JPH0759761B2 - Patchwork manufacturing method for thin fabrics - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention makes it possible to sew a cap or inner garment without using an interlining material or other reinforcing cloth by giving a certain amount of tension to a thin cloth sewn by patchwork. Regarding the manufacturing method of patchwork ground.

[0002]

2. Description of the Related Art Patchwork has been widely known since ancient times as a means for splicing pieces in sequence to make a desired size of cloth, but the method is used for relatively strong cloths such as leather and felt. It was to sew the cut-off edges against each other and sew them together with a zigzag hanging sewing machine, or to sew up this part by slightly overlapping the edges. In the case of thin fabrics such as ordinary fabrics and uneven fabrics that have weak stiffness, that is, no tension, overlap the edges of the cut edges with the inside surface and sew them together, and cut the seam allowance on the back side to this part. A technique of inserting both stitches or folding the seam allowance on one side and then applying the stitches has been used.

[0003]

However, for thin fabrics having a weak waist, any of the above patchwork is used,
If you try to sew a hat, shirt, etc. with the fabric obtained by this, it is necessary to put an interlining in the appropriate place or to attach a lining to reinforce it, which requires a lot of trouble and labor. There was a problem that it took time.

[0004]

Means for Solving the Problems The inventors of the present invention have conducted various experiments and studies for the purpose of overcoming the problems in the conventional patchwork material described above, especially for thin fabrics having a weak waist, and as a result, sew each other. Cut thin fabrics such as scraps to be matched in advance to a certain shape, and when overlapping the edges to be sewn on each other on the inside surface, insert a cloth or a cloth made of two different materials into two Suture with
It uses a means of overlocking (overlocking) each fabric edge on the back side.

Further, a means for freely selecting the width of the inner cloth according to the purpose is used.

[0006]

The present invention has the special effect that it is possible to impart a tension in the direction of the inner cloth to the thin cloth having a comparatively weak stiffness by virtue of the above construction.

When sewing a hat or the like using pachiwork, the strength and weakness of the waist can be freely changed by selecting the width and material of the inner cloth according to the purpose, and the design, texture, etc. There is also the effect that changes can be made.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of the present invention will be described in more detail below with reference to the first and second embodiments shown in the drawings. FIGS. 1 and 2 show the patchwork fabric obtained by the basic method of the present invention. Reference numeral 1 is a large number of thin cloth pieces that have been cut into rectangular pieces of the same size in advance, and 2 is a stitch of the cloth pieces between two cloth pieces 1 and 1 whose edges to be sewn are superposed on each other. It is a middle cloth that is folded in two and sandwiched in a slightly wider width than the generation
The cloth pieces 1 and 1 are sewn together with the seam allowances 1a and 1a, and 3 is an overlock which is applied to each cloth end portion on the back surface of the patchwork material which is sewn to each other.

In the patchwork fabric of this method, the inner cloth 2 interposed between the cloth pieces can be formed into a bead shape. Therefore, a wire or a nylon wire or the like is put in this portion in advance to restore the patchwork cloth. It is characterized by the fact that it has a strong texture.

Further, FIG. 2 shows a patchwork material which is sequentially joined to a certain area by the above-mentioned patchwork, and the sandwiching direction of the inner cloth 2 can be appropriately selected according to the desired or desired sewing material. In the figure, the middle cloth 2 is sewn only in the vertical direction, and the middle cloth 2 is not used in the left and right direction, but the seam allowance of the cloth piece 1 stacked on the inside surface is directly sewn,
The one that overlocks and stops on the other side.

Of course, depending on the purpose of use of the patchwork material 3, it is possible to freely interpose the inner cloth 2 in either the vertical direction or the lateral direction.

FIG. 3 shows another embodiment of the present invention, which is an example of a pachiwork material in which the width of the inner cloth 2 is widened. For example, a thin cloth piece 1.1 ... The material is cut into strips, and the inner cloth 2, 2, ... Is made of a material having a narrower width (for example, 30 mm) than the above-mentioned cloth piece and relatively strong, and these are alternately sewn to be finished in a lattice.

The overlocking of the seam margins on the back surface is the same as in the above-described embodiment, and the cloth pieces 1.1 in this case are not limited to rectangles, but squares, diamonds, triangles, etc. But good.

In the patchwork material having this structure, the strength of the tension can be adjusted in a wider range by adjusting the width of the inner cloth 2 so that the texture and the design can be freely changed. is there.

[0015]

As described above in detail, in the method for producing a thin material cloth by the patchwork of the present invention, it is possible to provide tension to a target product which is difficult to sew on the patchwork fabric by the conventionally known method. As a result, for example, in a shirt or a hat, the interlining and the reinforcing cloth are not usually required, and the sewing process can be greatly simplified.

[0016] In addition, since the back surface looks unsatisfactory with conventional patchwork stitching, such as a hat, it has been concealed by using a lining or tape, but the seams are overlocked so that the lining There is also an advantage that the use of etc. can be omitted.

In addition, the patchwork fabric according to the present invention is
It is not limited to the above thin fabrics, but it has many useful effects such as changing the shade and width of the inner fabric and providing different fabrics with different textures and various designs by changing the combination. It is something.

[Brief description of drawings]

FIG. 1 is a front view showing a part of a patchwork fabric according to the method of the present invention.

FIG. 2 is a partial plan view showing a partial back surface of the patchwork ground.

FIG. 3 is a partial plan view of a patchwork fabric according to another embodiment of the present invention.

[Explanation of symbols]

 1 Cloth 2 Middle cloth 3 Overlock

Claims (1)

[Claims] 1. Thin cloths such as cut pieces to be sewn to each other are cut into a regular shape in advance, and when the edges to be sewn to each other are overlapped on the inner surface, two cloths of different materials or different cloths are used. A method of manufacturing thin fabrics by patchwork, which is characterized by sandwiching a folded inner cloth between them and stitching, and overlocking each cloth edge on the back surface.