JPH0750038A - Manufacture of master optical disc - Google Patents
Manufacture of master optical discInfo
- Publication number
- JPH0750038A JPH0750038A JP19500893A JP19500893A JPH0750038A JP H0750038 A JPH0750038 A JP H0750038A JP 19500893 A JP19500893 A JP 19500893A JP 19500893 A JP19500893 A JP 19500893A JP H0750038 A JPH0750038 A JP H0750038A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- photoresist
- metal thin
- laser beam
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、高密度に情報を蓄積し
た光ディスク原盤の作製方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical disc master in which information is stored at a high density.
【0002】[0002]
【従来の技術】光ディスクの高密度化には、再生用レー
ザーの短波長化や対物レンズの高NA化が考えられてい
るが、現在では実用的には波長670nm、NA0.6
が限界であり、短波長化や高NA化に頼らない方式も幾
つか知られている。2. Description of the Related Art In order to increase the density of optical discs, it has been considered to shorten the wavelength of a reproducing laser and increase the NA of an objective lens, but at present, the wavelength is 670 nm and the NA is 0.6.
Is a limit, and there are some known methods that do not rely on shorter wavelengths or higher NA.
【0003】その一つに、特開昭54−136303号
公報で示された、隣接するトラックで信号ビットの深さ
を交互に変化させる方式がある。反射光を2つの光検出
部に分割された検出器で受光し、一方の深さの信号ビッ
ト列の再生にはそれら2つの光検出部の和信号を用い、
他方の信号ビット列の再生にはそれら2つの光検出部の
差信号を用いれば、隣りのトラックからのクロストーク
は小さく、狭ビッチ化して高密度化することができる。As one of them, there is a method, as disclosed in Japanese Patent Laid-Open No. 54-136303, which alternately changes the depth of signal bits in adjacent tracks. The reflected light is received by a detector that is divided into two photodetector units, and the sum signal of the two photodetector units is used to reproduce the signal bit string of one depth.
If the difference signal of these two photodetection sections is used for reproduction of the other signal bit string, crosstalk from adjacent tracks is small, and it is possible to narrow the pitch and increase the density.
【0004】この方式の光ディスク原盤の作製方法を図
2の(a)ないし(h)を用いて述べる。一旦、凹凸状
の溝が形成された基盤を作製する必要があり、図2
(a)に示すようにガラス基盤11にフォトレジスト1
2を塗布し、図2(b)に示すようにフォトレジスト1
2上にレーザービーム13を連続的に照射し、ついで図
2(c)に示すように現像してレーザービーム13の照
射部のフォトレジスト12を除去する。さらに図2
(d)に示すようにCHF3 ガスを用いた反応性イオン
エッチング法でガラス基盤11に溝14を形成し、その
後図2(e)に示すようにフォトレジスト12を除去す
る。次にこの凹凸状の溝14が形成されたガラス基盤1
5上に再度フォトレジスト16を図2(f)に示すよう
に塗布し、溝内および溝間に図2(g)に示すようにレ
ーザービーム17をトラッキングしながら照射して信号
を記録し、現像して記録部のフォトレジスト16を図2
(h)に示すように除去することで、溝内と溝間で深さ
の異なる信号ビット18、19が形成された光ディスク
原盤ができる。A method of manufacturing an optical disc master of this system will be described with reference to FIGS. Once it is necessary to prepare a substrate on which uneven grooves are formed,
As shown in (a), the photoresist 1 is formed on the glass substrate 11.
2 is applied and the photoresist 1 is applied as shown in FIG.
2 is continuously irradiated with a laser beam 13 and then developed as shown in FIG. 2C to remove the photoresist 12 at the irradiation portion of the laser beam 13. Furthermore, FIG.
As shown in (d), a groove 14 is formed in the glass substrate 11 by a reactive ion etching method using CHF 3 gas, and then the photoresist 12 is removed as shown in FIG. 2 (e). Next, the glass substrate 1 on which the concave and convex grooves 14 are formed
2 is coated again with a photoresist 16 as shown in FIG. 2 (f), and a laser beam 17 is radiated while tracking in and between the grooves as shown in FIG. 2 (g) to record a signal, After development, the photoresist 16 in the recording portion is shown in FIG.
By removing as shown in (h), an optical disk master having signal bits 18 and 19 having different depths in and between the grooves can be obtained.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、上記す
る従来の光ディスク原盤の作製方法には次のような問題
点があった。However, the above-mentioned conventional method for manufacturing an optical disk master has the following problems.
【0006】すなわちフォトレジストの屈折率は約1.
7、ガラスの屈折率は約1.5と余り差がないために、
ガラスとフォトレジストの境界の反射率は0.4%と非
常に小さい。溝が形成されたガラス基盤15にフォトレ
ジスト16を塗布すれば、溝からのトラッキング信号が
極めて小さく、原盤への信号記録時にトラッキング制御
が正確にできなくなる。上記従来の問題点を解決するた
め、本発明は原盤への信号記録時に正確なトラッキング
制御ができる光ディスク原盤の作製方法を提供すること
を目的とする。That is, the refractive index of the photoresist is about 1.
7. Since the refractive index of glass is about 1.5, which is not so different,
The reflectance at the boundary between the glass and the photoresist is 0.4%, which is very small. When the photoresist 16 is applied to the glass substrate 15 in which the groove is formed, the tracking signal from the groove is extremely small, and the tracking control cannot be accurately performed when the signal is recorded on the master. In order to solve the above-mentioned conventional problems, it is an object of the present invention to provide a method for manufacturing an optical disc master that enables accurate tracking control when recording a signal on the master.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
本発明の光ディスク原盤の作製方法はガラス基盤上に第
1のフォトレジスト薄膜を形成し、第1のフォトレジス
ト薄膜に第1のレーザービームを連続的に照射し、第1
のレーザービームが照射された部分の第1のフォトレジ
ストを除去して溝を形成し、その溝が形成されたガラス
基盤上に金属薄膜を形成し、残った第1のフォトレジス
ト薄膜上の金属薄膜を第1のフォトレジストとともに除
去して金属薄膜を螺旋状に残し、その上にさらに第2の
フォトレジスト薄膜を形成し、第2のレーザービームを
螺旋状の金属薄膜上および金属薄膜間にトラッキングし
ながら照射して信号を記録し、その第2のレーザービー
ムが照射された部分の第2のフォトレジスト薄膜を除去
する方法により、隣合うトラックで深さの異なる信号ビ
ットを形成した光ディスク原盤を作製するものである。In order to achieve the above object, a method of manufacturing an optical disk master according to the present invention comprises forming a first photoresist thin film on a glass substrate, and applying a first laser beam to the first photoresist thin film. Continuously irradiate the
The first photoresist in the portion irradiated with the laser beam is removed to form a groove, a metal thin film is formed on the glass substrate on which the groove is formed, and the remaining metal on the first photoresist thin film is formed. The thin film is removed together with the first photoresist to leave the metal thin film in a spiral shape, and a second photoresist thin film is further formed thereon, and a second laser beam is applied onto the spiral metal thin film and between the metal thin films. An optical disc master in which signal bits having different depths are formed in adjacent tracks by a method of irradiating while tracking to record a signal and removing the second photoresist thin film in the portion irradiated with the second laser beam. Is to be manufactured.
【0008】[0008]
【作用】上記の方法により、ガラス基盤に螺旋状の金属
薄膜を形成するので、金属とフォトレジストの境界は反
射率が高く、第2のフォトレジストを塗布しても、溝か
らのトラッキング信号は充分大きく、原盤への信号記録
時に正確なトラッキング制御ができるようになる。Since the spiral metal thin film is formed on the glass substrate by the above method, the boundary between the metal and the photoresist has a high reflectance, and even if the second photoresist is applied, the tracking signal from the groove is not generated. It is large enough to enable accurate tracking control when recording signals on the master.
【0009】[0009]
【実施例】以下本発明の一実施例の光ディスク原盤の作
製方法について図面を参照して説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing an optical disk master according to an embodiment of the present invention will be described below with reference to the drawings.
【0010】本実施例の光ディスク原盤の作製方法を示
す図1(a)ないし(h)において、ガラス基盤1の上
に第1のフォトレジスト薄膜2を形成し(図1
(a))、第1のフォトレジスト薄膜2上から第1のレ
ーザービーム3を連続的に照射し(図1(b))、現像
して溝4を形成する(図1(c))。溝4が形成された
基盤5上に金属薄膜6を形成し(図1(d))、第1の
フォトレジスト薄膜2上の金属薄膜6を第1のフォトレ
ジスト薄膜2とともに除去して金属薄膜6を螺旋状に残
し(図1(e))、その上に再度第2のフォトレジスト
薄膜7を形成し(図1(f))、第2のレーザービーム
8を螺旋状の金属薄膜6の上およびその間にトラッキン
グしながら照射して信号を記録する(図1(g))。そ
して現像することで金属薄膜6上と金属薄膜6間で深さ
の異なる信号ビット列9、10を作製できる(図1
(h))。1 (a) to 1 (h) showing a method for manufacturing an optical disk master according to this embodiment, a first photoresist thin film 2 is formed on a glass substrate 1 (see FIG. 1).
(A)), 1st laser beam 3 is continuously irradiated from the 1st photoresist thin film 2 (FIG. 1 (b)), and it develops and the groove | channel 4 is formed (FIG. 1 (c)). A metal thin film 6 is formed on the substrate 5 in which the groove 4 is formed (FIG. 1D), and the metal thin film 6 on the first photoresist thin film 2 is removed together with the first photoresist thin film 2 to remove the metal thin film. 6 is left in a spiral shape (FIG. 1 (e)), a second photoresist thin film 7 is formed thereon again (FIG. 1 (f)), and a second laser beam 8 is applied to the spiral thin metal film 6. The signal is recorded by irradiating on and between the above and tracking (FIG. 1 (g)). Then, by developing, signal bit strings 9 and 10 having different depths on the metal thin film 6 and between the metal thin films 6 can be manufactured (FIG. 1).
(H)).
【0011】図1(e)のように残った第1のフォトレ
ジスト薄膜2を溶剤で溶かして、その上の金属薄膜6も
同時に除去して螺旋状の金属薄膜6を形成する。溶剤に
第1のフォトレジスト薄膜2が溶け易くするためには、
第1のフォトレジスト薄膜2が溶剤に触れなければなら
ず、第1のフォトレジスト薄膜2の厚さが金属薄膜6よ
り厚い方が良い。また、第1のフォトレジスト薄膜2に
形成された溝4の端面に金属薄膜6が付着しない方がよ
く、指向性の高いイオンビーム・スパッタ法などの薄膜
形成法を採用する。As shown in FIG. 1E, the remaining first photoresist thin film 2 is dissolved in a solvent, and the metal thin film 6 on the first photoresist thin film 2 is simultaneously removed to form a spiral metal thin film 6. In order to make the first photoresist thin film 2 easily dissolved in the solvent,
The first photoresist thin film 2 must be in contact with the solvent, and the thickness of the first photoresist thin film 2 should be thicker than the metal thin film 6. Further, it is preferable that the metal thin film 6 does not adhere to the end surface of the groove 4 formed in the first photoresist thin film 2, and a thin film forming method such as an ion beam sputtering method having high directivity is adopted.
【0012】ガラス基盤1上に形成する金属薄膜6はガ
ラス基盤1との密着性が高い必要があり、そのような物
質として、クロムなどがある。The metal thin film 6 formed on the glass substrate 1 needs to have high adhesion to the glass substrate 1, and as such a substance, there is chromium or the like.
【0013】第1のフォトレジスト薄膜2を溶かすには
アセトンなどの有機溶剤を用いる。しかし、金属薄膜6
を形成する時に第1のフォトレジスト薄膜2が熱で変質
し、有機溶剤では溶けなくなることがある。その場合で
も、硫酸などの強酸では容易に溶かすことができる。金
属薄膜6として金などの貴金属を用いれば、強酸にも溶
けずに金属薄膜6を残すことができる。一般に、金など
の貴金属はガラスとの密着性が低いが、アルゴンなどの
イオンビームによりアシストしながらスパッタ法で形成
すれば、密着性は向上する。An organic solvent such as acetone is used to dissolve the first photoresist thin film 2. However, the metal thin film 6
When forming a film, the first photoresist thin film 2 may be deteriorated by heat and may not dissolve in an organic solvent. Even in that case, it can be easily dissolved with a strong acid such as sulfuric acid. If a noble metal such as gold is used as the metal thin film 6, the metal thin film 6 can be left without being dissolved in strong acid. Generally, a noble metal such as gold has low adhesion to glass, but if formed by a sputtering method while being assisted by an ion beam such as argon, the adhesion is improved.
【0014】[0014]
【発明の効果】以上の説明により明かなように、本発明
の光ディスク原盤の作製方法によれば、溝が形成された
ガラス基盤上にフォトレジスト薄膜を形成して溝および
溝間に信号記録する場合でも、溝からのトラッキング信
号が大きく正確なトラッキング制御ができ、高密度な光
ディスク原盤を作製することができる。As is apparent from the above description, according to the method of manufacturing an optical disc master of the present invention, a photoresist thin film is formed on a glass substrate having grooves formed therein, and signals are recorded between the grooves. Even in such a case, the tracking signal from the groove is large and accurate tracking control can be performed, so that a high-density optical disc master can be manufactured.
【図1】本発明の一実施例の光ディスク原盤の作製方法
を説明する光ディスク原盤の断面略図FIG. 1 is a schematic sectional view of an optical disc master for explaining a method for manufacturing an optical disc master according to an embodiment of the present invention.
【図2】従来例の光ディスク原盤の作製方法を説明する
光ディスク原盤の断面略図FIG. 2 is a schematic cross-sectional view of an optical disc master for explaining a method of manufacturing a conventional optical disc master.
1 ガラス基盤 2 第1のフォトレジスト薄膜 3 第1のレーザービーム 4 溝 5 溝が形成されたガラス基盤 6 金属薄膜 7 第2のフォトレジスト薄膜 8 第2のレーザービーム 9、10 信号ビット 1 Glass Substrate 2 First Photoresist Thin Film 3 First Laser Beam 4 Groove 5 Groove Formed Glass Substrate 6 Metal Thin Film 7 Second Photoresist Thin Film 8 Second Laser Beam 9, 10 Signal Bit
───────────────────────────────────────────────────── フロントページの続き (72)発明者 貴志 俊法 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 宮本 寿樹 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 阿部 伸也 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kishi Shunho 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Toshiki Miyamoto, 1006 Kadoma, Kadoma City Osaka Prefecture (72) Inventor Shinya Abe, 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.
Claims (3)
を形成する工程と、前記第1のフォトレジスト薄膜に第
1のレーザービームを連続的に照射する工程と、前記第
1のレーザービームが照射された部分の第1のフォトレ
ジスト薄膜を除去して溝を形成する工程と、その溝が形
成されたガラス基盤上に金属薄膜を形成する工程と、残
った第1のフォトレジスト薄膜上の金属薄膜を第1のフ
ォトレジスト薄膜とともに除去して前記金属薄膜を螺旋
状に残す工程と、その上にさらに第2のフォトレジスト
薄膜を形成する工程と、第2のレーザービームを螺旋状
の金属薄膜上および螺線状の金属薄膜間にトラッキング
しながら照射して信号を記録する工程と、その第2のレ
ーザービームが照射された部分の第2のフォトレジスト
薄膜を除去して信号ビットを形成する工程を主体とす
る、隣合うトラックで深さの異なる信号ビット列を形成
する光ディスク原盤の作製方法。1. A step of forming a first photoresist thin film on a glass substrate, a step of continuously irradiating the first photoresist thin film with a first laser beam, and a step of applying the first laser beam A step of removing the first photoresist thin film in the irradiated portion to form a groove, a step of forming a metal thin film on the glass substrate in which the groove is formed, and a step of forming a groove on the remaining first photoresist thin film. A step of removing the metal thin film together with the first photoresist thin film to leave the metal thin film in a spiral shape; a step of further forming a second photoresist thin film on the metal thin film; and a step of applying a second laser beam to the spiral metal. A process of irradiating while tracking the thin film and between the spiral metal thin films to record a signal, and removing the second photoresist thin film in the portion irradiated with the second laser beam, the signal is recorded. The method for manufacturing a master optical disc mainly the step of forming a bit, to form a different signal bit sequences in depth in adjacent tracks.
膜の厚さより厚い請求項1記載の光ディスク原盤の作製
方法。2. The method for producing an optical disk master according to claim 1, wherein the thickness of the first photoresist thin film is thicker than the thickness of the metal thin film.
ッタ法により貴金属薄膜を形成する請求項1記載の光デ
ィスク原盤の作製方法。3. The method for producing an optical disk master according to claim 1, wherein the precious metal thin film is formed by a sputtering method while being assisted by an ion beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19500893A JPH0750038A (en) | 1993-08-06 | 1993-08-06 | Manufacture of master optical disc |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19500893A JPH0750038A (en) | 1993-08-06 | 1993-08-06 | Manufacture of master optical disc |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0750038A true JPH0750038A (en) | 1995-02-21 |
Family
ID=16334004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19500893A Pending JPH0750038A (en) | 1993-08-06 | 1993-08-06 | Manufacture of master optical disc |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0750038A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6071586A (en) * | 1997-09-12 | 2000-06-06 | Samsung Electronics Co., Ltd. | Manufacturing method of a master disk for forming an optical disk, and the master disk |
-
1993
- 1993-08-06 JP JP19500893A patent/JPH0750038A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6071586A (en) * | 1997-09-12 | 2000-06-06 | Samsung Electronics Co., Ltd. | Manufacturing method of a master disk for forming an optical disk, and the master disk |
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