JPH08122500A - X-ray image observing apparatus - Google Patents

Abstract

PURPOSE: To easily determine presence or absence of left film s of multiple fine holes by a method wherein a fluorescent X ray which is generated from a specimen by X-ray radiation is divided to form an enlarged X-ray image of the surface of the specimen. CONSTITUTION: A fluorescent X-ray 50 generated by emitting an X ray 21 on a specimen 21 is divided by an optical device 2 and a pin hole plate 3 to be enlarged and focused on a detector 5 by an optical device 4 so that fluorescent X-ray image of the specimen 1 is obtained and is observed by means of an indication device 13 connected thereto. Assuming that the diameter or the length of a side of a fine hole to be observed is 2a and the depth thereof is (d) and an angle which is determined by tan (a/d) is θ, the fluorescent X-ray generated by the X-ray irradiation is observed in a region defined in a range of θ from a central axis of the fine hole. It is thereby possible to easily and quickly judge a left film condition of multiple fine holes based on the X-ray image.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray image observation apparatus by a surface analysis technique suitable for observing fine holes on a wafer surface.

[0002]

2. Description of the Related Art In order to promote high integration of semiconductor elements, it is necessary to establish a fine processing technology at a level of deep sub .mu.m or less. For example, 1 chip of 25
In a 6 Mb DRAM, tens of millions or more of contact holes (fine holes) having a diameter of 0.2 μm are formed. If even one of these fine holes has a conduction failure, it will lead to device failure. Therefore, a measurement technique that finds non-open micropores among a large number of fine holes during the process, that is, It is said that a measurement technique for determining the presence or absence of a residue (residual film) on the bottom surface in a short time is an essential technique.

In order to solve such a problem, we have developed an apparatus for injecting an X-ray or an electron beam into a fine hole to analyze the energy of light or X-ray generated from the residual film on the bottom surface of the fine hole. (Japanese Patent Application No. 4-190148 and Japanese Patent Application No. 4-257789). However, since these devices analyze the residual film for each contact hole, 256 chips with tens of millions or more of micro holes per chip are provided.
To detect non-open micro holes in MbDRAM,
It takes a huge amount of time and control becomes complicated. As a means for eliminating this, an apparatus for observing fluorescent X-rays generated from a sample by X-ray irradiation as an image is disclosed in JP-A-1-239500.

[0004]

SUMMARY OF THE INVENTION In the above-mentioned Japanese Patent Laid-Open No. 1-239500, the magnification of an X-ray objective optical system, which cannot be made high in terms of aberration and volume for improving the resolution of the X-ray microscope, is suppressed. Although the configuration is such that a large number of fluorescent X-ray images that can be finely moved in the xy directions are processed, the fact that the fluorescent X-rays are spectrally imaged is not taken into consideration, and the afterimage elements in a large number of fine holes are fluorescent. X-rays cannot be collectively observed. Therefore, even if a fluorescent X-ray image is used, an image of non-open micropores can be observed from a large number of micropores, but a substance existing in the micropores cannot be specified.

The object of the present invention is to make non-open micropores among a large number of micropores (there is a residual film made of a specific substance inside).
The purpose is to obtain an X-ray observing device for promptly finding out.

[0006]

Means for Solving the Problems The above-mentioned object is to add X to a sample.
If the diameter of the fine holes to be observed in the sample or the length of one side is 2a and the depth is d, tan
When the angle determined by (a / d) is θ, the fluorescent X-rays generated by the X-ray irradiation can be observed in a region defined within a range of θ from the central axis of the micropores. This is achieved by providing a spectroscopic unit, a fluorescent X-ray magnifying and imaging unit, and a two-dimensional detecting unit for magnifying the X-ray image of the sample surface. Alternatively, the fluorescent X-ray magnifying and imaging means, the fluorescent X-ray spectroscopic means, and the sample surface are arranged so that the fluorescent X-rays can be observed in a region defined within a range of θ from the central axis of the micropore. The two-dimensional detection means for magnifying X-ray image is provided, and it is achieved in the preceding stage of the two-dimensional detection means, depending on whether the installation positions of the magnifying image forming means and the spectroscopic means are before or after. The region defined within the range of θ from the central axis of the above is a region defined within the range of 26 degrees from the central axis, or the X-ray irradiation means collects the X-rays. It is achieved by means of irradiating with light or means of irradiating from the direction through which the bottom surface of the fine hole is seen.

Furthermore, the magnifying and imaging means is constituted by an optical system including a reflecting mirror or a zone plate, or the spectroscopic means includes a multilayer film reflecting mirror or a diffraction grating or a zone plate.

Alternatively, the magnified X-ray on the surface of the sample is automatically determined by the addition means for the residual film state of the micropores, and the addition means is a storage device connected to the control device. Can be achieved.

[0009]

When the substance is irradiated with X-rays, fluorescent X-rays are generated.
Since the energy (wavelength) of fluorescent X-rays is unique to the element, by performing the energy analysis of the fluorescent X-rays,
It is possible to identify elements, and thus substances
Further, the amount of the substance can be grasped from the intensity of the fluorescent X-rays generated.

In order to observe fluorescent X-rays from the residual film on the bottom surface of the micropores, the fluorescent X-ray observation method is important. The main residues in the semiconductor device manufacturing process are photoresist and Si oxide film. To identify these, C,
Light elements such as O and Si must be detected. Since the energy of CKα rays and OKα rays generated by X-ray irradiation is small (<1 keV), if there is an obstacle between the generation position of the fluorescent X-rays and the observation means such as the spectroscopic means or the magnifying image forming means. However, it cannot pass through the inside of the obstacle, and fluorescent X-rays cannot be observed.

In FIG. 2 for explaining the X-ray irradiation and the observation direction of the fluorescent X-rays, it is shown that the residual film 23 in the fine holes 22 is irradiated with the X-rays 21 and the fluorescent X-rays 24 and 24 'are generated.
When low-energy (<1 keV) X-rays are used as excitation light, X-rays do not pass through the substance as described above, so X-rays are emitted from directly above the fine holes 22 (that is, from the direction in which the bottom surface of the fine holes can be seen). I have to irradiate. However, in the case of irradiating X-rays having a larger energy, since the X-ray transmitting ability is large, it is possible to irradiate the residual film 23 through the inside of the substance as shown in FIG. The X-ray 21 with which the residual film 23 is irradiated may be condensed to about several hundred μmφ, or may not be condensed as shown in FIG. When the focused X-rays are used, the irradiation X-ray intensity per unit area increases, so that the fluorescent X-rays 24 and 2 are used.
4'observation can be performed with good S / N. Regarding the size of condensed X-rays, the size of the field of view and the S /
It can be changed in consideration of N.

As described above, in order to observe the fluorescent X-rays 24 from the residual film mainly composed of light elements, the observation is performed from the direction where there is no obstacle between the generation position and the observation means. Must be broken. That is, it is necessary to observe the fluorescent X-ray 24 from the area indicated by A in FIG. Here, the angle α is defined as the angle from the central axis of the fine hole to be observed, and is determined by tan α = (a / d) using the diameter 2a and the depth d of the fine hole 22. Taking a contact hole of a DRAM as a typical example of the fine holes, the transition of the angle α is shown in FIG. 3 together with the aspect ratio (2a / d) of the fine holes. 1M which will be the mainstream of future semiconductor devices
For the DRAMs after b, it is necessary to observe the fluorescent X-rays 24 in the region within 26 degrees. Regarding the fluorescent X-ray observing means adopted in the present invention, that is, the spectroscopic means and the magnifying image forming means, some or all of the X-ray spectroscopic elements or the X-ray optical elements included in these means have the above-mentioned angle α. Care is taken to place it within the defined area (ie, within area A of FIG. 2). Here, the spectroscopic means may be, for example, a diffraction grating, an X-ray multilayer film, a zone plate, or the like. Further, as the magnifying image forming means, an X-ray optical element utilizing reflection, diffraction and interference, for example, an optical element combining a plurality of reflecting mirrors represented by an aspherical reflecting mirror, a Walter type reflecting mirror, or a zone plate. A capillary tube or the like is considered.

In the present invention, the fluorescent X-rays having a specific energy are selected by the spectroscopic means from the fluorescent X-rays generated by irradiating the sample such as the wafer with the X-rays and selected by the magnifying image forming means. An enlarged X-ray image of the sample surface with fluorescent X-rays is formed on the detection means. A position-resolved detector having a two-dimensional detection capability is used as the detection means. Specifically, a two-dimensionally detectable microchannel plate (MCP), charge-coupled electrons (CCD), or a combination of a fluorescent plate and a television camera may be used. MC above
In P and CCD, the image formed on the X-ray receiving surface can be electrically and easily read out. Further, in the combination of the fluorescent screen and the television camera, the image on the fluorescent screen can be captured by the television camera. Considering that the size of the fine holes to be observed is approximately 1 μm or less and the spatial resolution of the detection means is approximately 10 μm, the magnification of the magnifying and imaging means must be 10 times or more.
That is, it is necessary to consider that the size of the enlarged micropores on the detection means becomes larger than the spatial resolution value of the detection means. The size of the observable field of view is determined by the effective field of view of the magnifying and imaging means used and the size of the X-ray receiving surface of the detecting means. For example, diameter 20mm
Assuming that 1 μmφ micropores arranged at intervals of 2 μm are observed at a magnification of 20 times using a φ MCP, it is 500 × 500.
= 250,000 micropores can be observed at one time. Even if the fine holes are arranged at larger intervals, or even if the effective field of view of the magnifying image forming means is smaller, 1000 to 1
It can be easily inferred that it is possible to observe about 0000 fine holes.

As described above, according to the present invention, the fluorescent X-rays generated by irradiating the sample with X-rays are spectrally dispersed and imaged to form a residual film state of a large number of fine holes on the surface of the sample. It can be determined easily and quickly.

[0015]

Embodiments of the present invention will now be described with reference to the drawings. 1 is an apparatus configuration diagram showing a first embodiment of an X-ray image observation apparatus according to the present invention, FIG. 2 is a view showing X-ray irradiation of a residual film and an observation direction of generated fluorescent X-rays, and FIG. 4 is the above-mentioned embodiment. 5 is a diagram showing an example of observing micropores according to the present invention, FIG. 5 is a diagram showing another example of observing micropores according to the above-mentioned embodiment, FIG. 6 is an apparatus configuration diagram showing a second embodiment according to the present invention, and FIG. FIG. 8 is a device configuration diagram showing a third embodiment, FIG. 8 is a device configuration diagram showing a fourth embodiment of the present invention,
FIG. 9 is a device configuration diagram showing a fifth embodiment of the present invention.

First Embodiment In FIG. 1 showing a first embodiment of the present invention, an X-ray 21 irradiates a sample 1 having fine holes. The fluorescent X-rays 50 (corresponding to the fluorescent X-rays 24 and 24 'in FIG. 2) generated from the sample 1 by this X-ray irradiation are condensed by the optical element 2, and the sample 1 is placed on the pinhole portion provided on the pinhole plate 3. An X-ray image of the surface is formed. This X-ray image is magnified by the optical element 4 and imaged again on the X-ray receiving surface of the detector 5. Here, as described in detail above, the optical element 2 is installed so that a part or the whole of the optical element 2 is located within the area A shown in FIG. 2 (also in each of the following embodiments. It is assumed that the optical element and the spectroscopic element on which the fluorescent X-ray 50 first enters are installed so that this condition is satisfied). Further, the detector 5 is MCP or CC.
D, or a combination of a fluorescent screen and a television camera may be used. In the present embodiment, at the same time as the image formation by the optical element 2, the fluorescent X-ray 5 is formed using the optical element 2 and the pinhole plate 3.
The zero spectrum is also performed. As such an optical element, for example, a zone plate can be used. The zone plate is an optical element whose focal position differs depending on the energy (wavelength) of X-rays. Therefore, by moving the position of the pinhole plate 3 along the optical axis direction, the energy of the X-rays incident on the optical element 4 can be selected, that is, the fluorescent X-rays 50 can be separated. In order to improve the spectral performance, in addition to the pinhole plate 3, a plate provided with a pinhole or the like can be added if necessary. To move the pinhole plate 3, the moving mechanism 8 connected to the pinhole plate 3 is used.

In this embodiment, a zone plate is also used for the optical element 4. Since the fluorescent X-rays 50 are separated by the optical element 2 and the pinhole plate 3, the optical element 4 and the detector 5 are separated.
The position of must also be adjusted according to the energy of the fluorescent X-rays incident on the optical element 4. The moving mechanisms 7 and 6 are used for this position adjustment.

In order to carry out accurate spectroscopy and image formation, it is necessary to adjust the positions of other optical elements and detectors. In this embodiment, the position adjustment is performed using the moving mechanisms 6-9.
The moving mechanisms 6 to 9 are controlled by the controller 10, and the position can be adjusted by inputting necessary parameters to the control device 12. In addition, X
By inputting the energy value or wavelength of the line, or the element species, etc., the optical elements 2 and 4, the pinhole plate 3, and the detector 5 are installed via the controller 10 at optimum preset positions. The moving mechanisms 6 to 9 can be automatically controlled. Sample 1 with the above device configuration
The fluorescent X-rays 50 generated in the above step are dispersed, and an enlarged X-ray image of the surface of the sample 1 can be formed on the X-ray receiving surface of the detector 5 using the dispersed fluorescent X-rays. This X-ray image is read by the control device 12 via the controller 11 and displayed on the display of the display device 13.

Next, a specific example of the residual film detection in this embodiment will be described. Fine holes were formed in the Si oxide film on the Si substrate. Using this as the sample 1, the optical element 2 and the pinhole plate 3
An enlarged X-ray image of the surface of the sample 1 was formed on the X-ray receiving surface of the detector 5 with the OKα rays dispersed by FIG. 4 shows the X of the surface of the sample 1 displayed on the display of the display device 13.
It is a line image. (A) shows the sample surface in a completely open state,
(B) is an X-ray image showing a sample surface including fine pores in a non-open state. As is clear from the figure, in (a), since no oxide film remains on the bottom surface of the micropores and OKα rays are not emitted, the micropores are all dark. On the other hand, in (b), from the thin residual film (oxide film) to O
Since the Kα rays are generated, the X-ray image of the fine holes is not as dark as shown in (a). In some cases (b)
In some areas, like the point A in the figure, the residual film is thick and is observed as a complete blank.

Another X-ray image shown in FIG. 5 is an X-ray image obtained after resist development for a sample in which a photoresist is coated on the oxide film. In (a), only CKα rays were dispersed to form an X-ray image. As is clear from (a), since the fine holes 15 are dark, there is no residual film, but the fine holes 16 are slightly bright and have a thin residual film. I understand. Formed by spectrally analyzing OKα rays from oxygen atoms contained in the underlying oxide film (b)
In the X-ray image shown in (1), the light-dark relationship is reversed, and the above conclusion can be supported.

According to this embodiment, the fluorescent X-rays generated by irradiating the sample with X-rays can be dispersed to form an enlarged X-ray image of the sample surface. As a result, as shown in FIGS. 4 and 5,
It is possible to easily and quickly determine the residual film state of a large number of fine holes from the X-ray image. Furthermore, since the observation technique uses X-rays, the wafer after observation can be returned to the manufacturing process.

Second Example In the first example, the X-ray 21 was obliquely applied to the sample 1. However, as described above, depending on the energy of the X-ray 21 (<1 KeV), the X-ray 21 may be absorbed by the substance and may not be able to pass through the substance. This embodiment is an example of an embodiment that is effective in such a case, and the schematic configuration of the observation apparatus is shown in FIG. In FIG. 6, X-ray 21
Passes through the spectroscopic element 18 and the optical element 17, and the sample 1
Irradiation is performed from directly above the fine holes provided in the. The fluorescent X-rays 50 generated by this light irradiation are magnified and imaged on the X-ray receiving surface of the detector 5 by the reflection of the optical element 17 and the spectroscopic element 18. The optical element 17 is a reflection type optical element, and is, for example, various aspherical mirrors such as an ellipsoidal mirror or a reflection optical system using a plurality of reflection mirrors represented by a Walter type reflection mirror. The optical element 17 is provided with a space necessary for passing the X-ray 21. A spectroscopic element 18 is arranged in the optical path between the optical element 17 and the detector 5, and it is possible to disperse the fluorescent X-ray 50 using reflection and refraction. As such a spectroscopic element, for example, a multilayer film reflecting mirror or a diffraction grating can be considered. A space necessary for the passage of X-rays 21 is secured for the spectroscopic element 18 as well. In order to secure this space, in FIG. 6, two spectroscopic elements 18 are mounted side by side in parallel on the same rotating mechanism. As described above, the fluorescent X-ray imaging system in this embodiment is an imaging system that takes into consideration reflection and diffraction by the spectroscopic element 18.

In this embodiment, the spectroscopic element 18 is rotated around an axis perpendicular to the plane of the drawing to disperse the fluorescent X-rays 50. However, the rotation of the spectroscopic element 18 also rotates the image forming position of the fluorescent X-rays. The detector 5 also rotates in synchronization with the rotation of the spectroscopic element 18. This rotation is performed by moving the movable table 19 along the guide 20. In FIG. 6, in order to clearly show the essential parts of the present embodiment, the rotating means and moving means of the spectroscopic element 18, the control means of the moving base 19 and the like are omitted.

However, it goes without saying that each of these means is included in the apparatus configuration of this embodiment.

According to this embodiment, since the X-ray 21 can be made incident from directly above the fine holes, fluorescent X-rays can be generated even by using X-rays of small energy. As a result, It is possible to detect the fluorescent X-rays from the light element with good S / N, and it is possible to observe the fine pores in which the photoresist or the like remains with higher accuracy.

Third Embodiment In each of the above-mentioned embodiments, the spectroscopic element is installed in the optical path between the optical element for collecting (imaging) fluorescent X-rays and the detector. However, it is also possible to reverse this order, dispose the spectroscopic element first to disperse the fluorescent X-rays, and then form the imaging system using the optical element. An example of such a case is shown in FIG. 7 as a third example. In Figure 7, X
The fluorescent X-rays 50 generated by the irradiation of the rays 21 are first dispersed by the spectroscopic element 30 and then incident on the X-ray receiving surface of the detector 5 using the optical element 31, and the sample is separated by the spectral X-rays. An enlarged X-ray image of one surface is formed. The spectroscopic element 30 is the same multi-layered film reflection mirror or diffraction grating as that used in the second embodiment. Further, as the optical element 31, in addition to the reflection type optical element, it is also possible to use a diffraction / interference type optical element such as a zone plate. When a diffraction / interference type optical element is used as the optical element 31, fluorescence X
Since the image forming characteristics differ depending on the energy of the line, it is necessary to move the optical element 31 along the optical axis to adjust the image forming state. Although a position adjusting mechanism for this purpose is not shown, it is included in this embodiment. Also in this embodiment, the spectroscopic element 30 rotates because it is necessary to disperse the fluorescent X-rays 50. This means that the emission direction of the fluorescent X-rays differs depending on the energy of the fluorescent X-rays 50 after being dispersed. In order to follow this change in the emission direction, the optical element 31 and the detector 5 are installed on the same movable table 32, and the movable table 32 moves along the guide 20 in synchronization with the rotation of the spectroscopic element 30. Has become. Other parts are the same as in the first or second embodiment. Also in this embodiment, the first
The same effect as that of the embodiment can be obtained.

Fourth Embodiment Although the X-ray 21 was not collected in the above-mentioned respective embodiments,
As described above, when the X-ray 21 is focused and irradiated on the sample,
S / N of the fine holes can be observed well, and an example of such a fourth embodiment is shown in FIG. In FIG. 8, the X-ray 21 from the X-ray source 37
After being reflected by the reflecting mirror 35, it is condensed by the optical element 36 and irradiated on the sample 1. Here, as the reflecting mirror 35, a total reflecting mirror or a multilayer film reflecting mirror can be used. As the optical element 36, a reflection type optical element or a diffractive optical element is used.
An interference type optical element, a cavity tube or the like can be used. The fluorescent X-rays 50 generated by the irradiation of the condensed X-rays are collected by the optical element 31, then are incident on the spectroscopic element 30 and are dispersed, and the surface of the sample 1 is dispersed on the X-ray receiving surface of the detector 5. An enlarged X-ray image is formed. In this embodiment, a transmissive diffraction grating is used as the spectroscopic element 30.
However, it is of course possible to form an image by using the reflection type or diffraction / interference type spectroscopic element as described in the second embodiment. Since it is necessary to finely adjust the positions of the optical element 36 and the reflecting mirror 35 to adjust the condensed state of the X-ray 21 on the surface of the sample 1, the moving mechanisms 32 and 33 are provided.
Is installed. Further, since it is necessary to adjust the positions of the other optical elements 31, the spectroscopic elements 30, and the detector 5,
The moving mechanisms 9, 34, 6 and the like are installed, and the control of each of these movements can be performed by the controller 12 via the controller 10 as in the first embodiment. Other parts are the same as those in the first embodiment.

According to the present embodiment, the X-rays 21 can be focused and applied to the sample 1, so that the observation of the micropores can be performed with good S / N in a short time.

Fifth Embodiment The fifth embodiment of the present invention shown in FIG. 9 is also an example in which the X-ray 21 is focused and irradiated on the sample 1. In this embodiment, the X-ray 2 is used.
1 is condensed by the optical element 44, and the sample 1 is irradiated from an oblique direction. Fluorescent X-ray 5 generated by irradiation of X-ray 21
0 is the optical element 2 and the pinhole plate 3 as in the first embodiment.
And are used to form an X-ray image of the surface of the sample 1 on the pinhole provided in the pinhole plate 3. This X-ray image is magnified in two steps using the optical elements 4 and 39, and an enlarged X-ray image of the surface of the sample 1 is formed on the X-ray receiving surface of the detector 5. The situation in which a moving mechanism for position adjustment is installed on each optical element or pinhole plate is the same as in the other embodiments. In this embodiment, the storage device 43 is connected to the control device 12. As a result, for example, the X-ray image of the surface of the sample 1 transferred onto the display of the display device 13 is automatically compared with the design pattern of the surface of the sample 1 which is input and stored in the storage device 43 in advance. It is possible to instantly grasp the defective part.

According to this embodiment, since the X-ray 21 is focused and irradiated on the sample 1, the fluorescent X-ray image on the surface of the sample 1 is further enlarged by using the optical element 39. The state of the residual film of the fine pores can be observed in more detail with good S / N.

Although the present invention has been described in detail based on some embodiments as described above, it goes without saying that combinations of these are also included in the present invention.

[0032]

As described above, the X-ray image observation apparatus according to the present invention has X-ray irradiating means for irradiating the sample, and the diameter or the length of one side of the fine holes to be observed in the sample is 2a and the depth thereof. D
Then, when the angle determined by tan (a / d) is θ, the fluorescent X-rays generated by the X-ray irradiation can be observed in the region defined within θ from the central axis of the micropore. As described above, by providing the fluorescent X-ray spectroscopic means, the fluorescent X-ray magnifying and imaging means, and the two-dimensional detecting means for the magnified X-ray image of the sample surface, the fluorescent X-rays generated from the sample by the X-ray irradiation. Can be dispersed to form an enlarged X-ray image of the sample surface, and as a result, the presence or absence of residual films of a large number of micropores can be quickly and easily determined, so that feedback to the manufacturing process can be performed quickly.

[Brief description of drawings]

FIG. 1 is an apparatus configuration diagram showing a first embodiment of an X-ray image observation apparatus according to the present invention.

FIG. 2 is a diagram showing X-ray irradiation of a residual film and an observation direction of generated fluorescent X-rays.

FIG. 3 is a diagram showing a corner α and an aspect ratio of a DRAM.

FIG. 4 is a diagram showing an observation example of micropores according to the above-mentioned embodiment,
(A) is a figure which shows the sample surface of a fully open state, (b) is a figure which shows the sample surface containing the fine hole of a non-open state.

5A and 5B are views showing another observation example of the micropores according to the above-mentioned embodiment, FIG. 5A shows an X-ray image formed by spectrally separating only CKα rays, and FIG. 5B is formed by spectrally separating OKα rays. It is a figure which shows the X-ray image which carried out.

FIG. 6 is a device configuration diagram showing a second embodiment of the present invention.

FIG. 7 is a device configuration diagram showing a third embodiment of the present invention.

FIG. 8 is a device configuration diagram showing a fourth embodiment of the present invention.

FIG. 9 is a device configuration diagram showing a fifth embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Sample 2, 4, 17, 31, 36 ... Optical element 3 ... Pinhole plate 5 ... Detection means (detector) 18, 30 ... Spectroscopic element 21 ... Irradiation X-ray 24, 24 ', 50 ... Fluorescent X-ray

Claims (12)

[Claims] 1. When the sample is provided with an X-ray irradiating means, and the diameter or the length of one side of the fine holes to be observed in the sample is 2a and the depth is d, it is determined by tan (a / d). When the angle is θ, the fluorescent X-ray spectroscopic means and the fluorescent X-rays are arranged so that the fluorescent X-rays generated by the X-ray irradiation can be observed in a region defined within a range of θ from the central axis of the micropore. An X-ray image observation apparatus provided with a magnifying image forming means of a line and a two-dimensional detecting means of a magnified X-ray image of a sample surface in this order. 2. When the sample has an X-ray irradiating means and the diameter or the length of one side of the fine holes to be observed in the sample is 2a and the depth is d, tan (a / d) Set the angle θ
Then, the fluorescent X-ray magnifying and imaging means and the fluorescent X-ray are arranged so that the fluorescent X-ray generated by the X-ray irradiation can be observed in a region defined within a range of θ from the central axis of the fine hole. X-ray image observation apparatus including the spectroscopic means and the two-dimensional detection means for the enlarged X-ray image of the sample surface in this order. 3. The region defined within the range of θ from the central axis of the fine light is a region defined within the range of 26 degrees from the central axis. The X-ray image observation apparatus according to 2. 4. The X-ray image observation apparatus according to claim 1, wherein the X-ray irradiating means is a means for condensing and irradiating the X-rays. 5. The X-ray image observation apparatus according to claim 1, wherein the X-ray irradiating means is a means capable of irradiating the X-ray from a direction through which the bottom surface of the fine hole is seen. . 6. The X-ray is passed through the spectroscopic unit, the magnifying and imaging unit, or both of them to irradiate the sample. The X-ray image observation apparatus according to claim 4 or 5. 7. The X-ray image observation apparatus according to claim 1, 2 or 6, wherein the magnifying and imaging means is constituted by an optical system including a reflecting mirror or a zone plate. . 8. The X-ray image observation apparatus according to claim 1, wherein the spectroscopic means includes a multilayer film reflection mirror, a diffraction grating, or a zone plate. 9. The X-ray image observation apparatus according to claim 1, wherein the magnified X-ray image of the surface of the sample automatically determines the residual film state of the fine holes by the addition means. 10. The X-ray image observation apparatus according to claim 9, wherein said adding means is a storage device connected to the control device. 11. An X-ray irradiating unit for a sample, a unit for separating X-rays generated from the sample, a unit for enlarging and forming the separated X-rays, and an X-ray image for forming the enlarged image. And an X-ray image observation apparatus. 12. X-ray irradiating means for irradiating a sample, means for magnifying and imaging the X-rays generated from the sample, means for dispersing the magnified and imaged X-ray image, and the above-mentioned spectroscopic X-ray. Statue of 2
An X-ray image observation apparatus comprising: a dimension detection unit.