JPH0776800A - Continuous treatment device for substrate for photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE:To provide the substrate for a photosensitive planographic printing plate which is free from troubles, such as corrosion of metallic electrodes, degradation in surface roughening efficiency by current leakage from a labyrinth structure and traces of gaseous hydrogen bubbles, etc., prevents the designs embodied in a part on the rear surface of the substrate of the photosensitive planographic printing plate from adversely affecting a photosensitive resin layer, maintains the high design characteristic even after the end of development processing and is improved in additive value, inexpensively on an industrial scale. CONSTITUTION:A masking plate 9 consisting of an insulating material plate blanked with the desired arbitrary shape described above is formed on the front surface of an insulating cylindrical drum 3. This cylindrical drum 3 is internally provided with the electrode 13. The front surface of the cylindrical drum 3 is brought into contact with the surface of an aluminum substrate 12 not provided with the photosensitive resin and this aluminum substrate 17 is transported together with rotation of the cylindrical drum 3. An aq. electrolyte soln. 18 is interposed between the electrode 11 and the aluminum substrate 17 and the current impressed to the electrode 13 flows through this aq. electrolyte soln. 18 to the aluminum substrate 17.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for continuously treating a support for a photosensitive lithographic printing plate, and more specifically, a surface roughening treatment for coating a photosensitive resin layer in a photosensitive lithographic printing plate. A continuous processing device for a support for a photosensitive lithographic printing plate, in which a part of the surface not subjected to the electrochemical roughening is electrochemically roughened to realize a rough surface (for example, a design) having an arbitrary shape on the surface. Is.

[0002]

2. Description of the Related Art A photosensitive lithographic printing plate mainly comprises an aluminum plate or its alloy plate (which is simply referred to as an aluminum plate) as a support and a photosensitive resin layer, and the support and the photosensitive resin layer. In order to improve the adhesion to the non-image area and to impart water retention to the non-image area, a so-called graining treatment has been conventionally performed to roughen the entire surface of the support to which the photosensitive resin layer is adhered. Specific means of this graining treatment method include sand blasting, ball grain, brush grain with nylon brush and abrasive / water slurry,
There are a mechanical graining method such as honing grain in which an abrasive / water slurry is sprayed on the surface under high pressure, and a chemical graining method in which the surface is roughened with an etching agent composed of an alkali or an acid or a mixture thereof. Further, JP-A-52-58602 and JP-A-52-15230.
No. 2, JP-A-54-85802, JP-A-55.
-158298, JP-A-58-120531, JP-A-60-147394, JP-A-56-2
8898, JP-A-60-190392, JP-A-1-5589, JP-A-1-280590, JP-A-1-118489, and JP-A-1-141.
094, JP 1-148592, JP 1-178496, JP 1-188395, JP 1-154797, JP 2-235.
No. 794, JP-A-3-260100, JP-A-3-253600, etc., or the electrochemical graining method, or JP-A-48-28123 and British Patent 896563. An electrochemical graining method using a sinusoidal waveform AC power source described, an electrochemical graining method using a special waveform described in Japanese Patent Laid-Open No. 52-58602, and further, for example, JP-A-54-123204, JP-A-54-6390
A method in which a mechanical graining method and an electrochemical graining method described in Japanese Patent No. 2 are combined, JP-A-56-
There is also known a method in which the mechanical graining method described in Japanese Patent No. 55261 and the chemical graining method using a saturated aqueous solution of an aluminum salt of a mineral acid are combined.

Among the various roughening treatment methods as described above, as a method for easily controlling the roughened shape, obtaining a fine roughened surface, and having a simple structure in terms of equipment, Electrochemical surface roughening treatment can be mentioned.

Since the roughened aluminum surface is soft and easily worn as it is, an anodizing treatment is performed to form an oxide film on which a photosensitive resin layer is provided. The surface of the aluminum plate treated in this manner is hard and has excellent abrasion resistance, and exhibits good hydrophilicity, water retention and adhesion to the photosensitive resin layer.

Further, a surface treatment method for aluminum building materials, name plates and the like is widely known. As a concrete means of this treatment method, Japanese Patent Publication No. 60-15
No. 717, a treatment method of electrolytically treating in a smut removing solution to form a pattern on the surface of aluminum, and roughening of aluminum (mechanical, chemical) described in Japanese Patent Publication No. 60-11118. (Electrochemically or electrochemically) processing, and then subjecting it to AC electrolysis in an electrolytic bath to form a film having a vertical stripe pattern by the action of bubbles generated, the metal described in JP-B-61-54120. (For example, aluminum) A plate of a plate such as an aluminum plate is coated with a resin solution in a pattern such as letters and dried to form a protective film, which is then electrolytically polished in an electrolytic bath, and then the protective film is removed to remove letters, etc. Processing method for forming a pattern of the above, processing of aluminum described in Japanese Patent Publication No. 2-3718 (degreasing, mechanical and chemical polishing, hairline and sandbrush). Stroke treatment, etc., then alumite treatment and further drying, followed by printing treatment with a printing ink with excellent non-conductivity, then drying and curing with a baking treatment means, and electrodeposition coating of these surface treatments. Processing method for forming characters, patterns, etc.
After supplying a pattern-forming substance (oil dye etc.) prepared by mixing and dispersing a powdery magnetic substance in advance, which is described in Japanese Patent Publication No. 0198, the magnetic force generated by an electromagnet is applied to the magnetic substance in the pattern-forming substance. By making it act, a certain pattern is made to appear on the pattern-forming substance on the liquid, and this is subjected to pretreatment (degreasing cleaning, etching, smut removal, etc.) and then anodic oxidation (may include coloring). There is a treatment method of attaching a pattern to an aluminum material to generate a pattern.

Further, a method of surface treatment of metals other than aluminum is widely known. As a concrete means of this treatment method, for example, in the case of copper, Japanese Patent Publication No. 60-4
Pretreatment of the copper plate described in Japanese Patent No. 11154 (electrolytic film formation, electrochemical film formation, chemical treatment, immersion treatment)
After that, marking characters etc. with a marking material having adhesiveness on the copper plate, for the other parts with respect to the marking material having adhesiveness to the copper plate, a resist film having no adhesiveness is formed, After that, there is a treatment method in which only the marking material is removed and the mark is plated, and then the resist film is removed to form characters and the like. In the case of stainless steel, it is described in JP-A-50-56334. After printing acid-resistant ink on the non-patterned part of the stainless steel product by screen printing, the pattern part is corroded by etching to form a concave part, and the bottom part of this concave part is electrolytically polished. Apply the
This stainless steel product is used as an anode and is plated with gold, silver, copper or the like as a cathode, and a metal plating layer of gold, silver, copper or the like is formed on the bottom of the recessed portion, JP-B-53-39869.
Japanese Patent Publication No. 56-10999 and Japanese Patent Publication No. 56-10999, a method of forming a colored pattern on a stainless clad aluminum plate, and a mechanical pattern on the back surface of a stainless steel plate described in Japanese Patent Laid-Open No. 2-307629. After applying (scoring, pressing a jig with a pattern, drawing a pattern with a sharp knife, embossing, etc.), color development (coloring in sulfuric acid-chromic acid solution, hardening of oxide film) There is a processing method to be performed.

On the other hand, the entire surface (back surface) of the photosensitive lithographic printing plate on which the photosensitive resin layer is not provided may be subjected to surface treatment. As a concrete means of this processing method, Japanese Patent Application Laid-Open No. HEI 3
-90388, a method of treatment with an aqueous solution of an alkali metal silicate, a coating having a surface-roughening agent dispersed therein, which is described in JP-A-62-1586, is applied, or a ball grain, A method of mechanically treating with honing grains, brush grains, or the like, or powdering powder directly, JP-A-3-24965.
The resin particles described in JP-B No. 2 are dispersed almost uniformly and heat-sealed, or the embossing roll is pressed from the back surface described in JP-B-55-237 to form an embossed pattern on the entire surface. The method of making it is known.
Further, in a photosensitive lithographic printing plate, an inkjet method, a printing method, etc. have been devised as a method for embodying a design on a part of the back surface of the support.

However, these methods are not only disadvantageous in that they adhere to the photosensitive resin layer when they are wound up or piled up, because the ink portion adhered by printing rises, and the ink melts during development. It has a drawback of calling out. Furthermore, curing (UV or heat)
If a mold ink is used to prevent elution at the time of development, there is a disadvantage in that the equipment cost is enormous. Further, there is a method of pressing a roll or plate embodying the design with the back surface of the support of the photosensitive lithographic printing plate, but this method is not only a drawback that the design part of the roll or plate is worn but also the support When the photosensitive resin layer is provided, the flatness of the support is impaired and the uniformity of the coating film cannot be obtained when the photosensitive resin layer is provided. As a method for solving these problems, Japanese Patent Application No. 5-
In the specification of 100118, a surface (back surface) of a photosensitive lithographic printing plate support on which a photosensitive resin layer is not provided is covered with an insulating material plate having a desired arbitrary shape punched out, and the support is immersed in an aqueous electrolyte solution. Although a photosensitive lithographic printing plate and a method for manufacturing the support have been proposed, in which a desired arbitrary shape is roughened on the back surface of the support by applying a current through the punching surface of the insulating material plate. , There is no description of continuous treatment method.

[0009]

However, when this method and apparatus are used as an industrial-scale apparatus, the insulating material provided between the electrodes has a strength problem or solves the strength problem. There is an economic problem of using expensive insulating materials to do this. Structurally, problems such as dissolution of the metallic electrode due to current application in an aqueous electrolyte solution, corrosion of the metallic electrode due to contact with the aqueous electrolyte solution, and reduction of roughening efficiency due to current leakage from the labyrinth structure part There is. In addition, the amount of electricity when performing this electrochemical treatment affects the concentration of the design, and the higher the amount of electricity, the higher the concentration. This causes a problem that traces of hydrogen gas bubbles are seen. Therefore, as a method for smoothly discharging the hydrogen gas generated when performing this electrochemical treatment, a method in which a large number of holes are provided in the electrode and the aqueous electrolyte solution is blown off from the holes is described. Since the method has a complicated structure, there is an economical problem that the manufacturing cost becomes large when the apparatus is used on an industrial scale.

The object of the present invention is to solve the above-mentioned problems and to carry out light-sensitive lithographic printing without troubles such as corrosion of metallic electrodes, reduction of roughening efficiency due to current leakage from a labyrinth structure, and traces of hydrogen gas bubbles. The design embodied on a part of the back surface of the plate support does not adversely affect the photosensitive resin layer, and the high design property is maintained even after the development processing is finished, and the added value is improved. It is an object of the present invention to provide a continuous processing device that efficiently manufactures a photosensitive lithographic printing plate support on an industrial scale at low cost.

[0011]

The above object of the present invention is to provide a surface of a photosensitive lithographic printing plate having a photosensitive resin layer on an aluminum support, on which the photosensitive resin layer is not provided, in any desired shape. Is covered with a punched insulating material plate, and an electric current is applied to the aluminum support through the punched surface of the insulating material plate in an aqueous electrolyte solution, so that a desired surface of the support is not provided with the photosensitive resin. In a treatment device for a photosensitive lithographic printing plate support for roughening an arbitrary shape, an insulating material plate punched into the desired arbitrary shape is formed on the surface of an insulating cylindrical drum, An electrode is provided inside the cylindrical drum, the surface of the cylindrical drum is in contact with the surface of the aluminum support on which the photosensitive resin is not provided, and the aluminum support is conveyed with the rotation of the cylindrical drum, The above An electrolytic aqueous solution is interposed between an electrode and the aluminum support, and a current applied to the electrode flows through the electrolytic aqueous solution to the aluminum support, for continuous treatment of a photosensitive lithographic printing plate support. apparatus. The insulating material plate in which the desired arbitrary shape is punched is detachable from the surface side of the cylindrical drum, and the electrode inside the cylindrical drum is an electrode container made of each insulating material plate. Of the support for the photosensitive lithographic printing plate as described above, wherein the support is provided inside the drum surface, and is detachable together with the electrode container from the surface side of the drum. Continuous processing equipment. The photosensitive drum according to the above or the above, wherein the cylindrical drum and the support are wrapped at least in a portion including a lowermost portion of the cylindrical drum, and in an upper portion, a portion including an uppermost portion is not wrapped. Continuous lithographic printing plate support processing equipment. The electrode is coaxially opposed to the insulating material plate,
The photosensitive lithographic printing plate as described in any one of 1 to 3, wherein the insulating material plate is arranged around the front surface of the electrode, and a space is provided between the electrode and the insulating material plate. Continuous support processing equipment. A continuous processing device for a photosensitive lithographic printing plate support as described in any one of the above 1 to 3, wherein a space is provided between the electrode and the vicinity of the insulating material plate of the electrode container. The difference between the curvature of the surface of the insulating material plate in contact with the aluminum plate and the curvature of the cylindrical drum is −0.1.
The continuous processing device for a support for a photosensitive lithographic printing plate as described in any one of the above items, which has a range of 0.5 mm. Achieved by

The insulating material plate in the present invention includes not only the insulating material plate but also the insulating structure material plate. It may be detachable from the surface of the cylindrical drum. The electrodes inside the drum are fixed and the electrodes can be insulated from each other. The distance between the support and the electrode is preferably 5 mm to 20 mm. Hereinafter, the present invention will be described in more detail. As the aluminum plate used in the present invention, JIS A1050
Material, JISA1100 material, JISA3003 material, JIS
Various aluminum plates such as A3103 material and JIS A5005 material can be used, but since the surface (surface) that is in close contact with the photosensitive resin layer affects the performance as a printing plate,
Even if the design is embodied on the back surface of aluminum, in the case of uniform aluminum on the front and back sides, the surface (surface) that is in close contact with the photosensitive resin layer is generally prioritized when selecting the material, and surface treatment (mechanical, chemical It is necessary to select the most suitable one depending on the method. However, in the case of an aluminum plate in which the front surface and the back surface are composed of different components, the present invention is not limited to this, and the optimum one can be selected according to the treatment method of each surface (front surface, back surface).

The surface (front surface) of the aluminum plate that comes into close contact with the photosensitive resin layer is subjected to electrochemical graining treatment for ensuring the performance as a printing plate, and the back surface is subjected to electrochemical graining treatment according to the present invention. Prior to being carried out, mechanical graining for removing rolling oil on the front and back surfaces as necessary, or for pretreatment for exposing a clean aluminum surface and for increasing the surface area of the surface. Processing may be performed. For the former of the pretreatment, organic solvents such as trichlene, surfactants or sodium silicates are widely used, and for the latter, alkali etching agents such as sodium hydroxide and potassium hydroxide are widely used. ing. A ball grain method, a nylon brush method, etc. are widely used for mechanical graining. In the subsequent electrochemical roughening, the surface (front surface) that comes into close contact with the photosensitive resin layer is carried out as necessary, but the back surface treatment is performed using an AC power supply waveform, and a sine wave Besides alternating current, it also includes alternating waveforms such as rectangular wave and trapezoidal wave. When the electrochemical roughening treatment of the surface (front surface) that is in close contact with the photosensitive resin layer is performed, it can be performed either before or after the treatment of the back surface,
It is preferably carried out after the treatment of the back surface has been carried out. It is also possible to separately perform the electrochemical graining treatment on the surface starting from the pretreatment and / or the mechanical graining treatment and the electrochemical graining treatment on the back surface,
It is preferable to carry out continuously. Since the present invention relates to the electrochemical roughening of the back surface, the back surface will be mainly described below.

As the electrolyte aqueous solution, an acidic aqueous solution containing hydrochloric acid, nitric acid, hydrofluoric acid, boric acid or tartaric acid as an essential component or an acidic aqueous solution consisting of a mixture of two or more of these acids is suitable. A solution containing the main component is preferred. As these electrolyte aqueous solutions,
Any one known in the art can be used. And its concentration is appropriately selected from the range of about 0.5% by weight to 5.0% by weight. Corrosion inhibitors (or stabilizers) such as nitrates, monoamines, diamines, aldehydes, phosphoric acid, chromic acid, boric acid, ammonium salts, aluminum salts, carbonates, etc. may be added to these electrolyte aqueous solutions as necessary.
Can be added. In the present invention, as described in US Pat. No. 4,087,341,
As disclosed in Japanese Patent Publication No. 61-48596, a method of passing an alternating current to an aluminum plate in a nitric acid-based electrolyte aqueous solution so as to be larger than the anodic electric quantity (QA) and the cathodic electric quantity (QC). In addition, the circuit for the auxiliary counter electrode is connected in parallel to the circuit connected to the main counter electrode for the aluminum plate, and the diode or diode-like mechanism for controlling the flow of the anode current in the main counter electrode is connected to the circuit for the auxiliary counter electrode. A method using the provided electrochemical graining apparatus may be applied. The voltage applied to the aluminum plate is preferably about 1V to about 200V.
V, more preferably 2 V to 100 V, the current density is preferably about 3 A / dm ^{2 to} 300 A / dm ² , more preferably about 3 A / dm ^{2 to} 250 A / dm ² , and the amount of electricity is the aluminum plate. It is determined by the continuous treatment rate, the contact time with the cylindrical drum (electrolytic reaction time), and the degree of roughening, but is preferably about 1 C / dm ² to about 300 C / dm ² , more preferably 3 C / dm ² 20
It is selected from the range of 0 C / dm ² . The temperature of the aqueous electrolyte solution is preferably about 10 ° C to 70 ° C, more preferably 20 ° C to 60 ° C.

Next, the continuous processing apparatus of the present invention will be described. As shown in FIG. 1, the continuous processing apparatus 1 of the present invention comprises a tank 2 made of an acid resistant liquid material, a rotatable cylindrical drum 3 and a sacrificial electrode 4 made of a conductive material. The drum 3 is supported by shafts 5a and 5b, and the inside of the drum 3 and the shafts 5a and 5b are hollow, and these hollows are continuous. Double seals 6a, 6b and 7a, 7b are provided between the tank 2 and the shafts 5a, 5b. Further, the surface of the drum 3 is lined with an acid resistant rubber 8, and several removable insulating material plates (masking plates) 9a and 9b having a desired arbitrary shape are formed. Electrolytic cells 12a, 12b consisting of electrode containers 10a, 10b made of a removable insulating material or insulating structure and electrodes 11a, 11b housed in the electrode containers.
Is provided. Cables 13a and 13b are connected to the electrodes 11a and 11b. The cables 13a, 13b are connected to slip rings 14a, 14b provided at the ends of the shaft 5a. Also, the cables 13a, 1 from the electrodes 11a, 11b
3b is, for example, a slip ring 14a, the electrodes 11a,
It is also possible to connect the cable from the electrode next to 11b to the slip ring 14b and then to the slip ring 14a sequentially. At this time, the cylindrical drum 3
Electrolytic cells 12a, 12 arranged in the circumferential direction on the surface of the
It is desirable that b is an even number per column. The slip ring 1
An insulating material 1 is provided between the shafts 4a and 14b and the shaft 5a.
5 are provided for insulation between the slip rings 14a and 14b and between the slip rings 14a and 14b and the shaft 5a. The shafts 5a and 5b have bearings 16a,
16b, which is provided outside the tank 2 and is fixed to a pedestal (not shown) so as to be rotatable. The aluminum plate 17 is wrapped on the surface of the drum 3, and the drum 3 is rotated at the same speed while a conveying device (not shown) is used.
Are continuously transported by. The prepared and controlled temperature of the aqueous electrolyte solution 18 is a liquid sending device (not shown).
Is sent to the tank 2. The liquid level of the electrolyte aqueous solution 18 in the tank 2 is adjusted by the height of an overflow dam plate (not shown) provided in the tank 2 so that the sacrificial electrode 4 is immersed, and the overflow occurs. The electrolyte aqueous solution 18 is returned to the tank (not shown). In such a state, a power supply brush (not shown) contacting the slip rings 14a and 14b and a power source (not shown) are connected by a cable to apply an alternating current. For example, when a current is first supplied from the slip ring 14a, the current flows through the cable 13a to the electrode 11a provided in the circumferential direction of the drum 3, and the electrode 11a and the electrode 1 are provided.
1a and the electrolyte solution 18 interposed between the masking plate 9a and the electrolyte solution 18 in the masking plate 9a
To reach the aluminum plate 17, pass through the aluminum plate 17, and pass through the electrode 11b and the cable 13.
b, flow with the slip ring 14b, power supply (not shown)
Return to. At the next moment, the current path when the current is supplied from the slip ring 14b is the reverse of the above case.
Thus, while the aluminum plate 17 is being wrapped, the masking plate 9 of the aluminum plate 17 is
A portion corresponding to the punched surface (pattern) of a and 9b is roughened, and several masking plates 9a, 9a,
By providing 9b, continuous processing becomes possible. When alternating current is used in this way, the electrodes 11a, 11b are melted, and in order to prevent this, the amount of electricity flowing from the aluminum plate 17 to the electrodes 11a, 11b is always
A power source designed to supply more electricity than the electric current flowing from the aluminum plate 17 to the aluminum plate 17 is used, and the sacrificial electrode 4 is provided below the cylindrical drum 3 in the transport direction of the aluminum plate 17, Connected using a cable from the power supply.

The electrolytic reaction starts at the moment when the aluminum plate 17 is wrapped in the electrolytic cells 12a and 12b provided on the cylindrical drum 3, and hydrogen gas corresponding to the amount of power supply is generated. This generation of hydrogen gas occurs while the aluminum plate 17 overlaps the electrolysis cells 12a and 12b, and is accumulated in the electrolysis cells 12a and 12b.
When the hydrogen gas bubbles adhere to the surface of the aluminum plate 17, the hydrogen gas bubbles serve as an insulation, and the portion of the aluminum plate 17 to which the hydrogen gas bubbles adhere is
There is a problem that the roughening process is not performed. Therefore, it is important to use a wrapping method that prevents the bubbles of hydrogen gas from adhering to the surface of the aluminum plate 17, and the wrapping between the cylindrical drum 3 and the aluminum plate 17 is at least the maximum of the cylindrical drum 3. It has been found that a method in which the portion including the lower portion and the portion including the uppermost portion in the upper portion are not wrapped is effective in preventing hydrogen gas bubbles from adhering to the surface of the aluminum plate 17.

As shown in FIG. 4, the processing electrolytic cell 12 of the present invention is an insulating (or insulating structure) material that is removable from the surface side on which an acid resistant rubber plate 8 is provided and a desired arbitrary shape is formed. A plate 9, an electrode container 10 made of an insulating material or structure which is also removable from the front surface side, and an electrode 11 made of carbon or resin-impregnated carbon contained in the electrode container 10, for example, a bolt having an insulating or insulating structure. By means of (not shown), a rotatable cylindrical drum 3 having a hollow interior and an acid resistant rubber plate 8 lined on the surface of a metal material (not shown) is provided. The electrode 11 coaxially faces the masking plate 9, and its cross-sectional area is equal to or larger than the cross-sectional area of a portion where the desired arbitrary shape of the masking plate 9 is punched out. A space 28 filled with an aqueous electrolyte solution is provided between the electrodes, between the masking plate 9 and the electrode 11, and between the electrode container 10 and the electrode 11.
The electrode 11 and the electrode container 10 include the cylindrical drum 3
Seals 29a, 29b, 29 for preventing the electrolyte aqueous solution from entering the metal part (not shown) and the inside of the
c and 29d are provided. The electrode 11 is fixed to the electrode container 10 by, for example, a bolt (not shown), and as shown in FIG. 1, a slip ring 14 (not shown) provided on the shaft 5a of the cylindrical drum 3 is provided. No)
3 for connecting a cable for feeding power to the electrode 11 through the inside of the cylindrical drum and the shaft.
0 is provided. The cylindrical drum 3 having a plurality of such treatment electrolytic cells 12 provided on the surface is housed in a treatment tank 2 made of an acid resistant liquid material, and the treatment tank 2 is filled with an electrolyte whose temperature is controlled. An aluminum plate 17 is wrapped around the cylindrical drum 3 with an aqueous solution 18, and the cylindrical drum 3 is covered with the aluminum plate 1 by a conveying device.
It is conveyed while rotating at the same speed as 7. In this state, when a power supply brush (not shown) connected to the slip ring 14 and a power source are connected by a cable 13 and an alternating current is applied, the aluminum plate 17 is provided on the cylindrical drum 3. Further, the electrolytic reaction starts on the surface of the aluminum plate 17 from the moment it is wrapped in the processing electrolytic cell 12, and hydrogen gas is generated. The amount is proportional to the amount of power supply.
This generation of hydrogen gas occurs while the aluminum plate 17 is wrapped with the processing electrolytic cell 12, and is accumulated in the sealed processing electrolytic cell 12. When the hydrogen gas bubbles adhere to the surface of the aluminum plate 17,
The hydrogen gas bubbles play a role of insulation, and a problem occurs that the surface of the aluminum plate to which the hydrogen gas bubbles are attached is not subjected to the roughening treatment.

Therefore, the hydrogen gas bubbles that are generated and sealed in the electrolytic cell for treatment 12 do not adhere to the surface while the aluminum plate is wrapped, and are separated from the aqueous electrolyte solution 18, It is important to have a processing electrolytic cell and wrap method that is structured to trap in an unaffected space. For that purpose, the generated hydrogen gas bubbles are floated and separated by their own buoyancy force and the centrifugal force due to the rotation of the cylindrical drum 3, and are collected toward the electrode 11, which is then roughened on the rough surface of the aluminum plate 17. It is effective to have a structure that does not affect the formation of the gas, that is, a structure in which the space 28 around the electrode 11 is provided and the generated hydrogen gas bubbles are trapped so as not to affect the punched portion of the masking plate 9. . At the same time, in a place where the sealing of the electrolytic cell for treatment 12 is opened, that is, in a place where the aluminum plate does not wrap with the cylindrical drum 3,
It is effective that the collected hydrogen gas bubbles are floated from the punched portion of the masking plate 9 into the electrolyte aqueous solution in the treatment tank and separated.

Specifically, the electrode 11 coaxially faces the masking plate 9, and the masking plate 9 and the electrode 11
A space 28 filled with the aqueous electrolyte solution is provided between the masking plate 9 and the electrode 11 and between the electrode container 10 and the electrode 11, and the cross-sectional area of the space 28 is defined by the mask 28. The structure is made larger than the punched-out portion (the maximum area determined by the design). As a method of wrapping the aluminum plate, at least a portion including the lowermost portion of the cylindrical drum 3 is used,
In the upper part, it was found that the method in which a part including the uppermost part does not wrap is effective. Further, the masking plate 9
The difference between the curvature of the surface in contact with the aluminum plate and the curvature of the cylindrical drum 3 is preferably small, and in consideration of the influence on the aluminum plate, -0.1 mm to 0.5 m.
It has been found that a range of m is desirable. Since the electrolyte aqueous solution becomes a resistance when a current flows, it is advantageous in terms of power that the distance between the electrode 11 and the aluminum plate is short. Considering the structure of the masking plate 9, Usually, it is preferably 5 to 20 mm. Further, the distance between the masking plate 9 and the electrodes, the distance between the masking plate 9 and the electrodes, and the distance between the electrode 11 and the electrode container 10 are
Depending on the amount of hydrogen gas generated and the difficulty of manufacturing the electrolysis cell 12, it is preferably 1 mm or more.

Since the back surface roughened electrochemically continuously in this way does not rise up as in the ink printing method or the pressure-bonding method of the support, it is adhered to the photosensitive resin layer. Or the ink elutes during the development process,
It cannot be said that the uniformity of the photosensitive resin layer is adversely affected when it is provided. The roughness (Ra) is preferably about 0.2 μm to 0.7 μm, more preferably 0.
25 μm to 0.5 μm is desirable.

The surface of the back surface which has been subjected to the above treatment may be subsequently subjected to a light etching treatment. However, the surface (surface) that is usually in close contact with the photosensitive resin layer is subjected to an etching treatment after the electrochemical graining treatment. When the above-mentioned front and back surface etching processing is performed,
Although it is possible to perform each separately, it is preferable to perform them simultaneously. The etching treatment is to dissolve the surface of the aluminum plate with an aqueous solution of acid or alkali. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, nitric acid, hydrochloric acid, and the like, and examples of the alkali include sodium hydroxide, potassium hydroxide, sodium triphosphate, potassium triphosphate, sodium aluminate, silicic acid. Includes sodium, sodium carbonate and the like. Among these, it is particularly preferable to use the latter aqueous solution because the etching rate is faster.

Since a part of the back surface of the aluminum plate treated as described above is soft and easily worn as it is as described above, it is desirable to form an anodized film in order to improve its strength. The anodizing treatment can be performed according to a conventionally known method. For example,
Sulfuric acid, phosphoric acid, oxalic acid, chromic acid, amidosulfonic acid, or a mixture of two or more thereof, or an aqueous solution or a non-aqueous solution containing aluminum ions in them is used as an electrolyte aqueous solution, and anodizing treatment is mainly performed using direct current. , Alternating current or a combination of these currents can also be used. The electrolyte concentration is 1% to 80% by weight,
The temperature is in the range of 5 ° C to 70 ° C, and the amount of electricity is 10 C / dm ²
200C / dm ² range, oxide film amount is 0.05g / m
The range of ^{2 to} 2.0 g / m ² is preferable.

The surface of the thus-obtained photosensitive lithographic printing plate support is subjected to a necessary surface treatment, and a photosensitive resin layer which has been conventionally known is further provided to embody a design on the back surface. The photosensitive lithographic printing plate can be obtained.

[0024]

EXAMPLES The present invention will be described in more detail below with reference to examples. In addition, "%" in the examples means "% by weight" unless otherwise specified. (Embodiment 1) As shown in FIG. 2, the continuous processing apparatus 1 of the present invention is installed in an equipment consisting of a delivery section 19, various processing tanks, a dryer 20 and a winding section 21, and an aluminum plate continuous processing apparatus 22 is installed. Configured. The specifications of the continuous processing apparatus 1 are as follows, and a perspective view of one embodiment of the masking plate shape is shown in FIG. (1) Cylindrical drum diameter: 500 mm (2) Number of masking plates: 12 (angle 60
° Pitch, distance 160mm) (3) Aluminum-electrode distance: 10mm (4) Masking plate-electrode space distance: 5m
m (5) Electrode container to electrode spatial distance: 7 m
m (6) Diameter of masking plate: outer diameter 80 mm,
(Punched part diameter 50 mm) (7) Electrode diameter facing the masking plate: 50 m
m (8) Thickness of acid resistant rubber: 2 mm (9) Difference in curvature between masking plate and cylindrical drum:
Approximately 0.2 mm (10) Lapping angle of aluminum support with cylindrical drum: 180 ° C. Then, by combining a liquid adjusting device, a liquid sending device and a power supply device (both not shown), continuous processing of aluminum plate is possible Equipment. Next, the aluminum plate 12 having a thickness of 0.15 mm (width 300 mm, from the sending unit 19 to the winding unit 21)
(JIS A1050 material). Then, a 10% aqueous sodium hydroxide solution (50 ° C.) is sprayed from the spray pipe onto the aluminum plate 17 to perform cleaning treatment by degreasing and etching, and first washing tanks 24 and 25 for spraying water from the spray pipe to wash with water. % Desulfurization bath 25 for removing smut by spraying a sulfuric acid aqueous solution, a second washing bath 26 for desmutting and further washing with water, a third washing bath 27 for continuous treatment and washing, and a dryer 2 for drying the treated aluminum plate 17.
0 was activated. Further, the aqueous electrolyte solution 18 was prepared in a solution preparation tank (not shown) so that the nitric acid concentration was 10 g / 1 and the aluminum ion concentration was 7 g / 1, and the solution was continuously supplied at a temperature of 55 ° C. using a liquid sending device (not shown). The solution was sent to the processing tank 2 of the processing apparatus 1. Electrolyte solution 1 sent to the treatment tank 2
The liquid level of No. 8 was adjusted by the height of an overflow dam plate (not shown) provided in the processing tank 2. afterwards,
While the aluminum plate 17 is continuously traveling at a conveying speed of 35 m / min, a frequency of 60 H is supplied from a power supply device (not shown).
z, current density 20 A / dm ² is adjusted to generate a sinusoidal alternating current through slip rings 14a and 14b,
11b, the aluminum plate 17 was continuously electrochemically roughened, and wound on the winding section 21. After that, the roughened aluminum plate 17 is cut out,
After treatment with a 25% sulfuric acid aqueous solution for 20 seconds, it was subjected to anodization treatment with a 15% sulfuric acid aqueous solution at a current density of 1 A / dm ² for 30 seconds. Finally, it was washed with water and dried to obtain a photosensitive lithographic printing plate support in which an arbitrary design was realized by electrochemical graining on one surface. The design portion embodied on one surface of the photosensitive lithographic printing plate support in this way has a roughening degree of Ra = 0.25 μm to 0.30.
In addition to the fact that there is no trace of hydrogen gas bubbles generated, which is uniform as μm, the boundary with the non-roughened part is
It became very clear.

(Example-2) The same treatment as in Example-1 was carried out except that the electrolytic aqueous solution 18 in Example-1 had a hydrochloric acid concentration of 11.5 g / 1 and an aluminum ion concentration of 4.5 g / 1. . As a result, the embodied design portion was the same as in Example-1.

[0026] except that the current density in (Example -3) Example -1 was 100A / dm ^2, was subjected to the same treatment as in Example -1.

As a result, traces of bubbles having a diameter of about 1 mm were found in the embodied design portion, and a design having a uniform density could not be obtained.

(Example 4) The same processing as in Example 1 was carried out except that the carrying speed in Example 1 was changed to 50 m / min. As a result, the embodied design portion was the same as that in Example 1 except that the density was low.

[0029] except that the electric density in (Example -5) Example -1 was 45A / dm ^2, was subjected to the same treatment as in Example -1. As a result, the part of the embodied design is
Example 1 was the same as Example 1 except that the concentration thereof was higher than that of Example 1.

[0030] except that the electric density in (Example -6) Example -1 was 75A / dm ^2, was subjected to the same treatment as in Example -1. As a result, the part of the embodied design is
Example 1 was the same as Example 1 except that the concentration thereof was higher than that of Example 1.

[0031]

With the continuous processing apparatus for the photosensitive printing plate of the present invention, the design of the desired arbitrary shape embodied on a part of the back surface of the support does not cause a trace of generated hydrogen gas bubbles. Not only that, the boundary with the non-roughened area is extremely clear, it does not adversely affect the photosensitive resin layer, and it retains its high designability even after the development processing is completed, and adds value. Can be improved. Furthermore, the support for the photosensitive lithographic printing plate can be continuously obtained inexpensively and efficiently on an industrial scale.

[Brief description of drawings]

FIG. 1 is a front view of an embodiment of a continuous processing apparatus for a photosensitive lithographic printing plate support according to the present invention.

FIG. 2 is a schematic diagram of an aluminum plate continuous processing apparatus of the continuous processing apparatus for a photosensitive lithographic printing plate support of the present invention.

FIG. 3 is a perspective view of an embodiment of a masking plate used in the processing apparatus for the photosensitive lithographic printing plate support of the present invention.

FIG. 4 is a schematic cross-sectional view of an example of an electrolytic cell used in a continuous processing apparatus for a photosensitive lithographic printing plate support of the present invention.

[Explanation of symbols]

 1 Continuous Treatment Device 2 Treatment Tank 3 Cylindrical Drum 4 Sacrificial Electrode 5 Shaft 9 Insulating Material Plate (Masking Plate) 11 Electrode 12 Electrolytic Cell 13 Cable 14 Slip Ring 17 Aluminum Plate 18 Electrolyte Aqueous Solution 19 Delivery Part 20 Dryer 21 Winding Part 23 Etching tank 24 1st water washing tank 25 Desmut tank 26 2nd water washing tank 27 3rd water washing tank 28 Space 29a, 29b, 29c, 20d, Seal 30 Tap

Claims (6)

[Claims] 1. A surface of a photosensitive lithographic printing plate having a photosensitive resin layer provided on an aluminum support, on which the photosensitive resin layer is not provided, is covered with an insulating material plate having a desired arbitrary shape punched out. By applying a current to the aluminum support in the aqueous electrolyte solution through the punched surface of the insulating material plate, the surface of the support on which the photosensitive resin is not provided is roughened in a desired arbitrary shape. In a processing apparatus for a planographic printing plate support, an insulating material plate punched into the desired arbitrary shape is formed on the surface of an insulating cylindrical drum,
An electrode is provided inside the cylindrical drum, and the surface of the aluminum support is in contact with the surface of the aluminum support on which the photosensitive resin is not provided, and the aluminum support is conveyed as the cylindrical drum rotates. An aqueous electrolyte solution is interposed between the electrode and the aluminum support, and a current applied to the electrode flows to the aluminum support through the aqueous electrolyte solution. Continuous processing equipment. 2. The insulative material plate punched out in the desired arbitrary shape is detachable from the surface side of the cylindrical drum, and the electrodes inside the cylindrical drum have respective insulating material plates. 2. The photosensitive material according to claim 1, wherein the photosensitive resin is housed in an electrode container made of a detachable structure, is provided inside the surface of the drum, and is detachable together with the electrode container from the surface side of the drum. Continuous lithographic printing plate support processing equipment. 3. The lapping between the cylindrical drum and the support is performed at least in a portion including the lowermost portion of the cylindrical drum, and in the upper portion, a portion including the uppermost portion is not wrapped. Item 3. A continuous processing device for the photosensitive lithographic printing plate support according to item 1 or 2. 4. The electrode is coaxially opposed to the insulating material plate, and the insulating material plate is arranged around the front surface of the electrode,
4. A continuous processing apparatus for a photosensitive lithographic printing plate support according to claim 1, wherein a space is provided between the electrode and the insulating material plate. 5. The photosensitive lithographic printing plate support according to claim 1, wherein a space is provided between the electrode and the vicinity of the insulating material plate of the electrode container. Continuous body processing equipment. 6. The difference between the curvature of the surface of the insulating material plate in contact with the aluminum plate and the curvature of the cylindrical drum is −
The continuous processing apparatus for a photosensitive lithographic printing plate support according to any one of claims 1 to 5, wherein the continuous processing device has a range of 0.1 to 0.5 mm.