JPH075612A - Silver halide photographic sensitive material and its processing method - Google Patents

Abstract

PURPOSE:To provide a silver halide photographic sensitive material capable of forming an image high in sensitivity and contrast even in the case of using a developer of low pH containing no amino compound and small in occurrence of black spots. CONSTITUTION:In the silver halide photographic sensitive material, at least one silver halide emulsion laver and/or another hydrophilic colloidal layer on a support contain a hydrazine derivative, a nucleation promoter and further at least one kind of acid polymer.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silver halide photographic light-sensitive material and a processing method thereof, and more particularly to a silver halide photographic light-sensitive material having improved surface properties and a processing method thereof.

[0002]

2. Description of the Related Art A silver halide photographic light-sensitive material has various troubles due to friction between an emulsion surface and a backing surface and friction between parts in an exposure machine and an automatic processor (scratches, pressure fog, conveyance failure, etc.). May cause. In particular, a hydrazine derivative-containing photosensitive material capable of obtaining an image with high contrast is very sensitive to pressure because of its high developability. For this reason, much research has been conducted on the improvement of the physical properties of the surface.

For example, a method of adding a matting agent to the surface:
Silica described in Swiss Patent 330,158, French Patents 1,2
Glass powder described in 96,995, alkali metal or cadmium described in British Patent 1,173,181, inorganic substance particles such as carbonates such as zinc, starch described in U.S. Pat.No. 2,322,037, Belgian patent 625,451 or British patent 981,198 Known starch derivatives, polyvinyl alcohol described in JP-B-44-3643, polystyrene or polymethylmethacrylate described in Swiss Patent 330,158, organic particles such as polycarbonate described in U.S. Pat.No. 3,022,169 are known. There is.

When such matting agent particles are supported on the hydrophilic colloid layer, it is difficult to obtain sufficient matting property and slipperiness because the matting agent easily sinks into the hydrophilic colloid layer during coating and drying. If a large amount of matting agent is used to enhance matting properties, haze will deteriorate, and pinholes and coating failures will occur.

As a method of incorporating a slipping agent into a silver halide photographic light-sensitive material: an emulsion layer or a protective layer as described in US Pat. No. 3,042,522, containing dimethyl silicone and a specific surfactant at the same time, A mixture of dimethyl silicone and diphenyl silicone on the backing surface as described in 3,080,317, also a British patent
No. 1,466,304, a method of coating a fatty acid ester of a polyhydric alcohol, a method of containing a methylphenyl silicone having a triphenyl end block in a protective layer, a method described in No. 1,143,118, and the like.

However, even though these known methods have some effect on the slipperiness, it was not possible to obtain a sufficient effect on the pressure.

[0007]

In order to solve the above problems, an object of the present invention is to provide a silver halide photographic light-sensitive material having less deterioration of matte pins and haze, high contrast and excellent pressure resistance, and a processing method thereof. To provide.

[0008]

The above object of the present invention is to provide a protective layer on the emulsion surface side of a binder comprising gelatin or gelatin and a polymer latex, and the total amount of the binder is
A silver halide photographic light-sensitive material characterized by having a content of 1.2 g / m ² or more, and a development processing method of a silver halide photographic light-sensitive material characterized by processing the light-sensitive material with a developer having a pH of less than 11.2. To be achieved.

In the above silver halide photographic light-sensitive material, the average thickness of the cross section of the protective layer on the emulsion surface side is 0.9 μm or more, at least one layer on the emulsion surface side contains a hydrazine derivative, and the emulsion surface side. It is a preferred embodiment of the present invention to contain a fluorine-based surfactant in at least one layer of the above.

The present invention will be specifically described below.

The protective layer on the emulsion side of the silver halide photographic light-sensitive material of the present invention may be a known binder composed of gelatin or gelatin and polymer latex. The total amount of binder refers to the sum of the weight of gelatin and polymer latex per square meter.

The average thickness of the cross section of the protective layer in the present invention is 23% at 50% after dry cutting of the raw film before development processing.
Observed using SEM (scanning electron microscope) in RH environment, 10 points of the thickness of the protective layer were measured when the uppermost layer where the emulsion grains exist was the boundary between the emulsion layer and the protective layer, and the average value was obtained. Was used.

First, the hydrazine derivative used in the present invention is preferably a compound represented by the following general formula [H].

[0014]

[Chemical 1]

[0015]

[Chemical 2]

In the formula, A represents an aryl group or a heterocyclic group containing at least one sulfur atom or oxygen atom, and n represents an integer of 1 or 2. When n = 1, R ₁ and R ₂ are each a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, a hydroxy group, an alkoxy group, an alkenyloxy group, an alkynyloxy group, an aryloxy group, Alternatively, it represents a heterocyclic oxy group, and R ₁ and R ₂ may form a ring together with a nitrogen atom. When n = 2, R ₁
And R ₂ are each a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a saturated or unsaturated heterocyclic group, a hydroxy group, an alkoxy group, an alkenyloxy group, an alkynyloxy group, an aryloxy group, or a heterocyclic oxy group. Represents a group. However, when n = 2, at least one of R ₁ and R ₂ is an alkenyl group, an alkynyl group, a saturated heterocyclic group, a hydroxy group, an alkoxy group, an alkenyloxy group, an alkynyloxy group, an aryloxy group, or a heterocyclic oxy group. Shall represent a group. R ₃ represents an alkynyl group or a saturated heterocyclic group. General formula [A] or [B]
The compounds represented by include those in which at least one H of -NHNH- in the formula is substituted with a substituent.

More specifically, A is an aryl group (eg, phenyl, naphthyl, etc.) or a heterocyclic group containing at least one sulfur atom or oxygen atom (eg, thiophene, furan, benzothiophene, pyran, etc.). Represents

R ₁ and R ₂ are each a hydrogen atom, an alkyl group (eg, methyl, ethyl, methoxyethyl, cyanoethyl, hydroxyethyl, benzyl, trifluoroethyl, etc.), an alkenyl group (eg, allyl, butenyl,
Pentenyl, pentadienyl, etc.), alkynyl group (eg, propargyl, butynyl, pentynyl, etc.), aryl group (eg, phenyl, naphthyl, cyanophenyl,
Methoxyphenyl, etc.), heterocyclic groups (eg, pyridine,
Unsaturated heterocyclic groups such as thiophene and furan and saturated heterocyclic groups such as tetrahydrofuran and sulfolane), hydroxy groups, alkoxy groups (eg, methoxy, ethoxy,
Benzyloxy, cyanomethoxy etc.), alkenyloxy group (eg allyloxy, butenyloxy etc.), alkynyloxy group (eg propargyloxy, butynyloxy etc.), aryloxy group (eg phenoxy, naphthyloxy etc.) or heterocyclic oxy Represents a group (eg, pyridyloxy, pyrimidyloxy, etc.), n
When = 1, R ₁ and R ₂ together with the nitrogen atom may form a ring (eg, piperidine, piperazine, morpholine, etc.).

However, when n = 2, at least one of R ₁ and R ₂ is an alkenyl group, alkynyl group, saturated heterocyclic group, hydroxy group, alkoxy group, alkenyloxy group, alkynyloxy group, aryloxy group or hetero. It represents a ring oxy group. Specific examples of the alkynyl group and the saturated heterocyclic group represented by R ₃ include those mentioned above.

Various substituents can be introduced into the aryl group represented by A or the heterocyclic group having at least one sulfur atom or oxygen atom. Examples of the substituent that can be introduced include a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an alkylthio group, an arylthio group, a sulfonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a carbamoyl group, and a sulfamoyl group, Acyl group, amino group, alkylamino group, arylamino group, acylamino group, sulfonamide group, arylaminothiocarbonylamino group,
Examples thereof include a hydroxy group, a carboxy group, a sulfo group, a nitro group and a cyano group. Of these substituents, the sulfonamide group is preferred.

In each general formula, A preferably contains at least one diffusion resistant group or silver halide adsorption promoting group. As the anti-diffusion group, a ballast group commonly used in non-moving photographic additives such as couplers is preferable. The ballast group is a group having a carbon number of 8 or more and relatively inert to photographic properties, and is selected from, for example, an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group and an alkylphenoxy group. You can

Examples of the silver halide adsorption promoting group include groups described in US Pat. No. 4,385,108 such as thiourea group, thiourethane group, heterocyclic thioamide group, mercaptoheterocyclic group and triazole group.

H of --NHNH-- in the general formulas [A] and [B], that is, the hydrogen atom of hydrazine, is a sulfonyl group (eg, methanesulfonyl, toluenesulfonyl, etc.), an acyl group (eg, acetyl, trifluoroacetyl, It may be substituted with a substituent such as ethoxycarbonyl) and an oxalyl group (eg, ethoxalyl, pyruvoyl, etc.), and the compounds represented by the general formulas [A] and [B] include such compounds.

More preferred compounds in the present invention are compounds of the general formula [A] when n = 2, and compounds of the general formula [B].
Is a compound of.

In the compound of n = 2 in the general formula [A],
R ₁ and R ₂ are a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a saturated or unsaturated heterocyclic group, a hydroxy group, or an alkoxy group, and R ₁ and R ₂
At least one of them is an alkenyl group, an alkynyl group,
Compounds representing a saturated heterocyclic group, a hydroxy group, or an alkoxy group are more preferable.

Typical compounds represented by the above general formulas [A] and [B] are shown below. However, as a matter of course, the specific compounds of the general formulas [A] and [B] that can be used in the present invention are not limited to these compounds.

Specific compound examples

[0028]

[Chemical 3]

[0029]

[Chemical 4]

[0030]

[Chemical 5]

[0031]

[Chemical 6]

Examples of the nucleation accelerator used in the present invention include amine compounds, hydrazine compounds, quaternary onium salt compounds and carbinol compounds, with amine compounds and carbinol compounds being preferred. Examples of these nucleation accelerators include those described in JP-A-4-56749, JP-A-63-124045 and JP-A-62-187340. These compounds preferably have a diffusion resistance or a silver halide adsorption group in the molecule. Other specific examples include the compounds described in the following patents. Japanese Patent Application 3-29
Compounds described in 5926, 3-293366, 3-286619, 4-33451 and the like.

More specifically, the following nucleation accelerators are listed, but the present invention is not limited thereto.

As a compound described in JP-A-4-56949

[0035]

[Chemical 7]

[0036]

[Chemical 8]

[0037]

[Chemical 9]

And the like.

As the fluorine-containing surfactant used in the present invention, the following general formulas [Fa], [Fb], [Fc],
It can be represented by [Fd] or [Fe].

[0040]

[Chemical 10]

[Wherein R ₁ , R ₂ , R ₄ , R ₅ and R ₆ are each a linear or branched alkyl group having 1 to 32 carbon atoms, such as a methyl group, an ethyl group or a butyl group. , Isobutyl group, pentyl group, hexyl group, octyl group, nonyl group,
Although it represents a decyl group, a dodecyl group, an octadecyl group or the like, it may be a cyclic alkyl group, and at least one group of R ₁ and R ₂ and at least one group of R ₄ , R ₅ and R ₆ is at least one fluorine group. It is replaced by an atom. Also R ₁ , R ₂ ,
R ₄ , R ₅ and R ₆ each represent an aryl group such as a phenyl group or a naphthyl group, and these aryl groups are at least one of R ₁ and R ₂ and R ₄ , R ₅ and R ₆
At least one of the groups is substituted with a group substituted with at least one fluorine atom.

Further, R ₃ and R ₇ represent an acid group such as a carboxylato group, a sulfonato group or a phosphoric acid group. ]

[0043]

[Chemical 11]

[In the formula, R ₈ is an alkyl group having 1 to 32 carbon atoms and represents, for example, a methyl group, an ethyl group, a propyl group, a hexyl group, a nonyl group, a dodecyl group or a hexadecyl group. Is substituted with at least one fluorine atom. n represents an integer of 1 to 3, and n ₁ represents an integer of 0 to 4. ]

[0045]

[Chemical 12]

[In the formula, R ₉ is a saturated group having 1 to 32 carbon atoms,
Represents an unsaturated linear or branched alkyl group, for example, a saturated alkyl group represents a methyl group, an ethyl group, a butyl group, an isobutyl group, a hexyl group, a dodecyl group, octadecyl, etc. For example, it represents an allyl group, a budenyl group, an octenyl group and the like. And these saturated and unsaturated alkyl groups are substituted with at least one fluorine atom. n ₂ and n ₃ is an integer of 1-3. The n ₄ represents an integer of 0 to 6. ]

[0047]

[Chemical 13]

[In the formula, Y is a sulfur atom, a selenium atom, an oxygen atom, a nitrogen atom or a -N (R ₁₁ )-group (wherein R ₁₁ is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, for example, methyl). R10 represents a group or an ethyl group, and R ₁₀ represents a group having the same meaning as the group represented by R ₈ in the above general formula [Fc] or an aryl group substituted with at least one fluorine atom (eg, phenyl group, naphthyl group). Group). Z represents an atomic group necessary for forming a 5-membered or 6-membered heterocycle,
Examples of these include thiazole ring, selenazole ring,
Examples thereof include an oxazole ring, an imidazole ring, a pyrazole ring, a triazole ring, a tetrazole ring, a pyrimidine ring and a triazine ring.

The above heterocyclic ring may further have a substituent such as an alkyl group and an aryl group, and these substituents may be substituted with a fluorine atom.

Specific examples of the fluorine-containing surfactant represented by the above general formulas [Fa] to [Fe] are shown below, but the compounds usable in the present invention are not limited to these. .

When R ₁₀ used in the present invention does not contain a fluorine atom, n ₅ represents an integer of 0 to 2 and n ₆ represents an integer of 0 to 2. The amount of the fluorine atom-containing surfactant added to the outermost layer is preferably 1 to 200 mg / m ² , and more preferably 3 to 100 mg / m ² .

(Exemplified compounds)

[0053]

[Chemical 14]

[0054]

[Chemical 15]

[0055]

[Chemical 16]

The fluorine-containing surfactant used in the present invention is 0.02 to 800 mg / m ² , preferably 0.05 to 300 mg.
/ m ² is included.

The fluorine-containing surfactant of the present invention is preferably added to both the emulsion side and the backing side. The addition position is preferably the uppermost layer on each surface.

In the present invention, various known techniques for photography,
For example, emulsion preparation, additives, development processing techniques and the like can be used without any particular limitation.

[0059]

EXAMPLES Specific examples of the present invention will be described below, but the embodiments of the present invention are not limited to these.

Example 1 (Preparation of Silver Halide Photographic Emulsion A) A silver chlorobromide emulsion (65 mol% of silver chloride per 1 mol of silver) was prepared by the simultaneous mixing method. The mixture during the K ₂ IrCl ₆ was per mole silver 8 × 10 ^-7 mol, and Na ₂ RhCl ₆ 1 × 10 ^-7 mol was added. The resulting emulsion had cubic monodispersity grains (coefficient of variation 1
0%). Then, it was washed with water and desalted by a conventional method. Thereafter, a mixture of the compounds [A], [B] and [C] was added, and then gold and sulfur sensitization was performed to obtain an emulsion A.

[0061]

[Chemical 17]

(Preparation of silver halide photographic light-sensitive material) One of 100 μm-thick polyethylene terephthalate films having a 0.1 μm-thick undercoat layer on both sides (see Example 1 of JP-A-59-19941) On the undercoat layer, a silver halide emulsion layer having the following formulation (1) was used, in which the amount of gelatin was 1.5 g / m ² and the amount of silver was 3.2 g / m ²
And an emulsion protective layer having the following formulation (2) so that the amount of binder is as shown in Table 1,
On the other undercoat layer on the opposite side, a backing layer is applied according to the following prescription (3) so that the amount of gelatin is 2.4 g / m ^2, and the backing protection of the following prescription (4) is further applied on it. A sample was obtained by coating the layer so that the amount of gelatin was 1 g / m ² .

Formulation (1) (Silver Halide Emulsion Layer Composition) Gelatin Amount of 1.5 g / m ² as emulsion layer Silver halide emulsion A Silver amount 3.2 g / m ² Sensitizing dye: SD-1 1.0 mg / m ² Stabilizer: 4-Methyl-6-hydroxy-1,3,3a, 7-tetrazaindene 30mg / m ² Antifoggant: Adenine 10mg / m ² 5-Sodium sulfonate-2-mercaptobenzimidazole 5mg / m ² Surfactant: saponin 0.1 g / m ² : S-1 8.0 mg / m ² hydrazine derivative H-1 25 mg / m ² H-3 2 mg / m ² nucleation accelerator (9) 20 mg / m ² latex polymer L (Copolymer of methyl acrylate, 2-acrylamido sulfonic acid and 2-acetoacetoxyethyl methyl acrylate) 0.1 g / m ² polyethylene glycol molecular weight 4000 0.1 g / m ²

[0064]

[Chemical 18]

Formulation (2) (Emulsion protective layer composition) Gelatin Amount shown in Table 1 Latex polymer L Amount shown in Table 1

[0066]

[Chemical 19]

Formula (3) (backing layer composition)

[0068]

[Chemical 20]

Gelatin 2.4 g / m ² Surfactant: Saponin 0.1 g / m ² : S-1 6 mg / m ² Colloidal silica 100 mg / m ² Formulation (4) (Backing protective layer composition) Gelatin 1 g / m ² Matting agent : Monodispersed polymethylmethacrylate having an average particle size of 3.5 μm 40 mg / m ² Surfactant: S-2 10 mg / m ² Fluorosurfactant F-1 Amount shown in Table 1 Hardener: Glyoxal 35 mg / m ² [Evaluation of Photographic Performance] A wedge was adhered to the obtained sample, which was exposed with a He-Ne laser for 2 × 10 ⁻⁶ seconds, and a developing solution and a fixing solution having the compositions shown below were added to Konica Corporation. Processing was carried out under the following conditions with an automatic processor for rapid processing GR-26SR manufactured by the same company.

The density of the obtained sample was measured with an optical densitometer, Konica PDA-65, and the sensitivity of sample No. 1 at a density of 2.5 was 100.
The gamma was shown by the tangent of the concentrations of 0.1 and 2.5. If the gamma value is less than 8.0, the contrast becomes insufficient and it cannot be used.

(Evaluation of pressure resistance) A load of 100 g / cm ² was applied to each sample, and the emulsion surface and the backing surface were rubbed at a speed of 5 cm / sec and then processed under the following conditions. At this time, the degree of pressure fog in the friction portion was evaluated.

◯: No fog is generated Δ: Fog is 1 to 1
Occurred at a probability of 50% ×: Fog occurred at a probability of 50% or more [Developer composition 1] Potassium sulfite 50.0g Hydroquinone 20.0g 4-Methyl-4-hydroxymethyl-1-phenyl-3-pyrazolidone 1.0g Ethylenediamine tetra Acetic acid disodium salt 2.0 g Potassium carbonate 12.0 g Potassium bromide 5.0 g 5-Methylbenzotriazole 0.3 g Diethylene glycol 25.0 g Compound (d) 0.1 g Water was added to make 1 liter, and pH was adjusted to 10.4 with potassium hydroxide.

Fixer formulation Ammonium thiosulfate (72.5% W / V aqueous solution) 200 ml Sodium sulfite 17 g Sodium acetate trihydrate 6.5 g Boric acid 6.0 g Sodium citrate dihydrate 2.0 g Pure water (ion exchange water) 17 ml Sulfuric acid ( Aqueous solution of 50% W / V) 2.0 g Aluminum sulphate (Aqueous solution containing 8.1% W / V in terms of Al ₂ O ₃ ) 8.5 g The fixing solution was finished to 1 liter and used. Of this fixer
The pH was adjusted to 4.8 with acetic acid.

[0074]

[Chemical 21]

(Development processing conditions) The time includes the time for wading.

(Process) (Temperature) (Time) Development 38 ° C. 12 seconds Fixing 35 ° C. 10 seconds Washing 30 ° C. 10 seconds Drying 50 ° C. 13 seconds Total 45 seconds The results are shown in Table 1.

[0077]

[Table 1]

From the results shown in Table 1, it is understood that the sample of the present invention is superior in pressure resistance to the comparative sample.

Example 2 (Emulsion preparation) A silver nitrate solution and an aqueous solution of sodium chloride and potassium bromide were mixed with a rhodium hexachloride complex at 8 × 10 ^-5 mol / Ag.
The solution, which was added so that it became mol, was added at the same time to the gelatin solution while controlling the flow rate, and after desalting according to the usual method, the particle size was 0.13.
A cubic monodispersed silver chloride emulsion was obtained.

This emulsion was subjected to sulfur sensitization by a conventional method, 6-methyl-4-hydroxy-1,3,3a, 7 tetrazaindene was added as a stabilizer, and the following additives were added to the emulsion for coating. Solution, then emulsion protective layer coating solution, backing layer coating solution,
A backing protective layer coating solution was prepared with the following composition.

(Preparation of Emulsion Coating Solution) Silver Halide Emulsion 3.0 g / m ² as Silver Amount Gelatin 1.2 g / m ² as Emulsion Coating Solution 10 mg / hydrazine derivative (H-1) of the present invention m ² Hydrazine derivative (H-8) of the present invention 7.5 mg / m ² Nucleation accelerator (9) 20 mg / m ² compound (e) 7.5 mg / m ² saponin (20%) 0.5 cc / m ² 5 nitroindazole 10 mg / m ² hydroquinone 50 mg / m ² 1-phenyl-5-mercaptotetrazole 5 mg / m ² latex polymer L 0.1 g / m ² styrene-maleic acid copolymerizable polymer (thickener) 90 mg / m ² (emulsion protective layer Coating solution) Gelatin Dry Cut added to have a thickness of Table 2 Latex polymer L Dry Cut added to have a thickness of Table 2 Compound (f) 40 mg / m ² compound (g) 100 mg / m ² compound (h ) 100 mg / m ² fluorine-containing surfactant F-4 table 2 the amounts shown in the spherical monodisperse silica (particle size 8 m) 20mg / m ² 〃 (particle diameter 3μm) 10mg / m ² Surfactant S-3 (Example 1 synonymous) 5 mg / m ² citrate pH5.8 to adjust styrene - maleic acid copolymer (thickening Agent) 50 mg / m ² Hardener 2 10 mg / m ² (Backing layer coating solution) Gelatin 1.4 g / m ² Compound (i) 80 mg / m ² Compound (q) 15 mg / m ² Compound (j) 150 mg / m ² Saponin (20%) 0.6 cc / m ² latex (Lx-1) Synonymous with Example 1 300 mg / m ² 5-methylbenzotriazole 5 mg / m ² 5-nitroindazole 20 mg / m ² Styrene-maleic acid copolymer ( Thickener) 50 mg / m ² Hardener 1 10 mg / m ² (Backing protective layer coating solution) Gelatin 1.0 g / m ² Compound (i) 40 mg / m ² Compound (q) 100 mg / m ² Compound (j) 100 mg / m ² surfactant S-3 (example 1 synonymous) 5 mg / m ² fluorine-containing surfactant F-4 table 2 shows the amount spherical polymethyl methacrylate (4 [mu] m 25 mg / m ² hardener glyoxal 10 mg / m ²

[0082]

[Chemical formula 22]

[0083]

[Chemical formula 23]

Each of the coating solutions prepared as described above was applied onto a polyethylene terephthalate support having a thickness of 100 μm, which was subjected to an undercoating, in the order of a backing layer side, a backing layer and a backing protective layer in that order from the side closer to the support. And dried. Then, an emulsion layer and an emulsion protective layer were applied in this order from the side closer to the support to the side opposite to the backing surface side of the support and dried.

The obtained sample was evaluated in the same manner as in Example 1. The results are shown in Table 2.

[0086]

[Table 2]

From the results shown in Table 2, as in Example 1, Sample Nos. 4 to 10 of the present invention had higher sensitivity than Comparative Samples No. 1 to 3,
It can be seen that the gamma is high and there are few black spots.

[0088]

According to the present invention, there is provided a silver halide photographic light-sensitive material capable of obtaining a high-sensitivity and high-contrast image even when processed with a developer having a low pH containing no amino compound, and having less black spots. We were able to.

Claims (5)

[Claims] 1. A silver halide photographic light-sensitive material having a silver halide emulsion layer and a protective layer on a support, wherein the emulsion-side protective layer has gelatin or a binder composed of gelatin and a polymer latex, and the total amount of the binder is 1.2 g /
A silver halide photographic light-sensitive material characterized by having a size of at least m ² . 2. The average thickness of the cross section of the protective layer on the emulsion side is 0.
The silver halide photographic light-sensitive material according to claim 1, which has a diameter of 9 μm or more. 3. The silver halide photographic light-sensitive material according to claim 1, wherein at least one layer on the emulsion surface side contains a hydrazine derivative. 4. The silver halide photographic light-sensitive material according to claim 1, wherein at least one layer on the emulsion surface side contains a fluorine-containing surfactant. 5. A method of developing and processing a silver halide photographic light-sensitive material, which comprises processing the silver halide photographic light-sensitive material according to claim 1 with a developer having a pH of less than 11.2.