JPH0760637A - Polishing device - Google Patents
Polishing deviceInfo
- Publication number
- JPH0760637A JPH0760637A JP21662093A JP21662093A JPH0760637A JP H0760637 A JPH0760637 A JP H0760637A JP 21662093 A JP21662093 A JP 21662093A JP 21662093 A JP21662093 A JP 21662093A JP H0760637 A JPH0760637 A JP H0760637A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- mount plate
- mount
- polished
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は研磨装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus.
【0002】[0002]
【従来の技術】従来の研磨装置としては、図5に示すよ
うなものが知られている。図5において、1は定盤であ
り、2はマウントプレート、3はマウントプレート2の
上部に装着されたマウントヘッドである。定盤1は、平
面的にみて円形の回転盤形状をしており、その上面に研
磨布4が装着されている。2. Description of the Related Art As a conventional polishing apparatus, one shown in FIG. 5 is known. In FIG. 5, 1 is a surface plate, 2 is a mount plate, and 3 is a mount head mounted on the mount plate 2. The surface plate 1 has a circular rotary disk shape when viewed in plan, and a polishing cloth 4 is attached to the upper surface thereof.
【0003】マウントプレート2は、セラミックスやガ
ラス材料からなる円板である。このマウントプレート2
の下面には図5に示すように、1枚以上複数枚の被研磨
体5が固定されている。このように被研磨体5が固定さ
れている面を定盤1上の研磨布4に加圧軸6で押圧し、
研磨布4と被研磨体5の相対運動により研磨加工が行わ
れる。The mount plate 2 is a disk made of ceramics or glass material. This mount plate 2
As shown in FIG. 5, one or more plural objects to be polished 5 are fixed to the lower surface of the. In this way, the surface to which the object to be polished 5 is fixed is pressed against the polishing cloth 4 on the surface plate 1 by the pressing shaft 6,
Polishing is performed by the relative movement of the polishing cloth 4 and the object 5 to be polished.
【0004】マウントプレート2に均一な圧力を加える
ために、従来の研磨装置ではマウントヘッド3により、
内部に流体を充填した、ら旋状の弾性チューブを介し
て、マウントプレート2を定盤1に押圧することにより
研磨加工を行う方法(特開昭63−144953号公
報)や、平板状の被研磨体5を下面側に固定したマウン
トプレート2と、マウントプレート2周囲を囲むヘッド
部間とを空隙部を介して離間することにより、研磨加工
を行う方法(特開平2−98927号公報)が採られて
いた。In order to apply a uniform pressure to the mount plate 2, in the conventional polishing apparatus, the mount head 3
A method of performing polishing by pressing the mount plate 2 against the surface plate 1 via a helical elastic tube filled with a fluid (Japanese Patent Laid-Open No. 63-144953) or a flat plate-shaped cover. A method of performing polishing by separating the mount plate 2 having the polishing body 5 fixed to the lower surface side and the head portions surrounding the mount plate 2 via a gap (Japanese Patent Laid-Open No. 2-98927). It was taken.
【0005】[0005]
【発明が解決しようとする課題】上述した従来の技術に
は次のような数多くの欠点が存在する。即ち、前述のよ
うに従来の研磨装置では、研磨時の押圧手段として、加
圧軸6などで所定の圧力を与え、その圧力をマウントプ
レート2に伝達し、研磨加工を行っていたため、マウン
トプレート2に発生する熱分布による熱応力変形、押圧
手段の不均一性によるマウントプレート2の変形、定盤
1の変形、マウントプレート2自体の平坦度精度などに
より、被研磨体5に均一な圧力を付与することができ
ず、高い平坦度が要求される研磨加工には対応ができな
いという問題点があった。The above-mentioned conventional technique has many drawbacks as follows. That is, as described above, in the conventional polishing apparatus, as the pressing means during polishing, a predetermined pressure is applied by the pressure shaft 6 or the like, and the pressure is transmitted to the mount plate 2 to perform the polishing process. A uniform pressure is applied to the object to be polished 5 due to thermal stress deformation due to heat distribution generated in 2, deformation of the mount plate 2 due to nonuniformity of the pressing means, deformation of the surface plate 1, flatness accuracy of the mount plate 2 itself, and the like. However, there is a problem in that it cannot be applied, and cannot be applied to polishing processing that requires high flatness.
【0006】本発明は、これらの上記問題点を解決する
ものであり、その目的とするところは、被研磨体の高平
坦度研磨加工の実現を可能にする研磨装置の提供にあ
る。The present invention solves the above problems, and an object of the present invention is to provide a polishing apparatus capable of realizing a high flatness polishing process for an object to be polished.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に、本発明の研磨装置は、マウントヘッドの下部に、加
圧力を独立に調整できる複数のアクチュエータを設置
し、この加圧力調整用アクチュエータを介してマウント
プレートを押圧するように構成したことを特徴とする。In order to achieve the above object, the polishing apparatus of the present invention is provided with a plurality of actuators capable of independently adjusting the pressing force at the lower part of the mount head, and the actuators for adjusting the pressing force are installed. It is characterized in that the mount plate is pressed via the.
【0008】[0008]
【作用】図1〜図4に示すように、加圧力を独立に調整
できる複数のアクチュエータ7は、1バッチ前のマウン
トプレート2下面に固定された、1枚以上複数枚の被研
磨体5の研磨後の表面の凹凸情報をもとに、次バッチで
は、研磨後の表面の凹凸を打ち消すようにそれぞれ独立
して調整され、マウントプレート2を押圧する。すなわ
ち、被研磨体5が凸になっている部分のマウントプレー
ト2の押圧面には高い圧力を付加し、凹になっている部
分には低い圧力を付加し、凸部を優先的に研磨し、凹部
との高低差を減少させることにより、高平坦度を実現す
る。As shown in FIGS. 1 to 4, a plurality of actuators 7 capable of independently adjusting the pressing force are provided for one or more plural objects to be polished 5 fixed to the lower surface of the mount plate 2 one batch before. In the next batch, the mount plate 2 is pressed based on the information on the unevenness of the surface after polishing, so that the unevenness of the surface after polishing is independently adjusted. That is, high pressure is applied to the pressing surface of the mount plate 2 in the convex portion of the object 5 to be polished, and low pressure is applied to the concave portion to preferentially polish the convex portion. High flatness is realized by reducing the height difference from the concave portion.
【0009】[0009]
【実施例】実施例を図面に基づいて説明する。図1は、
本発明の一実施例を示す図であり、符号1,2,3,6
はそれぞれ従来の研磨装置に用いられているものと同様
な、定盤、マウントプレート、マウントヘッド、加圧軸
である。マウントプレート2は従来と同様、下面に被研
磨体5が固定された状態で定盤1上に載置されている。
このマウントプレート2の上部に、複数のアクチュエー
ター(例えば、マウントプレート2の半径方向・円周方
向に17個のアクチュエータ)を整然と配置している
(図2)。Embodiments will be described with reference to the drawings. Figure 1
It is a figure which shows one Example of this invention, and the code | symbol 1,2,3,6
Are a surface plate, a mount plate, a mount head, and a pressure shaft, which are similar to those used in the conventional polishing apparatus. As in the conventional case, the mount plate 2 is placed on the surface plate 1 with the object 5 to be polished fixed to the lower surface.
A plurality of actuators (for example, 17 actuators in the radial direction and the circumferential direction of the mount plate 2) are arranged in order on the mount plate 2 (FIG. 2).
【0010】図1に示す例は、加圧アクチュエーター7
部に圧電素子8を使用したものを記載しているが、その
代わりに図3のように油圧ユニット9を用いることもで
き、また図4のようにボールねじ10を用いることもで
きる。要は加圧力をそれぞれ独立して任意に調整できる
機構であればいかなるものも採用可能である。The example shown in FIG. 1 is a pressure actuator 7.
Although the piezoelectric element 8 is used for the part, the hydraulic unit 9 may be used instead as shown in FIG. 3 or the ball screw 10 may be used as shown in FIG. In short, any mechanism can be adopted as long as it can independently adjust the pressing force independently.
【0011】[0011]
【発明の効果】本発明は、以上説明したように、マウン
トプレートを独立調整可能な複数に設置した加圧アクチ
ュエーターで加圧する手段をもった装置で、マウントプ
レートからの押圧力をアクティブに調整できる装置であ
るので、外乱に影響されず、高い平坦度を得ることので
きる研磨加工を実現できる。As described above, the present invention is an apparatus having means for pressurizing the mount plate by a plurality of independently adjustable pressure actuators, and the pressing force from the mount plate can be actively adjusted. Since it is a device, it is possible to realize polishing processing that is not affected by disturbance and can obtain high flatness.
【図1】研磨装置の実施例を示す全体正面図。FIG. 1 is an overall front view showing an embodiment of a polishing device.
【図2】研磨装置のアクチュエーターの配置例を示す斜
視図。FIG. 2 is a perspective view showing an arrangement example of actuators of the polishing apparatus.
【図3】研磨装置の他の実施例を示す要部正面図。FIG. 3 is a front view of a main part showing another embodiment of the polishing apparatus.
【図4】研磨装置のさらに他の実施例を示す要部正面
図。FIG. 4 is a front view of a main part showing still another embodiment of the polishing apparatus.
【図5】従来の研磨装置の例を示す全体正面図。FIG. 5 is an overall front view showing an example of a conventional polishing apparatus.
【符号の説明】 1 定盤 2 マウントプレート 3 マウントヘッド 4 研磨布 5 被研磨体 6 加圧軸 7 加圧アクチュエータ 8 圧電素子 9 油圧ユニット 10 ボールネジ[Explanation of reference symbols] 1 surface plate 2 mount plate 3 mount head 4 polishing cloth 5 object to be polished 6 pressure shaft 7 pressure actuator 8 piezoelectric element 9 hydraulic unit 10 ball screw
Claims (1)
利用して被研磨体の表面研磨を行う研磨装置において、
被研磨体を保持し、被研磨体に加工圧力を伝達するマウ
ントプレートに、複数箇所で独立に加圧調整可能なアク
チュエーターを設置したことを特徴とする研磨装置。1. A polishing apparatus for polishing the surface of an object to be polished by using a relative sliding motion between the object to be polished and a polishing cloth,
A polishing apparatus comprising: a mount plate that holds an object to be polished and that transmits a processing pressure to the object to be polished;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21662093A JPH0760637A (en) | 1993-08-31 | 1993-08-31 | Polishing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21662093A JPH0760637A (en) | 1993-08-31 | 1993-08-31 | Polishing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0760637A true JPH0760637A (en) | 1995-03-07 |
Family
ID=16691292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21662093A Pending JPH0760637A (en) | 1993-08-31 | 1993-08-31 | Polishing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0760637A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6350186B1 (en) | 1998-11-18 | 2002-02-26 | Nec Corporation | Apparatus and method for chemical mechanical polishing |
US6428385B1 (en) | 1999-11-05 | 2002-08-06 | Fujitsu Limited | Grinding machine for grinding bar member for magnetic head and method of grinding the same |
JP2008264917A (en) * | 2007-04-19 | 2008-11-06 | Fujikoshi Mach Corp | Workpiece single face polishing device and single side polishing method |
US7935216B2 (en) | 2001-07-25 | 2011-05-03 | Round Rock Research, Llc | Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
KR200471472Y1 (en) * | 2013-09-30 | 2014-03-12 | 전용준 | CMP installed detachable UPA on the upper |
-
1993
- 1993-08-31 JP JP21662093A patent/JPH0760637A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6350186B1 (en) | 1998-11-18 | 2002-02-26 | Nec Corporation | Apparatus and method for chemical mechanical polishing |
US6428385B1 (en) | 1999-11-05 | 2002-08-06 | Fujitsu Limited | Grinding machine for grinding bar member for magnetic head and method of grinding the same |
US7935216B2 (en) | 2001-07-25 | 2011-05-03 | Round Rock Research, Llc | Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
US7947190B2 (en) * | 2001-07-25 | 2011-05-24 | Round Rock Research, Llc | Methods for polishing semiconductor device structures by differentially applying pressure to substrates that carry the semiconductor device structures |
US8268115B2 (en) | 2001-07-25 | 2012-09-18 | Round Rock Research, Llc | Differential pressure application apparatus for use in polishing layers of semiconductor device structures and methods |
JP2008264917A (en) * | 2007-04-19 | 2008-11-06 | Fujikoshi Mach Corp | Workpiece single face polishing device and single side polishing method |
KR200471472Y1 (en) * | 2013-09-30 | 2014-03-12 | 전용준 | CMP installed detachable UPA on the upper |
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