JPH0776796A - Patina forming base material, production of the base material and formation of patina using the base material - Google Patents

Patina forming base material, production of the base material and formation of patina using the base material

Info

Publication number
JPH0776796A
JPH0776796A JP15857594A JP15857594A JPH0776796A JP H0776796 A JPH0776796 A JP H0776796A JP 15857594 A JP15857594 A JP 15857594A JP 15857594 A JP15857594 A JP 15857594A JP H0776796 A JPH0776796 A JP H0776796A
Authority
JP
Japan
Prior art keywords
patina
base material
copper
treatment
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15857594A
Other languages
Japanese (ja)
Inventor
Toshio Tani
俊夫 谷
Akira Matsuda
晃 松田
Hideo Suda
英男 須田
Minoru Igarashi
稔 五十嵐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP15857594A priority Critical patent/JPH0776796A/en
Publication of JPH0776796A publication Critical patent/JPH0776796A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide a patina forming base material capable of forming natural patina to be used for roofing in its early stage and to artificially form patina in the base material. CONSTITUTION:AC electrolysis is applied on the surface of a base material with at least its surface consisting of copper or copper alloy to obtain a patina forming base material on which a porous layer having many micropores with the opening 1 narrowed is formed. Patina is artificially formed in the base material. Water, moisture and patina component are easily held by the base material because of its porous surface. Accordingly, natural patina is formed in its early stage, and the patina formed in the base material is anchored in the base material surface and hardly released.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、屋根材等に用いられ
る、天然緑青が早期に形成される緑青形成用基材、及び
その製造方法、及び前記基材を用いて密着性に優れた人
工緑青を形成する方法に関する。
FIELD OF THE INVENTION The present invention relates to a patina-forming base material for use in roofing materials and the like in which natural patina is formed at an early stage, a method for producing the same, and an artificial material excellent in adhesion using the base material. It relates to a method of forming patina.

【0002】[0002]

【従来の技術】寺院の銅屋根等に緑青が形成されている
のをよく見かける。この緑青は天然に形成される。即
ち、大気中に晒された銅板は、徐々に表面が酸化して光
沢がなくなり、そこに酸化第一銅や酸化第二銅が生成し
て、黒色、赤橙色、褐色等に変色する。更に時間が経つ
と部分的にごく僅かずつ塩基性銅塩の緑青が形成され、
やがて全面が緑青に覆われる。この緑青に覆われるまで
の期間は、降雨量、温湿度、大気中の緑青成分、粉塵、
更には鳥の糞等に影響される。中でも温湿度と緑青成分
の影響が大きい。従来の銅屋根等には、圧延上りの銅板
が使用されており、緑青で覆われるまでには20年近い年
月を要する。この緑青は耐食性に富む上、美麗で趣が有
る為、一般家屋にも銅屋根が用いられるようになった。
しかし、前述のように、緑青が自然に形成されるには長
年月を要し、しかもこの年月は、昨今の酸性雨や大気汚
染の影響で、更に伸びたとも言われている。このように
長年月を要しては、折角銅屋根を葺いても、緑青が形成
される前に家の建て替え時期がきてしまう。
[Prior Art] I often see patina formed on the copper roofs of temples. This patina is naturally formed. That is, the surface of the copper plate exposed to the air gradually oxidizes and loses its luster, and cuprous oxide and cupric oxide are generated there, and the color changes to black, reddish orange, brown or the like. As time passes, patina of the basic copper salt is formed little by little,
Eventually the entire surface is covered with patina. During the period until it is covered with patina, rainfall, temperature and humidity, atmospheric patina components, dust,
Furthermore, it is affected by bird droppings. Above all, the effects of temperature and humidity and the patina component are great. Conventional copper roofs, etc. are made from rolled copper plates, and it takes nearly 20 years to be covered with patina. Since this patina has excellent corrosion resistance and is beautiful and attractive, copper roofs have also come to be used in ordinary houses.
However, as mentioned above, it takes many years for patina to form naturally, and it is said that this year has grown further due to the recent effects of acid rain and air pollution. Thus, after many years, even if you roof the corner copper roof, it will be time to rebuild the house before the patina is formed.

【0003】そこで、人工的に緑青を形成する方法が開
発された。この緑青の人工形成法には、銅板等を電解液
中でアノード酸化して電気化学的に形成する方法(特公
昭55-12117号等)、化成処理液に接触させて化学反応に
より形成する方法(特公昭56-9270 号等) 、銅粉を含有
する樹脂塗料を塗布研磨後化成処理する方法( 特公昭56
-30396号等) 、緑青の一種である塩基性炭酸銅粉末を混
合した塗料を塗布する方法(特開昭55-139467 号等) 、
樹脂を含有した化成処理液を塗布して形成する方法( 特
公昭62-19910号等) 等がある。しかし、この人工緑青は
天然緑青とは組成や構造が異なる為、数年で剥離してし
まうことが多かった。従って美観を長期間保持すること
が困難であった。
Therefore, a method for artificially forming patina has been developed. This patina artificial formation method includes a method in which a copper plate or the like is anodically oxidized in an electrolytic solution to form it electrochemically (Japanese Patent Publication No. 55-12117, etc.), and a method in which it is formed by a chemical reaction in contact with a chemical conversion treatment solution. (Japanese Patent Publication No. 56-9270, etc.), a method of applying chemical conversion treatment after coating and polishing a resin coating containing copper powder (Japanese Patent Publication No. 56270).
-30396 etc.), a method of applying a paint mixed with basic copper carbonate powder which is a kind of patina (JP-A-55-139467 etc.),
There is a method of forming by applying a chemical conversion treatment liquid containing a resin (Japanese Patent Publication No. 62-19910, etc.). However, since this artificial patina has a different composition and structure from natural patina, it often peeled off within a few years. Therefore, it is difficult to maintain the aesthetic appearance for a long time.

【0004】[0004]

【発明が解決しようとする課題】このようなことから、
天然緑青が早期に形成される基材の開発、或いは密着性
に優れた人工緑青の形成方法の開発が強く望まれてい
た。本発明の目的は、天然緑青が早期に形成される基
材、前記基材の製造方法、及び剥離し難い緑青の形成方
法を提供することにある。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
It has been strongly desired to develop a base material on which a natural patina is formed at an early stage or a method for forming an artificial patina which has excellent adhesion. An object of the present invention is to provide a substrate on which natural patina is formed at an early stage, a method for producing the substrate, and a method for forming patina which is difficult to peel off.

【0005】[0005]

【課題を解決のための手段】請求項1の発明は、少なく
とも表面が銅又は銅合金からなる基材であって、前記基
材表面に交流電解処理が施されていることを特徴とする
緑青形成用基材である。この緑青形成用基材は、図1に
示すように、表面に、開口部1が狭まった微細孔2を多
数有する多孔質層が形成されているものである。
According to a first aspect of the present invention, there is provided a base material having at least a surface made of copper or a copper alloy, and the surface of the base material is subjected to an AC electrolytic treatment. It is a base material for formation. As shown in FIG. 1, this green-blue forming substrate has a porous layer having a large number of fine pores 2 having narrow openings 1 formed on the surface thereof.

【0006】前記開口部が狭まった微細孔を多数有する
多孔質層の、前記微細孔内には、水分や湿気、大気中の
SO2 、O2 、CO2 、NOX 、SO3 2- 、SO4 2-
NO 3 - 、Cl- 等の緑青成分が保持されて、酸化や天
然緑青(主として塩基性硫酸銅、環境によっては塩基性
塩化銅、塩基性炭酸銅等との複合化合物)の形成が促進
される。又前記基材上に形成される天然緑青や人工緑青
は、前記微細孔に係着して剥離し難くなる。この発明で
は、交流電解処理は、酸又はアルカリ性水溶液、又は電
解質を含む有機溶媒等の電解液中にて行われる。
The opening has a large number of fine holes narrowed
In the fine pores of the porous layer, moisture, humidity, and
SO2, O2, CO2, NOX, SO3 2-, SOFour 2-,
NO 3 -, Cl-The patina components such as
Natural patina (mainly basic copper sulfate, basic in some environments
Formation of complex compounds with copper chloride, basic copper carbonate, etc.)
To be done. In addition, natural patina or artificial patina formed on the base material
Becomes difficult to be peeled off by engaging with the fine holes. With this invention
AC electrolytic treatment is performed with an acid or alkaline aqueous solution, or
It is carried out in an electrolytic solution such as an organic solvent containing degrading.

【0007】請求項3の発明は、少なくとも表面が銅又
は銅合金からなる基材に、電解液中で交流電解処理を施
すことを特徴とする請求項1又は請求項2記載の緑青形
成用基材の製造方法である。
The invention of claim 3 is characterized in that a base material having at least a surface made of copper or a copper alloy is subjected to an alternating current electrolytic treatment in an electrolytic solution. It is a method of manufacturing a material.

【0008】前記基材には、銅又は銅合金材料を始めと
して鉄鋼やステンレス鋼材料に銅を被覆形成した材料等
が適用される。前記基材に施す交流電解処理は、基材を
一方の電極にして電解液中にて交流を通電することによ
りなされる。交流電源には、通常の50Hzの交流電源又
はこれを他の周波数に変換したもの等が適用される。前
記電解液には、銅を溶解し得る任意の電解液が用いられ
る。例えば、酸又はアルカリ性水溶液、又はアンモニウ
ム塩、NH4 + のような銅のキレート剤、CuSO4
加H2 SO4 、NaCl、NH4 Cl、HCl等の水溶
液が用いられる。又水溶液は、pHや溶質濃度の制限を
特には受けず、NH3 水やNaOH等を添加したアルカ
リ性領域の水溶液を用いても構わない。但し、中性領域
では電解電圧が高めになり、電気代が嵩んで不利であ
る。
As the base material, a material such as a copper or copper alloy material and a steel or stainless steel material coated with copper is applied. The alternating current electrolytic treatment applied to the base material is performed by using the base material as one electrode and applying an alternating current in the electrolytic solution. As the AC power source, a normal 50 Hz AC power source or a power source obtained by converting this to another frequency is applied. As the electrolytic solution, any electrolytic solution capable of dissolving copper is used. For example, an acid or alkaline aqueous solution, or an ammonium salt, a copper chelating agent such as NH 4 + , an aqueous solution of CuSO 4 added H 2 SO 4 , NaCl, NH 4 Cl, HCl or the like is used. The aqueous solution is not particularly limited by pH and solute concentration, and an aqueous solution in an alkaline region to which NH 3 water, NaOH or the like is added may be used. However, in the neutral region, the electrolysis voltage becomes high, and the electricity cost increases, which is disadvantageous.

【0009】少なくとも表面が銅又は銅合金からなる基
材の表面を粗化する方法は色々あるが、中でも交流電解
処理法は、圧延上がりの基材を、電解液中で、銅イオン
の供給なしで又電解条件の制約を受けずに、容易に粗面
化できる。交流電解処理は基材をアノードとカソードに
交互に変化させて電解処理する方法で、基材がアノード
のときに表面の銅層が溶出(エッチング)して粗面化
し、更に基材がカソードのときに溶出銅が基材表面に析
出して著しく粗面化する。予め銅を電解液に溶解してお
くと、交流電解処理の初期から溶銅が析出して基材の粗
面化が定常化して好ましい。この交流電解処理では基材
の粗面化が一工程で行えるので効率が良い。この交流電
解処理では周波数は特に限定しないが、電解液によって
は、周波数により粗面化形状が変わるので、選択する必
要がある。
There are various methods for roughening the surface of a base material at least having a surface made of copper or copper alloy. Among them, the AC electrolytic treatment method is a method in which a base material just rolled is not supplied with copper ions in an electrolytic solution. Moreover, the surface can be easily roughened without being restricted by electrolysis conditions. The alternating current electrolytic treatment is a method in which the base material is alternately changed to an anode and a cathode, and electrolytic treatment is performed.When the base material is the anode, the copper layer on the surface is eluted (etched) to roughen the surface, and further the base material is the cathode. Occasionally, the eluted copper is deposited on the surface of the base material and is remarkably roughened. It is preferable to dissolve copper in the electrolytic solution in advance, because molten copper is deposited from the initial stage of the alternating current electrolytic treatment and the roughening of the surface of the base material becomes steady. This AC electrolytic treatment is efficient because the substrate can be roughened in one step. The frequency in this AC electrolysis treatment is not particularly limited, but depending on the electrolytic solution, the roughened shape changes depending on the frequency, so it must be selected.

【0010】この発明において、電解液中に塩素イオン
が含有されていると、粗面化時間が短縮され、又微細に
粗面化される。更に厚さ方向にもトンネル状にマイクロ
エッチングされ形状が複雑になる。前記の微細な粗面形
状により、保水性、保湿性が向上し、雨水に溶解したS
2 、O2 、CO2 、NOX 、SO3 2- 、SO4 2- 、N
3 - 、Cl- 等の緑青成分も微細孔内に補足残留され
易くなり、緑青化に要する時間が著しく短縮される。
In the present invention, when chlorine ions are contained in the electrolytic solution, roughening time is shortened and finely roughened. Furthermore, micro etching is performed in the tunnel direction in the thickness direction, and the shape becomes complicated. Due to the above-mentioned fine rough surface shape, water retention and moisture retention are improved, and S dissolved in rainwater
O 2 , O 2 , CO 2 , NO X , SO 3 2- , SO 4 2- , N
The patina components such as O 3 and Cl are also easily trapped and retained in the micropores, and the time required for patina conversion is significantly shortened.

【0011】この発明において、電解液温度を60℃以下
に保持すると、アノード時に、酸化皮膜生成が抑えられ
て基材表面が溶出し易くなり、又局部溶解が進行して微
細にエッチングされる。又カソード時には、電流が凸部
に集中し、そこが焼け状態になって粗面化が顕著にな
る。この低温効果は、電解液温度を5℃より下げても飽
和する。電解液を冷却するのは費用もかかるので、電解
液の温度は5〜60℃の範囲に制御するのが望ましい。
In the present invention, if the temperature of the electrolytic solution is maintained at 60 ° C. or lower, the formation of an oxide film is suppressed at the anode, the surface of the base material is liable to be eluted, and local dissolution progresses to cause fine etching. At the time of the cathode, the electric current concentrates on the convex portion, which becomes a burnt state, and the roughening becomes remarkable. This low temperature effect is saturated even when the temperature of the electrolytic solution is lowered below 5 ° C. Since it is expensive to cool the electrolyte, it is desirable to control the temperature of the electrolyte within the range of 5 to 60 ° C.

【0012】この発明において、アノード時に溶出した
銅の一部は、カソード時に析出せずに電解液に残留す
る。電解液中の銅濃度が高くなるとレベリング性が向上
して通常の銅めっきと同じ状態となり粗面化が鈍る。こ
の為電解液中の銅濃度は1.0mol/dm3以下に管理するのが
好ましい。
In the present invention, part of the copper eluted at the anode remains in the electrolytic solution without being deposited at the cathode. When the copper concentration in the electrolytic solution becomes high, the leveling property is improved, and the state becomes the same as that of ordinary copper plating, so that the roughening of the surface becomes dull. Therefore, it is preferable to control the copper concentration in the electrolytic solution to 1.0 mol / dm 3 or less.

【0013】この発明において、交流電解処理時の電流
密度は、30A/dm2 以上のとき基材凸部に電流が集中す
るようになって、アノード時の局部エッチングとカソー
ド時の焼け状態での局部析出が促進して粗面化が顕著と
なる。他方、電流密度が 100A/dm2 を超えると、反応
熱により電極近傍の電解液温度が上昇して粗面化が低下
する。従って電流密度は30A/dm2 以上、 100A/dm2
以下にするのが望ましい。
In the present invention, when the current density during the AC electrolytic treatment is 30 A / dm 2 or more, the current concentrates on the convex portion of the base material, and the local etching at the anode and the burned state at the cathode occur. Local precipitation is promoted and roughening becomes remarkable. On the other hand, when the current density exceeds 100 A / dm 2 , the temperature of the electrolytic solution near the electrodes rises due to the heat of reaction and the surface roughening decreases. Therefore, the current density is 30 A / dm 2 or more, 100 A / dm 2
The following is preferable.

【0014】交流電解処理の電極については、基材を一
方の電極のみに用いても良いが、同時に両極に用いると
交流電解処理が効率よくなされる。基材を一方の電極の
みに用いる場合は、対極に同種の銅材料を用いても良い
し、SUS製、カーボン製等の不溶性電極を用いても良
い。又2枚のカーボン電極間に基材を通して間接給電を
行っても良い。間接給電は、交流電解処理を連続的に行
うことを容易にし、生産性向上に有利である。
Regarding the electrodes for the AC electrolysis treatment, the base material may be used for only one of the electrodes, but if they are used for both electrodes at the same time, the AC electrolysis treatment will be performed efficiently. When the base material is used only for one electrode, the same kind of copper material may be used for the counter electrode, or an insoluble electrode made of SUS, carbon or the like may be used. In addition, indirect power supply may be performed by passing a base material between two carbon electrodes. The indirect power supply facilitates continuous AC electrolysis treatment and is advantageous in improving productivity.

【0015】請求項1の発明は、少なくとも表面が銅又
は銅合金からなる基材上に緑青を形成する方法におい
て、緑青形成前の基材に交流電解処理を施すことを特徴
とするものである。
According to a first aspect of the present invention, in a method for forming patina on a base material having at least a surface made of copper or a copper alloy, the base material before patina formation is subjected to AC electrolysis treatment. .

【0016】本発明は、緑青を形成する基材に交流電解
処理を施して表面を粗化して、緑青の密着性を高めよう
とするものである。
The present invention is intended to enhance the adhesion of patina by subjecting a patina-forming substrate to an AC electrolytic treatment to roughen the surface.

【0017】本発明において、交流電解処理前に、基材
表面を機械的に研磨しておくと、緑青の密着性が一層向
上する。機械的研磨にはバフロール、ブラシロール、シ
ョットブラスト、サンドブラスト等の通常の研磨方法が
用いられる。交流電解処理により表面を粗化した基材表
面に銅を電気めっきすると基材表面の粗化が助長されて
緑青の密着性が向上する。交流電解処理後に行う銅の電
気めっきは、硫酸銅浴、シアン化銅浴、ピロリン酸銅浴
等を用いた通常の電気めっき法が適用される。前記電気
めっき浴に光沢剤を過度に添加すると、電気めっき後の
表面が平滑化して緑青の密着性が低下するので光沢剤の
添加は適量に止める必要がある。
In the present invention, if the surface of the base material is mechanically polished before the AC electrolysis treatment, the adhesion of patina is further improved. For mechanical polishing, ordinary polishing methods such as buff roll, brush roll, shot blast, sand blast and the like are used. When copper is electroplated on the surface of the base material whose surface has been roughened by AC electrolysis, roughening of the surface of the base material is promoted and the adhesion of patina is improved. For the electroplating of copper performed after the alternating current electrolytic treatment, a normal electroplating method using a copper sulfate bath, a copper cyanide bath, a copper pyrophosphate bath, or the like is applied. If a brightening agent is excessively added to the electroplating bath, the surface after electroplating is smoothed and the adhesion of patina is lowered, so it is necessary to stop the addition of the brightening agent in an appropriate amount.

【0018】基材には、交流電解処理前に、必要に応じ
て脱脂や酸洗いを施す。本発明にて形成した緑青は、そ
の表面にクリアラッカーを塗布しておくと、ロールフォ
ーミング加工等を行っても緑青が剥離しない。本発明方
法は屋根板等の板状製品、鋳造製品、加工組立製品等の
種々の形状又は用途の製品の緑青形成に適用してその効
果が発現される。
The base material is subjected to degreasing and pickling, if necessary, before the AC electrolysis treatment. If the surface of the patina formed in the present invention is coated with a clear lacquer, the patina does not peel off even if roll forming is performed. The method of the present invention is applied to the formation of patina in various shapes or uses such as plate-like products such as roofing boards, cast products, processed and assembled products, and the effect is exhibited.

【0019】[0019]

【作用】本発明の緑青形成用基材は、少なくとも表面が
銅又は銅合金からなる基材であり、前記基材表面に交流
電解処理が施されたもので、基材表面は、開口部が狭ま
った微細孔を多数有する多孔質層から形成されている。
この多孔質層は、その微細孔内に緑青成分を保持して緑
青を早期に形成し、又前記微細孔は形成された緑青を係
着して緑青の剥離を防止する。
The base material for forming patina of the present invention is a base material having at least a surface made of copper or a copper alloy, and the base material surface has been subjected to an alternating current electrolytic treatment. It is formed of a porous layer having a large number of narrow micropores.
This porous layer retains the patina component in its micropores to form patina early, and the micropores attach the patina formed to prevent the patina from peeling.

【0020】本発明の緑青形成用基材は、少なくとも表
面が銅又は銅合金からなる基材の表面を、電解液中で交
流電解処理することにより容易に製造される。交流電解
処理に際し、基材は、アノード時に表面の銅層が局部的
に溶出し、カソード時に凸部に優先的に電流が集中して
溶出銅が析出する。このようにして基材表面は、開口部
が狭まった微細孔を多数有する多孔質層に形成される。
交流電解処理は連続的に行うことが可能であり、本発明
の緑青形成用基材は生産性に優れる。
The patina-forming substrate of the present invention is easily manufactured by subjecting at least the surface of the substrate, which is made of copper or a copper alloy, to an alternating current electrolytic treatment in an electrolytic solution. During the AC electrolysis treatment, the copper layer on the surface of the base material is locally eluted at the time of anode, and the current is preferentially concentrated on the convex portion at the time of cathode, and the eluted copper is deposited. In this way, the surface of the base material is formed into a porous layer having a large number of fine pores with narrow openings.
The alternating current electrolytic treatment can be continuously performed, and the patina-forming substrate of the present invention has excellent productivity.

【0021】本発明では、少なくとも表面が銅又は銅合
金からなる基材上に緑青を形成する方法において、緑青
形成前の基材に交流電解処理を施すので、基材表面が粗
化し、緑青が基材に強固に密着する。
In the present invention, in a method of forming patina on a base material having at least the surface made of copper or a copper alloy, since the base material before patina formation is subjected to AC electrolysis treatment, the base material surface is roughened and patina is Firmly adheres to the base material.

【0022】[0022]

【実施例】以下に本発明を実施例により詳細に説明す
る。 (実施例1)厚さ 0.4mmの圧延銅板に、脱脂・酸洗処理
した後、交流電解処理を施して表面を粗化した。脱脂・
酸洗処理、交流電解処理、緑青形成の各工程は下記条件
にて行った。圧延銅板はJIS-C1100 、質別 1/2Hのタフ
ピッチ銅板(65mm×150mm 約1dm2)を用いた。 脱脂・酸洗処理:アルカリ脱脂(クリーナ160 濃度60
g/リットル、処理時間30秒、処理温度60℃)→電解脱
脂(電流密度3A/dm2 )→酸洗(硫酸 100g/リット
ル、処理時間30秒、処理温度20℃)。 交流電解:表1に示した電解液の組成、温度、電流密
度(実効値)、電解時間で行った。交流周波数は50H
z、対極には SUS-304を用い、電流密度はスライド変圧
器により調整した。
EXAMPLES The present invention will be described in detail below with reference to examples. (Example 1) A rolled copper plate having a thickness of 0.4 mm was subjected to degreasing / pickling treatment and then subjected to AC electrolytic treatment to roughen the surface. Degreasing
The steps of pickling treatment, AC electrolysis treatment, and patina formation were performed under the following conditions. The rolled copper plate used was a JIS-C1100, tough pitch copper plate (65 mm x 150 mm, about 1 dm 2 ) with a temper of 1 / 2H. Degreasing / Pickling treatment: Alkaline degreasing (Cleaner 160 Concentration 60
g / liter, treatment time 30 seconds, treatment temperature 60 ° C. → electrolytic degreasing (current density 3 A / dm 2 ) → pickling (sulfuric acid 100 g / liter, treatment time 30 seconds, treatment temperature 20 ° C.). AC electrolysis: The composition of the electrolytic solution, the temperature, the current density (effective value), and the electrolysis time shown in Table 1 were used. AC frequency is 50H
SUS-304 was used for z and the counter electrode, and the current density was adjusted by a slide transformer.

【0023】得られた緑青形成用基材について、表面粗
さRzの測定、走査型電子顕微鏡による表面形状観察、
及び大気暴露試験を行った。表面粗さは小坂研究所
(株) 製の表面粗さ計を用いて測定した。走査型電子顕
微鏡で観察した表面形状は、保湿性と保水性の観点から
最も良好な形状を◎、以下○、△、×で4段階に評価し
た。何れも2個のサンプルの平均値をとった。又大気暴
露試験はJIS-K5400 の条件に従って行った。始めの1ヶ
月目は毎日、それ以降は3ヶ月毎に外観を観察し、半年
毎に1cm角のサンプルを切出してX線回折法により緑青
の形成有無を調べた。比較の為、交流電解処理を行わな
いタフピッチ銅板についても同様の試験を行った。この
比較例品については外観の光沢が消失した年数も記録し
た。サンプルは表面粗さの異なる2種の圧延上がりのま
まのタフピッチ銅板と、表面をワイヤーブラシで研磨し
たタフピッチ銅板の3種を用いた。結果を表2に示す。
The surface roughness Rz of the obtained green-blue forming substrate was measured, and the surface shape was observed with a scanning electron microscope.
And an air exposure test was conducted. The surface roughness was measured using a surface roughness meter manufactured by Kosaka Laboratory Ltd. As for the surface shape observed with a scanning electron microscope, the best shape from the viewpoint of moisture retention and water retention was evaluated as ⊚, and ∘, Δ, and x were evaluated in four levels. In each case, the average value of two samples was taken. The atmospheric exposure test was conducted according to the conditions of JIS-K5400. The appearance was observed every day for the first month of the beginning and every three months thereafter, and a sample of 1 cm square was cut out every six months and examined for the presence of patina by X-ray diffractometry. For comparison, the same test was performed on a tough pitch copper plate that was not subjected to AC electrolytic treatment. The number of years when the gloss of the appearance disappeared was also recorded for this comparative example product. The samples used were two types of tough pitch copper plates with different surface roughness, which were as-rolled, and three types of tough pitch copper plates, the surfaces of which were polished with a wire brush. The results are shown in Table 2.

【0024】[0024]

【表1】 [Table 1]

【0025】[0025]

【表2】 [Table 2]

【0026】表1に示すように、No.1〜22は塩素イオン
含有水溶液を用い、No.23 〜26は硫酸系水溶液を用いて
それぞれ交流電解処理した本発明例品である。No.27 〜
29は交流電解処理をしない比較例品である。
As shown in Table 1, Nos. 1 to 22 are chlorine ion-containing aqueous solutions, and Nos. 23 to 26 are examples of the present invention which are subjected to AC electrolysis treatment using a sulfuric acid-based aqueous solution. No.27 ~
29 is a comparative example product which is not subjected to AC electrolysis treatment.

【0027】表2から明らかなように、交流電解処理を
した銅板は何れも、緑青形成年数が比較例品のほぼ半分
以下に短縮された。緑青で均一に覆われる年数も大幅に
短縮された。中でも塩素イオンを含有する水溶液を用い
たもの(No.1〜22)は、屋外曝露後直ちに変色が始まり
1日足らずで均一に黒色に変化した。そして2〜3年後
に緑青の形成が確認された。水溶液の温度が高かったも
の(No.19)、電流密度の低かったもの(No.10、11)、電
流密度が高かったもの(No.14)、水溶液の銅濃度が高か
ったもの(No.22)、水溶液中に塩素イオンが含有されて
いないもの(No.23〜26) は、いずれも多孔質層の形状が
保水性にやや欠けるものとなり、緑青の形成年数が若干
長くなった。尚、液温を1℃に下げても(No.15)その効
果は認められなかった。以上から、本発明の緑青形成用
基材は、早期に天然緑青を形成できる、又水溶液組成と
電解条件を限定することにより、一層の効果が得られる
ことが判る。
As is clear from Table 2, the age of patina formation of each of the copper plates subjected to the AC electrolysis treatment was shortened to almost half or less of that of the comparative product. The number of years covered in patina is also greatly reduced. Among them, those using an aqueous solution containing chlorine ions (Nos. 1 to 22) began to discolor immediately after outdoor exposure and uniformly turned black in less than one day. And after 2-3 years, patina formation was confirmed. High temperature aqueous solution (No.19), low current density (No.10, 11), high current density (No.14), high aqueous solution copper concentration (No. 22) and those in which the chloride ion was not contained in the aqueous solution (Nos. 23 to 26), the shape of the porous layer was slightly lacking in water retention, and the number of years of forming patina became slightly longer. Even if the liquid temperature was lowered to 1 ° C (No. 15), the effect was not recognized. From the above, it is understood that the base material for forming patina of the present invention can form natural patina at an early stage, and further effects can be obtained by limiting the composition of the aqueous solution and the electrolysis conditions.

【0028】他方、圧延上りのままのもの(No.27、28)
、及びワイヤーブラシで粗面化したもの(No.29) は、
銅の光沢が無くなるまでに1年以上を要し、更に黒く酸
化するまでに4〜5年もかかった。結局、緑青が部分的
に形成されるまでに12〜13年、緑青に覆われるまでに16
年以上を要した。
On the other hand, the as-rolled product (No. 27, 28)
, And those roughened with a wire brush (No. 29) are
It took more than a year to lose the luster of copper, and it took 4 to 5 years to oxidize it to black. After all, it takes 12 to 13 years until the patina is partially formed, 16 before it is covered by patina.
It took more than a year.

【0029】(実施例2)実施例1で用いたのと同じ材
質の、厚さ 0.4mmの圧延銅板に、脱脂・酸洗処理した
後、交流電解処理を施して表面を粗化した。次にこの銅
板表面に緑青を形成した。前記の脱脂・酸洗処理、交流
電解処理、緑青形成の各工程は下記条件にて行った。 脱脂・酸洗処理:アルカリ脱脂(クリーナ160 濃度60
g/リットル、処理時間30秒、処理温度60℃)→電解脱
脂(電流密度3A/dm2 )→酸洗(硫酸 100g/リット
ル、処理時間30秒、処理温度20℃)。 交流電解:電解液(硫酸 160g/リットル、銅 35g/
リットル)、処理時間30秒、処理温度25℃、15V−50H
z加電。 緑青形成:緑青処理液(塩酸15g/リットル,酢酸銅
75g/リットル,塩基性炭酸銅50g/リットル,硝酸銅
20g/リットル,塩化アンモニウム 100g/リットル,
食塩:50g/リットル)。前記処理液をスプレーし、自
然乾燥する工程を2回繰り返した。
Example 2 A rolled copper plate having the same material as that used in Example 1 and having a thickness of 0.4 mm was degreased and pickled, and then subjected to AC electrolysis to roughen the surface. Next, patina was formed on the surface of this copper plate. The degreasing / pickling treatment, AC electrolysis treatment, and patina formation were performed under the following conditions. Degreasing / Pickling treatment: Alkaline degreasing (Cleaner 160 Concentration 60
g / liter, treatment time 30 seconds, treatment temperature 60 ° C. → electrolytic degreasing (current density 3 A / dm 2 ) → pickling (sulfuric acid 100 g / liter, treatment time 30 seconds, treatment temperature 20 ° C.). AC electrolysis: Electrolyte (sulfuric acid 160g / l, copper 35g /
Liter), processing time 30 seconds, processing temperature 25 ° C, 15V-50H
z energizing. Patina formation: Patina processing liquid (hydrochloric acid 15 g / l, copper acetate
75 g / liter, basic copper carbonate 50 g / liter, copper nitrate
20 g / liter, ammonium chloride 100 g / liter,
Salt: 50 g / liter). The process of spraying the treatment liquid and naturally drying was repeated twice.

【0030】(実施例3)厚さ 0.4mmの圧延銅板にショ
ットブラスト処理(#150 のアルミナ粒子投射)と脱脂
・酸洗処理を順次施し、次に交流電解処理を施して表面
を粗化し、しかる後、この銅板表面に緑青を形成した。
前記の脱脂・酸洗処理、交流電解処理、緑青形成は実施
例1と同じ方法により行った。
(Example 3) A rolled copper plate having a thickness of 0.4 mm was sequentially subjected to shot blasting (# 150 alumina particle projection), degreasing and pickling, and then AC electrolytic treatment to roughen the surface, Thereafter, patina was formed on the surface of this copper plate.
The above-mentioned degreasing / pickling treatment, AC electrolysis treatment, and patina formation were carried out in the same manner as in Example 1.

【0031】(実施例4)実施例1において、交流電解
処理後の銅板に銅をシアン化銅浴にて 0.1μm厚さ電気
めっきした他は、実施例1と同じ方法により緑青を形成
した。
Example 4 A patina was formed by the same method as in Example 1 except that copper was electroplated on the copper plate after the AC electrolysis treatment in a copper cyanide bath to a thickness of 0.1 μm.

【0032】(実施例5)実施例2において、交流電解
処理後の銅板に銅をシアン化銅浴にて 0.1μm厚さ電気
めっきした他は、実施例2と同じ方法により緑青を形成
した。
Example 5 A patina was formed in the same manner as in Example 2, except that the copper plate after the AC electrolysis was electroplated with copper to a thickness of 0.1 μm in a copper cyanide bath.

【0033】(実施例6)脱脂・酸洗処理を施した厚さ
0.4mmの圧延鉄板上に、銅を硫酸銅浴にて 0.1mm厚さ電
気めっきした。次いでこの銅めっき鉄板に実施例1と同
じ条件にて脱脂・酸洗処理を施した後、実施例1と同じ
条件にて交流電解処理を施して表面を粗化した。この粗
化した銅めっき鉄板表面に緑青を形成した。前記の緑青
形成は、緑青処理液(炭酸ナトリウム60g/リットル,
酒石酸10g/リットル,チオ硫酸ナトリウム5g/リッ
トル)中にて3分間アノード処理し、これを自然乾燥し
て形成した。
(Example 6) Thickness after degreasing / pickling treatment
Copper was electroplated on a 0.4 mm rolled iron plate in a copper sulfate bath to a thickness of 0.1 mm. Next, this copper-plated iron plate was subjected to degreasing / pickling treatment under the same conditions as in Example 1, and then subjected to AC electrolytic treatment under the same conditions as in Example 1 to roughen the surface. A patina was formed on the surface of the roughened copper-plated iron plate. The above-mentioned patina formation is a patina treatment liquid (sodium carbonate 60 g / liter,
It was formed by anodizing in tartaric acid (10 g / l, sodium thiosulfate 5 g / l) for 3 minutes and then air-drying.

【0034】(比較例1)厚さ 0.4mmの圧延銅板に脱脂
・酸洗処理を施し、この銅板上に緑青を形成した。脱脂
・酸洗処理及び緑青形成は実施例1と同じ条件により行
った。
(Comparative Example 1) A rolled copper plate having a thickness of 0.4 mm was subjected to degreasing / pickling treatment to form patina on the copper plate. Degreasing / pickling treatment and patina formation were performed under the same conditions as in Example 1.

【0035】(比較例2)脱脂・酸洗処理を施した厚さ
0.4mmの圧延鉄板上に、銅を硫酸銅浴にて 0.1mm厚さ電
気めっきした。次いでこの銅めっき鉄板に実施例2と同
じ条件でショットブラスト処理を施した。次いでこのシ
ョットブラスト処理した銅めっき鉄板を脱脂・酸洗し、
次いで実施例5と同じ条件にて緑青を形成した。
(Comparative Example 2) Thickness after degreasing / pickling treatment
Copper was electroplated on a 0.4 mm rolled iron plate in a copper sulfate bath to a thickness of 0.1 mm. Next, this copper-plated iron plate was shot-blasted under the same conditions as in Example 2. Then, this shot-blasted copper-plated iron plate is degreased and pickled,
Then, patina was formed under the same conditions as in Example 5.

【0036】このようにして得られた各々の緑青形成銅
板又は銅めっき鉄板からサンプルを採取し、緑青の密着
性を調査した。緑青の密着性はクロスカット試験により
行った。クロスカット試験は、サンプル上の緑青面に碁
盤の目状に切れ目を入れて 100個の枡を形成し、この上
に粘着テープを貼着し、この粘着テープを剥がした時に
剥がれた枡の枚数を数える方法により行った。結果を表
3に示した。
A sample was taken from each of the patina-formed copper plate or the copper-plated iron plate thus obtained, and the patina adhesion was investigated. The patina adhesion was measured by a cross cut test. In the cross-cut test, 100 squares are formed by making cuts in a grid pattern on the patina on the sample, adhesive tape is stuck on this, and the number of squares peeled off when this adhesive tape is peeled off Was performed by the method of counting. The results are shown in Table 3.

【0037】[0037]

【表3】 [Table 3]

【0038】表3より明らかなように、本発明方法品
(No1〜5)は、緑青を形成させた基材表面が交流電解
処理により粗化されたので、緑青が基材上に強固に密着
し、緑青の剥離はいずれのサンプルにも認められなかっ
た。これに対し、比較例品のNo6,7は、基材表面が平
滑だった為、いずれも緑青がかなりの部分で剥離した。
As is clear from Table 3, in the method products of the present invention (Nos. 1 to 5), the surface of the base material on which patina was formed was roughened by AC electrolytic treatment, so that patina was firmly adhered to the base material. However, no peeling of patina was observed in any of the samples. On the other hand, in Comparative Examples Nos. 6 and 7, since the surface of the base material was smooth, patina was peeled off in a considerable portion in all cases.

【0039】[0039]

【発明の効果】以上述べたように、本発明の緑青形成用
基材は、表面が多孔質の為、水分、湿気、緑青成分等が
保持され易い。従って圧延上がりのままの基材に比べ
て、天然緑青が早期に形成される。又形成された緑青
は、前記多孔質部分に係着されて、その剥離が防止さ
れ、その美観が長期間保持される。前記緑青形成用基材
は、長尺の圧延基材を連続的に交流電解処理して製造す
ることも可能で、生産性に優れ、低コストである。
As described above, since the surface of the base material for forming green / blue of the present invention is porous, water, moisture, green / blue component, etc. are easily retained. Therefore, natural patina is formed earlier than the as-rolled base material. Further, the formed patina is attached to the porous portion, its peeling is prevented, and its appearance is maintained for a long time. The green-blue forming base material can be manufactured by continuously subjecting a long rolled base material to AC electrolysis treatment, is excellent in productivity, and is low in cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の緑青形成用基材表面の多孔質層の側面
説明図である。
FIG. 1 is a side view illustrating a porous layer on the surface of a patina-forming substrate of the present invention.

【符号の説明】[Explanation of symbols]

1 開口部 2 微細孔 1 Opening 2 Micropore

フロントページの続き (72)発明者 五十嵐 稔 東京都千代田区丸の内2丁目6番1号 古 河電気工業株式会社内Front page continuation (72) Inventor Minoru Igarashi 2-6-1, Marunouchi, Chiyoda-ku, Tokyo Furukawa Electric Co., Ltd.

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 少なくとも表面が銅又は銅合金からなる
基材であって、前記基材表面に交流電解処理が施されて
いることを特徴とする緑青形成用基材。
1. A base material for forming a green-blue color, which is a base material having at least a surface made of copper or a copper alloy, and the surface of the base material has been subjected to an AC electrolysis treatment.
【請求項2】 基材表面に、開口部が狭まった微細孔を
多数有する多孔質層が形成されていることを特徴とする
請求項1記載の緑青形成用基材。
2. The green-blue forming substrate according to claim 1, wherein a porous layer having a large number of fine pores with narrowed openings is formed on the surface of the substrate.
【請求項3】 少なくとも表面が銅又は銅合金からなる
基材に、電解液中で交流電解処理を施すことを特徴とす
る請求項1又は請求項2記載の緑青形成用基材の製造方
法。
3. The method for producing a base material for forming a green-blue color according to claim 1 or 2, wherein an alternating current electrolytic treatment is performed in an electrolytic solution on a base material having at least a surface made of copper or a copper alloy.
【請求項4】 電解液に、塩素イオンが含有されている
ことを特徴とする請求項3記載の緑青形成用基材の製造
方法。
4. The method for producing a green-blue forming substrate according to claim 3, wherein the electrolytic solution contains chlorine ions.
【請求項5】 温度が 5〜60℃の電解液中で交流電解処
理を施すことを特徴とする請求項3又は請求項4記載の
緑青形成用基材の製造方法。
5. The method for producing a green-blue forming substrate according to claim 3 or 4, wherein an alternating current electrolytic treatment is performed in an electrolytic solution having a temperature of 5 to 60 ° C.
【請求項6】 電解液の銅濃度が1.0mol/dm3以下である
ことを特徴とする請求項3乃至請求項5記載の緑青形成
用基材の製造方法。
6. The method for producing a green-blue forming substrate according to claim 3, wherein the electrolytic solution has a copper concentration of 1.0 mol / dm 3 or less.
【請求項7】 交流電解処理を30〜100 A/dm2 の電流
密度で行うことを特徴とする請求項3乃至請求項6記載
の緑青形成用基材の製造方法。
7. The method for producing a green-blue forming substrate according to claim 3, wherein the alternating current electrolytic treatment is performed at a current density of 30 to 100 A / dm 2 .
【請求項8】 少なくとも表面が銅又は銅合金からなる
基材上に緑青を形成する方法において、緑青形成前の基
材に交流電解処理を施すことを特徴とする緑青の形成方
法。
8. A method of forming patina on a base material having at least a surface made of copper or a copper alloy, which comprises subjecting the base material before patina formation to AC electrolytic treatment.
【請求項9】 交流電解処理前に、基材に機械研磨を施
すことを特徴とする請求項8記載の緑青の形成方法。
9. The method for forming patina according to claim 8, wherein the base material is mechanically polished before the AC electrolytic treatment.
【請求項10】 交流電解処理後に、基材に銅めっきを施
すことを特徴とする請求項8又は請求項9記載の緑青の
形成方法。
10. The method for forming patina according to claim 8, wherein the base material is plated with copper after the alternating current electrolytic treatment.
JP15857594A 1993-07-13 1994-07-11 Patina forming base material, production of the base material and formation of patina using the base material Pending JPH0776796A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15857594A JPH0776796A (en) 1993-07-13 1994-07-11 Patina forming base material, production of the base material and formation of patina using the base material

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP19544993 1993-07-13
JP5-195449 1993-07-13
JP15857594A JPH0776796A (en) 1993-07-13 1994-07-11 Patina forming base material, production of the base material and formation of patina using the base material

Publications (1)

Publication Number Publication Date
JPH0776796A true JPH0776796A (en) 1995-03-20

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ID=26485646

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007196312A (en) * 2006-01-25 2007-08-09 Japan Fine Steel Co Ltd Saw wire and manufacturing method for same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007196312A (en) * 2006-01-25 2007-08-09 Japan Fine Steel Co Ltd Saw wire and manufacturing method for same

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