JPH0763914A - Method and device for smoothing of resin coating film - Google Patents

Method and device for smoothing of resin coating film

Info

Publication number
JPH0763914A
JPH0763914A JP21285493A JP21285493A JPH0763914A JP H0763914 A JPH0763914 A JP H0763914A JP 21285493 A JP21285493 A JP 21285493A JP 21285493 A JP21285493 A JP 21285493A JP H0763914 A JPH0763914 A JP H0763914A
Authority
JP
Japan
Prior art keywords
peeling member
film
smoothing
resin
peeling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP21285493A
Other languages
Japanese (ja)
Inventor
Masaru Nikaido
勝 二階堂
Hideumi Kanetaka
秀海 金高
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21285493A priority Critical patent/JPH0763914A/en
Publication of JPH0763914A publication Critical patent/JPH0763914A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Optical Filters (AREA)
  • Adhesive Tapes (AREA)

Abstract

PURPOSE:To decrease defects caused by a peeling member and to efficiently smooth a film by using such a resin film as a peeling member that has specified thickness and contains infusible silicone resin having a specified average particle size. CONSTITUTION:A supporting substrate 2a on which a resin coating film 2b is formed is mounted by vacuum sucking on a heating surface plate 1 which can be travelled at a constant speed. A smoothing roller 6 for heating and pressing is disposed above the zone where the heating surface plate 1 is travelled. A supplying device 3 for the peeling member is also disposed so that the peeling member 4 is supplied through a guide roller 5 to separate the smoothing roller 6 and the heating surface plate 1. As for the peeling member 4, such a resin film is used that has 25-100mum thickness and contains 1-30wt.% infusible silicone resin particles having 0.1-5mum average particle size. The resin film is preferably a film showing little thermal deformation during pressing and heating, and a polyethylene terephthalate film or the like is used.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、支持基板上に樹脂被膜
を有する部材の樹脂被膜平滑化方法および処理装置に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for smoothing a resin film on a member having a resin film on a supporting substrate.

【0002】[0002]

【従来の技術】近年、各種電子部品材料に樹脂被覆基板
が広く使用されるようになっている。たとえば、サーマ
ルヘッド、ハイブリットIC多層回路基板や液晶表示装
置に使用されるカラーフィルタ等が挙げられる。とくに
サーマルヘッドやカラーフィルタ等は被覆された樹脂表
面の平滑さが電子部品特性に直接影響するため、効率よ
く優れた表面平坦性を有する平滑化方法が望まれてい
る。
2. Description of the Related Art In recent years, resin-coated substrates have been widely used for various electronic component materials. Examples thereof include thermal heads, hybrid IC multilayer circuit boards, and color filters used in liquid crystal display devices. In particular, since the smoothness of the coated resin surface of the thermal head, the color filter, etc. directly affects the characteristics of electronic parts, a smoothing method having efficient and excellent surface flatness is desired.

【0003】従来の平滑化方法をサーマルヘッドとカラ
ーフィルタを例にとり説明する。セラミック基板上にグ
レーズガラス層を熱の発散および蓄熱をコントロールす
る保温層として形成した高抵抗体に代えて、セラミック
基板や金属基板上にポリイミド樹脂を保温層として形成
した耐熱絶縁基板がサーマルヘッドとして注目されてい
る。このようなサーマルヘッドは、ポリイミド樹脂の熱
拡散率が従来のグレーズガラス層に比べて 1/3〜1/6 と
小さくなることから、熱効率に優れたものとなる。ま
た、金属基板など可とう性を有する基板を使用した場合
は、曲げ加工を行うことも可能であり、小型かつ安価な
高性能のサーマルヘッドを得ることができる。しかし、
このようなサーマルヘッドにおいては、保温層のポリイ
ミド樹脂層上に発熱抵抗体や電極などを形成するための
無機薄膜や金属薄膜が必要となるため、ボイドや突起な
どの欠陥および表面凹凸を最小限に抑制し、表面を平滑
にする必要がある。表面を平滑にする方法として、ポリ
イミド樹脂の前駆体であるポリアミック酸ワニスを支持
基板上に塗布してイミド化しない温度で加熱して溶剤を
除去し基板上に形成されたポリアミック酸薄膜を剥離部
材を介して平滑化ローラにより加熱・加圧して平滑化し
た後、加熱によりポリアミック酸薄膜をイミド化しポリ
イミド樹脂層を形成する方法が提案されている。
A conventional smoothing method will be described by taking a thermal head and a color filter as an example. In place of the high-resistor formed as a heat insulating layer that controls heat dissipation and heat storage on the ceramic substrate, a heat-resistant insulating substrate made of polyimide resin as a heat insulating layer is used as a thermal head. Attention has been paid. Such a thermal head has excellent thermal efficiency because the thermal diffusivity of the polyimide resin is 1/3 to 1/6 smaller than that of the conventional glaze glass layer. Further, when a flexible substrate such as a metal substrate is used, it is possible to perform a bending process, and a compact and inexpensive high-performance thermal head can be obtained. But,
In such a thermal head, since an inorganic thin film or a metal thin film for forming a heating resistor or an electrode is required on the polyimide resin layer of the heat insulating layer, defects such as voids and protrusions and surface irregularities are minimized. It is necessary to suppress it and smooth the surface. As a method of smoothing the surface, a polyamic acid varnish, which is a precursor of a polyimide resin, is applied on a supporting substrate and heated at a temperature at which imidization is not performed to remove the solvent to remove the polyamic acid thin film formed on the substrate. A method has been proposed in which a polyamic acid thin film is imidized to form a polyimide resin layer by heating after heating and pressing with a smoothing roller to smooth the surface.

【0004】また、カラー液晶表示装置に用いられるカ
ラーフィルタは、顔料または染料を樹脂バインダー中に
分散させた着色層をガラス基板上に形成し、さらに透明
樹脂による保護層とその上に透明電極を形成した構造を
有している。この場合、液晶表示装置のセルギャップの
維持や各種光学的損失を防止するため、ボイドや突起な
どの欠陥および表面の凹凸を最小限に抑制する必要があ
る。カラーフィルタの場合は、ガラス基板上に形成され
た着色層の含有溶剤が蒸発した乾燥状態において、この
着色層を剥離部材を介して平滑化ローラにより加熱・加
圧して平滑化した後、着色層を熱硬化させる方法が提案
されている。また、着色層上にエポキシ樹脂やアクリル
樹脂等の透明保護層を形成し、この透明保護層の含有溶
剤が蒸発した乾燥状態において、剥離部材を介して透明
保護層を平滑化ローラにより加熱・加圧して平滑化した
後、熱硬化させる方法が提案されている。
Further, in a color filter used in a color liquid crystal display device, a colored layer in which a pigment or a dye is dispersed in a resin binder is formed on a glass substrate, and a protective layer made of a transparent resin and a transparent electrode are formed thereon. It has a formed structure. In this case, in order to maintain the cell gap of the liquid crystal display device and prevent various optical losses, it is necessary to minimize defects such as voids and protrusions and surface irregularities. In the case of a color filter, in the dry state where the solvent contained in the colored layer formed on the glass substrate is evaporated, this colored layer is heated and pressed by a smoothing roller through a peeling member to be smoothed, and then the colored layer. There has been proposed a method of heat curing the. In addition, a transparent protective layer such as epoxy resin or acrylic resin is formed on the colored layer, and in a dry state where the solvent contained in the transparent protective layer is evaporated, the transparent protective layer is heated and heated by a smoothing roller through a peeling member. A method has been proposed in which the material is pressed and smoothed, and then heat-cured.

【0005】そして、上述の樹脂被膜の平滑化を効率よ
く自動的に行う装置として、樹脂被膜が形成された支持
基板を搬送する搬送手段と、剥離部材を送り出す停止機
構を有する剥離部材供給部と、剥離部材および樹脂被膜
を加熱・加圧する平滑化ローラと、平滑化後、剥離部材
を剥離する剥離ローラと、剥離部材を巻き取るモータ機
構を有する巻き取り部とを具備する平滑化処理装置が提
案されている。
As a device for automatically and smoothly smoothing the above resin coating, a transporting means for transporting the support substrate on which the resin coating is formed, and a peeling member supplying section having a stopping mechanism for feeding the peeling member. A smoothing processing device including a smoothing roller that heats and presses a peeling member and a resin coating, a peeling roller that peels the peeling member after smoothing, and a winding unit that has a motor mechanism that winds the peeling member. Proposed.

【0006】従来、平滑化処理装置の剥離部材として
は、熱に強く、張力制御の容易な25〜100 μm 厚のポリ
エチレンテレフタレート(PET)フイルムの表面にシ
リコーン樹脂を離型層として塗布してなる剥離力が 10
〜50g/50mmの離型フイルムが多用されている。シリコー
ン樹脂の塗布方法としては、樹脂を溶剤で希釈溶解した
後、使用開始直前に触媒を混合しロールコータなどで塗
工を行い、塗布後、直ちにオーブンに入れ加熱硬化処理
を行う方法がとられている。
Conventionally, as a peeling member of a smoothing apparatus, a silicone resin is applied as a release layer on the surface of a polyethylene terephthalate (PET) film having a thickness of 25 to 100 μm, which is strong against heat and whose tension can be easily controlled. Peel force is 10
A release film of ~ 50g / 50mm is often used. As a coating method of the silicone resin, after the resin is diluted and dissolved with a solvent, a catalyst is mixed just before the start of use and coating is carried out with a roll coater or the like. ing.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、従来の
剥離部材は以下のような問題があった。シリコーン樹脂
が塗布されたフイルムは順次巻き取られていくが、その
とき空気の巻き込みがあるとフイルムに巻ムラが生じて
くる。いったん巻ムラが発生するとフイルムはもとの軸
心に戻ろうとして、剥離部材とフイルムの背面が擦れ合
う。このとき離型層に傷が入り離型層が欠落することに
なる。この状態で平滑化処理が施されると、傷跡がカラ
ーフィルタの着色層に転写するなどの欠陥を引き起こす
などの問題が生じる。
However, the conventional peeling member has the following problems. The film coated with the silicone resin is sequentially wound up, but if air is entrained at that time, unevenness in winding of the film occurs. Once uneven winding occurs, the film tries to return to the original axis, and the peeling member and the back surface of the film rub against each other. At this time, the release layer is damaged and the release layer is lost. If the smoothing process is performed in this state, there arises a problem that defects such as transfer of scratches to the coloring layer of the color filter are caused.

【0008】巻き取り時の空気の巻き込みを防ぐために
樹脂フイルムに滑剤という無機質の微粒子を混入させ、
フイルム表面を滑りやすくする方法があるが、この場
合、フイルム表面の平滑性が悪くなり平滑化処理に適さ
なくなるばかりか、滑剤がフイルム剥離の際、カラーフ
ィルタの着色層を傷つけてしまうという問題がある。
In order to prevent the entrainment of air during winding, inorganic fine particles called a lubricant are mixed in the resin film,
There is a method to make the film surface slippery, but in this case, the smoothness of the film surface deteriorates and it is not suitable for smoothing treatment, and the problem that the lubricant damages the colored layer of the color filter at the time of peeling the film is there.

【0009】本発明はこのような課題に対処するために
なされたもので、剥離部材を介して加圧することにより
樹脂被膜を平滑化するに際して、剥離部材によって生じ
る欠陥を減少させ、効率よく平滑化することのできる装
置および方法を提供することを目的する。
The present invention has been made to address such a problem, and in smoothing the resin film by applying pressure through the peeling member, the defects caused by the peeling member are reduced and the smoothing is efficiently performed. It is an object of the present invention to provide an apparatus and a method capable of doing the above.

【0010】[0010]

【課題を解決するための手段】本発明の樹脂被膜の平滑
化方法は、支持基板上に形成された樹脂被膜表面を剥離
部材を介して加圧することにより平滑化する樹脂被膜の
平滑化方法において、剥離部材が、平均粒径 0.1〜5 μ
m の非溶融性シリコーン樹脂粒子を 1〜30重量%含有す
る、厚さ25〜100 μm の樹脂フイルムであることを特徴
とする。
The method for smoothing a resin coating of the present invention is a method for smoothing a resin coating, wherein the surface of the resin coating formed on a supporting substrate is smoothed by applying pressure through a peeling member. , The peeling member has an average particle size of 0.1 to 5 μ
A resin film having a thickness of 25 to 100 μm and containing 1 to 30% by weight of m non-melting silicone resin particles.

【0011】また、本発明の樹脂被膜の平滑化処理装置
は、支持基板を搬送する搬送手段と、剥離部材を送り出
す剥離部材供給部と、剥離部材および樹脂被膜を加熱・
加圧する平滑化ローラと、剥離部材を剥離する剥離ロー
ラと、剥離部材を巻き取る巻き取り部とを具備する樹脂
被膜の平滑化処理装置において、剥離部材が、平均粒径
0.1〜5 μm の非溶融性シリコーン樹脂粒子を 1〜30重
量%含有する、厚さ25〜100 μm の樹脂フイルムである
ことを特徴とする。
Further, the apparatus for smoothing a resin film of the present invention comprises a conveying means for conveying a supporting substrate, a peeling member supply section for feeding the peeling member, a heating member for heating the peeling member and the resin film.
In a smoothing apparatus for a resin film, which comprises a smoothing roller for pressing, a peeling roller for peeling the peeling member, and a winding section for winding the peeling member, the peeling member has an average particle size of
A resin film having a thickness of 25 to 100 μm and containing 1 to 30% by weight of non-melting silicone resin particles of 0.1 to 5 μm.

【0012】本発明に係わる樹脂フイルムは、加圧・加
熱時の熱変形の少ないフイルムが好ましい。そのような
フイルムとしてポリエチレンテレフタレート(PET)
フイルム、ポリエチレンナフタレート(PEN)フイル
ム等を例示することができる。フイルム厚さは25〜100
μm 、好ましくは38〜75μm が効率よく樹脂被膜を平滑
化することができる。すなわちフイルム厚さが25μm 未
満では十分な張力制御が困難となり、100 μm をこえる
と樹脂被膜への熱伝達が悪くなり平滑化の効率が落ち
る。
The resin film according to the present invention is preferably a film which is less likely to be deformed by heat during pressurization and heating. Polyethylene terephthalate (PET) as such a film
Examples thereof include films and polyethylene naphthalate (PEN) films. Film thickness is 25-100
The thickness of μm, preferably 38 to 75 μm, can efficiently smooth the resin film. That is, if the film thickness is less than 25 μm, it is difficult to control the tension sufficiently, and if the film thickness exceeds 100 μm, the heat transfer to the resin coating is deteriorated and the smoothing efficiency is lowered.

【0013】本発明に係わる非溶融性シリコーン樹脂粒
子は、シロキサン結合により三次元的な網目構造を有す
るポリオルガノシロキサン樹脂を微粒子化したものであ
る。ポリオルガノシロキサンの珪素原子に結合する有機
基としては、一価の置換または非置換の炭化水素基であ
り、メチル基、エチル基等の脂肪族炭化水素基、フェニ
ル基などの芳香族炭化水素基、ビニル基などの不飽和炭
化水素基が例示される。ポリオルガノシロキサンの珪素
原子に結合する有機基は、非溶融性シリコーン樹脂粒子
の離型性に関与する重要な因子であり、使用する樹脂フ
イルム材料に応じて変えることが望ましい。たとえば、
PETフイルムにあってはフェニル基が望ましい。
The non-melting silicone resin particles according to the present invention are fine particles of polyorganosiloxane resin having a three-dimensional network structure due to siloxane bonds. The organic group bonded to the silicon atom of the polyorganosiloxane is a monovalent substituted or unsubstituted hydrocarbon group, which is an aliphatic hydrocarbon group such as a methyl group or an ethyl group, or an aromatic hydrocarbon group such as a phenyl group. And unsaturated hydrocarbon groups such as vinyl groups. The organic group bonded to the silicon atom of the polyorganosiloxane is an important factor involved in the releasability of the non-melting silicone resin particles, and it is desirable to change it depending on the resin film material used. For example,
A phenyl group is desirable in a PET film.

【0014】シリコーン樹脂は、一般には初期縮合物を
適当な溶剤に溶解したシリコーンワニスとして入手可能
であるが、非溶融性シリコーン樹脂粒子は、たとえばシ
リコーンワニスの溶剤を飛ばして硬化させた実質的に不
溶、不融の粉末状物質である。
The silicone resin is generally available as a silicone varnish obtained by dissolving the precondensate in a suitable solvent, but the non-melting silicone resin particles are substantially cured by, for example, removing the solvent of the silicone varnish. It is an insoluble and infusible powdery substance.

【0015】樹脂フイルムに配合する際の非溶融性シリ
コーン樹脂粒子の粒子径は、平均粒径が 0.1〜5 μm の
ものであり、とくに 0.5〜2 μm の範囲が好ましい。平
均粒径が5 μm をこえるとフイルムの平坦性が不十分と
なり、 0.1μm 未満の場合は、単分散の粒子を得ること
が困難となり表面突起を形成しやすくなる。
The particle size of the non-melting silicone resin particles when blended in the resin film is such that the average particle size is from 0.1 to 5 μm, preferably from 0.5 to 2 μm. If the average particle size exceeds 5 μm, the flatness of the film becomes insufficient, and if it is less than 0.1 μm, it becomes difficult to obtain monodisperse particles, and surface projections are easily formed.

【0016】また、非溶融性シリコーン樹脂粒子の形状
としては球状が好ましく、とくに下記の (I)式で示され
る真球度fが 0.7以上、さらには 0.8以上が好ましい。 f=(A/(π/4 )/Dmax 1/2 ……………………… (I) ここで、式中、Aは樹脂粒子の断面積、Dmax は樹脂粒
子の断面の最長径である。
The shape of the non-melting silicone resin particles is preferably spherical, and the sphericity f represented by the following formula (I) is preferably 0.7 or more, more preferably 0.8 or more. f = (A / (π / 4) / D max ) 1/2 …………………… (I) where A is the cross-sectional area of the resin particles and D max is the cross-section of the resin particles. Is the longest diameter of.

【0017】さらに、非溶融性シリコーン樹脂粒子の配
合量は、樹脂フイルムに対して 1〜30重量%であり、好
ましくは 5〜20重量%である。配合量が 1重量%未満で
は、十分な離型性を得ることができなく、30重量%をこ
えると離型性の効果は飽和してしまう。
Further, the blending amount of the non-melting silicone resin particles is 1 to 30% by weight, preferably 5 to 20% by weight, based on the resin film. If the content is less than 1% by weight, sufficient releasability cannot be obtained, and if it exceeds 30% by weight, the releasability effect is saturated.

【0018】また、非溶融性シリコーン樹脂粒子を配合
した樹脂フイルムに剥離力が10〜50g/50mmのシリコーン
系剥離剤を塗布したものを剥離部材とすることもでき
る。
Alternatively, a resin film containing non-melting silicone resin particles coated with a silicone-based release agent having a release force of 10 to 50 g / 50 mm may be used as the release member.

【0019】[0019]

【作用】上述の各条件を満足する非溶融性シリコーン樹
脂粒子を樹脂フイルムに添加することにより、非溶融性
シリコーン樹脂粒子の密度が樹脂フイルム表面近傍で高
くなる。その結果、樹脂フイルムが擦れ合うことによっ
て起こる傷や、多量の滑剤を含有したときに起こる着色
層の傷を防ぐことができる。
By adding non-melting silicone resin particles satisfying the above-mentioned conditions to the resin film, the density of the non-melting silicone resin particles becomes high near the surface of the resin film. As a result, it is possible to prevent scratches caused by rubbing of the resin film and scratches in the colored layer when a large amount of lubricant is contained.

【0020】[0020]

【実施例】以下、本発明の実施例を図面を参照して説明
する。 実施例1 平滑化処理装置を図1に示す。また、平滑化処理手順を
図2に示す。図1aにより装置の概要について説明す
る。たとえばACサーボモータ/LMガイド/ボールス
クリューネジの組合わせで、定速走行可能な加熱定盤1
上に樹脂被膜2bが形成された支持基板2aが真空吸着
し載置されている。液晶表示装置用のカラーフイルタを
例にとると樹脂被膜2bが着色層に、支持基板2aがガ
ラス基板にそれぞれ相当する。そして、加熱定盤1が通
過する上方には加熱および加圧用の平滑化ローラ6が設
置されている。また剥離部材供給装置3が設けられてお
り、加熱定盤1と平滑化ローラ6との間に剥離部材4を
ガイドローラ5を介して供給できるようになっている。
平滑化ローラ6の後段には剥離ローラ7が設けられ、駆
動ローラ8aおよびガイドローラ8bからなるフイルム
送りローラ8との組合わせにより自動剥離を可能として
いる。剥離部材4は最後に剥離部材巻取装置9に巻取ら
れる。なお、剥離部材供給装置3には図示を省略した逆
回転駆動装置、制動装置、バウダーブレーキ等が設けら
れ、また剥離部材巻取装置9には図示を省略したトルク
モータ、制動装置が設けられ剥離部材4の張力制御を行
っている。また剥離部材4の拡大断面図を図1bに示
す。
Embodiments of the present invention will be described below with reference to the drawings. Example 1 A smoothing processing apparatus is shown in FIG. The smoothing processing procedure is shown in FIG. An outline of the device will be described with reference to FIG. 1a. For example, with a combination of AC servo motor / LM guide / ball screw screw, heating platen 1 capable of running at a constant speed
A support substrate 2a on which a resin coating 2b is formed is vacuum-sucked and placed. Taking a color filter for a liquid crystal display device as an example, the resin coating 2b corresponds to a colored layer and the support substrate 2a corresponds to a glass substrate. A smoothing roller 6 for heating and pressing is installed above the heating platen 1. Further, a peeling member supply device 3 is provided so that the peeling member 4 can be supplied between the heating platen 1 and the smoothing roller 6 via the guide roller 5.
A peeling roller 7 is provided downstream of the smoothing roller 6, and automatic peeling is possible by combination with the film feed roller 8 including a drive roller 8a and a guide roller 8b. The peeling member 4 is finally wound up by the peeling member winding device 9. The peeling member supply device 3 is provided with a reverse rotation drive device, a braking device, a bower brake, etc., which are not shown, and the peeling member winding device 9 is provided with a torque motor and a braking device, which are not shown. The tension of the member 4 is controlled. An enlarged cross-sectional view of the peeling member 4 is shown in FIG. 1b.

【0021】つぎに、この装置を使用する樹脂被膜の平
滑化処理手順を図2により説明する。 まず、加熱定盤
1と平滑化ローラ6とを所定の温度に設定した後、樹脂
被膜2aが形成された支持基板2bを樹脂被膜2aを上
向きとして加熱定盤1に真空吸着し所定時間予備加熱を
行う。この加熱定盤1が平滑化ローラ6の下に到達する
までは、平滑化ローラ6および剥離ローラ7は加熱定盤
1の上方にある(図2(a))。
Next, the procedure for smoothing the resin coating using this apparatus will be described with reference to FIG. First, after setting the heating platen 1 and the smoothing roller 6 to a predetermined temperature, the supporting substrate 2b having the resin film 2a formed thereon is vacuum-adsorbed on the heating platen 1 with the resin film 2a facing upward and preheated for a predetermined time. I do. Until the heating platen 1 reaches below the smoothing roller 6, the smoothing roller 6 and the peeling roller 7 are above the heating platen 1 (FIG. 2A).

【0022】そして、加熱定盤1の先端が平滑化ローラ
6の下に到達する直前に剥離部材巻取装置9が回転駆動
され剥離部材4が右方向に進行し、それによって剥離部
材4の未使用面が平滑にすべき樹脂被膜2aの上に対面
する(図2(b))。
Immediately before the tip of the heating platen 1 reaches below the smoothing roller 6, the peeling member winding device 9 is rotationally driven to move the peeling member 4 to the right, whereby the peeling member 4 is not moved. The surface to be used faces the resin film 2a whose surface should be smooth (FIG. 2 (b)).

【0023】ついで、樹脂被膜2aが形成された支持基
板2bの先端が平滑化ローラ6の下に到達した時点で、
平滑化ローラ6および剥離ローラ7が下降して平滑化を
開始する。平滑化処理が行われている間は剥離部材供給
装置3と剥離部材巻取装置9が駆動され、それによって
剥離部材4に適当な張力が加えられ、剥離部材4の加熱
・加圧によるフイルムの伸びを吸収し樹脂被膜の平滑面
のムラの発生を防止している。なお、平滑化された樹脂
被膜面は、横筋の発生を防止するため、全面の平滑化が
終了するまで剥離部材4が密着された状態を保っている
(図2(c))。
Next, when the tip of the support substrate 2b having the resin coating 2a formed thereon reaches below the smoothing roller 6,
The smoothing roller 6 and the peeling roller 7 descend and start smoothing. While the smoothing process is being performed, the peeling member supply device 3 and the peeling member winding device 9 are driven to apply an appropriate tension to the peeling member 4, and the film is heated and pressed by the peeling member 4. It absorbs elongation and prevents unevenness on the smooth surface of the resin coating. The smoothed resin film surface keeps the peeling member 4 in close contact with the surface of the smoothed resin film until the smoothing of the entire surface is completed in order to prevent the occurrence of lateral stripes (FIG. 2C).

【0024】ついで、樹脂被膜2a全面の平滑化が終了
した時点で、剥離ローラ7を上昇させるとともに(図2
(d))、フイルム送りローラ8でフイルムのたるみを
抑えながら樹脂被膜2aに密着した剥離部材4を一気に
剥離する(図2(e))。
Next, when the smoothing of the entire surface of the resin coating 2a is completed, the peeling roller 7 is raised and the
(D)), The peeling member 4 that is in close contact with the resin coating 2a is peeled off at once with the film feed roller 8 suppressing the slack of the film (FIG. 2 (e)).

【0025】最後に、平滑化ローラ6を上昇させて加熱
定盤1を元の位置に戻して、一連の平滑化処理が完了す
る(図2(f))。
Finally, the smoothing roller 6 is raised to return the heating platen 1 to its original position, and a series of smoothing processing is completed (FIG. 2 (f)).

【0026】実施例2 実施例1に示す装置を使用して液晶表示装置のカラーフ
イルタ表面を平滑化した。金属クロムからなるブラック
マトリクスを形成した厚さ 1.1mmの4095Fガラス基
板(コーニング社製、商品名)の表面を、UV/O3
用いた光洗浄にて洗浄後、凹版オフセット印刷法を用い
て有機顔料と溶剤を少なくとも含有するエポキシ樹脂系
ワニスを主体とする着色インキを用いて、所定のパター
ンで最大膜厚 3.5〜4.5 μm の着色インキ被膜を形成す
る。その後、70〜100 ℃の熱硬化が起こらない温度で着
色インキ被膜中の溶剤を除去後、平滑化処理を行う。
Example 2 The surface of the color filter of the liquid crystal display device was smoothed by using the apparatus shown in Example 1. The surface of a 1.15-mm thick 4095F glass substrate (trade name, manufactured by Corning Incorporated) on which a black matrix made of metallic chromium is formed is washed by light cleaning using UV / O 3, and then the intaglio offset printing method is used. A colored ink film mainly composed of an epoxy resin varnish containing at least an organic pigment and a solvent is used to form a colored ink film having a maximum film thickness of 3.5 to 4.5 μm in a predetermined pattern. After that, the solvent in the colored ink film is removed at a temperature of 70 to 100 ° C. at which thermal curing does not occur, and then smoothing treatment is performed.

【0027】剥離部材および平滑化処理条件は以下の通
りである。 剥離部材;厚さ38〜100 μm の 2軸延伸PETフイルム
に、平均粒径 0.8〜1.0 μm 、真球度f 0.87 〜0.93、
ポリオルガノシロキサンの珪素原子に結合する有機基と
してフェニル基を用いた非溶融シリコーン樹脂粉末 10
重量%添加した離型フイルム。
The peeling member and the smoothing treatment conditions are as follows. Separation member: Biaxially stretched PET film having a thickness of 38 to 100 μm, an average particle size of 0.8 to 1.0 μm, a sphericity f 0.87 to 0.93,
Non-melting Silicone Resin Powder Using Phenyl Group as Organic Group Bonding to Silicon Atom of Polyorganosiloxane 10
Release film with added weight%.

【0028】 平滑化条件;予備加熱温度 85〜100 ℃ 平滑化ロール温度 85〜100 ℃ 圧力 10〜15kg/cm 送り速度 15〜30cm/min. 平滑化処理を行って得られたカラーフイルタ着色層に傷
の発生は見られなかった。
Smoothing conditions: preheating temperature 85 to 100 ° C. smoothing roll temperature 85 to 100 ° C. pressure 10 to 15 kg / cm feeding speed 15 to 30 cm / min. The color filter coloring layer obtained by performing the smoothing treatment. No scratches were found.

【0029】実施例3 実施例1に示す装置を使用して樹脂被膜金属板を用いた
サーマルヘッドの表面を平滑化した。厚さ 0.5mmの16〜
18%Cr-Fe 合金の表面を40〜60℃の希硫酸中で 1〜2 分
間活性後、ポリイミドの前駆体であるポリアミック酸を
ロールコータを用いて塗布、60〜 120℃のイミド化が起
こらない温度で塗膜中の溶剤を除去後、平滑化処理を行
う。
Example 3 The apparatus shown in Example 1 was used to smooth the surface of a thermal head using a resin-coated metal plate. 16 ~ 0.5mm thick
After activating the surface of 18% Cr-Fe alloy in dilute sulfuric acid at 40 to 60 ° C for 1 to 2 minutes, polyamic acid, which is a precursor of polyimide, is applied using a roll coater, and imidization at 60 to 120 ° C occurs. After removing the solvent in the coating film at a non-existent temperature, smoothing treatment is performed.

【0030】剥離部材および平滑化処理条件は以下の通
りである。 剥離部材;厚さ25〜100 μm の 2軸延伸PENフイルム
に、平均粒径 0.5〜0.8 μm 、真球度f 0.75 〜0.85、
ポリオルガノシロキサンの珪素原子に結合する有機基と
してフェニル基を用いた非溶融シリコーン樹脂粉末 7
重量%添加した離型フイルム。
The peeling member and the smoothing treatment conditions are as follows. Separation member: A biaxially stretched PEN film having a thickness of 25 to 100 μm, an average particle size of 0.5 to 0.8 μm, a sphericity f 0.75 to 0.85,
Non-melting Silicone Resin Powder Using Phenyl Group as Organic Group Bonding to Silicon Atom of Polyorganosiloxane 7
Release film with added weight%.

【0031】 平滑化条件;予備加熱温度 85〜 90 ℃ 平滑化ロール温度 90〜105 ℃ 圧力 10〜15kg/cm 送り速度 20〜50cm/min. 平滑化処理を行って得られたサーマルヘッドの表面層に
傷の発生は見られなかった。
Smoothing conditions: preheating temperature 85 to 90 ° C. smoothing roll temperature 90 to 105 ° C. pressure 10 to 15 kg / cm feeding speed 20 to 50 cm / min. Surface layer of a thermal head obtained by performing smoothing treatment No scratches were found on.

【0032】実施例4 実施例2で使用した非溶融シリコーン樹脂粉末添加剥離
部材の表面に剥離力が10〜50g/50mmのシリコーン系剥離
剤を塗布したものを剥離部材とする以外は実施例2と同
一の装置、同一の条件で、実施例2で準備した液晶表示
装置のカラーフイルタ表面を平滑化した。
Example 4 Example 2 except that the surface of the non-melting silicone resin powder-added release member used in Example 2 was coated with a silicone release agent having a release force of 10 to 50 g / 50 mm was used as the release member. The surface of the color filter of the liquid crystal display device prepared in Example 2 was smoothed using the same apparatus and under the same conditions.

【0033】平滑化処理を行って得られたカラーフイル
タ着色層に傷の発生は見られなかった。また、剥離部材
表面の離型層の欠落も認められなかった。
No scratch was observed in the color filter coloring layer obtained by the smoothing treatment. Further, no release layer was observed on the surface of the peeling member.

【0034】比較例1 厚さ38〜100 μm の 2軸延伸PETフイルムに剥離力が
10〜50g/50mmのシリコーン系剥離剤を塗布したものを剥
離部材とする以外は実施例2と同一の装置、同一の条件
で、実施例2で準備した液晶表示装置のカラーフイルタ
表面を平滑化した。
Comparative Example 1 A biaxially stretched PET film having a thickness of 38 to 100 μm has a peeling force.
The surface of the color filter of the liquid crystal display device prepared in Example 2 was smoothed under the same conditions and conditions as in Example 2 except that the release member was coated with 10 to 50 g / 50 mm of silicone release agent. did.

【0035】剥離部材の表面状態は平滑性に優れるもの
の、フイルム上の剥離層の欠落が認められ、平滑化処理
を行って得られたカラーフイルタ側に、離型層と同じ形
状の欠陥が発生していることが認められた。
Although the surface condition of the peeling member is excellent in smoothness, the peeling layer on the film is found to be missing, and a defect having the same shape as the release layer is generated on the color filter side obtained by performing the smoothing treatment. It was recognized that

【0036】比較例2 非溶融シリコーン樹脂粉末を35重量%添加した以外は実
施例2で使用した剥離部材の表面に剥離力が10〜50g/50
mmのシリコーン系剥離剤を塗布したものを剥離部材とす
る以外は実施例2と同一の装置、同一の条件で、実施例
2で準備した液晶表示装置のカラーフイルタ表面を平滑
化した。
Comparative Example 2 A peeling force of 10 to 50 g / 50 was applied to the surface of the peeling member used in Example 2 except that 35% by weight of non-melting silicone resin powder was added.
The surface of the color filter of the liquid crystal display device prepared in Example 2 was smoothed under the same apparatus and conditions as in Example 2 except that a silicone-based release agent having a thickness of 3 mm was used as the release member.

【0037】剥離部材の表面状態は平滑性が悪く、さら
にフイルム上の剥離層の欠落が認められ、平滑化処理を
行って得られたカラーフイルタ側に、多量の傷が発生し
ていることが認められた。
The surface condition of the peeling member was poor in smoothness, the peeling layer on the film was missing, and a large amount of scratches were generated on the color filter side obtained by performing the smoothing treatment. Admitted.

【0038】[0038]

【発明の効果】本発明の剥離部材を介して加圧すること
により平滑化する樹脂被膜の平滑化方法は、剥離部材と
して平均粒径 0.1〜5 μm の非溶融性シリコーン樹脂粒
子を 1〜30重量%含有する厚さ25〜100 μm の樹脂フイ
ルムを使用するので、樹脂被膜の表面に傷がつきにく
く、また平滑面の離型フイルム起因のムラを容易に防止
できる。
The method for smoothing a resin coating, which is smoothed by pressing through the peeling member of the present invention, comprises 1 to 30 weight of non-melting silicone resin particles having an average particle diameter of 0.1 to 5 μm as the peeling member. %, A resin film having a thickness of 25 to 100 μm is used, so that the surface of the resin film is less likely to be scratched, and unevenness due to the release film having a smooth surface can be easily prevented.

【0039】また、本発明の平滑化処理装置は、上述の
樹脂フイルムを剥離部材として使用するので、樹脂被膜
の表面に傷をつけることなく安定した平滑化処理を施す
ことができる。
Further, since the smoothing apparatus of the present invention uses the above-mentioned resin film as a peeling member, it is possible to perform a stable smoothing treatment without damaging the surface of the resin coating.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の平滑化処理装置を示す図である。FIG. 1 is a diagram showing a smoothing processing apparatus of the present invention.

【図2】本発明の平滑化処理手順を示す図である。FIG. 2 is a diagram showing a smoothing processing procedure of the present invention.

【符号の説明】[Explanation of symbols]

1………加熱定盤、2a………支持基板、2b………樹
脂被膜、3………剥離部材供給装置、4………剥離部
材、5………ガイドローラ、6………平滑化ローラ、7
………剥離ローラ、8a………フイルム送りローラ、9
………剥離部材巻取装置。
1 ... Heating platen, 2a ... Support substrate, 2b ... Resin coating, 3 ... Stripping member supply device, 4 ... Stripping member, 5 ... Guide roller, 6 ... Smooth Roller, 7
……… Peeling roller, 8a ……… Film feed roller, 9
……… Peeling member winding device.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 支持基板上に形成された樹脂被膜表面を
剥離部材を介して加圧することにより平滑化する樹脂被
膜の平滑化方法において、 前記剥離部材が、平均粒径 0.1〜5 μm の非溶融性シリ
コーン樹脂粒子を 1〜30重量%含有する、厚さ25〜100
μm の樹脂フイルムであることを特徴とする樹脂被膜の
平滑化方法。
1. A method for smoothing a resin coating formed by pressing the surface of a resin coating formed on a supporting substrate through a peeling member, wherein the peeling member has a mean particle size of 0.1 to 5 μm. Containing 1 to 30% by weight of meltable silicone resin particles, thickness 25 to 100
A method for smoothing a resin coating, which is a resin film having a thickness of μm.
【請求項2】 支持基板を搬送する搬送手段と、剥離部
材を送り出す剥離部材供給部と、前記剥離部材および樹
脂被膜を加熱・加圧する平滑化ローラと、前記剥離部材
を剥離する剥離ローラと、前記剥離部材を巻き取る巻き
取り部とを具備する樹脂被膜の平滑化処理装置におい
て、 前記剥離部材が、平均粒径 0.1〜5 μm の非溶融性シリ
コーン樹脂粒子を 1〜30重量%含有する、厚さ25〜100
μm の樹脂フイルムであることを特徴とする樹脂被膜の
平滑化処理装置。
2. A conveying means for conveying a supporting substrate, a peeling member supply section for feeding a peeling member, a smoothing roller for heating / pressurizing the peeling member and the resin coating, and a peeling roller for peeling the peeling member. In a smoothing device for a resin film, comprising: a winding unit that winds the peeling member, the peeling member contains 1 to 30% by weight of non-melting silicone resin particles having an average particle diameter of 0.1 to 5 μm, Thickness 25-100
An apparatus for smoothing a resin coating, which is a resin film of μm.
JP21285493A 1993-08-27 1993-08-27 Method and device for smoothing of resin coating film Withdrawn JPH0763914A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21285493A JPH0763914A (en) 1993-08-27 1993-08-27 Method and device for smoothing of resin coating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21285493A JPH0763914A (en) 1993-08-27 1993-08-27 Method and device for smoothing of resin coating film

Publications (1)

Publication Number Publication Date
JPH0763914A true JPH0763914A (en) 1995-03-10

Family

ID=16629418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21285493A Withdrawn JPH0763914A (en) 1993-08-27 1993-08-27 Method and device for smoothing of resin coating film

Country Status (1)

Country Link
JP (1) JPH0763914A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018144219A1 (en) * 2017-02-02 2018-08-09 General Electric Company Layerwise material application method and apparatus for additive manufacturing
WO2018129064A3 (en) * 2017-01-03 2018-11-15 General Electric Company Methods and systems for vacuum powder placement in additive manufacturing systems

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018129064A3 (en) * 2017-01-03 2018-11-15 General Electric Company Methods and systems for vacuum powder placement in additive manufacturing systems
US11148358B2 (en) 2017-01-03 2021-10-19 General Electric Company Methods and systems for vacuum powder placement in additive manufacturing systems
US12023859B2 (en) 2017-01-03 2024-07-02 General Electric Company Methods and systems for vacuum powder placement in additive manufacturing systems
WO2018144219A1 (en) * 2017-02-02 2018-08-09 General Electric Company Layerwise material application method and apparatus for additive manufacturing

Similar Documents

Publication Publication Date Title
TWI699424B (en) Release film of OCA optical glue and manufacturing method thereof
JPH05131537A (en) Laminated polyester film
US5832827A (en) Method for printing upon lenerless thermal transfer labels having a silicone release agent
JP2015198176A (en) Manufacturing method of flexible electronic device
WO1996040526A9 (en) Method for printing upon linerless thermal transfer labels having a silicone release agent
WO1992015905A1 (en) Method for manufacturing electronic device and apparatus therefor
JPH0763914A (en) Method and device for smoothing of resin coating film
JP3712923B2 (en) Method for manufacturing powder layer laminate and apparatus for manufacturing the same
JPH05293428A (en) Method for smoothing resin film
JPH0245997B2 (en)
JP2003300285A (en) Transfer type laminating member and its manufacturing method
TWI276537B (en) Supporting sheet for micro-capsules and method for manufacturing the same
JPH0691223A (en) Method for smoothing resin film
JPH0686957A (en) Smoothing method for resin film
JP5018075B2 (en) Printing method
JP3814763B2 (en) Manufacturing method of coating film
JP4257840B2 (en) Release paper manufacturing method and coating apparatus
JP2571484B2 (en) Abrasive sheet and its manufacturing method
JP2004145157A (en) Manufacturing method of non-glare processed object
US5449546A (en) Image retransfer sheet
JP3103682B2 (en) Method for manufacturing transparent conductive substrate
JP3953887B2 (en) Manufacturing method of plastic film products
JPS61177292A (en) Transfer film and production thereof
JP2005212302A (en) Protective layer transfer film
JP2015208943A (en) Release polyester film

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20001031