JPH08119978A - Method for jointly producing dimethylsilane and triorganochlorosilane - Google Patents
Method for jointly producing dimethylsilane and triorganochlorosilaneInfo
- Publication number
- JPH08119978A JPH08119978A JP6297789A JP29778994A JPH08119978A JP H08119978 A JPH08119978 A JP H08119978A JP 6297789 A JP6297789 A JP 6297789A JP 29778994 A JP29778994 A JP 29778994A JP H08119978 A JPH08119978 A JP H08119978A
- Authority
- JP
- Japan
- Prior art keywords
- dimethylsilane
- triorganochlorosilane
- sih
- lewis acid
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 19
- 229910000077 silane Inorganic materials 0.000 claims abstract description 11
- -1 silane compound Chemical class 0.000 claims abstract description 11
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000011968 lewis acid catalyst Substances 0.000 claims description 7
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical compound C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 claims description 6
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 abstract description 14
- 239000002841 Lewis acid Substances 0.000 abstract description 5
- 150000007517 lewis acids Chemical class 0.000 abstract description 5
- 150000002430 hydrocarbons Chemical group 0.000 abstract description 4
- 229930195733 hydrocarbon Natural products 0.000 abstract description 3
- 230000002194 synthesizing effect Effects 0.000 abstract description 3
- 239000004215 Carbon black (E152) Substances 0.000 abstract description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 239000002994 raw material Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- OHBQPCCCRFSCAX-UHFFFAOYSA-N 1,4-Dimethoxybenzene Chemical compound COC1=CC=C(OC)C=C1 OHBQPCCCRFSCAX-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 238000007327 hydrogenolysis reaction Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 239000007818 Grignard reagent Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910018540 Si C Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010504 bond cleavage reaction Methods 0.000 description 1
- HXLVDKGPVGFXTH-UHFFFAOYSA-N butyl(dimethyl)silane Chemical compound CCCC[SiH](C)C HXLVDKGPVGFXTH-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- ZKXWKVVCCTZOLD-UHFFFAOYSA-N copper;4-hydroxypent-3-en-2-one Chemical compound [Cu].CC(O)=CC(C)=O.CC(O)=CC(C)=O ZKXWKVVCCTZOLD-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- YKFUDUBXUCZEKT-UHFFFAOYSA-N cyclopentyl(dimethyl)silane Chemical compound C[SiH](C)C1CCCC1 YKFUDUBXUCZEKT-UHFFFAOYSA-N 0.000 description 1
- HFLUNURTMXOINE-UHFFFAOYSA-N dicyclohexylmethylsilane Chemical compound C1CCCCC1C([SiH3])C1CCCCC1 HFLUNURTMXOINE-UHFFFAOYSA-N 0.000 description 1
- OIKHZBFJHONJJB-UHFFFAOYSA-N dimethyl(phenyl)silicon Chemical compound C[Si](C)C1=CC=CC=C1 OIKHZBFJHONJJB-UHFFFAOYSA-N 0.000 description 1
- KMUIVDDMCZNNEJ-UHFFFAOYSA-N dimethyl(propan-2-yl)silicon Chemical compound CC(C)[Si](C)C KMUIVDDMCZNNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、ジメチルシランとトリ
オルガノクロロシランを併産、製造する方法に関する。FIELD OF THE INVENTION The present invention relates to a method for producing and producing dimethylsilane and triorganochlorosilane together.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】ジメチ
ルシランは、シリコーン工業界において重要な位置を占
めるモノマー原料であり、例えば、二重結合を有する有
機化合物に付加修飾する際の原料として用いられたり、
各種クロロシラン類と再分配反応させることにより、シ
リル化剤等の有用な有機ケイ素化合物の合成中間体を合
成する上での原料として知られている。BACKGROUND OF THE INVENTION Dimethylsilane is a monomer raw material that occupies an important position in the silicone industry, and is used as a raw material for addition modification of an organic compound having a double bond. Or
It is known as a raw material for synthesizing useful synthetic intermediates of organosilicon compounds such as silylating agents by redistribution reaction with various chlorosilanes.
【0003】一方、トリオルガノクロロシラン、例えば
トリメチルクロロシラン及びその誘導体はシリル化剤と
して広い分野で使われている他、無機物質の疎水化やオ
ルガノポリシロキサン鎖への末端ブロック単位の導入に
も使用することができる。On the other hand, triorganochlorosilanes such as trimethylchlorosilane and its derivatives are widely used as silylating agents, and also used for hydrophobizing inorganic substances and introducing terminal block units into organopolysiloxane chains. be able to.
【0004】特に、t−ブチルジメチルクロロシランは
抗生物質などの医薬品合成や有機合成のためのシリル化
剤として重要な化合物である。Particularly, t-butyldimethylchlorosilane is an important compound as a silylating agent for the synthesis of drugs such as antibiotics and organic synthesis.
【0005】従来、ジメチルシランの製造方法として
は、例えば、直接法によってジメチルジクロロシランを
得る際、低沸点成分中に炭化水素などと共に得られる副
生物の中から精留によって単離する方法が知られている
が、この方法では工程時間が長い割にジメチルシランを
少量しか得ることができないという欠点がある。Conventionally, as a method for producing dimethylsilane, for example, when dimethyldichlorosilane is obtained by a direct method, a method in which dimethyldichlorosilane is isolated from a by-product obtained together with hydrocarbons in a low boiling point component by rectification is known. However, this method has a disadvantage that dimethylsilane can be obtained in a small amount although the process time is long.
【0006】また、ジクロロシランを原料として、メチ
ルクロリドのグリニャール試薬を用いてジメチルシラン
を合成する方法が考えられるが、原料のジクロロシラン
が発火しやすく取り扱いの難しい物質である上に、溶媒
を大量に使用する為、生産性が悪く、また、原料のマグ
ネシウムが高価であるといった問題がある。Further, a method of synthesizing dimethylsilane using dichlorosilane as a raw material and a Grignard reagent of methyl chloride can be considered. However, the raw material dichlorosilane is a substance that is easily ignited and difficult to handle, and a large amount of solvent Therefore, there is a problem that productivity is poor and magnesium as a raw material is expensive.
【0007】その他の方法としては、リチウムアルミニ
ウムハイドライドなどの水素化分解試薬によってクロロ
シランのケイ素−塩素結合の塩素を水素分解する方法が
考えられるが、自然発火性の水素化分解試薬を用いる危
険性があり、工業的に一般的でない。As another method, a method of hydrolyzing chlorine of silicon-chlorine bond of chlorosilane with a hydrogenolysis reagent such as lithium aluminum hydride can be considered, but there is a risk of using a pyrophoric hydrogenolysis reagent. Yes, it is not industrially common.
【0008】一方、t−ブチルジメチルクロロシラン
は、t−ブチルジメチルシランを塩素によりクロロ化す
ることにより合成されている。しかし、この場合には、
水素原子は塩化水素となって失われ、有効に活用されて
いなかった。On the other hand, t-butyldimethylchlorosilane is synthesized by chlorinating t-butyldimethylsilane with chlorine. But in this case,
Hydrogen atoms were lost as hydrogen chloride and were not effectively utilized.
【0009】本発明は上記事情に鑑みなされたもので、
ジメチルシランとトリオルガノクロロシランとを同時に
安価にかつ簡便に、しかも危険を伴わずに収率良く合成
することができるジメチルシランとトリオルガノクロロ
シランの併産方法を提供することを目的とする。The present invention has been made in view of the above circumstances.
It is an object of the present invention to provide a co-production method of dimethylsilane and triorganochlorosilane, which can simultaneously synthesize dimethylsilane and triorganochlorosilane inexpensively and easily and in good yield without danger.
【0010】[0010]
【課題を解決するための手段及び作用】本発明者は、上
記目的を達成するため鋭意検討を重ねた結果、一般式R
1R2R3SiH(R1、R2、R3は互いに同一また
は異種の一価炭化水素基を示す。)で示されるSi−H
基含有のシラン化合物を、ルイス酸触媒存在化ジメチル
ジクロロシランと反応させることにより、ジメチルジク
ロロシランの両方のSi−Cl結合がSi−H結合に変
換されて、ジメチルシランを得ることができると共に、
一般式R1R2R3SiCl(R1、R2、R3は上記
と同様。)で示されるトリオルガノクロロシランを良好
な収率でしかも安価で簡便かつ安全に得ることができる
ものであることを知見し、特にこの方法がt−ブチルジ
メチルシランの水素原子を有効に利用してジメチルシラ
ンとt−ブチルシメチルクロロシランとの同時提供を可
能にすることを見いだし、本発明をなすに至ったもので
ある。Means and Actions for Solving the Problems As a result of extensive studies conducted by the present inventor to achieve the above object, the general formula R
Si-H represented by 1 R 2 R 3 SiH (R 1 , R 2 , and R 3 are the same or different monovalent hydrocarbon groups).
By reacting a silane compound containing a group with dimethyldichlorosilane in the presence of a Lewis acid catalyst, both Si-Cl bonds of dimethyldichlorosilane are converted to Si-H bonds, and dimethylsilane can be obtained,
The triorganochlorosilane represented by the general formula R 1 R 2 R 3 SiCl (R 1 , R 2 and R 3 are the same as above) can be obtained in good yield, at low cost, easily and safely. In particular, it was found that this method effectively utilizes the hydrogen atom of t-butyldimethylsilane and enables simultaneous provision of dimethylsilane and t-butyldimethylchlorosilane, which led to the present invention. It is a thing.
【0011】従って、本発明は、ルイス酸触媒の存在下
にジメチルジクロロシランと一般式R1R2R2SiH
(R1、R2、R3は上記と同様の意味を示す。)で表
されるSiH結合含有シラン化合物とを反応させること
を特徴とする、ジメチルシランとR1R2R3SiCl
で示されるトリオルガノクロロシランの併産方法を提供
する。Accordingly, the present invention is directed to dimethyldichlorosilane and the general formula R 1 R 2 R 2 SiH in the presence of a Lewis acid catalyst.
(R 1 , R 2 , and R 3 have the same meanings as described above.) A silane compound containing SiH bond represented by the formula ( 1 ) is reacted with dimethylsilane and R 1 R 2 R 3 SiCl.
And a method for co-producing triorganochlorosilane.
【0012】以下、本発明を更に詳述すると、本発明の
方法において用いるSiH結合含有シラン化合物として
は、一般式R1R2R3SiHで表されるものである。
これらの、R1、R2、R3としては、例えば、メチル
基、エチル基、プロピル基、イソプロピル基、n−ブチ
ル基、t−ブチル基、シクロヘキシル基、シクロペンチ
ル基、n−オクチル基等のアルキル基、あるいはフェニ
ル基等のアリール基等の炭素原子数1から20、より好
ましくは1から10の1価炭化水素基を上げることがで
き、これらは互い同一であっても良く、異なっていても
よい。具体的には、トリメチルシラン、トリエチルシラ
ン、t−ブチルジメチルシラン、フェニルジメチルシラ
ン、イソプロピルジメチルシラン、ジシクロヘキシルメ
チルシラン、ノルマルオクチルジメチルシラン、ノルマ
ルブチルジメチルシラン、シクロベンチルジメチルシラ
ンなどがあげられる。The present invention will be described in more detail below. The SiH bond-containing silane compound used in the method of the present invention is represented by the general formula R 1 R 2 R 3 SiH.
Examples of R 1 , R 2 , and R 3 include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a t-butyl group, a cyclohexyl group, a cyclopentyl group, and an n-octyl group. A monovalent hydrocarbon group having 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms, such as an alkyl group or an aryl group such as a phenyl group can be used, and these may be the same or different from each other. Good. Specific examples thereof include trimethylsilane, triethylsilane, t-butyldimethylsilane, phenyldimethylsilane, isopropyldimethylsilane, dicyclohexylmethylsilane, normal octyldimethylsilane, normal butyldimethylsilane, and cyclopentyldimethylsilane.
【0013】一方、ルイス酸触媒としては、具体的に
は、塩化アルミニウム、塩化鉄、三塩化ホウ素、塩化亜
鉛、塩化セシウム、塩化コバルト、塩化ニッケル、四塩
化チタン、塩化スズ、塩化ロジウム、塩化カドミウム、
銅アセチルアセトナートなどが挙げられ特に塩化アルミ
ニウムを用いることが好ましい。On the other hand, specific examples of the Lewis acid catalyst include aluminum chloride, iron chloride, boron trichloride, zinc chloride, cesium chloride, cobalt chloride, nickel chloride, titanium tetrachloride, tin chloride, rhodium chloride and cadmium chloride. ,
Copper acetylacetonate and the like are mentioned, and it is particularly preferable to use aluminum chloride.
【0014】上記、SiH結台含有シラン化合物の使用
量は、ジメチルジクロロシラン1モルに対して、0.8
〜5.0モル、特に、1.0〜2.0モルが好ましい。
シラン化合物の使用量が0.8モルより少ない、または
5.0モルより多いと未反応の原料が大量に残存する場
合がある。The amount of the SiH bond-containing silane compound used is 0.8 with respect to 1 mol of dimethyldichlorosilane.
˜5.0 mol, especially 1.0 to 2.0 mol is preferred.
When the amount of the silane compound used is less than 0.8 mol or more than 5.0 mol, a large amount of unreacted raw material may remain.
【0015】また、ルイス酸の使用量は、ジメチルジク
ロロシラン1モルに対して、0.001〜0.5モル、
特に、0.02〜0.1モルとすることが好ましく、ル
イス酸の使用量が0.001モル未満では反応速度が著
しく落ちる場合があり、0.5モルを越えるとSi−C
結合の開裂などの好ましくない不均化反応が生じる場合
がある。The amount of the Lewis acid used is 0.001 to 0.5 mol, based on 1 mol of dimethyldichlorosilane.
In particular, it is preferably 0.02 to 0.1 mol. When the amount of the Lewis acid used is less than 0.001 mol, the reaction rate may decrease remarkably, and when it exceeds 0.5 mol, Si-C
Undesired disproportionation reactions such as bond cleavage may occur.
【0016】上記反応は、通常、ジメチルジクロロシラ
ン中にルイス酸触媒を溶解し、次いで一般式R1R2R
3SiH(R1、R2、R3は上記と同様の意味を示
す。)で示されるSi−H結合含有シラン化合物を加え
て撹拌することによって、行うことができる。この場合
の反応温度は、0〜90℃、特に20〜60℃で行うこ
とが好ましい。また、反応時間は通常10分〜2時間で
ある。In the above reaction, the Lewis acid catalyst is usually dissolved in dimethyldichlorosilane, and then the general formula R 1 R 2 R is used.
It can be carried out by adding a Si—H bond-containing silane compound represented by 3 SiH (R 1 , R 2 and R 3 have the same meanings as described above) and stirring. In this case, the reaction temperature is preferably 0 to 90 ° C, particularly preferably 20 to 60 ° C. The reaction time is usually 10 minutes to 2 hours.
【0017】また、一般式R1R2R3SiH(R1、
R2、R3上記と同様の意味を示す。)で示されるSi
−H結合含有シラン化合物中にルイス酸触媒を溶解し、
次いでジメチルジクロロシランを加えて撹拌しても良
い。この場合は、特に、反応しながらジメチルシランを
留去することもできる。The general formula R 1 R 2 R 3 SiH (R 1 ,
R 2 and R 3 have the same meaning as above. ) Si
-Dissolving a Lewis acid catalyst in a silane compound containing an H bond,
Then, dimethyldichlorosilane may be added and stirred. In this case, in particular, dimethylsilane can be distilled off during the reaction.
【0018】なお、本発明のジメチルジクロロシランの
製造方法には溶媒を用いても良く、使用される溶媒とし
ては、ジメチルジクロロシラン及び/またはSiH結合
含有シランと反応しない溶媒を用いることが好ましく、
そのような溶媒としては、トルエン、酢酸エチル、デカ
ン、o−キシレンなどが例示される。A solvent may be used in the method for producing dimethyldichlorosilane of the present invention, and a solvent that does not react with dimethyldichlorosilane and / or SiH bond-containing silane is preferably used as the solvent.
Examples of such a solvent include toluene, ethyl acetate, decane, o-xylene and the like.
【0019】反応液よりトリオルガノクロロシランを蒸
留単離する際には、含有するルイス酸を、失活させてお
くことが望ましい。具体的には、用いたルイス酸のモル
数に対して、1〜5倍モルのアニソール、ジフェニルエ
ーテル、o−ジメトキシベンゼン、p−ジメトキシベン
ゼンなどのエーテルを加える方法などが挙げられる。When the triorganochlorosilane is distilled and isolated from the reaction solution, it is desirable to deactivate the Lewis acid contained therein. Specific examples include a method in which ether such as anisole, diphenyl ether, o-dimethoxybenzene and p-dimethoxybenzene is added in an amount of 1 to 5 times the moles of the Lewis acid used.
【0020】[0020]
【発明の効果】本発明のジメチルシランとトリオルガノ
クロロシランの併産方法は、安価でかつ簡便な方法でし
かも高収率で安全性高くジメチルシランとトリオルガノ
クロロシランとを同時に得ることができ、特に本方法は
ジメチルシランとt−ブチルジメチルクロロシランを同
時提供する方法として非常に有効である。The co-production method of dimethylsilane and triorganochlorosilane of the present invention is an inexpensive and simple method, and it is possible to obtain dimethylsilane and triorganochlorosilane at the same time with high yield and high safety. This method is very effective as a method for simultaneously providing dimethylsilane and t-butyldimethylchlorosilane.
【0021】[0021]
【実施例】以下、実施例を示して本発明を具体的に説明
するが、本発明は下記実施例に制限されるものではな
い。EXAMPLES The present invention will now be specifically described with reference to examples, but the present invention is not limited to the following examples.
【0022】[実施例1]冷却管、温度計、滴下管、撹
拌機を備え付けた4つ口フラスコに、ジメチルジクロロ
シラン12.9g(0.10モル)、塩化アルミニウム
0.27g(0.002モル)を入れ、撹拌機で撹拌し
た。次いで、この中に室温下t−ブチルジメチルシラン
23.2g(0.20モル)を30分かけて滴下し、そ
の後も30℃に保温しながら1時間撹拌した。反応終了
後、反応液を蒸留したところ、沸点が−20.1℃のジ
メチルシラン4.8g(収率80%)、沸点125℃の
t−ブチルジメチルクロロシラン29.5g(収率98
%)が得られた。[Example 1] 12.9 g (0.10 mol) of dimethyldichlorosilane and 0.27 g (0.002) of aluminum chloride were placed in a four-necked flask equipped with a cooling tube, a thermometer, a dropping tube and a stirrer. Mol), and stirred with a stirrer. Next, 23.2 g (0.20 mol) of t-butyldimethylsilane was added dropwise thereto over 30 minutes at room temperature, and then the mixture was stirred for 1 hour while keeping the temperature at 30 ° C. After completion of the reaction, the reaction solution was distilled. As a result, 4.8 g of dimethylsilane having a boiling point of -20.1 ° C (yield 80%) and 29.5 g of t-butyldimethylchlorosilane having a boiling point of 125 ° C (yield 98
%)was gotten.
【0016】[実施例2]冷却管、温度計、滴下管、撹
拌機を備え付けた4つ口フラスコに、t−ブチルジメチ
ルシラン123.2(0.20モル)、塩化アルミニウ
ム0.27g(0.002モル)を入れ、撹拌機で撹拌
した。次いで、この中に内温60℃でジメチルジクロロ
シラン12.9g(0.10モル)を30分かけて滴下
しながら、留分を留去させたところ、沸点が−20.1
℃のジメチルシラン5.7g(収率95%)が得られ
た。さらに、o−ジメトキシベンゼン0.2gを加えて
1時間撹拌した後、蒸留によりt−ブチルジメチルクロ
ロシランを単離した所、t−ブチルジメチルクロロシラ
ン29.4g(収率97%)が得られた。Example 2 In a four-necked flask equipped with a cooling tube, a thermometer, a dropping tube and a stirrer, t-butyldimethylsilane 123.2 (0.20 mol) and aluminum chloride 0.27 g (0 (.002 mol) was added and the mixture was stirred with a stirrer. Then, while distilling 12.9 g (0.10 mol) of dimethyldichlorosilane over 30 minutes at an internal temperature of 60 ° C. to distill off the distillate, the boiling point was −20.1.
5.7 g (yield 95%) of dimethylsilane at 0 ° C. were obtained. Furthermore, after adding 0.2 g of o-dimethoxybenzene and stirring for 1 hour, t-butyldimethylchlorosilane was isolated by distillation, and 29.4 g (yield 97%) of t-butyldimethylchlorosilane was obtained.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 久保田 泰文 新潟県中頚城郡頚城村大字西福島28−1 信越化学工業株式会社合成技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yasufumi Kubota 28-1 Nishifukushima, Kubiki Village, Nakakubiki District, Niigata Prefecture Shin-Etsu Chemical Co., Ltd.
Claims (2)
シランと一般式R1R2R3SiH(R1、R2、R3
は互いに同一又は異種の一価炭化水素基を示す。)で表
されるSiH結合含有シラン化合物とを反応させること
を特徴とするジメチルシランとR1R2R3SiCl
(R1、R2、R3は上記と同様の意味を示す。)で表
されるトリオルガノクロロシランの併産方法。1. Dimethylchlorosilane and the general formula R 1 R 2 R 3 SiH (R 1 , R 2 , R 3 in the presence of a Lewis acid catalyst.
Are the same or different monovalent hydrocarbon groups. ) And a SiH bond-containing silane compound represented by the formula (1) are reacted with dimethylsilane and R 1 R 2 R 3 SiCl.
(R 1 , R 2 , and R 3 have the same meanings as described above.) A method of co-producing triorganochlorosilane.
シランとt−ブチルジメチルシランとを反応させること
を特徴とするジメチルシランとt−ブチルジメチルクロ
ロシランの併産方法。2. A method for co-producing dimethylsilane and t-butyldimethylchlorosilane, which comprises reacting dimethylchlorosilane and t-butyldimethylsilane in the presence of a Lewis acid catalyst.
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JP29778994A JP3192565B2 (en) | 1994-10-25 | 1994-10-25 | Co-production method of dimethylsilane and triorganochlorosilane |
Publications (2)
Publication Number | Publication Date |
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JPH08119978A true JPH08119978A (en) | 1996-05-14 |
JP3192565B2 JP3192565B2 (en) | 2001-07-30 |
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