JPH08180362A - Magnetic recording medium - Google Patents

Abstract

PURPOSE: To enable further reduced floating of a magnetic head while maintaining superior durability by texturing a substrate so that moderate roughness is imparted to the surface of a magnetic disk. CONSTITUTION: The magnetic recording medium is composed of a substrate 1, an Al-M1 (M1 is a metal capable of forming carbide) layer 3 of an Al-M1 alloy material formed on the substrate 1, a metallic magnetic layer 7 formed on the Al-M1 layer 3 and a nonmetallic amorphous layer 4 interposed between the Al-M1 layer 3 and the magnetic layer 7. Thereby, the magnetic recording medium is excellent in electromagnetic transducing characteristics, adaptable to high density recording, excellent in running performance and excellent also in durability.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium such as a magnetic disk having a low friction coefficient, excellent durability and excellent electromagnetic conversion characteristics.

[0002]

BACKGROUND OF THE INVENTION In a magnetic disk used in an external storage device such as a computer, it is necessary to reduce the distance between the magnetic disk and the magnetic head, that is, the flying height of the magnetic head from the viewpoint of reproduction output. Has been. Therefore, it can be said that the surface of the magnetic disk is preferably smooth. However, if the surface is too smooth, the magnetic head may stick to the magnetic disk and damage the magnetic disk or the magnetic head. Therefore, in order to make the surface an appropriate roughness,
The texturing will be applied to the substrate.

As this texture processing, several methods have been conventionally proposed. For example, a mechanical polishing method has been proposed for an aluminum substrate. For glass substrates, a chemical etching method (Japanese Patent Laid-Open No. 64-377) is used.
No. 18) and a method for applying a coating material containing fine particles (JP-A-1-
194128) has been proposed. A thermal oxidation method (Japanese Patent Laid-Open No. 4-214225) has been proposed for carbon substrates. But with these methods,
Nowadays, it is not possible to sufficiently meet the demand in the present day when the flying height of the magnetic head is required to be further reduced.

That is, there is a demand for a texture technique that enables the magnetic head to be further lowered in flying height while maintaining excellent durability, that is, a surface characteristic that is smooth but has an appropriate roughness.

[0005]

As a technique to meet such a demand, a method of vacuum-depositing a low-melting metal such as Sn or In to form irregularities (Japanese Patent Laid-Open Nos. 60-216114 and Sho-216114). 61-240429), Al, Cu
A low melting point metal such as Si to form a discontinuous island structure (JP-A-3-73419), Cr, Mo, W
A method of making a rough surface by using a refractory metal such as
No. 67722) has been proposed.

[0006] These methods have the feature that the texture processing and the formation of the magnetic layer can be performed consistently in a vacuum system. But,
When a single metal having a low melting point is used, the unevenness is not good, and the adhesion to the substrate is poor, so that it is easily peeled off and cannot be put to practical use. Further, when a high melting point metal is used, there is a problem that the unevenness is not good and the durability (CSS characteristics) is poor.

The inventor of the present invention has eagerly studied the above problems. That is, it was considered that a layer in which irregularities are easily formed is provided between the magnetic layer or the underlayer of the magnetic layer and the glassy carbon substrate to improve the adhesion of this layer. While energetically conducting research in accordance with this guideline, in the case where the Al--Si alloy material is provided by means such as sputtering, it is easy to form irregularities, and appropriate irregularities are formed. It turns out that it has good adhesion. Furthermore, as a result of examining other materials, Al
Other than -Si alloys, Al-Cr alloys, Al-Ta alloys, Al-Ti alloys, Al-Zr alloys, Al-Y
Alloys, Al-Mo alloys, Al-W alloys, Al-V
It has been found that even in the case where the system alloy layer is provided, the unevenness can be easily formed, the appropriate unevenness is formed, and the adhesiveness is excellent.

While considering based on these findings, Al-M containing a metal M capable of forming a carbide.
When the base metal layer (unevenness forming layer) is provided on the carbon substrate, the presence of the C component of the carbon substrate and the metal M forming the carbide causes the carbon substrate and the Al-M based metal layer (unevenness forming layer) to be separated from each other. The bond between them is strong, and therefore, when a metal magnetic layer or a metal magnetic layer via an underlayer (metal layer) is provided on this, appropriate unevenness is formed on the surface, and the friction coefficient is small, It has been found that the durability is excellent and the problem of peeling is solved.

However, the squareness ratio and the noise characteristic were not sufficient only by providing the Al-M type metal layer. Therefore,
A low coefficient of friction, excellent durability, and improvements in squareness ratio and noise characteristics have been demanded.

[0010]

As research on the above-mentioned demands has been earnestly promoted, a non-metal layer is formed under the metal magnetic layer, particularly between the Al-M layer and the metal magnetic layer. It was found that the provision of the amorphous layer has a low friction coefficient, excellent durability, and an improved squareness ratio. In particular, after providing a metal layer capable of forming carbide on a substrate, then providing an Al-M layer and a non-metal amorphous layer on this metal layer, and providing a metal-based magnetic layer, It has been found that the surface can be made into a more preferable surface shape, whereby the friction coefficient can be further reduced, the durability can be further improved, and the squareness ratio can be improved.

Under the magnetic layer, Cr or Cr alloy,
It was also found that the one provided with Ti or Ti alloy has improved noise characteristics. The present invention has been achieved on the basis of the above findings, and since it is compatible with high-density recording, it is possible to reduce the flying height of the magnetic head, and the sticking of the magnetic head does not occur, resulting in excellent durability. An object of the present invention is to provide a magnetic recording medium having a fine surface roughness, a low coefficient of friction, an excellent running property, an excellent squareness ratio and a good noise characteristic, and an excellent electromagnetic conversion characteristic.

The object of the present invention is to provide a substrate and the
Al-M provided in₁(M₁Can form carbide
Al-M made of metal alloy material₁Layer and this Al
-M ₁A metallic magnetic layer provided on the layer, and the Al-M
₁Amorphous metal provided between the magnetic layer and the metallic magnetic layer
A magnetic recording medium characterized by comprising a fuss layer
Is achieved.

In particular, a carbon substrate (among others, a glassy carbon substrate) and Al provided on the carbon substrate
-M ₁ (M ₁ is a metal capable of forming a carbide) and Al-M ₁ layer made of alloy material, a metal-based magnetic layer provided on the Al-M ₁ layer on, with the Al-M ₁ layer And a non-metal amorphous layer provided between the magnetic recording layer and the metal-based magnetic layer.

The substrate and the metal provided on the substrate
M₂(M₂Is a metal that can form carbide)
Let M₂Layer and this M₂Al-M provided on the layer₁
(M ₁Is a metal capable of forming carbide, M₁Is M₂Same as
It may be the same or different. ) Al based on alloy materials
-M₁Layer and this Al-M₁Metal-based magnet provided on the layer
Layer and M₂Provided between the layer and the metallic magnetic layer
And a non-metal amorphous layer.
This is achieved by a magnetic recording medium.

In particular, a carbon substrate (among others, a glassy carbon substrate), an M ₂ layer having metal M ₂ (M ₂ is a metal capable of forming carbide) provided on the carbon substrate as a constituent element, and Al-M ₁ provided on the M ₂ layer
(M ₁ is a metal capable of forming carbide, M ₁ may be the same as or different from M ₂ ) Al made of a system alloy material
-M ₁ layer, a metal-based magnetic layer provided on the Al-M ₁ layer, and a non-metal amorphous layer provided between the M ₂ layer and the metal-based magnetic layer. This is achieved by the characteristic magnetic recording medium.

Further, in the magnetic recording medium of the present invention, 10 to 200 nm (more preferably 3 nm) is formed under the metallic magnetic layer.
This is achieved by a magnetic recording medium provided with a first underlayer of Ti or a Ti alloy having a thickness of 0 to 120 nm). Or, 10 to 200n below the metal magnetic layer
A first underlayer made of Ti or a Ti alloy having a thickness of m (more preferably 30 to 120 nm) is provided on the first underlayer 10 to 10
This is achieved by a magnetic recording medium provided with a second underlayer made of Cr or a Cr alloy having a thickness of 200 nm (more preferably 30 to 70 nm).

Further, in the magnetic recording medium of the present invention, it is achieved by a magnetic recording medium in which a protective layer is provided on a metallic magnetic layer. The non-metal amorphous layer in the present invention is preferably provided directly on the Al-M ₁ layer. The thickness of this non-metal amorphous layer is 5
.About.50 nm (more preferably 15 to 40 nm) is preferable. That is, the magnetic characteristics such as the squareness ratio of the magnetic recording medium thus constructed were excellent. As the non-metal amorphous layer, various types can be mentioned, and particularly preferable example is amorphous carbon.

Further, Al-M in the present invention₁The layer thickness is
5-100 nm is preferable. Also, M ₂Layer thickness is 5 to 2
00 nm is preferable. Incidentally, M₂Layers and Al-M₁Layers, table
A type with a concavo-convex structure on the surface and a continuous lower layer is preferable.
Good. That is, by configuring in this way,
M₂Fine first irregularities are formed on the surface of the layer, and Al-
M₁The surface of the layer has unevenness due to the influence of the first unevenness and Al-
M₁Larger than the first unevenness formed by the layer itself
The second unevenness of the structure that is combined with the textured unevenness is formed,
The surface profile formed by this is a preferred feature.
Show signs. Then, the uneven layer (M₂Layers and Al-M₁layer)
Has an uneven structure on the surface and the lower layer is
A continuous type is preferable.

The present invention will be described in detail below. In the present invention, the substrate may be magnetic or non-magnetic, but a non-magnetic substrate is generally used. For example, carbon (Japanese Patent Publication No. 63-46004, Japanese Patent Laid-Open No. 3-11005, etc.), tempered glass, crystallized glass, Al or Al alloy, titanium or titanium alloy, ceramics, resin, or a composite material of the above materials may be used. Used. Among them, carbon, particularly glassy carbon, is most preferable in the case of the present invention because it has heat resistance and generates less gas due to heating when a magnetic layer or the like is formed by sputtering.

Then, for example, the metal M is directly provided on the carbon substrate having Ra (center line average roughness) of 0.5 to 0.9 nm.
₂ (M ₂ is a metal capable of forming carbide,
i, Cr, Ta, Ti, Zr, Y, Mo, M 2 layer of one or more) selected from the group of W and V 5-20
0 nm thickness Provided if necessary. That is, vacuum deposition,
PV such as sputtering or ion plating
Ti layer, Mo layer, W layer, Si layer, Cr layer, Ta by D means
A layer, a Zr layer, a Y layer, and a V layer are provided. The temperature of the carbon substrate at this time is 80 to 500 ° C. (more preferably 120 to 3 ° C.).
50 ° C.) is preferred. In the case of the Ti layer, its thickness is preferably 10 to 150 nm (desirably 50 to 120 nm). In the case of Mo layer, the thickness is 10 to 120.
nm (desirably 50 to 100 nm) is preferable. In the case of the W layer, its thickness is preferably 10 to 120 nm (desirably 40 to 100 nm). In the case of a Si layer, its thickness is 10 to 150 nm (preferably 40 to 120 n).
m) is preferred. In the case of the Cr layer, the thickness is 5 to 2
00 nm (desirably 30 to 120 nm) is preferable.
In the case of the Ta layer, its thickness is preferably 10 to 130 nm (desirably 50 to 120 nm). In the case of a Zr layer, its thickness is 10 to 150 nm (preferably 50 to 1 nm).
20 nm) is preferred. In the case of Y layer, the thickness is 1
The thickness is preferably 0 to 140 nm (desirably 50 to 130 nm). In the case of V layer, the thickness is 10 to 140 nm
(Desirably 60 to 120 nm) is preferable. Particularly preferred are Ti layer, Si layer, Cr layer, and Zr layer. As a result, the surface of the M ₂ layer has fine irregularities (Ra of 9 to 9).
11Å, the maximum centerline height Rp is 20 to 40Å).

Directly on the metal M ₂ layer, Al-M
₁ (M ₁ is a metal capable of forming carbide) An Al-M ₁ layer made of an alloy material is provided. When the metal M ₂ layer is not provided, the Al-M ₁ layer is directly formed on the carbon substrate.
Provide a layer. However, it is preferable to provide the metal M ₂ layer. As a specific example of this Al-M ₁ type alloy, M ₁ is S
Al-M containing at least one element selected from elements such as i, Cr, Ta, Ti, Zr, Y, Mo, W and V
_{An example is a 1-} based alloy. For example, Al-Si alloy (preferably 0.2 to 15 wt% Si, more preferably S
i is 1 to 10 wt%), Al-Cr alloy (preferably Cr is 0.1 to 10 wt%, more preferably Cr is 1 to 1 wt%).
5 wt%), Al-Ta based alloy (preferably Ta is 0.
1-3 wt%, more preferably 1-2 wt% Ta),
Al-Ti alloy (preferably Ti of 0.5 to 15 wt)
%, More preferably Ti is 1 to 10 wt%), Al-Z
r-based alloy (preferably Zr 0.1 to 9 wt%, more preferably Zr 1 to 5 wt%), Al-Y-based alloy (preferably Y 0.1 to 10 wt%, more preferably Y 1).
~ 5 wt%), Al-Mo alloy (preferably 0.2 to 10 wt% Mo, more preferably 1 to 5 wt% Mo)
%), Al-W alloy (preferably W of 0.2 to 10 w)
t%, more preferably W is 1 to 8 wt%), Al-V alloy (preferably V is 0.5 to 8 wt%, more preferably V is 1 to 5 wt%). Also, Al-5w
t% Si-5wt% Cr alloy, Al-5wt% Si-
3wt% Mo alloy, Al-5wt% Si-3wt% W
Examples include ternary or higher Al alloys such as alloys. Among them, particularly preferable are Al-Si alloys and Al-Cr.
It is a system alloy.

The layer made of Al-M ₁ alloy material is provided by PVD means such as sputtering. The temperature of the carbon substrate at this time is 80 to 500 ° C. (more preferably 120 ° C.).
~ 350 ° C) is preferred. Its thickness is 5-100 nm
(Desirably 5 to 60 nm) is preferable. That is, P
When the Al-M ₁ -based alloy layer is formed by the VD means, by controlling the thickness as described above, the surface of the Al-M ₁ -based alloy layer has fine unevenness (Ra is 10 to 50Å, preferably Ra). 10 to 30Å.Rp is 20 to 300Å, preferably 30 to 80Å. In addition, this Al-M ₁
Irregularities formed on the surface of the layer, when there are M ₂ layers,
The unevenness pattern is a composite of the unevenness formed by the M ₂ layer itself and the unevenness formed by the Al-M ₁ layer itself. Therefore, Al-M having such unevenness is formed.
_{If a} magnetic layer or the like is provided on the _1- based alloy layer, the above-mentioned unevenness is inherited as it is, and the surface is appropriately roughened. Therefore, the sticking phenomenon of the magnetic head can be prevented, the durability is excellent, the friction coefficient is small, and the running property is excellent.

A non-metal amorphous layer, for example, an amorphous carbon layer is provided on the Al-M ₁ type alloy layer by PVD means. A carbon material is used as a PVD target material. A crystalline carbon material such as graphite may be used as the carbon material, but a glassy carbon material is preferably used. Further, the carbon material is Si, Ti,
Carbides, nitrides, borides, or oxides of W, Zr, Cr, Nb, Mo, Ta, or Al, or BN, B
_It may contain ceramic particles such as ₄ C. The thickness of the amorphous carbon layer is preferably 5 to 50 nm (desirably 20 to 40 nm). When this amorphous carbon layer is provided, the crystalline interaction between the Al-M ₁ based alloy layer and the underlayer (the metal layer provided between the non-metal amorphous layer and the magnetic layer) is blocked, and the underlayer of the underlayer is blocked. Crystallization proceeds satisfactorily, the orientation of the magnetic layer becomes favorable, and the magnetic characteristics such as the squareness ratio are improved.

A non-magnetic Cr-based layer made of Cr or a Cr alloy is provided by PVD means as an underlayer of the metal thin film type magnetic layer. Incidentally, this non-magnetic underlayer (Cr-based layer)
Is provided in order to improve the orientation of the magnetic layer provided on the upper layer. And the thickness is 10 to 200 nm
(Desirably 10 to 100 nm) is preferable. Furthermore,
It is preferable to provide an underlayer made of Ti or a Ti alloy between the amorphous layer and the Cr-based underlayer. The layer is provided by PVD means. By providing the Ti-based layer, noise is reduced. Its thickness is 10-200
nm (desirably 10 to 150 nm) is preferable.

The magnetic recording medium of the present invention is of a metal thin film type. That is, a metal thin film type magnetic layer is provided on the amorphous layer by PVD means. Examples of the material forming the magnetic layer include CoCr, CoCrX, CoNiX, and C.
A Co-based magnetic alloy containing Co as a main component represented by oWX or the like can be given. Here, X is Ta, Pt,
Au, Ti, V, Cr, Ni, W, La, Ce, Pr,
Nd, Pm, Sm, Eu, Li, Si, B, Ca, A
s, Y, Zr, Nb, Mo, Ru, Rh, Ag, Sb,
Examples include one or more elements selected from the group consisting of Hf. Among them, CoCr and CoCrPt can be mentioned as preferable ones. The film thickness of such a magnetic layer is usually about 300 to 1000Å.

The metal thin film type magnetic recording medium is generally
A protective layer is provided on the magnetic layer by PVD means or CVD means. As a material for the protective layer, a material having high hardness is desirable from the viewpoint of wear resistance. For example, Al, Si, Ti, Cr,
Examples include oxides, nitrides, and carbides of metals such as Zr, Nb, Mo, Ta, and W. Moreover, carbon, boron nitride, etc. are also mentioned. Among them, carbonaceous materials such as glassy carbon, diamond-like carbon, or a composite material of these carbons and metal oxides or ceramics are preferable. The thickness of the protective layer is 100
~ 300 ° is preferred.

In order to improve the running property, the protective layer is
For example, a lubricant layer having a thickness of about 5 to 40Å is provided.
As the lubricant, a lubricant having a polar group and a lubricant having no polar group may be used alone, but they are preferably used in combination. For example, after applying a lubricant solution with a polar group, apply a lubricant solution without a polar group at the end,
Apply a mixed solution of a polar group lubricant and a non-polar group lubricant, and apply a polar group-containing lubricant mainly on the lower layer side near the protective layer side and a non-polar group-containing lubricant agent on the upper layer side. You may make it exist. The polar group-containing lubricant used is a perfluoropolyether type having a molecular weight of 2000 to 4000, and preferably has an aromatic ring at the end. _{That, - (CF 2 CF 2 O} ) n - (CF
Those having a ₂ O) _m- skeleton, an aromatic ring at the end, and a molecular weight of 2000 to 4000 are preferable. Specific examples include Fomblin AM2001 (manufactured by Montecatini) and Demnum SP (manufactured by Daikin Industries, Ltd.). Lubricants without polar groups have a molecular weight of 2000-
A perfluoropolyether type of 10000 is preferable. _{That, CF 3 - (CF 2 CF} 2 O) n - (CF
It is represented by ₂ O) _m -CF _3, molecular weight 2000 to 100
00 is preferable. Specific examples include Fomblin Z03 (manufactured by Montecatini).

In the magnetic recording medium having the above-mentioned structure, the M ₂ layer or the Al-M ₁ type alloy layer (M ₁ ,
Since M ₂ is a metal capable of forming carbide), this M ₂ layer is firmly bonded to the carbon substrate, and Al −
The M ₁ -based alloy layer is firmly bonded to the M ₂ layer, and the magnetic layer or the Cr-based or Ti-based underlayer is firmly bonded through these layers, so that the adhesion is high and the durability is high. Will be excellent.

Moreover, since the fine irregularities are formed on the M ₂ layer and the Al-M ₁ alloy layer, the fine irregularities are also formed on the magnetic layer and the like provided thereon, and the friction coefficient is small. It has excellent running property and CSS durability. Furthermore, since a non-metal amorphous layer, for example, an amorphous carbon layer is provided between the Al-M ₁ layer and the metal-based magnetic layer, the magnetic characteristics such as the squareness ratio are improved and the electromagnetic conversion characteristics are improved. Become.

The present invention will be described below with reference to examples, but the present invention is not limited thereto.

[0031]

【Example】

Example 1 Density 1.5 g / cm ³ , Vickers hardness 6
Carbon substrate 1 using glassy carbon with 50 characteristics
Was produced. Ra of this carbon substrate 1 is 0.8 nm.
(Evaluated by a stylus type surface roughness meter).

Ar gas pressure of 2 m is applied on the carbon substrate 1.
Torr, carbon substrate temperature of 250 ℃ by DC magnetron sputtering 20nm thick Al-
A 10 wt% Si alloy layer 3 was provided. In addition, this Al-10
The surface of the wt% Si alloy layer 3 had Ra of 1.8 nm. Then, on the Al-Si alloy layer 3, an Ar gas pressure of 2 m
The amorphous carbon layer 4 having a thickness of 5 nm was formed by DC magnetron sputtering under the conditions of Torr and the carbon substrate temperature of 250 ° C.

Further, a 40 nm-thick Cr layer 6 was formed on the amorphous carbon layer 4 by DC magnetron sputtering under the conditions of Ar gas pressure of 2 mTorr and carbon substrate temperature of 250 ° C., followed by 40 nm-thick CoCrPt-based alloy magnetic layer 7. And a diamond-like carbon layer 8 having a thickness of 15 nm was provided. After this, Fomblin Z0
3 solution is applied and a lubricant layer 9 having a thickness of 15Å is provided.
A magnetic disk as shown in was obtained.

[Examples 2 to 18] 20 in Example 1
except that the Al-10 wt% Si alloy layer 3 having a thickness of nm is the Al-M ₁ alloy layer having a thickness of 20 nm shown in Table-1 and the thickness of the amorphous carbon layer 4 is the thickness shown in Table-1. A magnetic disk was obtained in the same manner as in Example 1. [Example 19] A magnetic disk was obtained in the same manner as in Example 3, except that the carbon substrate 1 in Example 3 was replaced with a tempered glass substrate.

[Example 20] A magnetic disk was obtained in the same manner as in Example 3 except that the carbon substrate 1 in Example 3 was changed to an aluminum substrate plated with NiP. [Example 21] A magnetic disk was obtained in the same manner as in Example 5 except that the carbon substrate 1 in Example 5 was replaced with a tempered glass substrate.

[Example 22] A magnetic disk was obtained in the same manner as in Example 5 except that the carbon substrate 1 in Example 5 was changed to an aluminum substrate plated with NiP. Comparative Examples 1 to 9 Al having a thickness of 20 nm in Example 1
A magnetic disk was obtained in the same manner as in Example 1 except that the -10 wt% Si alloy layer 3 was a 20 nm thick Al-M ₁ alloy layer shown in Table 1 and no amorphous carbon layer was provided.

[Comparative Examples 10 to 13] Magnetic disks were obtained according to Examples 19 to 22 except that the amorphous carbon layer was not provided in Examples 19 to 22. Table -1 Al-M ₁ thickness of the alloy layer carbon layer (nm) Example 2 Al-10wt% Si 15 Example 3 Al-10wt% Si 20 Example 4 Al-10wt% Si 40 Example 5 Al-5 wt % Cr 25 Example 6 Al-8wt% W 25 Example 7 Al-10wt% Ti 5 Example 8 Al-10wt% Ti 15 Example 9 Al-10wt% Ti 20 Example 10 Al-10wt% Ti 40 Example 11 Al-2wt% Ta 25 Example 12 Al-5wt% Zr 25 Example 13 Al-5wt% Y 25 Example 14 Al-5wt% V 25 Example 15 Al-5wt% Mo 25 Example 16 Al-5wt% Si-5wt% Cr 25 Example 17 Al-5wt% Si-5wt% Mo 25 Example 18 Al-5wt% Si-3wt% W 25 Example 19 Al-10wt% Si 25 Example 20 Al-10wt% Si 25 Example 21 Al-5wt% Cr 25 Example 22 Al-5wt% Cr 25 Comparative Example 1 Al-10wt% Si 0 Comparative Example 2 Al-5wt% Cr 0 Comparative Example 3 Al-8wt% W 0 Comparative Example 4 Al- Comparative Example 5 Al-2wt% Ta 0 Comparative Example 6 Al-5wt% Zr 0 Comparative Example 7 Al-5wt% Y 0 Comparative Example 8 Al-5wt% V 0 Comparative Example 9 Al-5wt% Mo 0 Comparative Example 10 Al-10wt% Si 0 Comparative Example 11 Al-10wt% Si 0 Comparative Example 12 Al-5wt% Cr 0 Comparative Example 13 Al-5wt% Cr 0 [Example 23] Density 1.5 g / cm ³ , A carbon substrate 1 was produced using glassy carbon having a characteristic of Vickers hardness of 650. Ra of this carbon substrate 1 is 0.8 n.
m (evaluated by a stylus type surface roughness meter).

On this carbon substrate 1, Ar gas pressure of 2 m
Torr, carbon substrate temperature of 250 ℃, DC magnetron sputtering 100nm thick Ti
Layer 2 was provided. The surface of the Ti layer 2 has Ra of 1.0.
was nm. Then, 20 nm thick Al-1 was deposited on the Ti layer 2 by DC magnetron sputtering under the conditions of Ar gas pressure of 2 mTorr and carbon substrate temperature of 260 ° C.
A 0 wt% Si alloy layer 3 was provided. Incidentally, without providing a Ti layer,
Ra was 1.8 nm on the surface after only the Al-10 wt% Si alloy layer 3 was directly formed on the substrate. Therefore, the surface profile in the case where the Al-10 wt% Si alloy layer 3 is provided on the Ti layer 2 has the complex uneven pattern shown in FIG.

After that, an amorphous carbon layer 4 having a thickness of 25 nm was formed on the Al-Si alloy layer 3 by DC magnetron sputtering under the conditions of Ar gas pressure of 2 mTorr and carbon substrate temperature of 260 ° C. Then, a Cr layer 6 having a thickness of 40 nm was formed on the amorphous carbon layer 4 by DC magnetron sputtering, a CoCrPt-based alloy magnetic layer 7 having a thickness of 40 nm was subsequently provided, and a diamond-like carbon layer 8 having a thickness of 15 nm was provided.

After that, a Fomblin Z03 solution was applied to form a lubricant layer 9 having a thickness of 15Å to obtain a magnetic disk as shown in FIG. [Examples 24 to 57] The Ti layer 2 having a thickness of 100 nm in Example 23 was formed on the M ₂ layer shown in Table 2 having a thickness of 100 nm, and the Al-10 wt% Si alloy layer 3 having a thickness of 20 nm was formed on the M ₂ layer.
A magnetic disk was obtained according to Example 23 except that the Al-M ₁ alloy layer shown in Table 2 having a thickness of 0 nm was used.

[Example 58] A magnetic disk was obtained in the same manner as in Example 23 except that the carbon substrate 1 in Example 23 was replaced with a tempered glass substrate. [Example 59] The carbon substrate 1 of Example 23 was replaced with N.
Example 2 except that an iP-plated aluminum substrate was used.
According to 3, a magnetic disk was obtained.

[Example 60] A magnetic disk was obtained in the same manner as in Example 24 except that the tempered glass substrate was used as the carbon substrate 1 in Example 24. [Example 61] The carbon substrate 1 of Example 24 was replaced with N.
Example 2 except that an iP-plated aluminum substrate was used.
According to 4, a magnetic disk was obtained.

Comparative Examples 14 to 22 The Ti layer 2 having a thickness of 100 nm in Example 23 was not provided, and A having a thickness of 20 nm was used.
A magnetic disk was obtained according to Example 23 except that the _1-10 wt% Si alloy layer 3 was replaced with the Al-M ₁ alloy layer having a thickness of 20 nm shown in Table-2. [Comparative Examples 23 to 26] 100 in Examples 58 to 61
20 nm thick Al-1 without the Ti layer 2 of 20 nm thick
The 0 wt% Si alloy layer 3 having a thickness of 20 nm shown in Table-2
except that the l-M ₁ alloy layer according to Example 58-61, to obtain a magnetic disk.

Table-2 M ₂ layer Al-M ₁ alloy layer Ra (nm) of M ₂ layer surface Example 24 Ti Al-5 wt% Cr 1.0 Example 25 Ti Al-8 wt% W 1.0 Example 26 Ti Al-10 wt% Ti 1.0 Example 27 Ti Al-2 wt% Ta 1.0 Example 28 Ti Al-5 wt% Zr 1.0 Example 29 Ti Al-5 wt% Y 1.0 Example 30 Ti Al-5 wt% V 1.0 Example 31 Ti Al-5 wt% Mo 1.0 Example 32 Cr Al-10 wt% Si 1.1 Example 33 Cr Al-5 wt% Cr 1.1 Example 34 Cr Al- 8 wt% W 1.1 Example 35 Cr Al-10 wt% Ti 1.1 Example 36 Cr Al-2 wt% Ta 1.1 Example 37 Cr Al-5 wt% Zr 1.1 Example 38 Cr Al-5 wt% Y 1.1 Example 39 Cr Al-5 wt% V 1.1 Example 40 Cr Al-5 wt% Mo 1.1 Example 41 W Al-10 wt% Si 1.0 Example 42 WA l-5 wt% Cr 1.0 Example 43 Si Al-10 wt% Si 0.9 Example 44 Si Al-5 wt% Cr 0.9 Example 45 Ta Al-10 wt% Si 1.0 Example 46 Ta Al- 5 wt% Cr 1.0 Example 47 Zr Al-10 wt% Si 1.0 Example 48 Zr Al-5 wt% Cr 1.0 Example 49 Y Al-10 wt% Si 0.9 Example 50 Y Al-5 wt% Cr 0.9 Example 51 V Al-10 wt% Si 1.0 Example 52 V Al-5 wt% Cr 1.0 Example 53 Mo Al-10 wt% Si 1.1 Example 54 Mo Al-5 wt% Cr 1 1 Example 55 Ti Al-5wt% Si-5wt% Cr 1.0 Example 56 Ti Al-5wt% Si-3wt% Mo 1.0 Example 57 Ti Al-5wt% Si-3wt% W 1.0 Example 58 Ti Al-10 wt% Si 2.0 Example 59 Ti Al-10 wt% Si 1.8 Example 60 Ti Al-5 wt% Cr 2.1 Example 61 Ti Al-5 wt% Cr 1.8 Comparative example 14-Al-10wt% Si-Comparative Example 15-Al 5 wt% Cr-Comparative Example 16-Al-8 wt% W-Comparative Example 17-Al-10 wt% Ti-Comparative Example 18-Al-2 wt% Ta-Comparative Example 19-Al-5 wt% Zr-Comparative Example 20-Al- 5 wt% Y-Comparative Example 21-Al-5 wt% V-Comparative Example 22-Al-5 wt% Mo-Comparative Example 23-Al-10 wt% Si-Comparative Example 24-Al-10 wt% Si-Comparative Example 25-Al- 5 wt% Cr-Comparative Example 26-Al-5 wt% Cr- [Example 62] A carbon substrate 1 was produced using glassy carbon having characteristics of a density of 1.5 g / cm ³ and a Vickers hardness of 650. Ra of this carbon substrate 1 is 0.8 n.
m (evaluated by a stylus type surface roughness meter).

On this carbon substrate 1, Ar gas pressure of 2 m
Torr, carbon substrate temperature of 250 ℃, DC magnetron sputtering 100nm thick Ti
Layer 2 was provided. The surface of the Ti layer 2 has Ra of 1.2.
was nm. Then, 20 nm thick Al-1 was deposited on the Ti layer 2 by DC magnetron sputtering under the conditions of Ar gas pressure of 2 mTorr and carbon substrate temperature of 260 ° C.
A 0 wt% Si alloy layer 3 was provided. In addition, this Al-10w
In the case of only the t% Si alloy layer 3, the surface has Ra of 1.8.
was nm. Therefore, Al-10 wt% on the Ti layer 2
The surface profile when the Si alloy layer 3 is provided is
It is a composite concavo-convex pattern shown in FIG.

Thereafter, an amorphous carbon layer 4 having a thickness of 25 nm was formed on the Al-Si alloy layer 3 by DC magnetron sputtering under the conditions of Ar gas pressure of 2 mTorr and carbon substrate temperature of 260 ° C. Then, by a DC magnetron sputtering, a Ti layer 5 having a thickness of 100 nm is formed on the amorphous carbon layer 4, and 40 nm is formed on the Ti layer 5.
Thick Cr layer 6 followed by 40 nm thick CoCrPt
A system alloy magnetic layer 7 and a diamond-like carbon layer 8 having a thickness of 15 nm were provided.

After this, a Fomblin Z03 solution was applied to form a lubricant layer 9 having a thickness of 15Å, and a magnetic disk as shown in FIG. 3 was obtained. [Examples 63 to 96] The Ti layer 2 having a thickness of 100 nm in Example 62 was formed on the M ₂ layer shown in Table 3 having a thickness of 100 nm, and the Al-10 wt% Si alloy layer 3 having a thickness of 20 nm was formed on the M ₂ layer.
A magnetic disk was obtained in the same manner as in Example 62 except that the Al-M ₁ alloy layer shown in Table 3 having a thickness of 0 nm was used.

Example 97 A magnetic disk was obtained in the same manner as in Example 62 except that the carbon substrate 1 in Example 62 was a tempered glass substrate. [Example 98] The carbon substrate 1 in Example 62 was replaced with N.
Example 6 except that an iP plated aluminum substrate was used.
According to 2, a magnetic disk was obtained.

Example 99 A magnetic disk was obtained in the same manner as in Example 63 except that the carbon substrate 1 in Example 63 was a tempered glass substrate. [Example 100] A magnetic disk was obtained in the same manner as in Example 63 except that the carbon substrate 1 in Example 63 was an aluminum substrate plated with NiP. [Comparative Examples 27 to 44] The Ti layer 2 having a thickness of 100 nm and the M ₂ layer shown in Table 3 having a thickness of 100 nm and the Al-1 wt% Si alloy layer 3 having a thickness of 20 nm in Example 62 were used.
nm thickness of Al-M ₁ alloy layer shown in Table-3, and T
A magnetic disk was obtained in the same manner as in Example 62 except that the i layer 5 was not provided.

[Comparative Examples 45 to 48] Examples 97 to 100
100nm thickness of the Ti layer 2 to M ₂ layer shown in Table 3 of 100nm thickness at, 20 nm thickness of the Al-1 wt%
Al-M ₁ shown in Table 3 having a thickness of 20 nm for the Si alloy layer 3.
Magnetic disks were obtained according to Examples 97 to 100 except that the alloy layer was not provided with the amorphous carbon layer.

Table 3 M ₂ layer Al—M ₁ alloy layer Ra (nm) of M ₂ layer surface Example 63 Ti Al-5 wt% Cr 1.0 Example 64 Ti Al-8 wt% W 1.0 Example 65 Ti Al-10 wt% Ti 1.0 Example 66 Ti Al-2 wt% Ta 1.0 Example 67 Ti Al-5 wt% Zr 1.0 Example 68 Ti Al-5 wt% Y 1.0 Example 69 Ti Al-5 wt% V 1.0 Example 70 Ti Al-5 wt% Mo 1.0 Example 71 Cr Al-10 wt% Si 1.1 Example 72 Cr Al-5 wt% Cr 1.1 Example 73 Cr Al- 8 wt% W 1.1 Example 74 Cr Al-10 wt% Ti 1.1 Example 75 Cr Al-2 wt% Ta 1.1 Example 76 Cr Al-5 wt% Zr 1.1 Example 77 Cr Al-5 wt% Y 1.1 Example 78 Cr Al-5 wt% V 1.1 Example 79 Cr Al-5 wt% Mo 1.1 Example 80 W Al-10 wt% Si 1.0 Example 81 WA l-5 wt% Cr 1.0 Example 82 Si Al-10 wt% Si 0.9 Example 83 Si Al-5 wt% Cr 0.9 Example 84 Ta Al-10 wt% Si 1.0 Example 85 Ta Al- 5 wt% Cr 1.0 Example 86 Zr Al-10 wt% Si 1.0 Example 87 Zr Al-5 wt% Cr 1.0 Example 88 Y Al-10 wt% Si 0.9 Example 89 Y Al-5 wt% Cr 0.9 Example 90 V Al-10 wt% Si 1.0 Example 91 V Al-5 wt% Cr 1.0 Example 92 Mo Al-10 wt% Si 1.1 Example 93 Mo Al-5 wt% Cr 1 1 Example 94 Ti Al-5wt% Si-5wt% Cr 1.0 Example 95 Ti Al-5wt% Si-3wt% Mo 1.0 Example 96 Ti Al-5wt% Si-3wt% W 1.0 Example 97 Ti Al-10 wt% Si 2.0 Example 98 Ti Al-10 wt% Si 1.8 Example 99 Ti Al-5 wt% Cr 2.1 Example 100 Ti Al-5 wt% Cr 1.8 Comparative Example 27 Ti Al-10wt% Si 1.0 Comparative Example 8 Ti Al-5 wt% Cr 1.0 Comparative Example 29 Ti Al-8 wt% W 1.0 Comparative Example 30 Ti Al-10 wt% Ti 1.0 Comparative Example 31 Ti Al-2 wt% Ta 1.0 Comparative Example 32 Ti Al-5 wt% Zr 1.0 Comparative Example 33 Ti Al-5 wt% Y 1.0 Comparative Example 34 Ti Al-5 wt% V 1.0 Comparative Example 35 Ti Al-5 wt% Mo 1.0 Comparative Example 36 Cr Al- 10 wt% Si 1.1 Comparative Example 37 Cr Al-5 wt% Cr 1.1 Comparative Example 38 Cr Al-8 wt% W 1.1 Comparative Example 39 Cr Al-10 wt% Ti 1.1 Comparative Example 40 Cr Al-2 wt% Ta 1.1 Comparative Example 41 Cr Al-5 wt% Zr 1.1 Comparative Example 42 Cr Al-5 wt% Y 1.1 Comparative Example 43 Cr Al-5 wt% V 1.1 Comparative Example 44 Cr Al-5 wt% Mo 1 .1 Comparative Example 45 Ti Al-10wt% Si 2.0 Comparative Example 46 Ti Al-10wt% Si 1.8 Comparative Example 47 Ti Al-5wt% Cr 2.1 Comparative Example 48 Ti Al- Magnetic disk obtained in wt% Cr 1.8 [Characteristics] above Examples 1 to 22 and Comparative Examples 1 to 13, a surface roughness R
a, static magnetic characteristics (squareness ratio), glide height test GH
The T and CSS durability were examined, and the results are shown in Table-4.

Table-4 Ra (nm) Squareness Ratio GHT CSS Durability Example 1 1.8 0.81 ○ 50000 times or more Example 2 1.8 0.83 ○ 50000 times or more Example 3 1.8 0 .86 ○ 50000 times or more Example 4 1.8 0.86 ○ 50000 times or more Example 5 1.8 0.86 ○ 50000 times or more Example 6 1.6 0.86 ○ 50000 times or more Example 7 1. 6 0.81 ○ 50000 times or more Example 8 1.6 0.83 ○ 50000 times or more Example 9 1.6 0.86 ○ 50000 times or more Example 10 1.6 0.86 ○ 50000 times or more Example 11 1.6 0.86 ○ 50000 times or more Example 12 1.6 0.86 ○ 50000 times or more Example 13 1.6 0.86 ○ 50000 times or more Example 14 1.6 0.86 ○ 50000 times or more Above Example 15 1.6 0.86 ○ 50000 times or more Example 16 1.5 0.86 ○ 50000 times or more Example 17 1.5 0.86 ○ 50000 times or more Example 18 1.5 0.86 ○ 50,000 times or more Example 19 1.7 0.86 ○ 40,000 times Example 20 1.5 0.86 △ 25,000 times Example 21 1.7 0.86 ○ 35,000 times Example 22 1.5 0.86 △ 20,000 Times Comparative Example 1 1.8 0.77 ○ 50000 times or more Comparative Example 2 1.8 0.77 ○ 50000 times or more Comparative Example 3 1.6 0.76 ○ 50000 times or more Comparative Example 4 1.6 0.76 ○ 50,000 times or more Comparative example 5 1.6 0.77 ○ 50000 times or more Comparative example 6 1.6 0.77 ○ 50000 times or more Comparative example 7 1.6 0.77 ○ 50000 times or more Comparative example 8 1. 0.77 ○ 50000 times or more Comparative example 9 1.6 0.77 ○ 50000 times or more Comparative example 10 1.7 0.76 ○ 40000 times Comparative example 11 1.5 0.77 Δ 25000 times Comparative example 12 1.7 0.76 ○ 35000 times Comparative Example 13 1.5 0.77 Δ 2000 times According to this, the substrate and the Al − provided on this substrate
M ₁ (M ₁ is a metal capable of forming a carbide) and Al-M ₁ layer made of alloy material, a metal-based magnetic layer provided on the Al-M ₁ layer on, Al-M ₁ layer and the metal-based the magnetic recording medium comprising an amorphous layer of metallic provided between the magnetic layer, glide height test GHT, excellent in both CSS durability, in particular, the Al-M ₁ layer and the metal magnetic layer The magnetostatic property (squareness ratio) is improved by providing a non-metal amorphous layer therebetween.

Further, Examples 23 to 61 and Comparative Example 1
The surface roughness Ra, the magnetostatic characteristics (squareness ratio), the glide height test GHT, the initial friction coefficient, and the CSS durability of the magnetic disks obtained in Comparative Example 26 to Comparative Example 26 were examined. 5 shows. Table-5 Ra (nm) Squareness Ratio GHT Initial Friction Coefficient CSS Durability Example 23 1.8 0.86 ○ 0.1 100 K times or more Example 24 1.8 0.86 ○ 0.1 100 K times or more Example 25 1.6 0.86 ○ 0.1 100 K times or more Example 26 1.6 0.86 ○ 0.1 100 K times or more Example 27 1.6 0.86 ○ 0.1 100 K times or more Example 28 1.6 0.86 ○ 0.1 100K times or more Example 29 1.6 0.86 ○ 0.1 100K times or more Example 30 1.6 0.86 ○ 0.1 100K times or more Example 31 1. 6 0.86 ○ 0.1 100K times or more Example 32 1.9 0.86 ○ 0.1 100K times or more Example 33 1.9 0.86 ○ 0.1 100K times or more Example 34 1.7 0 .86 ○ 0.1 100K or more times Example 35 1 7 0.86 ○ 0.1 100K times or more Example 36 1.7 0.86 ○ 0.1 100K times or more Example 37 1.7 0.86 ○ 0.1 100K times or more Example 38 1.7 0 .86 ○ 0.1 100 K times or more Example 39 1.7 0.86 ○ 0.1 100 K times or more Example 40 1.7 0.86 ○ 0.1 100 K times or more Example 41 1.8 0.86 ○ 0.1 100K times or more Example 42 1.8 0.86 ○ 0.1 100K times or more Example 43 1.7 0.86 ○ 0.1 100K times or more Example 44 1.7 0.86 ○ 0 .1 100K times or more Example 45 1.8 0.86 ○ 0.1 100K times or more Example 46 1.8 0.86 ○ 0.1 100K times or more Example 47 1.8 0.86 ○ 0.1 100K times or more Example 48 1.8 0.86 ○ 0 .1 100K times or more Example 49 1.7 0.86 ○ 0.1 100K times or more Example 50 1.7 0.86 ○ 0.1 100K times or more Example 51 1.8 0.86 ○ 0.1 100K times or more Example 52 1.8 0.86 ○ 0.1 100K times or more Example 53 1.9 0.86 ○ 0.1 100K times or more Example 54 1.9 0.86 ○ 0.1 100K times As described above Example 55 1.6 0.86 ○ 0.1 100K times or more Example 56 1.6 0.86 ○ 0.1 100K times or more Example 57 1.6 0.86 ○ 0.1 100K times or more Example 58 1.7 0.86 ○ 0.1 75 K times Example 59 1.8 0.86 Δ 0.1 50 K times Example 60 1.7 0.86 ○ 0.1 70 K times Example 61 1.8 0.86 Δ 0.1 50 K times Comparative Example 14 1.8 0.8. 75 ○ 0.1 70K times Comparative Example 15 1.8 0.76 ○ 0.1 60K times Comparative Example 16 1.6 0.77 ○ 0.1 52K times Comparative Example 17 1.6 0.75 ○ 0.1 55K times Comparative example 18 1.6 0.77 ○ 0.1 53K times Comparative example 19 1.6 0.75 ○ 0.1 55K times Comparative example 20 1.6 0.76 ○ 0.1 52K times Comparative example 21 1.6 0.75 ○ 0.1 52K times Comparative Example 22 1.6 0.77 ○ 0.1 55K times Comparative Example 23 1.7 0.76 ○ 0.1 40000 times Comparative Example 24 1.8 0.8. 77 Δ 0.1 25,000 times Comparative Example 25 1.7 0.76 ○ 0.1 35,000 times Comparative Example 26 1.8 0.77 Δ 0.1 20,000 times According to this, the substrate and the substrate are provided on this substrate. Metal M
₂ (M ₂ is a metal capable of forming a carbide) and M ₂ layer as a constituent element, Al-M provided in the M ₂ layer on
₁ (M ₁ is a metal capable of forming carbide, M ₁ may be the same as or different from M ₂ ) A based alloy material
1-M ₁ layer, a metal-based magnetic layer provided on the Al-M ₁ layer, and a non-metal amorphous layer provided between the M ₂ layer and the metal-based magnetic layer. The recording medium has magnetostatic characteristics (squareness ratio), glide height test GH
T is excellent in initial friction coefficient, and in particular, by including the M ₂ layer, the initial friction coefficient is lowered and the durability is effectively improved.

Further, regarding the magnetic disks obtained in Examples 62 to 100 and Comparative Examples 27 to 48, their surface roughness Ra, magnetostatic characteristics (squareness ratio), noise characteristics, glide height test GHT, The initial friction coefficient and CSS durability were examined, and the results are shown in Table-6. Table-6 Ra (nm) Squareness Ratio Noise Characteristics GHT Initial Friction Coefficient CSS Durability Example 62 1.8 0.86 75 ○ 0.1 100 K times or more Example 63 1.8 0.86 75 ○ 0.1 100 K times or more Example 64 1.6 0.86 75 ○ 0.1 100 K times or more Example 65 1.6 0.86 75 ○ 0.1 0.1 K times or more Example 66 1.6 0.86 75 75 ○ 0. 1 100K times or more Example 67 1.6 0.86 75 ○ 0.1 0.1K times or more Example 68 1.6 1.6 0.86 75 ○ 0.1 100K times or more Example 69 1.6 0.86 75 ○ 0 0.1 100K times or more Example 70 1.6 0.86 75 ○ 0.1 100K times or more Example 71 1.9 0.86 75 ○ 0.1 100K times or more Example 72 1.9 0.86 75 ○ 0.1 100K times or more Example 73 1.7 0.86 75 ○ .1 100K times or more Example 74 1.7 0.86 75 ○ 0.1 100K times or more Example 75 1.7 0.86 75 ○ 0.1 100K times or more Example 76 1.7 0.86 75 ○ 0.1 100 K times or more Example 77 1.7 0.86 75 ○ 0.1 100 K times or more Example 78 1.7 0.86 75 ○ 0.1 100 K times or more Example 79 1.7 0.86 75 ○ 0.1 100K times or more Example 80 1.8 0.86 75 ○ 0.1 100K times or more Example 81 1.8 0.86 75 ○ 0.1 100K times or more Example 82 1.7 0.86 75 ○ 0.1 100 K times or more Example 83 1.7 0.86 75 ○ 0.1 100 K times or more Example 84 1.8 0.86 75 ○ 0.1 100 K times or more Example 85 1.8 0. 86 75 ○ 0.1 100K times or more Example 86 1.8 0.86 75 ○ 0.1 100K times or more Example 87 1.8 0.86 75 ○ 0.1 100K times or more Example 88 1.7 0.86 75 ○ 0.1 100K times or more Example 89 1.7 0. 86 75 ○ 0.1 100K times or more Example 90 1.8 0.86 75 ○ 0.1 100K times or more Example 91 1.8 0.86 75 ○ 0.1 100K times or more Example 92 1.9 0 .86 75 ○ 0.1 100 K times or more Example 93 1.9 0.86 75 ○ 0.1 100 K times or more Example 94 1.6 1.6 0.86 75 ○ 0.1 100 K times or more Example 95 1.6 0.86 75 ○ 0.1 100 K times or more Example 96 1.6 0.86 75 ○ 0.1 100 K times or more Example 97 1.7 0.86 75 ○ 0.1 75 K times Example 98 1.8 0.86 75 △ 0.1 50K times Example 99 1.7 0.86 7 5 ○ 0.1 70 K times Example 100 1.8 0.86 75 △ 0.1 50 K times Comparative example 27 1.8 0.86 100 ○ 0.1 0.1 K times or more Comparative example 28 1.8 0.86 100 ○ 0.1 100 K times or more Comparative Example 29 1.6 0.86 100 ○ ○ 0.1 100 K times or more Comparative Example 30 1.6 0.86 100 ○ 0.1 0.1 K times or more Comparative Example 31 1.6 0.8 0.86 100 ○ 0.1 100K times or more Comparative example 32 1.6 0.86 100 ○ 0.1 0.1K times or more Comparative example 33 1.6 0.86 100 ○ 0.1 0.1K times or more Comparative example 34 1.60. 86 100 ○ 0.1 100K times or more Comparative Example 35 1.6 0.86 100 ○ 0.1 100K times or more Comparative Example 36 1.9 0.86 100 ○ 0.1 100K times or more Comparative Example 37 1.9 0 .86 100 ○ 0.1 100K times or more comparison 38 1.7 0.86 100 ○ 0.1 100K or more Comparative Example 39 1.7 0.86 100 ○ 0.1 100K or more Comparative Example 40 1.7 0.86 100 ○ 0.1 100K or more Comparative Example 41 1.7 0.86 100 ○ 0.1 100 K times or more Comparative example 42 1.7 0.86 100 ○ 0.1 100 K times or more Comparative example 43 1.7 0.86 100 ○ 0.1 0.1 K times or more Comparative Example 44 1.7 0.86 100 ○ 0.1 100K times or more Comparative Example 45 1.7 0.76 100 ○ 0.1 75K times Comparative Example 46 1.8 0.77 100 △ 0.1 50K times Comparison Example 47 1.7 0.76 100 ○ 0.1 70K times Comparative Example 48 1.8 0.77 100 △ 0.1 50K times * In Table-4, Table-5 and Table-6, Ra: Stylus surface Measured under the following conditions with a roughness meter (TENCOR P2). Stylus diameter; 6 μm (needle curvature radius), stylus pressing pressure;
7 mg, measurement length; 250 μm × 8 points, trace speed;
2.5 μm / sec, cutoff; 1.25 μm (low-pass filter) Evaluation of adhesion: Nichiban Cello Tape No. 405 (width 1
8 mm, made by Nichiban), ASTM D3359-
A peeling test was performed according to 87.

◯: No peeling, ×: Partial or full peeling at the substrate interface GHT: 50 using MG150T manufactured by PROQUIIP
% Slider head was used. A pass mark with a flying height of 1.2 μ inch is indicated by ◯, and a pass mark with a flying height of 1.6 μ inch is indicated by Δ. CSS test: Yamaha thin film head (Al ₂ O ₃
(TiC slider), head load 3.5 g, head flying height 2.8 μ inch, operation at 5500 rpm for 5 seconds, repeated for 5 seconds, repeated until static friction coefficient (μs) reaches 0.6. I checked the number of times. K in this column means 1000.

Noise characteristics: A power spectrum was measured using a spectrum analyzer (TR-4171 manufactured by Advantest Corporation) so that the signal outputs would be at the same level.
N / S was determined. Displayed as a relative value when the noise of Comparative Example 27 is 100. According to this, the substrate and the metal M provided on the substrate
₂ (M ₂ is a metal capable of forming a carbide) and M ₂ layer as a constituent element, Al-M provided in the M ₂ layer on
₁ (M ₁ is a metal capable of forming carbide, M ₁ may be the same as or different from M ₂ ) A based alloy material
an I-M ₁ layer, a metal-based magnetic layer provided on the Al-M ₁ layer, a non-metal amorphous layer provided between the M ₂ layer and the metal-based magnetic layer, and a metal-based magnetic layer. Under the layer Ti
Alternatively, the first underlayer made of a Ti alloy has Cr on it.
Alternatively, the magnetic recording medium provided with the second underlayer made of a Cr alloy is excellent in all of the magnetostatic characteristics (squareness ratio), glide height test GHT, initial friction coefficient, and CSS durability. By providing No. 5, noise can be effectively reduced.

[0057]

According to the present invention, it is possible to obtain a magnetic recording medium which is excellent in electromagnetic conversion characteristics, can be used for high density recording, and is excellent in running property and durability.

[Brief description of drawings]

FIG. 1 is a schematic diagram of a magnetic recording medium of Example 1.

FIG. 2 is a schematic diagram of a magnetic recording medium of Example 23.

FIG. 3 is a schematic diagram of a magnetic recording medium of Example 62.

[Explanation of symbols]

 1 Carbon substrate 2 Ti layer 3 Al-10 wt% Si alloy layer 4 Amorphous carbon layer 5 Ti layer 6 Cr layer 7 CoCrPt-based alloy magnetic layer 8 Protective layer

Claims (15)

[Claims] 1. A substrate and Al-provided on the substrate.
M ₁ (M ₁ is a metal capable of forming a carbide) and Al-M ₁ layer made of alloy material, a metal-based magnetic layer provided on the Al-M ₁ layer on the Al-M ₁ layer and the metal A magnetic recording medium comprising a non-metal amorphous layer provided between the magnetic recording medium and a system magnetic layer. 2. A substrate and a metal M provided on the substrate
₂ (M ₂ is a metal capable of forming a carbide) and M ₂ layer as a constituent element, Al-M provided in the M ₂ layer on
₁ (M ₁ is a metal capable of forming carbide, M ₁ may be the same as or different from M ₂ ) A based alloy material
an I-M ₁ layer, a metal-based magnetic layer provided on the Al-M ₁ layer, and a non-metal amorphous layer provided between the M ₂ layer and the metal-based magnetic layer. A magnetic recording medium characterized by: 3. The magnetic recording medium according to claim 1, wherein the substrate is a carbon substrate. 4. The magnetic recording medium according to claim 1, wherein an underlayer made of Cr or a Cr alloy is provided below the metallic magnetic layer. 5. A first underlayer made of Ti or a Ti alloy is provided under the metallic magnetic layer, and a second underlayer made of Cr or a Cr alloy is provided thereon. Alternatively, the magnetic recording medium according to claim 2. 6. The magnetic recording medium according to claim 1, wherein a protective layer is provided on the metallic magnetic layer. 7. The non-metallic amorphous layer is formed directly on the Al layer.
Claim, characterized in that thus provided for the -M ₁ layer on 1
~ The magnetic recording medium according to claim 6. 8. The thickness of the non-metal amorphous layer is 5 to 5.
It is 0 nm, The magnetic recording medium in any one of Claims 1-7 characterized by the above-mentioned. 9. The non-metal amorphous layer is an amorphous carbon layer.
Any magnetic recording medium. 10. The thickness of the Al-M ₁ layer is 5 to 100 nm.
The magnetic recording medium according to any one of claims 1 to 9, wherein 11. The Al-M ₁ layer has a concavo-convex structure on the surface, and the lower layer portion is continuous.
The magnetic recording medium according to claim 10. 12. The magnetic recording medium according to claim 2, wherein the M ₂ layer has a thickness of 5 to 200 nm. 13. The magnetic recording medium according to claim 2, wherein the M ₂ layer has a concavo-convex structure on the surface and the lower layer portion is continuous. 14. The magnetic recording medium according to claim 4, wherein the underlayer made of Cr or a Cr alloy has a thickness of 10 to 200 nm. 15. The magnetic recording medium according to claim 5, wherein the underlayer made of Ti or a Ti alloy has a thickness of 10 to 200 nm.