JPH0741083Y2 - Electron gun for cathode ray tube - Google Patents

Electron gun for cathode ray tube

Info

Publication number
JPH0741083Y2
JPH0741083Y2 JP1989133023U JP13302389U JPH0741083Y2 JP H0741083 Y2 JPH0741083 Y2 JP H0741083Y2 JP 1989133023 U JP1989133023 U JP 1989133023U JP 13302389 U JP13302389 U JP 13302389U JP H0741083 Y2 JPH0741083 Y2 JP H0741083Y2
Authority
JP
Japan
Prior art keywords
beam passage
passage hole
electron gun
ray tube
cathode ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1989133023U
Other languages
Japanese (ja)
Other versions
JPH0326040U (en
Inventor
完在 孫
Original Assignee
三星電管株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三星電管株式会社 filed Critical 三星電管株式会社
Publication of JPH0326040U publication Critical patent/JPH0326040U/ja
Application granted granted Critical
Publication of JPH0741083Y2 publication Critical patent/JPH0741083Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/488Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H01J29/503Three or more guns, the axes of which lay in a common plane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/50Plurality of guns or beams
    • H01J2229/502Three beam guns, e.g. for colour CRTs

Description

【考案の詳細な説明】 《産業上の利用分野》 本考案は陰極線管用電子銃に係るもので、球面収差と非
点収差が低い最終加速及び集束レンズを持つ陰極線管用
電子銃に係るものである。
DETAILED DESCRIPTION OF THE INVENTION << Industrial Application Field >> The present invention relates to an electron gun for a cathode ray tube, and relates to an electron gun for a cathode ray tube having a final acceleration and focusing lens with low spherical aberration and astigmatism. .

《従来の技術及びその問題点》 電子銃の電子レンズの球面収差を改善するためには、可
能な限りメインレンズの電界強度を弱化させるとともに
その口径は拡大しなければならない。しかし、レンズの
球径は陰極線管のネックの直径によって制限されるので
事実上レンズの口径拡張による球面収差の改善の範囲は
狭い。従って、現在は主に電界強度が弱い電子レンズを
多数重畳させて一つのグループのメインレンズ系を形成
するようにしている。即ち、第1図に図示されたような
形態の電子銃として米国特許第4,253,041号に記述され
ているような多段集束型電子銃が開発されている。
<< Prior Art and its Problems >> In order to improve the spherical aberration of the electron lens of the electron gun, it is necessary to weaken the electric field strength of the main lens as much as possible and to enlarge its aperture. However, since the spherical diameter of the lens is limited by the diameter of the neck of the cathode ray tube, the range of improvement of the spherical aberration by expanding the aperture of the lens is practically narrow. Therefore, at present, a large number of electron lenses having a weak electric field strength are mainly overlapped to form one group of main lens systems. That is, a multi-stage focusing electron gun as described in U.S. Pat. No. 4,253,041 has been developed as an electron gun of the form shown in FIG.

また、米国特許第3,772,554号には第2図に図示された
ようにメインレンズ系の最終加速及び集束レンズである
主レンズが大口径化され得るようにビーム通過孔が形成
された平面を凹状に形成した形態の電子銃が開示されて
いるが、これは前記多段集束型電子銃のように多数の電
子レンズが重畳されたような効果を得ることができる。
しかし、このような電子銃は、ビーム通過孔が形成され
た平面全体が凹状にプレスされなければならないので、
これを加工するプレスの金型構造が複雑になり、製造加
工上難しさを伴う。
Also, in US Pat. No. 3,772,554, as shown in FIG. 2, the plane in which the beam passage hole is formed is made concave so that the main lens, which is the final acceleration and focusing lens of the main lens system, can be made large in diameter. Although the electron gun in the formed form is disclosed, this can obtain the effect that a large number of electron lenses are superposed like the multi-stage focusing electron gun.
However, in such an electron gun, since the entire plane in which the beam passage hole is formed must be pressed concavely,
The die structure of the press for processing this becomes complicated, which causes difficulty in manufacturing and processing.

《考案の目的》 本考案は上記のような問題点を改善するためのもので、
簡単な構造で製作が簡便で、球面収差と非点収差が効率
的に改善された陰極線管用電子銃を提供することにその
目的がある。
<Purpose of Invention> The present invention is intended to improve the above problems.
An object of the present invention is to provide an electron gun for a cathode ray tube, which has a simple structure, is easy to manufacture, and has spherical aberration and astigmatism efficiently improved.

《問題点を解決しようとするための手段》 上記の目的を達成するために本考案は、メインレンズ系
の最終加速及び集束レンズを形成するフォーカス電極の
ビームの通過平面とアノード電極のビーム通過平面との
それぞれに、中央ビーム通過孔と、この中央ビーム通過
孔の両側に設けられた外郭ビーム通過孔を有する陰極線
管用電子銃において、前記中央ビーム通過孔と前記外郭
ビーム通過孔間に、前記ビーム通過平面に対して平行で
かつ平坦な底面と、この底面の両側に所定角度でなる傾
斜面で形成された陥没部を有し、この陥没部の傾斜面の
外郭側縁が前記外郭ビーム通過孔の略中央部位に掛か
り、かつ、前記中央ビーム通過孔に向かう外郭ビーム通
過孔の内側部位が傾斜面に位置することを特徴とする。
<< Means for Solving the Problems >> In order to achieve the above object, the present invention provides a beam passing plane of a focus electrode and a beam passing plane of an anode electrode which form a final acceleration and focusing lens of a main lens system. And a central beam passage hole, and an electron gun for a cathode ray tube having outer beam passage holes provided on both sides of the central beam passage hole, wherein the beam is provided between the central beam passage hole and the outer beam passage hole. It has a flat bottom surface that is parallel to the passing plane, and recesses formed on both sides of this bottom surface with inclined surfaces at a predetermined angle, and the outer side edge of the inclined surface of this recessed portion is the outer beam passage hole. The inner side portion of the outer beam passage hole that extends toward the central beam passage hole is located on the inclined surface.

《作用》 従って、中央のビーム通過孔によって形成された電子レ
ンズを通過する電子ビームは、たとえば小さい直径のビ
ーム通過孔であるが、対向するビーム通過空間の間隔が
大きいので、小さい集束力を受けるから球面収差が減少
される。一方、外郭のビーム通過孔によって形成された
電子レンズを通過する電子ビームは、レンズ形成空間の
間隔が狭い代わりに各ビーム通過孔の直径が大きい関係
上小さい集束力を受けるので、球面収差が低減される。
<< Effect >> Therefore, the electron beam passing through the electron lens formed by the central beam passage hole has, for example, a beam passage hole with a small diameter, but receives a small focusing force because the distance between the opposite beam passage spaces is large. To reduce spherical aberration. On the other hand, the electron beam passing through the electron lens formed by the outer beam passage hole receives a small focusing force due to the large diameter of each beam passage hole in spite of the narrow space between the lens forming spaces, so spherical aberration is reduced. To be done.

また、上記外郭ビーム通過孔の一部または全体が電子ビ
ーム通過平面に対して傾斜に形成されてあるので集中化
に有利になる。すなわち、傾斜された外郭ビーム通過孔
によって電界が電子進行方向に対して傾斜に形成される
ので、これを通過するビーム束間の集束方向が略一定に
なり、結果的に外郭電子ビーム非点収差が減少される。
Further, a part or the whole of the outer beam passage hole is formed to be inclined with respect to the electron beam passage plane, which is advantageous for concentration. That is, since the electric field is formed to be inclined with respect to the electron traveling direction by the inclined outer beam passage hole, the focusing direction between the beam bundles passing therethrough becomes substantially constant, resulting in the outer electron beam astigmatism. Is reduced.

《実施例》 第3図に単電子レンズ方式の本考案の電子銃が概略的に
示す。同図において、この電子銃はカソードK,グリッド
G1,スクリーングリッドG2,フォーカス電極G3,アノードG
4電極から構成される。そして、メインレンズ系を成す
フォーカス電極G3のビーム出射側の平面3Pの中央部位に
と、最終加速電極のG4のビーム入射側の平面4Pの中央部
位には斜面TRを持つ陥没部PR,RRが形成されている。
<< Embodiment >> FIG. 3 schematically shows an electron gun of the present invention of a single electron lens type. In the figure, this electron gun is a cathode K, grid
G1, screen grid G2, focus electrode G3, anode G
It consists of 4 electrodes. Then, the depressions PR and RR having the slope TR are formed in the central portion of the plane 3P on the beam emitting side of the focus electrode G3 that forms the main lens system and in the central portion of the plane 4P on the beam incident side of the final accelerating electrode G4. Has been formed.

このときに、中央のビーム通過孔3G,4Gは陥没部PR,RRの
底面に位置され、その両側の外郭ビーム通過孔3R,3B,4
R,4Bは斜面TRに位置されるが、斜面TRの領域は中央ビー
ム通過孔3G,4Gと外郭レンズ形成孔3R,3B,4R,4B間の境界
線Lから外郭レンズ形成孔3R,3B,4R,4Bの略中心部位ま
でである。しかし、斜面TRは境界線Lから外郭レンズ形
成孔3R,3B,4R,4Bの外側端部まで延長されるように形成
することができ、この場合外郭ビーム通過孔3R,3B,4R,4
Bは斜面TRに全体的に形成されて電子ビームの進行方向
に対して全体的に傾斜される。一方、中央のビーム通過
孔3G,4Gは外郭ビーム通過孔3R,3B,4R,4Bに比べてその直
径が小さい。各ビーム通過孔の縁部に形成されるリップ
BRの高さについても、中央ビーム通過孔3G,4GのリップB
Rは外郭ビーム通過孔3R,3B,4R,4BのリップBRの平均長さ
より短い。
At this time, the central beam passage holes 3G, 4G are located on the bottom surfaces of the depressions PR, RR, and the outer beam passage holes 3R, 3B, 4 on both sides thereof are located.
R and 4B are located on the slope TR, but the region of the slope TR is from the boundary line L between the central beam passing holes 3G and 4G and the outer lens forming holes 3R, 3B, 4R and 4B to the outer lens forming holes 3R and 3B, It is up to the approximate center of 4R and 4B. However, the slope TR may be formed so as to extend from the boundary line L to the outer ends of the outer lens forming holes 3R, 3B, 4R, 4B, and in this case, the outer beam passing holes 3R, 3B, 4R, 4B.
B is entirely formed on the slope TR, and is entirely inclined with respect to the traveling direction of the electron beam. On the other hand, the central beam passage holes 3G, 4G have a smaller diameter than the outer beam passage holes 3R, 3B, 4R, 4B. Lip formed at the edge of each beam passage hole
Regarding the height of BR, the lip B of the central beam passage holes 3G and 4G
R is shorter than the average length of the lip BR of the outer beam passage holes 3R, 3B, 4R, 4B.

以上のように構成された電子銃の電子ビーム特性を見れ
ば、まず中央のビーム通過孔3G,4Gによって形成された
電子レンズを通過する中央電子ビームは、小さい直径の
ビーム通過孔であるが、対向するビーム通過孔3G,4G間
の間隔が大きいので小さい集束力をうけるため球面収差
が減少される。一方、外郭のビーム通過孔3R,3B,4R,4B
によって形成された電子レンズを通過する外郭電子ビー
ムは、ビーム通過空間の間隔が狭い代わりに各ビーム通
過孔の直径が大きい関係上、これによって小さい集束力
を受けるので球面収差が低減される。また、外郭ビーム
通過孔の一部または全体が電子ビーム通過平面に対して
傾斜に形成されているため、ビームが集中する方向に働
くので、これを通過するビーム束(Flux)間の集束方向
が一定になる。
Looking at the electron beam characteristics of the electron gun configured as described above, first, the central electron beam passing through the electron lens formed by the central beam passing holes 3G and 4G is a beam passing hole having a small diameter, Since the distance between the beam passing holes 3G and 4G facing each other is large, a small focusing force is received, so that spherical aberration is reduced. On the other hand, the outer beam passage holes 3R, 3B, 4R, 4B
The outer electron beam passing through the electron lens formed by means of the above has a small focusing force due to the large diameter of each beam passage hole in spite of the narrow space of the beam passage space, so that the spherical aberration is reduced. In addition, since a part or the whole of the outer beam passage hole is formed to be inclined with respect to the electron beam passage plane, it acts in the direction in which the beam is concentrated, so the focusing direction between the beam bundles (Flux) passing therethrough is Be constant.

これを具体的に説明すると第5図に傾斜された外郭レン
ズMLを通過する電子ビームの集束および集中状態が図示
されてあるように、外郭電子ビームRが傾斜された外郭
メインレンズMLを通過するとにメインレンズMLの外側か
ら傾斜して入射するビーム束Roは弱い発散力をうけるの
で、大きな屈折角を持ち、その反面メインレンズMLの内
側方から傾斜に入射するビーム束Riは強い発散力を受け
るが、入射方向の内側に傾斜された関係上小さい屈折力
を持つ。
This will be described in detail. As shown in FIG. 5, the state of focusing and concentration of the electron beam passing through the tilted outer lens ML is shown, and when the outer electron beam R passes through the tilted outer main lens ML. Since the beam bundle Ro that is obliquely incident from the outside of the main lens ML receives a weak diverging force, it has a large refraction angle, while the beam bundle Ri that is obliquely incident from the inside of the main lens ML has a strong divergent force. Although it receives it, it has a small refracting power because it is inclined inward in the incident direction.

従って、多数のビーム束は上記のような各条件によって
調節されて一点で焦点を結ぶことになるのでビームスポ
ットが正常円の形態を持つように形成される。
Therefore, since a large number of beam bundles are adjusted according to the above-mentioned conditions and focused at one point, the beam spot is formed to have a normal circle shape.

《効果》 このような本考案の電子銃は簡単な構造で電子ビームの
球面収差と非点収差が共に改善されるようにするので複
雑な形態の従来電子銃の構造的な収差補正手段を排除し
うる。従って、信頼性が向上され、陰極線管の画質を大
幅的に向上させることができる。
<Effect> Since the electron gun of the present invention has a simple structure to improve both the spherical aberration and the astigmatism of the electron beam, the structural aberration correcting means of the conventional electron gun having a complicated shape is eliminated. You can. Therefore, the reliability is improved and the image quality of the cathode ray tube can be greatly improved.

【図面の簡単な説明】[Brief description of drawings]

第1図及び第2図は従来の電子銃の断面図、第3図は本
考案による電子銃の1実施例を示した図面、第4図は第
3図に図示された電子銃におけるメインレンズ系の主レ
ンズを形成する電極の正面図、第5図は本考案の電子銃
によって制御される電子ビームの集束及び集中状態を可
視化して示した図面である。 3R,3G,3B,4R,4G,4B……ビーム通過孔 RR,PR……陥没部 TR……傾斜面 L……陥没部底面の境界線 BR……ビーム通過孔のリップ
1 and 2 are sectional views of a conventional electron gun, FIG. 3 is a drawing showing an embodiment of the electron gun according to the present invention, and FIG. 4 is a main lens in the electron gun shown in FIG. FIG. 5 is a front view of an electrode forming a main lens of the system, and FIG. 5 is a view showing a focused state and a focused state of an electron beam controlled by an electron gun of the present invention. 3R, 3G, 3B, 4R, 4G, 4B …… Beam passage hole RR, PR …… Depression part TR …… Sloping surface L …… Boundary line of depression bottom surface BR …… Beam passage hole lip

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】メインレンズ系の最終加速及び集束レンズ
を形成するフォーカス電極のビームの通過平面とアノー
ド電極のビーム通過平面とのそれぞれに、中央ビーム通
過孔と、この中央ビーム通過孔の両側に設けられた外郭
ビーム通過孔を有する陰極線管用電子銃において、 前記中央ビーム通過孔と前記外郭ビーム通過孔間に、前
記ビーム通過平面に対して平行でかつ平坦な底面と、こ
の底面の両側に所定角度でなる傾斜面で形成された陥没
部を有し、 この陥没部の傾斜面の外郭側縁が前記外郭ビーム通過孔
の略中央部位に掛かり、かつ、前記中央ビーム通過孔に
向かう外郭ビーム通過孔の内側部位が傾斜面に位置する
ことを特徴とする陰極線管用電子銃。
1. A central beam passage hole in each of a beam passage plane of a focus electrode and a beam passage plane of an anode electrode which form a final acceleration and focusing lens of a main lens system, and on both sides of the central beam passage hole. In an electron gun for a cathode ray tube having an outer beam passage hole provided, between the central beam passage hole and the outer beam passage hole, a bottom surface parallel to the beam passage plane and flat, and predetermined on both sides of the bottom surface. There is a recessed portion formed by an inclined surface having an angle, and the outer side edge of the inclined surface of the recessed portion overlaps with the substantially central portion of the outer beam passage hole and the outer beam passage toward the central beam passage hole. An electron gun for a cathode ray tube, wherein an inner part of the hole is located on an inclined surface.
【請求項2】前記中央ビーム通過孔が前記外郭ビーム通
過孔より小さい直径を持つように形成されたことを特徴
とする請求項1記載の陰極線管用電子銃。
2. The electron gun for a cathode ray tube according to claim 1, wherein the central beam passage hole is formed to have a diameter smaller than that of the outer beam passage hole.
JP1989133023U 1988-12-23 1989-11-15 Electron gun for cathode ray tube Expired - Fee Related JPH0741083Y2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR21340 1988-12-23
KR2019880021340U KR910007658Y1 (en) 1988-12-23 1988-12-23 Electron gun of cathode ray tube

Publications (2)

Publication Number Publication Date
JPH0326040U JPH0326040U (en) 1991-03-18
JPH0741083Y2 true JPH0741083Y2 (en) 1995-09-20

Family

ID=19282438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989133023U Expired - Fee Related JPH0741083Y2 (en) 1988-12-23 1989-11-15 Electron gun for cathode ray tube

Country Status (3)

Country Link
JP (1) JPH0741083Y2 (en)
KR (1) KR910007658Y1 (en)
MY (1) MY104697A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5174570A (en) * 1974-12-25 1976-06-28 Hitachi Ltd KARAAJUZOKAN
JPS53147459A (en) * 1977-05-27 1978-12-22 Mitsubishi Electric Corp Electron gun for color receiving tube
JPS59194333A (en) * 1983-04-20 1984-11-05 Nec Corp In-line type electron gun frame body

Also Published As

Publication number Publication date
KR900013395U (en) 1990-07-05
MY104697A (en) 1994-05-31
KR910007658Y1 (en) 1991-09-30
JPH0326040U (en) 1991-03-18

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