JPH08129648A - Hatching method for two-dimensional polygon - Google Patents

Abstract

PURPOSE: To shorten the time required to generate a continuous segment pattern in a two-dimensional polygonal area. CONSTITUTION: Longitudinal intervals (a) as pattern elements and lateral intervals (b) as pattern elements are obtained from a previously equipped input means, and lateral pattern element segments in the two-dimensional polygonal area are generated by 1st algorithm from equal-interval lateral segments which are generated at the longitudinal intervals (a) and longitudinal pattern element segments (L1, L2..., L9) in the two-dimensional polygonal area are generated by 2nd algorithm from equal-interval longitudinal segments which are generated at the lateral intervals (b).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hatching method for hatching continuous line segment patterns in a two-dimensional polygonal area.

[0002]

2. Description of the Related Art Conventionally, in a construction drawing or the like, a hatching process for hatching a continuous line pattern as shown in FIG. 1 in a two-dimensional polygonal area is disclosed in Japanese Patent Laid-Open No. 63-18.
As described in detail in Japanese Patent No. 8281, a line segment generated by decomposing a two-dimensional polygonal region into line segment elements and obtaining an intersection of the region line segment element and a straight line parallel to the Y axis,
And a vertical line segment in the two-dimensional polygonal region and a horizontal line segment to be a pattern element are obtained from the line segments generated by obtaining the intersections of the region line segment element and the straight line parallel to the X axis, After that, the intersection of the vertical line segment and the horizontal line segment was obtained to obtain the vertical line segment as the pattern element.

[0003]

In the above-described conventional method of hatching continuous line segment patterns of a two-dimensional polygon, the line segments of the pattern element are all generated by obtaining the intersection points of the line segments. Therefore, there is a drawback that the time required to generate the line segment of the pattern element increases as the size of the two-dimensional polygonal area increases.

[0004]

According to a first aspect of the present invention, in a two-dimensional polygon hatching processing method in which a continuous line pattern is hatched in a two-dimensional polygonal area, a pattern element in the vertical direction is used as a pattern element. Spacing a and lateral spacing b, which is a pattern element
From the input means provided in advance, and then from the evenly-spaced horizontal line segments generated at the vertical spacing a by the first algorithm in the predetermined horizontal direction within the two-dimensional polygonal area. A pattern element line segment is generated, and then a predetermined vertical pattern element line in the two-dimensional polygonal area is generated by a second algorithm from the vertically-spaced vertical line segments generated at the interval b in the horizontal direction. It is characterized by generating minutes.

The second aspect of the present invention is a two-dimensional polygon hatching processing method for hatching a continuous line pattern in a two-dimensional polygonal area. Is obtained (step 2-1), then the horizontal distance b, which is a pattern element, is obtained from the input means (step 2-2), and then the two-dimensional polygonal area is obtained. The minimum coordinates and the maximum coordinates are obtained by calculation (step 2-3), and then the two-dimensional polygonal area is decomposed from each vertex coordinate into line segment elements (step 2-
4) Next, in the rectangular area formed from the minimum coordinates and the maximum coordinates of the two-dimensional polygon obtained in step 2-3, the vertical spacing a obtained in step 2-1 is equal. A horizontal line segment is generated (step 2-5), and then the area element line segment of the two-dimensional polygonal area decomposed in step 2-4 and the equal interval obtained in step 2-5. The intersection of a with the horizontal line segment is obtained, and the line segment inside the two-dimensional polygonal area divided by the intersection is set as a horizontal pattern element line segment (step 2-6), and further, the step 2 -3, the step 2
-2 generates vertical line segments at equal intervals in the horizontal direction of the space b (step 2-7), and then the area element line segment obtained in step 2-4 and the step 2- Step 2-1 is performed using a predetermined algorithm from the line segments inside the two-dimensional polygonal area obtained by obtaining the intersections with the vertical line segments at the equal intervals b obtained in Step 7 above.
It is characterized in that the line segment obtained for each of the vertical direction intervals a obtained in (1) is set as a vertical pattern element line segment (step 2-8).

[0006]

Next, the present invention will be described with reference to the drawings.

FIG. 1 is a diagram showing an example of hatching of continuous line segment patterns of a two-dimensional polygon, FIG. 2 is a processing flow chart showing one embodiment of the present invention, and FIG. 3 is a two-dimensional polygon in this embodiment. FIG. 4 is a diagram showing a minimum-maximum coordinate of a region and two-dimensional polygon region data, FIG. 4 is a diagram showing a method of generating a horizontal line segment in the minimum-maximum region, and FIG. 5 is a pattern element of a horizontal line segment of a two-dimensional polygon region. FIG. 6 is a diagram showing a generation method, FIG. 6 is a diagram showing a generation method of a vertical line segment in a minimum-maximum region, and FIG. 7 is a generation method of a vertical line segment pattern element of a two-dimensional polygon region and a two-dimensional region element and a minimum. FIG. 8 is a diagram showing a method of generating an intersection table with vertical line segments in the maximum area, and FIG. 8 is a reference diagram for generating pattern elements of vertical line segments in both areas of a two-dimensional polygon.

In the two-dimensional polygonal hatching method of the present embodiment, as shown in FIG. 2, first, in step 2-1 the vertical spacing a from the input means provided in advance becomes pattern elements.
Is acquired, and in step 2-2, a horizontal interval b that is a pattern element is acquired. Next, in step 2-3, the minimum coordinates (x
1, y1) -Get the maximum coordinate (x2, y2).

Next, in step 2-4, as shown in FIG. 3, the two-dimensional polygonal area is decomposed from each vertex coordinate into line segment elements. In the next step 2-5, as shown in FIG. 4, within the rectangular area formed from the minimum coordinates (x1, y1) -maximum coordinates (x2, y2) of the two-dimensional polygon obtained in step 2-3. , The line segments (y = aN + y1 ... N is N> 0) at equal intervals of the vertical interval a obtained in step 2-1 are generated.

At the next step 2-6, as shown in FIG. 5, the area element line segment decomposed at step 2-4 and the horizontal line in the two-dimensional polygonal area having the equal interval a obtained at step 2-5. Then, each line segment is divided into a plurality of line segments at the intersections, and the line segment inside the two-dimensional polygonal area is generated as a pattern element line segment.

Further, in step 2-7, as shown in FIG. 6, within the rectangular both regions formed from the minimum coordinates (x1, y1) -maximum coordinates (x2, y2) of the two-dimensional polygon obtained in step 2-3. Then, vertical line segments (x = bN + x1 ... where N> 0) at equal intervals of the horizontal distance b obtained in step 2-2 are generated.

In the next step 2-8, step 2-4
The intersections of the region element line segments decomposed in step 2 and the vertical line segments in the two-dimensional polygonal region of equal intervals b obtained in step 2-7 are obtained, and each line segment is divided into a plurality of line segments at the intersections, Generate a line segment inside the two-dimensional polygonal area. The starting point coordinates of the generated line segment are set in the starting point coordinate value table, and the ending point coordinates are set in the ending point coordinate value table.

Further, in step 2-9, step 2-
Using the starting point coordinate value table and the ending point coordinate value table generated in step 8, vertical pattern line segments in both two-dimensional areas are generated.

The generation of the intersection table of the two-dimensional area and the vertical line segment in step 2-8 will be described with reference to FIG. First, the intersection of the line segment (x = b + x1) of L shown in the segment diagram 7-1 and the two-dimensional polygonal area is obtained. Next, as shown in FIG. 7B, line segments L1, L2, L are obtained at the obtained intersections p1, p2.
Then, the line segment L2 that is inside the two-dimensional polygonal area is generated among the line segments L1, L2, and L3. Next, FIG.
As shown in, the start point coordinate value p1 of L1 is set in the start point coordinate value table S (not shown), and the end point coordinate value P2 is set in the end point coordinate value table E (not shown). The same applies to the line segments M and N.

Next, the generation of vertical line segments in the two-dimensional polygonal area in step 2-9 will be described with reference to FIG.

The generation order of the line segments L1 to L9 in FIG. 8 is as follows: pattern line segments L1, L2, L to be generated between a0 to a1.
3, pattern line segments L4, L5, L to be generated between a1 and a2
6, pattern line segments L7, L8, a to be generated between a2 and a3
The start point and end point coordinates of each pattern line segment are determined and generated in the order of the pattern line segment L9 to be generated between 3 and a4.

The coordinate value of the start point and end point of the line segment is the vertical interval a.
And the horizontal interval b, the start point coordinate table, and the end point coordinate table.

Pattern line segments L1, L2, L3 between a0 to a1
In the case of, the x coordinate value is x1 +
The offset values in the b and x directions are b * 2, and L1 is x1 +
b and L2 are x1 + b + b * 2, L3 is x1 + b + b * 2
Set as + b * 2.

In the case of between a1 and a2, the initial value is x
1 + b * 2, the offset value in the x direction is b * 2, and a2
In the case of between -a3, the initial value is x1 + b and the x-direction offset value is b * 2.

The method for determining the y coordinate value of the pattern line segment is a0 to a0.
In the case of a1, the start point coordinate value is y1 and the end point coordinate value is y1 +
In the case of a and a1 to a2, the start point coordinate value is set as the start point coordinate value + a between a0 to a1 and the end point coordinate value is set as the end point coordinate value + a between a0 to a1.
Based on the relationship between the start point coordinate value table and the end point coordinate value table set in -8, it is determined whether the line segment is a line segment to be generated.

If the result of determination is that the line segment is to be generated, the start point coordinate value and the value in the start point coordinate value table are compared,
When the value in the starting point coordinate value table is larger, the starting point coordinate value is changed to the value in the starting point coordinate value table. Further, the end point coordinate value is compared with the value of the end point coordinate value table, and if the value of the end point coordinate value table is smaller, the end point coordinate value is changed to the value of the end point coordinate value table.

The coordinate value determined by the above-described method is generated as a line segment of the pattern element.

When the cleanliness of the vertical pattern line segment is completed, FIG.
A continuous line segment pattern is displayed in both areas of the two-dimensional polygon as shown in FIG.

As described above, according to the present invention, when a continuous line pattern is hatched in a two-dimensional polygon area,
A vertical line segment that is a pattern element can be generated by an algorithm that is determined from a vertical interval a and a horizontal interval b without obtaining an intersection with the horizontal pattern line segment.

[0025]

As described above, when a continuous line pattern is hatched in a two-dimensional polygonal area, vertical line segments that are pattern elements are separated by a vertical space a and a horizontal space. b
Since it can be generated by the algorithm defined by, there is an effect that the time required to generate a continuous line segment pattern can be shortened.

[Brief description of drawings]

FIG. 1 is a diagram showing an example of hatching of continuous line segment patterns of a two-dimensional polygon.

FIG. 2 is a processing flow chart showing an embodiment of the present invention.

FIG. 3 is a diagram showing minimum-maximum coordinates of a two-dimensional polygon area and two-dimensional polygon area data according to the present invention.

FIG. 4 is a diagram showing a horizontal line segment generation method in the minimum-maximum region according to the present invention.

FIG. 5 is a diagram showing a method of generating a pattern element of a horizontal line segment of a two-dimensional polygonal area according to the present invention.

FIG. 6 is a diagram showing a method for generating a vertical line segment in a minimum-maximum region according to the present invention.

FIG. 7 is a diagram showing a method of generating a vertical line segment in a two-dimensional polygonal area and a method of generating an intersection table of a two-dimensional area element and a vertical line segment in a minimum-maximum area.

FIG. 8 is a reference diagram in the case of generating a pattern element of a vertical line segment in both areas of a two-dimensional polygon according to the present invention.

[Explanation of symbols]

Step 2-1 Vertical-direction interval acquisition step Step 2-2 Horizontal-direction interval acquisition step Step 2-3 Minimum-maximum coordinate acquisition step Step 2-4 Two-dimensional area element generation step Step 2-5 Minimum-maximum area Step of generating horizontal line segment in step 2-6 Step of generating horizontal line segment in two-dimensional polygonal area Step 2-7 Step of generating vertical line segment in minimum-maximum area Step 2-8 Two-dimensional area and vertical line segment Intersection table generation step Step 2-9 Generation step of vertical line segment in two-dimensional polygon area

Claims (2)

[Claims] 1. A method of hatching a two-dimensional polygon in which a continuous line pattern is hatched in a two-dimensional polygonal area, wherein a vertical interval a which is a pattern element and a horizontal direction which is a pattern element are used. The interval b is obtained from the input means provided in advance, and then the predetermined horizontal line segment in the two-dimensional polygonal region is calculated by the first algorithm from the equally-spaced horizontal line segments generated at the vertical interval a. Direction pattern element line segments are generated, and then the predetermined vertical pattern in the two-dimensional polygonal area is generated by the second algorithm from the equally-spaced vertical line segments generated at the horizontal distance b. A two-dimensional polygonal hatching method characterized by generating element line segments. 2. A method of hatching a two-dimensional polygon when a continuous line pattern is hatched in a two-dimensional polygonal area, wherein first, a vertical spacing a which becomes a pattern element from an input means provided in advance. Is obtained (step 2-1), then the horizontal interval b which is a pattern element is obtained from the input means (step 2-2), and then the minimum and maximum coordinates of the two-dimensional polygonal area are obtained. It is obtained by calculation (step 2-3), then the two-dimensional polygonal area is decomposed from the coordinates of each vertex into line segment elements (step 2-4), and then the step obtained in step 2-3 is performed. In the rectangular area formed by the minimum coordinates and the maximum coordinates of the two-dimensional polygon, horizontal line segments at equal intervals of the vertical interval a obtained in step 2-1 are generated (step 2-5), Next, the above step 2-4
The two-dimensional polygon obtained by finding the intersections of the area element line segments of the two-dimensional polygonal region decomposed in step 3 and the horizontal line segments of the equal interval a obtained in step 2-5. The line segment inside the area is used as a pattern element line segment in the horizontal direction (step 2-6), and the space in the horizontal direction obtained in step 2-2 is further included in both the rectangular regions obtained in step 2-3. Generate vertical line segments at equal intervals of b (step 2-
7) Next, the intersections of the area element line segments obtained in step 2-4 and the vertical line segments of the equal interval b obtained in step 2-7 are obtained, and the two divided by the intersection points.
The line segment obtained for each of the vertical intervals a obtained in step 2-1 by using a predetermined algorithm from the line segment inside the three-dimensional polygonal area is set as the vertical pattern element line segment (step 2 -8) A method for hatching a two-dimensional polygon, characterized in that