JPH08186022A - Magnetic multilayer film, manufacture thereof and photomagnetic recording medium - Google Patents
Magnetic multilayer film, manufacture thereof and photomagnetic recording mediumInfo
- Publication number
- JPH08186022A JPH08186022A JP33918794A JP33918794A JPH08186022A JP H08186022 A JPH08186022 A JP H08186022A JP 33918794 A JP33918794 A JP 33918794A JP 33918794 A JP33918794 A JP 33918794A JP H08186022 A JPH08186022 A JP H08186022A
- Authority
- JP
- Japan
- Prior art keywords
- multilayer film
- film
- magnetic multilayer
- rotation angle
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/325—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being noble metal
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、磁気光学カー回転を示
す磁性多層膜およびその製造方法と、この磁性多層膜を
光磁気記録膜として有する光磁気記録媒体とに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic multilayer film exhibiting magneto-optical Kerr rotation, a method for manufacturing the same, and a magneto-optical recording medium having the magnetic multilayer film as a magneto-optical recording film.
【０００２】[0002]
【従来の技術】異種金属を原子層レベルで交互に積層し
得る今日の薄膜作製技術により、熱平衡状態では存在し
ないような規則的積層構造をもつ多層膜、すなわち金属
人工格子の作製が可能となっている。一方、熱平衡状態
でＬ１0 型規則合金となるＦｅＰｔ合金は、垂直磁気異
方性をもち、大きな磁気光学カー回転が得られるため、
注目されている。2. Description of the Related Art Today's thin film forming technology capable of alternately laminating dissimilar metals at the atomic layer level makes it possible to produce a multilayer film having a regular laminated structure that does not exist in a thermal equilibrium state, that is, a metal artificial lattice. ing. On the other hand, the FePt alloy, which is an L1 0 type ordered alloy in a thermal equilibrium state, has perpendicular magnetic anisotropy and can obtain a large magneto-optical Kerr rotation.
Attention has been paid.
【０００３】Appl.Phys.Lett.62,639(1993) （以下、文
献１）では、スパッタ法で１００℃にて［Ｆｅ（１６Ｍ
Ｌ）／Ｐｔ（１５ＭＬ）］8 薄膜を作製し、４７５℃で
１４時間アニールを施して正方晶ＦｅＰｔ相を形成し、
垂直磁化膜としている。ここで、ＭＬは単原子層を示
し、Ｆｅ（１６ＭＬ）の厚さは２３ A、Ｐｔ（１５Ｍ
Ｌ）の厚さは３０ Aである。この垂直磁化膜は、（００
１）優先配向のＦｅＰｔ規則相を有するものであり、膜
面に垂直な方向の保磁力Ｈｃ⊥が約１．８ kOe（FIG.
４）、実効的な垂直磁気異方性定数が８×１０6 erg/cm
3 以上であることが報告されている。In Appl. Phys. Lett. 62, 639 (1993) (hereinafter referred to as reference 1), the sputtering method [Fe (16M
L) / Pt (15ML)] 8 thin film was prepared and annealed at 475 ° C. for 14 hours to form a tetragonal FePt phase,
It is a perpendicular magnetization film. Here, ML indicates a monoatomic layer, and the thickness of Fe (16ML) is 23 A and Pt (15M).
The thickness of L) is 30 A. This perpendicular magnetization film is (00
1) It has a FePt ordered phase with preferential orientation, and has a coercive force Hc⊥ in the direction perpendicular to the film surface of about 1.8 kOe (FIG.
4), effective perpendicular magnetic anisotropy constant is 8 × 10 6 erg / cm
It has been reported to be 3 or more.
【０００４】しかし、文献１の膜では、Ｘ線回折チャー
ト（FIG.２）の２θ＝４７度の位置にＰｔＦｅ（２０
０）面のピークが認められ、十分な配向性が得られてい
るとはいえない。また、実効的な垂直磁気異方性定数も
十分に大きくはないので、磁化曲線の角形比（残留磁化
Ｍｒ／飽和磁化Ｍｓ）が低い。However, in the film of Document 1, the PtFe (20) is formed at the position of 2θ = 47 degrees in the X-ray diffraction chart (FIG. 2).
A peak on the (0) plane is recognized, and it cannot be said that sufficient orientation is obtained. Moreover, since the effective perpendicular magnetic anisotropy constant is not sufficiently large, the squareness ratio (remanent magnetization Mr / saturation magnetization Ms) of the magnetization curve is low.
【０００５】Appl.Phys.Lett.63,1438(1993)（以下、文
献２）では、厚さ２３ AのＦｅ（００１）と厚さ２９ A
のＰｔ（００１）とからなる積層膜を８層重ねた多層膜
を作製し、アニール後にカー回転角を測定している。こ
の結果を示すFIG.１（ｂ）では、磁界強度と波長６３３
nmでのカー回転角との関係を表わすヒステリシス曲線に
おいて、保磁力（カー回転角が０度となる磁界強度）が
４ kOe、飽和カー回転角が０．６度、残留カー回転角
（磁界強度ゼロでのカー回転角）が０．５度となってい
る。また、この文献には、［Ｆｅ（１ＭＬ）／Ｐｔ（１
ＭＬ）］128 を作製したところ、均質で無秩序な合金と
なり、カー回転角がバルクのＰｔＦｅ無秩序合金と同様
となったことが記載されている。In Appl. Phys. Lett. 63, 1438 (1993) (hereinafter referred to as reference 2), Fe (001) having a thickness of 23 A and thickness 29 A are used.
8 layers of Pt (001) are stacked to form a multilayer film, and the Kerr rotation angle is measured after annealing. In FIG. 1 (b) showing this result, the magnetic field strength and the wavelength 633
In the hysteresis curve showing the relationship with the Kerr rotation angle in nm, the coercive force (magnetic field strength at which the Kerr rotation angle becomes 0 degree) is 4 kOe, the saturation Kerr rotation angle is 0.6 degree, and the residual Kerr rotation angle (magnetic field strength is The car rotation angle at zero) is 0.5 degrees. Further, in this document, [Fe (1ML) / Pt (1
ML)] 128 was produced, and it became a homogeneous and disordered alloy, and the Kerr rotation angle was similar to that of the bulk PtFe disordered alloy.
【０００６】しかし、文献２の膜では、カーループの角
形比（残留カー回転角／飽和カー回転角）が約０．８５
と小さく、カー回転角も十分に大きいとはいえない。ま
た、文献２の膜のＸ線回折チャート｛FIG.１（ａ）｝に
は、文献１の膜のＸ線回折チャート（FIG.２）と同様に
２θ＝４７度の位置にピークが認められる。これは、文
献１の膜と同様にＰｔＦｅ（２００）面のピークである
と考えられるので、やはり十分な配向性が得られている
とはいえない。However, in the film of Document 2, the squareness ratio (residual Kerr rotation angle / saturated Kerr rotation angle) of the Kerr loop is about 0.85.
And the car rotation angle is not large enough. In addition, in the X-ray diffraction chart of the film of FIG. 1 (FIG. 1 (a)), a peak is observed at the position of 2θ = 47 degrees similarly to the X-ray diffraction chart of the film of FIG. 1 (FIG. 2). . It is considered that this is the peak of the PtFe (200) plane as in the film of Document 1, so that it cannot be said that sufficient orientation is obtained.
【０００７】Phys.Rev.B.50,3419(1994)（以下、文献
３）では、ＦｅとＰｔとを超高真空中で共蒸着すること
により、（００１）高配向ＦｅＰｔ規則相をもつ膜が得
られたことが報告されている。５００℃で蒸着されたＦ
ｅ52Ｐｔ48膜では、光子エネルギー２eV（波長６３３n
m）におけるカー回転角が０．８度となっている。Phys. Rev. B.50, 3419 (1994) (hereinafter referred to as Document 3), a film having a (001) highly oriented FePt ordered phase by co-evaporating Fe and Pt in an ultrahigh vacuum. It has been reported that F deposited at 500 ° C
With the e 52 Pt 48 film, the photon energy is 2 eV (wavelength 633 n
The car rotation angle at m) is 0.8 degrees.
【０００８】しかし、文献３の膜では、Ｘ線回折チャー
トにＦｅＰｔ（１１１）面のピークおよびＦｅＰｔ（２
００）面のピークがあり、配向の乱れが認められる。ま
た、文献３では実効的な垂直磁気異方性定数を測定して
いないが、膜面に垂直な方向の保磁力Ｈｃ⊥は約１ kOe
（FIG.２）にすぎず、また、カーループの角形比は約
０．３５（FIG.２）と小さいので、光磁気記録膜として
実用化するには特性が不十分である。However, in the film of Document 3, the peak of FePt (111) plane and FePt (2
There is a peak of (00) plane, and disorder of orientation is recognized. Although the effective perpendicular magnetic anisotropy constant is not measured in Document 3, the coercive force Hc⊥ in the direction perpendicular to the film surface is about 1 kOe.
(FIG. 2) and the squareness ratio of the Kerr loop is as small as about 0.35 (FIG. 2), the characteristics are insufficient for practical use as a magneto-optical recording film.
【０００９】上記のように、従来のＦｅ／Ｐｔ磁性多層
膜では、大きなカー回転角と、カーループの高い角形比
（１．０）と、大きな垂直磁気異方性とを共に得ること
はできていない。また、従来のＦｅ／Ｐｔ多層膜では、
層厚比Ｆｅ／Ｐｔを１／４〜１／３としなければ、カー
ループの角形比が１．０である垂直磁化膜にはならなか
った。しかし、Ｆｅ層が薄いとカー回転角が小さくなっ
てしまうため、層厚比Ｆｅ／Ｐｔをより大きくした場合
にも角形比が１．０となる垂直磁化膜が望まれている。As described above, in the conventional Fe / Pt magnetic multilayer film, it is possible to obtain a large Kerr rotation angle, a high Kerr loop squareness ratio (1.0), and a large perpendicular magnetic anisotropy. Absent. Further, in the conventional Fe / Pt multilayer film,
Unless the layer thickness ratio Fe / Pt was set to 1/4 to 1/3, a perpendicular magnetization film having a Kerr loop squareness ratio of 1.0 could not be obtained. However, if the Fe layer is thin, the Kerr rotation angle becomes small. Therefore, even if the layer thickness ratio Fe / Pt is increased, a perpendicular magnetization film having a squareness ratio of 1.0 is desired.
【００１０】[0010]
【発明が解決しようとする課題】本発明の目的は、垂直
磁気異方性が大きく、膜面に垂直な方向の保磁力が大き
く、カーループの角形比が１．０であり、しかもカー回
転角の大きい磁性多層膜と、この磁性多層膜を光磁気記
録膜に用いた光磁気記録媒体とを提供することである。The object of the present invention is to provide a large perpendicular magnetic anisotropy, a large coercive force in the direction perpendicular to the film surface, a Kerr loop squareness ratio of 1.0, and a Kerr rotation angle. And a magneto-optical recording medium using the magnetic multilayer film as a magneto-optical recording film.
【００１１】[0011]
【課題を解決するための手段】このような目的は、下記
（１）〜（５）のいずれかの構成により達成される。 （１）Ｆｅ単原子層とＰｔ単原子層とが１層づつ積層さ
れており、（００１）面配向を有する磁性多層膜。 （２）Ｘ線回折チャートにおいて、（００１）面配向を
示すピークだけが認められる上記（１）の磁性多層膜。 （３）基板温度を５００℃以上とし、蒸着法によりＦｅ
単原子層とＰｔ単原子層とを交互に積層して規則合金膜
を形成する磁性多層膜の製造方法。 （４）上記（１）または（２）の磁性多層膜が形成され
る上記（３）の磁性多層膜の製造方法。 （５）上記（１）または（２）の磁性多層膜を光磁気記
録膜として有する光磁気記録媒体。This object is achieved by any of the following constitutions (1) to (5). (1) A magnetic multilayer film in which a Fe monoatomic layer and a Pt monoatomic layer are laminated one by one and have a (001) plane orientation. (2) The magnetic multilayer film according to (1) above, in which only a peak showing the (001) plane orientation is observed in the X-ray diffraction chart. (3) The substrate temperature is set to 500 ° C. or higher and Fe is deposited by the vapor deposition method.
A method for producing a magnetic multilayer film, wherein monoatomic layers and Pt monoatomic layers are alternately laminated to form an ordered alloy film. (4) The method for producing a magnetic multilayer film according to (3), wherein the magnetic multilayer film according to (1) or (2) above is formed. (5) A magneto-optical recording medium having the magnetic multilayer film of (1) or (2) as a magneto-optical recording film.
【００１２】[0012]
【作用および効果】本発明では、Ｆｅ単原子層とＰｔ単
原子層とを交互に１層づつ積層し、（００１）面配向を
有する規則合金と等価である磁性人工格子多層膜を得
る。この磁性多層膜は、超高真空蒸着法により形成する
ことが好ましい。蒸着時の基板温度は、５００℃程度以
上とすることが好ましい。In the present invention, Fe monoatomic layers and Pt monoatomic layers are alternately laminated one by one to obtain a magnetic artificial lattice multilayer film equivalent to an ordered alloy having a (001) plane orientation. This magnetic multilayer film is preferably formed by an ultra high vacuum vapor deposition method. The substrate temperature during vapor deposition is preferably about 500 ° C. or higher.
【００１３】このようにして作製された多層膜は、垂直
磁気異方性、膜面に垂直な方向の保磁力Ｈｃ⊥およびカ
ー回転角がいずれも大きく、しかもカーループの角形比
が１．０であるため、光磁気記録膜として有用である。The multilayer film thus produced has a large perpendicular magnetic anisotropy, a large coercive force Hc⊥ in the direction perpendicular to the film surface, and a large Kerr rotation angle, and a squareness ratio of the Kerr loop of 1.0. Therefore, it is useful as a magneto-optical recording film.
【００１４】なお、上記した文献２記載の［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］128 膜は、実際にはＦｅ単原子
層とＰｔ単原子層との積層膜ではなく、均質で無秩序な
合金であり、カー回転角がバルクのＰｔＦｅ無秩序合金
と同様であるので、本発明の磁性多層膜とは全く異なる
ものである。[Fe (1M
L) / Pt (1ML)] 128 film is not actually a laminated film of Fe monoatomic layer and Pt monoatomic layer, but is a homogeneous and disordered alloy, and the Kerr rotation angle is similar to that of bulk PtFe disordered alloy. Therefore, it is completely different from the magnetic multilayer film of the present invention.
【００１５】[0015]
【実施例】以下、本発明の実施例を挙げ、本発明を詳細
に説明する。The present invention will be described in detail below with reference to examples of the present invention.
【００１６】到達真空度を３×１０-10 Torrとし、Ｍｇ
Ｏ（００１）基板上に、２×１０-9Torr未満の圧力下で
厚さ２５０ AのＰｔ（００１）バッファ層を蒸着により
形成した。バッファ層形成時の基板温度（Ｔｓ）は５０
０℃とした。基板としては、ＭｇＯ（００１）の他、Ｇ
ａＡｓ（００１）、Ｓｉ（００１）等を用いてもよい。
バッファ層としては、Ｐｔ（００１）の他、Ａｕ（００
１）、Ａｇ（００１）等を用いてもよい。バッファ層の
厚さは、１５０〜３０００ A程度とすることが好まし
い。バッファ層形成時の基板温度は、通常、室温〜８０
０℃とすることが好ましい。The ultimate vacuum is set to 3 × 10 -10 Torr and Mg
A 250 A thick Pt (001) buffer layer was formed by vapor deposition on an O (001) substrate under a pressure of less than 2 × 10 −9 Torr. The substrate temperature (Ts) when forming the buffer layer is 50
It was set to 0 ° C. As the substrate, in addition to MgO (001), G
You may use aAs (001), Si (001), etc.
As the buffer layer, in addition to Pt (001), Au (00
1), Ag (001) or the like may be used. The thickness of the buffer layer is preferably about 150 to 3000 A. The substrate temperature during the formation of the buffer layer is usually room temperature to 80.
The temperature is preferably 0 ° C.
【００１７】次いで、バッファ層の上に、前記圧力下で
［Ｆｅ（１ＭＬ）／Ｐｔ（１ＭＬ）］100 多層膜を形成
した。基板温度は５００℃とした。蒸着装置には、２つ
の独立した電子銃をもつものを用いた。１ＭＬは単原子
層を意味する。Ｆｅ（１ＭＬ）の厚さは１．４ A、Ｐｔ
（１ＭＬ）の厚さは２．０ Aであり、この多層膜は、Ｆ
ｅ（１ＭＬ）＋Ｐｔ（１ＭＬ）を１単位として１００単
位積層したものである。蒸着レートは０．１ A／min と
した。蒸着中には、ＲＨＥＥＤ（Reflection High Ener
gy Electron Diffraction ）パターンをモニターし、
（００１）配向の単原子層が１層づつエピタキシャル成
長した膜が形成されていることを確認した。Then, a [Fe (1ML) / Pt (1ML)] 100 multilayer film was formed on the buffer layer under the above-mentioned pressure. The substrate temperature was 500 ° C. The vapor deposition apparatus used had two independent electron guns. 1 ML means monoatomic layer. Fe (1ML) thickness is 1.4 A, Pt
The thickness of (1ML) is 2.0 A, and this multilayer film is F
One unit of e (1ML) + Pt (1ML) is a stack of 100 units. The vapor deposition rate was 0.1 A / min. During vapor deposition, RHEED (Reflection High Ener
gy Electron Diffraction)
It was confirmed that a film was formed by epitaxially growing each (001) -oriented monoatomic layer.
【００１８】多層膜形成時の基板温度は、通常、２５０
〜８００℃、好ましくは５００〜８００℃とする。ま
た、Ｆｅ（１ＭＬ）＋Ｐｔ（１ＭＬ）を１単位としたと
きの積層単位数は特に限定されないが、通常、１０〜３
００程度とすることが好ましい。なお、多層膜形成時の
圧力は、好ましくは１×１０-8Torr以下とし、より好ま
しくは１×１０-10 〜３×１０-9Torr程度とする。The substrate temperature during formation of the multilayer film is usually 250.
-800 degreeC, Preferably it is 500-800 degreeC. The number of laminated units is not particularly limited when Fe (1ML) + Pt (1ML) is one unit, but is usually 10 to 3
It is preferably about 00. The pressure at the time of forming the multilayer film is preferably 1 × 10 −8 Torr or less, more preferably about 1 × 10 −10 to 3 × 10 −9 Torr.
【００１９】図１（ａ）に、この多層膜の最上層である
Ｐｔ層のＲＨＥＥＤパターンを示す。縞状のパターン
は、この多層膜の表面が、原子スケールでかなり平坦で
あることを意味する。基板温度５００℃で蒸着したため
に、Ｆｅ単原子層およびＰｔ単原子層は表面拡散によっ
て一層づつエピタキシャル成長したと考えられる。図２
に、この多層膜のＸ線回折チャートを示す。図２中に
は、一部のピークを拡大して示してある。このＸ線回折
チャートには、図１（ａ）のＲＨＥＥＤパターンから期
待されるように、（００１）面配向を示すピークが認め
られ、しかも他の配向を示すピークは認められない。こ
のことから、原子レベルで規則構造をもつ膜が形成され
ていることがわかる。FIG. 1A shows the RHEED pattern of the Pt layer which is the uppermost layer of this multilayer film. The striped pattern means that the surface of this multilayer film is fairly flat on the atomic scale. It is considered that the Fe monoatomic layer and the Pt monoatomic layer were epitaxially grown one by one due to surface diffusion because of the vapor deposition at the substrate temperature of 500 ° C. Figure 2
An X-ray diffraction chart of this multilayer film is shown in FIG. In FIG. 2, a part of the peaks is shown enlarged. In this X-ray diffraction chart, as expected from the RHEED pattern of FIG. 1 (a), a peak showing the (001) plane orientation was observed, and no peaks showing other orientations were observed. From this, it can be seen that a film having an ordered structure at the atomic level is formed.
【００２０】これに対し、基板温度を室温（Ｒ．Ｔ．）
とした以外は上記と同様にして形成した多層膜では、図
１（ｂ）に示されるようにＲＨＥＥＤパターンが斑点状
であった。これは、室温では島状成長が生じたことを示
す。なお、図１は、すべて［１１０］入射のものであ
る。また、このＲＨＥＥＤパターンに一致して、Ｘ線回
折では、ＦｅＰｔ（００１）面配向を示すピークは室温
で成長させたこのＦｅ／Ｐｔ多層膜では認められなかっ
た。On the other hand, the substrate temperature is room temperature (RT).
In the multilayer film formed in the same manner as above except that the RHEED pattern was speckled as shown in FIG. 1 (b). This indicates that island-shaped growth occurred at room temperature. It should be noted that all of FIG. 1 are for [110] incidence. Further, in agreement with this RHEED pattern, a peak showing FePt (001) plane orientation was not observed in this Fe / Pt multilayer film grown at room temperature by X-ray diffraction.
【００２１】多層膜の磁気異方性を、室温でSQUID 磁気
メータにより測定した。図３に、５００℃で成長させた
［Ｆｅ（１ＭＬ）／Ｐｔ（１ＭＬ）］100 膜の、膜面に
対して平行（Ｈ//）および垂直（Ｈ⊥）方向の磁化カー
ブを示す。５５ kOeにおいても飽和していない膜面内
（Ｈ//）の磁化カーブは、この多層膜の大きな垂直磁気
異方性を示す。The magnetic anisotropy of the multilayer film was measured with a SQUID magnetometer at room temperature. FIG. 3 shows magnetization curves of the [Fe (1ML) / Pt (1ML)] 100 film grown at 500 ° C. in the directions parallel (H //) and perpendicular (H⊥) to the film surface. The in-plane (H //) magnetization curve which is not saturated even at 55 kOe shows a large perpendicular magnetic anisotropy of this multilayer film.
【００２２】多層膜の波長（λ）６３３nmでの磁気光学
カー回転角（θk ）を、室温で測定した。図４に、磁界
強度とカー回転角との関係を示すカーループを示す。同
図に示されるように、５００℃で成長させた［Ｆｅ（１
ＭＬ）／Ｐｔ（１ＭＬ）］10 0 膜の６３３nmでの飽和カ
ー回転角は０．６９度と大きい。また、このカーループ
では、残留カー回転角（磁界強度ゼロでのカー回転角）
が飽和カー回転角と同じで角形比が１．０であり、保磁
力（カー回転角がゼロとなる磁界強度）が３ kOeと大き
い。したがって、この多層膜では、光磁気磁気記録膜と
しての実用的な特性が得られていることがわかる。The magneto-optical Kerr rotation angle (θ k ) of the multilayer film at a wavelength (λ) of 633 nm was measured at room temperature. FIG. 4 shows a Kerr loop showing the relationship between the magnetic field strength and the Kerr rotation angle. As shown in the figure, [Fe (1
ML) / Pt (1ML)] 10 0 film saturation Kerr rotation angle at 633nm of as large as 0.69 degrees. In this car loop, the residual Kerr rotation angle (Kerr rotation angle at zero magnetic field strength)
Is the same as the saturated Kerr rotation angle, the squareness ratio is 1.0, and the coercive force (the magnetic field strength at which the Kerr rotation angle becomes zero) is as large as 3 kOe. Therefore, it is understood that this multilayer film has practical characteristics as a magneto-optical recording film.
【００２３】これに対し、室温で成長させた［Ｆｅ（１
ＭＬ）／Ｐｔ（１ＭＬ）］100 多層膜の垂直磁気異方性
およびカー回転角は、５００℃で成長させたものに比べ
非常に小さかった。On the contrary, [Fe (1
The perpendicular magnetic anisotropy and Kerr rotation angle of the ML) / Pt (1ML)] 100 multilayer film were much smaller than those grown at 500 ° C.
【００２４】垂直磁気異方性および６３３nmでのカー回
転角は、［Ｆｅ（１ＭＬ）／Ｐｔ（１ＭＬ）］100 多層
膜の規則度の増大に伴なって増大する。この規則度は、
Ｘ線回折チャートのピーク強度比Ｉ001 ／Ｉ002 によっ
て評価される。Ｉ001 およびＩ002 は、それぞれＦｅＰ
ｔ（００１）面のピーク強度および（００２）面のピー
ク強度である。Ｉ001 ／Ｉ002 が０．１以上であれば、
実用上十分な垂直磁気異方性およびカー回転角が得られ
る。The perpendicular magnetic anisotropy and the Kerr rotation angle at 633 nm increase with increasing order of the [Fe (1ML) / Pt (1ML)] 100 multilayer film. This regularity is
It is evaluated by the peak intensity ratio I 001 / I 002 of the X-ray diffraction chart. I 001 and I 002 are FeP, respectively.
It is the peak intensity of the t (001) plane and the peak intensity of the (002) plane. If I 001 / I 002 is 0.1 or more,
Practically sufficient perpendicular magnetic anisotropy and Kerr rotation angle can be obtained.
【００２５】図５に、［Ｆｅ（１ＭＬ）／Ｐｔ（１Ｍ
Ｌ）］100 膜のＩ001 ／Ｉ002 と、実効的な垂直磁気異
方性定数Ｋｕ、このＫｕに形状異方性２πＭｓ2 を加え
た本質的な垂直磁気異方性定数Ｋ⊥および６３３nmでの
カー回転角との関係を示す。なお、Ｍｓは飽和磁化であ
る。この実施例では、Ｋ⊥＝５．５×１０7 erg/cm3 、
Ｋｕ＝４．７×１０7 erg/cm3 、Ｍｓ＝１１６０emu/cc
が得られている。なお、前記文献１における実効的な垂
直磁気異方性定数（８×１０6 erg/cm3 以上）は、この
実施例におけるＫｕと比較されるものである。したがっ
て、明らかに本発明において大きな値が得られているこ
とがわかる。In FIG. 5, [Fe (1ML) / Pt (1M
L)] I 001 / I 002 of 100 film, effective perpendicular magnetic anisotropy constant Ku, and essential perpendicular magnetic anisotropy constant K ⊥ and 633 nm obtained by adding shape anisotropy 2πMs 2 to this Ku. Shows the relationship with the car rotation angle. Note that Ms is saturation magnetization. In this example, K⊥ = 5.5 × 10 7 erg / cm 3 ,
Ku = 4.7 × 10 7 erg / cm 3 , Ms = 1160 emu / cc
Has been obtained. The effective perpendicular magnetic anisotropy constant (8 × 10 6 erg / cm 3 or more) in Document 1 is to be compared with Ku in this example. Therefore, it is apparent that a large value is obtained in the present invention.
【図１】（ａ）および（ｂ）は、それぞれ基板温度５０
０℃および室温で形成された［Ｆｅ（１ＭＬ）／Ｐｔ
（１ＭＬ）］100 多層膜の最上層であるＰｔ層のＲＨＥ
ＥＤパターンである。1A and 1B show a substrate temperature of 50, respectively.
[Fe (1ML) / Pt formed at 0 ° C. and room temperature
(1ML)] RHE of Pt layer which is the uppermost layer of 100 multilayer film
It is an ED pattern.
【図２】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］100 多層膜のＸ線回折チャート
である。[FIG. 2] [Fe (1M
L) / Pt (1ML)] 100 is an X-ray diffraction chart of a multilayer film.
【図３】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］100 多層膜の磁化ループであ
る。FIG. 3 shows [Fe (1M
L) / Pt (1ML)] 100 Magnetization loop of a multilayer film.
【図４】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］100 多層膜のカーループであ
る。FIG. 4 shows [Fe (1M
L) / Pt (1ML)] 100 Kerr loop of a multilayer film.
【図５】［Ｆｅ（１ＭＬ）／Ｐｔ（１ＭＬ）］100 多層
膜のＩ001 ／Ｉ002 と、実効的な垂直磁気異方性定数Ｋ
ｕ、本質的な垂直磁気異方性定数Ｋ⊥および６３３nmで
のカー回転角との関係を示すグラフである。FIG. 5 shows I 001 / I 002 of [Fe (1ML) / Pt (1ML)] 100 multilayer film and effective perpendicular magnetic anisotropy constant K.
3 is a graph showing the relationship between u, the essential perpendicular magnetic anisotropy constant K⊥, and the Kerr rotation angle at 633 nm.
─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───
【手続補正書】[Procedure amendment]
【提出日】平成７年６月３０日[Submission date] June 30, 1995
【手続補正１】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Name of item to be corrected] Brief description of the drawing
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図面の簡単な説明】[Brief description of drawings]
【図１】結晶構造を表わす図面代用写真であって、
（ａ）および（ｂ）は、それぞれ基板温度５００℃およ
び室温で形成された［Ｆｅ（１ＭＬ）／Ｐｔ（１Ｍ
Ｌ）］１０。多層膜の最上層であるＰｔ層のＲＨＥＥＤ
パターンである。FIG. 1 is a drawing-substitute photograph showing a crystal structure,
(A) and (b) show [Fe (1ML) / Pt (1M) formed at a substrate temperature of 500 ° C. and room temperature, respectively.
L)] 10 . RHEED of Pt layer which is the uppermost layer of multilayer film
It is a pattern.
【図２】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］１００多層膜のＸ線回折チャー
トである。[FIG. 2] [Fe (1M
L) / Pt (1ML)] 100 multilayer film X-ray diffraction chart.
【図３】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］１００多層膜の磁化ループであ
る。FIG. 3 shows [Fe (1M
L) / Pt (1ML)] 100 is a magnetization loop of a multilayer film.
【図４】基板温度５００℃で形成された［Ｆｅ（１Ｍ
Ｌ）／Ｐｔ（１ＭＬ）］１００多層膜のカーループであ
る。FIG. 4 shows [Fe (1M
L) / Pt (1ML)] 100 multi-layer car loop.
【図５】［Ｆｅ（１ＭＬ）／Ｐｔ（１ＭＬ）］１００多
層膜のＩ００１／Ｉ００２と、実効的な垂直磁気異方性
定数Ｋｕ、本質的な垂直磁気異方性定数Ｋ⊥および６３
３ｎｍでのカー回転角との関係を示すグラフである。FIG. 5 shows I 001 / I 002 of [Fe (1ML) / Pt (1ML)] 100 multilayer film, effective perpendicular magnetic anisotropy constant Ku, and essential perpendicular magnetic anisotropy constants K⊥ and 63.
It is a graph which shows the relationship with the Kerr rotation angle in 3 nm.
【手続補正２】[Procedure Amendment 2]
【補正対象書類名】図面[Document name to be corrected] Drawing
【補正対象項目名】図１[Name of item to be corrected] Figure 1
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【図１】 FIG.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 三谷 誠司 宮城県仙台市太白区八木山緑町７番41− 305号 (72)発明者 中嶋 英雄 岩手県盛岡市緑が丘４丁目11番40号 (72)発明者 佐野 正志 宮城県仙台市泉区東黒松５−36 高梨方 (72)発明者 大沢 明 岩手県盛岡市緑が丘１丁目11番19号 (72)発明者 佐藤 勝昭 神奈川県川崎市麻生区上麻生1087−169 (72)発明者 野口 潔 東京都中央区日本橋一丁目13番１号 ティ ーディーケイ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Seiji Mitani 7-41-305 Yagiyama Midori-cho, Taishiro-ku, Sendai City, Miyagi Prefecture (72) Hideo Nakajima 4--11-40 Midorigaoka, Morioka City, Iwate Prefecture (72) Inventor Masashi Sano 5-36 Takanashi, Higashikuromatsu, Izumi-ku, Sendai-shi, Miyagi (72) Inventor Akira Osawa 1-11-19 Midorigaoka, Morioka-shi, Iwate (72) Katsuaki Sato 1087 Kamioo, Aso-ku, Kawasaki-shi, Kanagawa −169 (72) Inventor Kiyoshi Noguchi 1-13-1, Nihonbashi, Chuo-ku, Tokyo Within TDK Corporation
Claims (5)
つ積層されており、（００１）面配向を有する磁性多層
膜。1. A magnetic multi-layered film in which an Fe monoatomic layer and a Pt monoatomic layer are laminated one by one, and which has a (001) plane orientation.
面配向を示すピークだけが認められる請求項１の磁性多
層膜。2. In the X-ray diffraction chart, (001)
The magnetic multilayer film according to claim 1, wherein only peaks showing plane orientation are recognized.
よりＦｅ単原子層とＰｔ単原子層とを交互に積層して規
則合金膜を形成する磁性多層膜の製造方法。3. A method for producing a magnetic multilayer film, wherein a substrate temperature is 500 ° C. or higher and Fe monoatomic layers and Pt monoatomic layers are alternately laminated by a vapor deposition method to form an ordered alloy film.
れる請求項３の磁性多層膜の製造方法。4. The method for producing a magnetic multilayer film according to claim 3, wherein the magnetic multilayer film according to claim 1 or 2 is formed.
記録膜として有する光磁気記録媒体。5. A magneto-optical recording medium having the magnetic multilayer film according to claim 1 or 2 as a magneto-optical recording film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33918794A JP3559332B2 (en) | 1994-12-28 | 1994-12-28 | Magnetic multilayer film, method of manufacturing the same, and magneto-optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33918794A JP3559332B2 (en) | 1994-12-28 | 1994-12-28 | Magnetic multilayer film, method of manufacturing the same, and magneto-optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08186022A true JPH08186022A (en) | 1996-07-16 |
| JP3559332B2 JP3559332B2 (en) | 2004-09-02 |
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ID=18325064
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33918794A Expired - Lifetime JP3559332B2 (en) | 1994-12-28 | 1994-12-28 | Magnetic multilayer film, method of manufacturing the same, and magneto-optical recording medium |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6824817B2 (en) | 2002-03-14 | 2004-11-30 | Tdk Corporation | Method of manufacturing magnetic multilayer film, method of manufacturing magnetic recording medium, magnetic multilayer film and magnetic recording medium |
| WO2008134075A1 (en) * | 2007-04-30 | 2008-11-06 | Micron Technology, Inc. | Magnetic floating gate flash memory structures |
| JP2010021580A (en) * | 2005-10-19 | 2010-01-28 | Toshiba Corp | Magneto-resistance effect device, magnetic random access memory, electronic card, electronic apparatus, production process of magneto-resistance effect device, and production process of magnetic random access memory |
| US7663197B2 (en) | 2005-10-19 | 2010-02-16 | Kabushiki Kaisha Toshiba | Magnetoresistive element |
-
1994
- 1994-12-28 JP JP33918794A patent/JP3559332B2/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6824817B2 (en) | 2002-03-14 | 2004-11-30 | Tdk Corporation | Method of manufacturing magnetic multilayer film, method of manufacturing magnetic recording medium, magnetic multilayer film and magnetic recording medium |
| JP2010021580A (en) * | 2005-10-19 | 2010-01-28 | Toshiba Corp | Magneto-resistance effect device, magnetic random access memory, electronic card, electronic apparatus, production process of magneto-resistance effect device, and production process of magnetic random access memory |
| US7663197B2 (en) | 2005-10-19 | 2010-02-16 | Kabushiki Kaisha Toshiba | Magnetoresistive element |
| US8036025B2 (en) | 2005-10-19 | 2011-10-11 | Kabushiki Kaisha Toshiba | Magnetoresistive element |
| US8363462B2 (en) | 2005-10-19 | 2013-01-29 | Kabushiki Kaisha Toshiba | Magnetoresistive element |
| WO2008134075A1 (en) * | 2007-04-30 | 2008-11-06 | Micron Technology, Inc. | Magnetic floating gate flash memory structures |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3559332B2 (en) | 2004-09-02 |
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