JPH0776663A - Curable coating material composition - Google Patents

Curable coating material composition

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Publication number
JPH0776663A
JPH0776663A JP34941493A JP34941493A JPH0776663A JP H0776663 A JPH0776663 A JP H0776663A JP 34941493 A JP34941493 A JP 34941493A JP 34941493 A JP34941493 A JP 34941493A JP H0776663 A JPH0776663 A JP H0776663A
Authority
JP
Japan
Prior art keywords
parts
pts
meth
weight
coating material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP34941493A
Other languages
Japanese (ja)
Other versions
JP3299371B2 (en
Inventor
Takashi Mita
高史 三田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
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Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP34941493A priority Critical patent/JP3299371B2/en
Publication of JPH0776663A publication Critical patent/JPH0776663A/en
Application granted granted Critical
Publication of JP3299371B2 publication Critical patent/JP3299371B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain the composition useful for electric part items, etc., curable with UV rays, providing a coating film having excellent alkali solubility, hole sealing properties, etching resistance and smoothness, comprising a specific compound, an acrylic copolymer, a leveling agent and a photopolymerization initiator. CONSTITUTION:This compound comprises (A) 10-80 pts.wt. of a compound of formula I ((m) is 1-4; (n) is >=2; R is residual part after removal of OH from n-hydric alcohol), (B) 20-70 pts.wt. of a compound containing one carboxyl group and one (meth)acryloyl group in one molecule, (C) 0-20 pts.wt. of a carboxyl group-containing acrylic copolymer, (D) 0-0.5 pts.wt. of a leveling agent and (E) 0.1-10 pts.wt. of a photopolymerization initiator (with the proviso that the total of the component A to the component C is 100 pts.wt.). A polyester polyacrylate obtained by reacting a polybasic acid such as phthalic acid with a polyhydric alcohol such as ethylene glycol, for example, should preferably be used as the component A.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、微細な凹凸を有する基
材に塗布した後、紫外線照射により、アルカリ溶解性、
封孔性、耐エッチング性、平滑性に優れた架橋硬化塗膜
を形成し得る硬化性被覆材組成物に関する。
BACKGROUND OF THE INVENTION The present invention is applied to a base material having fine irregularities and then exposed to ultraviolet rays to dissolve the alkali solubility,
The present invention relates to a curable coating material composition capable of forming a crosslinked cured coating film having excellent sealing properties, etching resistance and smoothness.

【0002】[0002]

【従来の技術】プリント配線板や半導体素子等の電子材
料には、一般に精密で微細な高度加工技術が必要とさ
れ、その製造ラインにおけるエッチング工程は、現在で
は紫外線露光法を主流としている。素子寸法の微細化、
加工精度の向上等の要求に応じてエッチングレジストも
高感度(光による化学反応の応答効率)、高解像度(特
にエッチング時の低膨潤性)のものが好まれており、中
でも基材が精密で微細な凹凸を有する場合、これに追随
し、平滑性の低下や気泡の発生なく被覆するエッチング
レジスト材が近年求められるようになってきた。
2. Description of the Related Art Electronic materials such as printed wiring boards and semiconductor elements generally require precision and fine advanced processing techniques, and the ultraviolet exposure method is the mainstream of the etching process in the production line at present. Miniaturization of device dimensions,
In response to demands for improved processing accuracy, etching resists with high sensitivity (response efficiency of chemical reaction by light) and high resolution (especially low swelling during etching) are preferred. In recent years, there has been a demand for an etching resist material which, when it has fine irregularities, follows the irregularities and covers it without deterioration of smoothness and generation of bubbles.

【0003】しかし、現在使用されているエッチングレ
ジスト材では、塗料の粘度や表面張力が高いため、基材
の微細な凹凸を十分被覆することができず、気泡の発生
や平滑性が低下するという欠点がある。
However, in the currently used etching resist material, since the viscosity and surface tension of the coating material are high, it is not possible to sufficiently cover the fine irregularities of the base material, resulting in generation of bubbles and deterioration of smoothness. There are drawbacks.

【0004】また、現行品のように有機溶剤を多量に使
用するものでは、レジストの乾燥工程での引火、爆発、
火災等の危険性もあるため、レジストの稀釈溶媒として
難燃性のトリクロロエチレン等の塩素系溶剤がこれまで
使用されてきた。しかし、近年これら塩素系溶剤が大気
汚染をもたらすおそれのあることが指摘され、法規制に
より近い将来レジスト溶媒としての使用が禁止される方
向にある。このため、紫外線硬化型塗料も無溶剤系に変
更されつつあるが、該塗料によって形成される塗膜の平
滑性、封孔性及びエッチング後のアルカリ溶解性が不十
分であり、実用化のレベルに至っていないのが現状であ
る。
Further, in the case of using a large amount of organic solvent like the current product, ignition, explosion, and
Since there is a risk of fire and the like, a flame retardant chlorine-based solvent such as trichlorethylene has been used as a solvent for diluting a resist. However, in recent years, it has been pointed out that these chlorine-based solvents may cause air pollution, and there is a trend toward the prohibition of their use as resist solvents in the near future due to legal regulations. For this reason, the UV-curable paint is being changed to a solvent-free system, but the smoothness, sealing property and alkali solubility after etching of the coating film formed by the paint are insufficient, and the level of practical application is reached. The current situation is that it has not yet reached.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、微細
な凹凸を有する基材に塗布した塗膜の紫外線照射による
硬化性、塗膜のアルカリ溶解性、封孔性、耐エッチング
性、平滑性に優れた架橋硬化塗膜を形成し得る被覆材組
成物を提供することにある。
DISCLOSURE OF THE INVENTION An object of the present invention is to cure a coating film applied on a substrate having fine irregularities by ultraviolet irradiation, alkali solubility of the coating film, sealing property, etching resistance, smoothness. It is intended to provide a coating material composition capable of forming a crosslinked cured coating film having excellent properties.

【0006】本発明の他の目的は、無溶剤系の紫外線硬
化型で平滑性に優れた架橋硬化塗膜を形成し得る被覆材
組成物を提供することにある。
Another object of the present invention is to provide a coating material composition which is solvent-free and can form a crosslinked cured coating film which is ultraviolet curable and has excellent smoothness.

【0007】[0007]

【課題を解決するための手段】すなわち、本発明の硬化
性被覆材組成物は、(a)次の式で表される化合物10
〜80重量部、
That is, the curable coating material composition of the present invention comprises (a) a compound 10 represented by the following formula:
~ 80 parts by weight,

【化2】 (b)1分子中に1個のカルボキシル基及び1個の(メ
タ)アクリロイルオキシ基を有する化合物20〜70重
量部、(c)カルボキシル基を含有するアクリル系共重
合体0〜20重量部、(d)レベリング剤0〜0.5重
量部、及び(e)光重合開始剤0.1〜10重量部、
(ただし、(a)〜(c)成分の合計を100重量部と
する。)からなることを特徴とする硬化性被覆材組成物
にある。
[Chemical 2] (B) 20 to 70 parts by weight of a compound having one carboxyl group and one (meth) acryloyloxy group in one molecule, (c) 0 to 20 parts by weight of a carboxyl group-containing acrylic copolymer, (D) 0 to 0.5 part by weight of a leveling agent, and (e) 0.1 to 10 parts by weight of a photopolymerization initiator,
(However, the total of the components (a) to (c) is 100 parts by weight.) The curable coating material composition is characterized in that.

【0008】[0008]

【作用】本発明の硬化性被覆材組成物は、(a)の化合
物に(b)のカルボキシル基含有モノマーと(c)の酸
性基を有するアクリル系共重合体とを併用することによ
り、耐エッチング性を向上させ、同時に良好なアルカリ
溶解性を発現させることが可能となった。
The curable coating material composition of the present invention is obtained by using the compound of (a) in combination with the carboxyl group-containing monomer of (b) and the acrylic copolymer having an acidic group of (c). It has become possible to improve the etching property and at the same time exhibit good alkali solubility.

【0009】本発明の硬化性被覆材組成物においては、
(a)の化合物を10〜80重量部の範囲で使用する。
ただし、(a)〜(c)成分の合計を100重量部とす
る。(a)の使用量が10重量部未満の被覆材では、そ
の架橋性が低下し、耐エッチング性が低くなる。また、
(a)の使用量が80重量部をこえた被覆材より形成し
た硬化塗膜はアルカリ溶解性が低下する。
In the curable coating material composition of the present invention,
The compound (a) is used in the range of 10 to 80 parts by weight.
However, the total of the components (a) to (c) is 100 parts by weight. If the amount of (a) used is less than 10 parts by weight, the crosslinkability of the coating material is lowered and the etching resistance is lowered. Also,
A cured coating film formed from a coating material in which the amount of (a) used exceeds 80 parts by weight has low alkali solubility.

【0010】化1の式で表される化合物(a)の例とし
ては、フタル酸、アジピン酸等の多塩基酸とエチレング
リコール、ブタンジオール等の多価アルコールとアクリ
ル酸との反応で得られるポリエステルポリアクリレート
等があげられる。
An example of the compound (a) represented by the formula (1) is obtained by reacting a polybasic acid such as phthalic acid or adipic acid with a polyhydric alcohol such as ethylene glycol or butanediol and acrylic acid. Examples thereof include polyester polyacrylate.

【0011】本発明の硬化性被覆材組成物においては、
1分子中に1個のカルボキシル基及び1個の(メタ)ア
クリロイルオキシ基を有する化合物(b)を20〜70
重量部の範囲で使用する。使用量が20重量部未満の被
覆材より形成した硬化塗膜ではアルカリ溶解性が低下
し、70重量部をこえた被覆材組成物ではその表面張力
が高くなり、該組成物より形成される塗膜の平滑性、封
孔性が低下する。
In the curable coating material composition of the present invention,
The compound (b) having one carboxyl group and one (meth) acryloyloxy group in one molecule is 20 to 70.
Used in the range of parts by weight. A cured coating film formed from a coating material used in an amount of less than 20 parts by weight has reduced alkali solubility, and a coating material composition exceeding 70 parts by weight has a high surface tension, resulting in a coating formed from the composition. The smoothness and sealing property of the film are deteriorated.

【0012】化合物(b)の具体例としては、酸無水物
又は二塩基酸と水酸基含有(メタ)アクリレートとのモ
ノエステル反応生成物が挙げられる。モノエステル反応
生成物を合成するのに用いられる二塩基酸又は酸無水物
としては、フタル酸、テトラヒドロフタル酸、ヘキサヒ
ドロフタル酸、マレイン酸、コハク酸及びこれらの無水
物が挙げられる。また、水酸基含有(メタ)アクリレー
トとしては、2−ヒドロキシエチル(メタ)アクリレー
ト、2−ヒドロキシプロピル(メタ)アクリレート、3
−ヒドロキシプロピル(メタ)アクリレート、4−ヒド
ロキシブチル(メタ)アクリレート等のヒドロキシアル
キル(メタ)アクリレート類;2−ヒドロキシエチル
(メタ)アクリレートへのエチレンオキシドの付加物;
2−ヒドロキシエチル(メタ)アクリレートへのプロピ
レンオキシドの付加物等が挙げられる。
Specific examples of the compound (b) include a monoester reaction product of an acid anhydride or a dibasic acid and a hydroxyl group-containing (meth) acrylate. The dibasic acids or acid anhydrides used to synthesize the monoester reaction product include phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, maleic acid, succinic acid and their anhydrides. Further, as the hydroxyl group-containing (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3
-Hydroxyalkyl (meth) acrylates such as hydroxypropyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate; addition product of ethylene oxide to 2-hydroxyethyl (meth) acrylate;
Examples thereof include an addition product of propylene oxide to 2-hydroxyethyl (meth) acrylate.

【0013】本発明の硬化性被覆材組成物において、カ
ルボキシル基を含有するアクリル系共重合体(c)は、
塗膜のハジキを防止する目的で使用され、しかも、該カ
ルボキシル基を含有するアクリル系共重合体(c)を含
む塗膜のアルカリ溶解性を向上させる特長を有する。そ
の使用範囲は0〜20重量部であり、好ましくは3〜2
0重量部である。20重量部をこえる割合で(c)を含
有する被覆材にて形成した塗膜は平滑性が低下する。ア
クリル系共重合体(c)は、重量平均分子量で7000
〜25000、酸価200mgKOH/g以下、特に3
0〜100mgKOH/gであることが好ましい。重量
平均分子量7000未満である重合体を含む被覆材より
形成した塗膜は耐エッチング性が低下し、25000を
こえる重合体を含む被覆材より形成した塗膜は平滑性が
低下する。
In the curable coating material composition of the present invention, the acrylic copolymer (c) containing a carboxyl group is
It is used for the purpose of preventing cissing of the coating film, and has the feature of improving the alkali solubility of the coating film containing the acrylic copolymer (c) containing the carboxyl group. The use range is 0 to 20 parts by weight, preferably 3 to 2
0 parts by weight. The coating film formed from the coating material containing (c) in a proportion of more than 20 parts by weight has low smoothness. The acrylic copolymer (c) has a weight average molecular weight of 7,000.
~ 25,000, acid value 200 mgKOH / g or less, especially 3
It is preferably 0 to 100 mgKOH / g. A coating film formed from a coating material containing a polymer having a weight average molecular weight of less than 7,000 has low etching resistance, and a coating film formed from a coating material containing a polymer having a weight average molecular weight of more than 25,000 has low smoothness.

【0014】アクリル系共重合体(c)は、カルボキシ
ル基含有ビニルモノマーとこれと共重合可能な他のビニ
ルモノマーとから構成される。カルボキシル基含有ビニ
ルモノマーとしては、(メタ)アクリル酸、イタコン
酸、フマル酸、クロトン酸、マレイン酸、イタコン酸モ
ノメチル、イタコン酸モノブチル、マレイン酸モノメチ
ル、マレイン酸モノブチル等が挙げられる。
The acrylic copolymer (c) is composed of a carboxyl group-containing vinyl monomer and another vinyl monomer copolymerizable therewith. Examples of the carboxyl group-containing vinyl monomer include (meth) acrylic acid, itaconic acid, fumaric acid, crotonic acid, maleic acid, monomethyl itaconate, monobutyl itaconate, monomethyl maleate, monobutyl maleate and the like.

【0015】また、共重合可能な他のビニルモノマーと
しては、メチル(メタ)アクリレート、エチル(メタ)
アクリレート、n−プロピル(メタ)アクリレート、n
−ブチル(メタ)アクリレート、t−ブチル(メタ)ア
クリレート、(メタ)アクリル酸2−エチルヘキシル、
(メタ)アクリル酸ラウリル、(メタ)アクリル酸ドデ
シル、(メタ)アクリル酸ステアリルなどの(メタ)ア
クリル酸エステル;スチレン、α−メチルスチレン、ビ
ニルトルエンなどのスチレン及びその誘導体;(メタ)
アクリロニトリル等の重合性不飽和ニトリル類;酢酸ビ
ニル、プロピオン酸ビニルなどのビニルエステル類が挙
げられるが、先に水酸基含有(メタ)アクリレート
(b)として例示した水酸基含有ビニルモノマー;N−
メトキシメチル(メタ)アクリルアミド、N−エトキシ
メチル(メタ)アクリルアミド、N−ブトキシメチル
(メタ)アクリルアミドなどのN−アルコキシ置換アミ
ド類;グリシジル(メタ)アクリレート、(メタ)アリ
ルグリシジルエーテル、メタグリシジル(メタ)アクリ
ル酸エステルなどのエポキシ基含有モノマー;ジメチル
アミノエチル(メタ)アクリル酸、ジエチルアミノエチ
ル(メタ)アクリル酸などの塩基性モノマーも使用でき
る。
Other copolymerizable vinyl monomers include methyl (meth) acrylate and ethyl (meth).
Acrylate, n-propyl (meth) acrylate, n
-Butyl (meth) acrylate, t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate,
(Meth) acrylic acid esters such as lauryl (meth) acrylate, dodecyl (meth) acrylate, and stearyl (meth) acrylate; styrenes such as styrene, α-methylstyrene, vinyltoluene and their derivatives; (meth)
Polymerizable unsaturated nitriles such as acrylonitrile; vinyl esters such as vinyl acetate and vinyl propionate, and the like, but the hydroxyl group-containing vinyl monomer exemplified above as the hydroxyl group-containing (meth) acrylate (b); N-
N-alkoxy-substituted amides such as methoxymethyl (meth) acrylamide, N-ethoxymethyl (meth) acrylamide, N-butoxymethyl (meth) acrylamide; glycidyl (meth) acrylate, (meth) allyl glycidyl ether, metaglycidyl (meta) ) Epoxy group-containing monomers such as acrylic acid esters; basic monomers such as dimethylaminoethyl (meth) acrylic acid and diethylaminoethyl (meth) acrylic acid can also be used.

【0016】アクリル系共重合体(c)は、特に限定さ
れるものではないが、カルボキシル基を含有すると同時
に水酸基をも含有するものであることが好ましい。水酸
基を含有しているとアルカリ溶解性が向上する。アクリ
ル系共重合体(c)は、水酸基価が50〜150mgK
OH/gであることが好ましい。
The acrylic copolymer (c) is not particularly limited, but it is preferable that it contains not only a carboxyl group but also a hydroxyl group. When it contains a hydroxyl group, alkali solubility is improved. The acrylic copolymer (c) has a hydroxyl value of 50 to 150 mgK.
It is preferably OH / g.

【0017】本発明におけるアクリル系共重合体(c)
の重合方法は、溶液重合法、塊状重合法、懸濁重合法、
乳化重合法等の公知のいずれの重合法によってもよい
が、特に、溶液重合法によって得た重合体であることが
好ましい。溶液重合法による場合、有機溶剤及び重合開
始剤の存在下に、上記モノマーの混合物を共重合させ
る。有機溶剤としては、イソプロピルアルコール、n−
ブタノール、トルエン、キシレン等の通常用いられる有
機溶剤が使用でき、また、重合開始剤もアゾビスイソブ
チロニトリル、過酸化ベンゾイル、クメンヒドロペルオ
キシド等の通常用いられる重合開始剤が使用できる。ま
た、必要に応じて2−メルカプトエタノール、n−オク
チルメルカプタン等の連鎖移動剤を使用することができ
る。
Acrylic copolymer (c) in the present invention
The polymerization method of, a solution polymerization method, a bulk polymerization method, a suspension polymerization method,
Although any known polymerization method such as emulsion polymerization method may be used, a polymer obtained by a solution polymerization method is particularly preferable. In the case of the solution polymerization method, the mixture of the above monomers is copolymerized in the presence of an organic solvent and a polymerization initiator. As the organic solvent, isopropyl alcohol, n-
A commonly used organic solvent such as butanol, toluene, xylene can be used, and a commonly used polymerization initiator such as azobisisobutyronitrile, benzoyl peroxide, cumene hydroperoxide can be used as a polymerization initiator. If necessary, a chain transfer agent such as 2-mercaptoethanol or n-octyl mercaptan can be used.

【0018】本発明の被覆材に用いるレベリング剤
(d)は、塗膜の平滑性、封孔性を向上させることを目
的として用いられるもので、一般的な界面活性剤を使用
することができる。その使用量は成分(a)〜(c)の
合計量100重量部に対し、0〜0.5重量部であり、
好ましくは0.01〜0.5重量部である。0.5重量
部を超えると気泡が発生しやすく、封孔性が低下するよ
うになる。
The leveling agent (d) used in the coating material of the present invention is used for the purpose of improving the smoothness and sealing property of the coating film, and a general surfactant can be used. . The amount used is 0 to 0.5 parts by weight based on 100 parts by weight of the total amount of the components (a) to (c),
It is preferably 0.01 to 0.5 parts by weight. If it exceeds 0.5 parts by weight, air bubbles are likely to be generated and the sealing property is deteriorated.

【0019】レベリング剤(d)としては、アクリル系
界面活性剤、シリコン系界面活性剤、フッ素系界面活性
剤のようなものが使用でき、その具体例としては、フロ
ーラドFC430(住友スリーエム(株)製);メガフ
ァックF177(大日本インキ(株)製);ダイヤエイ
ドAD−9002(三菱レイヨン(株)製)などが挙げ
られる。
As the leveling agent (d), acrylic surfactants, silicone surfactants, fluorine surfactants and the like can be used. Specific examples thereof include Florad FC430 (Sumitomo 3M Limited). MEGAFACK F177 (manufactured by Dainippon Ink and Chemicals, Inc.); Dia-Aid AD-9002 (manufactured by Mitsubishi Rayon Co., Ltd.) and the like.

【0020】本発明で用いられる光重合開始剤(e)
は、その使用量が成分(a)〜(c)の合計量100重
量部に対して、0.1〜10重量部であり、好ましくは
1〜5重量部である。
The photopolymerization initiator (e) used in the present invention
Is used in an amount of 0.1 to 10 parts by weight, preferably 1 to 5 parts by weight, based on 100 parts by weight of the total amount of components (a) to (c).

【0021】光重合開始剤(e)の具体例としては、ベ
ンゾフェノン、ベンゾインイソブチルエーテル、ベンゾ
インイソプロピルエーテル、ベンジルジメチルケター
ル、2,2−ジエトキシアセトフェノン、2,2−ジブ
トキシアセトフェノン、1−ヒドロキシシクロヘキシル
フェニルケトン、2−ヒドロキシ−2−メチル−1−フ
ェニルプロパン−1−オン、2−メチル−1−[4−
(メチルチオ)フェニル]−2−モルフォリノ−プロパ
ノン−1、2−ベンジル−2−ジメチルアミノ−1−
(4−モルフォリノフェニル)−ブタンオン−1、メチ
ルフェニルグリオキシレート、エチルフェニルグリオキ
シレート、2−クロロチオキサントン、2,4−ジエチ
ルチオキサントン、2,4−ジイソプロピルチオキサ
ン、2,4,6−トリメチルベンゾイルジフェノイルホ
スフィンオキサイド等を挙げることができる。これらの
光重合開始剤は単独または二種以上の混合物で使用する
ことができる。
Specific examples of the photopolymerization initiator (e) include benzophenone, benzoin isobutyl ether, benzoin isopropyl ether, benzyl dimethyl ketal, 2,2-diethoxyacetophenone, 2,2-dibutoxyacetophenone and 1-hydroxycyclohexyl. Phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 2-methyl-1- [4-
(Methylthio) phenyl] -2-morpholino-propanone-1,2-benzyl-2-dimethylamino-1-
(4-morpholinophenyl) -butanone-1, methylphenylglyoxylate, ethylphenylglyoxylate, 2-chlorothioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxane, 2,4,6- Examples thereof include trimethylbenzoyl diphenoyl phosphine oxide. These photopolymerization initiators can be used alone or as a mixture of two or more kinds.

【0022】また、本発明の硬化性被覆材組成物は、必
要に応じてスリップ剤、消泡剤、はじき防止剤、湿潤
剤、沈降防止剤、だれ防止剤、紫外線吸収剤、酸化防止
剤、重合禁止剤、カップリング剤等の各種添加剤や、粘
度調整のために揮発性有機溶剤を配合して用いることが
できる。
Further, the curable coating material composition of the present invention contains a slip agent, an antifoaming agent, an anti-repellent agent, a wetting agent, an anti-settling agent, an anti-sagging agent, an ultraviolet absorber, an antioxidant, if necessary. Various additives such as a polymerization inhibitor and a coupling agent, and a volatile organic solvent for adjusting the viscosity can be mixed and used.

【0023】本発明の硬化性被覆材組成物は、上述の成
分を混合するだけで製造できる。また、基材への被覆に
際しては、スプレーコート、カーテンフローコート、ロ
ールコート、ディッピングコート、スピンコート、グラ
ビアコート、スクリーンコート等が適用でき、特に制限
されない。
The curable coating material composition of the present invention can be produced simply by mixing the above-mentioned components. Further, when coating the substrate, spray coating, curtain flow coating, roll coating, dipping coating, spin coating, gravure coating, screen coating and the like can be applied and are not particularly limited.

【0024】本発明の硬化性被覆材組成物は、無機物
(鉄板、ブリキ板、トタン板、アルミ板、亜鉛鋼板な
ど)及び有機物(木材、紙、プラスチック、有機塗料の
塗膜など)等の基材に塗布して使用され、低圧水銀灯、
中圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンラン
プ、ガリウムランプ、メタルハライドランプ、太陽光等
の紫外線を照射することによって速やかに硬化させるこ
とができる。また、本発明の硬化性被覆材組成物は、電
子部品及び機械部品の表面処理あるいはシャドウマス
ク、プリント配線板、レジスト板等のエッチングレジス
トに広く使用できる。さらに、これ以外の塗料、成形材
料又は注型材料としても利用できる。
The curable coating material composition of the present invention comprises a base such as an inorganic substance (iron plate, tin plate, galvanized sheet, aluminum plate, zinc steel plate, etc.) and organic substance (wood, paper, plastic, coating film of organic paint, etc.) and the like. It is used by applying it to a low pressure mercury lamp,
It can be rapidly cured by irradiation with ultraviolet rays such as a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a xenon lamp, a gallium lamp, a metal halide lamp, and sunlight. Further, the curable coating material composition of the present invention can be widely used for surface treatment of electronic parts and mechanical parts, or for etching resists such as shadow masks, printed wiring boards and resist boards. Further, it can be used as other paints, molding materials or casting materials.

【0025】[0025]

【実施例】以下、本発明を実施例及び比較例により具体
的に説明するが、部及び%は特に断りのない限り、重量
基準による。
EXAMPLES Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples. Parts and% are based on weight unless otherwise specified.

【0026】合成例1 〈アクリル系共重合体c−1の製造例〉攪拌器、温度制
御装置、コンデンサーを備えた容器にソルベッソ♯10
0(芳香族石油誘導体、エッソ(株)製)を53.3部
仕込んだ。攪拌しながら温度を120℃に上昇させ、次
いで下記のモノマー混合物100部に、アゾビスイソブ
チロニトリル2部とt−ブチルペルオキシイソプロピル
カーボネート2部を添加し、3時間で滴下した。次い
で、アゾビスイソブチロニトリル0.1部を30分間隔
で4回添加した。更に、2時間120℃で加熱攪拌し反
応率を上昇させた後、酢酸n−ブチル13.3部を添加
し反応を終了させた。 スチレン 5部 メタクリル酸 20部 n−ブチルメタクリレート 20部 t−ブチルメタクリレート 8部 2−エチルヘキシルメタクリレート 29部 2−ヒドロキシエチルメタクリレート 18部 得られたアクリル系共重合体c−1の重量平均分子量は
14000、酸価は78mgKOH/g、ガラス転移温
度は49℃であった。
Synthesis Example 1 <Production Example of Acrylic Copolymer c-1> Solvesso # 10 was placed in a container equipped with a stirrer, a temperature controller and a condenser.
0 (aromatic petroleum derivative, manufactured by Esso Corporation) was charged in 53.3 parts. The temperature was raised to 120 ° C. with stirring, and then 2 parts of azobisisobutyronitrile and 2 parts of t-butylperoxyisopropyl carbonate were added to 100 parts of the following monomer mixture, and the mixture was added dropwise over 3 hours. Next, 0.1 part of azobisisobutyronitrile was added 4 times at intervals of 30 minutes. After further heating and stirring at 120 ° C. for 2 hours to increase the reaction rate, 13.3 parts of n-butyl acetate was added to terminate the reaction. Styrene 5 parts Methacrylic acid 20 parts n-Butyl methacrylate 20 parts t-Butyl methacrylate 8 parts 2-Ethylhexyl methacrylate 29 parts 2-Hydroxyethyl methacrylate 18 parts The resulting acrylic copolymer c-1 has a weight average molecular weight of 14,000. The acid value was 78 mgKOH / g and the glass transition temperature was 49 ° C.

【0027】合成例2 〈アクリル系共重合体c−2の製造例〉下記のモノマー
混合物を使用したことを除き、合成例1と同様に重合を
行い、アクリル系共重合体c−2を得た。 スチレン 17部 メタクリル酸 20部 n−ブチルメタクリレート 20部 メチルメタクリレート 15部 2−エチルヘキシルメタクリレート 10部 2−ヒドロキシエチルメタクリレート 18部 得られたアクリル系共重合体c−2の重量平均分子量は
16000、酸価は39mgKOH/g、ガラス転移温
度は61℃であった。
Synthesis Example 2 <Production Example of Acrylic Copolymer c-2> Polymerization was performed in the same manner as in Synthesis Example 1 except that the following monomer mixture was used to obtain an acrylic copolymer c-2. It was Styrene 17 parts Methacrylic acid 20 parts n-Butyl methacrylate 20 parts Methyl methacrylate 15 parts 2-Ethylhexyl methacrylate 10 parts 2-Hydroxyethyl methacrylate 18 parts The obtained acrylic copolymer c-2 has a weight average molecular weight of 16000 and an acid value. Was 39 mgKOH / g, and the glass transition temperature was 61 ° C.

【0028】実施例1〜6及び比較例1〜7 上記合成例1及び2で得たアクリル系共重合体c−1及
びc−2、並びに表1に示した各化合物を、表1に示し
た割合で混合し、硬化性被覆材組成物を得た。得られた
各組成物を、脱脂した微細な穴(直径0.2mm)を多
数有する鋼板上にそれぞれ10μmの乾燥膜厚になるよ
うにバーコータで塗装し、60℃で5分間予備乾燥した
後、所定のマスクを介して紫外線を照射し、硬化塗膜を
形成し、アルカリ現像した。
Examples 1 to 6 and Comparative Examples 1 to 7 Table 1 shows the acrylic copolymers c-1 and c-2 obtained in the above Synthesis Examples 1 and 2 and each compound shown in Table 1. The mixture was mixed at different ratios to obtain a curable coating material composition. Each of the obtained compositions was coated on a steel plate having a large number of degreased fine holes (diameter 0.2 mm) with a bar coater so as to have a dry film thickness of 10 μm, and after preliminary drying at 60 ° C. for 5 minutes, Ultraviolet rays were radiated through a predetermined mask to form a cured coating film, which was then alkali-developed.

【0029】これら硬化性被覆材組成物の評価結果を表
1に示した。表1から明らかなように、本発明の硬化性
被覆材組成物は、アルカリ溶解性、封孔性、耐エッチン
グ性、平滑性においていずれも優れていた。
The evaluation results of these curable coating material compositions are shown in Table 1. As is clear from Table 1, the curable coating material composition of the present invention was excellent in alkali solubility, sealing property, etching resistance, and smoothness.

【0030】[0030]

【表1】 a−1:ブタンジオール(1モル)とアクリル酸2量体
(2モル)とのエステル a−2:トリプロピレングリコール(1モル)とアクリ
ル酸2量体(2モル)とのエステル a−3:ペンタエリスリトール(1モル)とアクリル酸
2量体(3モル)とのエステル b−1:アロニックスM−5400(フタル酸モノヒド
ロキシエチルアクリレート、東亜合成化学(株)製) b−2:アロニックスM−5600(カルボキシポリカ
プロラクトンモノアクリレート、東亜合成化学(株)
製) d−1:ダイヤエイドAD−9002(アクリレート
系、三菱レイヨン(株)製) d−2:メガファックF177(フッ素系、大日本イン
キ化学(株)製) e−1:イルガキュア184(チバガイギー(株)製) e−2:ベンゾフェノン評価方法 アルカリ溶解性:70℃の5%NaOH溶液に1分間浸
漬後の塗膜の溶解性を目視判定。 封孔性:穴の封止状態を目視判定。 耐エッチング性:エッチング液(FeCl2 )に70℃
10分浸漬後、外観を目視判定。 平滑性:目視判定。評価基準 A:良好 B:やや良好 C:やや不十分 D:不十分
E:かなり不十分
[Table 1] a-1: ester of butanediol (1 mol) and acrylic acid dimer (2 mol) a-2: ester of tripropylene glycol (1 mol) and acrylic acid dimer (2 mol) a-3 : Ester of pentaerythritol (1 mol) and acrylic acid dimer (3 mol) b-1: Aronix M-5400 (monohydroxyethyl phthalate phthalate, manufactured by Toagosei Co., Ltd.) b-2: Aronix M -5600 (Carboxypolycaprolactone monoacrylate, Toa Gosei Chemical Co., Ltd.)
D-1: Dia-Aid AD-9002 (acrylate type, manufactured by Mitsubishi Rayon Co., Ltd.) d-2: Megafac F177 (fluorine type, manufactured by Dainippon Ink and Chemicals, Inc.) e-1: Irgacure 184 (Ciba Geigy) E-2: Benzophenone Evaluation Method Alkali Solubility: The solubility of the coating film after 1 minute of immersion in a 5% NaOH solution at 70 ° C. is visually determined. Sealing property: The sealing condition of the hole is visually judged. Etching resistance: 70 ° C in etching solution (FeCl 2 ).
After soaking for 10 minutes, the appearance is visually judged. Smoothness: visually determined. Evaluation criteria A: Good B: Somewhat good C: Somewhat insufficient D: Inadequate E: Quite insufficient

【0031】[0031]

【発明の効果】本発明の硬化性被覆材組成物は、紫外線
により硬化することができ、かつ得られた塗膜はアルカ
リ溶解性、封孔性、耐エッチング性、平滑性に優れたも
のであり、その工業的意義は極めて高いものである。
The curable coating material composition of the present invention can be cured by ultraviolet rays, and the coating film obtained is excellent in alkali solubility, sealing property, etching resistance and smoothness. Yes, its industrial significance is extremely high.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 (a)次の式で表される化合物10〜8
0重量部、 【化1】 (b)1分子中に1個のカルボキシル基及び1個の(メ
タ)アクリロイルオキシ基を有する化合物20〜70重
量部、(c)カルボキシル基を含有するアクリル系共重
合体0〜20重量部、(d)レベリング剤0〜0.5重
量部、及び(e)光重合開始剤0.1〜10重量部、
(ただし、(a)〜(c)成分の合計を100重量部と
する。)からなることを特徴とする硬化性被覆材組成
物。
1. (a) Compounds 10 to 8 represented by the following formulas:
0 parts by weight, (B) 20 to 70 parts by weight of a compound having one carboxyl group and one (meth) acryloyloxy group in one molecule, (c) 0 to 20 parts by weight of an acrylic copolymer containing a carboxyl group, (D) 0 to 0.5 part by weight of a leveling agent, and (e) 0.1 to 10 parts by weight of a photopolymerization initiator,
(However, the total of the components (a) to (c) is 100 parts by weight).
JP34941493A 1993-07-14 1993-12-28 Curable coating composition Expired - Lifetime JP3299371B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP5-195595 1993-07-14
JP19559593 1993-07-14
JP34941493A JP3299371B2 (en) 1993-07-14 1993-12-28 Curable coating composition

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001021708A1 (en) * 1999-09-24 2001-03-29 Taiyo Ink Manufacturing Co., Ltd. Ultraviolet-curable resin composition
JP2005122123A (en) * 2003-09-26 2005-05-12 Mitsubishi Chemicals Corp Blue-violet laser photosensitive composition
JP2008152285A (en) * 2003-09-26 2008-07-03 Mitsubishi Chemicals Corp Blue-violet laser photosensitive composition
DE112009000690T5 (en) 2008-03-27 2011-03-24 Nisshin Steel Co., Ltd. Inkjet ink composition for etch resists
US8357859B2 (en) 2007-01-16 2013-01-22 Sumitomo Bakelite Co., Ltd. Insulating resin sheet laminate and multi-layer printed circuit board including insulating resin sheet laminate
KR20180026800A (en) 2015-09-03 2018-03-13 닛신 세이코 가부시키가이샤 METHOD FOR REMOVING A RESIST FILM FROM A METAL PLATE

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001021708A1 (en) * 1999-09-24 2001-03-29 Taiyo Ink Manufacturing Co., Ltd. Ultraviolet-curable resin composition
US6602643B2 (en) 1999-09-24 2003-08-05 Taiyo Ink Manufacturing Co., Ltd. Ultraviolet-curable resin composition
JP2005122123A (en) * 2003-09-26 2005-05-12 Mitsubishi Chemicals Corp Blue-violet laser photosensitive composition
JP2008152285A (en) * 2003-09-26 2008-07-03 Mitsubishi Chemicals Corp Blue-violet laser photosensitive composition
JP4485288B2 (en) * 2003-09-26 2010-06-16 三菱化学株式会社 Blue-violet laser photosensitive composition
US8357859B2 (en) 2007-01-16 2013-01-22 Sumitomo Bakelite Co., Ltd. Insulating resin sheet laminate and multi-layer printed circuit board including insulating resin sheet laminate
DE112009000690T5 (en) 2008-03-27 2011-03-24 Nisshin Steel Co., Ltd. Inkjet ink composition for etch resists
US8425790B2 (en) 2008-03-27 2013-04-23 Nisshin Steel Co., Ltd. Ink-jet ink composition for etching resist
KR20180026800A (en) 2015-09-03 2018-03-13 닛신 세이코 가부시키가이샤 METHOD FOR REMOVING A RESIST FILM FROM A METAL PLATE
US10156789B2 (en) 2015-09-03 2018-12-18 Nisshin Steel Co., Ltd. Method for stripping resist film from metal plate and method for manufacturing etched metal plate

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