JPH08219230A - Vibration isolator - Google Patents
Vibration isolatorInfo
- Publication number
- JPH08219230A JPH08219230A JP4790495A JP4790495A JPH08219230A JP H08219230 A JPH08219230 A JP H08219230A JP 4790495 A JP4790495 A JP 4790495A JP 4790495 A JP4790495 A JP 4790495A JP H08219230 A JPH08219230 A JP H08219230A
- Authority
- JP
- Japan
- Prior art keywords
- vibration
- displacement
- actuator
- weight
- vibration isolation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)
- Vibration Prevention Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は除振装置、さらに詳しく
は例えば走査プローブ顕微鏡や超微小硬度計などの精密
測定機器に使用される除振装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anti-vibration device, and more particularly to an anti-vibration device used in precision measuring instruments such as a scanning probe microscope and a micro hardness meter.
【０００２】[0002]
【従来の技術】例えば走査プローブ顕微鏡（ＳＰＭ）や
ナノインデンテーション試験機などの精密測定機器は、
近年ナノメートル以下の分解能を持つ機器が実用化され
ているが、これらの機器の性能を充分に発揮させるため
には、充分な除振対策が施される必要がある。すなわち
一般の実験室では、比較的良好な条件化においてもμｍ
オーダーの床振動が存在するため、この振動を測定に影
響を与えないサブナノメートル程度に押さえる必要があ
り、このため１００ｄＢ程度の減衰率を持つ除振装置が
必要になる。この種の除振装置で１００ｄＢ程度の減衰
率を確保する方法としては、除振装置の共振周波数と測
定機器の共振周波数とに差異を設け、共振周波数の差異
によって除振性能を得ることとしており、構造上より容
易な方法として、除振面の共振周波数を出来るだけ低く
し、測定機器の共振周波数を出来るだけ高くする方法を
取っている。2. Description of the Related Art Precision measuring instruments such as a scanning probe microscope (SPM) and a nanoindentation tester are
In recent years, devices having a resolution of nanometers or less have been put into practical use, but in order to sufficiently bring out the performance of these devices, it is necessary to take sufficient anti-vibration measures. That is, in a general laboratory, μm even under relatively good conditions.
Since floor vibration of the order exists, it is necessary to suppress this vibration to sub-nanometers that do not affect the measurement. Therefore, a vibration isolation device having a damping rate of about 100 dB is required. As a method of ensuring an attenuation rate of about 100 dB with this type of vibration isolator, a difference is set between the resonance frequency of the vibration isolator and the resonance frequency of the measuring device, and vibration isolation performance is obtained by the difference in the resonance frequency. As a structurally simpler method, the resonance frequency of the vibration isolation surface is made as low as possible and the resonance frequency of the measuring device is made as high as possible.
【０００３】然しながら従来のパッシブ型の除振装置、
すなわち質量，ばね，ダンパ等で振動を受けるだけの除
振装置では、除振面の共振周波数を低く設計してもせい
ぜい１Ｈｚ程度が限界となる。図４は、従来のパッシブ
型の除振装置を模試的に表した図であり、１は除振装置
が置かれている床面、２は測定機器を乗せる除振面、３
は質量ｍの定盤、４は定数ｋのばね、５は減衰係数ｃの
ダンパである。However, a conventional passive type vibration isolation device,
That is, in a vibration isolator that only receives vibrations due to mass, springs, dampers, etc., even if the resonance frequency of the vibration isolation surface is designed to be low, the limit is about 1 Hz at most. FIG. 4 is a diagram schematically showing a conventional passive type vibration isolation device. 1 is a floor surface on which the vibration isolation device is placed, 2 is a vibration isolation surface on which a measuring instrument is placed, 3
Is a surface plate with a mass m, 4 is a spring with a constant k, and 5 is a damper with a damping coefficient c.
【０００４】図４に示す除振装置において床面に振動Ｐ
が作用した場合の除振面の変位をｘ1 ，床面の変位をｘ
2 とすると、この除振装置の運動方程式は、下記数式
（１）で表すことができる。In the vibration isolator shown in FIG. 4, vibration P is generated on the floor surface.
X 1 is the displacement of the vibration isolation surface and x is the displacement of the floor when
If the value is 2 , the equation of motion of this vibration isolation device can be expressed by the following mathematical expression (1).
【数１】 この数式をラプラス変換し、ｘ2 に対するｘ1 の伝達関
数を求めると、下記数式（２）となる。[Equation 1] When the transfer function of x 1 with respect to x 2 is obtained by Laplace transforming this expression, the following expression (2) is obtained.
【数２】 但し、ｓは複素周波数、Ｘ1 ，Ｘ2 はそれぞれｘ1 ，ｘ
2 のラプラス変換を示す。そして、振動角周波数ωの応
答特性は、ｓ＝ｊωとおくことにより得られ、下記数式
（３），数式（４）で表すことができる。[Equation 2] However, s is a complex frequency, and X 1 and X 2 are x 1 and x, respectively.
A Laplace transform of 2 is shown. Then, the response characteristic of the vibration angular frequency ω is obtained by setting s = jω, and can be expressed by the following formulas (3) and (4).
【数３】 図５の曲線１０は図４に示す従来の除振装置の除振面の
振動周波数応答特性を示す。(Equation 3) A curve 10 in FIG. 5 shows the vibration frequency response characteristic of the vibration isolation surface of the conventional vibration isolation device shown in FIG.
【０００５】また、測定機器の共振周波数を高くするこ
とにも限界がある。例えば原子間力顕微鏡（ＡＦＭ）で
は、その機能上、ばね定数は数Ｎ／ｍ程度の小さな値に
する必要があり、共振周波数を数ｋＨｚ以上出来るだけ
高く設計する必要がある。このために、その質量を極め
て小さくする必要から成膜プロセスを用いて制作した厚
さ数μｍ，幅数十μｍ，長さ数百μｍ程度の微小なカン
チレバーを使用する等の方法を取ることができる。然し
ながら測定機器のうちには、ＳＰＭのようにプローブの
共振周波数を高くし難いものがあり、またナノインデン
テーション試験器では、試験重量が小さくなるほど試験
器の共振周波数が低下してしまい、数十ｎｍ程度の薄膜
の評価の場合には、その共振周波数は荷重負荷機構の共
振周波数と同等になってしまう。従ってこれらの測定機
器では、従来の除振装置を使用しても充分な性能を得る
ことができない。There is also a limit to increasing the resonance frequency of the measuring device. For example, in an atomic force microscope (AFM), the spring constant needs to be as small as several N / m in view of its function, and the resonance frequency needs to be designed to be as high as several kHz or higher. For this reason, it is necessary to make the mass extremely small. Therefore, a method of using a minute cantilever having a thickness of several μm, a width of several tens of μm, and a length of several hundreds of μm produced by a film forming process can be adopted. it can. However, some measuring instruments, such as SPM, have difficulty in increasing the resonance frequency of the probe, and in the nano-indentation tester, the resonance frequency of the tester decreases as the test weight decreases, resulting in tens of degrees. In the case of evaluating a thin film having a thickness of about nm, its resonance frequency becomes equal to the resonance frequency of the load mechanism. Therefore, with these measuring instruments, sufficient performance cannot be obtained even if the conventional vibration isolator is used.
【０００６】[0006]
【発明が解決しようとする課題】上記のように従来のパ
ッシブ型の除振装置では、共振周波数を低く設定するこ
とに限界があり、充分な除振性能が得られないという問
題点があった。As described above, in the conventional passive type vibration isolation device, there is a limit in setting the resonance frequency to a low level, and there is a problem that sufficient vibration isolation performance cannot be obtained. .
【０００７】本発明はかかる問題点を解決するためにな
されたものであり、簡単な構成で除振面の共振周波数を
低くでき、サブナノメートルオーダーの除振性能が得ら
れるアクティブ型の除振装置を提供することを目的とし
ている。The present invention has been made to solve the above problems, and is an active type vibration isolator capable of lowering the resonance frequency of the vibration isolating surface with a simple structure and obtaining vibration isolation performance on the order of sub-nanometers. Is intended to provide.
【０００８】[0008]
【課題を解決するための手段】本発明に係わる除振装置
は、除振面と床面との間をアクチュエータで接続すると
共に、除振面に緩衝機構を介して重錘を取り付け、床面
振動に対しては重錘と除振面との相対変位を計測し、こ
の相対変位を所定の伝達関数を持たせてアクチュエータ
に伝達し、該アクチュエータを駆動して除振面の変位を
フィードバック制御する構成を特徴とする。A vibration isolator according to the present invention has a vibration isolation surface and a floor surface connected by an actuator, and a weight is attached to the vibration isolation surface via a cushioning mechanism. For vibration, the relative displacement between the weight and the vibration isolation surface is measured, this relative displacement is transmitted to the actuator with a predetermined transfer function, and the actuator is driven to feedback control the displacement of the vibration isolation surface. It is characterized by the configuration.
【０００９】[0009]
【実施例】以下、本発明の原理を説明する。図１は本発
明の除振装置の動作原理を説明するための模式図であ
り、図において、１は床面、２は除振面、３は質量ｍの
重錘、４は定数ｋのばね、５は減衰係数ｃのダンパ、６
はフィードバック制御用のアクチュエータである。図１
に模式的に示す除振装置において、床面に振動Ｐが作用
した場合の床面１の変位をｘ2 ，重錘３の変位をｘ0 ，
除振面２の変位をｘ1 とすると、除振面２に対する重錘
の変位量はｘ0 −ｘ1 となり、除振面２の変位ｘ1 を補
正するアクチュエータ６でフィードバックする変位量は
ｘ1 −ｘ2 となり、伝達関数をＡすると、ｘ1 −ｘ2 ＝
Ａ（ｘ0 −ｘ1 ）・・・数式（５）の関係になる。EXAMPLES The principle of the present invention will be described below. FIG. 1 is a schematic diagram for explaining the operation principle of the vibration isolator of the present invention. In the figure, 1 is a floor surface, 2 is a vibration isolation surface, 3 is a weight having a mass of m, and 4 is a spring having a constant k. 5 is a damper having a damping coefficient c, 6
Is an actuator for feedback control. FIG.
In the vibration isolator schematically shown in FIG. 2 , the displacement of the floor surface 1 when the vibration P acts on the floor surface is x 2 , the displacement of the weight 3 is x 0 ,
When the displacement of the vibration isolation surface 2 is x 1 , the displacement amount of the weight with respect to the vibration isolation surface 2 is x 0 −x 1 , and the displacement amount fed back by the actuator 6 for correcting the displacement x 1 of the vibration isolation surface 2 is x. 1 −x 2 and the transfer function is A, x 1 −x 2 =
A (x 0 −x 1 ) ... Equation (5).
【００１０】また、重錘３と除振面２との間の運動方程
式は上述の数式（１）と同様な下記数式（６）で表すこ
とができる。The equation of motion between the weight 3 and the vibration isolation surface 2 can be expressed by the following equation (6) similar to the above equation (1).
【数４】 そして、数式（５），数式（６）の両辺をラプラス変換
して下記数式（７），（８）を得る。[Equation 4] Then, both sides of the equations (5) and (6) are Laplace transformed to obtain the following equations (7) and (8).
【数５】 なお、大文字の記号はラプラス変換されたものを表す。
次に数式（７），数式（８）を連立させてＸ0 を消去
し、除振面の変位Ｘ1 を床面の変位Ｘ2 で表すと、下記
数式（９）となり、振動周波数の応答特性は、ｓ＝ｊω
とおくことにより、下記数式（１０），数式（１１）と
なる。(Equation 5) The capital letters represent the Laplace-transformed ones.
Next, the equations (7) and (8) are combined to eliminate X 0 , and when the displacement X 1 of the vibration isolation surface is represented by the displacement X 2 of the floor surface, the following equation (9) is obtained, and the vibration frequency response The characteristic is s = jω
Then, the following mathematical expressions (10) and (11) are obtained.
【数６】 (Equation 6)
【００１１】この数式（１１）と上述の数式（４）とを
比較すれば明らかなように、本発明の除振装置は共振周
波数を１／√（１＋Ａ）と低くでき、従来の装置の共振
周波数付近は極めて小さな減衰率となり、除振性能の高
い除振装置が得られる。図５の曲線１１は、上述の数式
（１１）を ζ＝ｃ／ｍ＝２， Ａ＝９ とした場合の
本発明の除振装置の振動周波数応答特性を示す。As is clear from the comparison between this equation (11) and the above equation (4), the vibration isolation device of the present invention can reduce the resonance frequency to 1 / √ (1 + A), and the resonance of the conventional device. The damping ratio is extremely small near the frequency, and a vibration isolation device with high vibration isolation performance can be obtained. A curve 11 in FIG. 5 shows a vibration frequency response characteristic of the vibration isolator of the present invention in the case where ζ = c / m = 2 and A = 9 in Expression (11) described above.
【００１２】図２は、本発明の除振装置の構成の一実施
例を示す図であり、図１と同一符号は同一又は相当部分
を示し、１６は圧電素子を用いたアクチュエータ、１７
は除振面２と重錘３の相対変位を計測する変位計であ
る。使用するアクチュエータ６はフィードバック制御が
迅速に行える圧電素子を用いたアクチュエータ１６を使
用するのが望ましく、また、変位計１７には、サブナノ
メートルのオーダーで変位を計測できるものであれば、
どのようなものでも良いが、例えば被測定面に照射した
光の反射光量が被測定面の変位によって変化する現象を
利用する光ファイバを用いた反射光電方式の変位計を使
用することができる。また、本願出願人らが１９９３年
度精密工学会秋季大会学，術講演会，講演論文集（第３
分冊）あるいは特願平６−２３０９６号「微小変位測定
装置」で開示した照射用光源に交流変調電力を給電して
所定期間で光度変化させ、受光した反射光を電気信号に
変換して交流増幅することで増幅時のドリフトを低減さ
せる手段を備えた変位計を使用しても良い。FIG. 2 is a diagram showing an embodiment of the structure of the vibration isolator of the present invention. The same reference numerals as those in FIG. 1 denote the same or corresponding parts, 16 is an actuator using a piezoelectric element, and 17 is an actuator.
Is a displacement meter that measures the relative displacement between the vibration isolation surface 2 and the weight 3. As the actuator 6 to be used, it is desirable to use an actuator 16 using a piezoelectric element capable of quick feedback control. Further, if the displacement gauge 17 is capable of measuring displacement on the order of sub-nanometers,
Any type may be used, but for example, a reflection photoelectric type displacement meter using an optical fiber that utilizes a phenomenon in which the amount of light reflected on the surface to be measured changes depending on the displacement of the surface to be measured can be used. In addition, applicants of the present application, the 1993 Autumn Meeting of Precision Engineering, Annual Meeting, Technical Lecture, Proceedings (3rd
Separate volume) or Japanese Patent Application No. 6-23096 "Micro displacement measuring device", AC modulation power is supplied to the irradiation light source to change the luminous intensity in a predetermined period, and the received reflected light is converted into an electric signal for AC amplification. By doing so, a displacement gauge provided with a means for reducing the drift at the time of amplification may be used.
【００１３】なお、アクテイブ型の除振装置の先行技術
としては、図３に示すような装置が精密防振ハンドブッ
クに開示されているが、この装置は定盤にリニアモータ
等のアクチュエータを介して補助質量を装着し、定盤の
振動その他の変数を検出してこれをアクチュエータにフ
ィードバックすることで除振を行う装置であり、原理的
には床振動による加振力と等しい力を、補助質量の加速
度によって得ようとするものであり、変位を制御する本
発明の除振装置とは本質的に異なる。As a prior art of an active type vibration isolation device, a device as shown in FIG. 3 is disclosed in the precision vibration isolation handbook, but this device is mounted on a surface plate via an actuator such as a linear motor. This is a device that mounts an auxiliary mass, detects vibration of the surface plate and other variables, and feeds this back to the actuator to perform vibration isolation.In principle, a force equal to the vibration force due to floor vibration is applied to the auxiliary mass. The vibration isolation device of the present invention, which controls the displacement, is essentially different from the vibration isolation device of the present invention.
【００１４】[0014]
【発明の効果】以上説明したように本発明の除振装置
は、重錘と除振面の相対変位をサブナノメートルオーダ
ーで計測し、所定の伝達関数を持たせて除振面の変位を
アクチュエータでフィードバック制御することにより、
除振面の共振周波数を低くでき、除振性能の高い装置が
得られるという効果がある。As described above, the vibration isolator of the present invention measures the relative displacement between the weight and the vibration isolation surface on the order of sub-nanometers, and imparts a predetermined transfer function to the displacement of the vibration isolation surface as an actuator. By feedback control with
There is an effect that the resonance frequency of the vibration isolation surface can be lowered and a device having high vibration isolation performance can be obtained.
【図１】本発明の装置の動作原理を説明するための図で
ある。FIG. 1 is a diagram for explaining the operation principle of the device of the present invention.
【図２】本発明の一実施例を示す図である。FIG. 2 is a diagram showing an embodiment of the present invention.
【図３】アクティブ型の除振装置の一例を示す図であ
る。FIG. 3 is a diagram showing an example of an active type vibration isolation device.
【図４】従来の除振装置の動作原理を説明するための図
である。FIG. 4 is a diagram for explaining the operation principle of a conventional vibration isolation device.
【図５】除振面の振動周波数応答特性を示す図である。FIG. 5 is a diagram showing a vibration frequency response characteristic of a vibration isolation surface.
１ 床面 ２ 除振面 ３ 重錘 ４ ばね ５ ダンパ ６ アクチュエータ １６ 圧電素子を用いたアクチュエータ １７ 変位計 1 Floor Surface 2 Vibration Isolation Surface 3 Weight 4 Spring 5 Damper 6 Actuator 16 Actuator Using Piezoelectric Element 17 Displacement Meter
Claims (4)
接続すると共に、除振面に緩衝機構を介して重錘を取り
付け、床面振動に対しては重錘と除振面との相対変位を
計測し、この相対変位を所定の伝達関数を持たせてアク
チュエータに伝達し、該アクチュエータで除振面の変位
をフィードバック制御する構成を特徴とする除振装置。1. A vibration isolating surface and a floor surface are connected by an actuator, and a weight is attached to the vibration isolating surface via a cushioning mechanism to prevent vibration of the floor surface between the weight and the vibration isolating surface. An anti-vibration device characterized by measuring relative displacement, transmitting the relative displacement to an actuator with a predetermined transfer function, and performing feedback control of the displacement of the anti-vibration surface by the actuator.
を用いることを特徴とする請求項第１項記載の除振装
置。2. The vibration isolator according to claim 1, wherein a piezoelectric element is used as a drive source of the actuator.
る手段には、被測定面に照射した光の反射光量が被測定
面の変位によって変化する現象を利用する光ファイバを
用いた反射光電方式の変位計を使用することを特徴とす
る請求項第１項記載の除振装置。3. The means for measuring the relative displacement between the weight and the vibration isolation surface uses an optical fiber that utilizes the phenomenon that the amount of light reflected on the surface to be measured changes with the displacement of the surface to be measured. The anti-vibration device according to claim 1, characterized in that a reflection photoelectric displacement meter is used.
電力を給電して所定期間で光度変化させ、受光した反射
光を電気信号に変換して交流増幅することで増幅時のド
リフトを低減させる手段を備えた変位計を使用すること
を特徴とする請求項第３項記載の除振装置。4. The displacement gauge is supplied with AC modulation power to an irradiation light source to change the luminous intensity in a predetermined period, and the received reflected light is converted into an electric signal and AC-amplified so that drift during amplification is prevented. 4. The vibration isolator according to claim 3, wherein a displacement gauge provided with a means for reducing the vibration is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4790495A JPH08219230A (en) | 1995-02-14 | 1995-02-14 | Vibration isolator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4790495A JPH08219230A (en) | 1995-02-14 | 1995-02-14 | Vibration isolator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08219230A true JPH08219230A (en) | 1996-08-27 |
Family
ID=12788383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4790495A Pending JPH08219230A (en) | 1995-02-14 | 1995-02-14 | Vibration isolator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH08219230A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1097292A1 (en) * | 1998-07-14 | 2001-05-09 | Newport Corporation | Active isolation module |
| WO2005024266A1 (en) * | 2003-09-05 | 2005-03-17 | Koninklijke Philips Electronics N.V. | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| JP2007135925A (en) * | 2005-11-18 | 2007-06-07 | Hiroshima Univ | Foreign substance detecting method and apparatus |
| CN100465473C (en) * | 2003-09-05 | 2009-03-04 | 皇家飞利浦电子股份有限公司 | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| JP2010085373A (en) * | 2008-10-02 | 2010-04-15 | Takenaka Komuten Co Ltd | Device, method, and program for detecting frequency of vibrations and antivibration apparatus |
| JP2017517874A (en) * | 2014-04-02 | 2017-06-29 | メトリックス・リミテッドＭｅｔｒｙｘ Ｌｉｍｉｔｅｄ | Semiconductor wafer weight measuring apparatus and method |
-
1995
- 1995-02-14 JP JP4790495A patent/JPH08219230A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1097292A1 (en) * | 1998-07-14 | 2001-05-09 | Newport Corporation | Active isolation module |
| EP1097292A4 (en) * | 1998-07-14 | 2004-08-25 | Newport Corp | Active isolation module |
| WO2005024266A1 (en) * | 2003-09-05 | 2005-03-17 | Koninklijke Philips Electronics N.V. | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| CN100465473C (en) * | 2003-09-05 | 2009-03-04 | 皇家飞利浦电子股份有限公司 | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| US8091694B2 (en) | 2003-09-05 | 2012-01-10 | Koninklijke Philips Electronics N.V. | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| US8915340B2 (en) | 2003-09-05 | 2014-12-23 | Koninklijke Philips N.V. | Actuator arrangement for active vibration isolation comprising an inertial reference mass |
| JP2007135925A (en) * | 2005-11-18 | 2007-06-07 | Hiroshima Univ | Foreign substance detecting method and apparatus |
| JP2010085373A (en) * | 2008-10-02 | 2010-04-15 | Takenaka Komuten Co Ltd | Device, method, and program for detecting frequency of vibrations and antivibration apparatus |
| JP2017517874A (en) * | 2014-04-02 | 2017-06-29 | メトリックス・リミテッドＭｅｔｒｙｘ Ｌｉｍｉｔｅｄ | Semiconductor wafer weight measuring apparatus and method |
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