JPH0784266A - Production of liquid crystal display element - Google Patents

Abstract

PURPOSE:To obtain sufficient orientability to liquid crystal molecules without generating contamination of substrates, etc., by subjecting liquid crystal oriented films to orientation treatments by photoirradiation of polysilane thin films with light patterned to a grating shape. CONSTITUTION:The polysilane thin films are formed on transparent electrodes 121 and the liquid crystal oriented films are formed by subjecting the polysilane thin films to the photoirradiation with the light patterned to the grating shape at the time of producing the liquid crystal display element having a pair of transparent substrates 111 facing each other, the transparent electrodes 121 formed on the opposite main surfaces of these transparent substrates 111, the liquid crystal oriented films 191 formed on the transparent electrodes 121 and liquid crystal materials 211 encapsulated via the transparent electrodes 121 and the liquid crystal oriented films 191 between the transparent substrates 111. The method for forming the polysilane thin films in such a case includes a roll coater method, spin coater method, LB method (Langmuir-Bloclgett method), etc.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display element used for a display or the like.

[0002]

2. Description of the Related Art Conventionally, liquid crystal display devices have been widely used in small flat panel displays, calculators, watches and the like. Recently, it has also been used as a display for automobiles and a display for personal computers.
Furthermore, it has begun to be applied to motion picture displays such as small LCD TVs.

As a liquid crystal cell constituting such a liquid crystal display element, a twisted nematic liquid crystal cell (hereinafter,
(Abbreviated as TN type liquid crystal cell) is known. This TN
In the liquid crystal cell of the type, a transparent electrode and a liquid crystal alignment film that has been subjected to an alignment treatment for aligning liquid crystal molecules are sequentially laminated on the surfaces of two transparent substrates, and the two transparent substrates are twisted at 90 ° to each other. And arrange them so that a constant substrate spacing is maintained 2
A spacer is sandwiched between a plurality of transparent substrates, a nematic liquid crystal material is injected into the space between the transparent substrates, and the periphery of the transparent substrates is fixed with a sealing material. The alignment treatment performed on the liquid crystal alignment film is for aligning the liquid crystal molecules in parallel with the transparent substrate (homogeneous alignment), and is important for controlling the alignment of the liquid crystal molecules. Currently, for this alignment treatment, a polymer film made of polyimide, polyvinyl alcohol, etc. is formed on a transparent electrode, and then the surface is rubbed with a roller equipped with a cloth such as velvet to give the surface alignment ability. The rubbing method is most often used.

However, when the rubbing method is applied to the TN type liquid crystal cell, there are the following problems.
The defective rate becomes high in the orientation process. First of all, since the cloth is brought into direct contact and rubbed, thread waste or the like adheres to and contaminates the substrate and its periphery. Secondly, since the polymer is a dielectric, a large amount of static electricity is generated on the liquid crystal alignment film by rubbing the polymer with a cloth, adsorbing dust and forming a gap on the surface of the liquid crystal alignment film. This reduces the uniformity of the surface. Further, in the active matrix type liquid crystal display element, the TFT (thin film transistor) is destroyed by static electricity. Thirdly, the surface is scratched by rubbing with a cloth, which causes an image defect and deteriorates the display quality of the liquid crystal display element.

Therefore, there is a strong demand for an alignment treatment which is an alternative to the rubbing method, and several research results have been reported so far. That is, it has been confirmed that when liquid crystal molecules are placed on a substrate having linear grooves formed at regular intervals, the liquid crystal molecules are aligned in the direction along the grooves, and HV Kennel's Physical Review
A24 (5) 2713 (1981), Jpn.J.Appl.Phy by A. Sugiyama et al.
s 20 (7) 1343 (1981) and the like. Based on this fact, for example, in Japanese Patent Laid-Open No. 60-60624, 2
By irradiating the surface of the polymer film made of photosensitive polyvinyl alcohol or photosensitive polyimide by interfering two laser beams, the cross-linking reaction in the light irradiation part is used to form grating-like irregularities on the polymer film for orientation. A method of applying treatment is disclosed. However, it is not possible to accurately shrink the volume of only the light irradiation part by the above-mentioned crosslinking reaction, and it is extremely difficult to form a liquid crystal alignment film having a fine concavo-convex pattern. It is not possible to impart a proper alignment ability. Further, Japanese Patent Application Laid-Open No. 1-210932 discloses a technique in which ultraviolet rays are pattern-irradiated on the surface of a polyimide film and ozone generated on the surface of the polyimide film oxidizes and vaporizes the polyimide to form a grating-like unevenness. However, even in such a technique, it is not easy to suppress the oxidation of the polyimide except the light irradiation portion, and it is still difficult to form a fine uneven pattern. Further, in JP-A-63-142327, JP-A-2-196219, and the like, by irradiating the surface of a polymer film with laser light in a striped pattern, the polymer in the laser light irradiation part is scattered to form a polymer. Attempts have been made to form grating-like irregularities on the film, but in this case it is necessary to irradiate a laser beam of extremely strong power, which is not preferable in terms of increasing the size of the device.

[0006]

As described above, many alignment treatments of liquid crystal alignment films have been studied as an alternative to the rubbing method, but all of them are still in practical use because of insufficient alignment ability for liquid crystal molecules. It has not been realized.

In view of the above problems, the present invention provides a method for manufacturing a liquid crystal display device capable of easily forming a liquid crystal alignment film having a sufficient alignment ability for liquid crystal molecules without causing contamination of a substrate or the like. Is intended.

[0008]

According to the present invention, a pair of transparent substrates facing each other, transparent electrodes provided on the main surfaces of the transparent substrates facing each other, and a liquid crystal alignment film formed on the transparent electrodes. And a liquid crystal material enclosed between the transparent substrate via the transparent electrode and a liquid crystal alignment film, wherein a polysilane thin film is formed on the transparent electrode. A method for manufacturing a liquid crystal display device, comprising the step of forming the liquid crystal alignment film by irradiating a grating-shaped pattern light on the substrate. That is, the method for producing a liquid crystal display device of the present invention is characterized in that the alignment treatment of the liquid crystal alignment film is performed by irradiating the polysilane thin film with the grating-shaped pattern light.

The present invention will be described in detail below. In the present invention, the polysilane used for the liquid crystal alignment film is not particularly limited, and examples thereof include those having a repeating unit represented by the following general formula. The weight average molecular weight of such a polysilane is preferably 5,000 to 1,000,000, more preferably 10,000 to 100,000. The reason for this is that if the weight average molecular weight of polysilane is too small, the film strength of the resulting liquid crystal alignment film may be insufficient,
On the other hand, if the weight average molecular weight of polysilane is too large, the solubility of the solvent will decrease and film formation will become difficult.

[0010]

[Chemical 1]

Further, in the present invention, the film thickness of the polysilane thin film to be formed is preferably about 0.01 to 1 μm. This is because it is difficult to make the film thickness uniform if the film thickness of the polysilane thin film is less than 0.01 μm, and conversely if the film thickness of the polysilane thin film exceeds 1 μm, the driving voltage of the liquid crystal display element is increased. Is likely to rise. In addition, as a film forming method of the polysilane thin film at this time,
The roll coater method, the spin coater method, the LB method (Langmuir-Blodgett method) and the like can be mentioned.

In the present invention, a liquid crystal alignment film having alignment ability for liquid crystal molecules is formed by irradiating the polysilane thin film as described above with grating pattern light. As the light source of the pattern light at this time,
Ultraviolet light, X-rays, EB, etc. can be used, and in order to irradiate the grating pattern light, specifically, interference fringes or beam diameters generated by interfering a plurality of light beams are narrowed down. The light beam may be scanned and directly irradiated, or the light may be irradiated through a photomask on which a predetermined line and space pattern is formed. The liquid crystal alignment film thus obtained has an excellent alignment ability with respect to liquid crystal molecules because a fine concavo-convex pattern is formed on the surface of the polysilane thin film due to volume expansion in the light irradiation part.

Here, the irradiation light to the polysilane thin film is preferably a grating pattern light having a fine pitch of 10 μm or less. This is because when the pitch exceeds 10 μm, there may be a region where liquid crystal molecules are oriented in different directions in the obtained liquid crystal display element. Further, in the present invention, the width of the concave portion of the fine concavo-convex pattern formed on the surface of the liquid crystal alignment film is 0.
It is preferable that the width is 5 to 5 μm and the width of the convex portion is 0.1 to 5 μm. If the width of the recess is less than 0.5 μm, the alignment ability with respect to the liquid crystal molecules is reduced, and the width of the recess is 5 μm.
If it exceeds, the orientation of the liquid crystal molecules above the recess is almost lost. Further, if the width of the convex portion is less than 0.1 μm, the aligning ability with respect to the liquid crystal molecules is lowered, and if the width of the convex portion exceeds 5 μm, the alignment property of the liquid crystal molecule above the convex portion is almost lost.

Further, in the present invention, the irradiation light on the polysilane thin film as described above is applied at an irradiation amount of 10 to 50.
It is preferably set to 0 mJ / cm ² . The reason for this is that if the irradiation dose deviates from this range, it becomes difficult to accurately form a fine uneven pattern on the surface of the polysilane thin film.

Further, in the present invention, in forming the liquid crystal alignment film, it is particularly preferable to use polysilane having a repeating unit represented by the following general formula and form a polysilane thin film by the LB method.

[0016]

[Chemical 2]

The polysilane having the repeating unit represented by the above general formula has a hydrophilic group X on one side chain and a hydrophobic group R on the other side chain with respect to the main chain composed of Si--Si bonds.
Since it has ³ , a monomolecular film can be easily developed on the liquid surface, and a polysilane thin film can be preferably formed by the LB method.
Here, specific examples of such polysilane are shown below.

[0018]

[Chemical 3]

[0019]

[Chemical 4]

[0020]

[Chemical 5]

[0021]

[Chemical 6]

[0022]

[Chemical 7]

[0023]

[Chemical 8]

[0024]

[Chemical 9]

[0025]

[Chemical 10]

[0026]

[Chemical 11]

[0027]

[Chemical 12]

[0028]

[Chemical 13]

[0029]

[Chemical 14]

[0030]

[Chemical 15]

[0031]

[Chemical 16]

[0032]

[Chemical 17]

[0033]

[Chemical 18]

[0034]

[Chemical 19]

[0035]

[Chemical 20]

[0036]

[Chemical 21]

[0037]

[Chemical formula 22]

[0038]

[Chemical formula 23]

[0039]

[Chemical formula 24]

[0040]

[Chemical 25]

The polysilane thin film thus formed is S when the monomolecular film developed on the liquid surface is transferred onto the substrate.
Since the i-Si main chain is strongly aligned in the pulling direction of the substrate from the liquid surface, it has high orientation. Therefore, by irradiating the polysilane thin film with the grating-shaped pattern light substantially parallel to the arrangement direction of the Si—Si main chain, the fine uneven pattern as described above can be formed particularly accurately. Furthermore, for example, by interposing a polarizing element between the light source and the polysilane thin film, and irradiating a grating pattern light having only a vibration component in a direction substantially parallel to the arrangement direction of the Si-Si main chain, the surface of the polysilane thin film is irradiated. It is also possible to efficiently form a fine uneven pattern.

Next, the structure of the liquid crystal display device obtained by the present invention will be described with reference to the drawings. FIG. 1 is a vertical cross-sectional view showing the structure of a pixel portion of an example of the liquid crystal display element obtained by the present invention. Although the liquid crystal display element applied to the active matrix display format is shown here, the present invention is also applicable to the liquid crystal display element of the simple matrix display format. In the figure, 11 ₁ and 11
Reference numeral ₂ is a transparent substrate made of a material such as glass, and transparent electrodes 12 ₁ (display electrodes) and 12 ₂ (scanning electrodes) made of a material such as ITO (Indium Tin Oxide) are formed on respective opposing surfaces. Has been done. A TFT 13 is mounted on _one transparent substrate 11 ₁ so as to be in contact with the transparent electrode 12 ₁ . In the TFT 13, the gate electrode 14 is provided on the first transparent substrate 11 ₁ on, the gate electrode 14 is covered with the gate insulating film 15. Gate insulating film 15
A semiconductor layer 16 is formed on the semiconductor layer 16, and a source electrode 17 and a drain electrode 18 are connected to predetermined regions on the semiconductor layer 16. Transparent electrode 12 ₁ and TFT 1
The third surface is a liquid crystal alignment film 19 ₁ is formed, on the transparent substrate 11 ₂ facing thereto, are liquid crystal alignment film 19 ₂ is formed via a transparent electrode 12 _2, a liquid crystal alignment film 19 ₁
A liquid crystal material 20 is enclosed between the first and the _second 192.

However, in this liquid crystal display device, in order to prevent conduction between the source electrode 17 and the drain electrode 18 via the liquid crystal alignment film 19 ₁ , the liquid crystal alignment film 19 above the semiconductor layer 16 is prevented.
_{In 1} , it is preferable that the polysilane is wholly siloxaned by light irradiation or the like to enhance the insulating property. Further, in the present invention, such light irradiation may be performed simultaneously with the irradiation of the grating-shaped pattern light on the polysilane thin film when forming the liquid crystal alignment film 19 ₁ . The liquid crystal alignment film 1
9 ₁ How to prevent conduction between the source electrode 17 and the drain electrode 18 through is not limited to this, the liquid crystal alignment film, for example after forming the insulating polymer film in advance polyimide above at least the semiconductor layer 16 The formation of 19 ₁ and the formation of the liquid crystal alignment film 19 ₁ in the region except above the semiconductor layer 16 can be adopted.

Furthermore, the liquid crystal material 2 enclosed between the liquid crystal alignment films 19 ₁ and 19 ₂ of the liquid crystal display element as described above.
0 may be either a P-type liquid crystal molecule or an N-type liquid crystal molecule, and the molecular weight and the like are not particularly limited and can be used.

[0045]

In the method of manufacturing the liquid crystal display element of the present invention,
By irradiating the polysilane thin film with the grating-shaped pattern light, the polysilane thin film undergoes volume expansion at the light irradiation portion, and a liquid crystal alignment film having an uneven pattern on the surface is formed. At this time, in the present invention, after the polysilane in the light-irradiated portion has a low molecular weight due to a photochemical reaction, for example, oxygen in the air is taken in and silicified, whereby the polysilane thin film expands in volume in the light-irradiated portion. That is, since the uneven pattern as described above is formed by utilizing the volume change accompanying the photooxidation reaction of polysilane, a fine uneven pattern corresponding to the pattern light irradiated by the irradiation of the pattern light of relatively low energy is formed. It can be obtained accurately.

Here, the alignment state of the liquid crystal molecules on the liquid crystal alignment film in the present invention is schematically shown in FIG. As shown in the figure, in the present invention, the liquid crystal molecules 21 are aligned along the concave portions of the liquid crystal alignment film 19 ₁ . At this time, since the liquid crystal alignment film 19 ₁ has an extremely fine uneven pattern formed on the surface as described above, it has excellent alignment ability with respect to the liquid crystal molecules 21.

Further, in the present invention, when a polysilane thin film is formed by the LB method and the obtained highly oriented polysilane thin film is irradiated with grating-shaped pattern light substantially parallel to the arrangement direction of the Si—Si main chain, the liquid crystal is irradiated. The uneven pattern on the surface of the alignment film can be formed particularly accurately. Moreover, at this time, due to the delocalization of electrons in the Si—Si main chain of the polysilane arranged in the light non-irradiated portion, a dipole moment is induced in the light non-irradiated portion of the liquid crystal alignment film, resulting in a dielectric difference. Electronic interaction occurs with the liquid crystal molecules having the directionality. Therefore, in combination with the fact that the concavo-convex pattern on the surface of the liquid crystal alignment film can be formed with high precision, it becomes possible to obtain a liquid crystal alignment film having extremely excellent alignment ability for liquid crystal molecules.

Further, in the liquid crystal alignment film as described above, the substituents introduced into the side chains of the polysilane arranged in the light non-irradiated portion are present at regular intervals on the concave surface. Along with this, the liquid crystal molecules above the concave portions of the liquid crystal alignment film are affected by the substituents of the polysilane side chains existing at regular intervals. In this case, a predetermined tilt angle is applied to the liquid crystal molecules aligned on the liquid crystal alignment film. It is also possible to add.

Further, in the present invention, since polysilane having semiconductivity is used for forming the liquid crystal alignment film, the accumulation of charges in the liquid crystal alignment film is reduced when a driving voltage is applied to the obtained liquid crystal display element. As a result, the occurrence of charge-up is prevented, and the alignment disorder of the liquid crystal molecules is suppressed. Moreover, since polysilane does not absorb light in the visible light region, it is possible to form a liquid crystal alignment film having excellent light transmittance.

[0050]

EXAMPLES Examples of the present invention will be described below. Examples 1 to 5 Hard glass N having ITO deposited on its surface as a transparent electrode
A-45 (manufactured by HOYA Co., Ltd.) was cut into a wafer and treated with a mixture of hydrogen peroxide solution and sulfuric acid. After washing it with water, dry it with a rinser dryer, and further 150
It was dried at 30 ° C. for 30 minutes to form a transparent substrate.

Next, a TFT is formed on the transparent substrate with ITO.
On the TFT and ITO surfaces after mounting
2.5 wt% of butyl (m-hydroxyphenyl) polysilane (molecular weight 150,000) filtered with a μm filter
Cyclohexanone solution (room temperature: 22 ° C) was spin-coated (spinner speed: 500 rpm, 5 seconds, 2500 r
pm. 25 seconds), dried at 150 ° C. for 30 minutes, and a film thickness of 0.
A 3 μm polysilane thin film was formed. Then, a parallel exposure machine equipped with a mercury lamp (PLA-10 manufactured by Nikon Corporation)
5) was used as a light source, and the polysilane thin film obtained through the photomask on which the line-and-space pattern shown in Table 1 was formed was irradiated with grating-like pattern light (irradiation amount: 44 mJ / cm ² ), and the liquid crystal was formed. An alignment film was formed.

On the other hand, a polysilane thin film was formed and pattern light was formed in exactly the same manner except that a color filter substrate in which a color filter and a transparent electrode were sequentially formed on a glass transparent substrate and a protective film was overcoated was used. Irradiation was performed to form a liquid crystal alignment film.

Next, the transparent substrate with ITO and the color filter substrate on which the liquid crystal alignment film was formed as described above were each subjected to pattern light irradiation through the same photomask, and each was combined to prepare a liquid crystal according to a conventional method. A cell was prepared and a liquid crystal material was enclosed. However, 4-n-pentyl-4'-cyanobiphenyl (manufactured by Merck, 5CB) was used as the liquid crystal material. Subsequently, the alignment state of liquid crystal molecules in the obtained liquid crystal display device was evaluated. Here, the display characteristics of a liquid crystal display element having a liquid crystal alignment film formed by applying a rubbing method to a polymer film made of polyimide were set to 100, and the respective display characteristics were evaluated for comparison. The results are also shown in Table 1. Table 1
From the results, it is understood that in the liquid crystal display devices of Examples 1 to 5, the liquid crystal alignment film having a sufficient alignment ability with respect to the liquid crystal molecules was formed very easily without using the rubbing method.

[0054]

[Table 1]

Examples 6 to 10 of butyl (m-hydroxyphenyl) polysilane (molecular weight 200,000) previously filtered through a 0.2 μm filter.
A 224 wt% cyclohexanone solution (pH = 7.0) was dropped on the water surface at 15.2 to 15.3 ° C. (room temperature: 21
〜23 ℃), develop the polysilane monolayer, and apply surface pressure to 2
It was adjusted to 0 dyn / cm. Subsequently, the same transparent substrate with ITO as in Examples 1 to 5 and the color filter substrate were subjected to a hydrophobic treatment with hexamethyldisilazane, and each was immersed in the direction perpendicular to the water surface at a rate of 5 mm / cm, It was pulled up above the water surface at a speed of 5 mm / cm. By repeating this operation, that is, according to the process of the LB method, the cumulative number of polysilane thin films shown in Table 2 were formed on the transparent substrate with ITO and the color filter substrate, respectively. Then, a parallel exposure machine (PLA-105, manufactured by Nikon Corporation) equipped with a mercury lamp was used as a light source, and a line 1 μm was used.
Through a photomask on which a line-and-space pattern of m and space of 1 μm was formed, all the obtained polysilane thin films were irradiated with grating-shaped pattern light parallel to the pulling direction of the substrate during the polysilane thin film formation (irradiation amount). : 44 mJ / cm ² ), a liquid crystal alignment film was formed.

Next, with respect to the transparent substrate with ITO and the color filter substrate on which the liquid crystal alignment film was formed as described above, those having the same cumulative number of polysilane monomolecular films were respectively combined, and a liquid crystal cell was prepared and a liquid crystal was prepared according to a conventional method. The material was encapsulated. However, as a liquid crystal material, 4-n
-Pentyl-4'-cyanobiphenyl (Merck, 5C
B) was used. Subsequently, the alignment state of liquid crystal molecules in the obtained liquid crystal display device was evaluated by the same method as in Examples 1 to 5, respectively. The results are also shown in Table 2. From Table 2, it can be seen that also in the liquid crystal display devices of Examples 6 to 10, the liquid crystal alignment film having a sufficient alignment ability with respect to the liquid crystal molecules was extremely easily formed without using the rubbing method.

[0057]

[Table 2]

Examples 11 to 13 0.04 wt% cyclohexanone solution (pH = 7.0) of butyl (m-hydroxyphenyl) polysilane (molecular weight 200,000) previously filtered through a 0.2 μm filter.
Was dropped on the water surface at 15.2 to 15.3 ° C (room temperature: 2
(1 to 23 ° C.), the polysilane monomolecular film was developed, and the surface pressure was adjusted to 20 dyn / cm. Subsequently, the same transparent substrate with ITO as in Examples 1 to 5 and the color filter substrate were subjected to a hydrophobic treatment with hexamethyldisilazane, and each was immersed in the direction perpendicular to the water surface at a rate of 5 mm / cm, By pulling up on the water surface at a speed of 5 mm / cm and repeating this operation, a cumulative number of polysilane thin films of 10 were formed. Next, using a parallel exposure machine (PLA-105, manufactured by Nikon Corporation) equipped with a mercury lamp as a light source, a polysilane thin film was formed on a polysilane thin film through a photomask on which a line and space pattern having a line of 1 μm and a space of 1 μm was formed. Grating pattern light irradiation parallel to the pulling direction of the substrate during thin film formation (irradiation amount of 420 mJ / cm ² ) was performed to form a liquid crystal alignment film.

Then, the transparent substrate with ITO and the color filter substrate on which the liquid crystal alignment film was formed as described above were combined, and a liquid crystal cell was prepared and a liquid crystal material was enclosed according to a conventional method. However, as a liquid crystal material, 4-n
-Pentyl-4'-cyanobiphenyl (Merck, 5C
B) was used. Subsequently, the alignment state of liquid crystal molecules in the obtained liquid crystal display device was evaluated by the same method as in Examples 1 to 5. Further, liquid crystal display elements which are completely the same except that 4-hydroxypentylhexylpolysilane (molecular weight 300,000) or bis (5-ethoxypentyl) polysilane (molecular weight 200,000) is used instead of butyl (m-hydroxyphenyl) polysilane, respectively. The alignment state of liquid crystal molecules was similarly evaluated. The results are shown in Table 3. From Table 3, it can be seen that also in the liquid crystal display devices of Examples 11 to 13, the liquid crystal alignment film having sufficient alignment ability with respect to the liquid crystal molecules was extremely easily formed without using the rubbing method.

[0060]

[Table 3]

[0061]

As described in detail above, according to the present invention, it is possible to easily form a liquid crystal alignment film having a sufficient alignment ability for liquid crystal molecules without causing contamination of the substrate and the like, and thus, It is possible to manufacture a liquid crystal display element having excellent display characteristics with a high yield, and its industrial value is great.

[Brief description of drawings]

FIG. 1 is a vertical cross-sectional view showing the structure of a pixel portion in an example of a liquid crystal display element obtained by the present invention.

FIG. 2 is a schematic view showing an arrangement state of liquid crystal molecules on a liquid crystal alignment film in the present invention.

[Explanation of symbols]

11 ₁ , 11 ₂ ... Transparent substrate, 12 ₁ , 12 ₂ ... Transparent electrode, 13 ... TFT, 14 ... Gate electrode, 15 ... Gate insulating film, 16 ... Semiconductor layer, 17 ... Source electrode, 18 ... Drain electrode, 19 ₁ , 19 ₂ ... Liquid crystal alignment film, 20 ... Liquid crystal material, 21 ... Liquid crystal molecule.

Claims (1)

[Claims] 1. A pair of transparent substrates facing each other, transparent electrodes provided on the main surfaces of the transparent substrates facing each other, a liquid crystal alignment film formed on the transparent electrodes, and the transparent substrate between the transparent substrates. A method of manufacturing a liquid crystal display device comprising a transparent electrode and a liquid crystal material encapsulated via a liquid crystal alignment film, wherein a polysilane thin film is formed on the transparent electrode, and the polysilane thin film is irradiated with a grating pattern light. A method of manufacturing a liquid crystal display device, comprising a step of forming the liquid crystal alignment film by applying the above process.