JPH0798404A - Production of diffraction grating - Google Patents
Production of diffraction gratingInfo
- Publication number
- JPH0798404A JPH0798404A JP21551393A JP21551393A JPH0798404A JP H0798404 A JPH0798404 A JP H0798404A JP 21551393 A JP21551393 A JP 21551393A JP 21551393 A JP21551393 A JP 21551393A JP H0798404 A JPH0798404 A JP H0798404A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- resist
- optical crystal
- nonlinear optical
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は光情報処理分野、あるい
は光応用計測制御分野に使用する回折格子の製造方法に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a diffraction grating used in the field of optical information processing or the field of optical measurement and control.
【０００２】[0002]
【従来の技術】近年、回折格子は結合器，偏向器，分波
器，反射器，波長フィルタ，モ−ド変換器等、種種の受
動素子として広く用いられ、また光波制御用の機能素子
にも応用できる事から、光集積回路構成上の最も重要な
要素の一つである。2. Description of the Related Art Recently, diffraction gratings have been widely used as passive elements of various kinds such as couplers, deflectors, demultiplexers, reflectors, wavelength filters, mode converters, etc., and also as functional elements for controlling light waves. Is also one of the most important factors in optical integrated circuit configuration.
【０００３】以下に従来の回折格子の製造方法について
説明する。図３は従来の回折格子の製造方法の工程を示
すものである。A conventional method of manufacturing a diffraction grating will be described below. FIG. 3 shows steps of a conventional method of manufacturing a diffraction grating.
【０００４】同図（ａ）で非線形光学結晶であるＬｉＴ
ａＯ3 基板３１にレジスト３２をスピンナ−で０．２μ
ｍの厚さに塗布する。ここで用いたレジストはシプレ−
社製のＡＺ１４００である。次に９０℃で，２０分間プ
リベ−クした後，同図（ｂ）でＨｅ−Ｃｄレ−ザ−３３
（λ＝４４１．６ｎｍ）を用いた干渉露光法により、露
光する。（露光量４５ｍＪ／ｃｍ2、θ＝３３．５゜）
次に現像液（シプレ−社製ＭＦ３１２：水＝１：１）で
５秒間現像し、純水で１分間リンスした後ポストベ−ク
を９０℃で、２５分間行うと、同図（ｃ）となり、レジ
スト上に回折格子３２ａが出来上がる。大きさとして２
０ｍｍの範囲で回折効率１０％±１％であった。In FIG. 1A, LiT, which is a nonlinear optical crystal, is used.
The resist 32 is spin coated on the aO 3 substrate 31 to 0.2 μm.
Apply to a thickness of m. The resist used here is
AZ1400 manufactured by the company. Next, after prebaking at 90 ° C. for 20 minutes, the He-Cd laser 33 shown in FIG.
Exposure is performed by the interference exposure method using (λ = 441.6 nm). (Exposure amount 45 mJ / cm 2 , θ = 33.5 °)
Next, after developing with a developing solution (MF312: water = 1: 1) manufactured by Shipley Co., Ltd. for 5 seconds and rinsing with pure water for 1 minute, post baking is performed at 90 ° C. for 25 minutes, the result is as shown in FIG. The diffraction grating 32a is completed on the resist. 2 as size
The diffraction efficiency was 10% ± 1% in the range of 0 mm.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら上記の従
来の構成では、図４に示すように、ＬｉＴａＯ3 基板４
１の表面反射４４と、裏面反射４５（ここで言う裏面と
は、非線形光学結晶４１に光が入射する側と反対側の面
４１ａ。）が起こるので、レジスト上の干渉縞にムラが
でき、深く、均一な干渉縞が形成されないという問題点
を有していた。[0005] However, in the conventional configuration described above, as shown in FIG. 4, LiTaO 3 substrate 4
1 surface reflection 44 and back surface reflection 45 (the back surface referred to here is the surface 41a opposite to the side on which light is incident on the nonlinear optical crystal 41). Therefore, the interference fringes on the resist are uneven, There was a problem that deep and uniform interference fringes were not formed.
【０００６】本発明は上記従来の問題点を解決するもの
で、新たな工夫を加える事により、深く、均一な干渉縞
をレジスト上に形成することを目的とするものである。The present invention solves the above-mentioned conventional problems, and an object thereof is to form deep and uniform interference fringes on a resist by adding new measures.
【０００７】[0007]
【課題を解決するための手段】この目的を達成するため
に本発明の回折格子の製造方法は、レジストを塗布する
前に非線形光学結晶上に反射防止膜を形成する工程、ま
たは、非線形光学結晶の裏面をすりガラス状とし、前記
非線形光学結晶の裏面に黒色液体または黒色固体を塗布
するという工程を有している。In order to achieve this object, a method of manufacturing a diffraction grating of the present invention comprises a step of forming an antireflection film on a nonlinear optical crystal before coating a resist, or a nonlinear optical crystal. Of the non-linear optical crystal is coated with black liquid or black solid.
【０００８】[0008]
【作用】本発明は上記の方法により、非線形光学結晶表
面上の反射光と、反射防止膜表面上の反射光の反射率を
等しくし、反射防止膜の膜厚を１／４波長とすること
で、二つの反射光が互いに打ち消しあうため、表面での
反射を防止できる。According to the present invention, the reflectance of the reflected light on the surface of the nonlinear optical crystal is made equal to the reflectance of the reflected light on the surface of the antireflection film by the above method, and the film thickness of the antireflection film is set to 1/4 wavelength. Thus, the two reflected lights cancel each other out, so that reflection on the surface can be prevented.
【０００９】また、本発明によれば、黒色液体または黒
色固体が非線形光学結晶 基板の裏面からの反射光を吸
収するため、裏面反射を防ぐことができる。このためレ
ジスト上に深く、均一な干渉縞を形成することができ
る。Further, according to the present invention, since the black liquid or the black solid absorbs the reflected light from the back surface of the nonlinear optical crystal substrate, back surface reflection can be prevented. Therefore, deep and uniform interference fringes can be formed on the resist.
【００１０】[0010]
（実施例１）以下本発明の実施例１について図面を参照
しながら説明する。図１は本発明の実施例１を示す回折
格子の製造方法の工程図である。(Embodiment 1) Hereinafter, Embodiment 1 of the present invention will be described with reference to the drawings. First Embodiment FIG. 1 is a process diagram of a method of manufacturing a diffraction grating showing a first embodiment of the present invention.
【００１１】非線形光学結晶１１の裏面１１ａは前にも
述べたように裏面反射が抑えられるように研磨してすり
ガラス状にしておく。The back surface 11a of the nonlinear optical crystal 11 is ground so as to suppress back surface reflection and has a ground glass shape as described above.
【００１２】次に図１（ａ）においてＬｉＴａＯ3 基板
１１上に反射防止膜１３を０．０６μｍの厚さに蒸着す
る。反射防止膜の原理は、図５に示してある。非線形光
学結晶５１と反射防止膜５２の反射率Ｒ1，Ｒ2を等しく
し、反射防止膜５２の膜厚を１／４波長とすることで反
射光５１ａと５２ａが互いに打ち消し合い、反射を防
ぐ。非線形光学結晶５１、反射防止膜５２、レジスト５
３、の屈折率をそれぞれｎ1、ｎ2、ｎ3とすると、（式
１）、（式２）、（式３）のような関係式が得られる。Next, in FIG. 1A, an antireflection film 13 is vapor-deposited to a thickness of 0.06 μm on the LiTaO 3 substrate 11. The principle of the antireflection film is shown in FIG. By setting the reflectances R 1 and R 2 of the nonlinear optical crystal 51 and the antireflection film 52 to be equal and setting the film thickness of the antireflection film 52 to ¼ wavelength, the reflected lights 51a and 52a cancel each other and prevent reflection. . Nonlinear optical crystal 51, antireflection film 52, resist 5
When the refractive indices of 3 and 3 are n 1 , n 2 and n 3 , respectively, relational expressions such as (Expression 1), (Expression 2) and (Expression 3) are obtained.
【００１３】 Ｒ1＝ （ｎ2 2−ｎ1 2）／（ｎ2 2＋ｎ1 2） …（式１） Ｒ2＝ （ｎ3 2−ｎ2 2）／（ｎ3 2＋ｎ2 2） …（式２） ｎ2ｌ＝λ／４ …（式３） ｎ1＝２．２、ｎ3＝１．５とし、（式１）＝（式２）と
すると、ｎ2＝１．８２となる。これに近い値としてＡ
ｌ2Ｏ3の屈折率１．７を（式３）に代入すると、ｌ＝
０．０６μｍとなる。次に図１（ｂ）では反射防止膜１
３の上に、スピンナ−でレジスト１２を０．２μｍの厚
さに塗布する。その後９０℃で、２０分間プリベ−クし
た後、黒色液体である活性炭を水に溶いたもの１４を基
板の裏面１１ａに塗布し、サンプル台に固定する。
（ｃ）では、Ｈｅ−Ｃｄレ−ザ−１５（λ＝４４１．６
ｎｍ）で干渉露光法により露光する。（露光量４５ｍＪ
／ｃｍ2、交差角θ＝３３．５゜）（ｄ）では、現像液
（ＭＦ３１２：水＝１：１）で５秒間現像し、純水で１
分間リンスする。その後ポストベ−クを９０℃で、２５
分間行う。このようにして深さ０．１μｍ、周期０．４
μｍの回折格子１２ａができる。大きさとして２０ｍｍ
の範囲で回折効率３０％±１％の均一な効率が得られ
た。R 1 = (n 2 2 −n 1 2 ) / (n 2 2 + n 1 2 ) (Equation 1) R 2 = (n 3 2 −n 2 2 ) / (n 3 2 + n 2 2 ) (Equation 2) n 2 l = λ / 4 (Equation 3) If n 1 = 2.2 and n 3 = 1.5 and (Equation 1) = (Equation 2), then n 2 = 1.82 Becomes A close to this
Substituting the refractive index 1.7 of l 2 O 3 into (Equation 3), l =
It becomes 0.06 μm. Next, in FIG. 1B, the antireflection film 1
A resist 12 is applied on the surface of the No. 3 by a spinner to a thickness of 0.2 μm. Then, after prebaking at 90 ° C. for 20 minutes, activated carbon, which is a black liquid, dissolved in water 14 is applied to the back surface 11a of the substrate and fixed to the sample table.
In (c), He-Cd laser-15 (λ = 441.6
exposure) by the interference exposure method. (Exposure amount 45 mJ
/ Cm 2 , crossing angle θ = 33.5 °) (d), development with a developer (MF312: water = 1: 1) was performed for 5 seconds, and pure water was used to
Rinse for a minute. After that, post bake at 90 ° C for 25
Do for a minute. In this way, the depth is 0.1 μm and the period is 0.4.
A μm diffraction grating 12a is formed. 20mm as size
A uniform efficiency of 30% ± 1% was obtained in the range of.
【００１４】このように本実施例による回折格子の製造
方法はレジスト上に深く、均一な干渉縞を得る点で優れ
た効果が得られる。As described above, the method of manufacturing the diffraction grating according to the present embodiment has an excellent effect in obtaining deep and uniform interference fringes on the resist.
【００１５】以上のように本実施例によれば、レジスト
を塗布する前に反射防止膜を形成する事で、ＬｉＴａＯ
3上表面の反射を防ぎ、また、ＬｉＴａＯ3裏面をすりガ
ラスとし、黒色液体を塗布したことで裏面の反射も防
ぎ、深く、均一な干渉縞を形成することができ、いたっ
て簡単に０．４μｍの回折格子を製造することができ
る。さらにレジスト上の回折格子を反射防止膜上に転写
すれば、硬い回折格子を製造することができ、保存しや
すくなる。As described above, according to this embodiment, the LiTaO film is formed by forming the antireflection film before applying the resist.
3 Prevents reflection on the top surface, and also uses LiTaO 3 back surface as frosted glass and black liquid applied to prevent reflection on the back surface to form deep and uniform interference fringes. Can be manufactured. Furthermore, if the diffraction grating on the resist is transferred onto the antireflection film, a hard diffraction grating can be manufactured and storage becomes easy.
【００１６】なお、非線形光学結晶上に反射防止膜を形
成するのみ、または非線形光学結晶の裏面をすりガラス
状とし、前記裏面に黒色液体または固体を塗布するのみ
でも回折格子を製造することができる。The diffraction grating can be manufactured only by forming an antireflection film on the nonlinear optical crystal, or by forming the back surface of the nonlinear optical crystal into a frosted glass shape and coating the back surface with a black liquid or a solid.
【００１７】（実施例２）以下本発明の実施例２につい
て図面を参照しながら説明する。図２は本発明の実施例
２を示す回折格子の製造方法の工程図である。(Second Embodiment) A second embodiment of the present invention will be described below with reference to the drawings. Second Embodiment FIG. 2 is a process diagram of a method of manufacturing a diffraction grating showing a second embodiment of the present invention.
【００１８】まず、（ａ）で非線形光学結晶であるＬｉ
ＴａＯ3２１上に反射防止膜であるＡｌ2Ｏ3２３を（式
３）より０．０５μｍ塗布する。次に（ｂ）ではレジス
ト２２を前記Ａｌ2Ｏ3２３上にスピンナ−で０．２μｍ
塗布する。その後９０℃で、２０分間プリベ−クした
後、ＬｉＴａＯ3２１の裏面２１ａに有機物である２−
Ｍｅｔｈｙｌ−４−ｎｉｔｒｏａｎｉｌｉｎｅ（ＭＮ
Ａ）２４をスピンコ−トする。ＭＮＡは紫外線を吸収す
るため紫外線に対して黒色固体として作用する。そして
Ａｒレ−ザ−２５（λ＝３６５ｎｍ、交差角θ＝６５．
８゜）で干渉露光法により、露光する。（ｄ）では、現
像液（ＭＦ３１２：水＝１：１）で現像し、純水で１分
間リンスし、その後ポストベ−クを９０℃で、２５分間
行う。このようにして、深さ０．１μｍ、周期０．２μ
ｍの回折格子２２ａができあがる。このようにレ−ザ−
の波長と交差角θをかえることで、０．２μｍ周期の回
折格子も実施例１と同様いたって簡単に製造することが
できる。First, in (a), a non-linear optical crystal, Li, is used.
An Al 2 O 3 film 23, which is an antireflection film, is applied onto TaO 3 film 21 by 0.05 μm according to (formula 3). Next, in (b), the resist 22 is spin-coated on the Al 2 O 3 23 by 0.2 μm.
Apply. Then, after prebaking at 90 ° C. for 20 minutes, the back surface 21a of LiTaO 3 21 has an organic substance of 2-
Methyl-4-nitroaniline (MN
A) Spin coat 24. Since MNA absorbs ultraviolet rays, it acts as a black solid against ultraviolet rays. And Ar laser-25 (λ = 365 nm, crossing angle θ = 65.
Exposure is performed by the interference exposure method at 8 °). In (d), it is developed with a developer (MF312: water = 1: 1), rinsed with pure water for 1 minute, and then post-baked at 90 ° C. for 25 minutes. In this way, the depth is 0.1 μm and the cycle is 0.2 μm.
The diffraction grating 22a of m is completed. Like this
By changing the wavelength and the crossing angle θ, a diffraction grating with a 0.2 μm period can be easily manufactured as in the first embodiment.
【００１９】（実施例３）以下本発明の実施例３につい
て説明する。回折格子の製造方法は実施例１と同様であ
る。本実施例ではＬｉＴａＯ3 基板のかわりに屈折率が
ほぼ同じであるＬｉＮｂＯ3 基板を用いた。このように
して得られる回折格子も実施例１と同様、深さ０．１μ
ｍ、周期０．４μｍであり、ＬｉＮｂＯ3でも簡単に回
折格子を作ることができる。(Third Embodiment) A third embodiment of the present invention will be described below. The method of manufacturing the diffraction grating is the same as in the first embodiment. In the present example, a LiNbO 3 substrate having almost the same refractive index was used instead of the LiTaO 3 substrate. The diffraction grating thus obtained has a depth of 0.1 μm as in the first embodiment.
m, the period is 0.4 μm, and a diffraction grating can be easily formed with LiNbO 3 .
【００２０】なお、反射防止膜としてＡｌ2 Ｏ3 を用い
たが、Ｆｅ2Ｏ3、Ｚｎ、Ｂｉでも同様の効果を発揮す
る。Although Al 2 O 3 was used as the antireflection film, Fe 2 O 3 , Zn, and Bi also exhibit the same effect.
【００２１】なお、黒色液体として活性炭を溶いたも
の、または黒色固体としてＭＮＡを用いたが、黒色アル
マイトでも同様の効果を発揮する。その他レ−ザ−光を
吸収する物質であれば、利用することができる。Although activated carbon is dissolved as the black liquid or MNA is used as the black solid, the same effect can be obtained with black alumite. Any other substance that absorbs laser light can be used.
【００２２】[0022]
【発明の効果】以上のように本発明の回折格子の製造方
法によれば、非線形光学結晶にレジストを塗布する前に
反射防止膜を形成する工程または、非線形光学結晶の裏
面をすりガラス状とし、黒色液体または黒色固体を塗布
することにより、非線形光学結晶上の表面反射と、非線
形光学結晶の裏面反射とを抑え、レジスト上に深く、均
一な干渉縞を簡単に形成することができ、優れた回折格
子の製造を実現するものである。As described above, according to the method for manufacturing a diffraction grating of the present invention, the step of forming an antireflection film before applying a resist to a nonlinear optical crystal or the back surface of the nonlinear optical crystal is made into a frosted glass, By applying a black liquid or a black solid, the surface reflection on the nonlinear optical crystal and the back surface reflection of the nonlinear optical crystal can be suppressed, and deep and uniform interference fringes can be easily formed on the resist, which is excellent. It realizes the manufacture of a diffraction grating.
【図１】本発明の実施例１における回折格子の製造方法
の工程断面図FIG. 1 is a process cross-sectional view of a method for manufacturing a diffraction grating in a first embodiment of the present invention.
【図２】本発明の実施例２における回折格子の製造方法
の工程断面図FIG. 2 is a process cross-sectional view of a method for manufacturing a diffraction grating in a second embodiment of the present invention.
【図３】従来例の回折格子の製造方法の工程断面図FIG. 3 is a process sectional view of a method of manufacturing a diffraction grating of a conventional example.
【図４】従来例の課題を示す図FIG. 4 is a diagram showing a problem of a conventional example.
【図５】反射防止膜の原理を示す図FIG. 5 is a diagram showing the principle of an antireflection film.
１１ 非線形光学結晶ＬｉＴａＯ3 １１ａ ＬｉＴａＯ3の裏面 １２ レジスト １２ａ 回折格子 １３ 反射防止膜Ａｌ2Ｏ3 １４ 活性炭 １５ Ｈｅ−Ｃｄレ−ザ ２１ 非線形光学結晶 ＬｉＴａＯ3 ２１ａ ＬｉＴａＯ3の裏面 ２２ レジスト ２２ａ 回折格子 ２３ 反射防止膜Ａｌ2Ｏ3 ２４ ＭＮＡ ２５ Ａｒレ−ザ ３１ 非線形光学結晶ＬｉＴａＯ3 ３２ レジスト ３２ａ 回折格子 ３３ Ｈｅ−Ｃｄレ−ザ ４１ ＬｉＴａＯ3 ４１ａ ＬｉＴａＯ3の裏面 ４２ レジスト ４３ 入射光 ４４ 表面の反射 ４５ 裏面の反射 ５１ 非線形光学結晶 ５１ａ 非線形光学結晶の反射光 ５２ 反射防止膜 ５２ａ 反射防止膜の反射光 ５３ レジスト11 Nonlinear Optical Crystal LiTaO 3 11a Backside of LiTaO 3 12 Resist 12a Diffraction Grating 13 Antireflection Film Al 2 O 3 14 Activated Carbon 15 He-Cd Laser 21 Nonlinear Optical Crystal LiTaO 3 21a LiTaO 3 Backside 22 Resist 22a Diffraction Grating 23 Antireflection film Al 2 O 3 24 MNA 25 Ar laser 31 Non-linear optical crystal LiTaO 3 32 Resist 32a Diffraction grating 33 He-Cd laser 41 LiTaO 3 41a LiTaO 3 back surface 42 Resist 43 Incident light 44 Surface reflection 45 Backside reflection 51 Non-linear optical crystal 51a Non-linear optical crystal reflected light 52 Anti-reflection film 52a Anti-reflection film reflected light 53 Resist
Claims (5)
工程と、前記反射防止膜上にレジストを塗布する工程
と、レ−ザ−光を用いた干渉露光と、現像を行い回折格
子を形成する工程とを含むことを特徴とする回折格子の
製造方法。1. A step of forming an antireflection film on a nonlinear optical crystal, a step of applying a resist on the antireflection film, an interference exposure using laser light, and a development to form a diffraction grating. And a step of forming the diffraction grating.
る工程と，前記非線形光学結晶の裏面にレ−ザ−光を吸
収するための黒色液体または黒色固体を塗布する工程
と、非線形光学結晶上にレジストを塗布する工程と、レ
−ザ−光を用いた干渉露光と、現像を行い回折格子を形
成する工程とを含むことを特徴とする回折格子の製造方
法。2. A step of forming the back surface of the nonlinear optical crystal into a frosted glass shape, a step of applying a black liquid or a black solid for absorbing laser light to the back surface of the nonlinear optical crystal, and A method of manufacturing a diffraction grating, comprising: a step of applying a resist on the substrate; an interference exposure using a laser beam; and a step of developing to form a diffraction grating.
（０≦Ｘ≦１）であることを特徴とする請求項１または
２記載の回折格子の製造方法。3. The nonlinear optical crystal is LiNb X Ta 1-X O 3
The method of manufacturing a diffraction grating according to claim 1 or 2, wherein (0 ≦ X ≦ 1).
とする請求項１記載の回折格子の製造方法。4. The method of manufacturing a diffraction grating according to claim 1, wherein the antireflection film is Al 2 O 3 .
とを特徴とする請求項２記載の回折格子の製造方法。5. The method for producing a diffraction grating according to claim 2, wherein the black liquid or the black solid is activated carbon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21551393A JPH0798404A (en) | 1993-08-02 | 1993-08-31 | Production of diffraction grating |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5-191084 | 1993-08-02 | ||
| JP19108493 | 1993-08-02 | ||
| JP21551393A JPH0798404A (en) | 1993-08-02 | 1993-08-31 | Production of diffraction grating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0798404A true JPH0798404A (en) | 1995-04-11 |
Family
ID=26506486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21551393A Pending JPH0798404A (en) | 1993-08-02 | 1993-08-31 | Production of diffraction grating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0798404A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1070974A1 (en) * | 1999-07-21 | 2001-01-24 | SA Highwave Optical Technologies | Apodization process of photoinscripted Bragg graring |
| EP1070973A1 (en) * | 1999-07-21 | 2001-01-24 | Highwave Optical Technologies S.A. | Optical waveguide with improved photoinscription |
| JP2002169010A (en) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | Diffraction optical element |
| JP2008107566A (en) * | 2006-10-25 | 2008-05-08 | Shimadzu Corp | Manufacturing method of diffraction grating |
| JP2010066296A (en) * | 2008-09-08 | 2010-03-25 | Nitto Denko Corp | Method for manufacturing light diffusion film, light diffusion film, polarizing plate and liquid crystal display apparatus |
| WO2012157697A1 (en) * | 2011-05-19 | 2012-11-22 | 株式会社日立製作所 | Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method |
| GB2581251A (en) * | 2018-12-12 | 2020-08-12 | Oz Optics Ltd | A broadband THz receiver using thick patterned semiconductor crystals |
-
1993
- 1993-08-31 JP JP21551393A patent/JPH0798404A/en active Pending
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1070974A1 (en) * | 1999-07-21 | 2001-01-24 | SA Highwave Optical Technologies | Apodization process of photoinscripted Bragg graring |
| EP1070973A1 (en) * | 1999-07-21 | 2001-01-24 | Highwave Optical Technologies S.A. | Optical waveguide with improved photoinscription |
| FR2796728A1 (en) * | 1999-07-21 | 2001-01-26 | France Telecom | PHOTO-WRITTEN BRAGG NETWORK PROCESSING PROCESS |
| FR2796727A1 (en) * | 1999-07-21 | 2001-01-26 | France Telecom | OPTICAL GUIDE FOR ENHANCED PHOTO-REGISTRATION |
| US6574395B1 (en) | 1999-07-21 | 2003-06-03 | Sa Highwave Optical Technologies | Photowritten Bragg grating apodization method |
| JP2002169010A (en) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | Diffraction optical element |
| JP2008107566A (en) * | 2006-10-25 | 2008-05-08 | Shimadzu Corp | Manufacturing method of diffraction grating |
| JP4650390B2 (en) * | 2006-10-25 | 2011-03-16 | 株式会社島津製作所 | Diffraction grating manufacturing method |
| JP2010066296A (en) * | 2008-09-08 | 2010-03-25 | Nitto Denko Corp | Method for manufacturing light diffusion film, light diffusion film, polarizing plate and liquid crystal display apparatus |
| US8693100B2 (en) | 2008-09-08 | 2014-04-08 | Nitto Denko Corporation | Method of manufacturing light diffusion film, light diffusion film, polarizing plate, and liquid crystal display |
| WO2012157697A1 (en) * | 2011-05-19 | 2012-11-22 | 株式会社日立製作所 | Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method |
| CN103688198A (en) * | 2011-05-19 | 2014-03-26 | 株式会社日立高新技术 | Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method |
| JPWO2012157697A1 (en) * | 2011-05-19 | 2014-07-31 | 株式会社日立ハイテクノロジーズ | Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method |
| GB2581251A (en) * | 2018-12-12 | 2020-08-12 | Oz Optics Ltd | A broadband THz receiver using thick patterned semiconductor crystals |
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