JPH0820746A - Composition and method for forming inorganic coating film and article coated with inorganic coating film - Google Patents
Composition and method for forming inorganic coating film and article coated with inorganic coating filmInfo
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- JPH0820746A JPH0820746A JP17970394A JP17970394A JPH0820746A JP H0820746 A JPH0820746 A JP H0820746A JP 17970394 A JP17970394 A JP 17970394A JP 17970394 A JP17970394 A JP 17970394A JP H0820746 A JPH0820746 A JP H0820746A
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電気絶縁性、耐食性、
耐薬品性、耐熱性、耐摩耗性を有する透明な無機系被膜
を形成する組成物とその無機系被膜の形成方法および該
被膜を形成してなる物品に関するものである。BACKGROUND OF THE INVENTION The present invention relates to electrical insulation, corrosion resistance,
The present invention relates to a composition for forming a transparent inorganic coating having chemical resistance, heat resistance, and abrasion resistance, a method for forming the inorganic coating, and an article formed with the coating.
【０００２】[0002]
【従来の技術】従来、シリコン樹脂を主成分とする無機
系被膜コーティング組成物を各種基材に塗布して乾燥し
た後、数１００℃で熱処理し、無機系被膜とすることは
公知である。ここで、シリコン樹脂とは、シロキサン単
位がＲ4 −ｎＳｉＯ n/2で示され、Ｒはメチル基、エチ
ル基、プロピル基、ビニル基、フェニル基等で示され、
ｎは１から４の整数で示される重合物を意味する。2. Description of the Related Art Conventionally, it is known that an inorganic coating film composition containing a silicone resin as a main component is applied to various substrates, dried and then heat treated at several 100 ° C. to form an inorganic coating film. Here, the silicone resin means that the siloxane unit is represented by R 4 -nSiO n / 2, R is represented by a methyl group, an ethyl group, a propyl group, a vinyl group, a phenyl group, or the like.
n means a polymer represented by an integer of 1 to 4.
【０００３】[0003]
【発明が解決しようとする課題】例えば、フェニルシリ
コン樹脂（─Ｓｉ（Ｃ6 Ｈ5 ）2 ―Ｏ―) n は、これを
キシレンのごとき溶剤に溶解し、金属板などに塗布し、
８０℃付近で乾燥の後、２５０℃付近の温度で数時間熱
処理を行うことによって、耐溶剤性、耐熱性などの性質
をもつ透明被膜の形成が可能である。さらに、この系に
アミンの如き触媒を添加することによって硬化温度を１
５０℃付近まで低下させることも可能である。しかし、
室温で被膜を形成することは不可能である。For example, phenyl silicone resin (--Si (C 6 H 5 ) 2 --O--) n is dissolved in a solvent such as xylene and applied to a metal plate,
It is possible to form a transparent film having properties such as solvent resistance and heat resistance by performing heat treatment at a temperature of around 250 ° C. for several hours after drying at around 80 ° C. Furthermore, by adding a catalyst such as amine to this system, the curing temperature can be increased to 1
It is also possible to lower the temperature to around 50 ° C. But,
It is impossible to form a film at room temperature.
【０００４】また、シリコン樹脂に有機チタネート系硬
化剤を配合する方法によれば、室温で被膜を形成するこ
とが可能であるが、急激な硬化反応のため被膜にクラッ
クが発生したり、被膜の基材からの剥離が起こるという
問題がある。Further, according to the method of blending the organic titanate type curing agent with the silicone resin, it is possible to form the coating at room temperature, but cracks may occur in the coating due to the rapid curing reaction, or the coating may not be formed. There is a problem that peeling from the base material occurs.
【０００５】そこで本発明は、室温でも硬化可能であ
り、かつ、基材との密着性に優れた無機系被膜形成用組
成物と、その組成物を用いた被膜の形成方法および同被
膜を形成した物品を得ることを目的に提案されたもの
で、発明者は、シリコン樹脂に硬化触媒として有機変性
スメクタイトを配合することにより上記の問題が解決で
きることを見いだし本発明を完成するに至った。Therefore, the present invention provides a composition for forming an inorganic film which is curable even at room temperature and has excellent adhesion to a substrate, a method for forming a film using the composition, and a film for forming the same. The present inventor has completed the present invention by discovering that the above problems can be solved by adding an organically modified smectite as a curing catalyst to a silicone resin.
【０００６】[0006]
【課題を解決するための手段】本発明無機系被膜形成用
組成物はシリコン樹脂と有機変性スメクタイトを主成分
とする。本発明無機系被膜形成方法は、上記無機系被膜
形成用組成物を、基材に塗布して乾燥した後、室温に放
置するかあるいは加熱処理することを内容とする。ま
た、本発明無機系被膜形成物品は、上記組成物を、基材
たる当該物品の表面に塗布し乾燥した後、室温に放置す
るかあるいは加熱処理することによって得たものであ
る。The composition for forming an inorganic film of the present invention contains a silicone resin and an organically modified smectite as main components. The method for forming an inorganic coating film of the present invention comprises coating the substrate with the composition for forming an inorganic coating film, drying the composition, and then leaving the composition at room temperature or by heat treatment. Further, the inorganic film-forming article of the present invention is obtained by applying the composition to the surface of the article as a base material, drying it, and then leaving it at room temperature or by heat treatment.
【０００７】ここでシリコン樹脂とは、シロキサン単位
がＲ4 −ｎＳｉＯ n/2で示され、Ｒはメチル基、エチル
基、プロピル基、ビニル基、フェニル基等で示され、ｎ
は１から４の整数で示される重合物が用いられる。本発
明に使用される市販のシリコン樹脂の例としては、信越
化学株式会社製品のＫＲ−２７２、ＫＲ−２７５、ＫＲ
−２４０、ＫＲ−２２１、東レ・ダウコーニング・シリ
コーン株式会社製品のＳＲ−２１１５、ＳＲ−２１４
５、ＳＲ−２１０４、東芝シリコーン株式会社製品のＴ
ＳＲ−１１６、ＴＳＲ−１１７、ＴＳＲ−１１８などが
ある。The term "silicon resin" as used herein means that the siloxane unit is represented by R 4 -nSiO n / 2, R is represented by methyl group, ethyl group, propyl group, vinyl group, phenyl group, etc.
Is a polymer represented by an integer of 1 to 4. Examples of commercially available silicone resins used in the present invention include KR-272, KR-275, and KR manufactured by Shin-Etsu Chemical Co., Ltd.
-240, KR-221, SR-2115, SR-214 manufactured by Toray Dow Corning Silicone Co., Ltd.
5, SR-2104, T of Toshiba Silicone Co., Ltd.
There are SR-116, TSR-117, TSR-118 and the like.
【０００８】また、スメクタイトとは、膨潤性層状粘土
鉱物として知られるベントナイト系鉱物の一種で、有機
変性スメクタイトはスメクタイトに、例えば、ジオクタ
デシルジメチルアンモニウム塩のようなカチオン系界面
活性剤をイオン交換で作用させたものである。本発明に
使用される市販の有機変性スメクタイトの例としては、
コープケミカル株式会社製品の合成スメクタイトＳＡシ
リーズがある。[0008] Smectite is a kind of bentonite mineral known as swelling layered clay mineral, and organically modified smectite is smectite, for example, a cationic surfactant such as dioctadecyldimethylammonium salt is ion-exchanged. It was made to act. Examples of commercially available organically modified smectites used in the present invention include:
There is a synthetic smectite SA series manufactured by Coop Chemical Co., Ltd.
【０００９】本発明において、有機変性スメクタイトを
シリコン樹脂に添加する場合は、有機溶剤、たとえば、
トルエン、キシレン、またはその混合物が使用できる。
また、本発明の無機系被膜形成用組成物を基材に塗布す
るに当たっては、組成物を上記溶剤で希釈して用いるこ
とができる。塗布液の濃度は塗布方法により適宜変更で
きる。In the present invention, when the organically modified smectite is added to the silicone resin, an organic solvent such as, for example,
Toluene, xylene, or mixtures thereof can be used.
In applying the composition for forming an inorganic film of the present invention to a substrate, the composition can be diluted with the above solvent and used. The concentration of the coating liquid can be appropriately changed depending on the coating method.
【００１０】また、シリコン樹脂と有機変性スメクタイ
トの比率は、重量比で１００／０．０５〜１００／５
０、好ましくは１００／０．１〜１００／１０がよい。
この比率より有機変性スメクタイトが少ないと硬化に高
い温度が必要になり好ましくない。また、この比率より
有機変性スメクタイトが多くなると有機変性スメクタイ
ト添加効果が飽和してくるし、組成物自身の安定性が悪
くなり、さらに、増粘してゲル状物となり塗布しても均
一な膜を形成することができにくくなるので好ましくな
い。The weight ratio of silicone resin to organically modified smectite is 100 / 0.05 to 100/5.
0, preferably 100 / 0.1 to 100/10 is good.
If the organically modified smectite is less than this ratio, a high temperature is required for curing, which is not preferable. In addition, if the amount of organically modified smectite is larger than this ratio, the effect of adding organically modified smectite will be saturated, the stability of the composition itself will deteriorate, and further, a thick film will form a gel-like substance, and a uniform film will be formed even when applied It is not preferable because it becomes difficult to form.
【００１１】本発明に用いられる基材としては、例え
ば、ステンレス、鉄、アルミニウム、真鍮などの金属、
レンガ、コンクリート、スレート、アルミナ基板などの
セラミックスあるいはガラス、石英などのような耐熱性
基材、または、木材、紙、プラスチックスなどの非耐熱
性基材があげられる。Examples of the substrate used in the present invention include metals such as stainless steel, iron, aluminum and brass,
Examples thereof include ceramics such as brick, concrete, slate and alumina substrates, or heat resistant substrates such as glass and quartz, and non-heat resistant substrates such as wood, paper and plastics.
【００１２】無機系被膜形成用組成物の上記各種の基材
への塗布には、浸漬、ロールコート、スプレー、スピン
コート、刷毛塗り、印刷などの任意の方法を採用でき
る。塗布乾燥後の室温放置は数時間〜数１０時間が硬化
に適当であり、また、その硬化時間を短縮するには１５
０℃以下の温度で数時間以内の加熱をすることが適切
で、これによって所期の透明な無機系被膜を形成するこ
とができる。For coating the above-mentioned various substrates with the inorganic film-forming composition, any method such as dipping, roll coating, spraying, spin coating, brush coating, and printing can be adopted. After coating and drying, leaving at room temperature is suitable for curing for several hours to several tens of hours, and in order to shorten the curing time, 15
It is suitable to heat at a temperature of 0 ° C. or lower for several hours or less, whereby a desired transparent inorganic film can be formed.
【００１３】[0013]
【作用】本発明無機系被膜形成用組成物は、シリコン樹
脂と有機変性スメクタイトとを主成分とするから、室温
で被膜を形成することができ、かつ、その被膜は基材と
の密着性に優れ剥離を起こさない。Since the composition for forming an inorganic coating film of the present invention contains silicon resin and organic modified smectite as main components, the coating film can be formed at room temperature and the coating film has excellent adhesion to the substrate. Excellent peeling does not occur.
【００１４】[0014]
【実施例】以下、本発明を実施例について詳しく説明す
る。EXAMPLES The present invention will be described in detail below with reference to examples.
【００１５】実施例１ 固形分６０％を含むフェニルシリコン樹脂（信越化学工
業株式会社製品のＫＲ−３１１および東レ・ダウコーニ
ング・シリコーン株式会社製品のＳＨ−８０４）１００
ｇを撹拌しつつ、合成スメクタイトＳＡＮ０．５ｇをト
ルエン２０ｇに分散したものを、徐々に添加し、室温で
少なくとも２４時間撹拌して無機系被膜形成用組成物を
得た。Example 1 Phenyl silicone resin containing 60% solids (KR-311 manufactured by Shin-Etsu Chemical Co., Ltd. and SH-804 manufactured by Toray Dow Corning Silicone Co., Ltd.) 100
While agitating g, 0.5 g of synthetic smectite SAN dispersed in 20 g of toluene was gradually added and agitated at room temperature for at least 24 hours to obtain an inorganic film-forming composition.
【００１６】この組成物を合成樹脂製化粧タイル（基
材）にスプレー塗布し、２５℃で３０分間乾燥させ、さ
らに室温で２４時間静置して約５ミクロンの無機系被膜
を形成させた。This composition was spray-coated on a synthetic resin decorative tile (base material), dried at 25 ° C. for 30 minutes, and allowed to stand still at room temperature for 24 hours to form an inorganic coating film of about 5 μm.
【００１７】得られた塗膜は、無色で透明な被膜で、表
面をキシレン溶剤で拭いても溶解せず何等のキズも付か
ず、また、沸騰水中に２４０時間放置しても被膜に剥
離、白濁など何等の変化も認められなかった。さらにま
た、これにガスライターなどのバーナーの炎を近づけて
も表面が変色せず、燃焼も起こらなかった。なお、かか
る被膜を施していない上記基材の表面を、キシレン溶剤
で拭いたところ膨潤が認められ、また、バーナーで発
煙、燃焼を生じた。The coating film obtained was a colorless and transparent coating film, which did not dissolve even if the surface was wiped with a xylene solvent and did not cause any scratches. Also, the coating film was peeled off even after standing in boiling water for 240 hours. No change such as cloudiness was observed. Furthermore, when the flame of a burner such as a gas lighter was brought close to this, the surface did not discolor and combustion did not occur. When the surface of the base material not coated with such a film was wiped with a xylene solvent, swelling was observed, and smoking and burning were caused by a burner.
【００１８】比較例１ 実施例１において、硬化剤としてブチルチタネート１ｇ
をキシレン２０ｇに希釈したものを用い、実施例１と同
様な手順で得た無機系被膜は、やや黄色がかった透明被
膜であるが、キシレン溶剤による拭き取りで膨潤が認め
られ、バーナーで発煙、燃焼を生じた。Comparative Example 1 In Example 1, 1 g of butyl titanate as a curing agent
Was diluted to 20 g of xylene, and the inorganic coating obtained by the same procedure as in Example 1 was a slightly yellowish transparent coating, but swelling was observed by wiping with a xylene solvent, and smoke and burn with a burner. Occurred.
【００１９】実施例２ 固形分５０％を含むメチルフェニルシリコン樹脂を撹拌
しつつ、合成スメクタイトＳＡＮ０．５ｇをトルエン２
０ｇに分散したものを、徐々に添加し、室温で少なくと
も２４時間撹拌して無機系被膜形成用組成物を得た。Example 2 0.5 g of synthetic smectite SAN was mixed with toluene 2 while stirring methylphenylsilicone resin containing 50% of solid content.
What was dispersed in 0 g was gradually added and stirred at room temperature for at least 24 hours to obtain an inorganic film-forming composition.
【００２０】ガラス板を基材とし、これに上記組成物を
浸漬により塗布し、２５℃で３０分乾燥し、さらに、１
５０℃で２時間加熱し、約２ミクロンの無機系被膜を形
成させた。A glass plate is used as a base material, and the above composition is applied thereto by dipping and dried at 25 ° C. for 30 minutes.
It heated at 50 degreeC for 2 hours, and formed the inorganic type coating film of about 2 micron.
【００２１】得られた塗膜は、無色透明被膜で、表面を
キシレン溶剤で拭いても溶解せず何等のキズも付かず、
また、沸騰水中に２４０時間放置しても被膜に剥離、白
濁など何等の変化も認められなかった。さらにまた、こ
れにガスライターなどのバーナーの炎を近づけても表面
に何等の変化が起こらなかった。The resulting coating film was a colorless and transparent coating film, which did not dissolve even if the surface was wiped with a xylene solvent and did not have any scratches.
Moreover, no change such as peeling or clouding of the film was observed even after standing in boiling water for 240 hours. Furthermore, even if the flame of a burner such as a gas lighter was brought close to this, no change occurred on the surface.
【００２２】実施例３ （１） 固形分５０％を含むメチルフェニルシリコン樹脂 １０重量部 （２） ベントナイト １０重量部 （３） 石英粉３５０メッシュパス ４０重量部 （４） 石英粒６０−１００ ２０重量部 （５） 石英粒１００−１５０ ２０重量部Example 3 (1) Methylphenyl silicone resin containing 50% solids 10 parts by weight (2) Bentonite 10 parts by weight (3) Quartz powder 350 mesh pass 40 parts by weight (4) Quartz grains 60-100 20 parts by weight Parts (5) Quartz grains 100-150 20 parts by weight
【００２３】（１）と（２）を乳鉢に入れて混合し、
（３）−（４）−（５）と順次に加えて撹拌し湿り気の
ある混合粉体を得た。これを配合粉体（ａ）とする。合
成スメクタイトＳＡＮ０．５ｇをトルエン２０ｇに分散
したものを除々に添加し、室温で少なくとも２４時間撹
拌して得た濃液状物を（ｂ）とする。配合粉体（ａ）８
００ｇに濃液状物（ｂ）２００ｇを加えて混合し濃厚ペ
ーストを得た。Put (1) and (2) in a mortar and mix,
(3)-(4)-(5) were sequentially added and stirred to obtain a moist mixed powder. This is designated as compounded powder (a). A mixture of 0.5 g of synthetic smectite SAN dispersed in 20 g of toluene was gradually added, and the concentrated liquid obtained by stirring at room temperature for at least 24 hours was designated as (b). Compound powder (a) 8
To 00 g, 200 g of the concentrated liquid substance (b) was added and mixed to obtain a thick paste.
【００２４】このペーストをモルタルガン等によりスレ
ートまたはコンクリートブロック等に吹き付けて５mm位
の厚みの塗膜を得た。この塗膜は、６〜１２時間常温放
置後、硬化が始まり２４時間後には完全に硬化した無機
質膜となった。この膜は、電気的に絶縁性で、耐蝕性、
耐薬品性、耐熱性、耐磨耗性の硬い不燃性塗膜であっ
た。The paste was sprayed onto a slate or a concrete block with a mortar gun to obtain a coating film having a thickness of about 5 mm. This coating film began to cure after being left at room temperature for 6 to 12 hours, and became a completely cured inorganic film after 24 hours. This film is electrically insulating, corrosion resistant,
It was a hard, non-combustible coating with chemical resistance, heat resistance, and abrasion resistance.
【００２５】[0025]
【発明の効果】以上述べたところから明らかなように、
本発明無機系被膜形成用組成物はシリコン樹脂と有機変
性スメクタイトとを主成分とするから、これを各種の基
材に塗布して乾燥した後、所要時間、室温に放置するか
あるいは加熱処理することによって、被膜を容易に形成
することができ、かつ、その被膜は基材との密着性に優
れ剥離を起こさない。As is apparent from the above description,
Since the composition for forming an inorganic film of the present invention contains a silicone resin and an organic modified smectite as main components, it is applied to various base materials and dried, and then left at room temperature for a required time or heat-treated. As a result, the coating film can be easily formed, and the coating film has excellent adhesion to the substrate and does not cause peeling.
【００２６】すなわち、本発明による無機系被膜は、ス
テンレス、鉄、アルミニウム、真鍮などの金属、レン
ガ、コンクリート、スレート、アルミナ基板などのセラ
ミックスあるいはガラス、石英などのような耐熱性基
材、または、木材、紙、プラスチックスなどの非耐熱性
基材に、塗布、乾燥の後、室温ないし比較的低い温度で
の熱処理によって容易に形成され、当該基材に緻密な被
膜をもった表面保護機能を付与するので工業的に極めて
有用である。That is, the inorganic coating film according to the present invention is a metal such as stainless steel, iron, aluminum or brass, ceramics such as brick, concrete, slate or alumina substrate, or a heat resistant substrate such as glass or quartz, or A non-heat resistant substrate such as wood, paper, plastics, etc. can be easily formed by coating, drying, and then heat-treating at room temperature or a relatively low temperature. Since it is added, it is industrially extremely useful.
Claims (3)
主成分とする無機系被膜形成用組成物。1. A composition for forming an inorganic film, which comprises a silicone resin and an organically modified smectite as main components.
主成分とする無機系被膜形成用組成物を、基材に塗布し
て乾燥した後、室温に放置するかあるいは加熱処理する
ことを特徴とする無機系被膜形成方法。2. A composition for forming an inorganic film comprising a silicone resin and an organically modified smectite as main components, which is applied to a substrate and dried, and then left at room temperature or heat-treated. Inorganic film forming method.
主成分とする無機系被膜形成用組成物を、塗布して乾燥
した後、室温に放置するかあるいは加熱処理することに
よって無機系被膜を形成してなることを特徴とする無機
系被膜形成物品。3. An inorganic coating film-forming composition comprising a silicone resin and an organically modified smectite as main components is applied and dried, and then left at room temperature or heat-treated to form an inorganic coating film. An inorganic film-forming article characterized by comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6179703A JP2678268B2 (en) | 1994-07-08 | 1994-07-08 | Inorganic film forming composition, inorganic film forming method, and inorganic film forming article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6179703A JP2678268B2 (en) | 1994-07-08 | 1994-07-08 | Inorganic film forming composition, inorganic film forming method, and inorganic film forming article |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0820746A true JPH0820746A (en) | 1996-01-23 |
| JP2678268B2 JP2678268B2 (en) | 1997-11-17 |
Family
ID=16070405
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6179703A Expired - Fee Related JP2678268B2 (en) | 1994-07-08 | 1994-07-08 | Inorganic film forming composition, inorganic film forming method, and inorganic film forming article |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2678268B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH069928A (en) * | 1992-06-26 | 1994-01-18 | Okitsumo Kk | Heat-resistant polysiloxane coating composition |
-
1994
- 1994-07-08 JP JP6179703A patent/JP2678268B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH069928A (en) * | 1992-06-26 | 1994-01-18 | Okitsumo Kk | Heat-resistant polysiloxane coating composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2678268B2 (en) | 1997-11-17 |
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