JPH08159908A - Method and apparatus for confirmation performance of valve - Google Patents

Method and apparatus for confirmation performance of valve

Info

Publication number
JPH08159908A
JPH08159908A JP33186994A JP33186994A JPH08159908A JP H08159908 A JPH08159908 A JP H08159908A JP 33186994 A JP33186994 A JP 33186994A JP 33186994 A JP33186994 A JP 33186994A JP H08159908 A JPH08159908 A JP H08159908A
Authority
JP
Japan
Prior art keywords
valve
performance
valves
flow rate
fluid supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33186994A
Other languages
Japanese (ja)
Inventor
Sadayuki Suzuki
貞之 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Priority to JP33186994A priority Critical patent/JPH08159908A/en
Publication of JPH08159908A publication Critical patent/JPH08159908A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To confirm the operation of a valve, to diagnose the performance of the valve in its maintenance and to diagnose the performance of the valve in a performance confirmation method of valve for fluid supply and discharge line. CONSTITUTION: In the performance confirmation method of valves 8, 11, 13 for fluid supply and discharge line 10 provided with a flowmeter 12, the valves as objects whose performance is to be confirmed for the fluid supply and discharge line, are closed, the other valves are opened, and a flow rate is detected by the flowmeter. When the flow rate is 0, the valves are diagnosed as normal. When the flow rate is detected, the valves are diagnosed as abnormal because a leak exists.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は流体給排ラインのバルブ
が正常に作動しているかどうかを検査するバルブの性能
確認方法及びその装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a valve performance confirmation method and apparatus for inspecting whether a valve of a fluid supply / discharge line is operating normally.

【0002】[0002]

【従来の技術】各種生産ラインに導入される製造装置、
例えば半導体製造装置の稼働率は、装置の総合的な性能
を示す大きな要因の1つである。
2. Description of the Related Art Manufacturing equipment introduced into various production lines,
For example, the operating rate of semiconductor manufacturing equipment is one of the major factors that show the overall performance of the equipment.

【0003】半導体製造装置は製造品質を維持する為、
数日に一度、或は数週間に一度は、必ず保守作業を行わ
なければならない。保守作業では寿命の尽きかけている
消耗品の交換、汚れた箇所の清掃、不良設備の修理を行
い、最後に排気動作を含む半導体製造装置の各機器の診
断を実施する。保守作業時には半導体製造装置を休止さ
せる必要があり、稼働率を向上する為には保守作業に要
する時間を最小に抑える必要がある。
Since semiconductor manufacturing equipment maintains manufacturing quality,
Maintenance work must be performed every few days or once every few weeks. In the maintenance work, the consumables which have reached the end of their life are replaced, the dirty parts are cleaned, the defective equipment is repaired, and finally each device of the semiconductor manufacturing apparatus including the exhaust operation is diagnosed. It is necessary to suspend the semiconductor manufacturing apparatus during maintenance work, and it is necessary to minimize the time required for maintenance work in order to improve the operating rate.

【0004】ところで、半導体製造装置としてはエッチ
ング装置、アッシング装置、CVD装置等があり、これ
ら装置はウェーハやガラス基板等の被処理物を密閉され
た処理容器内に収納した後、処理容器内を減圧状態とし
て所定の処理を行う様になっている。
Semiconductor manufacturing equipment includes etching equipment, ashing equipment, CVD equipment, and the like. These equipments store objects to be treated such as wafers and glass substrates in a hermetically sealed treatment container, and then, A predetermined process is performed in a depressurized state.

【0005】図1により前掲した従来の半導体製造装置
の概略を説明する。
An outline of the conventional semiconductor manufacturing apparatus described above will be described with reference to FIG.

【0006】気密な処理容器1には被処理物載置台2が
設けられ、該被処理物載置台2にはウェーハ、ガラス基
板等の被処理基板3が載置される。前記処理容器1には
排気管4を介して真空ポンプ5が接続されると共にガス
導入管6が接続され、該ガス導入管6には処理容器1側
からガスフィルタ7、エアバルブ8、ガス導入制御部9
が接続される。
An object-to-be-processed table 2 is provided in the airtight processing container 1, and the object-to-be-processed 3 such as a wafer or a glass substrate is placed on the object-to-be-processed table 2. A vacuum pump 5 and a gas introduction pipe 6 are connected to the processing container 1 via an exhaust pipe 4, and a gas filter 7, an air valve 8 and a gas introduction control are connected to the gas introduction pipe 6 from the processing container 1 side. Part 9
Is connected.

【0007】該ガス導入制御部9はn系統のガス供給ラ
イン101 ,102 ,103 ,…,10n から成り、各
ガス供給ライン101 ,102 ,103 ,…,10n
それぞれ処理容器1側からエアバルブ111 ,112
113 ,…,11n 、マスフローコントローラ121
122 ,123 ,…,12n 、エアバルブ131 ,13
2 ,133 ,…,13n 、ガスフィルタ141 ,1
2 ,143 ,…,14nが設けられている。
[0007] The gas introduction control unit 9 a gas supply line 10 1 of n lines, 10 2, 10 3, ..., consists 10 n, each gas supply line 10 1, 10 2, 10 3, ..., 10 n is Air valves 11 1 , 11 2 from the processing container 1 side,
11 3 , ..., 11 n , mass flow controller 12 1 ,
12 2 , 12 3 , ..., 12 n , air valves 13 1 , 13
2 , 13 3 , ..., 13 n , gas filter 14 1 , 1
4 2 , 14 3 , ..., 14 n are provided.

【0008】而して、被処理基板3を処理する場合は、
前記エアバルブ8を閉じ、前記真空ポンプ5により処理
容器1内を排気して減圧状態とし、所定の減圧状態とな
ったら、処理容器1内に導入するガスが選択され、前記
エアバルブ8を開き、選択されたガス供給ライン、例え
ばガス供給ライン10n の前記エアバルブ11n 、ガス
フィルタ14n を開き反応ガスを導入する。反応ガスの
流量は、マスフローコントローラ12n により設定した
流量に制御され、処理容器1の内部圧力は図示しない圧
力制御装置によって設定した圧力に保持される。
When processing the substrate 3 to be processed,
The air valve 8 is closed, the inside of the processing container 1 is evacuated by the vacuum pump 5 to a depressurized state, and when a predetermined depressurized state is reached, the gas to be introduced into the processing container 1 is selected, and the air valve 8 is opened and selected. gas supply lines, for example, the air valve 11 n of the gas supply line 10 n, a reaction gas is introduced to open the gas filter 14 n. The flow rate of the reaction gas is controlled to the flow rate set by the mass flow controller 12 n, and the internal pressure of the processing container 1 is maintained at the pressure set by a pressure control device (not shown).

【0009】[0009]

【発明が解決しようとする課題】ところが上記したエア
バルブ8、エアバルブ11、エアバルブ13等のバルブ
自体にはバルブの開閉動作を確認する手段を具備してい
るものは殆どなく、例えバルブ自体が動作確認の手段を
具備していたとしても、開閉動作が完全であるかどう
か、即ち閉状態でリークがないか、バルブの性能劣化等
については診断する手段はなかった。
However, most of the above-mentioned air valve 8, air valve 11, air valve 13 and the like have no means for confirming the opening / closing operation of the valve. For example, the operation of the valve itself is confirmed. Even if the above-mentioned means is provided, there is no means for diagnosing whether the opening / closing operation is complete, that is, whether there is a leak in the closed state or deterioration of the performance of the valve.

【0010】この為、数日に一度、或は数週間に一度行
う保守作業時にもバルブの動作確認はすることができて
も開閉状態が完全であるかどうか等の性能迄確認するこ
とはできなかった。更に、バルブの性能劣化が生じて
も、どのバルブであるかを特定することが困難で、バル
ブ個々の性能確認にはラインを分解してバルブ単体の点
検を行わなければならなかった。
Therefore, the operation of the valve can be confirmed even during maintenance work performed once every few days or once every few weeks, but it is possible to confirm even the performance such as whether the open / closed state is complete. There wasn't. Further, even if the performance of the valve deteriorates, it is difficult to identify which valve it is. Therefore, in order to confirm the performance of each valve, it was necessary to disassemble the line and inspect the individual valve.

【0011】本発明は斯かる実情に鑑み、保守時にバル
ブの動作確認、性能診断を行えると共に、バルブの性能
確認迄行える様にするものである。
In view of the above situation, the present invention is intended to enable the operation confirmation and the performance diagnosis of the valve at the time of maintenance as well as the performance confirmation of the valve.

【0012】[0012]

【課題を解決するための手段】本発明は、流量計を具備
した流体給排ラインのバルブの性能確認方法に於いて、
流体給排ラインの性能確認の対象となるバルブを閉塞す
ると共に他のバルブを開放して、前記流量計による流量
検出により対象となるバルブの性能を診断することを特
徴とするものである。
SUMMARY OF THE INVENTION The present invention provides a method for checking the performance of a valve of a fluid supply / discharge line equipped with a flow meter,
It is characterized in that the valve for which the performance of the fluid supply / discharge line is to be checked is closed and the other valves are opened, and the performance of the target valve is diagnosed by detecting the flow rate by the flow meter.

【0013】[0013]

【作用】対象となるバルブを閉塞して、流量計による流
量検出を行い、流量が0であれば、正常、流量が検出さ
れれば、リークが有るということであり、異常と診断さ
れる。
The target valve is closed, and the flow rate is detected by the flow meter. If the flow rate is 0, it is normal, and if the flow rate is detected, there is a leak, and it is diagnosed as abnormal.

【0014】[0014]

【実施例】以下、図面を参照しつつ本発明の一実施例を
説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0015】図1に於いてガス供給ライン10n に関す
るバルブの性能確認をする場合を説明する。
A case where the performance of the valve for the gas supply line 10 n is confirmed in FIG. 1 will be described.

【0016】ガス供給ライン10n に関するバルブ、エ
アバルブ8、エアバルブ11n 、エアバルブ13n を全
て開放し、エアバルブ8、エアバルブ11n 、エアバル
ブ13n を除く全てのバルブを閉とする。前記ガス供給
ライン10n には前記マスフローコントローラ12n
制御された反応ガスが流れ、該マスフローコントローラ
12n からは流通する反応ガス流量の出力がある。
All the valves related to the gas supply line 10 n , the air valve 8, the air valve 11 n and the air valve 13 n are opened, and all the valves except the air valve 8, the air valve 11 n and the air valve 13 n are closed. Wherein the gas supply line 10 n the mass flow controller 12 controlled reaction gas flows through a n, said the mass flow controller 12 n have the output of the reaction gas flow rate flowing.

【0017】次に、前記エアバルブ13n のみを閉と
し、前記マスフローコントローラ12n からの出力を監
視する。反応ガスの流量が0となると、前記マスフロー
コントローラ12n からの出力が0となり、前記エアバ
ルブ13n は正常に作動していることが分かり、マスフ
ローコントローラ12n からの出力が0でない場合は、
前記エアバルブ13n からガスのリークが有るというこ
とであり、エアバルブ13n の密閉が破れていることに
なり、動作不良を起こしていることが分かる。
Next, only the air valve 13 n is closed and the output from the mass flow controller 12 n is monitored. When the flow rate of the reaction gas becomes 0, the output from the mass flow controller 12 n becomes 0, and it can be seen that the air valve 13 n is operating normally. When the output from the mass flow controller 12 n is not 0,
It means that there is a gas leak from the air valve 13 n , which means that the air valve 13 n has a broken airtightness, which causes malfunction.

【0018】同様な手順で、前記エアバルブ11n 、エ
アバルブ8についても性能診断を行うことができ、更に
他のガス供給ライン10に関しても同様に行うことがで
き、全てのバルブについて性能診断を行うことができ
る。
By the same procedure, the performance diagnosis can be performed for the air valves 11 n and the air valves 8 and also for the other gas supply lines 10, and the performance diagnosis can be performed for all the valves. You can

【0019】次に、上記バルブの性能確認については装
置自体が自己診断することもできる。
Next, the apparatus itself can self-diagnose the performance of the valve.

【0020】自己診断機能について図2により略述す
る。
The self-diagnosis function will be briefly described with reference to FIG.

【0021】前記エアバルブ8、エアバルブ111 ,1
2 ,113 ,…,11n 、エアバルブ131 ,1
2 ,133 ,…,13n はバルブ駆動制御器16によ
り駆動され、該バルブ駆動制御器16は主制御器17か
らの指令信号により前記バルブを駆動する。又、前記主
制御器17には記憶器18が接続され、該記憶器18に
は製造工程を実施する為のバルブ駆動プログラムが設定
入力されると共に自己診断プログラムが設定入力されて
いる。
The air valve 8 and the air valves 11 1 and 1
1 2 , 11 3 , ..., 11 n , Air valve 13 1 , 1
3 2, 13 3, ..., 13 n is driven by the valve drive controller 16, to drive the valve by a command signal from the valve drive control device 16 main controller 17. A memory 18 is connected to the main controller 17, and a valve drive program for carrying out the manufacturing process is set and input to the memory 18 and a self-diagnosis program is set and input.

【0022】該自己診断プログラムは上記した性能診断
を実施する為のバルブの開閉シーケンス、及びマスフロ
ーコントローラから入力される信号によりバルブの性能
判断を行い、診断結果を表示器19に表示する為のフォ
ーマットを格納している。
The self-diagnosis program is a format for judging the valve performance based on a valve opening / closing sequence for carrying out the above-mentioned performance diagnosis and a signal input from the mass flow controller, and displaying the diagnosis result on the display unit 19. Is stored.

【0023】キーボード等の入力手段20で自己診断プ
ログラムを選択し実行すると、上記したバルブの性能確
認の手順に従って、順次ガス供給ライン10が選択さ
れ、更にバルブが順次開閉される。又、開閉の度に該当
するラインのマスフローコントローラからの信号を呼込
み、主制御器17に於いてバルブの性能確認が行われ
る。
When the self-diagnosis program is selected and executed by the input means 20 such as a keyboard, the gas supply line 10 is sequentially selected and the valves are sequentially opened and closed in accordance with the procedure for confirming the valve performance described above. Also, every time the valve is opened / closed, a signal from the mass flow controller of the corresponding line is called, and the performance of the valve is confirmed by the main controller 17.

【0024】バルブの性能確認が完了すると、診断結果
は表形式等、設定されたフォーマットで表示、或はプリ
ントアウトされる。
When the valve performance confirmation is completed, the diagnostic result is displayed or printed out in a set format such as a table format.

【0025】而して、半導体製造装置自体がバルブの性
能確認を実施し、作業者は各バルブの開閉作動を指示す
る必要はない。
Thus, the semiconductor manufacturing apparatus itself checks the performance of the valves, and the operator need not instruct the opening / closing operation of each valve.

【0026】尚、上記実施例ではライン中のマスフロー
コントローラを利用してバルブの性能確認を行ったが、
マスフローコントローラに限らず流量を検出できるもの
であればよく、或はバルブの性能確認の為に別途対象と
なるラインに流量検出器を設けてもよく、ラインを流れ
る流体は気体に限らず液体であってもよいことは勿論で
ある。
In the above embodiment, the performance of the valve was confirmed by using the mass flow controller in the line.
The flow rate detector is not limited to a mass flow controller as long as it can detect the flow rate, or a flow rate detector may be installed in the target line to check the valve performance. Of course, it is acceptable.

【0027】[0027]

【発明の効果】以上述べた如く本発明によれば、流体給
排ラインのバルブが正常に作動しているかどうか、更に
バルブの性能検査迄容易に実施でき、処理不良、或はガ
スのリーク等の事故を未然に防ぐことができる。
As described above, according to the present invention, whether or not the valve of the fluid supply / discharge line is operating normally, and even the performance check of the valve can be easily carried out, and the processing failure, gas leak, etc. Can prevent accidents.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の対象の1つである半導体製造装
置のガス導入制御部を示す系統図である。
FIG. 1 is a system diagram showing a gas introduction control unit of a semiconductor manufacturing apparatus which is one of the objects of implementation of the present invention.

【図2】本発明を実施する為の診断装置の概略を示すブ
ロック図である。
FIG. 2 is a block diagram showing an outline of a diagnostic device for carrying out the present invention.

【符号の説明】[Explanation of symbols]

8 エアバルブ 10 ガス供給ライン 11 エアバルブ 12 マスフローコントローラ 14 ガスフィルタ 17 主制御器 18 記憶器 8 Air Valve 10 Gas Supply Line 11 Air Valve 12 Mass Flow Controller 14 Gas Filter 17 Main Controller 18 Memory

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 流量計を具備した流体給排ラインのバル
ブの性能確認方法に於いて、流体給排ラインの性能確認
の対象となるバルブを閉塞すると共に他のバルブを開放
して、前記流量計による流量検出により対象となるバル
ブの性能を診断することを特徴とするバルブの性能確認
方法。
1. A method for confirming the performance of a valve of a fluid supply / discharge line equipped with a flow meter, wherein the valve to be confirmed for the performance of the fluid supply / discharge line is closed and another valve is opened to obtain the flow rate. A method for checking valve performance, which comprises diagnosing the performance of the target valve by detecting the flow rate with a meter.
【請求項2】 所要数のバルブが設けられた流体給排ラ
インに設けられた流量計と、流体給排ラインの性能確認
の対象となるバルブを閉塞すると共に他のバルブを開放
して前記流量計による流量検出を行う様に設定された自
己診断プログラムを格納する記憶器と、前記自己診断プ
ログラムを実行する為の制御器とを具備したことを特徴
とするバルブの性能確認装置。
2. A flow meter provided in a fluid supply / discharge line provided with a required number of valves, and a valve whose performance is to be checked in the fluid supply / discharge line is closed and other valves are opened to provide the flow rate. A performance checking device for a valve, comprising: a storage device for storing a self-diagnosis program set to detect a flow rate by a meter; and a controller for executing the self-diagnosis program.
JP33186994A 1994-12-09 1994-12-09 Method and apparatus for confirmation performance of valve Pending JPH08159908A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33186994A JPH08159908A (en) 1994-12-09 1994-12-09 Method and apparatus for confirmation performance of valve

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33186994A JPH08159908A (en) 1994-12-09 1994-12-09 Method and apparatus for confirmation performance of valve

Publications (1)

Publication Number Publication Date
JPH08159908A true JPH08159908A (en) 1996-06-21

Family

ID=18248560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33186994A Pending JPH08159908A (en) 1994-12-09 1994-12-09 Method and apparatus for confirmation performance of valve

Country Status (1)

Country Link
JP (1) JPH08159908A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010519511A (en) * 2007-02-19 2010-06-03 ブルックス・インストルメント・エルエルシー Diagnosis of valve self-leakage
WO2017018257A1 (en) * 2015-07-29 2017-02-02 東京エレクトロン株式会社 Method for inspecting for leaks in gas supply system valves

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010519511A (en) * 2007-02-19 2010-06-03 ブルックス・インストルメント・エルエルシー Diagnosis of valve self-leakage
US8887549B2 (en) 2007-02-19 2014-11-18 Brooks Instrument, Llc Valve leakby diagnostics
WO2017018257A1 (en) * 2015-07-29 2017-02-02 東京エレクトロン株式会社 Method for inspecting for leaks in gas supply system valves
JP2017032305A (en) * 2015-07-29 2017-02-09 東京エレクトロン株式会社 Method for inspecting valve leak in gas supply system
CN107709953A (en) * 2015-07-29 2018-02-16 东京毅力科创株式会社 The method for checking the valve leakage of gas supply system
CN107709953B (en) * 2015-07-29 2019-12-06 东京毅力科创株式会社 Method for checking valve leakage of gas supply system
TWI688726B (en) * 2015-07-29 2020-03-21 日商東京威力科創股份有限公司 Inspection method for valve body leakage of gas supply system

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