JPH08139451A - Manufacturing method of printed-wiring board - Google Patents

Manufacturing method of printed-wiring board

Info

Publication number
JPH08139451A
JPH08139451A JP27651594A JP27651594A JPH08139451A JP H08139451 A JPH08139451 A JP H08139451A JP 27651594 A JP27651594 A JP 27651594A JP 27651594 A JP27651594 A JP 27651594A JP H08139451 A JPH08139451 A JP H08139451A
Authority
JP
Japan
Prior art keywords
wiring board
printed
hole
printed wiring
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27651594A
Other languages
Japanese (ja)
Inventor
Hisao Takano
久夫 高野
Mizuki Nagai
瑞樹 長井
Koji Kamiyama
宏治 上山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP27651594A priority Critical patent/JPH08139451A/en
Publication of JPH08139451A publication Critical patent/JPH08139451A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE: To provide the title manufacturing method of printed-wiring board having excellent bond properties between inner layer copper foils, outer layer copper foils and an electroplating copper while avoiding a decline in precipitation of manganese oxide on an insulator surface on a through hole inner wall, especially on a glass cloth, thereby improving the conductivity on the through hole inner wall part. CONSTITUTION: The title manufacturing method of pronted-wiring board is composed of the four steps as follows, i.e., the first step of treating a perforated and cleaned printed-wiring board with a solution containing neutral permanganate, the second step of pickling the printed-wiring board, the third step of coating the printed-wiring board inner wall part with organic monomer and the fourth step of immersing the printed-wiring board in an acid solution for making an organic monomer into conductive polymer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、表裏の配線パターンを
接続するスルーホールを有する両面及び多層プリント配
線板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a double-sided and multilayer printed wiring board having through holes for connecting front and back wiring patterns.

【0002】[0002]

【従来の技術】プリント配線基板のスルーホール内壁に
電気めっきを施すに際して、予め、スルーホール内壁に
導電性を付与する手段として、特表平5−506125
号公報及び特開平4−188696号公報に示されてい
るように、従来の如き無電解めっきによらず、酸化重合
により導電性ポリマーを形成する有機モノマーと溶媒又
は可溶化剤を含む処理液、例えばピロールモノマーとN
−メチル−2−ピロリドンとの混合液を用い、スルーホ
ール内壁に露出しているエポキシ樹脂及びガラスクロス
等の絶縁体表面に、導電性ポリマー被膜を形成し、のち
の電気めっきを行う方法が提案されている。すなわち、
例えばプリント配線板の所定箇所をドリルで穴明けし、
次いで研磨、洗浄等を含む清浄活性化工程(デスミア工
程)、さらに、ソフトエッチング工程、過マンガン酸塩
工程、有機モノマー付与工程、酸重合工程を経たのち直
接電気銅めっきを行い、プリント配線板のスルーホール
が形成されていた。この場合、有機モノマーの重合触媒
であるマンガン酸化物の形成には、アルカリ性の過マン
ガン酸塩溶液が用いられ、これによりスルーホール内壁
に酸重合タイプの導電性ポリマー被膜を得ている。しか
し、水酸化ナトリウム10〜30g/lを含むアルカリ
性の過マンガン酸塩溶液を用いるため、ガラスクロス上
へのマンガン酸化物の析出量は著しく低下し、導電性も
悪くなり電気銅めっきを行う上で極めて不利になる。さ
らに、ポリイミド基材等は、ガラスエポキシ基材と比較
してアルカリに弱いため、上記従来法では、同一条件下
の過マンガン酸塩処理することは難しく、作業上好まし
くない。
2. Description of the Related Art When electroplating an inner wall of a through hole of a printed wiring board, as a means for imparting conductivity to the inner wall of the through hole in advance, it is disclosed in Japanese Patent Publication No. H05-506125.
As disclosed in Japanese Patent Laid-Open No. 4-188696 and Japanese Patent Laid-Open No. 4-188696, a treatment liquid containing an organic monomer that forms a conductive polymer by oxidative polymerization and a solvent or a solubilizing agent, instead of conventional electroless plating, For example, pyrrole monomer and N
-Proposed a method of forming a conductive polymer film on the surface of the insulating material such as epoxy resin and glass cloth exposed on the inner wall of the through hole using a mixed solution with methyl-2-pyrrolidone and then performing electroplating. Has been done. That is,
For example, drill a hole in the printed wiring board at a predetermined location,
Then, after a cleaning activation step (desmear step) including polishing, washing, etc., and further a soft etching step, a permanganate step, an organic monomer applying step, an acid polymerization step, direct electrolytic copper plating is performed, and then a printed wiring board Through holes were formed. In this case, an alkaline permanganate solution is used to form manganese oxide, which is a polymerization catalyst for the organic monomer, to obtain an acid polymerization type conductive polymer film on the inner wall of the through hole. However, since an alkaline permanganate solution containing 10 to 30 g / l of sodium hydroxide is used, the amount of manganese oxide deposited on the glass cloth is remarkably reduced, the conductivity is deteriorated, and electrolytic copper plating is performed. Will be extremely disadvantageous. Furthermore, since the polyimide base material and the like are more vulnerable to alkalis than the glass epoxy base material, it is difficult to perform permanganate treatment under the same conditions by the above conventional method, which is not preferable in terms of work.

【0003】[0003]

【発明が解決しようとする課題】上記従来の問題点を解
決するため、本発明者等は、プリント配線板のスルーホ
ール内壁のマンガン酸化物の析出を従来の如きアルカリ
性の過マンガン酸塩溶液によらず、中性の過マンガン酸
塩溶液を用いることにより行うことを提案した。しか
し、その方法によれば導電性ポリマー被膜の導電性やめ
っき析出性の向上は図られるものの、銅箔上への微量の
金属酸化物被膜を形成し易くなり、銅箔と電気めっき銅
の間に導電性ポリマーが介在し、密着不良を起こした
り、接続部分に境界が見られる等の問題があった。
In order to solve the above-mentioned conventional problems, the present inventors have proposed that the precipitation of manganese oxide on the inner wall of the through hole of the printed wiring board be changed to the conventional alkaline permanganate solution. However, it was proposed to do this by using a neutral permanganate solution. However, although this method can improve the conductivity and plating depositability of the conductive polymer coating, it facilitates the formation of a trace amount of a metal oxide coating on the copper foil, and thus the copper foil and the electroplated copper are separated from each other. There is a problem that a conductive polymer intervenes in the above, causing poor adhesion, and that a boundary is seen at the connecting portion.

【0004】本発明は、スルーホール内壁部の絶縁体表
面、特にガラスクロス上へのマンガン酸化物の析出量低
下を防止し、これによりスルーホール内壁の導電性向上
を図ると共に、内層銅箔と外層銅箔と電気めっき銅の密
着性に優れたプリント配線板の製造方法を提供するもの
である。
The present invention prevents a decrease in the amount of manganese oxide deposited on the surface of the insulator of the inner wall of the through hole, particularly on the glass cloth, thereby improving the conductivity of the inner wall of the through hole and forming an inner layer copper foil. Provided is a method for producing a printed wiring board having excellent adhesion between an outer layer copper foil and electroplated copper.

【0005】[0005]

【課題を解決するための手段】本発明は、上記課題を解
決するため、中性の過マンガン酸塩溶液を用いてスルー
ホール内壁にマンガン酸化物層を析出させた後、酸洗を
行うことにより、銅箔上の金属酸化物被膜を除去し、上
記課題の解決を図ったものである。すなわち、本発明
は、(1)穴明けして洗浄したプリント配線基板を中性
の過マンガン酸塩を含む溶液で処理する工程と、(2)
該プリント配線基板を酸洗する工程と、(3)スルーホ
ール内壁部に有機モノマー被着させる工程と、(4)次
いで、酸性溶液中に該プリント配線基板を浸漬して、該
有機モノマーを導電性ポリマー化する工程とを具備して
なる工程により直接電気銅めっきするための下地を形成
することを特徴とするプリント配線板の製造方法を提供
するものである。
SUMMARY OF THE INVENTION In order to solve the above problems, the present invention uses a neutral permanganate solution to deposit a manganese oxide layer on the inner wall of a through hole and then performs pickling. Thus, the metal oxide coating on the copper foil is removed to solve the above problems. That is, the present invention includes (1) a step of treating a printed wiring board that has been perforated and washed with a solution containing a neutral permanganate, and (2)
A step of pickling the printed wiring board, (3) a step of applying an organic monomer to the inner wall of the through hole, and (4) a step of immersing the printed wiring board in an acid solution to conduct the organic monomer. The present invention provides a method for producing a printed wiring board, characterized in that a base for direct electrolytic copper plating is formed by a step including a step of forming a conductive polymer.

【0006】なお、この場合、(2)工程で用いられる
酸としては、硫酸を用いることができ、該水溶液の濃度
は、例えば5〜10%含むものであって、処理温度は1
0〜30℃が好ましい。
In this case, sulfuric acid can be used as the acid used in the step (2), and the concentration of the aqueous solution contains, for example, 5 to 10% and the treatment temperature is 1%.
0-30 degreeC is preferable.

【0007】[0007]

【作用】過マンガン酸塩で処理する工程(1)を中性液
で処理することにより、従来のアルカリ液に見られるよ
うなガラスクロス上のマンガン酸化物析出量の低下がな
くなることになる。また、ガラスクロスへのめっき析出
性向上ならびに製品の品質安定化が図られる。さらに、
銅箔を電気めっき銅の間に境界が見られなくなり、熱衝
撃試験よるスルーホールの信頼性向上が図られる。
By treating the step (1) of treating with permanganate with a neutral solution, the decrease in the amount of manganese oxide deposited on the glass cloth, which is observed in the conventional alkaline solution, can be eliminated. Further, it is possible to improve the deposition of plating on the glass cloth and stabilize the quality of the product. further,
No boundary is seen between the copper foil and the electroplated copper, and the thermal shock test improves the reliability of the through hole.

【0008】[0008]

【実施例】【Example】

実施例1 多層プリント配線板(層数6層、板厚1.6mm)の所
定位置にドリルで直径0.6mmのスルーホールを形成
した。次いで、表面研磨によりバリを除去したのち、過
マンガン酸デスミア処理を行った。次に、酸化剤ブラシ
ッドDMA(ブラスバーグ社製、商品名)80g/l、
濃硫酸20g/lから成るエッチング液を用いて、30
℃にて3分間ソフトエッチングした。次いで、コンディ
ショナーとして、界面活性剤ブラソリットDMS2パー
ト1(ブラスバーグ社製、商品名)を15ml/l及び
界面活性剤ブラソリットDMS2パート2(ブラスバー
グ社製、商品名)を30ml/lを含む溶液を用いて、
60℃、5分間処理した。さらに、過マンガン酸カリウ
ムを60g/lを含む中性溶液を用いて、過マンガン酸
カリウム処理を90℃にて5分間行った。次に、濃硫酸
を100ml/l含む酸洗液を用いて室温にて1分間処
理した。なお、酸洗処理前後の銅箔及びガラスクロス上
のマンガン酸化物を測定したが、析出量の低下は認めら
れなかった。その後、有機モノマー剤キャタリストDM
S2(ブラスバーグ社製、商品名)を400ml/l含
む水溶液中に室温にて1分間浸漬して、有機モノマーを
被着させ、続いて希硫酸(濃硫酸100ml/l)に1
分間浸漬し、モノマーを酸化重合させて、スルーホール
内壁に導電性ポリマーを形成させた。次に、硫酸銅めっ
き浴として硫酸銅五水和物70g/l、濃硫酸180g
/l及び添加剤カプロスターLP−1(ブラスバーグ社
製、商品名)4ml/lから成る浴を用い、2A/dm
2で5分間電気めっきを行い、スルーホールの光透過試
験を行った結果、スルーホール全体は、めっき銅で完全
に被覆されていた。また、2A/dm2で60分間電気
めっきを行い、スルーホール内壁に25μm厚の銅めっ
き皮膜を形成した配線板のスルーホール断面を観察した
ところ、外層銅箔及び内層銅箔とめっき銅との接続部分
には境界は見られなかった。以上のように作成された配
線板を用い、はんだディップ試験、熱衝撃試験を行った
が、異常は全く認められなかった。
Example 1 A through hole having a diameter of 0.6 mm was formed with a drill at a predetermined position of a multilayer printed wiring board (6 layers, board thickness 1.6 mm). Then, after removing burrs by surface polishing, permanganate desmear treatment was performed. Next, an oxidizer brushed DMA (trade name, manufactured by Brasberg) 80 g / l,
Using an etching solution consisting of 20 g / l of concentrated sulfuric acid, 30
Soft etching was performed for 3 minutes at ℃. Then, as a conditioner, a solution containing 15 ml / l of the surfactant Brasolit DMS2 Part 1 (Brasberg, trade name) and 30 ml / l of the surfactant Brasolit DMS2 Part 2 (Brasberg, trade name). make use of,
It was treated at 60 ° C. for 5 minutes. Furthermore, potassium permanganate treatment was performed at 90 ° C. for 5 minutes using a neutral solution containing 60 g / l of potassium permanganate. Next, it was treated for 1 minute at room temperature with a pickling solution containing concentrated sulfuric acid at 100 ml / l. The manganese oxide on the copper foil and the glass cloth before and after the pickling treatment was measured, but no decrease in the amount of precipitation was observed. After that, the organic monomer agent catalyst DM
Immerse S2 (Brasberg Co., trade name) in an aqueous solution containing 400 ml / l for 1 minute at room temperature to deposit an organic monomer, and then to dilute sulfuric acid (concentrated sulfuric acid 100 ml / l) 1
It was immersed for a minute, and the monomer was oxidatively polymerized to form a conductive polymer on the inner wall of the through hole. Next, as a copper sulfate plating bath, copper sulfate pentahydrate 70 g / l, concentrated sulfuric acid 180 g
/ L and an additive, Caprostar LP-1 (Brasberg, trade name) 4 ml / l, 2 A / dm
As a result of conducting electroplating at 2 for 5 minutes and conducting a light transmission test of the through hole, the entire through hole was completely covered with plated copper. Further, when electroplating was performed at 2 A / dm 2 for 60 minutes and the through hole cross section of the wiring board in which the copper plating film having a thickness of 25 μm was formed on the inner wall of the through hole was observed, the outer copper foil and the inner copper foil and the plated copper were No boundary was found at the connection. Using the wiring board prepared as described above, a solder dip test and a thermal shock test were conducted, but no abnormality was recognized at all.

【0009】実施例2 実施例1において、過マンガン酸カリウム処理後の酸洗
液に濃硫酸50ml/lを用い、室温にて1分間処理し
た以外は実施例1と同様に処理した結果、実施例1と同
様の結果が得られた。
Example 2 The same procedure as in Example 1 was carried out except that 50 ml / l of concentrated sulfuric acid was used as the pickling solution after the treatment with potassium permanganate and the treatment was carried out at room temperature for 1 minute. Similar results to Example 1 were obtained.

【0010】比較例1 実施例1において、過マンガン酸カリウム溶液に水酸化
ナトリウム10g/lを含む過マンガン酸カリウム処理
を90℃にて5分間行い、酸洗を行わずに有機モノマー
を被着させ、スルーホール内壁に導電性ポリマーを形成
させた以外は、実施例1と同様に処理した。その結果、
銅箔上のマンガン酸化物の析出量は0.01mg/dm
2以下であったが、ガラスクロス上のマンガン酸化物の
析出量は役90%の低下が認められ、さらに、電気めっ
き5分後のスルーホールの光透過試験においては、ガラ
スクロスの殆どがめっき未析出であった。
Comparative Example 1 In Example 1, a potassium permanganate solution was treated with potassium permanganate containing 10 g / l of sodium hydroxide at 90 ° C. for 5 minutes to deposit an organic monomer without pickling. Then, the same treatment as in Example 1 was performed except that a conductive polymer was formed on the inner wall of the through hole. as a result,
The amount of manganese oxide deposited on the copper foil is 0.01 mg / dm
Although it was 2 or less, the amount of manganese oxide deposited on the glass cloth decreased by 90%, and most of the glass cloth was plated in the through hole light transmission test 5 minutes after electroplating. It was not precipitated.

【0011】比較例2 実施例1において、過マンガン酸カリウム処理後に酸洗
を行わなかった以外は、実施例1と同様に処理した。そ
の結果、ガラスクロス上のマンガン酸化物の析出量低下
は認められなかったが、銅箔上には、約0.2mg/d
2のマンガン酸化物の析出が認められた。また、電気
めっき5分後のスルーホールの光透過試験においては、
スルーホール全体がめっき銅で完全に被覆され良好なめ
っき析出性を示したが、25μm厚の銅めっき皮膜を形
成後のスルーホール断面を観察した結果、外層銅箔及び
内層銅箔とめっき銅との接続部分には境界及び剥がれが
認められた。
Comparative Example 2 The same treatment as in Example 1 was carried out except that no pickling was carried out after the treatment with potassium permanganate. As a result, no reduction in the amount of manganese oxide deposited on the glass cloth was observed, but about 0.2 mg / d on the copper foil.
Precipitation of m 2 of manganese oxide was observed. Also, in the light transmission test of the through hole after 5 minutes of electroplating,
The entire through-hole was completely covered with plated copper and showed good plating depositability, but the cross-section of the through-hole after forming the copper plating film with a thickness of 25 μm was observed. Boundary and peeling were observed at the connection part of.

【0012】[0012]

【発明の効果】以上に説明したように、本発明によっ
て、過マンガン酸塩処理工程において、浴のpHを中性
にすることにより、マンガン酸化物の析出量を低下させ
ることがないので、スルーホール内に均一で導電性の良
好なポリマー被膜を得ることができる。また、過マンガ
ン酸塩処理後の酸洗により、銅箔上の金属酸化物が除去
されるため内層銅箔及び外層銅箔との間の境界の発生を
防止することができ、これにより銅箔とめっき銅の密着
性が良好となり、製品の品質安定化が図れるようになっ
た。
As described above, according to the present invention, in the permanganate treatment step, the precipitation amount of manganese oxide is not lowered by making the pH of the bath neutral, so that the through It is possible to obtain a uniform and highly conductive polymer film in the hole. Further, by pickling after the permanganate treatment, since the metal oxide on the copper foil is removed, it is possible to prevent the occurrence of a boundary between the inner layer copper foil and the outer layer copper foil, and thereby the copper foil. The adhesion of the plated copper is improved, and the quality of the product can be stabilized.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】(1)穴明けして洗浄したプリント配線基
板を中性過マンガン酸塩溶液で処理し、スルーホール内
壁部の絶縁体部分にマンガン酸化物層を析出させる工程
と、(2)上記(1)からのプリント配線基板を酸洗す
る工程と、(3)上記(2)からのプリント配線基板を
酸化重合により導電性ポリマーを形成し得る有機モノマ
ーを被着させる工程と、(4)次いで、上記(3)工程
からのプリント配線基板を酸性溶液中に浸漬して、スル
ーホール内壁の絶縁体表面に導電性ポリマー被膜を形成
させる工程と、を具備してなる工程によりの直接電気銅
めっきするための下地を形成することを特徴とするプリ
ント配線板の製造方法。
1. A step of: (1) treating a printed wiring board that has been perforated and washed with a neutral permanganate solution to deposit a manganese oxide layer on an insulator portion of an inner wall portion of a through hole; ) A step of pickling the printed wiring board from (1) above, and (3) a step of depositing an organic monomer capable of forming a conductive polymer on the printed wiring board from above (2) by oxidative polymerization. 4) Next, a step of immersing the printed wiring board from the above step (3) in an acidic solution to form a conductive polymer film on the insulator surface of the inner wall of the through hole. A method for manufacturing a printed wiring board, which comprises forming an underlayer for electrolytic copper plating.
JP27651594A 1994-11-10 1994-11-10 Manufacturing method of printed-wiring board Pending JPH08139451A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27651594A JPH08139451A (en) 1994-11-10 1994-11-10 Manufacturing method of printed-wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27651594A JPH08139451A (en) 1994-11-10 1994-11-10 Manufacturing method of printed-wiring board

Publications (1)

Publication Number Publication Date
JPH08139451A true JPH08139451A (en) 1996-05-31

Family

ID=17570552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27651594A Pending JPH08139451A (en) 1994-11-10 1994-11-10 Manufacturing method of printed-wiring board

Country Status (1)

Country Link
JP (1) JPH08139451A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103874344A (en) * 2012-12-10 2014-06-18 Ymt株式会社 Vias of a circuit board and method for depositing conducting polymers into through-holes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103874344A (en) * 2012-12-10 2014-06-18 Ymt株式会社 Vias of a circuit board and method for depositing conducting polymers into through-holes

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