JPH0794694A - Solid state image sensor - Google Patents

Solid state image sensor

Info

Publication number
JPH0794694A
JPH0794694A JP23833393A JP23833393A JPH0794694A JP H0794694 A JPH0794694 A JP H0794694A JP 23833393 A JP23833393 A JP 23833393A JP 23833393 A JP23833393 A JP 23833393A JP H0794694 A JPH0794694 A JP H0794694A
Authority
JP
Japan
Prior art keywords
state image
light
image sensor
solid state
output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23833393A
Other languages
Japanese (ja)
Inventor
Yasushi Maruyama
康 丸山
Yasuto Maki
康人 真城
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP23833393A priority Critical patent/JPH0794694A/en
Publication of JPH0794694A publication Critical patent/JPH0794694A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a CCD solid state image sensor in which the incidence of light to a charge detecting part is blocked, the dark current is reduced, the output dynamic range is prevented from lowering, and the operation of peripheral circuit is stabilized by laminating the dye layers of respective colors of an on-chip filter at least on the charge detecting part of solid state image sensor thereby forming a shading film. CONSTITUTION:Dye layers of three colors M, Cy, Y of an on-chip color filter 19 at an image pick-up part 14 are superposed to form a shading film 27 on the output part 18 of a solid state image sensor including a signal charge detecting part 16 and the peripheral circuit part 20 thereof. Consequently, when a bright light source such as the sun is sensed, incidence of light to the output part 18, especially to the signal charge detecting part 16 thereof, is blocked thus retarding generation of dark current through photoelectric conversion. This structure reduces the dark current with no adverse effect on the high sensitivity and high operating speed and without sacrifice of the output dynamic range of solid state image sensor.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、固体撮像素子に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device.

【0002】[0002]

【従来の技術】CCD固体撮像素子として、IT(イン
ターライントランスファ)型のCCD固体撮像素子が知
られている。図3は、IT型CCD固体撮像素子の全体
の構成を示す。IT型CCD固体撮像素子1は、画素と
なる多数の受光部2がマトリックス状に配列され、各受
光部列の一側にCCD構造の垂直転送レジスタ3が設け
られた撮像部4と、CCD構造の水平転送レジスタ5
と、水平転送レジスタ5の終段に接続された例えばフロ
ーティングディフージョン領域又はフローティングゲー
ト等の信号電荷検出部6及びこれに接続された出力アン
プ7からなる出力部8とを有して成る。
2. Description of the Related Art As a CCD solid-state image pickup device, an IT (interline transfer) type CCD solid-state image pickup device is known. FIG. 3 shows the overall configuration of the IT type CCD solid-state image sensor. The IT type CCD solid-state image pickup device 1 has a large number of light receiving parts 2 which are arranged in a matrix, and an image pickup part 4 in which a vertical transfer register 3 having a CCD structure is provided on one side of each light receiving part row, and a CCD structure. Horizontal transfer register 5
And a signal charge detection unit 6 such as a floating diffusion region or a floating gate connected to the final stage of the horizontal transfer register 5 and an output unit 8 including an output amplifier 7 connected to the signal charge detection unit 6.

【0003】垂直転送レジスタ3及び水平転送レジスタ
5には、光が入射されないように例えばAlによる遮光
膜が形成される。また、撮像部4上には所謂オンチップ
カラーフィルタ9が形成され、例えば補色系フィルタの
場合には、各受光部2上に夫々対応するマゼンタ
(M)、シアン(Cy)及びイエロー(Y)の染色層が
形成される。撮像部4の周辺部では図示せざるも、周辺
回路が形成される。
A light shielding film made of, for example, Al is formed on the vertical transfer register 3 and the horizontal transfer register 5 so that light is not incident thereon. A so-called on-chip color filter 9 is formed on the image pickup section 4. For example, in the case of a complementary color filter, magenta (M), cyan (Cy) and yellow (Y) respectively corresponding to each light receiving section 2 are formed. The dyed layer is formed. Although not shown, peripheral circuits are formed in the peripheral portion of the imaging unit 4.

【0004】この撮像素子1では、各受光部2からの信
号電荷が垂直転送レジスタ3へ読み出され、垂直転送レ
ジスタ3から1ライン毎の信号電荷が水平転送レジスタ
5へ転送された後、水平転送レジスタ5内を順次転送
し、信号電荷検出部6にて電荷−電圧変換され、出力ア
ンプ7よりCCD出力が得られるようになされる。
In the image pickup device 1, the signal charges from the respective light receiving portions 2 are read out to the vertical transfer register 3, and the signal charges for each line are transferred from the vertical transfer register 3 to the horizontal transfer register 5 and then horizontally. The signals are sequentially transferred in the transfer register 5, converted into charge-voltage by the signal charge detection unit 6, and CCD output is obtained from the output amplifier 7.

【0005】[0005]

【発明が解決しようとする課題】ところで、上述したC
CD固体撮像素子1、即ち一般用途向けの固体撮像素子
では、従来、出力部8及び周辺回路部10は遮光されて
いない。これは、配線の加工上の問題や、Al遮光膜を
形成した場合にAl遮光膜と信号電荷検出部6間で容量
が増え、高感度化、高速化に不利となるためである。
By the way, the above-mentioned C
In the CD solid-state image pickup device 1, that is, in the solid-state image pickup device for general use, the output unit 8 and the peripheral circuit unit 10 have not been shielded from light. This is because there is a problem in processing the wiring, and when the Al light-shielding film is formed, the capacity between the Al light-shielding film and the signal charge detection unit 6 increases, which is disadvantageous in achieving higher sensitivity and higher speed.

【0006】しかし、遮光しない場合、例えば太陽等の
明るい光源を写した時に、たまたま撮像領域の外にある
出力部、特に信号電荷検出部6に強い光が当り、そこで
光電変換して暗電流となることがある。この現象は特に
駆動周波数が低い場合に顕著である。
However, in the case where the light is not shielded, for example, when a bright light source such as the sun is photographed, the output portion, especially the signal charge detection portion 6 outside the image pickup area happens to be exposed to strong light, and photoelectric conversion is performed there to generate dark current. May be. This phenomenon is remarkable especially when the driving frequency is low.

【0007】例えばカメラのオートフォーカス用センサ
では駆動周波数が通常のテレビ用のイメージセンサの駆
動周波数より低く、例えば100KHz程度である。こ
の場合、信号電荷が電荷検出部、例えばフローティング
ディフージョン領域6に蓄積されている時間が長くなる
ため、このフローティングディフージョン領域6で光電
変換される時間が長くなり、暗電流が大幅に増加するこ
とになる。
For example, the drive frequency of an auto-focus sensor of a camera is lower than the drive frequency of a normal television image sensor, for example, about 100 KHz. In this case, since the signal charge is accumulated in the charge detection portion, for example, the floating diffusion region 6 for a long time, the time for photoelectric conversion in the floating diffusion region 6 is increased, and the dark current is significantly increased. It will be.

【0008】かかる場合、その時出力されている画素は
黒レベルが上がるので、本来よりも暗く見えてしまうこ
とになる。同じ理由で出力のダイナミックレンジが小さ
くなってしまう。
In such a case, the black level of the pixel being output at that time increases, so that the pixel appears darker than it should be. For the same reason, the output dynamic range becomes smaller.

【0009】一方、周辺回路部10のトランジスタに光
が当たると、即ち、ゲート下に光が入射されると変調さ
れ、例えばカットオフ時の電流が増え、回路動作が不安
定になる。
On the other hand, when the transistor of the peripheral circuit section 10 is exposed to light, that is, when light is incident under the gate, it is modulated, for example, the current at the cutoff increases and the circuit operation becomes unstable.

【0010】本発明は、上述の点に鑑み、暗電流の低減
等を可能にした固体撮像素子を提供するものである。
In view of the above points, the present invention provides a solid-state image pickup device capable of reducing dark current.

【0011】[0011]

【課題を解決するための手段】本発明は、固体撮像素子
の少なくとも電荷検出部16上にオンチップフィルタ1
9の各色M,Cy,Yを重ねた積層膜27による遮光膜
を形成して構成する。
According to the present invention, the on-chip filter 1 is provided on at least the charge detection portion 16 of the solid-state image pickup device.
The light-shielding film is formed by the laminated film 27 in which the respective colors M, Cy, and Y of 9 are stacked.

【0012】[0012]

【作用】本発明においては、少なくとも電荷検出部16
上にオンチップカラーフィルタ19の各色M,Cy,Y
を重ねた積層膜による遮光膜27を形成することによ
り、電荷検出部16への光の入射が阻止される。このた
め、電荷検出部16での光電変換による暗電流の発生が
抑えられ、固体撮像素子の暗電流の低減が図れる。同時
に出力のタイナミックレンジの低下を防止できる。
In the present invention, at least the charge detector 16
Each color M, Cy, Y of the on-chip color filter 19
By forming the light-shielding film 27 made of a laminated film in which light is overlapped, the incidence of light on the charge detection unit 16 is blocked. Therefore, the generation of dark current due to photoelectric conversion in the charge detection unit 16 is suppressed, and the dark current of the solid-state image sensor can be reduced. At the same time, it is possible to prevent a decrease in the output dynamic range.

【0013】そして、遮光膜27として、オンチップカ
ラーフィルタ19の各色による積層膜で形成することに
より、電荷検出部16の拡散層との間で容量が形成され
ることがなく、固体撮像素子の高感度化、高速化を損な
うことがない。
Since the light shielding film 27 is formed of a laminated film for each color of the on-chip color filter 19, no capacitance is formed between the on-chip color filter 19 and the diffusion layer of the charge detection unit 16, and the solid-state image pickup device High sensitivity and high speed are not impaired.

【0014】また、周辺回路部20上にも、同様にオン
チップカラーフィルタ19の各色を重ねた積層膜による
遮光膜27を形成するときには、周辺回路部20のトラ
ンジスタへの光入射が阻止され、カットオフ時の電流増
加がなく確実なトランジスタ動作を行わせることができ
る。
Similarly, when the light-shielding film 27 made of a laminated film in which the respective colors of the on-chip color filter 19 are overlapped is formed on the peripheral circuit section 20, light incidence on the transistors of the peripheral circuit section 20 is blocked, A reliable transistor operation can be performed without an increase in current at the cutoff.

【0015】[0015]

【実施例】以下、図面を参照して本発明による固体撮像
素子の実施例を説明する。
Embodiments of the solid-state image pickup device according to the present invention will be described below with reference to the drawings.

【0016】図1は、本発明によるIT型のCCD固体
撮像素子の一例を示す。本例のCCD固体撮像素子11
は、画素となる多数の受光部12がマトリックス状に配
列され、各受光部列の一側に信号電荷を垂直方向に転送
するためのCCD構造の垂直転送レジスタ13が設けら
れてなる撮像部14と、撮像部14の下端に信号電荷を
水平方向に転送するCCD構造の水平転送レジスタ15
と、水平転送レジスタの終段に接続された例えばフロー
ティングディフージョン領域、フローティングゲート等
の信号電荷検出部16及び出力アンプ17からなる出力
部18とを備え、更に周辺部に駆動回路等の周辺回路が
形成されて成る。
FIG. 1 shows an example of an IT type CCD solid-state image pickup device according to the present invention. CCD solid-state image sensor 11 of this example
Is an image pickup section 14 in which a large number of light receiving sections 12 to be pixels are arranged in a matrix, and a vertical transfer register 13 having a CCD structure for vertically transferring signal charges is provided on one side of each light receiving section row. And a horizontal transfer register 15 having a CCD structure for horizontally transferring the signal charges to the lower end of the imaging unit 14.
And a signal charge detection unit 16 such as a floating diffusion region and a floating gate connected to the final stage of the horizontal transfer register, and an output unit 18 including an output amplifier 17, and a peripheral circuit such as a drive circuit in the peripheral portion. Are formed.

【0017】垂直転送レジスタ13及び水平転送レジス
タ15には、光が入射されないように例えばAlによる
遮光膜が形成される。撮像部14上にはオンチップカラ
ーフィルタ19が形成され、例えば補色系フィルタの場
合には、対応する受光部12上に夫々マゼンタ(M)、
シアン(Cy)及びイエロー(Y)の各染色層が形成さ
れる。
A light shielding film made of, for example, Al is formed on the vertical transfer register 13 and the horizontal transfer register 15 so that light is not incident thereon. An on-chip color filter 19 is formed on the image pickup unit 14. For example, in the case of a complementary color system filter, magenta (M) and M are respectively provided on the corresponding light receiving units 12.
Cyan (Cy) and yellow (Y) dyed layers are formed.

【0018】即ち、図2の断面図で示すように、撮像部
14では、受光部2を構成する例えばフォトダイオード
(光電変換素子)、垂直転送レジスタ13の転送チャン
ネル領域等が形成された半導体基体21の表面に、ゲー
ト絶縁膜を介して多結晶シリコンからなる転送電極22
が形成され、この転送電極22を覆うように絶縁膜を介
してAl遮光膜23が形成される。そして、平坦化膜2
4を介して各受光部12上に夫々対応するマゼンタ
(M)、シアン(Cy)及びイエロー(Y)の染色層か
らなるオンチップカラーフィルタ19が形成され、更に
このカラーフィルタ19上に入射光を各受光部12に集
光させるためのオンチップマイクロレンズ25が形成さ
れる。
That is, as shown in the sectional view of FIG. 2, in the image pickup section 14, for example, a photodiode (photoelectric conversion element) which constitutes the light receiving section 2, a semiconductor substrate in which a transfer channel region of the vertical transfer register 13 and the like are formed. Transfer electrode 22 made of polycrystalline silicon on the surface of 21 via a gate insulating film.
Is formed, and an Al light-shielding film 23 is formed so as to cover the transfer electrode 22 via an insulating film. Then, the flattening film 2
An on-chip color filter 19 composed of corresponding dyed layers of magenta (M), cyan (Cy) and yellow (Y) is formed on each of the light-receiving units 12 through 4, and incident light is further incident on the color filter 19. An on-chip microlens 25 for condensing light on each light receiving unit 12 is formed.

【0019】このCCD固体撮像素子11の動作(信号
電荷の読み出し)は前述と同様であるので重複説明は省
略する。
Since the operation of the CCD solid-state image pickup device 11 (reading of signal charges) is the same as that described above, duplicated description will be omitted.

【0020】そして、本例では、特に、出力部18と周
辺回路部20の全体に、図1の斜線で示すように、オン
チップカラーフィルタ19の全色即ちマゼンタ(M)、
シアン(Cy)及びイエロー(Y)の3色の染色層を重
ねた積層膜による遮光膜27が形成される。
In the present embodiment, in particular, all the colors of the on-chip color filter 19, that is, magenta (M), on the entire output section 18 and the peripheral circuit section 20, as shown by the diagonal lines in FIG.
A light shielding film 27 is formed by a laminated film in which dye layers of three colors of cyan (Cy) and yellow (Y) are stacked.

【0021】即ち、オンチップカラーフィルタの形成工
程において、出力部18及び周辺回路部20まで広げた
マスクを用いて露光し、之を各色の染色層について繰り
返し行って図2に示すように、出力部18(周辺回路部
20も同様)上に、撮像部14のカラーフィルタ19の
形成と同時に、マゼンタ(M)、シアン(Cy)及びイ
エロー(Y)の3色の染色層を全て重ねてなる遮光膜2
7が形成される。この遮光膜27上には、オンチップマ
イクロレンズ25と同じ材料による保護膜28が形成さ
れる。
That is, in the process of forming the on-chip color filter, exposure is performed by using the mask expanded to the output section 18 and the peripheral circuit section 20, and the process is repeated for each dyed layer of each color to output as shown in FIG. Simultaneously with the formation of the color filter 19 of the imaging unit 14, the dye layers of three colors of magenta (M), cyan (Cy), and yellow (Y) are all overlaid on the unit 18 (the peripheral circuit unit 20 is the same). Shading film 2
7 is formed. A protective film 28 made of the same material as the on-chip microlens 25 is formed on the light shielding film 27.

【0022】上述した本実施例によれば、固体撮像素子
の出力部18及び周辺回路部20上に、撮像部14にお
けるオンチップカラーフィルタ19の染色層を利用し
て、その3色(M),(Cy),(Y)の染色層を全て
重ねてなる遮光膜27を形成することにより、出力部1
8及び周辺回路部20への光入射が阻止される。一般に
使われている補色系オンチップカラーフィルタの場合、
3色を重ねた積層膜27の透過率は0〜30%程度の低
さである。
According to the above-described embodiment, the dye layer of the on-chip color filter 19 in the image pickup section 14 is used on the output section 18 and the peripheral circuit section 20 of the solid-state image pickup element to obtain the three colors (M). , (Cy), (Y) dyeing layers are all stacked to form the light-shielding film 27, so that the output unit 1
8 and the peripheral circuit section 20 are prevented from entering the light. In case of commonly used complementary color on-chip color filter,
The transmittance of the laminated film 27 in which the three colors are overlapped is as low as 0 to 30%.

【0023】従って、例えば太陽等の明るい光源を写し
た時でも、出力部18の特に信号電荷検出部(例えばフ
ローティングディフージョン領域、フローティングゲー
ト等)16への光入射が阻止され、光電変換により暗電
流が生じるのを抑えることができる。このため、固体撮
像素子の暗電流を低減することができる。
Therefore, even when a bright light source such as the sun is photographed, light is blocked from entering the signal charge detecting section 16 (eg, floating diffusion region, floating gate, etc.) 16 of the output section 18, and is darkened by photoelectric conversion. It is possible to suppress the generation of electric current. Therefore, the dark current of the solid-state image sensor can be reduced.

【0024】また、本例の遮光膜27は、Al等の導電
膜ではなく、オンチップカラーフィルタ19を利用した
遮光膜であるため、信号電荷検出部16、例えばフロー
ティングディフージョン領域との間で容量が形成される
こともなく、高感度化、高速化を妨げることがない。同
時に、固体撮像素子の出力のダイナミックレンジの低下
を防止することができる。本実施例は、特にカメラのオ
ートフォーカス用センサに適用して好適である。
Since the light-shielding film 27 of this example is not a conductive film of Al or the like but a light-shielding film utilizing the on-chip color filter 19, the light-shielding film 27 is formed between the signal charge detecting portion 16 and the floating diffusion region. No capacitance is formed, and there is no hindrance to higher sensitivity and higher speed. At the same time, it is possible to prevent a decrease in the dynamic range of the output of the solid-state image sensor. This embodiment is particularly suitable for application to a camera autofocus sensor.

【0025】さらに、周辺回路部20においても、遮光
膜27によって、周辺回路のトランジスタに光が当たら
ないので、例えばカットオフ時の電流増加もなく、回路
動作を安定にすることができる。
Further, in the peripheral circuit section 20 as well, since the light shielding film 27 does not illuminate the transistors in the peripheral circuit, the circuit operation can be stabilized without an increase in the current at the cutoff, for example.

【0026】尚、上例では遮光膜27として、補色系オ
ンチップカラーフィルタの3色を重ねて形成したが、そ
の他、赤,緑,青のオンチップカラーフィルタを用いる
ときは、その赤,緑,青の3色の染色層を重ねた遮光膜
を用いることもできる。
In the above example, the light-shielding film 27 is formed by superimposing three colors of complementary color on-chip color filters. However, when using red, green, and blue on-chip color filters, the red and green colors are used. It is also possible to use a light-shielding film in which dye layers of three colors of blue are stacked.

【0027】また上例では、本発明をIT型CCD固体
撮像素子に適用したが、その他、例えばFIT(フレー
ム インターライン トランスファ)型のCCD固体撮
像素子等にも適用できる。
In the above example, the present invention is applied to the IT type CCD solid-state image pickup device, but it is also applicable to, for example, an FIT (frame interline transfer) type CCD solid-state image pickup device.

【0028】[0028]

【発明の効果】本発明によれば、固体撮像素子の少なく
とも信号電荷検出部上にオンチップカラーフィルタの各
色を重ねてなる遮光膜を形成したことにより、暗電流を
低減することができ、また出力のダイナミックレンジの
低下を防止することができる。従って、信頼性の高い固
体撮像素子を提供することができる。
According to the present invention, the dark current can be reduced by forming the light-shielding film formed by superimposing the respective colors of the on-chip color filter on at least the signal charge detecting portion of the solid-state image sensor. It is possible to prevent a decrease in the output dynamic range. Therefore, a highly reliable solid-state image sensor can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るCCD固体撮像素子の一例を示す
構成図である。
FIG. 1 is a configuration diagram showing an example of a CCD solid-state imaging device according to the present invention.

【図2】本発明に係るCCD固体撮像素子の一例を示す
要部の断面図である。
FIG. 2 is a sectional view of essential parts showing an example of a CCD solid-state imaging device according to the present invention.

【図3】従来のCCD固体撮像素子の構成図である。FIG. 3 is a configuration diagram of a conventional CCD solid-state imaging device.

【符号の説明】[Explanation of symbols]

1,11 CCD固体撮像素子 2,12 受光部 3,13 垂直転送レジスタ 4,14 撮像部 5,15 水平転送レジスタ 6,16 信号電荷検出部 7,17 出力アンプ 8,18 出力部 19 オンチップカラーフィルタ 10,20 周辺回路部 21 半導体基体 22 転送電極 23 Al遮光膜 24 平坦化膜 25 オンチップマイクロレンズ 27 遮光膜 28 保護膜 M マゼンタ Cy シアン Y イエロー 1, 11 CCD solid-state imaging device 2, 12 light receiving part 3, 13 vertical transfer register 4, 14 imaging part 5, 15 horizontal transfer register 6, 16 signal charge detection part 7, 17 output amplifier 8, 18 output part 19 on-chip color Filters 10, 20 Peripheral circuit part 21 Semiconductor substrate 22 Transfer electrode 23 Al light-shielding film 24 Flattening film 25 On-chip microlens 27 Light-shielding film 28 Protective film M Magenta Cy Cyan Y Yellow

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 固体撮像素子の少なくとも電荷検出部上
に、オンチップカラーフィルタの各色を重ねた積層膜に
よる遮光膜が形成されて成ることを特徴とする固体撮像
素子。
1. A solid-state image sensor, comprising a solid-state image sensor having a light-shielding film formed on at least a charge detection portion, the light-shielding film being a laminated film in which respective colors of an on-chip color filter are overlapped.
JP23833393A 1993-09-24 1993-09-24 Solid state image sensor Pending JPH0794694A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23833393A JPH0794694A (en) 1993-09-24 1993-09-24 Solid state image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23833393A JPH0794694A (en) 1993-09-24 1993-09-24 Solid state image sensor

Publications (1)

Publication Number Publication Date
JPH0794694A true JPH0794694A (en) 1995-04-07

Family

ID=17028653

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23833393A Pending JPH0794694A (en) 1993-09-24 1993-09-24 Solid state image sensor

Country Status (1)

Country Link
JP (1) JPH0794694A (en)

Cited By (6)

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Publication number Priority date Publication date Assignee Title
JP2000323696A (en) * 1999-03-31 2000-11-24 Xerox Corp Photosensitive chip and assembly
US7030918B1 (en) 1999-06-30 2006-04-18 Nec Electronics Corporation Solid-state image pickup device
JP2006156545A (en) * 2004-11-26 2006-06-15 Canon Inc Photoelectric conversion device, multichip type image sensor, and contact type image sensor
KR100736524B1 (en) * 2001-12-14 2007-07-06 매그나칩 반도체 유한회사 Image sensor
JP2009218382A (en) * 2008-03-11 2009-09-24 Sony Corp Solid state imaging device, manufacturing method thereof and imaging device
JP2012099639A (en) * 2010-11-02 2012-05-24 Toppan Printing Co Ltd Image sensor and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000323696A (en) * 1999-03-31 2000-11-24 Xerox Corp Photosensitive chip and assembly
US7030918B1 (en) 1999-06-30 2006-04-18 Nec Electronics Corporation Solid-state image pickup device
KR100736524B1 (en) * 2001-12-14 2007-07-06 매그나칩 반도체 유한회사 Image sensor
JP2006156545A (en) * 2004-11-26 2006-06-15 Canon Inc Photoelectric conversion device, multichip type image sensor, and contact type image sensor
JP2009218382A (en) * 2008-03-11 2009-09-24 Sony Corp Solid state imaging device, manufacturing method thereof and imaging device
US8895346B2 (en) 2008-03-11 2014-11-25 Sony Corporation Solid-state imaging device, manufacturing method for the same, and imaging apparatus
JP2012099639A (en) * 2010-11-02 2012-05-24 Toppan Printing Co Ltd Image sensor and method of manufacturing the same

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