JPH08178639A - Manufacturing method and device, and preform of cantilever for near-field scanning optical microscope - Google Patents

Abstract

PURPOSE: To provide a cantilever for a near-field scanning optical microscope having a probe with a microopening at its end and incorporating an atomic force microscope. CONSTITUTION: A holding means 210 by which the probe of a preform 126' is supported while being opposite to a counter electrode 208 is provided. The counter electrode 208 is replaceably fixed on a counter electrode holding means 206 fixed to a vertically moving stage 204, and its distance to the probe is adjustable. In order to monitor that interval, an optical-lever type displacement measuring means consisting of a laser beam source 212 and a two-piece photodetector 214 is provided. The counter electrode 208 is connected to a voltage source 216, and the conductive light-blocking coating of the preform 126' is connected to the voltage source 216 via a current detection means 218 and a switch 224. The current detection means 218 comprises a resistance 220 and a voltmeter 222. A capacitor 226 is provided between the conductive light- blocking coating and the counter electrode 208.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning near field microscope which belongs to a kind of scanning probe microscope.

[0002]

2. Description of the Related Art A scanning probe microscope (SPM) scans in a XY direction or an XYZ direction while detecting an interaction acting between a probe, that is, a probe when brought close to a sample surface to 1 μm or less. , A device for performing two-dimensional mapping of the interaction, a scanning tunneling microscope (STM), an atomic force microscope (AFM),
Magnetic force microscope (MFM), scanning near-field light microscope (SN
OM) and the like.

Scanning near-field optical microscopes have been actively developed since the latter half of the 1980s, particularly as optical microscopes having a resolution exceeding the diffraction limit by detecting evanescent waves. This device utilizes the property that the evanescent wave is localized in a region having a size smaller than the wavelength and does not propagate in free space. An example thereof is disclosed in, for example, Japanese Patent Application Laid-Open No. 4-291310 (REBetzig, AT & T), in which a rod-shaped probe with a thin tip is used, and light is irradiated to a sample from a minute opening at the tip. At this time, there is shown a device that performs two-dimensional mapping of transmitted light intensity by detecting light transmitted through the sample with a photodetector installed under the sample.

Generally, an optical fiber, a glass rod, or a crystal probe having a finely processed tip is used as a probe of a scanning near-field optical microscope, but these probes are rod-shaped and are obliquely rearward while rotating the probe. It is possible to fabricate a probe having an opening at the tip covered with metal except for the tip by utilizing the fact that the tip of the probe is not easily coated with the metal when the metal is vapor-deposited. By using this probe, a scanning near-field optical microscope whose lateral resolution is improved as compared with that using a probe not coated with a metal is already commercially available and available.

In the atomic force microscope, the probe is formed at the tip of the cantilever, and the displacement of the cantilever displaced according to the force acting on the probe is detected by, for example, an optical displacement sensor to obtain surface information of the sample. And JP-A-62-13
No. 0302 (G. Binning, IBM) and the like.

The idea of measuring the unevenness of the sample by detecting the interaction force between the sample and the tip of the probe in this atomic force microscope can be applied to other scanning probe microscopes. It is used as a means for maintaining what is called a regulation, in which the distance between them is kept constant. NF van Hulst et al. "Appl.
Phys. Lett. 62 (5) P.461 (1993) ”, a silicon nitride cantilever for atomic force microscope is used as a probe to detect the optical information of the sample while measuring the unevenness of the sample by AFM measurement. We have proposed a new scanning near-field optical microscope capable of scanning.

A scanning near-field optical microscope produced based on the principle proposed by NF van Hulst et al. Will be described with reference to FIGS. 5 and 6. As shown in FIG. 6, the sample table (glass) 14 to which the sample 12 is fixed is installed on the prism 18 fixed to the piezoelectric scanner 20 via the matching oil 16. The piezoelectric scanner 20 receives a drive signal output from the scanner drive circuit 24 according to an XY scan signal or an XYZ scan signal generated by the computer 22, and scans in the XY direction (sample surface direction) or the Z direction (sample normal direction). Do. A cantilever 26 is arranged above the sample 12.

The cantilever 26, as shown in FIG.
The lever portion 30 is fixed to the support portion 28, and a probe portion 32 is formed at the tip thereof. On the upper surface of the lever portion 30, a reflecting surface 34 made of a metal thin film or the like is provided near the probe portion 32. In addition, fan hurst (NFvan Hulst)
In these papers, cantilevers without such a reflective surface are used.

Returning to FIG. 6 again, in order to detect the displacement of the probe portion 32 of the cantilever 26, a semiconductor laser 40 that irradiates the reflecting surface 34 with a light beam and a two-divided photodetector 42 that receives the reflected light are provided. These constitute optical lever type displacement measuring means. A feedback circuit 44 for controlling the piezoelectric scanner 20 according to the output of the two-divided photodetector 42 is provided. Furthermore, the apparatus is provided with an optical system for generating an evanescent field on the surface of the sample 12, and this optical system has a laser light source 46, a filter 48, a mirror 50, and a mirror 52. A photodetector 54 that monitors the light totally reflected by the sample table 14 is provided. Probe 32
Is provided with an objective lens 56 that receives the propagating light generated when the light enters the evanescent field, and a detection optical system 58 that detects the intensity of the light that has entered the objective lens 56. The detection optical system 58 includes a condenser lens 60 and a pinhole 6
2. It has a photomultiplier tube 64. Further, an amplifier 20 for amplifying the output of the photomultiplier tube 64 is provided.

A filter 48 emitted from a laser light source 46
The light that has passed through is reflected by the mirror 50 and the mirror 52, then passes through the prism 18, and is incident on the surface of the sample table 16 on the sample side at an angle equal to or greater than the critical angle to cause total reflection. As a result, an evanescent field is formed near the surface of the sample 12. The light totally reflected by the surface of the sample table 16 on the sample side enters the photodetector 16 and is monitored. Piezoelectric scanner 20
While performing XY scanning, the displacement of the probe 32 is detected by the displacement measuring means including the semiconductor laser 40 and the two-divided photodetector 42, and the feedback circuit 44 is used to detect the probe 32.
That is, the distance between the probe 32 and the sample surface is kept constant. Part of the propagating light generated due to the probe 32 penetrating the evanescent field enters the objective lens 56 and is detected by the photomultiplier tube 64. The computer 22 can obtain the unevenness information of the sample surface based on the AFM measurement by processing the signal from the feedback circuit 44 in synchronization with the internally generated XY scanning signal. Similarly, by processing the signal from the photomultiplier tube 64 in synchronization with the XY scanning signal, it is possible to obtain information on the sample surface based on the SNOM measurement.

[0011]

The lateral resolving power of the optical signal image in the scanning near-field optical microscope is determined by the surface area of the tip of the probe inserted into the evanescent field near the surface of the sample. It is desired to reduce the surface area of the tip of the probe in order to obtain optical information of the sample. For this purpose, it is effective to coat the probe with a metal or the like and form a small opening at the tip thereof.

However, NF van Huls
In the scanning near-field optical microscope proposed by T. et al., a cantilever for an atomic force microscope is used as a probe, so it is not possible to stably form a minute opening at the tip of the probe by oblique rear evaporation. Therefore, the lateral resolution of this scanning near-field light microscope is limited to about 0.05 μm,
It is inferior to STM, atomic force microscope, and scanning near-field light microscope using optical fiber.

Further, in the scanning type near-field optical microscope in the early 1980s, a metal probe was applied to the entire rod-shaped probe having a sharp tip, and this probe was strongly pressed against the sample to form a minute opening at the probe tip. Some were formed. This method can also be applied to a scanning near-field optical microscope using a cantilever. That is, it is possible to form a minute opening by applying a metal coat to the surface of the probe at the tip of the cantilever portion and strongly pressing or rubbing the probe against the sample. However, this method cannot stably form a minute opening, and is used only experimentally. An object of the present invention is to provide a probe for scanning near-field light microscopes incorporating an atomic force microscope, which has a minute opening at the tip of a probe.

[0014]

According to the invention of claim 1, there is provided a method of manufacturing a cantilever for a scanning near-field optical microscope having a microscopic opening at the tip of the probe, wherein the probe transmitting light is provided at the free end. The method includes the steps of preparing the provided cantilever, providing a conductive light-shielding coat on the surface of the probe, and removing the conductive light-shielding coat at the tip of the probe by electric discharge to form an opening.

According to a second aspect of the present invention, an opening is formed in the conductive light-shielding coat at the tip of the probe for a preformed product having a transparent probe whose surface is covered with a conductive light-shielding coat at its free end. An apparatus for manufacturing a cantilever for a scanning near-field light microscope by using a counter electrode, a means for supporting a preform,
It comprises means for adjusting the distance between the probe and the counter electrode, and means for applying a voltage between the conductive light-shielding coat and the counter electrode.

A third aspect of the present invention is a preformed product of a cantilever for a scanning near-field light microscope, which is processed by the apparatus of the second aspect, and includes a probe that transmits light and a lever portion that supports the probe. , And a conductive light-shielding coat that covers the surface of the probe.

[0017]

In the present invention, first, a cantilever having a probe for transmitting light at its free end is prepared. This cantilever is used in a scanning near-field optical microscope incorporating the atomic force microscope proposed by Van Hulst. Next, a conductive light-shielding coat is provided on at least the surface of the probe of this cantilever to obtain a preform. The conductive light-shielding coat at the tip of the probe is removed from this preformed product by electric discharge to form an opening, and a completed cantilever for a scanning near-field microscope is obtained.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Some embodiments of the present invention will be described below with reference to the drawings. First, a preformed product of a cantilever commonly used in the following examples will be described with reference to FIG. This preform 12
6'is similar to the cantilever shown in FIG. 5, in which like parts are designated with the same reference numerals. Preform 1
26 'has a lever portion 30 made of silicon nitride and a supporting portion 28.
And a probe portion 32 is formed at the tip thereof.
On the upper surface of the lever portion 30, near the probe portion 32, a metal thin film 34 that functions as a reflecting surface for the optical lever type displacement measuring means.
Is provided. A conductive light-shielding coat 36 is formed on the entire lower surface of the lever portion 30. The conductive light-shielding coat 36 may be anything as long as it is conductive and blocks light. For example, a film of gold, platinum palladium, aluminum, titanium or the like can be used. The film needs to have a thickness that does not transmit light,
For example, 40 nm to 100 nm. The substances illustrated here are all metals, but not limited to metals.

In the following examples, this preform 12
6 ', a part of the conductive light-shielding coat 36 covering the tip of the probe is removed by electric discharge, and a minute opening 38 is formed at the tip of the probe as shown in FIG. 1 (B). A cantilever 126 for a scanning near-field light microscope incorporating an atomic force microscope is obtained. <First Embodiment> Next, as a first embodiment, an apparatus for forming a minute opening in the above-mentioned preform 126 'and a method for forming the same will be described.

An apparatus for forming microscopic openings in a preform 126 'is shown in FIG. The device comprises a holding means 210 for supporting the preform 126 'and a probe 32 for the preform 126'.
Have opposing electrodes 208 facing each other. Counter electrode 20
Numeral 8 is replaceably fixed on the counter electrode holding means 206. The counter electrode holding means 206 is the preform 12
The 6 ′ probe 32 and the counter electrode 208 are fixed to the upper / lower stage 204 which is a distance adjusting means, and the stage driving means 20
It moves up and down according to the signal from 2, and adjusts the distance between the two. As the upper and lower stages 204, for example, a stage using a piezoelectric body or a motor is used. The laser light source 212 and the two-divided photodetector 214 constitute a displacement measuring means of an optical lever type, and the displacement of the lever portion, that is, the distance between the probe 32 and the counter electrode 208 can be monitored. The counter electrode 208 is connected to one terminal of a voltage source 216 that supplies a constant voltage, and also the preform 12
The conductive light-shielding coat 36 of 6'is connected to the other terminal of the voltage source 216 via the current detecting means 218 and the switch 224. The current detecting means 218 is composed of a resistor 220 and a voltmeter 222. A capacitor 226, which is a charge storage unit, is provided between the conductive light-shielding coat 36 of the preform 126 ′ and the counter electrode 208. By opening and closing the switch 224, the capacitor 22
Electric charges are accumulated in 6 and a voltage is applied between the conductive light-shielding coat 36 and the counter electrode 208.

Next, using this apparatus, the preform 12
A procedure for forming the minute opening 38 at the tip of the 6'probe will be described. Before applying a voltage between the conductive light-shielding coat 36 and the counter electrode 208, first, the probe 32 and the counter electrode 20.
Hold 8 at a predetermined distance. Next, similarly to the atomic force microscope, the force curve shown in FIG. 3A is measured. From the state where the probe 32 and the counter electrode 208 are separated from each other (FIG. 3B), the upper and lower stages 204 are driven to gradually bring them into close contact with each other (FIG. 3C), and then gradually to bring them together. Release (Fig. 3 (d)). The displacement of the probe 32 during this series of operations is monitored by using an optical lever type displacement measuring means, and the horizontal axis indicates the distance between the probe and the counter electrode, and the vertical axis indicates the output of the displacement measuring means. By drawing the graph, the force curve shown in FIG. 3A can be obtained.

Next, the distance between the probe and the counter electrode is shown in FIG.
It is adjusted to a distance corresponding to point e in the graph of (a), and both are kept at a stable distance during discharge. In FIG. 3A, the distance from the point b where the probe is in contact with the counter electrode to the point d depends on the environment and the spring constant of the cantilever.
It hardly occurs when a hard cantilever of N / m or more is used, and may become 300 nm when a soft cantilever of 0.1 N / m or less is used.

Next, the switch 224 is closed and a voltage is applied between the conductive light-shielding coat 36 and the counter electrode 208.
The conductive light-shielding coat 36 covering the probe 32 has the probe 32.
1B, the cantilever 126 having the minute opening 38 at the tip of the probe 32 shown in FIG. 1B is obtained.

Next, the results of the experiments actually conducted will be described. A series of openings were formed by installing this device in an air-conditioned room in order to prevent the discharge starting voltage from being affected by ambient humidity and the like.

The resistor 220 has a resistance value of 1 MΩ, the voltage source 216 has a voltage value of 10 V, and the capacitor 226 has a resistance of 10 pF and 100 pF. Further, the preform 126 ′ has a thickness of 45 nm as the conductive light-shielding coat 36.
Used with a thin film of gold. Capacitor 226
When 10 pF was used, an opening of about 200 nm was formed at the tip of the probe 32. If a capacitor 226 of 100 pF is used, the probe 3
An opening of about φ1.5 μm was formed at the tip of No. 2. In both cases, when the outputs of the voltmeter 222 and the optical lever type displacement measuring means were monitored by an oscilloscope, signal fluctuation due to discharge was observed, and after confirming this signal, voltage application was stopped. That is, the voltmeter 222 and the optical lever type displacement measuring means were used as the discharge state monitoring means.

An experiment was also carried out with the capacitor 226 removed. In this case, it can be considered that the stray capacitance of the wiring code is replaced with the capacitor 226. Also,
When the voltage of the voltage source 216 was set to 5 volts and the voltage was applied for 30 seconds, an opening of about 2 μm was formed in the conductive light-shielding coat at the tip of the probe 32 by discharge. When the voltage was reduced to 3 volts, the opening was reduced to φ1 μm, and when the voltage application time was gradually shortened, the opening of φ0.3 μm could be finally formed. However, as far as the outputs of the voltmeter 226 and the optical lever type displacement measuring means are viewed on an oscilloscope, the fluctuation of the signal due to the discharge is slightly less stable than when the capacitor 226 is provided.

The discharge starting voltage depends on the shape of the tip of the probe, but if the cantilevers in the same lot manufactured by the silicon process have the same tip shape, roughly, the voltage of the voltage source, Depends on the capacitance of the capacitor and the distance between the probe and the counter electrode. Therefore, as in this embodiment,
While holding the cantilever close to the counter electrode by a predetermined distance and monitoring the signal of the displacement measuring means for detecting the displacement of the probe 32, the conductive light-shielding coat 36 and the counter electrode 20 are monitored.
By applying a voltage between the electrodes 8 and generating discharge between the conductive light-shielding coat at the tip of the probe and the counter electrode, a fine opening is stably formed at the tip of the conductive light-shielding coat covering the probe. can do.

In this embodiment, the counter electrode 208 is moved up and down by the upper and lower stages 204, which are distance adjusting means, but the holding means 210 may be moved up and down. Moreover, although the DC voltage is used as the applied voltage, an AC voltage or a pulse voltage may be used. When an AC voltage is used, a method of monitoring a change in capacitance between the probe and the counter electrode may be used as a means of monitoring whether or not an opening is formed.

Further, the probe 32 and the counter electrode 208 are maintained at a constant interval for electric discharge. At this time, the preform 1
The discharge may be performed while vibrating 26 'vertically.
By doing so, the detection sensitivity can be enhanced when the discharge state is monitored using the displacement measuring means.

Further, although the counter electrode is made of stainless steel whose surface is polished, other metals may be used. However,
Surface roughness is important, and if a counter electrode with too much unevenness is used, there is a high possibility that discharge will occur in parts other than the probe part.Therefore, the counter electrode surface may be in a state of polishing or equivalent. is necessary. The height of the probe of a cantilever used in an atomic force microscope or the like is usually several μm or more, but it is preferable that the vicinity of the counter electrode part where discharge occurs has irregularities less than that. Further, when the size of the counter electrode becomes equal to or smaller than the size of the cantilever, discharge may occur at the corners of the counter electrode. Therefore, it is necessary to use a counter electrode having a size larger than that. In fact
When a wire of φ0.2 mm is cut as the counter electrode and fixed to the counter electrode holding means to form an opening by discharge, a discharge mark may be formed on a portion other than the tip of the probe, for example, the lever portion of the cantilever. there were. Usually, the length of the cantilever is about 50 μm to 1 mm, and the counter electrode is preferably longer than this. <Second Embodiment> Next, a second embodiment will be described. The same device as in the first embodiment was used. The procedure for forming the minute openings will be described below.

Before applying a voltage between the probe 32 and the counter electrode 208, first, the force curve is measured as in the first embodiment. The measurement procedure is exactly the same as in the first embodiment.

The probe is brought into contact with the counter electrode based on the obtained force curve. That is, the distance between the probe and the counter electrode is set to a position between points b and c in the force curve of FIG.

Next, the switch 224 is closed, and the voltage is applied between the conductive light-shielding coat 36 and the counter electrode 208, and the upper and lower stages 204 are lowered to move the probe away from the counter electrode. Then, a discharge is generated between the conductive light-shielding coat at the tip of the probe and the counter electrode, an opening is formed in the conductive light-shielding coat covering the surface of the probe, and the cantilever 126 shown in FIG. 1B is obtained. .

The results of the experiments actually conducted will be described.
A resistor having a resistance value of 1 MΩ is used as the resistor 220, and the voltage source 3
When the voltage value of 04 was set to 3 V DC and the discharge was performed at a moving speed of the upper and lower stages of 10 μm / sec, an opening of about φ0.3 μm was formed in the conductive light-shielding coat at the tip of the probe. <Third Example> As a third example, the production of a probe and
A scanning near-field optical microscope incorporating an atomic force microscope, which is capable of performing FM measurement and SNOM measurement and is provided with a mechanism for forming a minute opening in the preform 126 ′ of FIG. 1A, will be described. The structure is shown in FIG. In the figure, the same members as those in the scanning near-field microscope (see FIG. 6) described above are designated by the same reference numerals.

The apparatus configuration of this embodiment will be described based on the difference from the scanning near-field light microscope described above. On the prism 18, the counter electrode 114 made of an optically transparent conductive plate is arranged via the matching oil 16. As the optically transparent conductive plate 114, for example, ITO glass (glass coated with an indium tin oxide thin film) can be used. Above the counter electrode 114,
The preform 126 ′ shown in FIG. 1 (A) is supported.

The counter electrode 114 and the conductive light-shielding coat 36 of the preform 126 'are connected via the switch 224 and the current detecting means 218 similarly to the device described in the first embodiment.
It is electrically connected to each output terminal of the voltage source 216. The current detecting means 218 can be composed of, for example, a resistor and a voltmeter. In addition, the counter electrode 114 and the preform 12
Between the conductive light-shielding coat 36 of 6 ', the capacitor 22
6 is provided. Further, an opening formation control means 228 for controlling the voltage of the switch 224 and the voltage source 216 is provided.

The other structure is the same as that of the scanning near-field light microscope described above. With this device, it is possible to optically observe the formation of the opening while forming the opening in the conductive light-shielding coat at the tip of the probe. The procedure for forming the opening will be described below.

According to the procedure described in the first or second embodiment, a voltage is applied between the conductive light-shielding coat 36 of the preform 126 'and the counter electrode 114 to cause discharge. The discharge is performed for a predetermined time. After the discharge is completed, the laser light source 46 irradiates the counter electrode 114 with light to generate an evanescent field on the surface. Then, the probe is brought closer to the counter electrode within 200 nm. The distance of 200 nm corresponds to almost half the wavelength of the laser light source 46.

If an opening is formed in the conductive light-shielding coat at the tip of the probe, the propagating light generated by the entry of the tip of the probe into the evanescent field passes through the aperture and the objective lens 5
6 and is detected by the photomultiplier tube 64. Since the output of the photomultiplier tube 64 depends on the size of the opening, the size of the opening can be known from the output.

If no opening is formed in the conductive light-shielding coat at the tip of the probe, the propagating light does not pass through the probe 32 and is not detected by the photomultiplier tube 64. Photomultiplier tube 6
4 is not output, or the output of the photomultiplier tube 64 is at a predetermined value, which is a value corresponding to the diameter of the desired opening, but if it is not reached, the discharge is performed again. The discharge is repeated until the output of the photomultiplier tube 64 reaches a predetermined value.

If the output of the photomultiplier tube 64 has reached the predetermined value, it is considered that the cantilever shown in FIG. 1B is obtained, and the step of forming the opening is completed. Actually, the resistance value is 1 MΩ, the voltage value of the voltage source 216 is 5 V, the capacitor 2
When the output of the photomultiplier tube reached 10 pW under the condition that the capacitance of 26 was 10 pF, formation of the aperture was completed, and the obtained cantilever was observed by SEM (scanning electron microscope). An opening having a diameter of about 0.1 μm was formed at the tip of the.

In the apparatus shown in FIG. 4, after the opening is formed, the counter electrode 114 is exchanged with the sample stage, so that A
FM measurement and SNOM measurement can be performed. In this embodiment, ITO glass is used for the counter electrode 114, but other materials may be used. For example, glass coated with metal to the extent that light can be transmitted can be used.

Alternatively, the preform may be held closer to the counter electrode as the tip of the probe is located inside the localized evanescent field, and the evanescent field may be discharged. In this case, the state of the opening can be known during the discharge by detecting the propagation light that increases as the opening becomes larger with the photomultiplier tube. Since the discharge and the measurement of the propagating light are not separately performed, the opening can be formed in a short time, and the opening closer to the desired size can be formed.

Further, the propagating light may be monitored while vibrating the probe. In this case, the detected propagating light is also modulated accordingly, so that even weaker light can be detected by performing lock-in detection. Therefore,
Not only can it be possible to control the size of the opening produced by stopping the discharge at the time when the minute opening is formed, but also a smaller opening can be obtained.

Although the cantilever manufactured by using the silicon planar process has been described in the above-described embodiments, the present invention is not limited to this. For example, as shown in FIG. 5, the core 131 and the clad 1
An optical fiber 33 having a sharp tip is bent into an L-shape and a conductive light-shielding coat 136 is provided on the surface thereof to form a cantilever preform, and an opening 138 is formed by using the above-described device. Then, the cantilever may be obtained. The conductive light-shielding coat 136 may be provided only on the probe portion, that is, the tip portion.

Although the present invention has been described above based on the embodiments, the present invention includes the technical ideas described below, and it goes without saying that modifications, improvements and corrections are made without departing from the technical ideas. Included in the invention.

1. The steps of preparing a cantilever with a light-transmitting probe at its free end, providing a conductive light-shielding coat on the surface of the probe, and removing the conductive light-shielding coat at the tip of the probe by electric discharge A method of manufacturing a cantilever for a scanning near-field light microscope having a minute opening at the tip of a probe, which has a step of forming.

2. In the first item, the opening forming step includes a step of disposing the probe close to the counter electrode, and a step of applying a voltage between the conductive light-shielding coat and the counter electrode. For manufacturing cantilever for automobile.

3. The method for manufacturing a cantilever for a scanning near-field light microscope according to the second item, further comprising a step of monitoring a current flowing between the conductive light-shielding coat and the counter electrode. 4. 2. The method for manufacturing a cantilever for a scanning near-field light microscope, which further comprises the step of monitoring the displacement of the probe.

5. The cantilever for a scanning near-field microscope according to claim 3 or 4, further comprising a step of vibrating a distance between the probe and the counter electrode while applying a voltage between the conductive light-shielding coat and the counter electrode. Manufacturing method.

6. In the first item, the opening forming step includes a step of placing the probe in contact with the counter electrode, a step of applying a voltage between the conductive light-shielding coat and the counter electrode, and a step of moving the probe away from the counter electrode. A method of manufacturing a cantilever for a scanning near-field light microscope having the above.

7. 7. The method for manufacturing a cantilever for a scanning near-field light microscope, further comprising the step of monitoring a current flowing between a conductive light-shielding coat and a counter electrode. 8. 7. The method for manufacturing a cantilever for a scanning near-field light microscope, which further comprises the step of monitoring the displacement of the probe.

9. The scanning near-field light microscope according to the second item, further comprising a step of generating an evanescent field on the surface of the counter electrode and a step of monitoring the propagating light generated when the tip of the probe is located in the evanescent field. Cantilever manufacturing method.

10. In the ninth item, the probe is arranged so that its tip is located outside the evanescent field, and further has a step of causing the tip of the probe to enter the evanescent field after discharge, the cantilever for a scanning near-field optical microscope. Manufacturing method.

11. In the ninth item, the method for manufacturing a cantilever for a scanning near-field optical microscope, wherein the probe is arranged so that its tip is located in the evanescent field. 12. The scanning near-field optical microscope according to the sixth item, further comprising a step of generating an evanescent field on the surface of the counter electrode and a step of monitoring the propagating light generated when the tip of the probe is located in the evanescent field. Cantilever manufacturing method.

13. Cantilever for scanning near-field light microscope by forming an opening in the conductive light-shielding coating at the tip of the probe for a preformed product whose surface has a transparent probe covered with a conductive light-shielding coating at its free end. A device for manufacturing a counter electrode, a means for supporting a preform, a means for adjusting the distance between the probe and the counter electrode, and a voltage applied between the conductive light-shielding coat and the counter electrode. An apparatus for manufacturing a cantilever for a scanning near-field light microscope, comprising:

14. Item 13. The apparatus for manufacturing a cantilever for a scanning near-field light microscope, further comprising means for monitoring a current flowing between the conductive light-shielding coat and the counter electrode.

15. 13. The manufacturing apparatus for a cantilever for a scanning near-field light microscope, further comprising a means for monitoring the displacement of the probe. 16. The cantilever for a scanning near-field microscope according to claim 14 or 15, further comprising means for vibrating a distance between the probe and the counter electrode while applying a voltage between the conductive light-shielding coat and the counter electrode. Manufacturing equipment.

17. The scanning near-field light microscope according to the item 13, further comprising means for generating an evanescent field on the surface of the counter electrode and means for monitoring propagation light generated when the tip of the probe is located in the evanescent field. Cantilever manufacturing equipment.

18. In the seventeenth aspect, the counter electrode is optically transparent, and the evanescent field generating means includes a light source and a surface of the counter electrode facing the light from the light source with respect to the probe, from the opposite side of the probe to a critical angle or more. And a means for making the light incident at an incident angle of 1. cantilever manufacturing apparatus for a scanning near-field light microscope.

19. Item 18. The apparatus for manufacturing a cantilever for a scanning near-field light microscope, further comprising means for vibrating a gap between the probe and the counter electrode while applying a voltage between the conductive light-shielding coat and the counter electrode.

20. Item 18. The apparatus for manufacturing a cantilever for a scanning near-field light microscope, further comprising a unit for detecting displacement of the probe and a unit for detecting a current flowing between the probe and the counter electrode.

21. Item 20. An apparatus for manufacturing a cantilever for a scanning near-field light microscope, which is incorporated in the scanning near-field light microscope. 22. A preform of a cantilever for a scanning near-field optical microscope, which has a probe that transmits light, a lever portion that supports the probe, and a conductive light-shielding coat that covers the surface of the probe.

23. Item 22. A preformed product of a cantilever for a scanning near-field optical microscope, which is manufactured by a silicon planar process. 24. Item 22. A preform of a cantilever for a scanning near-field light microscope, wherein the lever portion is an optical fiber.

25. A cantilever for a scanning near-field light microscope having a probe that transmits light, a lever portion that supports the probe, and a conductive light-shielding coat that covers the surface of the probe except the tip.

[0066]

According to the present invention, it is possible to obtain a cantilever for a scanning near-field optical microscope incorporating an atomic force microscope, which has a probe having a minute opening at its tip. This enables high-resolution measurement in a scanning near-field optical microscope incorporating an atomic force microscope.

[Brief description of drawings]

FIG. 1 shows cross sections of a preform (A) and a finished product (B) of a cantilever for a scanning near-field light microscope incorporating an atomic force microscope according to the present invention.

FIG. 2 shows a configuration of a cantilever manufacturing apparatus related to the first embodiment of the present invention.

FIG. 3A shows a force curve of a preform, and FIGS. 3B, 3D, and 3C show a preform of the preform for the counter electrode at points a, b, and e of the force curve, respectively. It shows the state.

FIG. 4 shows a configuration of a cantilever manufacturing apparatus relating to a third embodiment of the present invention.

FIG. 5 shows another cantilever different from that shown in FIG.

FIG. 6 shows a cross section of a cantilever used in a scanning near-field light microscope incorporating a conventional atomic force microscope.

FIG. 7 shows a configuration of a scanning near-field light microscope incorporating a conventional atomic force microscope.

[Explanation of symbols]

30 ... Lever part, 32 ... Probe, 36 ... Conductive light-shielding coat, 38 ... Opening, 126 '... Preform, 208 ... Counter electrode, 216 ... Voltage source, 224 ... Switch.

Claims (3)

[Claims] 1. A step of preparing a cantilever having a light-transmitting probe at its free end, a step of providing a conductive light-shielding coat on the surface of the probe, and a discharge of the conductive light-shielding coat at the tip of the probe. And a step of forming an opening to remove the opening, and a method for manufacturing a cantilever for a scanning near-field optical microscope having a minute opening at the tip of a probe. 2. A scanning-type proximity to a preformed product having a transparent probe whose surface is covered with a conductive light-shielding coat at its free end, with an opening formed in the conductive light-shielding coat at the tip of the probe. A device for manufacturing a cantilever for a field light microscope, comprising: a counter electrode, a means for supporting a preform, a means for adjusting the distance between the probe and the counter electrode, a conductive light-shielding coat and a counter electrode. A device for manufacturing a cantilever for a scanning near-field light microscope, which is provided with a means for applying a voltage to the. 3. A preform for a cantilever for a scanning near-field light microscope, which has a probe that transmits light, a lever portion that supports the probe, and a conductive light-shielding coat that covers the surface of the probe. Goods.