitamin D3 derivative useful as a curing or prophylactic agent to diseases such as osteoporosis and rachitis, which are attributable to abnormalities of absorption, transportation or metabolism of calcium, an anti-tumor agent, etc., without depending on time consuming processes and through such a moderate process as silica gel column chromatography for purification.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、種々の活性型ビタミン
3 誘導体の製造における中間体として有用なエンイン
化合物を製造する方法に関する。すなわち、本発明の目
的化合物であるエンイン化合物を原料として、例えば公
開特許公報昭和63年第45249号に記載される23
−ヒドロキシ(またはオキソ)ビタミンD3 誘導体を製
造することができる。上記23−ヒドロキシ(またはオ
キソ)ビタミンD3 誘導体は優れた薬理作用、すなわち
有用なビタミンD様の生理作用を有し、カルシウムの吸
収、輸送あるいは代謝異常に起因する種々の疾患、例え
ばくる病、骨軟化症、骨粗しょう症などの骨の疾患に対
する治療もしくは予防薬として有用であるばかりでな
く、腫瘍細胞、たとえば骨髄性白血病細胞に対してその
増殖を抑制し、かつ正常細胞への分化誘導能を有し、抗
腫瘍剤として有用である。同公報には、下記反応式に従
って23−ヒドロキシ(またはオキソ)ビタミンD3
導体を合成することが記載されている。
TECHNICAL FIELD The present invention relates to a method for producing an enyne compound useful as an intermediate in the production of various active vitamin D 3 derivatives. That is, using the enyne compound, which is the object compound of the present invention, as a raw material, for example, the method described in Japanese Patent Laid-Open Publication No. 45249/1988, 23.
- it is possible to produce hydroxy (or oxo) vitamin D 3 derivatives. The 23-hydroxy (or oxo) vitamin D 3 derivative has an excellent pharmacological action, that is, a useful physiological action similar to vitamin D, and various diseases caused by abnormal calcium absorption, transport or metabolism, such as rickets, Not only is it useful as a therapeutic or prophylactic agent for bone diseases such as osteomalacia and osteoporosis, it also suppresses the growth of tumor cells such as myeloid leukemia cells and induces differentiation into normal cells. And is useful as an antitumor agent. The same publication, it is described that synthesize 23-hydroxy (or oxo) vitamin D 3 derivatives in accordance with the following reaction formula.

【化11】 [Chemical 11]

【0002】一方で、最近下式に書いたようなエンイン
化合物と臭化ビニル化合物をパラジウム触媒を用いて反
応させることでビタミンD誘導体を合成する方法が開発
された(ジャーナル・オブ・アメリカン・ケミカル・ソ
サエティ(J.Am.Chem.Soc.)114巻,
9836頁(1992年))。
On the other hand, recently, a method for synthesizing a vitamin D derivative by reacting an enyne compound and a vinyl bromide compound as described in the following formula with a palladium catalyst has been developed (Journal of American Chemical).・ Society (J. Am. Chem. Soc.) Volume 114,
9836 (1992)).

【化12】 [Chemical 12]

【0003】[0003]

【従来の技術】上記報文には、エンイン化合物は、下式
のようにプロパルギルアルコールを原料として用い合成
することが記載されている。
2. Description of the Related Art The above-mentioned report describes that an enein compound is synthesized by using propargyl alcohol as a raw material as shown in the following formula.

【化13】 [Chemical 13]

【0004】[0004]

【発明が解決しようとする課題】しかし、上記の方法で
はジメトキシ化の工程に於いて特殊な装置が必要であ
り、また酸化工程に於いて毒物であるクロム酸を用いる
必要があり、そして合成経路の途中でジアステレオマー
分離に効率の悪い高速液体クロマトグラフィーを用いな
ければならず、1バッチの仕込量が非常に制限され大量
スケールの精製が非常に困難になる。さらにラセミ分割
工程では反応に19日間を要する。従って、比較的大量
に取り扱う場合、効率的な製造法という観点からは上記
方法は満足すべきものではない。
However, the above method requires special equipment in the dimethoxylation step, requires the use of toxic chromic acid in the oxidation step, and requires a synthetic route. In the middle of the process, inefficient high performance liquid chromatography must be used for diastereomer separation, and the charged amount of one batch is very limited, and purification on a large scale becomes very difficult. Further, the racemic resolution step requires 19 days for the reaction. Therefore, when handling a relatively large amount, the above method is not satisfactory from the viewpoint of an efficient manufacturing method.

【0005】[0005]

【課題を解決するための手段】本発明者らは、上記課題
を解決するため、光学活性なエンイン誘導体の製造方法
について種々検討を重ねた。その結果、市販の光学活性
なエポキシドを用いることにより、エンイン誘導体を効
率よく製造できることを見出し、本発明を完成した。即
ち、本発明は一般式(3)
Means for Solving the Problems In order to solve the above problems, the present inventors have made various studies on a method for producing an optically active enyne derivative. As a result, they have found that an enyne derivative can be efficiently produced by using a commercially available optically active epoxide, and completed the present invention. That is, the present invention has the general formula (3)

【化14】 (式中、Rは水素原子または水酸基の保護基を表し、Y
は水素原子または置換シリル基を表す)で表される化合
物を製造する方法およびその中間体に関する。
Embedded image (In the formula, R represents a hydrogen atom or a hydroxyl-protecting group, and Y
Represents a hydrogen atom or a substituted silyl group) and an intermediate thereof.

【0006】さらに詳しくは、本発明は、(i)一般式
(1)
More specifically, the present invention relates to (i) the general formula (1)

【化15】 (式中、RおよびYは前記と同じ意味を表す)で表され
る化合物をエチレンの金属塩と反応させて、一般式
(2)
[Chemical 15] (Wherein R and Y have the same meanings as described above), the compound represented by the general formula (2) is reacted with a metal salt of ethylene.

【化16】 (式中、RおよびYは前記と同じ意味を表す)で表され
るエノン化合物とし、必要に応じて水酸基を保護または
脱保護し、さらに、一般式(2)で表される化合物を還
元反応に付することにより、前記一般式(3)で表され
るエンイン化合物を製造する方法、(ii)一般式(4)
Embedded image (Wherein R and Y have the same meanings as described above), the hydroxyl group is protected or deprotected as necessary, and the compound represented by the general formula (2) is subjected to a reduction reaction. A method for producing the enyne compound represented by the general formula (3) by adding to (ii) the general formula (4)

【化17】 (式中、Xは脱離基を表す)で表される化合物に、2位
に置換シリル基が置換していてもよいアセチレンの金属
塩を付加させて、一般式(5a)
[Chemical 17] A metal salt of acetylene optionally substituted with a substituted silyl group at the 2-position is added to the compound represented by the formula (wherein X represents a leaving group) to give a compound of the general formula (5a)

【化18】 (式中、XおよびYは前記と同じ意味を表す)で表され
る化合物とし、これを必要に応じて水酸基を保護するこ
とにより、一般式(5)
Embedded image (Wherein, X and Y have the same meanings as described above), and by protecting the hydroxyl group as necessary, the compound represented by the general formula (5)

【化19】 (式中、R、YおよびXは前記と同じ意味を表す)で表
される化合物を得、さらに、一般式(5)で表される化
合物をシアンイオンのアルカリ金属塩と反応させること
により、前記一般式(1)で表される化合物とした後、
上記(i)の方法に従って前記一般式(3)で表される
エンイン化合物を製造する方法、並びに(iii)これらの
方法における原料化合物あるいは中間体として有用な、
前記一般式(1)で表される化合物および前記一般式
(5)で表される化合物に関する。
[Chemical 19] (Wherein R, Y and X have the same meanings as described above), and by reacting the compound represented by the general formula (5) with an alkali metal salt of cyanide, After the compound represented by the general formula (1),
A method for producing the enyne compound represented by the general formula (3) according to the method (i) above, and (iii) useful as a raw material compound or an intermediate in these methods,
The present invention relates to the compound represented by the general formula (1) and the compound represented by the general formula (5).

【0007】本発明に於ける官能基について説明する。
水酸基の保護基としては、本方法の反応条件に使用しう
るものであればいかなるものでも使用できる。またその
導入、除去方法は当業者に周知の方法でおこなえる(例
えば、Protective Groups in O
rganicSynthesis、John−Wile
y Sons、New York、pp10−86(1
981)に記載)が、酸またはアルカリ加水分解により
除去される保護基、なかでも置換シリル基、メチル基、
置換メチル基、2−テトラヒドロピラニル基、アシル基
等を挙げることができる。
The functional group in the present invention will be described.
As the hydroxyl-protecting group, any group can be used as long as it can be used under the reaction conditions of the present method. The introduction and removal methods can be carried out by a method known to those skilled in the art (for example, Protective Groups in O).
organicSynthesis, John-Wile
y Sons, New York, pp10-86 (1
981)), a protecting group removed by acid or alkali hydrolysis, especially a substituted silyl group, a methyl group,
Examples thereof include a substituted methyl group, a 2-tetrahydropyranyl group and an acyl group.

【0008】置換シリル基としては、低級アルキル基や
アリール基で三置換されたシリル基が挙げられ、低級ア
ルキル基としてはメチル、エチル、プロピル、イソプロ
ピル、t−ブチル等の炭素原子数6個以下のアルキル基
が、アリール基としてはフェニル等の炭素原子数10個
以下のアリール基が挙げられる。置換シリル基の具体的
な例としてはトリメチルシリル基、トリエチルシリル
基、トリイソプロピルシリル基、ジメチルイソプロピル
シリル基、ジエチルイソプロピルシリル基、t−ブチル
ジメチルシリル基、ジフェニルメチルシリル基、t−ブ
チルジフェニルシリル基などを挙げることができる。
Examples of the substituted silyl group include a silyl group trisubstituted with a lower alkyl group or an aryl group, and examples of the lower alkyl group include methyl, ethyl, propyl, isopropyl, t-butyl and the like having 6 or less carbon atoms. Examples of the alkyl group and the aryl group include aryl groups having 10 or less carbon atoms such as phenyl. Specific examples of the substituted silyl group include trimethylsilyl group, triethylsilyl group, triisopropylsilyl group, dimethylisopropylsilyl group, diethylisopropylsilyl group, t-butyldimethylsilyl group, diphenylmethylsilyl group, t-butyldiphenylsilyl group. And so on.

【0009】置換メチル基における置換基としてはアル
コキシ基、アルキルチオ基、アラルキルオキシ基、アル
コキシアルコキシ基等が挙げられ、これら置換基のアル
キル部分としてはメチル、エチル等の炭素原子数4個以
下のアルキル基が、アリール部分としてはフェニル等の
炭素数10個以下のアリール基が挙げられる。置換メチ
ル基の具体的な例としては、メトキシメチル基、メチル
チオメチル基、ベンジルオキシメチル基、メトキシエト
キシメチル基などを挙げることができる。アシル基とし
ては低級アルカノイル基やアロイル基が挙げられ、低級
アルカノイル基としてはモノクロロアセチル、ジクロロ
アセチル、トリクロロアセチル、トリフルオロアセチル
等の1〜3個のハロゲン原子で置換された炭素数が3個
以下のアルカノイル基や、アセチル、プロピオニル、ブ
チリル、イソブチリル、ピバロイル等のアルキル部分の
炭素原子数が6個以下のアルカノイル基が、アロイル基
としてはベンゾイル等のアリール部分の炭素原子数が1
0個以下のアロイル基が挙げられる。
Examples of the substituent in the substituted methyl group include an alkoxy group, an alkylthio group, an aralkyloxy group, an alkoxyalkoxy group, and the like, and the alkyl portion of these substituents includes an alkyl group such as methyl and ethyl having 4 or less carbon atoms. Examples of the aryl portion of the group include aryl groups having 10 or less carbon atoms such as phenyl. Specific examples of the substituted methyl group include a methoxymethyl group, a methylthiomethyl group, a benzyloxymethyl group and a methoxyethoxymethyl group. Examples of the acyl group include a lower alkanoyl group and an aroyl group, and examples of the lower alkanoyl group include a carbon number of 3 or less substituted with 1 to 3 halogen atoms such as monochloroacetyl, dichloroacetyl, trichloroacetyl and trifluoroacetyl. And alkanoyl groups having 6 or less carbon atoms in the alkyl moiety such as acetyl, propionyl, butyryl, butyryl, isobutyryl, pivaloyl, and the like, and aroyl groups having 1 carbon atom in the aryl moiety such as benzoyl.
There may be 0 or less aroyl groups.

【0010】Rで表される水酸基の保護基として好適な
ものとしては、置換シリル基を挙げることができる。よ
り好ましいものとしては、例えばトリイソプロピルシリ
ル基、t−ブチルジメチルシリル基あるいはジフェニル
メチルシリル基などの低級アルキル基やアリール基で置
換されたシリル基を選ぶことができる。Yで表される置
換シリル基として好適なものとしては、トリメチルシリ
ル基が挙げられる。
Suitable examples of the protective group for the hydroxyl group represented by R include a substituted silyl group. As a more preferable one, a silyl group substituted with a lower alkyl group or an aryl group such as a triisopropylsilyl group, a t-butyldimethylsilyl group or a diphenylmethylsilyl group can be selected. A preferable example of the substituted silyl group represented by Y is a trimethylsilyl group.

【0011】脱離基としては、例えばハロゲン、アルキ
ルスルホニルオキシ基、アリールスルホニルオキシ基お
よびアラルキルスルホニルオキシ基が挙げられ、ハロゲ
ンとしては、塩素、臭素、ヨウ素が挙げられ、アルキル
スルホニルオキシ基、アラルキルスルホニルオキシ基の
アルキル部分としてはメチル、エチル等の炭素数が4個
以下のアルキル基が、アラルキルスルホニルオキシ基、
アリールスルホニルオキシ基のアリール部分としてはフ
ェニル等の炭素原子数が10個以下のアリールが挙げら
れる。アリールスルホニルオキシ基のアリール部分には
メチル等の炭素数4個以下のアルキル基が置換していて
もよい。このような脱離基の例としてはメタンスルホニ
ルオキシ、エタンスルホニルオキシ、ベンゼンスルホニ
ルオキシ、ベンジルスルホニルオキシ、p−トルエンス
ルホニルオキシ等が挙げられる。
Examples of the leaving group include halogen, alkylsulfonyloxy group, arylsulfonyloxy group and aralkylsulfonyloxy group, and examples of halogen include chlorine, bromine and iodine, and alkylsulfonyloxy group and aralkylsulfonyl group. As the alkyl part of the oxy group, an alkyl group having 4 or less carbon atoms such as methyl and ethyl is an aralkylsulfonyloxy group,
Examples of the aryl moiety of the arylsulfonyloxy group include aryl having 10 or less carbon atoms such as phenyl. The aryl portion of the arylsulfonyloxy group may be substituted with an alkyl group having 4 or less carbon atoms such as methyl. Examples of such leaving groups include methanesulfonyloxy, ethanesulfonyloxy, benzenesulfonyloxy, benzylsulfonyloxy, p-toluenesulfonyloxy and the like.

【0012】2位に置換シリル基が置換していてもよい
アセチレンの金属塩としては、求核性のある金属塩であ
ればよく、具体的には一般式(10)
As the metal salt of acetylene which may be substituted with a substituted silyl group at the 2-position, any metal salt having a nucleophilic property may be used. Specifically, it may be represented by the general formula (10).

【化20】 (式中、Yは前記と同じ意味を表し、M1 はアルカリ金
属を表す)で表される化合物が挙げられる。M1 で表さ
れるアルカリ金属としては、ナトリウムやリチウムを挙
げることができる。一般式(10)で表される化合物と
して好ましくは、アセチレンのリチウム塩や2−トリメ
チルシリルアセチレンのリチウム塩が挙げられる。ま
た、2位に置換シリル基が置換していてもよいアセチレ
ンの金属塩は錯体を形成していてもよく、リチウム塩の
エチレンジアミン錯体も好ましい。エチレンの金属塩と
しては求核性のある金属塩であればよく、具体的には一
般式(11)
Embedded image (Wherein Y represents the same meaning as described above and M 1 represents an alkali metal). Examples of the alkali metal represented by M 1 include sodium and lithium. The compound represented by the general formula (10) is preferably a lithium salt of acetylene or a lithium salt of 2-trimethylsilylacetylene. Further, a metal salt of acetylene which may be substituted with a substituted silyl group at the 2-position may form a complex, and an ethylenediamine complex of lithium salt is also preferable. The metal salt of ethylene may be a nucleophilic metal salt, and specifically, the general formula (11)

【化21】 (式中、M2 はアルカリ金属またはMgZ(Zはハロゲ
ン原子を表す))で表される化合物が挙げられる。M2
で表されるアルカリ金属としては、ナトリウムやリチウ
ムを挙げることができる。Zで表されるハロゲン原子と
しては、塩素、沃素、臭素を挙げることができる。一般
式(11)で表される化合物として望ましくは、臭化ビ
ニルマグネシウムが挙げられる。シアンイオンのアルカ
リ金属塩を形成するアルカリ金属の種類としては、ナト
リウムやカリウムなどが挙げられる。
[Chemical 21] (In the formula, M 2 is an alkali metal or a compound represented by MgZ (Z represents a halogen atom)). M 2
Examples of the alkali metal represented by are sodium and lithium. Examples of the halogen atom represented by Z include chlorine, iodine and bromine. A desirable example of the compound represented by the general formula (11) is vinylmagnesium bromide. Examples of the type of alkali metal forming an alkali metal salt of cyan ion include sodium and potassium.

【0013】次に、本発明の製造方法を以下詳細に説明
する。
Next, the manufacturing method of the present invention will be described in detail below.

【化22】 (式中、R3 は水酸基の保護基を表し、XおよびYは前
記と同じ意味を表す。) 工程A:化合物(4)への、2位に置換シリル基が置換
していてもよいアセチレンの付加 市販されているかまたは容易に入手可能な化合物(4)
と、2位に置換シリル基が置換していてもよいアセチレ
ンの金属塩を例えばテトラヘドロンレターズ(Tetr
ahedron Letters)24巻、391ペー
ジ(1983年)に記載のある方法で反応させることに
より式(5a)の化合物を合成できる。例えば、化合物
(4)に対し1当量以上、好ましくは1.2〜1.8当
量の2位に置換シリル基が置換していてもよいアセチレ
ンのリチウム塩を反応温度−100℃〜−50℃好まし
くは−80℃〜−70℃下テトラヒドロフラン、ジエチ
ルエーテル等の非プロトン性溶媒中で、例えばn−ブチ
ルリチウムを溶媒中に加えた後アセチレンガスを通す方
法や、n−ブチルリチウムを溶媒中に加えた後置換シリ
ル基によりモノ置換されたアセチレンを加える方法等に
より調製し、必要であれば、1当量以上、好ましくは
1.2〜1.8当量のルイス酸、好ましくは、三フッ化
ホウ素のジエチルエーテル錯体を加えた後、化合物
(4)を順次加え反応させることにより化合物(5a)
を合成できる。
[Chemical formula 22] (In the formula, R 3 represents a hydroxyl-protecting group, and X and Y have the same meanings as described above.) Step A: Acetylene optionally substituted with a substituted silyl group at the 2-position to the compound (4). Addition of commercially available or easily available compound (4)
And a metal salt of acetylene which may be substituted with a substituted silyl group at the 2-position, such as tetrahedron letters (Tetr)
The compound of formula (5a) can be synthesized by a reaction according to a method described in ahedron Letters, Vol. 24, page 391 (1983). For example, 1 equivalent or more, preferably 1.2 to 1.8 equivalents of the lithium salt of acetylene optionally substituted with a substituted silyl group at the 2-position to the compound (4) is used at a reaction temperature of -100 ° C to -50 ° C. Preferably, in an aprotic solvent such as tetrahydrofuran or diethyl ether at −80 ° C. to −70 ° C., for example, n-butyllithium is added to the solvent and then acetylene gas is passed through, or n-butyllithium is added to the solvent. It is prepared by a method such as adding acetylene mono-substituted by a substituted silyl group after addition, and if necessary, 1 equivalent or more, preferably 1.2 to 1.8 equivalents of a Lewis acid, preferably boron trifluoride. Of the compound (5a) by sequentially adding the compound (4) and reacting.
Can be synthesized.

【0014】工程B:化合物(6)のアセチレン付加 市販されているかまたは容易に入手可能な化合物(6)
を上記工程Aと同じ方法で反応させることにより式(1
a)の化合物を合成することもできる。得られた化合物
(1a)は、もし必要であれば、水酸基を保護して式
(1b)の化合物にすることができる。
Step B: Addition of acetylene to compound (6) Compound (6) which is commercially available or easily available
By reacting in the same manner as in step A above, the formula (1
It is also possible to synthesize the compound of a). The resulting compound (1a) can be converted to a compound of formula (1b) by protecting the hydroxyl group, if necessary.

【0015】工程C:化合物(5)(化合物(5a)ま
たは化合物(5b))のニトリル化 化合物(5)(化合物(5a)または化合物(5b))
を例えば、アセトニトリル等の非プロトン性溶媒に溶解
させ、必要であれば、化合物(5)に対し5〜20重量
%、好ましくは10〜15重量%のジシクロヘキセノ−
18−クラウン−6存在下、化合物(5)に対し1当量
以上、好ましくは3〜4当量のシアンイオンのアルカリ
金属塩、例えばシアン化カリウムと反応温度30℃以上
好ましくは加熱還流し反応させることにより、化合物
(1)(化合物(1a)または化合物(1b))を合成
できる。
Step C: Nitrilation of Compound (5) (Compound (5a) or Compound (5b)) Compound (5) (Compound (5a) or Compound (5b))
Is dissolved in an aprotic solvent such as acetonitrile and, if necessary, 5 to 20% by weight, preferably 10 to 15% by weight, of dicyclohexeno-based on the compound (5).
By reacting with 1 equivalent or more, preferably 3 to 4 equivalents of an alkali metal salt of cyanide such as potassium cyanide in the presence of 18-crown-6 with respect to the compound (5), at a reaction temperature of 30 ° C. or higher, preferably by heating and refluxing, Compound (1) (compound (1a) or compound (1b)) can be synthesized.

【0016】工程D:化合物(1)(化合物(1a)ま
たは化合物(1b))のエノン化 化合物(1)(化合物(1a)または化合物(1b))
を例えば、テトラヒドロフラン、ジエチルエーテル等の
非プロトン性溶媒に溶解させ、反応温度0℃〜50℃好
ましくは室温で、化合物(1)に対し1当量以上、好ま
しくは1.2〜1.8当量のエチレンの金属塩、好まし
くはハロゲン化ビニルマグネシウムを加え反応させるこ
とにより、化合物(2)(化合物(2a)または化合物
(2b))を合成できる。ハロゲン化ビニルマグネシウ
ムは、例えばTHF等のエーテル系溶媒中、ハロゲン化
ビニルと粉末マグネシウムを室温〜加熱還流下の温度、
好ましくは加熱還流下で反応させる等の方法で合成でき
る。
Step D: Enonization of Compound (1) (Compound (1a) or Compound (1b)) Compound (1) (Compound (1a) or Compound (1b))
Is dissolved in, for example, an aprotic solvent such as tetrahydrofuran or diethyl ether, and at a reaction temperature of 0 ° C. to 50 ° C., preferably room temperature, at 1 equivalent or more, preferably 1.2 to 1.8 equivalents relative to compound (1). Compound (2) (compound (2a) or compound (2b)) can be synthesized by adding a metal salt of ethylene, preferably vinylmagnesium halide and reacting. Vinylmagnesium halide is, for example, in an ether solvent such as THF, the temperature of vinyl halide and powdered magnesium from room temperature to reflux under heating,
Preferably, it can be synthesized by a method such as reacting under heating under reflux.

【0017】工程E:化合物(2)(化合物(2a)ま
たは化合物(2b))の還元 化合物(2)(化合物(2a)または化合物(2b))
を一般的に知られている方法を用いてジアステレオ選択
的に還元することにより、式(3)(化合物(3a)ま
たは化合物(3b))の化合物を合成できる。ただし、
選択的に還元するためには水酸基は保護されていないほ
うが望ましい。例えば、化合物(2)(化合物(2a)
または化合物(2b))を炭素数が4以下の低級飽和脂
肪酸、その中でも好ましくは酢酸に溶解し、反応温度0
℃〜40℃好ましくは10℃〜20℃付近で化合物
(2)に対し1当量以上、好ましくは1.2〜1.8当
量のトリアセチル化ホウ素のテトラアルキルアンモニウ
ム塩、好ましくはテトラメチルアンモニウムトリアセチ
ル化ホウ素を加え反応させることにより、化合物(3)
(化合物(3a)または化合物(3b))を合成でき
る。このテトラアルキルアンモニウム塩のアルキル部分
としては炭素数1〜5の低級のものであればよく、望ま
しくはメチル基かブチル基が好ましい。また、上の方法
を用いなくても通常のエノンの還元方法を用いて還元し
た後、シリカゲルカラムクロマトグラフィーで分離精製
することにより、式(3)の化合物を合成できる。例え
ば、炭素数が4以下のアルコール、望ましくは、エタノ
ールに溶解し反応温度−20℃〜25℃好ましくは0℃
〜10℃で(必要に応じて1当量以上、好ましくは1.
2〜1.8当量の塩化セリウムを加えるとエノンの1、
4還元を防ぐことが出来る)化合物(2)に対し1当量
以上、好ましくは1.2〜1.8当量の水素化ホウ素ナ
トリウムを加え反応させ、得られたジアステレオ混合物
を、シリカゲルカラムクロマトグラフィーで分離精製す
ることにより同じく化合物(3)(化合物(3a)また
は化合物(3b))を合成することができる。
Step E: Reduction of Compound (2) (Compound (2a) or Compound (2b)) Compound (2) (Compound (2a) or Compound (2b))
Can be diastereoselectively reduced using a generally known method to synthesize a compound of formula (3) (compound (3a) or compound (3b)). However,
For selective reduction, it is desirable that the hydroxyl group is not protected. For example, compound (2) (compound (2a)
Alternatively, the compound (2b)) is dissolved in a lower saturated fatty acid having 4 or less carbon atoms, of which acetic acid is preferable, and the reaction temperature is 0.
C. to 40.degree. C., preferably in the vicinity of 10.degree. Compound (3) was obtained by reacting with acetylated boron.
(Compound (3a) or compound (3b)) can be synthesized. The alkyl moiety of the tetraalkylammonium salt may be a lower one having 1 to 5 carbon atoms, preferably a methyl group or a butyl group. Further, the compound of the formula (3) can be synthesized by reducing using a usual enone reduction method without using the above method and then separating and purifying by silica gel column chromatography. For example, it is dissolved in an alcohol having 4 or less carbon atoms, preferably ethanol, and the reaction temperature is -20 ° C to 25 ° C, preferably 0 ° C.
At -10 ° C (1 equivalent or more, if necessary, preferably 1.
When 2-1.8 equivalents of cerium chloride are added, the
4 reduction can be prevented) 1 equivalent or more, preferably 1.2 to 1.8 equivalents of sodium borohydride is added to the compound (2) and reacted, and the obtained diastereomeric mixture is subjected to silica gel column chromatography. The compound (3) (compound (3a) or compound (3b)) can be similarly synthesized by separating and purifying with.

【0018】式(5a)、(5b)、(1a)、(1
b)、(2a)、(2b)、(3a)または(3b)で
表される化合物のうち、Yが置換シリル基である化合物
は公知の方法でYが水素原子である化合物に変換でき
る。例えば、Yがトリメチルシリル基である場合にはメ
タノール等のアルコール系溶媒中、炭酸カリウムなどの
アルカリ存在下、室温で反応させることによりYが水素
原子である対応する化合物に変換できる。具体的には例
えば、20mg〜50mg/1ml、好ましくは30m
g〜40mg/1mlの炭酸カリウム/メタノール懸濁
液で処理する方法が挙げられる。本反応においては、炭
酸カリウムが懸濁状態である方が反応速度が速いので望
ましい。ただし式(5a)で表される化合物は、直接塩
基性条件による脱置換シリル反応させるよりも水酸基を
予め保護して式(5b)で表される化合物としてから同
反応を行う方が、分子内エポキシ化反応が防げるため望
ましい。
Equations (5a), (5b), (1a), (1
Among the compounds represented by b), (2a), (2b), (3a) or (3b), the compound in which Y is a substituted silyl group can be converted into the compound in which Y is a hydrogen atom by a known method. For example, when Y is a trimethylsilyl group, it can be converted to a corresponding compound in which Y is a hydrogen atom by reacting in an alcoholic solvent such as methanol in the presence of an alkali such as potassium carbonate at room temperature. Specifically, for example, 20 mg to 50 mg / 1 ml, preferably 30 m
Examples include a method of treating with a g-40 mg / 1 ml potassium carbonate / methanol suspension. In this reaction, it is desirable that potassium carbonate is in a suspended state because the reaction rate is faster. However, in the case of the compound represented by the formula (5a), it is more preferable to carry out the same reaction as the compound represented by the formula (5b) after protecting the hydroxyl group in advance, rather than performing the desilylation silyl reaction under direct basic conditions. It is desirable because it can prevent the epoxidation reaction.

【0019】本発明の方法により得られた化合物(3)
は、例えば水酸基を保護した後、化合物(7)と、文献
(ジャーナル・オブ・アメリカン・ケミカル・ソサエテ
ィ(J.Am.Chem.Soc.114巻,9836
頁(1992年))に記載されている同じ条件でパラジ
ウムカップリング反応をおこない、続いて脱保護するこ
とにより、文献(ジャーナル・オブ・アメリカン・ケミ
カル・ソサエティ(J.Am.Chem.Soc.11
4巻,9836頁(1992年))に記載されている1
位が酸化されたビタミンD3 や、公開特許公報昭和63
年第45249号に記載されている化合物(8)に誘導
できる。
Compound (3) obtained by the method of the present invention
Is, for example, after protecting the hydroxyl group, and with compound (7) and the literature (Journal of American Chemical Society (J. Am. Chem. Soc. 114, 9836).
Page (1992)), the palladium coupling reaction was carried out under the same conditions as described below, followed by deprotection to obtain the literature (J. Am. Chem. Soc. 11).
4, Vol. 98, page 36 (1992))
Vitamin D 3 whose position is oxidized and Japanese Patent Laid-Open Publication No. 1988
The compound (8) described in No. 45249 can be used.

【化23】 (式中、R4 は水素原子、置換シリル基、メチル基、置
換メチル基または2−テトラヒドロピラニル基を表し、
5 およびR6 は同一または異なってtert−ブチル
ジフェニルシリル基やtert−ブチルジメチルシリル
基などの置換シリル基を表し、Qは脱離基(例えば臭素
原子、トリフルオロメタンスルホニルオキシ基等)を表
す。)
[Chemical formula 23] (In the formula, R 4 represents a hydrogen atom, a substituted silyl group, a methyl group, a substituted methyl group or a 2-tetrahydropyranyl group,
R 5 and R 6 are the same or different and each represents a substituted silyl group such as a tert-butyldiphenylsilyl group or a tert-butyldimethylsilyl group, and Q represents a leaving group (for example, a bromine atom or a trifluoromethanesulfonyloxy group). . )

【0020】[0020]

【発明の効果】本発明の製法及び中間体によりエンイン
化合物を効率よく大量に合成することができるようにな
った。具体的には、時間のかかる工程もなく、精製もシ
リカゲルカラムクロマトグラフィー程度の操作で済み、
また毒性の高い化合物を用いる必要もない。従って、本
発明の製法及び中間体により、従来比較的大きなスケー
ルでは困難と言われていた活性型ビタミンD3 誘導体の
合成が容易なものになる。
INDUSTRIAL APPLICABILITY By the production method and intermediate of the present invention, it has become possible to efficiently synthesize an enyne compound in a large amount. Specifically, there is no time-consuming step, and purification can be performed by a silica gel column chromatography operation.
Further, it is not necessary to use a highly toxic compound. Therefore, the production method and the intermediate of the present invention facilitate the synthesis of the active vitamin D 3 derivative, which has hitherto been difficult on a relatively large scale.

【0021】[0021]

【実施例】次に、実施例、参考例を挙げて本発明をさら
に具体的に説明するが、本発明はもちろんこれらによっ
て何ら限定されるものではない。なお、以下において使
用される略号の意味は次のとおりである。 TBS :tert−ブチルジメチルシリル基 MOM :メトキシメチル基 Tf :トリフルオロメタンスルホニル基
EXAMPLES Next, the present invention will be described in more detail with reference to examples and reference examples, but the present invention is not limited to these examples. The abbreviations used below have the following meanings. TBS: tert-butyldimethylsilyl group MOM: methoxymethyl group Tf: trifluoromethanesulfonyl group

【0022】実施例 1Example 1

【化24】 (1)1−クロロ−2R−ヒドロキシ−ペンタ−4−イ
ンの合成 n−ブチルリチウムのヘキサン溶液(0.96ml,
1.5mmol)をテトラヒドロフラン(2.0ml)
に加え、−78℃に冷却しアセチレンガス(約50m
l)を通して、10分間撹拌した。次に三フッ化ホウ素
のジエチルエーテル錯体(0.2ml)、R−エピクロ
ルヒドリン(93mg)を順次加えてさらに−78℃で
20分間撹拌した。同じ温度で飽和塩化アンモニウム水
溶液を滴下し、室温にもどした後、酢酸エチルで2回抽
出した。有機層を飽和食塩水で洗浄し残渣を得た。これ
をシリカゲルカラムクロマトグラフィーに付し、酢酸エ
チル:ヘキサン(1:3)で溶出される分画を集め、標
記化合物103mgを得た。 NMR(CDCl3 ,δ) 4.00(1H,m),3.73(1H,dd,J=
4.6,11.2Hz),3.65(1H,dd,J=
6.3,11.2Hz),2.57(1H,dd,J=
2.0,2.6Hz),2.54(1H,t,J=2.
6Hz),2.09(1H,t,J=2.6Hz) (2)1−シアノ−2R−ヒドロキシ−ペンタ−4−イ
ンの合成 1−クロロ−2R−ヒドロキシ−ペンタ−4−イン(4
7mg)のアセトニトリル(4ml)溶液にジシクロヘ
キサノ−18−クラウン−6(15mg)、シアン化カ
リウム(80mg)を順次加え7時間加熱還流した。放
冷後、反応液を氷水に加え、酢酸エチルで2回抽出し
た。有機層を飽和食塩水で洗浄後硫酸マグネシウムで乾
燥し、減圧濃縮して残渣を得た。これをシリカゲルカラ
ムクロマトグラフィーに付し、酢酸エチル:ヘキサン
(1:3)で溶出される分画を集め、標記化合物35m
gを得た。 NMR(CDCl3 ,δ) 4.14(1H,m),2.69(1H,d,J=3.
0Hz)2.67(1H,d,J=4.0Hz),2.
56(2H,dd,J=2.6,5.9Hz)2.14
(t,1H,J=2.6Hz) (3)5R−ヒドロキシ−1−オクテン−7−イン−3
−オンの合成 1−シアノ−2R−ヒドロキシ−ペンタ−4−イン(3
5mg)のテトラヒドロフラン(1.0ml)溶液に臭
化ビニルマグネシウム(1.0M、0.32ml)を加
え、室温で30分撹拌した。反応終了後、反応液に、塩
化アンモニウム水溶液を加え、酢酸エチルで2回抽出し
た。有機層を飽和食塩水で洗浄後、硫酸マグネシウムで
乾燥し、減圧濃縮して残渣を得た。これをシリカゲルカ
ラムクロマトグラフィーに付し、酢酸エチル:ヘキサン
(1:3)で溶出される分画を集め、標記化合物8.9
mgを得た。 NMR(CDCl3 ,δ) 6.37(1H,dd,J=9.6,17.5Hz),
6.29(1H,dd,J=2.0,17.5Hz),
5.93(1H,dd,J=2.0,9.6Hz),
4.27(1H,m),3.21(1H,d,J=4.
0Hz),2.99(1H,dd,3.3,17.5H
z),2.48(1H,ddd,J=2.6,3.6,
15.6Hz),2.45(1H,ddd,J=2.
6,4.6,15.6Hz),2.06(1H,t,J
=2.6Hz) (4)3S,5R−ジヒドロキシ−1−オクテン−7−
インの合成 5R−ヒドロキシ−1−オクテン−7−イン−3−オン
(50mg)の酢酸(2ml)溶液に、水素化ホウ素ア
ンモニウム(42mg)を加え、室温で30分間撹拌し
た。反応終了後、反応液にメタノールを加え、減圧濃縮
し残渣を得た。これをシリカゲルカラムクロマトグラフ
ィーに付し、酢酸エチル:ヘキサン(1:3)で溶出さ
れる分画を集め標記化合物(37mg)を得た。 NMR(CDCl3 ,δ) 5.91(1H,ddd,J=17.2,10.5,
5.5Hz),5.29(1H,d,J=17.2H
z),5.13(1H,d,J=10.5Hz),4.
46(1H,m),4.09(1H,m),2.44−
2.39(2H,m),2.05(1H,t,J=2.
6Hz),1.88−1.68(2H,m) (5)3S,5R−ジ(tert−ブチルジメチルシリ
ルオキシ)−1−オクテン−7−イン(化合物(E
5))の合成 3S,5R−ジヒドロキシ−1−オクテン−7−イン
(3.0g)のジメチルホルムアミド(60ml)溶液
に、イミダゾール(4.4g)、tert−ブチルジメ
チルシリルクロリド(8.0g)を順次加えて50℃で
2時間撹拌した。反応終了後、放冷し氷水にあけ、2N
−HCl水溶液、飽和重曹水、飽和食塩水で順次洗浄
し、硫酸マグネシウムで乾燥後減圧濃縮し残渣を得た。
これをシリカゲルカラムクロマトグラフィーに付し、ヘ
キサン:酢酸エチル(20:1)で溶出される分画を集
めて濃縮し標記化合物(7.1g)を得た。 NMR(CDCl3 ,δ) 5.80(1H,ddd,J=17.5,10.3,
7.3Hz),5.03(1H,d,J=10.3H
z),5.14(1H,d,J=17.5Hz),4.
22(1H,m),3.93(1H,m),2.37
(2H,m),1.97(1H,t,J=2.6H
z),1.92−1.83(1H,m),1.70−
1.60(1H,m),0.89(9H,s),0.8
8(9H,s),0.09(3H,s),0.08(3
H,s),0.06(3H,s),0.04(3H,
s)
[Chemical formula 24] (1) Synthesis of 1-chloro-2R-hydroxy-pent-4-yne n-butyllithium hexane solution (0.96 ml,
Tetrahydrofuran (2.0 ml)
In addition to, acetylene gas (about 50m
Stirring through l) for 10 minutes. Next, a boron trifluoride diethyl ether complex (0.2 ml) and R-epichlorohydrin (93 mg) were sequentially added, and the mixture was further stirred at -78 ° C for 20 minutes. A saturated aqueous ammonium chloride solution was added dropwise at the same temperature, the mixture was returned to room temperature, and then extracted twice with ethyl acetate. The organic layer was washed with saturated brine to obtain a residue. This was subjected to silica gel column chromatography, and fractions eluted with ethyl acetate: hexane (1: 3) were collected to give 103 mg of the title compound. NMR (CDCl 3 , δ) 4.00 (1H, m), 3.73 (1H, dd, J =
4.6, 11.2 Hz), 3.65 (1H, dd, J =
6.3, 11.2Hz), 2.57 (1H, dd, J =
2.0, 2.6 Hz), 2.54 (1H, t, J = 2.
6Hz), 2.09 (1H, t, J = 2.6Hz) (2) Synthesis of 1-cyano-2R-hydroxy-pent-4-yne 1-chloro-2R-hydroxy-pent-4-yne (4
Dicyclohexano-18-crown-6 (15 mg) and potassium cyanide (80 mg) were sequentially added to a solution of 7 mg) in acetonitrile (4 ml), and the mixture was heated under reflux for 7 hours. After cooling, the reaction solution was added to ice water and extracted twice with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to give a residue. This was subjected to silica gel column chromatography, and fractions eluted with ethyl acetate: hexane (1: 3) were collected to give the title compound (35 m).
g was obtained. NMR (CDCl 3 , δ) 4.14 (1H, m), 2.69 (1H, d, J = 3.
0 Hz) 2.67 (1H, d, J = 4.0 Hz), 2.
56 (2H, dd, J = 2.6, 5.9Hz) 2.14
(T, 1H, J = 2.6 Hz) (3) 5R-hydroxy-1-octene-7-in-3
Synthesis of 1-one 1-cyano-2R-hydroxy-pent-4-yn (3
Vinylmagnesium bromide (1.0 M, 0.32 ml) was added to a tetrahydrofuran (1.0 ml) solution of 5 mg), and the mixture was stirred at room temperature for 30 minutes. After completion of the reaction, an aqueous solution of ammonium chloride was added to the reaction solution, and the mixture was extracted twice with ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to give a residue. This was subjected to silica gel column chromatography, and fractions eluted with ethyl acetate: hexane (1: 3) were collected and the title compound 8.9 was obtained.
mg was obtained. NMR (CDCl 3 , δ) 6.37 (1H, dd, J = 9.6, 17.5 Hz),
6.29 (1H, dd, J = 2.0, 17.5Hz),
5.93 (1H, dd, J = 2.0, 9.6Hz),
4.27 (1H, m), 3.21 (1H, d, J = 4.
0Hz), 2.99 (1H, dd, 3.3, 17.5H
z), 2.48 (1H, ddd, J = 2.6, 3.6,
15.6 Hz), 2.45 (1H, ddd, J = 2.
6, 4.6, 15.6 Hz), 2.06 (1H, t, J
= 2.6 Hz) (4) 3S, 5R-dihydroxy-1-octene-7-
Synthesis of Yin To a solution of 5R-hydroxy-1-octen-7-yn-3-one (50 mg) in acetic acid (2 ml) was added ammonium borohydride (42 mg), and the mixture was stirred at room temperature for 30 minutes. After completion of the reaction, methanol was added to the reaction solution and concentrated under reduced pressure to obtain a residue. This was subjected to silica gel column chromatography, and the fractions eluted with ethyl acetate: hexane (1: 3) were collected to give the title compound (37 mg). NMR (CDCl 3 , δ) 5.91 (1H, ddd, J = 17.2, 10.5,
5.5 Hz), 5.29 (1H, d, J = 17.2H)
z), 5.13 (1H, d, J = 10.5Hz), 4.
46 (1H, m), 4.09 (1H, m), 2.44-
2.39 (2H, m), 2.05 (1H, t, J = 2.
6 Hz), 1.88-1.68 (2H, m) (5) 3S, 5R-di (tert-butyldimethylsilyloxy) -1-octen-7-yne (compound (E
5)) Synthesis 3S, 5R-dihydroxy-1-octene-7-yne (3.0 g) in dimethylformamide (60 ml) was added to imidazole (4.4 g) and tert-butyldimethylsilyl chloride (8.0 g). Were sequentially added and stirred at 50 ° C. for 2 hours. After the reaction is complete, leave it to cool and pour in ice water, 2N
An aqueous HCl solution, a saturated aqueous sodium hydrogen carbonate solution and a saturated saline solution were sequentially washed, dried over magnesium sulfate and concentrated under reduced pressure to obtain a residue.
This was subjected to silica gel column chromatography, and the fractions eluted with hexane: ethyl acetate (20: 1) were collected and concentrated to give the title compound (7.1 g). NMR (CDCl 3 , δ) 5.80 (1H, ddd, J = 17.5, 10.3,
7.3 Hz), 5.03 (1H, d, J = 10.3H
z), 5.14 (1H, d, J = 17.5 Hz), 4.
22 (1H, m), 3.93 (1H, m), 2.37
(2H, m), 1.97 (1H, t, J = 2.6H
z), 1.92-1.83 (1H, m), 1.70-
1.60 (1H, m), 0.89 (9H, s), 0.8
8 (9H, s), 0.09 (3H, s), 0.08 (3
H, s), 0.06 (3H, s), 0.04 (3H,
s)

【0023】参考例1Reference Example 1

【化25】 (1)トリス−(ジベンジリデンアセトン)ジパラジウ
ム(0)クロロホルム錯体(17mg)、トリフェニル
ホスフィン(44mg)およびトリエチルアミン(2.
0ml)をトルエン(2.0ml)に加え10分間撹拌
した。続いて化合物(E4)(65mg)と化合物(E
5)(62mg)のトルエン(1.0ml)溶液を加
え、1時間加熱還流した。放冷後、反応液をそのままシ
リカゲルカラムクロマトグラフィーに付し、酢酸エチ
ル:ヘキサン(1:20)で溶出される分画を集め目的
とする化合物(E6)(70mg)を得た。 NMR(CDCl3 ,δ) 6.23(1H,d,J=11.1Hz),6.02
(1H,d,J=11.1Hz)5.19(1H,
s),5.09(1H,d,J=6.6Hz),4.8
6(1H,d,J=6.6Hz),4.86(1H,
s),4.66(1H,d,J=6.9Hz),4.6
1(1H,d,J=6.9Hz),4.38(1H,
m),4.19(1H,m),3.94(1H,br.
t),3.45(3H,s)3.37(3H,s),
0.88(18H,m),0.54(3H,s),0.
06(12H,m) (2)化合物(E6)(70mg)のメタノール(2.
0ml)溶液にメタンスルホン酸(0.1ml)を加え
3時間撹拌した。反応液を水に加え酢酸エチルで2回抽
出した。有機層を飽和重曹水、飽和食塩水で順次洗浄し
たのち、硫酸マグネシウムで乾燥した。続いて、減圧濃
縮して残渣を得た。これをシリカゲルカラムクロマトグ
ラフィーに付し、酢酸エチル:ヘキサン(3:2)で溶
出される分画を集め化合物(E3)(30mg)を得
た。 NMR(CDCl3 ,δ) 6.37(1H,d,J=11.2Hz),6.33
(1H,s),6.02(1H,d,J=11.2H
z)5.33(1H,s),4.99(1H,s),
4.20〜4.50(3H,m),0.98(3H,
d,J=5.6Hz),0.57(3H,s)
[Chemical 25] (1) Tris- (dibenzylideneacetone) dipalladium (0) chloroform complex (17 mg), triphenylphosphine (44 mg) and triethylamine (2.
0 ml) was added to toluene (2.0 ml), and the mixture was stirred for 10 minutes. Then, the compound (E4) (65 mg) and the compound (E
5) A solution of (62 mg) in toluene (1.0 ml) was added, and the mixture was heated under reflux for 1 hour. After allowing to cool, the reaction solution was directly subjected to silica gel column chromatography, and fractions eluted with ethyl acetate: hexane (1:20) were collected to obtain the target compound (E6) (70 mg). NMR (CDCl 3 , δ) 6.23 (1H, d, J = 11.1 Hz), 6.02
(1H, d, J = 11.1 Hz) 5.19 (1H,
s), 5.09 (1H, d, J = 6.6Hz), 4.8
6 (1H, d, J = 6.6Hz), 4.86 (1H,
s), 4.66 (1H, d, J = 6.9 Hz), 4.6
1 (1H, d, J = 6.9 Hz), 4.38 (1H,
m), 4.19 (1H, m), 3.94 (1H, br.
t), 3.45 (3H, s) 3.37 (3H, s),
0.88 (18H, m), 0.54 (3H, s), 0.
06 (12H, m) (2) Compound (E6) (70 mg) in methanol (2.
0 ml) solution was added with methanesulfonic acid (0.1 ml) and stirred for 3 hours. The reaction solution was added to water and extracted twice with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and saturated brine, and dried over magnesium sulfate. Then, it concentrated under reduced pressure and the residue was obtained. This was subjected to silica gel column chromatography, and fractions eluted with ethyl acetate: hexane (3: 2) were collected to obtain compound (E3) (30 mg). NMR (CDCl 3 , δ) 6.37 (1H, d, J = 11.2 Hz), 6.33
(1H, s), 6.02 (1H, d, J = 11.2H
z) 5.33 (1H, s), 4.99 (1H, s),
4.20 to 4.50 (3H, m), 0.98 (3H,
d, J = 5.6 Hz), 0.57 (3H, s)

【0024】参考例2 参考例1の原料化合物(E4)は以下の方法により合成
した。
Reference Example 2 The starting compound (E4) of Reference Example 1 was synthesized by the following method.

【化26】 1)化合物(E9)の合成 ケミカル・アンド・ファーマシューチカル・ブレチン
(Chem.Pharm.Bull.)、40巻、16
62頁(1992年)に記載の方法で合成した1α,3
β−ビス[tert−ブチルジメチルシリルオキシ]−
23−ホルミル−9,10−セコプレグナ−5(Z),
7(E),10(19)−トリエン(化合物(E8)、
19.7g)のジエチルエーテル溶液(415ml)に
臭化メチルマグネシウムのテトラヒドロフラン溶液
(0.96mol/L、45.5ml)を注意深く滴下
し、氷冷下30分間撹拌した後、飽和塩化アンモニウム
水溶液を加え分配した。有機層を硫酸マグネシウムで乾
燥後、減圧濃縮し、残渣を得た。残渣をシリカゲルカラ
ムクロマトグラフィーに付し、酢酸エチル:n−ヘキサ
ン(1:5)で溶出される分画を集め、目的の23−ア
ルコール体(化合物(E9)、23位由来のジアステレ
オ混合物)18.4g(収率91%)を得た。 IR(neat)cm-1: 3353 NMR(CDCl3 ,δ): 0.05〜0.06(1
2H,m),0.54,0.56(3H,s),3.9
1(1H,m),4.20(1H,m),4.36(1
H,m),4.86(1H,d,J=2Hz),5.1
7(1H,s),6.01(1H,d,J=11H
z),6.24(1H,d,J=11Hz)
[Chemical formula 26] 1) Synthesis of Compound (E9) Chemical and Pharmaceutical Bulletin (Chem. Pharm. Bull.), 40, 16
1α, 3 synthesized by the method described on page 62 (1992)
β-bis [tert-butyldimethylsilyloxy]-
23-formyl-9,10-secopregna-5 (Z),
7 (E), 10 (19) -triene (compound (E8),
A solution of methylmagnesium bromide in tetrahydrofuran (0.96 mol / L, 45.5 ml) was carefully added dropwise to a diethyl ether solution (415 ml) of 19.7 g), and the mixture was stirred under ice cooling for 30 minutes, and then a saturated aqueous ammonium chloride solution was added. Distributed. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure to give a residue. The residue is subjected to silica gel column chromatography, the fractions eluted with ethyl acetate: n-hexane (1: 5) are collected, and the desired 23-alcohol compound (compound (E9), diastereomeric mixture derived from the 23rd position) is collected. 18.4 g (yield 91%) was obtained. IR (neat) cm −1 : 3353 NMR (CDCl 3 , δ): 0.05 to 0.06 (1
2H, m), 0.54, 0.56 (3H, s), 3.9
1 (1H, m), 4.20 (1H, m), 4.36 (1
H, m), 4.86 (1H, d, J = 2 Hz), 5.1
7 (1H, s), 6.01 (1H, d, J = 11H
z), 6.24 (1H, d, J = 11Hz)

【0025】2)化合物(E10)の合成 10.0gの化合物(E9)をジクロロメタン(133
ml)に溶解し、N−メチルモルホリン−N−オキシド
2.93g、粉末モレキュラーシーブス4A5.0g、
テトラ−n−プロピルアンモニウムパールテネート60
0mgを順次加え室温で15分撹拌した。反応液を直
接、シリカゲルカラムクロマトグラフィーに付し、ジク
ロロメタンで溶出される分画を集め、目的のメチルケト
ン体(化合物(E10))9.12g(収率92%)を
得た。 IR(neat)cm-1: 1718 NMR(CDCl3 ,δ): 0.05〜0.06(1
2H,m),0.57(3H,s),0.93(3H,
d,J=6.5Hz),2.12(3H,s),4.1
8(1H,m),4.36(1H,m),4.86(1
H,d,J=2.5Hz),5.17(1H,s),
6.01(1H,d,J=11Hz),6.23(1
H,d,J=11Hz)
2) Synthesis of compound (E10) 10.0 g of compound (E9) was added to dichloromethane (133
ml), N-methylmorpholine-N-oxide (2.93 g), powdered molecular sieves 4A (5.0 g),
Tetra-n-propyl ammonium pearl tenate 60
0 mg was sequentially added and the mixture was stirred at room temperature for 15 minutes. The reaction solution was directly subjected to silica gel column chromatography, and the fractions eluted with dichloromethane were collected to obtain 9.12 g (yield 92%) of the desired methyl ketone compound (Compound (E10)). IR (neat) cm −1 : 1718 NMR (CDCl 3 , δ): 0.05 to 0.06 (1
2H, m), 0.57 (3H, s), 0.93 (3H,
d, J = 6.5 Hz), 2.12 (3H, s), 4.1
8 (1H, m), 4.36 (1H, m), 4.86 (1
H, d, J = 2.5 Hz), 5.17 (1 H, s),
6.01 (1H, d, J = 11 Hz), 6.23 (1
H, d, J = 11Hz)

【0026】3)化合物(E11)の合成 N,N’−ヘキサメチルジシラザン2.55gとテトラ
ヒドロフラン30mlの溶液を−70℃に冷却し、n−
ブチルリチウムのヘキサン溶液(1.64mol/l,
9.10ml)を滴下し、続けて、6.30gの化合物
(E10)とテトラヒドロフラン35mlの溶液を滴下
した。続けて、ヘキサフルオロアセトンガス(ヘキサフ
ルオロアセトン・3水和物を硫酸で脱水して得られた)
を原料が消失するまで吹き込んだ。反応液に酢酸3.1
5gとテトラヒドロフラン20mlとの溶液を加えて、
室温までもどし、水、酢酸エチルで分配した。有機層を
1N−塩酸水、飽和重曹水、飽和食塩水で順次洗浄し、
硫酸マグネシウムで乾燥した後、減圧濃縮し、残渣を得
た。残渣をシリカゲルクロマトグラフィーに付し、酢酸
エチル:n−ヘキサン(1:30)で溶出される分画を
集め、目的のケトン体(化合物(E11))6.56g
(収率82%)を得た。 IR(neat)cm-1: 1709 NMR(CDCl3 ,δ): 0.04〜0.06(1
2H,m),0.57(3H,s),0.96(3H,
d,J=6Hz),2.88(3H,s),4.20
(1H,m),4.37(1H,m),4.85(1
H,d,J=2Hz),5.18(1H,s),6.0
1(1H,d,J=12Hz),6.23(1H,d,
J=11Hz),6.88(1H,br.s).
3) Synthesis of compound (E11) A solution of 2.55 g of N, N'-hexamethyldisilazane and 30 ml of tetrahydrofuran was cooled to -70 ° C and n-
Butyl lithium in hexane (1.64 mol / l,
9.10 ml) was added dropwise, and then a solution of 6.30 g of compound (E10) and 35 ml of tetrahydrofuran was added dropwise. Hexafluoroacetone gas (obtained by dehydrating hexafluoroacetone trihydrate with sulfuric acid)
Was blown in until the material disappeared. Acetic acid 3.1 in the reaction solution
Add a solution of 5 g and 20 ml of tetrahydrofuran,
The mixture was returned to room temperature and partitioned with water and ethyl acetate. The organic layer was washed successively with 1N-hydrochloric acid, saturated aqueous sodium hydrogen carbonate and saturated brine,
After drying over magnesium sulfate, concentration under reduced pressure gave a residue. The residue was subjected to silica gel chromatography, and fractions eluted with ethyl acetate: n-hexane (1:30) were collected to give 6.56 g of a desired ketone body (compound (E11)).
(Yield 82%) was obtained. IR (neat) cm −1 : 1709 NMR (CDCl 3 , δ): 0.04 to 0.06 (1
2H, m), 0.57 (3H, s), 0.96 (3H,
d, J = 6 Hz), 2.88 (3H, s), 4.20
(1H, m), 4.37 (1H, m), 4.85 (1
H, d, J = 2 Hz), 5.18 (1H, s), 6.0
1 (1H, d, J = 12Hz), 6.23 (1H, d,
J = 11 Hz), 6.88 (1H, br.s).

【0027】4)化合物(E12a)、(E12b)の
合成 化合物(E11)7.0g、テトラヒドロフラン60m
l及びメタノール60mlの溶液に、−10℃で水素化
ホウ素ナトリウム(0.514g)を加えた。10分撹
拌した後、反応液に1N−塩酸水を加えた。室温にもど
した後、酢酸エチル、水で分配し、有機層を飽和重曹
水、飽和食塩水で順次洗浄し、硫酸マグネシウムで乾燥
し、減圧濃縮し、残渣を得た。残渣をシリカゲルカラム
クロマトグラフィーに付し、酢酸エチル:n−ヘキサン
(1:20)で溶出される分画を集め化合物(E12
a)(Rf=0.25,ヘキサン/酢酸エチル(10/
1))2.27g(収率32%)と化合物(E12b)
(Rf=0.5,ヘキサン/酢酸エチル(10/1))
3.65g(収率52%)を得た。
4) Synthesis of compounds (E12a) and (E12b) 7.0 g of compound (E11), 60 m of tetrahydrofuran
To a solution of 1 and 60 ml of methanol was added sodium borohydride (0.514 g) at -10 ° C. After stirring for 10 minutes, 1N-hydrochloric acid water was added to the reaction solution. After returning to room temperature, the mixture was partitioned with ethyl acetate and water, the organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to give a residue. The residue was subjected to silica gel column chromatography, and the fractions eluted with ethyl acetate: n-hexane (1:20) were collected to collect the compound (E12
a) (Rf = 0.25, hexane / ethyl acetate (10 /
1)) 2.27 g (yield 32%) and compound (E12b)
(Rf = 0.5, hexane / ethyl acetate (10/1))
3.65 g (yield 52%) was obtained.

【0028】化合物(E12a) IR(neat)cm-1: 3308 NMR(CDCl3 ,δ): 0.06(12H,
m),0.56(3H,s),0.98(3H,d,J
=6Hz),4.20(1H,m),4.38(2H,
m),4.86(1H,d,J=2Hz),5.18
(1H,s),6.02(1H,d,J=11Hz),
6.23(1H,d,J=11Hz),6.31(1
H,s) 化合物(E12b) IR(neat)cm-1: 3326 NMR(CDCl3 ,δ): 0.06(12H,
s),0.56(3H,s),1.00(3H,d,J
=6Hz),4.20(1H,m),4.37(2H,
m),4.86(1H,d,J=2Hz),5.18
(1H,s),6.02(1H,d,J=11Hz),
6.24(1H,d,J=11Hz),6.28(1
H,s)
Compound (E12a) IR (neat) cm −1 : 3308 NMR (CDCl 3 , δ): 0.06 (12H,
m), 0.56 (3H, s), 0.98 (3H, d, J
= 6 Hz), 4.20 (1H, m), 4.38 (2H,
m), 4.86 (1H, d, J = 2Hz), 5.18
(1H, s), 6.02 (1H, d, J = 11Hz),
6.23 (1H, d, J = 11Hz), 6.31 (1
H, s) Compound (E12b) IR (neat) cm −1 : 3326 NMR (CDCl 3 , δ): 0.06 (12H,
s), 0.56 (3H, s), 1.00 (3H, d, J
= 6 Hz), 4.20 (1H, m), 4.37 (2H,
m), 4.86 (1H, d, J = 2Hz), 5.18
(1H, s), 6.02 (1H, d, J = 11Hz),
6.24 (1H, d, J = 11Hz), 6.28 (1
H, s)

【0029】[0029]

【化27】 5)化合物(E2)の合成 化合物(E12a)(1.5g)のクロロホルム(20
ml)溶液にジイソプロピルエチルアミン(14.8m
l)とクロロメチルメチルエーテル(4.31ml)を
順次加え、1時間加熱還流した。放冷後、反応液を水に
加え酢酸エチルで2回抽出した。有機層を2N塩酸、飽
和重曹水、そして飽和食塩水で順次洗浄したのち、硫酸
マグネシウムで乾燥した。続いて、減圧濃縮して残渣
(1.72g)得た。これをシリカゲルカラムクロマト
グラフィーに付し、酢酸エチル:ヘキサン(1:5)で
溶出される分画を集め化合物(E2)(1.60g)を
得た。 NMR(CDCl3 ,δ) 6.23(1H,d,J=11.1Hz),6.02
(1H,d,J=11.1Hz)5.19(1H,
s),5.09(1H,d,J=6.6Hz),4.8
6(1H,d,J=6.6Hz),4.86(1H,
s),4.66(1H,d,J=6.9Hz),4.6
1(1H,d,J=6.9Hz),4.38(1H,
m),4.19(1H,m),3.94(1H,br.
t),3.45(3H,s)3.37(3H,s),
0.88(18H,m),0.54(3H,s),0.
06(12H,m)
[Chemical 27] 5) Synthesis of Compound (E2) Compound (E12a) (1.5 g) in chloroform (20
ml) solution with diisopropylethylamine (14.8 m
1) and chloromethyl methyl ether (4.31 ml) were sequentially added, and the mixture was heated under reflux for 1 hour. After allowing to cool, the reaction solution was added to water and extracted twice with ethyl acetate. The organic layer was washed successively with 2N hydrochloric acid, saturated aqueous sodium hydrogen carbonate and saturated brine, and dried over magnesium sulfate. Then, it concentrated under reduced pressure and the residue (1.72g) was obtained. This was subjected to silica gel column chromatography, and the fractions eluted with ethyl acetate: hexane (1: 5) were collected to obtain compound (E2) (1.60 g). NMR (CDCl 3 , δ) 6.23 (1H, d, J = 11.1 Hz), 6.02
(1H, d, J = 11.1 Hz) 5.19 (1H,
s), 5.09 (1H, d, J = 6.6Hz), 4.8
6 (1H, d, J = 6.6Hz), 4.86 (1H,
s), 4.66 (1H, d, J = 6.9 Hz), 4.6
1 (1H, d, J = 6.9 Hz), 4.38 (1H,
m), 4.19 (1H, m), 3.94 (1H, br.
t), 3.45 (3H, s) 3.37 (3H, s),
0.88 (18H, m), 0.54 (3H, s), 0.
06 (12H, m)

【0030】6)化合物(E3)の合成 化合物(E2)(1.72g)をジクロロメタン(15
0ml)とメタノール(30ml)の混合溶媒に溶解し
た。このものを−78℃に冷却しオゾンガスを通気し
た。反応液が薄い青色に着色したのを確認したのち、過
剰のオゾンを窒素ガスを通じることにより除いてからト
リフェニルホスフィン(1.70g)を加え反応液を室
温にもどした。反応液を水に加え酢酸エチルで2回抽出
し、有機層を飽和重曹水、そして飽和食塩水で順次洗浄
したのち、硫酸マグネシウムで乾燥した。続いて、減圧
濃縮して残渣(3.50g)得た。これをシリカゲルカ
ラムクロマトグラフィーに付し、酢酸エチル:ヘキサン
(1:5)で溶出される分画を集め化合物(E3)(4
85mg)を得た。 NMR(CDCl3 ,δ) 5.06(1H,d,J=6.6Hz),4.86(1
H,d,J=6.6Hz)4.65(1H,d,J=
7.0Hz),4.59(1H,d,J=7.0H
z),3.93(1H,m),3.42(3H,s),
3.35(3H,s),0.99(3H,d,J=6.
3Hz),0.63(3H,s)
6) Synthesis of compound (E3) Compound (E2) (1.72 g) was added to dichloromethane (15
It was dissolved in a mixed solvent of 0 ml) and methanol (30 ml). This was cooled to −78 ° C. and ozone gas was passed through. After confirming that the reaction solution was colored a pale blue color, excess ozone was removed by passing nitrogen gas through it, and then triphenylphosphine (1.70 g) was added and the reaction solution was returned to room temperature. The reaction mixture was added to water and extracted twice with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and saturated brine, and dried over magnesium sulfate. Then, it concentrated under reduced pressure and the residue (3.50g) was obtained. This was subjected to silica gel column chromatography, and the fractions eluted with ethyl acetate: hexane (1: 5) were collected and compound (E3) (4
85 mg) was obtained. NMR (CDCl 3 , δ) 5.06 (1H, d, J = 6.6Hz), 4.86 (1
H, d, J = 6.6 Hz) 4.65 (1H, d, J =
7.0 Hz), 4.59 (1H, d, J = 7.0H
z), 3.93 (1H, m), 3.42 (3H, s),
3.35 (3H, s), 0.99 (3H, d, J = 6.
3Hz), 0.63 (3H, s)

【0031】7)化合物(E4)の合成 1,1,1,3,3,3−ヘキサメチルジシラザン
(0.363ml)のトルエン(3.0ml)溶液を−
78℃に冷却し、n−ブチルリチウムのヘキサン溶液
(0.86ml,1.60M)を滴下し10分間撹拌し
た。続いて、ブロモメチルトリフェニルホスホニウムブ
ロミド(748mg)を加え、0℃に昇温しさらに10
分間撹拌した。そこへ化合物(E3)(169mg)の
トルエン(0.7ml)溶液を滴下しさらに30分間撹
拌した。反応液に飽和塩化アンモニウム水溶液を加え酢
酸エチルで2回抽出した。有機層を飽和重曹水、そして
飽和食塩水で順次洗浄したのち、硫酸マグネシウムで乾
燥した。続いて、減圧濃縮して残渣を得た。これをシリ
カゲルカラムクロマトグラフィーに付し、酢酸エチル:
ヘキサン(1:10)で溶出される分画を集め目的とす
る化合物(E4)(80mg)を得、原料の化合物(E
3)(44mg)を回収した。 NMR(CDCl3 ,δ) 5.65(1H,s),5.09(1H,d,J=6.
6Hz),4.88(1H,d,J=6.6Hz),
4.66(1H,d,J=6.9Hz),4.61(1
H,d,J=6.9Hz),3.95(1H,br.
t),3.45(3H,s),3.37(3H,s),
0.99(3H,d,J=5.6Hz),0.57(3
H,s)
7) Synthesis of compound (E4) A solution of 1,1,1,3,3,3-hexamethyldisilazane (0.363 ml) in toluene (3.0 ml) was added to-
The mixture was cooled to 78 ° C., a hexane solution of n-butyllithium (0.86 ml, 1.60 M) was added dropwise, and the mixture was stirred for 10 minutes. Subsequently, bromomethyltriphenylphosphonium bromide (748 mg) was added and the temperature was raised to 0 ° C.
Stir for minutes. A solution of the compound (E3) (169 mg) in toluene (0.7 ml) was added dropwise thereto, and the mixture was further stirred for 30 minutes. A saturated aqueous ammonium chloride solution was added to the reaction solution, and the mixture was extracted twice with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate and saturated brine, and dried over magnesium sulfate. Then, it concentrated under reduced pressure and the residue was obtained. This was subjected to silica gel column chromatography, ethyl acetate:
Fractions eluted with hexane (1:10) were collected to obtain the target compound (E4) (80 mg).
3) (44 mg) was recovered. NMR (CDCl 3 , δ) 5.65 (1H, s), 5.09 (1H, d, J = 6.
6Hz), 4.88 (1H, d, J = 6.6Hz),
4.66 (1H, d, J = 6.9Hz), 4.61 (1
H, d, J = 6.9 Hz), 3.95 (1H, br.
t), 3.45 (3H, s), 3.37 (3H, s),
0.99 (3H, d, J = 5.6Hz), 0.57 (3
H, s)

【0032】参考例3 前記式(7)においてQがトリフルオロメタンスルホニ
ルオキシ基である化合物は、次のようにして合成するこ
とができる。
Reference Example 3 A compound in which Q is a trifluoromethanesulfonyloxy group in the above formula (7) can be synthesized as follows.

【0033】[0033]

【化28】 [Chemical 28]

【0034】(式中、R4 は前記と同じ意味を表す。) (1)酸化的開裂 化合物(b)は、文献[ジャーナル・オブ・オーガニッ
ク・ケミストリー(J.Org.Chem.)、48
巻、3477頁(1983年)]記載の方法に準じて合
成することができる。すなわち化合物(a)を炭素数が
1〜4のアルコール、好ましくはエタノールと芳香族系
の溶媒、好ましくはベンゼンの混合溶媒に溶解し、ロー
ズベンガル等の増感剤存在下、酸素を吹き込みながらハ
ロゲンランプを照射する。増感剤を除いた後濃縮し、再
び芳香族系の溶媒に溶解し、0〜10℃好ましくは3〜
5℃に冷却しルイス酸、好ましくは三フッ化ホウ素ジエ
チルエーテル錯体を1〜1.5当量、好ましくは1.2
〜1.3当量を加えて反応させることにより化合物
(b)を合成することができる。 (2)水酸基の保護 水酸基の保護は、通常行われる一般的方法[例えば、P
rotectiveGroups in Organi
c Synthesis,John−Wiley&So
ns,NewYork,pp10−86(1981)]
に従ってすることができる。例えば、メトキシメチル基
を導入した化合物(c)を合成するには、化合物(b)
のクロロホルム溶液にジイソプロピルエチルアミンとク
ロロメチルメチルエーテルを加え反応させることにより
行うことができる。 (3)ビニルトリフレートの合成 化合物(c)からは、文献[テトラヘドロン・レター
(Tetrahedron Letter)、24巻、
979頁(1983年)]記載の方法に準じて化合物
(d)を合成することができる。例えば、エーテル系の
溶媒、好ましくはジメトキシエタン中、−78〜−60
℃好ましくは−75〜−65℃でアルカリ金属を含んだ
塩基、好ましくはリチウムジイソプロピルアミドを調製
し、次に化合物(c)を加えエノレートイオンを発生さ
せ、続いてN−フェニルトリフルオロメタンスルホンイ
ミドを加え反応させることにより、化合物(d)を合成
することができる。
(In the formula, R 4 has the same meaning as described above.) (1) Oxidative Cleavage The compound (b) can be prepared by the method described in the literature [Journal of Organic Chemistry (J. Org. Chem.), 48].
Vol. 3, 3477 (1983)]. That is, the compound (a) is dissolved in an alcohol having 1 to 4 carbon atoms, preferably ethanol and an aromatic solvent, preferably a mixed solvent of benzene, and halogen is blown with oxygen in the presence of a sensitizer such as rose bengal. Illuminate the lamp. After removing the sensitizer, it is concentrated, dissolved again in an aromatic solvent, and at 0 to 10 ° C., preferably 3 to
After cooling to 5 ° C., a Lewis acid, preferably boron trifluoride diethyl ether complex, is added at 1 to 1.5 equivalents, preferably 1.2.
The compound (b) can be synthesized by adding ~ 1.3 equivalents and reacting. (2) Protection of Hydroxyl Group The protection of hydroxyl group is carried out by a general method [eg P
rotaryGroups in Organi
c Synthesis, John-Wiley & So
ns, New York, pp10-86 (1981)].
You can follow. For example, to synthesize a compound (c) having a methoxymethyl group introduced, the compound (b)
It can be carried out by adding diisopropylethylamine and chloromethyl methyl ether to the chloroform solution of and reacting. (3) Synthesis of vinyl triflate From the compound (c), the literature [Tetrahedron Letter, 24,
Compound (d) can be synthesized according to the method described on page 979 (1983)]. For example, in an ether solvent, preferably dimethoxyethane, -78 to -60.
A base containing an alkali metal, preferably lithium diisopropylamide, is prepared at a temperature of preferably -75 to -65 ° C, and then compound (c) is added to generate an enolate ion, followed by N-phenyltrifluoromethanesulfonimide. Compound (d) can be synthesized by adding and reacting.

【0035】[0035]

【化29】 [Chemical 29]

【0036】1)化合物(E14)の合成 314mgの化合物(E13)をベンゼンとエタノール
の混合溶媒(9:1、20ml)に溶解し、そこへロー
ズベンガル(40mg)を加え、酸素をバブリングしな
がらハロゲンランプを1時間照射した。反応終了後、シ
リカゲルでローズベンガルを吸着させ、濾液を減圧濃縮
し、残渣を得た。この残渣を再び20mlのベンゼンに
溶解し、氷冷下、三フッ化ホウ素ジエチルエーテル錯体
(3滴)を加え、3分間撹拌した。反応液を飽和重曹水
にあけ、酢酸エチルで2回抽出した。有機層を飽和食塩
水で洗浄し、減圧濃縮し残渣を得た。これをシリカゲル
カラムクロマトグラフィーに付し、酢酸エチル:ヘキサ
ン(1:2)で溶出される分画を集め、目的のアルデヒ
ド体(E14)のジアステレオ混合物(混合比、1:
9)(50mg)を得た。 IR(neat)cm-1:3225(br.)、295
4、1705 NMR(CDCl3 )δ:0.62(3H×0.9,
s),0.72(3H×0.1,s)0.90〜1.0
2(3H,m),4.32(1H,br.t),6.3
4〜6.38(1H,m),9.54(1H×0.
1),10.00(1H×0.9)
1) Synthesis of compound (E14) 314 mg of compound (E13) was dissolved in a mixed solvent of benzene and ethanol (9: 1, 20 ml), and rose bengal (40 mg) was added thereto while bubbling oxygen. The halogen lamp was irradiated for 1 hour. After completion of the reaction, rose bengal was adsorbed on silica gel and the filtrate was concentrated under reduced pressure to obtain a residue. This residue was dissolved again in 20 ml of benzene, boron trifluoride diethyl ether complex (3 drops) was added under ice cooling, and the mixture was stirred for 3 minutes. The reaction mixture was poured into saturated aqueous sodium hydrogen carbonate and extracted twice with ethyl acetate. The organic layer was washed with saturated brine and concentrated under reduced pressure to give a residue. This was subjected to silica gel column chromatography, the fractions eluted with ethyl acetate: hexane (1: 2) were collected, and the diastereomeric mixture of the desired aldehyde derivative (E14) (mixing ratio, 1: 2) was collected.
9) (50 mg) was obtained. IR (neat) cm −1 : 3225 (br.), 295
4, 1705 NMR (CDCl 3 ) δ: 0.62 (3H × 0.9,
s), 0.72 (3H × 0.1, s) 0.90 to 1.0
2 (3H, m), 4.32 (1H, br.t), 6.3
4 to 6.38 (1H, m), 9.54 (1H × 0.
1), 10.00 (1H x 0.9)

【0037】2)化合物(E15)の合成 50mgの化合物(E14)のクロロホルム(2.0m
l)溶液にジイソプロピルエチルアミン(1.37m
l)とクロロメチルメチルエーテル(0.4ml)を順
次加え、1時間加熱還流した。放冷後、反応液を氷水に
あけ、酢酸エチルで2回抽出した。有機層を1N塩酸
水、飽和重曹水、飽和食塩水で順次洗浄し硫酸マグネシ
ウムで乾燥した後、減圧濃縮し残渣を得た。これをシリ
カゲルカラムクロマトグラフィーに付し、酢酸エチル:
ヘキサン(1:10)で溶出される分画を集め、化合物
(E15)のジアステレオ混合物(混合比、1:9)
(52mg)を得た。 IR(neat)cm-1:2947,1716 NMR(CDCl3 )δ:0.64(3H×0.9,
s),0.73(3H×0.1),3.37(3H,
s),3.47(3H,s)4.01(1H,br.
s),4.55(1H,d,J=7.1Hz),4.7
0(1H,d,J=7.1Hz),4.94(1H,
d,J=6.3Hz),5.00(1H,d,J=6.
3Hz),9.57(1H×0.1,s),10.02
(1H×0.9,s)
2) Synthesis of compound (E15) 50 mg of compound (E14) in chloroform (2.0 m
l) diisopropylethylamine (1.37 m
1) and chloromethyl methyl ether (0.4 ml) were sequentially added, and the mixture was heated under reflux for 1 hour. After allowing to cool, the reaction solution was poured into ice water and extracted twice with ethyl acetate. The organic layer was washed successively with 1N aqueous hydrochloric acid, saturated aqueous sodium hydrogen carbonate and saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to give a residue. This was subjected to silica gel column chromatography, ethyl acetate:
Fractions eluted with hexane (1:10) were collected and collected as a diastereomeric mixture of compound (E15) (mixing ratio, 1: 9).
(52 mg) was obtained. IR (neat) cm −1 : 2947, 1716 NMR (CDCl 3 ) δ: 0.64 (3H × 0.9,
s), 0.73 (3H × 0.1), 3.37 (3H,
s), 3.47 (3H, s) 4.01 (1H, br.
s), 4.55 (1H, d, J = 7.1 Hz), 4.7
0 (1H, d, J = 7.1Hz), 4.94 (1H,
d, J = 6.3 Hz), 5.00 (1H, d, J = 6.
3Hz), 9.57 (1H x 0.1, s), 10.02
(1H × 0.9, s)

【0038】3)化合物(E16)の合成 0.047mlの1,1,1,3,3,3−ヘキサメチ
ルジシラザンをジメトキシエタン(0.5ml)に溶解
し、−78℃でn−ブチルリチウムヘキサン溶液(1.
6M,0.104ml)を滴下し、10分間撹拌した。
続いて化合物(E15)(14mg)のジメトキシエタ
ン(0.3ml)溶液を滴下しさらに1時間撹拌した。
N−フェニルトリフルオロメタンスルホンイミド(99
mg)を加えた後、反応温度を室温にあげ、終夜撹拌し
た。反応液をそのまま減圧濃縮し、残渣をシリカゲルカ
ラムクロマトグラフィーに付し、酢酸エチル:ヘキサン
(1:10)で溶出される分画を集め、化合物(E1
6)(10mg)を得た。 IR(neat)cm-1:2954,1423 NMR(CDCl3 )δ:0.61(3H,s),0.
97(3H,d,J=6.6Hz),3.37(3H,
s),3.47(3H,s),4.01(1H,br.
s),4.55(1H,d,J=7.1Hz),4.7
1(1H,d,J=7.1Hz),4.95(1H,
d,J=6.3Hz),5.01(1H,d,J=6.
3Hz)6.17(br.s)
3) Synthesis of compound (E16) 0.047 ml of 1,1,1,3,3,3-hexamethyldisilazane was dissolved in dimethoxyethane (0.5 ml) and n-butyl was added at -78 ° C. Lithium-hexane solution (1.
6M, 0.104 ml) was added dropwise and stirred for 10 minutes.
Subsequently, a solution of compound (E15) (14 mg) in dimethoxyethane (0.3 ml) was added dropwise, and the mixture was further stirred for 1 hour.
N-phenyltrifluoromethanesulfonimide (99
(mg) was added, the reaction temperature was raised to room temperature, and the mixture was stirred overnight. The reaction mixture was directly concentrated under reduced pressure, the residue was subjected to silica gel column chromatography, and the fractions eluted with ethyl acetate: hexane (1:10) were collected to give the compound (E1
6) (10 mg) was obtained. IR (neat) cm −1 : 2954, 1423 NMR (CDCl 3 ) δ: 0.61 (3H, s), 0.
97 (3H, d, J = 6.6Hz), 3.37 (3H,
s), 3.47 (3H, s), 4.01 (1H, br.
s), 4.55 (1H, d, J = 7.1 Hz), 4.7
1 (1H, d, J = 7.1Hz), 4.95 (1H,
d, J = 6.3 Hz), 5.01 (1H, d, J = 6.
3 Hz) 6.17 (br.s)

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C07C 41/18 C07C 41/18 C07F 7/18 C07F 7/18 W // C07C 401/00 C07C 401/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location C07C 41/18 C07C 41/18 C07F 7/18 C07F 7/18 W // C07C 401/00 C07C 401 / 00

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 一般式(1) 【化1】 (式中、Rは水素原子または水酸基の保護基を表し、Y
は水素原子または置換シリル基を表す)で表される化合
物をエチレンの金属塩と反応させて、一般式(2) 【化2】 (式中、RおよびYは上記と同じ意味を表す)で表され
るエノン化合物とし、必要に応じて水酸基を保護または
脱保護し、次いで還元して一般式(3) 【化3】 (式中、RおよびYは上記と同じ意味を表す)で表され
るエンイン化合物を製造する方法。
1. A compound represented by the general formula (1): (In the formula, R represents a hydrogen atom or a hydroxyl-protecting group, and Y
Represents a hydrogen atom or a substituted silyl group) and is reacted with a metal salt of ethylene to give a compound represented by the general formula (2): (Wherein R and Y have the same meanings as described above), and if necessary, the hydroxyl group is protected or deprotected, and then reduced to give an enone compound represented by the general formula (3) (In the formula, R and Y have the same meanings as described above.) A method for producing an enyne compound.
【請求項2】 一般式(4) 【化4】 (式中、Xは脱離基を表す)で表される化合物に、2位
に置換シリル基が置換していてもよいアセチレンの金属
塩を付加させ一般式(5a) 【化5】 (式中、Xは上記と同じ意味を表し、Yは水素原子また
は置換シリル基を表す)で表される化合物とし、これを
必要に応じて水酸基を保護し、次にシアンイオンのアル
カリ金属塩と反応させ一般式(1) 【化6】 (式中、Rは水素原子または水酸基の保護基を表し、Y
は前記と同じ意味を表す)で表される化合物とし、必要
に応じて水酸基を保護または脱保護し、次にエチレンの
金属塩を反応させ一般式(2) 【化7】 (式中、RおよびYは前記と同じ意味を表す)で表され
るエノン化合物とし、必要に応じて水酸基を保護または
脱保護して、次いで還元して一般式(3) 【化8】 (式中、RおよびYは前記と同じ意味を表す)で表され
るエンイン化合物を製造する方法。
2. A compound represented by the general formula (4): A metal salt of acetylene optionally substituted by a substituted silyl group is added to the 2-position of the compound represented by the formula (wherein X represents a leaving group) and the compound represented by the general formula (5a): (Wherein, X represents the same meaning as described above, Y represents a hydrogen atom or a substituted silyl group), the hydroxyl group is protected as necessary, and then a cyanide alkali metal salt is formed. By reacting with general formula (1) (In the formula, R represents a hydrogen atom or a hydroxyl-protecting group, and Y
Represents the same meaning as above), and if necessary protects or deprotects the hydroxyl group, and then reacts with a metal salt of ethylene to give a compound of the general formula (2) (Wherein R and Y have the same meanings as described above), and if necessary, the hydroxyl group is protected or deprotected, and then reduced to give the general formula (3) (In the formula, R and Y have the same meanings as described above.) A method for producing an enyne compound.
【請求項3】 一般式(1) 【化9】 (式中、Rは水素原子または水酸基の保護基を表し、Y
は水素原子または置換シリル基を表す)で表される化合
物。
3. A compound represented by the general formula (1): (In the formula, R represents a hydrogen atom or a hydroxyl-protecting group, and Y
Represents a hydrogen atom or a substituted silyl group).
【請求項4】 一般式(5) 【化10】 (式中、Rは水素原子または水酸基の保護基を、Yは水
素原子または置換シリル基を表し、Xは脱離基を表す)
で表される化合物。
4. A compound represented by the general formula (5): (In the formula, R represents a hydrogen atom or a hydroxyl-protecting group, Y represents a hydrogen atom or a substituted silyl group, and X represents a leaving group.)
The compound represented by.
JP10817195A 1994-12-20 1995-04-06 Production of synthetic intermediate for vitamin d derivative Pending JPH08225480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10817195A JPH08225480A (en) 1994-12-20 1995-04-06 Production of synthetic intermediate for vitamin d derivative

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP6-335603 1994-12-20
JP33560394 1994-12-20
JP10817195A JPH08225480A (en) 1994-12-20 1995-04-06 Production of synthetic intermediate for vitamin d derivative

Publications (1)

Publication Number Publication Date
JPH08225480A true JPH08225480A (en) 1996-09-03

Family

ID=26448114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10817195A Pending JPH08225480A (en) 1994-12-20 1995-04-06 Production of synthetic intermediate for vitamin d derivative

Country Status (1)

Country Link
JP (1) JPH08225480A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007064011A1 (en) 2005-12-02 2007-06-07 Chugai Seiyaku Kabushiki Kaisha Method for producing vitamin d derivative by using convergent method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007064011A1 (en) 2005-12-02 2007-06-07 Chugai Seiyaku Kabushiki Kaisha Method for producing vitamin d derivative by using convergent method
US8173824B2 (en) 2005-12-02 2012-05-08 Chugai Seiyaku Kabushiki Kaisha Process for producing vitamin D derivative using convergent method

Similar Documents

Publication Publication Date Title
EP0516411B1 (en) Intermediates for the synthesis of 19-nor vitamin D compounds
JPH09118641A (en) Intermediate of 19-nol-vitamin d compound and its preparation
Solladie et al. Enantioselective synthesis of (+)-brefeldin A
JP2675625B2 (en) Method for producing enol silyl ether compound
JPH08225480A (en) Production of synthetic intermediate for vitamin d derivative
US4658044A (en) Intermediates for uracil derivatives
JPH07112968A (en) Production of 1alpha,24-dihydroxycholecalciferol
US7906495B2 (en) Monohalogenovinyl vitamin D derivative compounds
EP1072582B1 (en) Intermediate for synthesis of a ring part of vitamin d derivatives having a substituent at 2-position
JP2000319289A (en) Phosphine oxide vitamin d precursor
JP3410492B2 (en) 7-Octin-1-ene derivative and method for producing the same
JP3776478B2 (en) Method for producing coprostandiol derivative
JPH07126246A (en) New intermediate for producing vitamin d derivative
JP2765575B2 (en) Process for producing substituted cyclopentenone and substituted cyclohexenone derivatives
JPH047755B2 (en)
JPH07145093A (en) Production of synthetic intermediate of vitamin derivative
US6313353B1 (en) Method for producing an optically active acyloin
JP3249847B2 (en) Method for producing Z-cyclohexylideneacetic acid derivative
JPH0770053A (en) Fluorinated vitamin d derivative and production method therefor
JPH07304732A (en) Fluorine-containing vitamin d3 analogue
JPH08291160A (en) Production of (-)-trans-kumausyne and its novel intermediate
JPH08301811A (en) Hydroindan-4-ol derivative and its production
Park Stereoselective syntheses of functionalized tetrahydrofurans via intramolecular oxymetallations of allenes and syntheses of methyl nonactate homologues
JPH11322663A (en) Production of gamma-fluoroacetoacetic acid derivative
JPH08134070A (en) New synthesis of 15-hydroxymilbemycin derivative