JPH08126580A - Cooker - Google Patents

Cooker

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Publication number
JPH08126580A
JPH08126580A JP26859594A JP26859594A JPH08126580A JP H08126580 A JPH08126580 A JP H08126580A JP 26859594 A JP26859594 A JP 26859594A JP 26859594 A JP26859594 A JP 26859594A JP H08126580 A JPH08126580 A JP H08126580A
Authority
JP
Japan
Prior art keywords
conductive film
film
polyimide resin
temperature
binder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26859594A
Other languages
Japanese (ja)
Inventor
Hiroshi Yoshikawa
浩史 吉川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP26859594A priority Critical patent/JPH08126580A/en
Publication of JPH08126580A publication Critical patent/JPH08126580A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To provide a cooker having a positive temperature characteristic by applying the constitution that a conductive film contains a binder of polyimide resin and a conductive inorganic substance having the specified grain size according to the preset ratio. CONSTITUTION: A cooker 10 has a pair of electrodes 2 at both ends of a flat insulation substrate 3, and a conductive film 1 containing a conductive material and a binder is laid between the electrodes 2. The conductive film 1 formed on the substrate 3 contains a binder at least made of polyimide resin, and metallic powder or silicide with a grain size between 1 and 20μm on the basis of a blending ratio between 1:1 and 1:6. As a result, the film 1 comes to have a positive temperature characteristic, and even if the temperature of cooking surface drops, due to the placement of a cooking ingredient thereon, power consumption becomes high and the temperature thereof quickly rises. Furthermore, power consumption becomes low, when temperature reaches the preset level. Also, when the film 1 is made to contain an insulation filler having a mean grain size equal to or less than 10μm, the resistance value of the film 1 increases, and a resistance value for a heating film can be easily established.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、家庭用及び業務用の加
熱加熱調理器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to household and commercial heating cookers.

【0002】[0002]

【従来の技術】従来から、種々の発熱抵抗体が提案され
ている。例えば、金属硼化物と導電性珪化物とをスパッ
タリングして調製した発熱抵抗体を有するサーマルヘッ
ド(特公昭60−229号公報)、ポリイミド樹脂と低
分子量重合体とからなるバインダー樹脂に導電性粉体を
分散させてなる皮膜型抵抗体(特開昭55−14170
5号公報)、絶縁基板上にバインダーとして熱硬化性ポ
リイミド樹脂と導電粉末とからなる抵抗体を形成してな
る印刷抵抗体(特開昭63−226901号公報)等が
提案されており、それぞれ繰り返し使用時或いは高温時
における抵抗変化率の低減等が図られている。
2. Description of the Related Art Conventionally, various heating resistors have been proposed. For example, a thermal head (Japanese Patent Publication No. 60-229) having a heating resistor prepared by sputtering a metal boride and a conductive silicide, a binder resin composed of a polyimide resin and a low molecular weight polymer, and a conductive powder. A film type resistor formed by dispersing the body (Japanese Patent Laid-Open No. 55-14170).
No. 5), a printed resistor (Japanese Patent Laid-Open No. 63-226901) in which a resistor made of a thermosetting polyimide resin as a binder and a conductive powder is formed on an insulating substrate has been proposed. It has been attempted to reduce the rate of resistance change during repeated use or at high temperatures.

【0003】一方、従来の加熱調理器としては、ニクロ
ム線やニッケル、アルミ等の金属線或いは金属平板から
なる発熱体を、マイカ板等の絶縁体で支持挟着したも
の、ニクロム線ヒータ、シーズヒータ等で間接的に加熱
するもの等がある。これらの加熱調理器では、調理板上
に調理物を置いて調理板の表面温度が低下した場合、調
理板に接触させた温度センサーにより表面温度の低下を
検知し、調理板表面の温度が所定の温度になるまでヒー
タに印加電圧を加えていた。
On the other hand, as a conventional cooking device, a heating element made of a metal wire such as a nichrome wire, nickel, aluminum or a flat metal plate is supported and sandwiched by an insulating material such as a mica plate, a nichrome wire heater, and a sheath. For example, there is a heater that indirectly heats. In these heating cookers, when a cooked product is placed on the cooking plate and the surface temperature of the cooking plate decreases, the temperature sensor in contact with the cooking plate detects the decrease in the surface temperature and the temperature of the cooking plate surface is kept at a predetermined level. The applied voltage was applied to the heater until the temperature reached.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、調理板
表面の温度をヒータのON−OFFだけで制御する上記
加熱調理器において、調理物を調理板に置いた際の調理
板表面の温度低下を最小限にするためには、図7に示す
ように、消費電力の大きいヒータを用いるか、或いは設
定温度を予め高く設定しておく必要があるという問題が
ある。
However, in the above heating cooker in which the temperature of the surface of the cooking plate is controlled only by turning ON / OFF the heater, the temperature drop on the surface of the cooking plate when the food is placed on the cooking plate is minimized. In order to set the limit, as shown in FIG. 7, there is a problem that it is necessary to use a heater that consumes a large amount of power, or to set the set temperature in advance to be high.

【0005】本発明は、前記従来の問題点を解消すべく
なされたものであって、調理板に調理物を置いて調理板
表面の温度が低下した場合には高消費電力になって速や
かに昇温し、所定の温度まで昇温した場合には低消費電
力となる加熱調理器を提供することを目的とする。
The present invention has been made to solve the above-mentioned conventional problems, and when the food is placed on the cooking plate and the temperature of the surface of the cooking plate is lowered, the power consumption becomes high and the speed is promptly increased. An object of the present invention is to provide a heating cooker that consumes low power when the temperature is raised to a predetermined temperature.

【0006】[0006]

【課題を解決するための手段】本発明は以下の構成によ
り前記課題を解決するものである。すなわち、本発明の
加熱調理器は、絶縁性基板と、該基板上に形成された導
電性皮膜と、該導電性皮膜に電力を供給する電極とを備
えた加熱調理器において、前記導電性皮膜は、少なくと
もポリイミド樹脂からなるバインダーと、粒径が1〜2
0μmである金属粉末とを1:1〜1:6の配合比率
(重量比)で含有し、かつ、前記導電性皮膜はPTC特
性(正の温度特性)を有することを特徴とする。
The present invention solves the above problems by the following constitutions. That is, the heating cooker of the present invention is a heating cooker provided with an insulating substrate, a conductive film formed on the substrate, and electrodes for supplying electric power to the conductive film. Is a binder composed of at least a polyimide resin and has a particle size of 1 to 2
It is characterized in that it contains 0 μm of metal powder at a compounding ratio (weight ratio) of 1: 1 to 1: 6, and that the conductive film has PTC characteristics (positive temperature characteristics).

【0007】また、本発明の加熱調理器は、絶縁性基板
と、該基板上に形成された導電性皮膜と、該導電性皮膜
に電力を供給する電極とを備えた加熱調理器において、
前記導電性皮膜は、少なくともポリイミド樹脂からなる
バインダーと、粒径が1〜20μmである珪化物とを
1:1〜1:6の配合比率(重量比)で含有し、かつ、
前記導電性皮膜はPTC特性(正の温度特性)を有する
ことを特徴とする。
Further, the heating cooker of the present invention is a heating cooker provided with an insulating substrate, a conductive film formed on the substrate, and an electrode for supplying electric power to the conductive film.
The conductive film contains at least a binder made of a polyimide resin and a silicide having a particle size of 1 to 20 μm in a mixing ratio (weight ratio) of 1: 1 to 1: 6, and
The conductive film has a PTC characteristic (positive temperature characteristic).

【0008】以下、本発明の内容を詳細に説明する。耐
熱性樹脂であるポリイミド樹脂から少なくともなるバイ
ンダーと、導電材として粒径1〜20μmの金属粉末又
は珪化物とを、一定の配合比率で混合分散して得られた
導電コーティング材を、絶縁性基板上にコーティングし
て導電性皮膜を形成し、そしてこの導電性皮膜の両端に
電極を設けることにより加熱調理器が得られる。
The contents of the present invention will be described in detail below. A conductive coating material obtained by mixing and dispersing a binder made of at least a polyimide resin, which is a heat-resistant resin, and a metal powder or a silicide having a particle size of 1 to 20 μm as a conductive material in a fixed mixing ratio is used as an insulating substrate. A heating cooker is obtained by forming a conductive film by coating the above and providing electrodes at both ends of the conductive film.

【0009】この加熱調理器は、通電により温度が上が
るにつれて抵抗が上がるPTC特性(正の温度特性)を
示し、一定の電圧をかけておくことにより低温時には高
消費電力になって速やかに昇温し、高温時には低消費電
力となる。したがって、図7に示すように、低温時のヒ
ータ出力が上がるので、予め設定温度を従来の場合より
も高くしておく必要がなく、設定温度まで速やかに昇温
する。
This cooking device exhibits a PTC characteristic (positive temperature characteristic) in which the resistance increases as the temperature rises due to energization, and by applying a constant voltage, high power consumption is achieved at low temperatures and the temperature rises rapidly. However, it consumes low power at high temperatures. Therefore, as shown in FIG. 7, since the heater output at low temperatures increases, it is not necessary to set the preset temperature higher than in the conventional case, and the preset temperature is quickly raised.

【0010】本発明で用いられる絶縁性基板は、絶縁性
のセラミックプレート、又はアルミ、鉄等の金属表面を
絶縁処理したものであってもよい。また、絶縁基板上に
設けられる電極は、ニッケル、アルミニウム等の金属を
溶射したもの、或いは銀ペースト等の金属を含んだペー
ストを塗布、焼き付けしたものであり、該電極は導電性
皮膜を絶縁基板上に形成した後に設けても構わないが、
予め設けておいてもよい。
The insulative substrate used in the present invention may be an insulative ceramic plate or a metal surface of aluminum, iron or the like which has been subjected to an insulation treatment. Further, the electrodes provided on the insulating substrate are those obtained by spraying a metal such as nickel and aluminum, or those obtained by applying and baking a paste containing a metal such as a silver paste, and the electrodes have a conductive film with an insulating substrate. It may be provided after forming on top,
It may be provided in advance.

【0011】本発明の導電性皮膜の構成成分であるバイ
ンダーとしては、ポリイミド樹脂単独でもよいが、他の
樹脂と混合して調製してもよい。例えば、エポキシ樹
脂、シリコーン樹脂、ポリエステル樹脂等は、ポリイミ
ド樹脂と併用することができる。しかしながら、耐熱性
の点から、ポリイミド樹脂単独或いは主成分とするのが
好ましい。また、導電性皮膜は、スクリーン印刷、スプ
レー塗装、ハケ塗り等のコーティング法により絶縁性基
板上に膜厚が均一となるようにコーティングされ、その
後、焼き付けが行われて形成される。なお、コーティン
グ方法は、樹脂濃度により前記方法から適宜選択され
る。
The binder, which is a constituent of the conductive film of the present invention, may be a polyimide resin alone, or may be prepared by mixing it with another resin. For example, epoxy resin, silicone resin, polyester resin and the like can be used in combination with the polyimide resin. However, from the viewpoint of heat resistance, it is preferable to use the polyimide resin alone or as the main component. The conductive film is formed by coating the insulating substrate with a uniform film thickness by a coating method such as screen printing, spray coating, brush coating, and then baking. The coating method is appropriately selected from the above methods depending on the resin concentration.

【0012】本発明で用いられる金属粉末は、導電性が
あればいかなるものでもよく、例えば、ニッケル、銀、
パラジウム等がある。一方、本発明で用いられる珪化物
も導電性があればいかなるものでもよく、例えば、珪化
クロム、珪化モリブデン、珪化タングステン、珪化バナ
ジウム、珪化チタン等が挙げられる。また、導電性皮膜
が含有する導電材の粒径は1〜20μmの範囲にあるの
が望ましい。粒径が1μm未満の導電材は、物理的に粉
砕して製造するのが困難であり、他の方法で製造したと
しても非常にコストが高くなり、実用的ではない。一
方、粒径が20μmを超えると、導電性皮膜の膜厚との
関係もあるが、数十ミクロンオーダーの膜厚では抵抗が
無限大になることがあり、実用に適さない。
The metal powder used in the present invention may be any one as long as it has conductivity, such as nickel, silver,
Palladium, etc. On the other hand, the silicide used in the present invention may be any one as long as it has conductivity, and examples thereof include chromium silicide, molybdenum silicide, tungsten silicide, vanadium silicide, titanium silicide and the like. The particle size of the conductive material contained in the conductive film is preferably in the range of 1 to 20 μm. A conductive material having a particle size of less than 1 μm is difficult to physically pulverize and is manufactured, and even if it is manufactured by another method, the cost is very high and it is not practical. On the other hand, if the particle size exceeds 20 μm, it may be related to the film thickness of the conductive film, but if the film thickness is on the order of several tens of microns, the resistance may become infinite, which is not suitable for practical use.

【0013】また、導電性皮膜を構成するバインダーと
導電材(金属粉末、珪化物)との配合比率(重量比)
は、1:1〜1:6(バインダー:導電材)の範囲にあ
るのが望ましい。すなわち、1:1(バインダー:導電
材)よりバインダーの比率が大きくなると、皮膜の抵抗
が不安定になり、混合分散の状態によっては抵抗が無限
大になることがあるため、実用に適さない。一方、1:
6(バインダー:導電材)より導電材の比率を増やす
と、バインダーの比率が減って、皮膜の密着力がなくな
り、実用に適さなくなる。
Further, the compounding ratio (weight ratio) of the binder constituting the conductive film and the conductive material (metal powder, silicide).
Is preferably in the range of 1: 1 to 1: 6 (binder: conductive material). That is, when the ratio of the binder is larger than 1: 1 (binder: conductive material), the resistance of the film becomes unstable, and the resistance may become infinite depending on the mixed dispersion state, which is not suitable for practical use. On the other hand, 1:
When the ratio of the conductive material is increased from 6 (binder: conductive material), the ratio of the binder is decreased and the adhesion of the film is lost, which is not suitable for practical use.

【0014】上記導電性皮膜に、さらに平均粒径が10
μm以下である絶縁性充填材を含有せしめると、導電性
皮膜の抵抗値が上がり、抵抗値の設定が容易になるの
で、好ましい。絶縁性充填材としては、例えばフッ素樹
脂、マイカ、アルミナ、シリカ等が挙げられる。また、
絶縁性充填材の平均粒径を10μm以下としたのは、導
電材の粒径とほぼ同等あるいはそれ以下とすることによ
り、混合物の安定な分散状態が得られ、抵抗値を精度良
く調製することができるからである。
The conductive film has an average particle size of 10
The inclusion of an insulating filler having a thickness of μm or less is preferable because the resistance value of the conductive film is increased and the resistance value is easily set. Examples of the insulating filler include fluororesin, mica, alumina, silica and the like. Also,
The average particle size of the insulating filler is set to 10 μm or less so that a stable dispersion state of the mixture can be obtained and the resistance value can be accurately adjusted by setting the particle size to be equal to or smaller than the particle size of the conductive material. Because you can

【0015】また、絶縁性基板と導電性皮膜との間に、
ポリイミド樹脂を含む中間層を設けると、絶縁性基板と
導電性皮膜の熱応力を緩和するので、望ましい。上記中
間層は、ポリイミド樹脂単独でもよいが、他の樹脂と混
合して調製してもよい。例えば、エポキシ樹脂、シリコ
ーン樹脂、ポリエステル樹脂等は、ポリイミド樹脂と併
用することができる。なお、中間層に用いられる樹脂成
分は、熱膨張率、密着性との関係から、導電性皮膜を構
成する樹脂成分と同じものが好ましい。また、中間層
は、上記導電性皮膜と同様な方法により形成される。
Further, between the insulating substrate and the conductive film,
Providing an intermediate layer containing a polyimide resin is preferable because it alleviates thermal stress on the insulating substrate and the conductive film. The intermediate layer may be a polyimide resin alone or may be prepared by mixing with another resin. For example, epoxy resin, silicone resin, polyester resin and the like can be used in combination with the polyimide resin. The resin component used for the intermediate layer is preferably the same as the resin component constituting the conductive film in terms of the coefficient of thermal expansion and the adhesiveness. Further, the intermediate layer is formed by the same method as the above-mentioned conductive film.

【0016】さらに、上記導電性皮膜上に、ポリイミド
樹脂を含む表面保護層を設けると、空気中の酸素や水分
による導電材の酸化を防ぐので、好ましい。この表面保
護層は、導電性皮膜上にポリイミド樹脂を含むバインダ
ーをコーティングするか、又はポリイミド樹脂を含むフ
ィルムを導電性皮膜上に接着することによって形成され
る。上記表面保護層は、ポリイミド樹脂単独でもよい
が、他の樹脂と混合して調製してもよい。例えば、エポ
キシ樹脂、シリコーン樹脂、ポリエステル樹脂等は、ポ
リイミド樹脂と併用することができる。なお、表面保護
層に用いられる樹脂成分は、熱膨張率、密着性との関係
から、導電性皮膜を構成する樹脂成分と同じものが好ま
しい。また、表面保護層は、上記導電性皮膜と同様な方
法により形成される。
Further, it is preferable to provide a surface protective layer containing a polyimide resin on the conductive film, because the conductive material is prevented from being oxidized by oxygen or moisture in the air. The surface protective layer is formed by coating the conductive film with a binder containing a polyimide resin or by adhering a film containing the polyimide resin on the conductive film. The surface protective layer may be a polyimide resin alone, or may be prepared by mixing with another resin. For example, epoxy resin, silicone resin, polyester resin and the like can be used in combination with the polyimide resin. The resin component used for the surface protective layer is preferably the same as the resin component constituting the conductive film in terms of the coefficient of thermal expansion and the adhesiveness. The surface protective layer is formed by the same method as the above-mentioned conductive film.

【0017】[0017]

【作用】本発明の加熱調理器によれば、絶縁性基板上に
形成された導電性皮膜は、少なくともポリイミド樹脂か
らなるバインダーと、粒径が1〜20μmである金属粉
末又は珪化物とを1:1〜1:6の配合比率(重量比)
で含有しているので、上記導電性皮膜はPTC特性(正
の温度特性)を呈し、調理面表面に調理物が置かれて表
面温度が低下しても、高消費電力となって速やかに昇温
し、設定温度になると低消費電力となる(図7参照)。
According to the cooking device of the present invention, the conductive film formed on the insulating substrate comprises a binder made of at least a polyimide resin and a metal powder or a silicide having a particle size of 1 to 20 μm. : Mixing ratio (weight ratio) of 1 to 1: 6
Since the above-mentioned conductive film contains PTC characteristics (positive temperature characteristics), even if food is placed on the surface of the cooking surface and the surface temperature drops, the power consumption will be high and the temperature will rise rapidly. When the temperature rises to the set temperature, the power consumption becomes low (see FIG. 7).

【0018】上記導電性皮膜に、平均粒径が10μm以
下である絶縁性充填材を含有せしめると、導電性皮膜の
抵抗値が上がり、発熱皮膜の抵抗値設定が容易となる。
さらに、上記絶縁性充填材の粒径を導電材の粒径とほぼ
同等あるいはそれ以下とすることで、混合物の分散状態
が安定する。
When the conductive film contains an insulating filler having an average particle size of 10 μm or less, the resistance value of the conductive film is increased and the resistance value of the heat generating film is easily set.
Furthermore, by setting the particle size of the insulating filler to be substantially equal to or smaller than the particle size of the conductive material, the dispersed state of the mixture is stabilized.

【0019】また、上記絶縁性基板と上記導電性皮膜と
の間に、ポリイミド樹脂を含む中間層を設けることによ
り、ポリイミド樹脂がある程度可とう性を有しているた
めに、前記中間層は発熱皮膜と基板との熱膨張率の違い
によって発生する熱歪みを緩和する働きがある。
By providing an intermediate layer containing a polyimide resin between the insulating substrate and the conductive film, the polyimide resin has flexibility to some extent, so that the intermediate layer generates heat. It has a function of alleviating thermal strain caused by the difference in thermal expansion coefficient between the coating and the substrate.

【0020】さらに、上記導電性皮膜上に、ポリイミド
樹脂を含む表面保護層を設けることで、水分、空気中の
酸素による導電材の酸化が防止される。
Further, by providing a surface protective layer containing a polyimide resin on the conductive film, oxidation of the conductive material due to moisture and oxygen in the air can be prevented.

【0021】[0021]

【実施例】次に、実施例により本発明をさらに詳細に説
明するが、本発明はこれらの実施例によって何ら限定さ
れるものではない。 実施例1 ポリイミド樹脂(東レ社製、耐熱性絶縁ワニス”トレニ
ース#3000”)、粒径が1〜20μmのニッケル粉
末及び溶剤n−メチルー2ーピロリドンを4:2:1
(重量比)の割合で混合し、得られた混合物を絶縁性基
板上にスクリーン印刷法により均一な膜厚となるように
コーティングした。次に、このコーティング膜を100
℃×30min.、150℃×30min.、250℃
×30min.及び350℃×30min.の熱処理を
行い、導電性皮膜を形成した。
EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Example 1 Polyimide resin (heat resistant insulating varnish “Trenis # 3000” manufactured by Toray Industries, Inc.), nickel powder having a particle size of 1 to 20 μm, and solvent n-methyl-2-pyrrolidone 4: 2: 1.
The mixture was mixed at a ratio of (weight ratio), and the obtained mixture was coated on an insulating substrate by a screen printing method so as to have a uniform film thickness. Next, this coating film is coated with 100
° C x 30 min. , 150 ° C. × 30 min. , 250 ℃
× 30 min. And 350 ° C. × 30 min. Was heat-treated to form a conductive film.

【0022】このようにして得られた導電性皮膜を応用
した加熱調理器を図1及び図2に示す。図1は、本発明
の加熱調理器にかかる一実施例を示す概略断面図であ
り、図2は、図1の加熱調理器の外観斜視図である。図
1及び図2に示すように、本発明の加熱調理器10は、
平面状の絶縁性基板3の両端に一対の電極2が形成され
ており、その電極2間に導電材とバインダーを含んだ導
電性皮膜1が形成されている。
A heating cooker to which the conductive film thus obtained is applied is shown in FIGS. 1 and 2. FIG. 1 is a schematic sectional view showing an embodiment of the heating cooker of the present invention, and FIG. 2 is an external perspective view of the heating cooker of FIG. As shown in FIGS. 1 and 2, the heating cooker 10 of the present invention is
A pair of electrodes 2 are formed on both ends of a planar insulating substrate 3, and a conductive film 1 containing a conductive material and a binder is formed between the electrodes 2.

【0023】前記条件で形成された導電性皮膜の面抵抗
は、常温時で0.13Ω/□であり、1.3W/cm2
の通電条件で225℃まで昇温させた時で0.31Ω/
□であった。すなわち、昇温時の面抵抗は、常温時の約
2.4倍になっており、温度が上がれば抵抗値もあがる
というPTC特性を示した(図6参照)。したがって、
発熱の立ち上がり速度が速く、皮膜表面温度が低下した
場合には、消費電力の増加が大きくなるという特性を有
した加熱調理器が得られた。なお、導電材としてニッケ
ルを用いて調製した導電性皮膜の面抵抗は、相対的に小
さいが、図1に示すような面全体に発熱体を塗布して両
端に電極を設ける構造とせずに、電極構造を変えたり、
発熱皮膜をパターン状にすることにより、上記問題は解
消される。
The sheet resistance of the conductive film formed under the above conditions is 0.13 Ω / □ at room temperature and 1.3 W / cm 2.
0.31Ω / when heated up to 225 ℃ under
It was □. That is, the sheet resistance at the time of temperature increase was about 2.4 times that at room temperature, and the PTC characteristic showed that the resistance value increased as the temperature increased (see FIG. 6). Therefore,
A heating cooker having a characteristic that the power consumption increases largely when the rising rate of heat generation is high and the film surface temperature is lowered was obtained. The surface resistance of the conductive film prepared by using nickel as the conductive material is relatively small, but without applying a heating element to the entire surface and providing electrodes at both ends as shown in FIG. Change the electrode structure,
The above problem is solved by forming the heating film in a pattern.

【0024】実施例2 導電材に珪化クロムを使用した以外は、実施例1と同様
な条件で導電性皮膜を形成した。得られた導電性皮膜の
面抵抗は、常温時で43Ω/□であり、1.3W/cm
2の通電条件で245℃まで昇温させた時で51Ω/□
であった。すなわち、昇温時の面抵抗は、常温時の約
1.2倍になっており、温度が上がれば抵抗値もあがる
というPTC特性を示した(図6参照)。本実施例で得
られた皮膜の初期抵抗は、相対的に高く、PTC特性の
傾向(通電時の抵抗/常温時の抵抗)が小さいので、突
入電流が小さく温度低下時の消費電力の増加が少ないと
いう特性を有した加熱調理器が得られた。ただし、従来
のニッケル、クロムのヒータ線と比較すると、低温時に
は高消費電力、高温時には低消費電力となっている。
Example 2 A conductive film was formed under the same conditions as in Example 1 except that chromium silicide was used as the conductive material. The sheet resistance of the obtained conductive film is 43 Ω / □ at room temperature, 1.3 W / cm
51 Ω / □ when the temperature is raised to 245 ° C under the energization condition of 2
Met. That is, the sheet resistance at the time of temperature rise was about 1.2 times that at room temperature, and the PTC characteristic showed that the resistance value increased as the temperature rose (see FIG. 6). Since the initial resistance of the film obtained in this example is relatively high and the tendency of PTC characteristics (resistance at energization / resistance at room temperature) is small, the rush current is small and the power consumption increases when the temperature drops. A cooker was obtained with the property of being low. However, compared to the conventional nickel and chromium heater wires, the power consumption is high at low temperatures and low at high temperatures.

【0025】実施例3 導電材量の30%のフッ素樹脂(ポリテトラフルオロエ
チレン製、平均粒径5μm)を絶縁性充填材として導電
性皮膜中に加えたこと以外は、実施例1と同様な条件で
導電性皮膜を形成した。得られた導電性皮膜の概略断面
図を図3に示す。図3において、4は導電材、5は絶縁
性充填材、そして6はバインダーである。ニッケルとフ
ッ素樹脂との組み合わせにより調製した導電性皮膜の常
温時における面抵抗は、0.22Ω/□であり、実施例
1のものに比して約1.7倍となった。以上の結果よ
り、絶縁性充填材を導電性皮膜中に混入することで、皮
膜の初期抵抗値が上昇することが判明した。
Example 3 The same as Example 1 except that a fluororesin (made of polytetrafluoroethylene, having an average particle size of 5 μm) containing 30% of the amount of the conductive material was added to the conductive film as an insulating filler. A conductive film was formed under the conditions. A schematic sectional view of the obtained conductive film is shown in FIG. In FIG. 3, 4 is a conductive material, 5 is an insulating filler, and 6 is a binder. The sheet resistance of the conductive film prepared by combining nickel and fluororesin at room temperature was 0.22 Ω / □, which was about 1.7 times that of Example 1. From the above results, it was found that the initial resistance value of the film is increased by mixing the insulating filler into the conductive film.

【0026】実施例4 導電材量の30%のフッ素樹脂(ポリテトラフルオロエ
チレン製、平均粒径5μm)を絶縁性充填材として導電
性皮膜中に加えたこと以外は、実施例2と同様な条件で
導電性皮膜を形成した。珪化クロムとフッ素樹脂との組
み合わせにより調製した導電性皮膜の常温時における面
抵抗は、72Ω/□であり、実施例2のものに比して約
1.7倍となった。以上の結果より、絶縁性充填材を導
電性皮膜中に混入することで、皮膜の初期抵抗値が上昇
することが判明した。
Example 4 The same as Example 2 except that a fluororesin (made of polytetrafluoroethylene, having an average particle size of 5 μm) in an amount of 30% of the conductive material was added as an insulating filler in the conductive film. A conductive film was formed under the conditions. The surface resistance of the conductive film prepared by combining chromium silicide and fluororesin at room temperature was 72 Ω / □, which was about 1.7 times that of Example 2. From the above results, it was found that the initial resistance value of the film is increased by mixing the insulating filler into the conductive film.

【0027】実施例5 導電材量の10%又は30%のマイカ(トピー工業製マ
イカ”ダイモリーフF”、平均粒径10μm)を絶縁性
充填材として導電性皮膜中に加えたこと以外は、実施例
1と同様な条件で導電性皮膜を形成した。ニッケルとマ
イカとの組み合わせにより調製した導電性皮膜の常温時
における面抵抗は、10%の場合は0.2Ω/□、30
%の場合は5.2Ω/□となり、実施例1のものに比し
てそれぞれ1.5倍、40倍となった。以上の結果よ
り、絶縁性充填材を導電性皮膜中に混入することで、皮
膜の初期抵抗値が上昇することが判明した。
Example 5 Mica was used except that 10% or 30% of the amount of the conductive material (mica "Dymo Leaf F" manufactured by Topy Industries, average particle size 10 μm) was added to the conductive film as an insulating filler. A conductive film was formed under the same conditions as in Example 1. The sheet resistance of the conductive film prepared by the combination of nickel and mica at room temperature is 0.2Ω / □, 30 when it is 10%.
In the case of%, the value was 5.2Ω / □, which was 1.5 times and 40 times that of Example 1, respectively. From the above results, it was found that the initial resistance value of the film is increased by mixing the insulating filler into the conductive film.

【0028】実施例6 本実施例の加熱調理器は、図4に示すように、絶縁性基
板3と導電性皮膜1との間にバインダーからなる中間層
7が介在したものである。該中間層は以下のようにして
形成された。ポリイミド樹脂(東レ社製、耐熱性絶縁ワ
ニス”トレニース#3000”)と溶剤n−メチルー2
ーピロリドンを1:1.5(重量比)の割合で混合し、
得られた混合物を絶縁性基板上にスプレーコーティング
法により均一な膜厚となるようにコーティングした。次
に、このコーティング膜を100℃×30min.、1
50℃×30min.、250℃×30min.及び3
50℃×30min.の熱処理を行い、中間層を形成し
た。この中間層上に設けられる導電性皮膜は実施例1と
同様な条件で調製された。
Example 6 As shown in FIG. 4, the heating cooker of this example has an intermediate layer 7 made of a binder interposed between an insulating substrate 3 and a conductive film 1. The intermediate layer was formed as follows. Polyimide resin (Toray, heat-resistant insulating varnish "Treney # 3000") and solvent n-methyl-2
-Pyrrolidone was mixed in a ratio of 1: 1.5 (weight ratio),
The obtained mixture was coated on an insulating substrate by a spray coating method so as to have a uniform film thickness. Next, this coating film was formed at 100 ° C. for 30 min. 1
50 ° C. × 30 min. , 250 ° C. × 30 min. And 3
50 ° C. × 30 min. Was heat-treated to form an intermediate layer. The conductive film provided on this intermediate layer was prepared under the same conditions as in Example 1.

【0029】中間層を設けたものと中間層を設けていな
いものの通電試験(30分間、ON−OFFのサイクル
試験20回)を行った結果、中間層を設けたものの抵抗
値は初期の抵抗に比して1.01倍であったが、中間層
を設けていないものの抵抗値は初期の抵抗に比して1.
11倍になった。この結果より、中間層を形成すると導
電性皮膜の抵抗の安定化が図られることが明らかになっ
た。
As a result of conducting an energization test (30 minutes, ON-OFF cycle test 20 times) of the one with the intermediate layer and the one without the intermediate layer, the resistance value of the one with the intermediate layer was the initial resistance. Although it was 1.01 times that of the initial resistance, the resistance value was 1.
It has increased 11 times. From this result, it became clear that the resistance of the conductive film is stabilized by forming the intermediate layer.

【0030】実施例7 本実施例の加熱調理器は、図5に示すように、絶縁性基
板3上に形成された導電性皮膜1の表面上にバインダー
からなる表面保護層8が設けられたものである。該表面
保護層は以下のようにして形成された。ポリイミド樹脂
(東レ社製、耐熱性絶縁ワニス”トレニース#300
0”)と溶剤n−メチルー2ーピロリドンを2:1(重
量比)の割合で混合し、得られた混合物を導電性皮膜上
にスクリーン印刷法により均一な膜厚となるようにコー
ティングした。次に、このコーティング膜を100℃×
30min.、150℃×30min.、250℃×3
0min.及び350℃×30min.の熱処理を行
い、表面保護層を形成した。なお、この表面保護層下に
設けられる導電性皮膜は実施例1と同様な条件で調製さ
れた。
Example 7 In the heating cooker of this example, as shown in FIG. 5, a surface protective layer 8 made of a binder was provided on the surface of the conductive film 1 formed on the insulating substrate 3. It is a thing. The surface protective layer was formed as follows. Polyimide resin (Toray, heat-resistant insulating varnish "Treney # 300"
0 ″) and the solvent n-methyl-2-pyrrolidone at a ratio of 2: 1 (weight ratio), and the resulting mixture was coated on the conductive film by a screen printing method so as to have a uniform film thickness. Then, apply this coating film at 100 ℃
30 min. , 150 ° C. × 30 min. , 250 ° C x 3
0 min. And 350 ° C. × 30 min. Was heat-treated to form a surface protective layer. The conductive film provided under the surface protective layer was prepared under the same conditions as in Example 1.

【0031】表面保護層を設けたものと表面保護層を設
けていないものとを300℃で水中サーモショックテス
トにかけた。試験後、表面保護層を設けたものの抵抗変
化が1%であったが、表面保護層を設けていないものの
抵抗変化が5.3%であった。この結果より、表面保護
層を設けることで、導電材の酸化劣化を防止することが
できるということが判明した。
The one with a surface protective layer and the one without a surface protective layer were subjected to a thermoshock test in water at 300 ° C. After the test, the resistance change was 1% when the surface protective layer was provided, but the resistance change was 5.3% when the surface protective layer was not provided. From this result, it was found that the oxidation protection of the conductive material can be prevented by providing the surface protective layer.

【0032】[0032]

【発明の効果】本発明の加熱調理器によれば、絶縁性基
板上に形成された導電性皮膜は、少なくともポリイミド
樹脂からなるバインダーと、粒径が1〜20μmである
金属粉末又は珪化物とを1:1〜1:6の配合比率(重
量比)で含有しているので、上記導電性皮膜はPTC特
性(正の温度特性)を呈し、低温時にヒータ出力が上昇
するため、設定温度を所望の温度より予め高くする必要
がなく、設定温度まで速やかに昇温することができる。
According to the cooking device of the present invention, the conductive film formed on the insulating substrate is composed of at least a binder made of a polyimide resin and a metal powder or a silicide having a particle size of 1 to 20 μm. Since the conductive film contains PTC in a mixing ratio (weight ratio) of 1: 1-1: 6, the conductive film exhibits PTC characteristics (positive temperature characteristics), and the heater output increases at low temperatures. It is not necessary to make the temperature higher than the desired temperature in advance, and the temperature can be quickly raised to the set temperature.

【0033】上記導電性皮膜に、平均粒径が10μm以
下である絶縁性充填材を含有せしめることにより、導電
性皮膜の抵抗値が上がり、発熱皮膜の抵抗値設定が容易
となるので、消費電力量の調整、皮膜形状の設計が任意
に行えるようになり、あらゆる容量、形状の加熱調理器
を提供することができる。さらに、上記絶縁性充填材の
粒径を導電材の粒径とほぼ同等あるいはそれ以下とする
ことで、安定した分散状態の混合物が得られ、抵抗値を
精度良く調整することができる。
By including an insulating filler having an average particle size of 10 μm or less in the above-mentioned conductive film, the resistance value of the conductive film is increased and the resistance value of the heat-generating film is easily set, so that the power consumption is reduced. Since the amount can be adjusted and the film shape can be designed arbitrarily, a heating cooker of any capacity and shape can be provided. Further, by setting the particle size of the insulating filler to be substantially equal to or smaller than the particle size of the conductive material, a stable dispersed mixture can be obtained, and the resistance value can be adjusted accurately.

【0034】また、上記絶縁性基板と上記導電性皮膜と
の間に、ポリイミド樹脂を含む中間層を設けることによ
り、ポリイミド樹脂がある程度可とう性を有しているた
めに、前記中間層は発熱皮膜と基板との熱膨張率の違い
によって発生する熱歪みを緩和する機能を具備し、この
結果、クラックの発生が抑制されて発熱皮膜の安定性の
向上が図られる。
By providing an intermediate layer containing a polyimide resin between the insulating substrate and the conductive film, the polyimide resin has flexibility to some extent, so that the intermediate layer generates heat. It has a function of alleviating thermal strain caused by the difference in the coefficient of thermal expansion between the coating and the substrate, and as a result, the generation of cracks is suppressed and the stability of the heating coating is improved.

【0035】さらに、上記導電性皮膜上に、ポリイミド
樹脂を含む表面保護層を設けることにより、水分、空気
中の酸素による導電材の酸化が防止され、発熱皮膜の抵
抗値の安定化が図られ、耐久性のある発熱体を提供する
ことができる。
Further, by providing a surface protective layer containing a polyimide resin on the conductive film, oxidation of the conductive material due to moisture and oxygen in the air is prevented, and the resistance value of the heat generating film is stabilized. It is possible to provide a durable heating element.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の加熱調理器にかかる一実施例を示す概
略断面図である。
FIG. 1 is a schematic cross-sectional view showing an embodiment of a heating cooker according to the present invention.

【図2】図1の加熱調理器の概略底面図である。2 is a schematic bottom view of the heating cooker of FIG. 1. FIG.

【図3】絶縁性充填材を含有して導電性皮膜の要部断面
図である。
FIG. 3 is a cross-sectional view of an essential part of a conductive film containing an insulating filler.

【図4】中間層を設けた本発明の加熱調理器にかかる一
実施例を示す概略断面図である。
FIG. 4 is a schematic cross-sectional view showing one embodiment of the heating cooker of the present invention provided with an intermediate layer.

【図5】表面保護層を設けた本発明の加熱調理器にかか
る一実施例を示す概略断面図である。
FIG. 5 is a schematic cross-sectional view showing an embodiment of the heating cooker of the present invention provided with a surface protective layer.

【図6】本発明の発熱皮膜の抵抗温度特性を示す図であ
る。
FIG. 6 is a diagram showing resistance-temperature characteristics of the heating film of the present invention.

【図7】本発明品と従来品との温度特性等の比較を示す
図である。
FIG. 7 is a diagram showing a comparison of temperature characteristics and the like between the product of the present invention and the conventional product.

【符号の説明】[Explanation of symbols]

1 導電性皮膜 2 電極 3 絶縁性基板 4 導電材 5 絶縁性充填材 6 バインダー 7 中間層 8 表面保護層 10 加熱調理器 1 Conductive Film 2 Electrode 3 Insulating Substrate 4 Conductive Material 5 Insulating Filler 6 Binder 7 Intermediate Layer 8 Surface Protective Layer 10 Heating Cooker

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性基板と、該基板上に形成された導
電性皮膜と、該導電性皮膜に電力を供給する電極とを備
えた加熱調理器において、前記導電性皮膜は、少なくと
もポリイミド樹脂からなるバインダーと、粒径が1〜2
0μmである金属粉末とを1:1〜1:6の配合比率
(重量比)で含有し、かつ、前記導電性皮膜はPTC特
性(正の温度特性)を有することを特徴とする加熱調理
器。
1. A heating cooker comprising an insulating substrate, a conductive film formed on the substrate, and electrodes for supplying electric power to the conductive film, wherein the conductive film is at least a polyimide resin. And a particle size of 1-2
A cooker characterized by containing 0 μm of metal powder in a compounding ratio (weight ratio) of 1: 1 to 1: 6, and the conductive film has PTC characteristics (positive temperature characteristics). .
【請求項2】 絶縁性基板と、該基板上に形成された導
電性皮膜と、該導電性皮膜に電力を供給する電極とを備
えた加熱調理器において、前記導電性皮膜は、少なくと
もポリイミド樹脂からなるバインダーと、粒径が1〜2
0μmである珪化物とを1:1〜1:6の配合比率(重
量比)で含有し、かつ、前記導電性皮膜はPTC特性
(正の温度特性)を有することを特徴とする加熱調理
器。
2. A heating cooker comprising an insulating substrate, a conductive film formed on the substrate, and electrodes for supplying electric power to the conductive film, wherein the conductive film is at least a polyimide resin. And a particle size of 1-2
A cooker characterized by containing a silicide of 0 μm in a compounding ratio (weight ratio) of 1: 1 to 1: 6, and the conductive film has PTC characteristics (positive temperature characteristics). .
【請求項3】 前記導電性皮膜は、さらに平均粒径が1
0μm以下である絶縁性充填材を含有することを特徴と
する請求項1又は2記載の加熱調理器。
3. The conductive film has an average particle size of 1
The heating cooker according to claim 1 or 2, further comprising an insulating filler having a size of 0 µm or less.
【請求項4】 前記絶縁性基板と前記導電性皮膜との間
に、ポリイミド樹脂を含む中間層が設けられたことを特
徴とする請求項1又は2記載の加熱調理器。
4. The heating cooker according to claim 1, wherein an intermediate layer containing a polyimide resin is provided between the insulating substrate and the conductive film.
【請求項5】 前記導電性皮膜上には、ポリイミド樹脂
を含む表面保護層が設けられたことを特徴とする請求項
1又は2記載の加熱調理器。
5. The heating cooker according to claim 1, wherein a surface protective layer containing a polyimide resin is provided on the conductive film.
JP26859594A 1994-11-01 1994-11-01 Cooker Pending JPH08126580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26859594A JPH08126580A (en) 1994-11-01 1994-11-01 Cooker

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26859594A JPH08126580A (en) 1994-11-01 1994-11-01 Cooker

Publications (1)

Publication Number Publication Date
JPH08126580A true JPH08126580A (en) 1996-05-21

Family

ID=17460720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26859594A Pending JPH08126580A (en) 1994-11-01 1994-11-01 Cooker

Country Status (1)

Country Link
JP (1) JPH08126580A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011078597A3 (en) * 2009-12-23 2011-11-10 Hoammaria Co., Ltd. Electric roast cooking device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011078597A3 (en) * 2009-12-23 2011-11-10 Hoammaria Co., Ltd. Electric roast cooking device

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