JPH08114485A - Liquid level holding method and liquid level detector of treating liquid of photosensitive material treating apparatus - Google Patents

Abstract

PURPOSE: To detect the liquid level of a treating liquid with good accuracy, to always hold a proper liquid level while the concentration of the treating liquid is being prevented and to prevent the oxidation of the treating liquid. CONSTITUTION: Tip parts 150A of electrodes 150 for a liquid level sensor 116 come into at least line contact with the liquid level. Their contact region has a larger tank contact length with the liquid level than that of structure in which the electrodes are lowered vertically to the surface of a treating liquid. Since the tip parts 150A of the electrodes 150 come into line contact with the liquid level, a region in which surface tension is generated is expanded, electrical connection state is obtained by surface tension which is generated in a state that the tip parts 150A of the electrodes 150 come into contact barely, and the output signal of a sensor body 152 stabilized.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of maintaining a liquid level of a processing liquid in a photosensitive material processing apparatus for maintaining the liquid level of the processing liquid in each processing tank of the photosensitive material processing apparatus at a predetermined level by replenishing water. And a liquid level detector used therefor.

[0002]

2. Description of the Related Art An exposed light-sensitive material is normally developed, fixed and washed with a processing solution such as a developing solution, a fixing solution and a washing water, and then sent to a drying section to be dried. .

Although the processing liquid deteriorates according to the amount of processing of the photosensitive material, since the replenishing liquid is replenished, the capacity of the processing liquid can be kept almost constant, and the processing liquid adheres to the surface of the photosensitive material. It is possible to prevent a decrease in the processing liquid in the processing tank due to being taken out to the inside.

However, the lowering of the processing liquid level may occur not only by taking out the photosensitive material but also by evaporating water in the processing liquid. Conventionally, a liquid level detection sensor having a pair of electrodes is arranged so that the tip portions of the pair of electrodes are substantially perpendicular to the liquid level, and whether the electrodes are electrically connected via the processing liquid. It is determined whether or not the water is replenished, and water is replenished at the time of non-conduction, and the replenishment of water is stopped in the conduction state.

As a result, concentration of the treatment liquid due to evaporation is prevented, and deterioration of the finished quality can be prevented.

[0006]

However, since such water evaporation occurs during the processing of the photosensitive material and during the suspension of operation, it is necessary to constantly detect the liquid level of the processing liquid. In particular, in a small-sized automatic developing machine which has a small amount of treatment but has a long stand-by state for the treatment liquid, the liquid level of the treatment liquid remarkably decreases due to evaporation.

At this time, the processing liquid is in a concentrated state, and when the photosensitive material is processed, the finish quality is affected. Also,
When the liquid level drops, the bottom surface of the floating lid (usually fixed to the processing tank) and the surface of the processing liquid that prevent the oxidation of the processing liquid by contacting the liquid surface of the processing liquid and the air Appears, and the function of the floating lid is lost.

Further, when trying to detect the liquid level in a state where the tip of the electrode is arranged vertically to the treatment liquid, the surface tension of the treatment liquid causes the disconnection between the surface of the treatment liquid and the electrode to be poor, and the ON / OFF is irregular. Therefore, the liquid level cannot be detected with high accuracy, and for example, fine detection near the overflow liquid level cannot be performed. Therefore, depending on the tip position of the electrode, insufficient or excessive replenishment is likely to occur.

Especially when the liquid level is gradually lowered like evaporation, the conductive state between the electrodes is maintained due to the surface tension and the like, and the liquid level of the processing liquid is erroneously recognized as being located at a predetermined liquid level. However, since the replenishment is not performed, the oxidation preventing function of the floating lid is deteriorated.

In view of the above facts, the present invention keeps the processing liquid level of a photosensitive material processing apparatus capable of preventing the processing liquid from condensing and always maintaining an appropriate liquid level and preventing the oxidation of the processing liquid. Aim to get a way.

Further, in addition to the above objects, it is another object of the present invention to provide a liquid level detector capable of accurately detecting the liquid level of a processing liquid.

[0012]

According to a first aspect of the present invention, a liquid of a processing liquid in a processing tank is provided by a non-conduction between a pair of electrodes provided near a predetermined processing liquid level in the processing tank. A method for holding the processing liquid surface of a photosensitive material processing apparatus, which retains the processing liquid at a predetermined liquid level by replenishing water in the processing tank when a surface drop is detected. After the lapse of time, when the state in which the pair of electrodes is in conduction is changed to the state of non-conduction, water is replenished until the pair of electrodes is in conduction.

According to a second aspect of the present invention, there is provided a processing liquid level detector for a photosensitive material processing device for detecting the liquid level of the processing liquid in the processing tank of the photosensitive material processing device, wherein the predetermined processing liquid is used. It is characterized in that the liquid surface contact portions of the pair of electrodes provided in the vicinity of the surface position have a structure of making line contact or surface contact with the liquid surface.

[0014]

According to the first aspect of the invention, the liquid level of the processing liquid in the processing tank is constantly monitored regardless of whether the photosensitive material processing device is operating or not. As a result, it is possible to quickly replenish water corresponding to evaporation, and for example, it is possible to shorten (or eliminate) the separation time between the liquid surface and the floating lid due to the lowered liquid level. . In addition, if water is replenished frequently, the surface of the treatment liquid may undulate and the overflow liquid level may fluctuate.Therefore, even if the liquid level goes down until a predetermined time elapses after the last water replenishment, it remains unchanged. It is controlled to stand by and replenish water after a lapse of a predetermined time. As a result, the liquid surface can be accurately maintained at the predetermined liquid level.

According to the second aspect of the present invention, since the electrode is arranged so as to make line contact or surface contact with the liquid surface, the electrode and the surface of the processing liquid come into contact with each other due to the surface tension of the processing liquid over a relatively wide area. In this case, conduction can be surely caused at a predetermined liquid level. Well, when the liquid level is separated from the electrode by a predetermined height, it becomes clearly non-conductive. By utilizing this regularity, the liquid level detection accuracy can be improved.

[0016]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an automatic developing apparatus 10 which is an embodiment of the photosensitive material processing apparatus of the present invention. The automatic developing device 10 conveys a film 20, which is an example of a photosensitive material, sequentially dipped it in a developing solution, a fixing solution, and washing water, and then performs a drying process.

The automatic developing device 10 is provided with a processing liquid processing section 11 and a drying section 50 in a machine frame 12. The processing liquid processing unit 11 includes a developing tank 14 for storing a developing solution, a fixing tank 16 for storing a fixing solution, and a washing tank 18 for storing washing water, and is provided in the vicinity of the insertion port 15 provided in the machine frame 12. , An insertion rack 17 for drawing the film 20 into the machine frame 12, and an insertion detection sensor 8 for detecting the film 20 to be inserted.
0 is set.

The developing tank 14 and the fixing tank 1 of the processing liquid processing section 11
6, in the washing tank 18, a plurality of transport rollers 22, 26,
Transport racks 24, 28, 32 each having 30
It is disposed by being immersed in a developing solution, a fixing solution, and washing water.
Further, between the developing tank 14 and the fixing tank 16 and between the fixing tank 16 and the washing tank 18, a crossover rack 34 having a conveying roller 36 and a guide 38 is arranged above them.

The film 20 inserted from the insertion opening 15
Are drawn in by the insertion rack 17, and the developing solution, fixing solution, and
It is conveyed while being successively immersed in washing water to undergo development, fixing, and washing treatment.

A squeeze roller 4 for conveying the film 20 while squeezing it is provided between the washing tank 18 and the drying section 50.
2, a squeeze rack 40 having a guide 43 for guiding the film 20 and the drying unit 50 is provided. The film 20 delivered from the water washing tank 18 is guided to the drying section 50 while the surface water content is squeezed out by the squeeze roller 42.

At the lower part of the drying section 50, a drying turn section 48 is provided.
Is provided, and the film 20 inserted from the upstream side of the drying section 50 is dried while being conveyed downward by a plurality of rollers 44 arranged in a staggered manner, and then obliquely upward in the drying turn section 48. After being turned toward, it is stocked in the receiving box 52. In addition, as shown in FIG.
A part of the plurality of rollers 44 (for example, four rollers hatched with an upper portion) may be the heat roller 60.

FIG. 2 shows a piping system for supplying water to maintain the liquid level of the processing liquid in the developing tank 14. Since the other processing tanks have the same structure, the developing tank 14 will be described below as an example, and the description of the structure of the other processing tank (fixing tank 16) will be omitted.

An overflow tank 100 is provided adjacent to the developing tank 14, and when the processing liquid in the developing tank 14 exceeds the height of the partition wall 102, the overflow tank 10 is provided.
It is supposed to flow to zero. This limits the maximum amount of processing liquid in the developing tank 14.

Corresponding to the developing tank 14, a replenisher tank 106 in which water is stored is arranged in the apparatus.

A suction pipe 108 is provided in the water tank 106.
One end of the suction pipe 108 is disposed, and the other end opening of the suction pipe 108 is disposed above the developing tank 14 so as to be opposed thereto. A pump 112 is arranged in the middle of the suction pipe 108.

The pump 112 is driven in response to a signal from the controller 114 and can supply the water in the water tank 106 to the developing tank 14.

Here, since the water in the processing liquid in the developing tank 14 is evaporated, the processing liquid is concentrated. In particular, in a small-sized automatic processor, the number of films to be processed is small and the waiting time for heating the processing liquid in a non-processing state is long, so that the evaporation amount tends to be large relative to the film processing amount.

Therefore, in the present embodiment, the liquid level sensor 116 is provided near the liquid level in the developing tank 14 so that the drop in the liquid level can be detected quickly. The liquid level sensor 116 uses the signal line 11
8 is connected to the controller 114.

The liquid level sensor 116 is composed of a pair of round bar-shaped electrodes 150 and a sensor body 152 whose contacts are switched by conduction and non-conduction between the electrodes 150. The electrodes 150 are formed by the sensor body 152. It projects from and hangs in the direction of the processing liquid. This extension direction tip portion is bent at a substantially right angle, whereby the tip portion 150A of the electrode 150 is
It is parallel to the surface of the processing liquid.

The tip 150A of the electrode 150 has its lowermost end installed at the same height as a predetermined standard liquid level of the processing liquid. This height almost coincides with the overflow liquid level. Therefore, when the treatment liquid has a predetermined liquid level, the electrodes 150 are electrically connected via the treatment liquid, and the sensor main body 152 outputs a high-level signal to the controller 114, for example. When the output signal from the sensor main body 152 is at a high level, the controller 114 determines that the liquid level of the processing liquid is at a predetermined liquid level and does not execute the water supply control.

On the other hand, when the liquid level of the treatment liquid is lowered for some reason such as evaporation, the electrodes 150 become non-conductive, and the sensor body 152 outputs a low level signal, for example. The controller 114 operates the pump 112 to execute the water supply control when the low level signal is detected.

Here, since the drop of the liquid level due to evaporation occurs gently, it is difficult to accurately detect the liquid level. However, since the tip portion 150A of the electrode 150 of the liquid level sensor 116 is arranged in parallel with the liquid surface of the processing liquid,
Since the electrode 150 is in line contact with the liquid surface, the detection region of the electrode 150 is enlarged as compared with the configuration in which the electrode 150 is simply arranged perpendicular to the liquid surface of the processing liquid. As a result, the range in which the surface tension on the peripheral surface of the electrode 150 occurs is expanded, the contact with the liquid surface is ensured, and the instability of the signal output is eliminated.

Further, in the present embodiment, the water replenishment interval is not limited to a simple on / off control, and the water replenishment interval is always greater than or equal to a predetermined value. After that, water is replenished when the processing liquid level is still low, so not only the accuracy of replenishment is improved, but also uneven concentration of the developer due to short-term concentrated replenishment of water is prevented. .

The operation of this embodiment will be described below. The film 20 on which an image is recorded by exposure is inserted into the automatic developing device 10 through the insertion port 15 of the automatic developing device 10 and processed. In the automatic developing device 10, the film 20 inserted from the insertion port 15 is drawn by the insertion rack 17 and sent to the developing tank 14 of the processing liquid processing section 11.

In the developing tank 14, the carrying roller 22 of the rack 24 carries the developing treatment by immersing it in a developing solution while carrying it in a substantially U-shape. The film 20 which has been processed in the developing tank 14 is guided and conveyed by the guide 38 of the crossover rack 34 and the conveying roller 36, and is sent to the fixing tank 16. In the fixing tank 16, the transport roller 2 of the rack 28
The film 20 is conveyed while being guided in a substantially U-shape by 6 and immersed in a fixing solution to perform a fixing process. The film 20 that has been processed in the fixing tank 16 is guided and conveyed by the crossover rack 34 and sent to the washing tank 18. In the water washing tank 18, the film 20 is conveyed while being immersed in the washing water by the conveyance roller 30 of the rack 32 to wash the film 20 with water and remove the fixer component from the surface of the film.

The film 20 that has been washed with water is guided from the washing tank 18 to the squeeze roller 42 of the squeeze rack 40 and the guide 43, and sent from the treatment liquid treatment section 11 to the drying section 50. At this time, the water adhering to the surface of the film 20 is removed by the squeeze roller 42.

In the drying section 50, while the film 20 is being conveyed by the conveying rollers 44, the drying air generated in the drying air generating section 45 is blown to heat and dry the film 20. When the film 20 is conveyed while being heated and reaches the drying turn section 48, the film 20 is obliquely turned upward, discharged, and stocked in a receiving box 49.

Here, the temperature of the developing solution in the developing tank 14 is always adjusted (usually by a heater) whether the film 20 is processed or not. During the treatment, since the replenishment liquid is replenished according to the treatment, the decrease in the liquid level due to evaporation is not so noticeable. However, particularly in a small-sized automatic developing machine, since the processing amount is small, the processing solution is warmed even during non-processing and the waiting time is long. For this reason, evaporation is also promoted, and since the replenisher is not replenished during the waiting time, the decrease in the liquid level due to evaporation becomes remarkable.

Therefore, the liquid level sensor 1 is provided near the liquid level of the developing solution.
16 is arranged to constantly detect the liquid level and perform water replenishment control. The water replenishment control procedure when the liquid level is lowered due to evaporation will be described below with reference to the time chart of FIG.

The power of the apparatus is turned on, a predetermined preparation (temperature adjustment, etc.) is performed, and at the liquid level sensor 116, it is determined whether or not the liquid level of the developing solution (fixing solution) has reached the standard liquid level. When the judgment is made and it is confirmed that it has been reached (the sensor output is at the high level), the processing is executed.

Since the temperature control is continued regardless of whether the film is being processed or not, the water in the processing liquid is easily evaporated. During film processing, a replenisher solution (a solution in which an undiluted solution and water are mixed in a predetermined ratio) depending on the processing.
Is replenished, so the liquid level does not drop much. On the other hand, since only the temperature is adjusted during the film non-treatment, when the water in the treatment liquid evaporates, the liquid level lowers accordingly.

The liquid level sensor 116 constantly detects the liquid level, and when the liquid level falls below the tip 150A of the electrode 150, the sensor body 152 outputs a low level signal,
The controller 114 receives this and operates the pump 112. At the same time, the timer is reset and started. By the operation of the pump 112, water is supplied from the water tank 106 to the developing tank 14. By this water supply, the liquid level of the developing solution rises, the electrodes 150 are brought into conduction via the developing solution, and the output signal from the sensor main body 152 switches to a high level. As a result, the controller 114 stops driving the pump 112.

Next, when it is detected that the liquid level has dropped (low level signal output), the pump 112 should normally be operated, but if the time measured by the timer has not reached the predetermined time A, Prohibit the operation of the pump 112,
When it is detected that the liquid level is still lowered after the lapse of the predetermined time A, the pump 112 is operated. As a result, not only the detection accuracy is improved, but also it is possible to prevent the concentration unevenness of the developing solution from being generated by supplying water in a short period of time.

Further, the liquid level sensor 116 in this embodiment.
The axis of the tip portion 150A of the electrode 150 is arranged parallel to the liquid surface. That is, it is in line contact with the liquid surface, and the contact area is larger than in the conventional structure in which the electrodes are vertically arranged. Conventionally, since the contact portion with the liquid surface is in a substantially point contact state, surface tension may or may not occur when the electrode is at the position where the liquid surface slips, thus making the sensor output unstable. However, in the present embodiment, since the tip end portion 150A of the electrode 150 is brought into line contact with the liquid surface as described above, the area where the surface tension occurs is expanded, and the tip end portion 15 of the electrode 150 is expanded.
The output signal from the sensor body 152 is stable because the conductive state is surely brought about by the surface tension generated when 0 A and the liquid surface are in a slipping state.

Therefore, for example, it is possible to suppress the formation of a space between the lower surface of the floating lid whose position is fixed and the liquid surface, and prevent oxidative deterioration.

In the above-described embodiment, the electrode 150 has a round bar shape, and the tip end portion 152A thereof is bent to make a line contact with the liquid surface. However, as shown in FIG. For example, if a liquid level sensor 162 made of stainless steel 160 is used, it is possible to secure a contact area of width dimension × wall thickness dimension.
The sensor output can be stabilized. Further, as shown in FIG. 5, a plate-shaped electrode 160 is used, and the tip 1
The contact area can be further expanded by bending 60A at a substantially right angle.

Further, as shown in FIG. 6, the plate-shaped electrode 160 shown in FIG. 4 is arranged in the vicinity of the partition wall 102 for partitioning the developing tank 14 and the overflow tank 100 to reduce the overflow amount. be able to.

[0048]

As described above, the processing liquid level detector of the photosensitive material processing apparatus according to the present invention is the method for holding the processing liquid level of the photosensitive material processing apparatus, and Oxidation of the processing liquid is prevented by keeping the processing liquid in the processing tank at an appropriate level at all times while preventing concentration, and by keeping the space between the surface of the processing liquid and the floating lid to be eliminated. It has an excellent effect of being able to.

In addition to the above effects, there is an effect that the liquid level of the processing liquid can be accurately detected.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of an automatic developing device according to the present embodiment.

FIG. 2 is a schematic view showing a developing tank, an overflow tank, and a replenisher piping system.

FIG. 3 is a water replenishment control time chart.

FIG. 4 is a perspective view showing a modified example (a plate-shaped electrode) of an electrode.

FIG. 5 is a perspective view showing a modification of the electrode (a plate-shaped electrode and a bent tip portion).

FIG. 6 is a side view showing an arrangement example of electrodes.

[Explanation of symbols]

 10 Automatic Developing Device 14 Developing Tank 16 Fixing Tank 106 Water Tank 112 Pump 114 Controller 116 Liquid Level Sensor 150 Electrode 150A Tip

Claims (2)

[Claims] 1. When water level drop of the processing liquid in the processing tank is detected due to non-conduction between a pair of electrodes provided near a predetermined processing liquid level in the processing tank, water in the processing tank is detected. A method for holding a processing liquid surface of a photosensitive material processing apparatus for holding a processing liquid at a predetermined liquid level by replenishing the processing liquid, wherein the pair of electrodes are electrically connected after a predetermined time has passed from the previous water replenishment. When the status changes from the current status to the non-conductive status,
A method of maintaining a liquid level of a processing liquid in a photosensitive material processing apparatus, wherein water is replenished until the pair of electrodes are electrically connected. 2. A processing liquid level detector of a photosensitive material processing device for detecting the liquid level of a processing liquid in a processing tank of the photosensitive material processing device, the detector being provided in the vicinity of a predetermined liquid level of the processing liquid. 2. A processing liquid level detector for a photosensitive material processing apparatus, wherein the liquid level contact portions of the pair of electrodes have a structure in which they make line contact or surface contact with the liquid level.