JP2001210812A - Solid-state image pickup device and solid-state image pickup system provided with the same - Google Patents
Solid-state image pickup device and solid-state image pickup system provided with the sameInfo
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- JP2001210812A JP2001210812A JP2000019227A JP2000019227A JP2001210812A JP 2001210812 A JP2001210812 A JP 2001210812A JP 2000019227 A JP2000019227 A JP 2000019227A JP 2000019227 A JP2000019227 A JP 2000019227A JP 2001210812 A JP2001210812 A JP 2001210812A
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- 230000005484 gravity Effects 0.000 claims abstract description 36
- 238000006243 chemical reaction Methods 0.000 claims abstract description 15
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 238000003384 imaging method Methods 0.000 claims description 73
- 238000000034 method Methods 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 abstract description 13
- 238000010586 diagram Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 102100032566 Carbonic anhydrase-related protein 10 Human genes 0.000 description 1
- 101000867836 Homo sapiens Carbonic anhydrase-related protein 10 Proteins 0.000 description 1
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- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、集光された光を電
気信号に変換する画素を複数備えた固体撮像装置及び固
体撮像システムに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state imaging device and a solid-state imaging system having a plurality of pixels for converting collected light into an electric signal.
【0002】[0002]
【従来の技術】従来、固体撮像装置は、たとえば特開平
05−040201号公報に記載されているように、受
光光を電気信号に変換するフォトダイオードなどの光電
変換素子と、光電変換素子に光を入射させるために集光
するマイクロレンズとを備えている。2. Description of the Related Art Conventionally, a solid-state imaging device includes a photoelectric conversion element such as a photodiode for converting received light into an electric signal and a photoelectric conversion element as described in Japanese Patent Application Laid-Open No. 05-040201. And a microlens for condensing light to make the light incident.
【0003】ここで、マイクロレンズは、近年の画素の
小型化に伴って、フォトダイオードにおける受光光が減
少することによって、フォトダイオードの受光感度が低
下するのを防止するために備えられているものである。Here, the microlenses are provided to prevent a decrease in light reception sensitivity of the photodiode due to a decrease in light reception in the photodiode due to recent miniaturization of pixels. It is.
【0004】図7(a)は、従来の固体撮像装置の平面
図である。図7(b)は、図7(a)に示した固体撮像
装置の各画素の断面図である。図7(a)、図7(b)
おいて、1はシリコン基板(Si基板)7上にフォトダ
イオード5を有する画素、2は画素1のうちフォトダイ
オード5以外の領域を遮光する遮光層、3は画素1のフ
ォトダイオード5に光を入射させるための開口領域、4
はフォトダイオード5に光を集光するマイクロレンズ、
6はたとえば青・赤・緑などのカラーフィルタ層であ
る。FIG. 7A is a plan view of a conventional solid-state imaging device. FIG. 7B is a cross-sectional view of each pixel of the solid-state imaging device shown in FIG. FIGS. 7A and 7B
Here, 1 is a pixel having a photodiode 5 on a silicon substrate (Si substrate) 7, 2 is a light-shielding layer that blocks a region other than the photodiode 5 in the pixel 1, and 3 is a light-shielding layer for the photodiode 5 of the pixel 1. Open area for incidence 4
Is a micro lens for condensing light on the photodiode 5,
Reference numeral 6 denotes a color filter layer for, for example, blue, red, and green.
【0005】図7(a)に示したように、従来の固体撮
像装置には、複数の画素1が配列されている。また、図
7(b)に示したように、各画素1のフォトダイオード
5の受光部の位置に合わせて開口領域3及びマイクロレ
ンズ4が同一ピッチで形成されており、マイクロレンズ
4によって集光された光の光軸と開口領域3の重心とが
一致する。これにより、マイクロレンズ4を介した光
は、フォトダイオード5の受光部のほぼ中心に集光され
る。As shown in FIG. 7A, a plurality of pixels 1 are arranged in a conventional solid-state imaging device. Also, as shown in FIG. 7B, the aperture regions 3 and the micro lenses 4 are formed at the same pitch in accordance with the position of the light receiving portion of the photodiode 5 of each pixel 1, and the light is condensed by the micro lenses 4. The optical axis of the emitted light coincides with the center of gravity of the aperture region 3. As a result, the light passing through the microlens 4 is focused on almost the center of the light receiving portion of the photodiode 5.
【0006】このように、従来、各画素1のフォトダイ
オード5の位置に対応させてマイクロレンズ4の位置を
定めているため、画素1の小型化によって開口領域3の
開口面積が少なくなっても、マイクロレンズ4により光
を集光することによって受光感度の低下を防止してい
る。As described above, since the position of the microlens 4 is conventionally determined in accordance with the position of the photodiode 5 of each pixel 1, even if the opening area of the opening region 3 is reduced by the downsizing of the pixel 1, In addition, the light is condensed by the micro lens 4 to prevent the light receiving sensitivity from lowering.
【0007】[0007]
【発明が解決しようとする課題】しかし、従来の技術
は、固体撮像装置の画素の配置位置によって、マイクロ
レンズによって集光された光の一部が、フォトダイオー
ドに到達しないものがあり、このため、固体撮像装置の
受光感度にばらつきが生じる場合があった。However, in the prior art, a part of the light condensed by the microlens does not reach the photodiode depending on the arrangement position of the pixels of the solid-state imaging device. In some cases, the light receiving sensitivity of the solid-state imaging device varies.
【0008】図8(a)、図8(b)は、上記問題が生
じる原理の説明図である。図8(a)、図8(b)にお
いて、10は固体撮像装置によって撮像される被写体、
11は被写体10からの光を固体撮像装置上へ結像させ
る撮像レンズである。なお、図8(a)、図8(b)に
おいて、図7(a)、図7(b)に示した部分と同様の
部分には、同一の符号を付している。FIGS. 8A and 8B are explanatory diagrams of the principle in which the above problem occurs. 8A and 8B, reference numeral 10 denotes a subject imaged by the solid-state imaging device;
Reference numeral 11 denotes an imaging lens that forms light from the subject 10 on a solid-state imaging device. In FIGS. 8A and 8B, the same parts as those shown in FIGS. 7A and 7B are denoted by the same reference numerals.
【0009】また、図8(a)、図8(b)において、
(ii)は、固体撮像装置の中心付近に配置されている画
素である。(i)及び(iii) は固体撮像装置の周辺に配
置されている画素である。In FIGS. 8 (a) and 8 (b),
(Ii) is a pixel arranged near the center of the solid-state imaging device. (I) and (iii) are pixels arranged around the solid-state imaging device.
【0010】図8(a)に示すように、被写体10から
の光は、撮像レンズ11を介して固体撮像装置上へ結像
される。ここで、たとえば図8(b)(ii)に示す画素
へ送られた被写体10からの光は、マイクロレンズ4を
介してフォトダイオード5に入射される。As shown in FIG. 8A, light from a subject 10 is imaged on a solid-state imaging device via an imaging lens 11. Here, for example, light from the subject 10 sent to the pixels shown in FIGS. 8B and 8B enters the photodiode 5 via the microlens 4.
【0011】一方、図8(b)(i),図8(b)(i
i)に示す画素へ送られた被写体10からの光は、マイ
クロレンズ4を介した後に、一部が遮光層2の遮光領域
により遮られ、フォトダイオード5に入射されない。こ
のため、画素が撮影レンズから近いものと遠いものとで
受光感度のばらつきをなくすことができなかった。On the other hand, FIGS. 8 (b) (i) and 8 (b) (i)
The light from the subject 10 sent to the pixel shown in i) passes through the microlens 4 and is partially blocked by the light-blocking region of the light-blocking layer 2 and does not enter the photodiode 5. For this reason, it has not been possible to eliminate variations in light receiving sensitivity between a pixel close to the photographing lens and a pixel far from the photographing lens.
【0012】図9は、図8に示した固体撮像装置の出力
信号を示す図である。図9に示すように、従来の固体撮
像装置の出力信号の平均値に対して、出力信号の最大値
と最小値との開きは、10%以上である。FIG. 9 is a diagram showing output signals of the solid-state imaging device shown in FIG. As shown in FIG. 9, the difference between the maximum value and the minimum value of the output signal of the conventional solid-state imaging device is 10% or more.
【0013】すなわち、従来の固体撮像装置の出力信号
の平均値を100mVとしたときに、出力信号の最大値
が105mV以上、最小値が95mV以下である。な
お、一般に、固体撮像装置の出力信号は、平均値に対し
て最大値と最小値との開きが10%より小さければ、再
生画像に影響がないレベルと考えられている。That is, when the average value of the output signal of the conventional solid-state imaging device is 100 mV, the maximum value of the output signal is 105 mV or more and the minimum value is 95 mV or less. In general, the output signal of the solid-state imaging device is considered to have a level that does not affect the reproduced image if the difference between the maximum value and the minimum value with respect to the average value is smaller than 10%.
【0014】そこで、本発明は、再生画像に影響がない
ようにするため、受光感度のばらつきが少ない固体撮像
装置を提供することを課題とする。Accordingly, an object of the present invention is to provide a solid-state imaging device having a small variation in light receiving sensitivity so as not to affect a reproduced image.
【0015】[0015]
【課題を解決するための手段】上記課題を解決するため
に、本発明は、入遮光を集光する集光レンズと、前記集
光レンズにより集光された光を電気信号に変換する光電
変換素子とを有する画素を複数備えた固体撮像装置にお
いて、前記複数の画素の各々は、前記集光された光の光
軸と前記光電変換素子の受光部の重心とが一致するよう
に構成されている。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a condensing lens for condensing incoming and outgoing light, and a photoelectric conversion for converting light condensed by the condensing lens into an electric signal. In a solid-state imaging device including a plurality of pixels each including an element, each of the plurality of pixels is configured such that an optical axis of the collected light coincides with a center of gravity of a light receiving unit of the photoelectric conversion element. I have.
【0016】また、本発明は、上記固体撮像装置と、前
記固体撮像装置側に被写体からの光を送る撮像レンズ
と、前記固体撮像装置の出力信号を記憶する記憶手段と
を備える。The present invention also includes the solid-state imaging device, an imaging lens for transmitting light from a subject to the solid-state imaging device, and storage means for storing an output signal of the solid-state imaging device.
【0017】[0017]
【発明の実施の形態】(実施形態1)図1(a)は、本
発明の実施形態1の固体撮像装置の画素群の平面図であ
る。図1(b)は、図1(a)に示した画素群のうち1
列目、3列目及び5列目の画素の断面図である。図1
(a)、図1(b)において、1はシリコン基板(Si
基板)7上に光電変換素子であるフォトダイオード5を
有する画素、2は画素1のうちフォトダイオード5以外
の領域を遮光する遮光領域を有する遮光層、3は遮光層
2に備えられ画素1のフォトダイオード5に光を入射さ
せるための開口領域、4はフォトダイオード5に光を集
光するマイクロレンズ、6はたとえば青・赤・緑などの
カラーフィルタ層である。(Embodiment 1) FIG. 1A is a plan view of a pixel group of a solid-state imaging device according to Embodiment 1 of the present invention. FIG. 1B shows one of the pixel groups shown in FIG.
It is sectional drawing of the pixel of the 3rd column and the 5th column. FIG.
1A and 1B, reference numeral 1 denotes a silicon substrate (Si
A pixel having a photodiode 5 which is a photoelectric conversion element on a substrate 7, a light-shielding layer 2 having a light-shielding region that shields a region other than the photodiode 5 in the pixel 1, and a light-shielding layer 3 provided in the light-shielding layer 2. An opening area for allowing light to enter the photodiode 5, a microlens 4 for condensing light on the photodiode 5, and a color filter layer 6 for blue, red, and green, for example.
【0018】なお、図1(a)には、説明の都合上、5
×5画素にした例を示しているが、通常はたとえば数1
0万〜数100万画素を2次元状に配列させている。FIG. 1A shows, for convenience of explanation, 5
Although an example of × 5 pixels is shown, usually, for example, Equation 1
Ten thousand to several million pixels are arranged two-dimensionally.
【0019】図1(a),図1(b)に示すように、本
実施形態では、画素群の中心よりも周辺に配置されてい
る画素1ほど、フォトダイオード5の受光部の重心が、
マイクロレンズ4及び開口領域3の重心よりも周辺側に
位置するように構成して、マイクロレンズ4により集光
された光の光軸と、フォトダイオード5の受光部の重心
とが一致するようにしている。As shown in FIGS. 1A and 1B, in the present embodiment, the center of gravity of the light receiving portion of the photodiode 5 is closer to the pixel 1 located closer to the periphery than the center of the pixel group.
It is configured to be located on the peripheral side of the center of gravity of the micro lens 4 and the opening region 3 so that the optical axis of the light condensed by the micro lens 4 and the center of gravity of the light receiving part of the photodiode 5 coincide. ing.
【0020】すなわち、図1(b)に示すように、1列
目の画素1はフォトダイオード5の受光部の重心に対し
て図面の右方向にマイクロレンズ4及び開口領域3の重
心が位置するように構成し、3列目の画素1はフォトダ
イオード5の受光部の重心とマイクロレンズ4及び開口
領域3の重心とが一致するように構成し、5列目の画素
1はフォトダイオード5の受光部の重心に対して図面の
左方向にマイクロレンズ4及び開口領域3の重心が位置
するように構成している。なお、ここで、開口領域3の
重心とは、開口領域3に任意の物質を配したときにその
物質の重心となる位置をいう。That is, as shown in FIG. 1B, in the pixels 1 in the first column, the center of gravity of the microlens 4 and the center of the aperture region 3 are located rightward in the drawing with respect to the center of the light receiving portion of the photodiode 5. The pixel 1 in the third column is configured so that the center of gravity of the light receiving portion of the photodiode 5 and the center of gravity of the microlens 4 and the opening region 3 coincide with each other. The configuration is such that the center of gravity of the microlens 4 and the opening area 3 is located to the left of the drawing with respect to the center of gravity of the light receiving unit. Here, the center of gravity of the opening region 3 refers to a position that becomes the center of gravity of an arbitrary substance when the substance is disposed in the opening region 3.
【0021】このように、本実施形態では、画素群の中
心よりも周辺に配置されている画素1ほど、フォトダイ
オード5の受光部の重心を、マイクロレンズ4及び開口
領域3の重心よりも周辺側に位置するように構成するこ
とにより、図1(b)に示したように、マイクロレンズ
4を介してフォトダイオード5へ入射する光が、遮光層
2の遮光領域に遮られないようになる。As described above, in the present embodiment, the center of gravity of the light receiving portion of the photodiode 5 is set closer to the periphery of the pixel 1 than the center of the microlens 4 and the center of the opening region 3 for the pixel 1 arranged closer to the periphery than the center of the pixel group. 1B, light incident on the photodiode 5 via the microlens 4 is not blocked by the light-blocking region of the light-blocking layer 2 as shown in FIG. 1B. .
【0022】図2は、図1に示した固体撮像装置の出力
信号を示す図である。図2に示すように、本実施形態の
固体撮像装置は、出力信号の平均値に対して、出力信号
の最大値と最小値との開きが、10%より小さい。これ
は、フォトダイオード5への集光光が遮光層2に遮られ
ないようになることにより受光感度のばらつきを少なく
することができるからである。FIG. 2 is a diagram showing output signals of the solid-state imaging device shown in FIG. As shown in FIG. 2, in the solid-state imaging device according to the present embodiment, the difference between the maximum value and the minimum value of the output signal is smaller than 10% with respect to the average value of the output signal. This is because variation in the light receiving sensitivity can be reduced by preventing the light condensed on the photodiode 5 from being blocked by the light shielding layer 2.
【0023】(実施形態2)図3(a)は、本発明の実
施形態2の固体撮像装置の画素群の平面図である。図3
(b)は、図3(a)に示した画素群のうち1列目、3
列目及び5列目の画素の断面図である。なお、図3
(a)、図3(b)において、図1(a)、図1(b)
に示したものと同様の部分には、同一の符号を付してい
る。Embodiment 2 FIG. 3A is a plan view of a pixel group of a solid-state imaging device according to Embodiment 2 of the present invention. FIG.
FIG. 3B shows the first column and the third column in the pixel group shown in FIG.
It is sectional drawing of the pixel of a 5th column. Note that FIG.
(A), FIG. 3 (b), FIG. 1 (a), FIG. 1 (b)
Are denoted by the same reference numerals.
【0024】図3(a),図3(b)に示すように、本
実施形態では、画素群の中心よりも周辺に配置されてい
る画素1ほど、フォトダイオード5の受光部の重心が、
マイクロレンズ4の重心に対して周辺側に位置するよう
に構成し、且つ開口領域3の重心も、マイクロレンズ4
の重心に対して周辺側に位置するように構成して、マイ
クロレンズ4により集光された光の光軸と、フォトダイ
オード5の受光部の重心と、開口領域3の重心とがそれ
ぞれ一致するようにしている。As shown in FIGS. 3A and 3B, in the present embodiment, the center of gravity of the light receiving portion of the photodiode 5 is closer to the pixel 1 located closer to the periphery than the center of the pixel group.
The center of gravity of the microlens 4 is located on the peripheral side with respect to the center of gravity of the microlens 4.
, The optical axis of the light condensed by the microlens 4, the center of gravity of the light receiving portion of the photodiode 5, and the center of gravity of the aperture region 3 respectively match. Like that.
【0025】図3(a)、図3(b)に示したような画
素1の構成は、たとえばカラーフィルタ層6の厚さがあ
るとき、すなわち遮光層2とマイクロレンズ4との間隔
が大きい場合に有効である。In the configuration of the pixel 1 as shown in FIGS. 3A and 3B, for example, when the thickness of the color filter layer 6 is large, that is, the distance between the light shielding layer 2 and the microlens 4 is large. It is effective in the case.
【0026】このように、画素群の中心よりも周辺に配
置されている画素1ほど、マイクロレンズ4の重心に対
して開口領域3の重心と、フォトダイオード5の受光部
の重心とを各々ずらすことにより、図1(a)、図1
(b)に示した固体撮像装置よりも、さらに受光感度の
ばらつきを少なくすることができる。As described above, the center of gravity of the aperture region 3 and the center of gravity of the light receiving portion of the photodiode 5 are shifted from the center of gravity of the microlens 4 in each of the pixels 1 arranged closer to the periphery than the center of the pixel group. As a result, FIG. 1 (a), FIG.
The variation in the light receiving sensitivity can be further reduced as compared with the solid-state imaging device shown in FIG.
【0027】(実施形態3)図4は、本発明の実施形態
3の固体撮像装置の画素の断面図であって、図1(b)
の1列目の画素及び3列目の画素に相当する図である。
図4において、8は有機材料などからなる遮光用の黒フ
ィルタ層、9はカラーフィルタ層6を平坦に形成するた
めの平坦化層である。(Embodiment 3) FIG. 4 is a sectional view of a pixel of a solid-state imaging device according to Embodiment 3 of the present invention.
3 is a diagram corresponding to the pixel in the first column and the pixel in the third column.
In FIG. 4, reference numeral 8 denotes a light-shielding black filter layer made of an organic material or the like, and reference numeral 9 denotes a flattening layer for forming the color filter layer 6 flat.
【0028】なお、黒フィルタ層8は、マイクロレンズ
4のない部分に入射した光が、たとえば迷光、光による
クロストークなどの悪影響を生じさせないようにカラー
フィルタ層6の製造プロセスなどにおいて作成される。
また、図4において、図1(a)、図1(b)に示した
ものと同様の部分には、同一の符号を付している。The black filter layer 8 is formed in a process of manufacturing the color filter layer 6 so that light incident on a portion having no microlens 4 does not cause adverse effects such as stray light and crosstalk due to light. .
Further, in FIG. 4, the same parts as those shown in FIGS. 1A and 1B are denoted by the same reference numerals.
【0029】本実施形態では、図4に示すように、画素
群の中心よりも周辺に配置されている画素1ほど、フォ
トダイオード5の受光部の重心及び黒フィルタ層8の開
口領域の重心が、マイクロレンズ4及び開口領域3の開
口領域の重心よりも周辺側に位置するように構成して、
マイクロレンズ4により集光された光の光軸と、フォト
ダイオード5の受光部の重心と、黒フィルタ層8の開口
領域の重心とが一致するようにしている。In the present embodiment, as shown in FIG. 4, the center of gravity of the light receiving section of the photodiode 5 and the center of gravity of the opening area of the black filter layer 8 are closer to the pixel 1 located closer to the periphery than the center of the pixel group. , The microlens 4 and the opening area 3 are located on the peripheral side of the center of gravity of the opening area,
The optical axis of the light condensed by the microlens 4, the center of gravity of the light-receiving portion of the photodiode 5, and the center of gravity of the opening region of the black filter layer 8 match.
【0030】なお、遮光層2は、図3(b)に示すよう
にずらして配置すると、さらに受光感度のばらつきを少
なくすることができる。When the light-shielding layers 2 are displaced as shown in FIG. 3B, variations in the light receiving sensitivity can be further reduced.
【0031】(実施形態4)図5は、本発明の実施形態
4の固体撮像装置の画素群の平面図である。図5に示す
ように、本実施形態の固体撮像装置は、長方形状の画素
1を湾曲形状に配列している。こうして、光電変換を行
う開口領域の開口率を配置位置毎に変化させることによ
り、オートフォーカスセンサなどとしてオートフォーカ
スカメラなどの固体撮像システムに適用することができ
る。なお、図1(a)に示した固体撮像装置と同様の部
分には、同一の符号を付している。(Embodiment 4) FIG. 5 is a plan view of a pixel group of a solid-state imaging device according to Embodiment 4 of the present invention. As shown in FIG. 5, in the solid-state imaging device according to the present embodiment, rectangular pixels 1 are arranged in a curved shape. In this manner, by changing the aperture ratio of the aperture region where the photoelectric conversion is performed for each arrangement position, the aperture ratio can be applied to a solid-state imaging system such as an autofocus camera as an autofocus sensor. The same parts as those of the solid-state imaging device shown in FIG. 1A are denoted by the same reference numerals.
【0032】また、本実施形態では、図5に示すよう
に、画素群の中心よりも周辺に配置されている画素1ほ
ど、フォトダイオード5の受光部の重心が、マイクロレ
ンズ4及び開口領域3の開口領域の重心よりも周辺側に
位置するように構成して、マイクロレンズ4により集光
された光の光軸と、フォトダイオード5の受光部の重心
とが一致するようにしている。In this embodiment, as shown in FIG. 5, the closer the pixel 1 is located to the periphery than the center of the pixel group, the more the center of gravity of the light receiving portion of the photodiode 5 is shifted to the microlens 4 and the aperture region 3. Is arranged on the peripheral side with respect to the center of gravity of the opening region, so that the optical axis of the light condensed by the microlens 4 and the center of gravity of the light receiving portion of the photodiode 5 coincide with each other.
【0033】そのため、図5に示す固体撮像装置は、図
1に示した固体撮像装置と同様に、受光感度のばらつき
を少なくすることができる。なお、遮光層2は、図3
(b)に示すようにずらして配置すると、さらに受光感
度のばらつきを少なくすることができる。また、図4に
示すように、黒フィルタ層を設けてもよい。Therefore, the solid-state imaging device shown in FIG. 5 can reduce the variation in the light receiving sensitivity similarly to the solid-state imaging device shown in FIG. The light-shielding layer 2 is formed as shown in FIG.
By displacing them as shown in (b), variations in light receiving sensitivity can be further reduced. Further, as shown in FIG. 4, a black filter layer may be provided.
【0034】(実施形態5)図6は、本発明の実施形態
5の固体撮像装置の画素群の平面図である。図6に示す
画素群は、図示しない撮像レンズにいわゆる樽型収差が
ある場合の配置例を示している。すなわち、樽型収差の
ある撮像レンズに光が入射すると、マイクロレンズ4に
は光がゆがんで集光される。そこで、本実施形態の固体
撮像装置は、このように光学系で発生する収差を、固体
撮像装置側で補正する。Embodiment 5 FIG. 6 is a plan view of a pixel group of a solid-state imaging device according to Embodiment 5 of the present invention. The pixel group illustrated in FIG. 6 illustrates an arrangement example in a case where an imaging lens (not illustrated) has a so-called barrel aberration. That is, when light enters the imaging lens having barrel-shaped aberration, the light is distorted and condensed on the microlens 4. Therefore, the solid-state imaging device according to the present embodiment corrects the aberration generated in the optical system as described above on the solid-state imaging device side.
【0035】なお、図6において、図1(a)に示した
固体撮像装置と同様の部分には、同一の符号を付してい
る。また、本実施形態においても、図1と同様に、マイ
クロレンズ4により集光された光の光軸と、フォトダイ
オード5の受光部の重心とが一致するようにしている。In FIG. 6, the same parts as those of the solid-state imaging device shown in FIG. 1A are denoted by the same reference numerals. Also in this embodiment, similarly to FIG. 1, the optical axis of the light condensed by the microlens 4 and the center of gravity of the light receiving portion of the photodiode 5 match.
【0036】ちなみに、遮光層2は、図3(b)に示す
ようにずらして配置すると、さらに受光感度のばらつき
を少なくすることができる。また、図4に示すように、
黒フィルタ層を設けてもよい。By the way, if the light shielding layer 2 is displaced as shown in FIG. 3B, the variation in the light receiving sensitivity can be further reduced. Also, as shown in FIG.
A black filter layer may be provided.
【0037】以上、実施形態1〜5では、マイクロレン
ズを有する固体撮像装置を例に説明したが、光電変換装
置はフォトダイオード以外にも、たとえばCCD、BA
SIS、CMOSセンサ、SITセンサ、CMD、AM
Iなど、どのタイプのセンサでも適用することができ
る。また、センサは複数行×複数列に配列した場合を例
に説明したが、たとえば1行×複数列に配列してもよ
い。In the first to fifth embodiments, the solid-state image pickup device having a microlens has been described as an example.
SIS, CMOS sensor, SIT sensor, CMD, AM
Any type of sensor, such as I, can be applied. Also, the case where the sensors are arranged in a plurality of rows × a plurality of columns has been described as an example, but the sensors may be arranged in a row × a plurality of columns, for example.
【0038】また、実施形態1〜5のいずれかに記載し
た固体撮像装置は、固体撮像装置に被写体からの光を入
射させる撮像レンズと、固体撮像装置からの出力信号を
記憶するメモリなどの記憶手段とを備えたビデオカメラ
やスチルビデオカメラなどの固体撮像システムにも適用
することができる。Further, the solid-state imaging device according to any one of the first to fifth embodiments has an imaging lens for causing light from a subject to enter the solid-state imaging device, and a storage such as a memory for storing an output signal from the solid-state imaging device. The present invention can also be applied to a solid-state imaging system such as a video camera or a still video camera having the means.
【0039】[0039]
【発明の効果】以上説明したように、本発明の固体撮像
装置は、集光レンズにより集光された光の光軸と、集光
された光を電気信号に変換する光電変換素子の受光部の
重心とが一致するように構成されているため、受光感度
のばらつきをなくすことができる。As described above, according to the solid-state imaging device of the present invention, the optical axis of the light condensed by the condensing lens and the light receiving portion of the photoelectric conversion element for converting the condensed light into an electric signal. Is configured to coincide with the center of gravity of the photodetector, so that the variation in the light receiving sensitivity can be eliminated.
【0040】また、上記固体撮像装置を備えたビデオカ
メラ、スチルビデオカメラ等の固体撮像システムは、画
質を向上することができる。Further, a solid-state imaging system such as a video camera and a still video camera provided with the above-mentioned solid-state imaging device can improve the image quality.
【図1】本発明の実施形態1の固体撮像装置の画素群の
平面図及び断面図である。FIG. 1 is a plan view and a cross-sectional view of a pixel group of a solid-state imaging device according to a first embodiment of the present invention.
【図2】図1の固体撮像装置の出力信号を示す図であ
る。FIG. 2 is a diagram illustrating output signals of the solid-state imaging device of FIG. 1;
【図3】本発明の実施形態2の固体撮像装置の画素群の
平面図及び断面図である。FIG. 3 is a plan view and a cross-sectional view of a pixel group of a solid-state imaging device according to a second embodiment of the present invention.
【図4】本発明の実施形態3の固体撮像装置の画素群の
断面図である。FIG. 4 is a sectional view of a pixel group of a solid-state imaging device according to a third embodiment of the present invention.
【図5】本発明の実施形態4の固体撮像装置の画素群の
平面図である。FIG. 5 is a plan view of a pixel group of a solid-state imaging device according to a fourth embodiment of the present invention.
【図6】本発明の実施形態5の固体撮像装置の画素群の
平面図である。FIG. 6 is a plan view of a pixel group of a solid-state imaging device according to a fifth embodiment of the present invention.
【図7】従来の固体撮像装置の画素群の平面図と断面図
である。FIG. 7 is a plan view and a sectional view of a pixel group of a conventional solid-state imaging device.
【図8】従来の固体撮像装置の課題の説明図である。FIG. 8 is an explanatory diagram of a problem of a conventional solid-state imaging device.
【図9】図8に示した固体撮像装置の出力信号を示す図
である。FIG. 9 is a diagram illustrating output signals of the solid-state imaging device illustrated in FIG. 8;
1 画素 2 遮光層 3 開口領域 4 マイクロレンズ 5 フォトダイオード 6 カラーフィルタ層 7 Si基板 8 黒フィルタ層 9 平坦化層 10 被写体 11 撮像レンズ Reference Signs List 1 pixel 2 light shielding layer 3 opening area 4 micro lens 5 photodiode 6 color filter layer 7 Si substrate 8 black filter layer 9 flattening layer 10 subject 11 imaging lens
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4M118 AA06 AB01 BA06 BA10 BA14 CA02 CA10 CA26 FA06 FA08 GB06 GB13 GD04 5C024 DX01 EX43 GX03 GY01 GY31 GY42 GY44 GY47 GZ39 HX58 ──────────────────────────────────────────────────続 き Continued on front page F term (reference) 4M118 AA06 AB01 BA06 BA10 BA14 CA02 CA10 CA26 FA06 FA08 GB06 GB13 GD04 5C024 DX01 EX43 GX03 GY01 GY31 GY42 GY44 GY47 GZ39 HX58
Claims (8)
光レンズにより集光された光を電気信号に変換する光電
変換素子とを有する画素を複数備えた固体撮像装置にお
いて、 前記複数の画素の各々は、前記集光された光の光軸と前
記光電変換素子の受光部の重心とが一致するように構成
されていることを特徴とする固体撮像装置。1. A solid-state imaging device comprising a plurality of pixels each having a condensing lens for condensing incident light shielding and a photoelectric conversion element for converting light condensed by the condensing lens into an electric signal. Wherein the optical axis of the condensed light and the center of gravity of the light receiving section of the photoelectric conversion element coincide with each other.
りも周辺に設けられている画素ほど、前記光電変換素子
の受光部の重心が前記周辺側に位置するように構成する
ことを特徴とする請求項1に記載の固体撮像装置。2. The method according to claim 1, wherein the center of gravity of the light receiving unit of the photoelectric conversion element is located closer to the periphery of the pixel group having a plurality of pixels than the center of the pixel group. The solid-state imaging device according to claim 1.
照明する開口領域と、前記光電変換素子以外の領域を遮
光するような遮光領域とからなる遮光層を有し、 前記複数の画素の各々は、前記集光された光の光軸と前
記遮光部の開口領域の重心とが一致するように構成され
ていることを特徴とする請求項1又は2に記載の固体撮
像装置。3. The pixel according to claim 1, further comprising a light-shielding layer including an opening area for illuminating the condensed light on the photoelectric conversion element and a light-shielding area for shielding an area other than the photoelectric conversion element. 3. The solid-state imaging device according to claim 1, wherein each of the light-emitting elements is configured such that an optical axis of the condensed light coincides with a center of gravity of an opening region of the light-shielding portion. 4.
タ層を設けることを特徴とする請求項1から3のいずれ
か1項に記載の固体撮像装置。4. The solid-state imaging device according to claim 1, wherein a color filter layer is provided in an optical path of the collected light.
入射させるための開口領域と、前記画素の前記マイクロ
レンズが設けられていない領域を遮光するような遮光領
域からなるフィルタ層を有し、 前記複数の画素の各々は、前記集光された光の光軸と前
記フィルタ層の開口領域の重心とが一致するように構成
されていることを特徴とする請求項1から4のいずれか
1項に記載の固体撮像装置。5. A filter layer comprising an opening area for allowing the condensed light to enter the photoelectric conversion element and a light shielding area for shielding an area of the pixel where the microlenses are not provided. 5. The method according to claim 1, wherein each of the plurality of pixels is configured such that an optical axis of the collected light coincides with a center of gravity of an opening region of the filter layer. 6. 2. The solid-state imaging device according to claim 1.
又は2次元に配列してなることを特徴とする請求項2か
ら5のいずれか1項に記載の固体撮像装置。6. The solid-state imaging device according to claim 2, wherein the pixel group includes the plurality of pixels arranged one-dimensionally or two-dimensionally.
に配列してなることを特徴とする請求項6に記載の固体
撮像装置。7. The solid-state imaging device according to claim 6, wherein the pixel group includes the plurality of pixels arranged in a curved shape.
固体撮像装置と、 前記固体撮像装置側に被写体からの光を送る撮像レンズ
と、 前記固体撮像装置の出力信号を記憶する記憶手段とを備
えることを特徴とする固体撮像システム。8. A solid-state imaging device according to claim 1, an imaging lens for transmitting light from a subject to the solid-state imaging device, and a storage for storing an output signal of the solid-state imaging device. And a solid-state imaging system.
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US09/768,500 US6995800B2 (en) | 2000-01-27 | 2001-01-25 | Image pickup apparatus utilizing a plurality of converging lenses |
US11/180,533 US7280146B2 (en) | 2000-01-27 | 2005-07-14 | Image pickup apparatus having its peripheral conversion elements shifted outwardly as compared to converging lenses |
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JP2000019227A JP3571982B2 (en) | 2000-01-27 | 2000-01-27 | Solid-state imaging device and solid-state imaging system having the same |
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