JPH08179304A - Color filter substrate and method for correcting its defect - Google Patents

Abstract

PURPOSE: To provide a color filter substrate having high quality at a high yield by easily correcting pattern chipping defects. CONSTITUTION: An ITO electrode 2 which is transparent conductive film, is formed on the transparent glass substrate 1. Black matrix patterns 31 to 35 as well as red color filter patterns 4, green color filter patterns 5 and blue color filter patterns 6 are formed on the ITO electrode 2. A light shieldable resin is electrodeposited on the defective parts of the black matrix patterns 32 or the defective parts of the red color filter patterns 4 and the green color filter patterns 5 to form light shieldable films 7. A dyeable resin film is formed on the glass substrate 1 and the black matrix patterns and color filter patterns are formed thereon. The dyeable resin films of the defective parts are dyed with the black matrix patterns, etc., as a mask to form the light shieldable dyed regions.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defect correction method for a color filter (CF) substrate used for color separation of a CCD camera, a color liquid crystal display device or the like.

In recent years, liquid crystal display devices have been used in various fields such as display devices for personal computers, word processors, computer terminal equipment, TV receivers, etc. by taking advantage of thinness, light weight, low power consumption and the like. And
Nowadays, the color liquid crystal display devices are required to be large-sized, high-definition, large-capacity, and colorized, and the improvement of the quality of the color filter substrate, which is one of the important constituent members of the liquid crystal display device, becomes an issue. ing.

[0003]

2. Description of the Related Art As the display area of a liquid crystal display device becomes larger, the area of a color filter area formed on a glass substrate becomes wider, so that defects in the color filter substrate greatly affect the manufacturing yield and display quality. . As the defects of the color filter substrate, foreign matter adhesion, black defect generation, pattern defects (white voids, pinholes) and the like can be mentioned. Among them, the pattern defects have the largest influence on the display quality.

That is, the transmissivity of a normal panel is 2 to 7% in the case of black display, whereas the transmissivity of a defective portion is about 10%, and it is 50% or more depending on the place. When mounted on a display and displayed, the brightness difference becomes noticeable and becomes a brightness defect. Conventionally, a colored photosensitive resin is applied to the periphery of the defective portion, and the portion where the luminance defect is generated is exposed and developed,
A colored resin film is formed in the place where the pattern chip defect is generated to correct the pattern chip defect.

[0005]

However, in the above-described conventional defect correction method, it is difficult to accurately align a mask for exposing a region where a pattern defect is generated, and the number of patterning steps is large. Therefore, it has not been put to practical use. SUMMARY OF THE INVENTION It is an object of the present invention to provide a color filter substrate that can easily correct a pattern defect and can realize a high-yield color filter substrate of high quality and a defect repairing method thereof.

[0006]

In a color filter substrate according to the present invention, a conductive coating film is formed on the substrate, and a black matrix pattern and a defective portion of the color filter pattern formed on the conductive coating film. A structure was adopted in which a light-shielding resin was electrodeposited on the black matrix pattern or the defective portion of the color filter pattern was corrected.

In this case, the light-shielding resin may be electrodeposited between the color filter patterns as well as the defective portions of the black matrix pattern or the color filter pattern. A conductive coating may be formed, and the electrodeposition conductive coating for electrodeposition of the light-shielding resin may also be used as a display electrode, and the light-shielding resin may be electrodeposited. The low reflectance resin coating may be formed between the conductive coating and the black matrix pattern.

In another color filter substrate of the present invention, a dyeable resin film is formed on the substrate, and the black matrix pattern of the dyeable resin film and the area exposed from the color filter pattern are dyed. The black matrix or the defective portion of the color filter pattern is shielded from light.

In this case, the dyed dyeable resin film in the region exposed from the black matrix pattern and the color filter pattern can be covered with the protective film, and the dyeable resin film and the black matrix pattern can be used. A low reflectance resin coating may be formed between the layers.

Further, in another color filter substrate according to the present invention, a dyeable resin coating is formed on the substrate, and the area exposed to the defective portion of the color filter pattern of the dyeable resin coating and the black matrix. The structure in which the pattern part is dyed is adopted. In these cases, the substrate and the conductive coating can be translucent.

In the method of correcting a defect of a color filter substrate according to the present invention, a step of forming a transparent conductive film on a transparent substrate and a black matrix pattern and a color filter pattern on the transparent conductive film. A step and a step of electrodepositing a light-shielding resin on the defective portion of the black matrix or color filter pattern using the transparent conductive film as an electrode were adopted.

In this case, the step of electrodepositing the light-shielding resin at the same time between the defective portion of the black matrix pattern or the color filter pattern and the color filter pattern can be performed. Can be a step of forming a transparent conductive coating on the conductive resin after electrodeposition, and a low reflectance between the transparent conductive coating and the black matrix pattern layer for electrodepositing the light-shielding resin. It may be a step of forming a resin film.

Further, in another defect repairing method for a color filter substrate according to the present invention, a step of forming a dyeable resin film on the transparent substrate, a black matrix pattern on the dyeable resin film, and A step of forming a color filter pattern and a step of dyeing an exposed region of the dyeable resin film to shield a defective portion of the black matrix or the color filter pattern from each other were adopted. In this case, a step of forming a low reflectance resin film between the dyeable resin film and the black matrix pattern layer can be performed.

Further, in another color filter substrate defect correcting method according to the present invention, a step of forming a dyeable resin film on the transparent substrate and a color filter pattern on the dyeable resin film. The step of forming and dyeing the area exposed to the defective portion of the color filter pattern of the dyeable resin coating to shield the defective portion of the color filter pattern from light, and to form the black matrix pattern portion of the dyeable resin coating. A process of forming a black matrix pattern by dyeing was adopted.

[0015]

FIG. 1 is a diagram for explaining the principle of the defect correcting method (1) for a color filter substrate according to the present invention, and (A) to (F) show respective steps. In this figure, 1 is a glass substrate,
2 is an ITO electrode, 3 ₁ , 3 ₂ , 3 ₃ , 3 ₄ , 3 ₅ is a black matrix pattern, 4 is a red color filter pattern, 5 is a green color filter pattern, 6 is a blue color filter pattern, and 7 is a light-shielding film. Is.

The principle of the color filter substrate defect correcting method (1) of the present invention will be described with reference to this principle explanatory diagram.

First Step (See FIG. 1A) ITO electrode 2 which is a transparent conductive film is formed on a glass substrate 1.
To form. This ITO electrode 2 will be used in a later process to form black matrix (BM) patterns 3 ₁ , 3 ₂ , 3 ₃ ,
3 _4, 3 ₅ or the red color filter pattern 4, a green color filter pattern 5 is an electrode for blocking by electrodepositing a light-shielding film 7 to the defective portion of the blue color filter pattern 6.

Second step (see FIG. 1B) Black matrix patterns 3 ₁ , 3 ₂ , 3 ₃ , 3 ₄ , 3 ₅ are formed as a light-shielding film on the ITO electrode 2 formed in the first step. And the photolithography technique are used.

Third step (see FIG. 1C) The red color filter is formed by applying a red photosensitive resin, exposing it using an exposure mask having an opening in a region where the red color filter pattern 4 is formed, and developing it. Pattern 4 is formed.

Fourth Step (see FIG. 1D) A green color filter pattern 5 and a blue color filter pattern 6 are formed by the same steps as the red color filter pattern 4.

Fifth step (see FIG. 1E) At this time, it is assumed that a defect occurs in the black matrix pattern 3 ₂ . Defects of the black matrix pattern 3 _2, defects in a part of the red color filter pattern 4 and the green color filter pattern 5 formed thereon.

The electrodeposition of light-shielding film 7 to the defective portion of the sixth step (FIG. 1 (F)) An ITO electrode 2 as the electrode, a black matrix pattern 3 ₂ and the red color filter pattern 4 and the green color filter pattern 5 .

FIG. 2 is an explanatory view of the principle of the defect correcting method (2) of the color filter substrate according to the present invention, in which (A) to (F).
Indicates each step. In this figure, 11 is a glass substrate, 12 is a dyeable resin film, 12 ₁ is a dyed region, and 13 is a dyed region.
₁ , 13 ₂ , 13 ₃ , 13 ₄ , 13 ₅ are black matrix patterns, 14 are red color filter patterns, 1
Reference numeral 5 is a green color filter pattern, and 16 is a blue color filter pattern.

The principle of the color filter substrate defect correcting method (2) of the present invention will be described with reference to this principle explanatory diagram.

First step (see FIG. 2A) A dyeable resin film 12 is formed on a glass substrate 11.
The dyeable resin coating 12 dyes defective portions of the black matrix patterns 13 ₁ , 13 ₂ , 13 ₃ , 13 ₄ , 13 ₅ or the red color filter pattern 14, the green color filter pattern 15, and the blue color filter pattern 16. It is a film for blocking light.

Second step (see FIG. 2B) Black matrix patterns 13 ₁ , 13 ₂ , 13 ₃ , 1 are formed on the dyeable resin film 12 formed in the first step.
3 ₄ and 13 ₅ are formed by using the film forming technique of the light shielding film and the photolithography technique.

Third step (see FIG. 2C) The red color filter is formed by applying a red photosensitive resin, exposing it using an exposure mask having an opening in the region where the red color filter pattern 14 is formed, and developing it. The pattern 14 is formed.

Fourth Step (see FIG. 2D) A green color filter pattern 15 and a blue color filter pattern 16 are formed by the same steps as the red color filter pattern 14.

Fifth Step (see FIG. 2E) At this time, it is assumed that a defect occurs in the black matrix pattern 13 ₂ . This black matrix pattern 13 ₂
The red color filter pattern 14 and the green color filter pattern 15 formed thereon due to the defect of
Is partially defective.

Sixth step (see FIG. 2F) Black matrix patterns 13 ₁ , 13 ₃ , 13 ₄ ,
13 ₅ a red color filter pattern 14, a green color filter pattern 15, a blue color filter pattern 1
The dyeable resin film 12 is dyed by using 6 as a mask to form a dyed region 12 ₁ that shields light from the defective portions of the black matrix pattern 13 ₂ , the red color filter pattern 14 and the green color filter pattern 15.

According to the present invention, as described with reference to FIGS. 1 and 2, after forming the black matrix pattern and the color filter pattern, the light-shielding film is electrodeposited or the dyeable resin film 12 is dyed. The defect can be corrected by shielding only the defective portions of the black matrix pattern and the color filter pattern.

Therefore, the pattern defect and the pinhole defect can be corrected by self-alignment, and the brightness defect can be eliminated. Further, in order to form a transparent conductive film or a dyeable film to be an electrodeposition electrode on a glass substrate used as a transparent conductive substrate, when used as a color filter of a liquid crystal display device, elution of alkaline components from the glass substrate Therefore, it is possible to prevent a decrease in the specific resistance of the liquid crystal due to the alkaline component eluted from the glass substrate, a change in display characteristics, and a deterioration in the adhesiveness of the sealing material.

[0033]

【Example】

(First Embodiment) FIGS. 3 and 4 are explanatory views of a defect repairing process of a color filter substrate according to the first embodiment of the present invention.
(H) has shown each process. In this figure, 21
Is an alkali-free glass substrate, 22 is an ITO electrode, 23 ₁ ,
23 ₂ , 23 ₃ , 23 ₄ , 23 ₅ are black matrix patterns, 24 ₂ are openings, 24 ₁ is a light-shielding film, 24 is an exposure mask, 25 is a red photosensitive resin film, 25 ₁ is a red color filter pattern, 26 Reference numeral ₁ is a green color filter pattern, 27 ₁ is a blue color filter pattern, and 28 is a light-shielding electrodeposition layer. A defect repairing method for a color filter substrate according to the first embodiment of the present invention will be described with reference to the process explanatory drawings.

First step (see FIG. 3A) A thickness 150 serving as an electrode when electrodepositing the light-shielding electrodeposition layer 28 on a 1.1 mm-thick non-alkali glass substrate 21.
The ITO electrode 22 of 0 to 2000 Å is formed by the DC magnetron sputtering method. Since it is desirable that the electrode for electrodepositing the light-shielding electrodeposition layer 28 has a low resistance (15Ω / □ or less), it is heated to 250 ° C. during sputtering.

Second step (see FIG. 3B) A photosensitive black resin (CK manufactured by Fuji Hunt) having a thickness of 1 μm is formed on the ITO electrode 22 formed in the first step by a spinner.
And pre-cure at 90 ℃ for 30 minutes, 1500m
A matrix (mesh) is exposed with exposure light having an energy of j, and a black matrix pattern 23 ₁ , 23 ₂ , 2 is passed through an immersion developing process (the developing solution is a CD manufactured by Fuji Hunt).
3 ₃ , 23 ₄ , and 23 ₅ are formed.

Third step (see FIG. 3C) Black matrix pattern 2 formed in the second step
A red photosensitive resin (CR-2000 manufactured by Fuji Hunt) having a thickness of 1.5 on top of 3 ₁ , 23 ₂ , 23 ₃ , 23 ₄ , and 23 _5.
Then, the red photosensitive resin film 25 is formed.

Fourth step (see FIG. 3 (D)) The red photosensitive resin film 25 applied and formed in the third step is pre-cured to form an opening 24 ₂ at a position where a red color filter pattern 25 ₁ is to be formed. Using the exposure mask 24 provided with the film 24 ₁ , the red photosensitive resin film 25 is exposed with exposure light having energy of 400 to 500 mj.

Fifth step (see FIG. 4 (E)) The red photosensitive resin film 25 selectively exposed in the fourth step is subjected to immersion development (developing solution is a CD made by Fuji Hunt) to obtain a red color filter pattern 25 ₁ To form.

Step 6 (see FIG. 4 (F)) By repeating the same steps as the third step, the fourth step and the fifth step, a green photosensitive resin (CG-50 manufactured by Fuji Hunt) is obtained.
Forming a green color filter pattern 26 ₁ with 00), the blue photosensitive resin (Fuji Hunt Ltd. CB-2000)
To form the blue color filter pattern 27 ₁ .

Seventh step (see FIG. 4G) At this time, it is assumed that a defect occurs in the black matrix pattern 23 ₂ . This black matrix pattern 23 ₂
The red color filter pattern 25 ₁ and the green color filter pattern 2 formed thereon due to the defect of
A defect occurs in part of 6 ₁ .

Eighth step (see FIG. 4H) Using the ITO electrode 22 as an electrode, electrodeposition is performed using an electrodeposition liquid in which carbon black is dispersed in polyester / melamine resin. By this electrodeposition step, the light-shielding electrodeposition layer is formed on the portion where the ITO electrode 22 is exposed, that is, on the portion where the defects of the black matrix pattern 23 ₂ , the red color filter pattern 25 ₁ and the green color filter pattern 26 ₁ occur. Thus, the light-shielding electrodeposition layer 28 corrects the defective portion.

In this case, the red color filter pattern 2
5 ₁ , the green color filter pattern 26 ₁ and the blue color filter pattern 27 ₁ are thinly formed to a thickness of 0.5 μm or less, and the ITO electrode 22, the red color filter pattern 25 ₁ and the green color filter pattern 26 ₁ are formed in the electrodeposition process. By reducing the potential difference on the surface of the blue color filter pattern 27 ₁ , the ITO electrode 22 can be used also as a display electrode when this color filter substrate is used in a liquid crystal display device.

(Second Embodiment) FIGS. 5 and 6 are explanatory views of a defect repairing process of a color filter substrate according to a second embodiment of the present invention, in which (A) to (G) show each process. . In this figure, 31 is non-alkali glass, 32 is a dyeable resin coating, 32 ₁ is a dyed area, 33 ₁ , 33 ₂ , 33 ₃ , 33.
₄ , 33 ₅ are black matrix patterns, 34 ₁ are red color filter patterns, 35 ₁ are green color filter patterns, 36 ₁ are blue color filter patterns, 3
7 is a protective film. A defect repairing method for a color filter substrate according to the second embodiment of the present invention will be described with reference to the process explanatory drawings.

First step (see FIG. 5 (A)) A dyeable resin coating 32 of gelatin, casein, polyvinyl alcohol or the like having a thickness of about 1 μm is formed on a non-alkali glass substrate 31 having a thickness of 1.1 mm. To do.

Second step (see FIG. 5 (B)) On the dyeable resin film 32 formed in the first step, a photosensitive material is formed.
Black resin (Fuji Hunt CK) spinner thickness 1
Apply to μm, pre-cure at 90 ℃ for 30 minutes, 150
Matrix (mesh) shape with exposure light with energy of 0 mj
Exposure process and immersion development process (developer is Fuji Hunt's CD)
Through the black matrix pattern 33 ₁, 33₂, 3
Three₃, 33_Four, 33_FiveTo form

Third step (see FIG. 5C) Black matrix pattern 3 formed in the second step
3 _1, 33 _2, 33 _3, 33 _4, 33 on the _5, red-sensitive resin (Fuji Hunt Ltd. CR-2000) to a thickness of 1.5
to form a red photosensitive resin coating film, and after pre-curing, a red photosensitive resin coating film is formed using an exposure mask provided with a light-shielding film having an opening at a position where the red color filter pattern 34 ₁ is to be formed. Is exposed to an exposure light having an energy of 400 to 500 mj, and is subjected to immersion development (the developing solution is a CD manufactured by Fuji Hunt) to obtain a red color filter pattern 34 _1.
To form.

Fourth Step (see FIG. 5D) By repeating the same steps as the third step, the green color filter pattern 35 ₁ is formed using the green photosensitive resin (CG-5000 manufactured by Fuji Hunt). A blue color filter pattern 36 ₁ is formed using a blue photosensitive resin (CB-2000 manufactured by Fuji Hunt).

Fifth Step (see FIG. 6E) At this time, it is assumed that a defect occurs in the black matrix pattern 33 ₂ . This black matrix pattern 33 ₂
The red color filter pattern 34 ₁ and the green color filter pattern 3 formed thereon due to the defect of
Defects in a part of the 5 _1.

Sixth step (see FIG. 6F) Black matrix patterns 33 ₁ , 33 ₃ , 33 ₄ ,
33 ₅ and the red color filter pattern 34 ₁ , the green color filter pattern 35 ₁ and the blue color filter pattern 36 ₁ are masked, and the dyeable resin film 32 is dyed using a dyeing bath of an acid dye to form a black matrix pattern. A dyed region 32 ₁ that shields light is formed on the defective portions of the 33 ₂ , the red color filter pattern 34 _1, and the green color filter pattern 35 ₁ .

Step 7 (see FIG. 6G) Next, the surface is covered with a protective film 37 made of acrylic resin, epoxy resin or the like, and the dye leaches out from the dyed region 32 ₁ or reacts with liquid crystal or the like. As a result, the dyed region 32 ₁ is prevented from discoloring to lose its light-shielding property or the liquid crystal or the like from being deteriorated.

(Third Embodiment) FIG. 7 is an explanatory view of a defect correcting process of a color filter substrate according to a third embodiment of the present invention.
(A) and (B) have shown each process. In this figure, 41 is an alkali-free glass substrate, 42 is an ITO electrode,
43 ₁ , 43 ₂ , 43 ₃ , 43 ₄ , 43 ₅ are black matrix patterns, 44 ₁ are red color filter patterns, 45 ₁ are green color filter patterns, 46 ₁ are blue color filter patterns, and 47 is a light-shielding electrodeposition layer. Is. A defect repairing method for a color filter substrate according to a third embodiment of the present invention will be described with reference to the process explanatory drawings.

First step (see FIG. 7A) Thickness of 1500 to 2 serving as an electrode when a light-shielding film is electrodeposited on a 1.1 mm-thick non-alkali glass substrate 41.
The 000Å ITO electrode 42 is formed by the DC magnetron sputtering method. C on the ITO electrode 42
A black or black matrix pattern 43 ₁ , 43 ₂ , 43 ₃ , 43 ₄ , 43 ₅ is formed by forming a conductive metal film of r or the like and using a photolithography technique.

This black matrix pattern 43 ₁ ,
Red color filter pattern 44 ₁ and green color filter pattern 4 are provided on 43 ₂ , 43 ₃ , 43 ₄ , and 43 _5.
5 ₁ and blue color filter pattern 46 ₁ are formed. At this time, it is assumed that the black matrix pattern 43 ₂ has a defect. This black matrix pattern 4
The defect of 3 ₂ causes a defect in a part of the red color filter pattern 44 ₁ and the green color filter pattern 45 ₁ formed thereon.

Second step (see FIG. 7B) In order to correct this defective portion, the ITO electrode 42 is used as an electrode.
Then, carbon black on polyester / melamine resin
Electrodeposition is carried out using an electrodeposition liquid in which
In addition, the black matrix pattern 43₁, 4
Three₂, 43₃, 43 _Four, 43_FiveConductive metal film such as Cr
Since the light-shielding electrodeposition layer 47 is formed by
Pattern 44₁, Green color filter pattern 45₁
And blue color filter pattern 46₁In the gap of
Will be formed and it will be possible to flatten the surface.
It When the surface is flattened, this color filter substrate is
When used in a liquid crystal display device, it suppresses uneven cell pressure and
It has the effect of improving the orientation of molecules.

(Fourth Embodiment) FIG. 8 is an explanatory view of a defect repairing process of a color filter substrate according to a fourth embodiment of the present invention.
(A) and (B) have shown each process. In this figure, 51 is an alkali-free glass substrate, 52 is an ITO electrode,
53 ₁ , 53 ₃ , 53 ₄ , 53 ₅ are black matrix patterns, 54 ₁ are red color filter patterns, 55
₁ is a green color filter pattern, 56 ₁ is a blue color filter pattern, 57 is a light-shielding electrodeposition layer, and 58 is ITO.
It is a membrane. A defect repairing method for a color filter substrate according to a fourth embodiment of the present invention will be described with reference to the process explanatory drawings.

First step (see FIG. 8A) The ITO electrode 5 which becomes an electrode when the light-shielding film 57 is electrodeposited on the non-alkali glass substrate 51 having a thickness of 1.1 mm.
Form 2 Black matrix patterns 53 ₁ , 53 ₂ (not shown in the figure), 53 ₃ , 53 ₄ , 53 ₅ are formed on the ITO electrode 52, and a red color filter pattern 54 ₁ is formed thereon. , Green color filter pattern 55 ₁ and blue color filter pattern 56 ₁ are formed.

The black matrix pattern 5
Three₂, Red color filter pattern 54 ₁And green color
Filter pattern 55₁Light-shielding property by electrodeposition on the defective part of
The electrodeposition layer 57 is formed.

Second step (see FIG. 8B) The black matrix patterns 53 ₁ , 53 ₂ , 53 ₃ , 53 ₄ , 53 ₅ with the defective portions thus corrected, the red color filter pattern 54 ₁ , and the green color The ITO film 58 can be further formed on the filter pattern 55 ₁ and the blue color filter pattern 56 ₁ to reduce the resistance of the ITO electrode 52. Further, if a conductive film is used as the black matrix patterns 53 ₁ , 53 ₂ , 53 ₃ , 53 ₄ , 53 ₅ , the resistance can be further reduced.

(Fifth Embodiment) FIGS. 9 and 10 are explanatory diagrams of a defect repairing process for a color filter substrate according to a fifth embodiment of the present invention, in which (A) to (H) show respective processes. . In this figure, 61 is a non-alkali glass substrate, and 62 is ITO.
Electrodes, 63 are low-reflective photosensitive resin coatings, 64 ₁ , 64 ₂ ,
64 ₃ , 64 ₄ , 64 ₅ are black matrix patterns, 65 ₁ is a red color filter pattern, 66 ₁ is a green color filter pattern, 67 ₁ is a blue color filter pattern, and 68 is a light-shielding electrodeposition layer. A defect repairing method for a color filter substrate according to a ninth embodiment of the present invention will be described with reference to the process explanatory drawings.

First step (see FIG. 9 (A)) A thickness of 150 serving as an electrode when the light-shielding electrodeposition layer 68 is electrodeposited on a 1.1 mm-thick non-alkali glass substrate 61.
The ITO electrode 62 of 0 to 2000 Å is formed by the DC magnetron sputtering method.

Second step (see FIG. 9B) A positive resist in which a pigment is dispersed is applied on the ITO electrode 62 formed in the second step to form a low reflection photosensitive resin film 63. .

Third step (see FIG. 9C) C is formed on the low reflection photosensitive resin coating 63 formed in the second step.
A metal coating such as r is formed.

Fourth Step (See FIG. 9D) Black matrix patterns 64 ₁ , 64 ₂ , 64 ₃ , 64 are formed by selectively etching the metal film of Cr or the like formed in the third step by using a lithography technique. ₄ , 64 ₅ are formed.

Fifth Step (see FIG. 10E) When the positive type low reflection photosensitive resin coating 63 is used, the black matrix pattern 64 ₁ formed in the fourth step,
The low reflection photosensitive resin coating 63 is exposed using 64 ₂ , 64 ₃ , 64 ₄ , 64 ₅ as a mask. When the negative low-reflection photosensitive resin coating 63 is used, exposure is performed from below the alkali-free glass substrate 61 using a photomask.

Sixth step (see FIG. 10F) The low reflection photosensitive resin coating 63 exposed in the fifth step is developed to form black matrix patterns 64 ₁ , 64 ₂ , 64.
_The low-reflective photosensitive resin coating 63 is left under ₃ , 64 ₄ and 64 ₅ .

Seventh step (see FIG. 10G) Black matrix pattern 6 formed in the sixth step
4 _1, 64 _2, 64 _3, 64 _4, 64 on the _5, the red color filter pattern 65 ₁ by the process described in the first embodiment, a green color filter pattern 66 _1,
A blue color filter pattern 67 ₁ is formed. At this time, it is assumed that a part of the black matrix pattern 64 ₂ has a defect, and a part of the red color filter pattern 65 ₁ and the green color filter pattern 66 ₁ formed thereon also has a defect.

Eighth step (see FIG. 10H) Using the ITO electrode 62 as an electrode, electrodeposition is performed using an electrodeposition liquid in which carbon black is dispersed in polyester / melamine resin. By this electrodeposition step, the light-shielding electrodeposition layer is formed in the portion where the ITO electrode 62 is exposed, that is, in the portion where the black matrix pattern 64 ₂ , the red color filter pattern 65 ₁ and the green color filter pattern 66 ₁ have defects. 68 is formed, and the light-shielding electrodeposition layer 68 corrects the defective portion. According to this embodiment, surface reflection at the time of display can be reduced.

(Sixth Embodiment) FIG. 11 shows a sixth embodiment of the present invention.
FIG. 6 is an explanatory diagram of a defect correction process of the color filter substrate of the example.
(A) to (D) indicate each step. In this figure
, 71 is a non-alkali glass substrate, and 72 is a dyeable resin.
Coating, 72 ₁, 72₂Is the stained area, 73₁Is red color
Filter pattern, 74₁Is a green color filter pattern
75₁Is a blue color filter pattern, 76 is protection
It is a membrane. 6th Example of this invention by this process explanatory drawing
A method of correcting a defect of the color filter substrate will be described.

First step (see FIG. 11 (A)) A dyeable resin film 72 of gelatin, casein, polyvinyl alcohol or the like having a thickness of about 1 μm is formed on a non-alkali glass substrate 71 having a thickness of 1.1 mm. To do.

Second step (see FIG. 11 (B)) On the dyeable resin film 72 formed in the first step, a red coat is formed.
Ra filter pattern 73₁, Green color filter pattern
74₁, Blue color filter pattern 75 ₁Forming
I do. At this time, the red color filter pattern 73₁of
It is assumed that a part is defective.

Third step (see FIG. 11C) Red color filter pattern 73₁, Green color fill
Pattern 74₁, Blue color filter pattern 75₁
Masking the dyeable resin coating 72 with an acid dye
By dyeing with
Turn 73₁Light-blocking dyeing area 72 on the defective part of₁Shape
To correct the defective parts, and red color filter pattern 7
Three₁, Green color filter pattern 74₁, Blue color
Filter pattern 75₁With a black matrix between
Light-blocking dyeing area 72 that functions as ₂To form

Fourth Step (see FIG. 11D) Next, the surface is covered with a protective film 76 made of an acrylic resin, a urethane resin, etc., so that the dye is leached out from the dyed areas 72 ₁ and 72 ₂ and the dyed areas 72 ₁ and 72 ₂ are protected from liquid crystals. Reacting and stained area 72 ₁ ,
72 ₂ or losing light shielding property discolored, liquid crystal or the like is prevented from degraded.

According to this embodiment, the red color filter pattern 73 ₁ , the green color filter pattern 74 ₁ ,
Since the dyeing area 72 ₁ that corrects the defect of the blue color filter pattern 75 ₁ can be formed and the light-blocking dyeing area 72 ₂ that functions as a black matrix pattern can be formed at the same time, the number of steps is reduced.

In the above embodiment, the transparent substrate such as glass is used as the substrate and the transparent conductive film such as ITO is used as the conductive film. However, the present invention is applicable to the reflective liquid crystal display panel. It can also be applied to a color filter substrate in which a color filter is provided on the reflective substrate side. In this case, the reflective surface provided on the surface of the substrate should be Cr
By forming a metal film such as the above, there is also an advantage that this metal film can be used as a conductive film.

[0075]

As described above, according to the present invention,
Defects in the black matrix pattern or color filter pattern can be self-aligned because the electrodeposition electrode of the light-shielding electrodeposition layer or the dyeable resin coating is provided under the black matrix pattern or color filter pattern. Since it can be corrected, the quality and yield of the color filter substrate are improved, and the bright spot defect of the display device using this color filter substrate can be prevented. Further, the electrodeposition electrode and the dyeable resin film serve as a protective layer in the dyed area, and it is possible to prevent elution of the alkaline component from the glass substrate.

[Brief description of drawings]

FIG. 1 is a diagram illustrating the principle of a color filter substrate defect correction method (1) according to the present invention, in which (A) to (F) show respective steps.

FIG. 2 is an explanatory view of the principle of the color filter substrate defect repairing method (2) of the present invention, in which (A) to (F) show respective steps.

FIG. 3 is an explanatory diagram (1) of a defect repairing process of the color filter substrate according to the first embodiment of the present invention, in which (A) to (D) show each process.

FIG. 4 is an explanatory view (2) of the defect repairing process of the color filter substrate of the first embodiment of the present invention, in which (E) to (H) show each process.

FIG. 5 is an explanatory diagram (1) of a defect repairing process of the color filter substrate according to the second embodiment of the present invention, in which (A) to (D) show each process.

FIG. 6 is an explanatory diagram (2) of the defect repairing process of the color filter substrate of the second embodiment of the present invention, in which (E) to (G) show each process.

FIG. 7 is an explanatory diagram of a defect repairing process of the color filter substrate according to the third embodiment of the present invention, in which (A) and (B) show each process.

FIG. 8 is an explanatory diagram of a defect repairing process of the color filter substrate according to the fourth embodiment of the present invention, in which (A) and (B) show each process.

FIG. 9 is an explanatory view (1) of a defect repairing process of the color filter substrate of the fifth embodiment of the present invention, in which (A) to (D) show each process.

FIG. 10 is an explanatory view (2) of the defect repairing process of the color filter substrate according to the fifth embodiment of the present invention, in which (E) to (H) show each process.

FIG. 11 is a diagram illustrating a defect repairing process of the color filter substrate according to the sixth embodiment of the present invention, in which (A) to (D) show each process.

[Explanation of symbols]

1 Glass Substrate 2 ITO Electrodes 3 ₁ , 3 ₂ , 3 ₃ , 3 ₄ , 3 ₅ Black Matrix Pattern 4 Red Color Filter Pattern 5 Green Color Filter Pattern 6 Blue Color Filter Pattern 7 Light-Shielding Film 11 Glass Substrate 12 Dyeable Resin Coating 12 ₁ Dyeing area 13 ₁ , 13 ₂ , 13 ₃ , 13 ₄ , 13 ₅ Black matrix pattern 14 Red color filter pattern 15 Green color filter pattern 16 Blue color filter pattern 21 Non-alkali glass substrate 22 ITO electrode 23 ₁ , 23 ₂ , 23 ₃ , 23 ₄ , 23 ₅ Black matrix pattern 24 ₂ Opening 24 ₁ Light-shielding film 24 Exposure mask 25 Red photosensitive resin film 25 ₁ Red color filter pattern 26 ₁ Green color filter pattern 27 ₁ Blue color filter pattern 28 Light-shielding property Electrodeposition Layer 31 Alkali-free glass 32 Dyeable resin film 32 ₁ Dyeing area 33 ₁ , 33 ₂ , 33 ₃ , 33 ₄ , 33 ₅ Black matrix pattern 34 ₁ Red color filter pattern 35 ₁ Green color filter pattern 36 ₁ Blue color filter pattern 37 Protective film 41 Non-alkali glass substrate 42 ITO electrodes 43 ₁ , 43 ₂ , 43 ₃ , 43 ₄ , 43 ₅ Black matrix pattern 44 ₁ Red color filter pattern 45 ₁ Green color filter pattern 46 ₁ Blue color filter pattern 47 Light-shielding electricity sealable layer 51 alkali-free glass substrate 52 ITO electrodes 53 _1, 53 _3, 53 _4, 53 ₅ black matrix pattern 54 ₁ red color filter pattern 55 ₁ green color filter pattern 56 ₁ blue color filter pattern 57 light-blocking electrodeposited layers 58 IT Membrane 61 non-alkali glass substrate 62 ITO electrodes 63 low reflection photosensitive resin film 64 _1, 64 _2, 64 _3, 64 _4, 64 ₅ black matrix pattern 65 ₁ red color filter pattern 66 ₁ green color filter pattern 67 ₁ blue filter Pattern 68 Light-shielding electrodeposition layer 71 Non-alkali glass substrate 72 Dyeable resin coating 72 ₁ , 72 ₂ Dyeing area 73 ₁ Red color filter pattern 74 ₁ Green color filter pattern 75 ₁ Blue color filter pattern 76 Protective film

Claims (15)

[Claims] 1. A conductive film is formed on a substrate, and a light-shielding resin is electrodeposited on the defective portions of the black matrix pattern and the color filter pattern formed on the conductive film to form a black matrix pattern or A color filter substrate, wherein a defective portion of a color filter pattern is corrected. 2. The color filter substrate according to claim 1, wherein a light-shielding resin is electrodeposited between the color filter patterns as well as the defective portions of the black matrix pattern or the color filter pattern. 3. The color filter substrate according to claim 1, wherein a conductive film is formed on the black matrix or the color filter pattern. 4. A low reflectance resin coating is formed between a conductive coating for electrodeposition of a light-shielding resin and a black matrix pattern, according to any one of claims 1 to 3. The color filter substrate as described in 1 above. 5. A dyeable resin film is formed on a substrate,
A color filter substrate, wherein a region exposed from the black matrix pattern and the color filter pattern of the dyeable resin film is dyed to shield a defective portion of the black matrix or the color filter pattern from light. 6. The color filter substrate according to claim 5, wherein a low reflectance resin film is formed between the dyeable resin film and the black matrix pattern layer. 7. A dyeable resin film is formed on a substrate,
A color filter substrate, wherein a region exposed to a defective portion of a color filter pattern of the dyeable resin film and a black matrix pattern portion are dyed. 8. The substrate according to claim 1, wherein the conductive film and the conductive film are translucent.
The color filter substrate described in the item. 9. A step of forming a transparent conductive film on a transparent substrate, a step of forming a black matrix pattern and a color filter pattern on the transparent conductive film, and using the transparent conductive film as an electrode. A method of repairing a defect of a color filter substrate, comprising a step of electrodepositing a light-shielding resin on a defective portion of a black matrix or a color filter pattern. 10. A method of repairing a defect on a color filter substrate according to claim 9, wherein a light-shielding resin is electrodeposited simultaneously between the defective portion of the black matrix pattern or the color filter pattern and the color filter pattern. . 11. The transparent conductive film is formed on the black matrix or the defective portion of the color filter pattern by electrodeposition of the light-shielding resin, and the transparent conductive film is formed thereon. Defect repairing method for color filter substrate. 12. The low reflectance resin film is formed between the transparent conductive film for electrodeposition of the light-shielding resin and the black matrix pattern layer, according to any one of claims 9 to 11. A method for repairing a defect of a color filter substrate according to item 1. 13. A step of forming a dyeable resin film on a transparent substrate, a step of forming a black matrix pattern and a color filter pattern on the dyeable resin film, and a step of forming the dyeable resin film. A method of repairing a defect of a color filter substrate, which comprises a step of dyeing an exposed region to shield the defective portion of the black matrix or the color filter pattern from light. 14. The method for repairing a defect of a color filter substrate according to claim 13, wherein a low reflectance resin film is formed between the dyeable resin film and the black matrix pattern layer. 15. A step of forming a dyeable resin film on a transparent substrate, a step of forming a color filter pattern on the dyeable resin film, and the color filter pattern of the dyeable resin film. Of the color filter pattern to block light, and to dye the black matrix pattern portion of the dyeable resin film to form a black matrix pattern. Method for repairing defects of color filter substrate.