JPH0737111B2 - Substrate partially having insulating metal thin film and method of partially applying insulating metal thin film - Google Patents
Substrate partially having insulating metal thin film and method of partially applying insulating metal thin filmInfo
- Publication number
- JPH0737111B2 JPH0737111B2 JP1161509A JP16150989A JPH0737111B2 JP H0737111 B2 JPH0737111 B2 JP H0737111B2 JP 1161509 A JP1161509 A JP 1161509A JP 16150989 A JP16150989 A JP 16150989A JP H0737111 B2 JPH0737111 B2 JP H0737111B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- thin film
- metal thin
- insulating metal
- paint
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Description
【発明の詳細な説明】 （産業上の利用分野） この発明は、絶縁性金属薄膜を部分的に有する基材及び
絶縁性金属薄膜を部分的に付与する方法に係り、詳細に
は、部分的に存在している金属薄膜が金属光沢を有して
いてしかも絶縁性を有している基材及びその様な金属薄
膜を部分的に付与する方法に係るものである。Description: TECHNICAL FIELD The present invention relates to a base material partially having an insulating metal thin film and a method of partially applying an insulating metal thin film, and more particularly to a partial application. The present invention relates to a base material in which the metal thin film present in 2) has metallic luster and also has an insulating property, and a method for partially applying such a metal thin film.
（従来の技術） 表面に金属薄膜を部分的に有する基材として、プラスチ
ックフイルムの上に水溶性塗料を印刷等により部分的に
塗布し、その上から金属薄膜を全面的に形成し、その後
水洗して得た、金属薄膜を部分的に有するプラスチック
フイルムが知られている（特公昭43−2600号公報、特公
昭56−38611号公報参照）。これは、言わば水洗方式に
より金属薄膜を部分的に付与して得たものであり、金属
光沢を部分的に有しているものである。(Prior art) As a substrate partially having a metal thin film on its surface, a water-soluble paint is partially applied on the plastic film by printing, etc., and then a metal thin film is entirely formed on it and then washed with water. There is known a plastic film having a metal thin film partially obtained (see Japanese Patent Publication Nos. 43-2600 and 56-38611). This is, so to speak, obtained by partially applying a metal thin film by a water washing method, and partially having a metallic luster.
また、金属薄膜を島状構造のものにしたところの、金属
光沢を有していてしかも絶縁性を有する絶縁性金属薄膜
も知られている（特開昭62−174189号公報参照）。In addition, an insulating metal thin film having a metallic luster and an insulating property, which is obtained by forming the metal thin film into an island structure, is also known (see JP-A-62-174189).
発明者は、この二つの技術を組み合わせて、絶縁性金属
薄膜を部分的に有するプラスチックフイルムを得ること
ができた。The inventor was able to combine these two techniques to obtain a plastic film partially having an insulating metal thin film.
（発明が解決しようとする課題） しかしながら、上記の絶縁性金属薄膜を部分的に有する
プラスチックフイルムは、一応金属光沢を有してはいる
が、絶縁性金属薄膜にキズが発生して絶縁性金属薄膜が
破壊され、そのため外観上、美麗な金属光沢は得られな
かった。(Problems to be Solved by the Invention) However, although the plastic film partially having the above-mentioned insulating metal thin film has a metallic luster, the insulating metal thin film may be scratched to cause the insulating metal thin film. The thin film was destroyed, and as a result, a beautiful metallic luster was not obtained in appearance.
これは、絶縁性金属薄膜は、金属薄膜が島状構造になっ
ているので、その島状構造をなす島状金属原子塊は相互
の結合がなく、それぞれが離れた状態になっていること
から、プラスチックフイルムに対する密着力が、連続的
な金属膜を形成している通常の金属薄膜に比べて極めて
弱く、島状金属原子塊の付着状態が水洗、乾燥といった
外部の力によりたやすく破壊されるからである。This is because the metal thin film of the insulating metal thin film has an island-shaped structure, and therefore the island-shaped metal atomic masses forming the island-shaped structure do not bond to each other and are separated from each other. , The adhesion to the plastic film is much weaker than that of a normal metal thin film that forms a continuous metal film, and the adhesion state of island-shaped metal atomic masses is easily destroyed by external forces such as washing and drying. Because.
特に、水洗及び乾燥の工程では、水洗効率を上げるため
のバフかけや乾燥効率を上げるための拭き取り等を行う
ことが多いが、バフかけや拭き取り等を行った場合に
は、キズの発生は特に著しかった。In particular, in the steps of washing and drying, buffing to improve the washing efficiency and wiping to improve the drying efficiency are often performed, but when buffing or wiping is performed, scratches are particularly generated. It was remarkable.
この発明は、上記の欠点を除去するもので、水洗及び乾
燥の工程でバフかけや拭き取りを行ってもキズが発生し
ていない絶縁性金属薄膜を部分的に有する基材、及びキ
ズが発生しない絶縁性金属薄膜を部分的に付与する方法
を提供するものである。This invention eliminates the above-mentioned drawbacks and does not cause scratches even after buffing or wiping in the steps of washing and drying. A base material partially having an insulating metal thin film, and scratches do not occur. The present invention provides a method for partially applying an insulating metal thin film.
（課題を解決するための手段） この発明は、基材の表面に水溶性塗料を印刷等により部
分的に塗布し、その上から絶縁性金属薄膜を全面的に形
成し、該絶縁性金属薄膜の上から厚さ0.05〜1.0μｍの
水不溶性塗料を塗布し、次にこの様にして得たものを水
洗して水溶性塗料を溶解除去することにより、水溶性塗
料上の絶縁性金属薄膜と水不溶性塗料を除去すると共
に、水溶性塗料が存在しない部分の絶縁性金属薄膜と水
不溶性塗料を残存させて得たことを特徴とする、絶縁性
金属薄膜を部分的に有する基材である。(Means for Solving the Problem) The present invention is to partially coat a surface of a base material with a water-soluble paint by printing or the like, and form an insulating metal thin film on the entire surface of the base material. A water-insoluble paint having a thickness of 0.05 to 1.0 μm is applied from above, and then the thus obtained product is washed with water to dissolve and remove the water-soluble paint, thereby forming an insulating metal thin film on the water-soluble paint. A base material partially having an insulating metal thin film, which is obtained by removing the water-insoluble paint and leaving the water-insoluble paint and a portion of the insulating metal thin film where the water-soluble paint does not exist.
またこの発明は、基材の表面に水溶性塗料を印刷等によ
り部分的に塗布し、その上から絶縁性金属薄膜を全面的
に形成し、該絶縁性金属薄膜の上から厚さ0.05〜1.0μ
ｍの水不溶性塗料を塗布し、次にこの様にして得たもの
を水洗して水溶性塗料を溶解除去することにより、水溶
性塗料上の絶縁性金属薄膜と水不溶性塗料を除去すると
共に、水溶性塗料が存在しない部分の絶縁性金属薄膜と
水不溶性塗料を残存させることを特徴とする、絶縁性金
属薄膜を部分的に付与する方法である。Also, the present invention partially coats the surface of the substrate with a water-soluble paint by printing or the like, forms an insulating metal thin film on the entire surface thereof, and has a thickness of 0.05 to 1.0 from the insulating metal thin film. μ
m water-insoluble paint is applied, and then the thus obtained product is washed with water to dissolve and remove the water-soluble paint, thereby removing the insulating metal thin film and the water-insoluble paint on the water-soluble paint. It is a method for partially applying an insulating metal thin film, characterized in that the insulating metal thin film and the water-insoluble paint are left in a portion where the water-soluble paint does not exist.
以下、この発明を図面を参照しつつ説明する。The present invention will be described below with reference to the drawings.
基材１は、各種のプラスチックフイルム等、絶縁性金属
薄膜を形成させることができ、かつ水洗できるものは全
て含む。この場合、各種のプラスチックフイルム等に
は、予め所望の模様、図柄、文字等の印刷を施しておい
てもよく、この様なものもこの発明の基材１に含む。ま
た、基材１は単体でなく適宜の目的で適宜の樹脂コート
や貼合せ等をした複合体であってもよく、この様なもの
もこの発明の基材１に含む。The base material 1 includes all kinds of plastic films and the like on which an insulating metal thin film can be formed and which can be washed with water. In this case, various plastic films or the like may be preliminarily printed with desired patterns, patterns, characters and the like, and such a material is also included in the base material 1 of the present invention. Further, the base material 1 may not be a single substance but may be a composite body in which an appropriate resin coating or lamination is performed for an appropriate purpose, and such a material is also included in the base material 1 of the present invention.
水溶性塗料２は適宜の樹脂を使用し、第２図に示すよう
に、基材１の表面に印刷等により部分的に塗布する。The water-soluble paint 2 uses an appropriate resin and is partially applied to the surface of the base material 1 by printing or the like, as shown in FIG.
絶縁性金属薄膜３は、Sn、Pb、Zn、その他各種の金属、
各種の合金、等々を使用し、第３図に示すように、水溶
性塗料２を塗布した上から、真空蒸着、スパッタリン
グ、イオンプレーティング等の各種の薄膜生成法により
全面的に形成する。この場合、金属薄膜を島状構造のも
のとして絶縁性金属薄膜とする。The insulating metal thin film 3 is made of Sn, Pb, Zn, various other metals,
As shown in FIG. 3, various alloys and the like are used, and then the water-soluble paint 2 is applied, and then the entire surface is formed by various thin film forming methods such as vacuum deposition, sputtering, and ion plating. In this case, the metal thin film is an insulating metal thin film having an island structure.
金属薄膜を島状構造のものとして絶縁性金属薄膜とする
には、前記した特開昭62−174189号公報にも記載されて
いるように、薄膜生成過程でいえば「核生成」から「核
結合」、「初期島状構造」を経た後の島状構造となるよ
うに制御して金属薄膜を形成する。このようにして金属
薄膜を島状構造とすることにより、絶縁性金属薄膜とす
ることができる。As described in JP-A-62-174189, in order to form an insulating metal thin film with a metal thin film having an island structure, in the thin film forming process, "nucleation" to "nucleation" is performed. A metal thin film is formed by controlling so as to form an island structure after "bonding" and "initial island structure". By thus forming the metal thin film in an island structure, an insulating metal thin film can be obtained.
金属薄膜の島状構造における島のサイズは200Å〜１μ
ｍ程度とする。島のサイズが200Åより小さいと、島が
小さすぎて美麗な金属光沢が得られない。島のサイズが
１μｍを超えると、島が大きすぎて島と島とが接して一
体となってきて絶縁性が低下する。The island size in the island structure of the metal thin film is 200Å ~ 1μ
It is about m. If the size of the island is less than 200Å, the island is too small to obtain a beautiful metallic luster. When the size of the island exceeds 1 μm, the island is too large and the islands come into contact with each other to be integrated with each other, resulting in deterioration of the insulating property.
金属薄膜の島状構造における島の間隔は100Å〜5000Å
とする。島の間隔が100Åより小さいと、帯電した電荷
のトンネル電流が流れて、絶縁性が悪い。島の間隔が50
00Åより大きいと、全体としての金属の量が少なくなる
ので、美麗な金属光沢は得られない。また、島の間隔が
5000Åを超えると、金属薄膜の平面方向の密度が粗とな
り耐磨耗性が低下する。The island spacing in the island structure of the metal thin film is 100Å ~ 5000Å
And If the spacing between islands is less than 100Å, tunneling current of charged charges will flow, resulting in poor insulation. 50 islands apart
If it is larger than 00Å, the amount of metal as a whole will be small, so a beautiful metallic luster cannot be obtained. Also, the island spacing
If it exceeds 5000Å, the density of the metal thin film in the plane direction becomes coarse and the wear resistance decreases.
島状構造をした金属薄膜には、Sn、Pb、Zn、Bi、Ti、C
r、Fe、Co、Ni、Si、Ge等の各種の金属、合金が使用で
きる。Sn, Pb, Zn, Bi, Ti, C are used for the metal thin film with island structure.
Various metals and alloys such as r, Fe, Co, Ni, Si and Ge can be used.
島状構造をした金属薄膜は、蒸発速度、基材温度、蒸着
膜厚等を制御することにより形成することができる。制
御は、前記した通り薄膜生成過程でいえば「核生成」か
ら「核結合」、「初期島状構造」を経た後の島状構造と
なるように制御するものであるが、使用する金属により
難易がある。大ざっぱにいえば、融点の低い金属や貴金
属は制御が比較的容易であり、中でもSn、Pb、Zn、Bi等
は特に容易であるが、Ti、Cr、Fe、Co、Ni等の遷移金属
やSi、Ge等の半導体金属は制御は比較的容易でない。The metal thin film having an island structure can be formed by controlling the evaporation rate, substrate temperature, vapor deposition film thickness and the like. As mentioned above, the control is to control from the “nucleation” to the “nuclear bond” in the thin film formation process, and then to the island structure after passing through the “initial island structure”. There is difficulty. Roughly speaking, low melting point metals and noble metals are relatively easy to control, and among them, Sn, Pb, Zn, Bi and the like are particularly easy, but Ti, Cr, Fe, Co, Ni and other transition metals and Si, Control of semiconductor metals such as Ge is relatively difficult.
島状構造をした金属薄膜の生成は、金属の凝集エネルギ
ーと吸着エネルギーとの関係の制御にかかっており、そ
のために蒸発速度等の各種の制御を要するものである
が、一般的には、蒸発速度を速く、また基材温度を低く
する程島のサイズは小さくなる傾向にある。しかし、膜
厚の影響は特に大きく、膜厚を光線透過率で換算した場
合、光線透過率10％〜15％程度がこの発明の金属薄膜の
島状構造を得るのに最適である。もっともこれも金属に
より異なり、Sn、Pb、Zn、Bi、等は大体これでよいが、
その他の金属では必ずしもこの範囲が最適とはならない
場合もある。The formation of a metal thin film having an island structure depends on the control of the relationship between the cohesive energy and the adsorption energy of the metal, which requires various controls such as evaporation rate. The higher the speed and the lower the substrate temperature, the smaller the island size tends to be. However, the influence of the film thickness is particularly large, and when the film thickness is converted into light transmittance, a light transmittance of about 10% to 15% is optimal for obtaining the island-shaped structure of the metal thin film of the present invention. However, this also differs depending on the metal, and Sn, Pb, Zn, Bi, etc. can be roughly this,
For other metals, this range may not always be optimal.
水不溶性塗料４は適宜の樹脂を使用し、第４図に示すよ
うに、絶縁性金属薄膜３の上から、リバースコートやグ
ラビアコート等により全面的に又は部分的に塗布する。
水不溶性塗料４を部分的に塗布する場合は、少なくとも
水溶性塗料２が存在しない部分には塗布する。水溶性塗
料２が存在しない部分であっても、絶縁性金属薄膜が必
要なのがその内の一部であるときは、その必要部分にの
み水不溶性塗料４を塗布してもよい。An appropriate resin is used for the water-insoluble paint 4, and as shown in FIG. 4, the water-insoluble paint 4 is applied to the whole or part of the insulating metal thin film 3 by reverse coating or gravure coating.
When the water-insoluble paint 4 is partially applied, it is applied to at least a portion where the water-soluble paint 2 does not exist. Even if the water-soluble paint 2 is not present, if the insulating metal thin film is needed for a part of the part, the water-insoluble paint 4 may be applied only to the necessary part.
水不溶性塗料４を部分的に塗布する場合は、水不溶性塗
料４は、エッヂが水溶性塗料２と接してもよく離れても
よく、すなわち水不溶性塗料４と水溶性塗料２とは重な
らなくてもよく、また、両者は一部重なってもよい。When the water-insoluble paint 4 is partially applied, the edge of the water-insoluble paint 4 may come in contact with or separate from the water-soluble paint 2, that is, the water-insoluble paint 4 and the water-soluble paint 2 do not overlap each other. Or both may partially overlap.
第４図に示すように水不溶性塗料４を塗布した後には、
水洗して水溶性塗料２を溶解除去することにより、水溶
性塗料２上の絶縁性金属薄膜３と水不溶性塗料４を除去
すると共に、水溶性塗料２が存在しない部分の絶縁性金
属薄膜３と水不溶性塗料４を残存させる。このようにす
ることにより、第１図に示すような、絶縁性金属薄膜を
部分的に有する基材を得ることができる。第１図は、水
不溶性塗料４を塗布した後に水洗、乾燥することにより
得ることができる、この発明の絶縁性金属薄膜を部分的
に有する基材の一例を示す一部拡大断面図である。After applying the water-insoluble paint 4 as shown in FIG.
By washing with water to dissolve and remove the water-soluble paint 2, the insulating metal thin film 3 and the water-insoluble paint 4 on the water-soluble paint 2 are removed, and at the same time, the insulating metal thin film 3 where the water-soluble paint 2 does not exist is formed. The water-insoluble paint 4 remains. By doing so, a base material partially having an insulating metal thin film as shown in FIG. 1 can be obtained. FIG. 1 is a partially enlarged cross-sectional view showing an example of a base material partially having an insulating metal thin film of the present invention, which can be obtained by applying a water-insoluble coating material 4, followed by washing with water and drying.
水不溶性塗料４は、水洗及び乾燥時、並びに、水洗及び
乾燥して絶縁性金属薄膜３を部分的に付与した後に、水
不溶性塗料４の下の絶縁性金属薄膜３の保護として機能
するものである。The water-insoluble paint 4 functions as a protection of the insulating metal thin film 3 under the water-insoluble paint 4 at the time of washing and drying, and after partially washing and drying to apply the insulating metal thin film 3. is there.
水不溶性塗料４の厚さは、この明細書では乾燥膜厚を意
味する。The thickness of the water-insoluble paint 4 means a dry film thickness in this specification.
水不溶性塗料４は厚さ0.05〜1.0μｍと極めて薄く塗布
する。この範囲の中でも、0.1〜0.3μｍの範囲は特に好
ましい。The water-insoluble paint 4 is applied very thinly with a thickness of 0.05 to 1.0 μm. Within this range, the range of 0.1 to 0.3 μm is particularly preferable.
水不溶性塗料４の厚さが1.0μｍを越えると、水洗時に
水が水不溶性塗料４を浸透しにくくなるので、水洗がス
ムースに行えない。また、水不溶性塗料４の厚さが0.05
μｍより薄いと薄すぎて絶縁性金属薄膜３の保護として
機能しなくなり、絶縁性金属薄膜３にキズが発生する。If the thickness of the water-insoluble paint 4 exceeds 1.0 μm, it becomes difficult for water to permeate the water-insoluble paint 4 during washing with water, so that washing with water cannot be performed smoothly. In addition, the thickness of the water-insoluble paint 4 is 0.05
If the thickness is less than μm, it is too thin to function as a protection for the insulating metal thin film 3, and the insulating metal thin film 3 is damaged.
この発明の絶縁性金属薄膜を部分的に有する基材は、そ
のまま、又は絶縁性金属薄膜上に適宜の樹脂層やプラス
チックフイルムを設けて、包装用等の各種の用途に使用
できる。The base material partially having the insulating metal thin film of the present invention can be used as it is, or by providing an appropriate resin layer or a plastic film on the insulating metal thin film, for various uses such as packaging.
また、それらを適宜の紙や他のプラスチックフイルム等
と貼合せる等して複合体としても使用できる。Further, they can be used as a composite by laminating them with appropriate paper or other plastic film.
さらにまた他の使用例を挙げると、第５図に示すよう
に、プラスチックフイルム５の片面に離型層６及び保護
層７を順次積層したものを基材１とし、その基材１の保
護層７上にこの発明の方法により絶縁性金属薄膜３及び
水不溶性塗料４を部分的に設け、該絶縁性金属薄膜３及
び水不溶性塗料４の上から全面に接着層８を設ければ、
美麗な金属光沢を有している絶縁性金属薄膜３が部分的
に形成された転写材料を得ることができる。この絶縁性
金属薄膜３が部分的に形成された転写材料は、絶縁性金
属薄膜３が島状構造をしていることから絶縁性とマイク
ロ波透過性を有しており、電気製品や電気機器、電子レ
ンジ用容器や包装等に使用すれば有益であり、また、使
用方法も、一般の型押しやラバー押しのみならず、イン
モールド成形用の転写材料として射出成形時の転写にも
使用できる。As another example of use, as shown in FIG. 5, a plastic film 5 on which a release layer 6 and a protective layer 7 are sequentially laminated is used as a base material 1, and the protective layer of the base material 1 is used. If the insulating metal thin film 3 and the water-insoluble paint 4 are partially provided on the surface 7 by the method of the present invention, and the adhesive layer 8 is provided on the entire surface of the insulating metal thin film 3 and the water-insoluble paint 4.
It is possible to obtain a transfer material in which the insulating metal thin film 3 having a beautiful metallic luster is partially formed. The transfer material on which the insulating metal thin film 3 is partially formed has an insulating property and a microwave transmitting property because the insulating metal thin film 3 has an island structure, and thus the transfer material is used for electric appliances and electric devices. It is useful when used in containers and packaging for microwave ovens, and can be used not only for general embossing and rubber pressing but also for transfer during injection molding as a transfer material for in-mold molding. .
（実施例） 厚さ12μｍの広幅長尺なポリエステルフイルムの片面
に、ポリビニルアルコールと体者顔料からなる水溶性塗
料をグラビア印刷で部分的に塗布した。(Example) A water-soluble paint composed of polyvinyl alcohol and body pigment was partially applied by gravure printing to one side of a wide and long polyester film having a thickness of 12 μm.
次に、その上からSnを真空蒸着して厚さ300Åで島状構
造の絶縁性Sn蒸着層を形成した。この絶縁性Sn蒸着層は
美麗な金属光沢を有していた。Next, Sn was vacuum-deposited from above to form an insulating Sn vapor-deposited layer having a thickness of 300 Å and having an island structure. The insulating Sn vapor deposition layer had a beautiful metallic luster.
次いで、絶縁性Sn蒸着層上に、ポリ塩化ビニル−酢酸ビ
ニル共重合体樹脂とこれを溶解するトルエン、酢酸エチ
ル、メチルイソブチルケトンを配合した混合溶剤とから
なる水不溶性塗料を、リバースロールコーターにて膜厚
を下記の表に示す如く０〜1.5μｍの間で各種に変化さ
せて全面的に塗布し乾燥した。Then, on the insulating Sn vapor-deposited layer, a polyvinyl chloride-vinyl acetate copolymer resin and a water-insoluble paint consisting of toluene, ethyl acetate, and a mixed solvent containing methyl isobutyl ketone dissolved in the reverse-roll coater. As shown in the table below, the film thickness was variously changed within the range of 0 to 1.5 μm, and the entire surface was coated and dried.
その後このようにして得たものを走行させながら水槽に
浸漬することにより水洗してバフかけし、ポリビニルア
ルコールと体質顔料からなる水溶性塗料を溶解すること
により、水溶性塗料上の絶縁性Sn蒸着層と水不溶性塗料
を除去すると共に、水溶性塗料が存在しない部分の絶縁
性Sn蒸着層と水不溶性塗料を残存させ、次いで、水分を
拭き取りつつ乾燥した。この場合に、浸漬後の水溶性塗
料の溶解開始時間を測定し、水洗及び乾燥後の絶縁性Sn
蒸着層のキズの発生の有無につき外観を観察した。After that, the product thus obtained is immersed in a water tank while running, washed with water and buffed, and the water-soluble paint consisting of polyvinyl alcohol and an extender pigment is dissolved, thereby insulating Sn vapor deposition on the water-soluble paint. The layer and the water-insoluble paint were removed, and the insulating Sn vapor-deposited layer and the water-insoluble paint in the portion where the water-soluble paint was not present were left, and then dried while wiping off water. In this case, measure the dissolution start time of the water-soluble paint after immersion, and the insulating Sn after washing and drying
The appearance was observed for the presence or absence of scratches on the vapor deposition layer.
結果を次の表に示す。The results are shown in the table below.
上記の表から、水不溶性塗料の厚さが0.05〜1.0μｍの
範囲であれば、水洗工程でのバフかけや乾燥工程での拭
き取りでも絶縁性Sn蒸着層にキズが発生することがな
く、絶縁性Sn蒸着層は破壊されることなく美麗な金属光
沢を保持できると共に、水洗もスムースに行うことがで
きることが分かる。 From the above table, if the thickness of the water-insoluble paint is in the range of 0.05 to 1.0 μm, the insulating Sn vapor-deposited layer will not be damaged even if it is buffed in the washing process or wiped in the drying process. It can be seen that the vapor-deposited Sn vapor layer can maintain a beautiful metallic luster without being broken and can be washed smoothly with water.
また、水不溶性塗料がない場合は、絶縁性Sn蒸着層にキ
ズが著しく発生し、水不溶性塗料の厚さが0.03μｍと薄
すぎる場合にも、水不溶性塗料が破壊されて絶縁性Sn蒸
着層にキズが相当発生し、いずれも美麗な金属光沢が保
持できない。If there is no water-insoluble paint, the insulating Sn vapor-deposited layer will be significantly scratched, and even if the thickness of the water-insoluble paint is too thin as 0.03 μm, the water-insoluble paint will be destroyed and There are considerable scratches on the surface, and none of them retains a beautiful metallic luster.
また、水不溶性塗料の厚さが1.2〜1.5μｍと厚すぎる場
合は、良好な金属光沢は保持できるが、フイルム走行速
度を11.0〜4.0とかなり下げても、水不溶性塗料により
水の浸透が妨げられる結果、浸漬後の水溶性塗料の溶解
開始時間（秒）は8.5〜20以上であり、水洗加工はスム
ースに行うことが出来ない。そしてこの場合、表には記
載していないが、水槽には溶解していない水不溶性塗料
が浮遊し、その後の水洗加工が妨げられた。Also, if the water-insoluble paint is too thick as 1.2-1.5 μm, good metallic luster can be maintained, but even if the film running speed is considerably reduced to 11.0-4.0, the water-insoluble paint prevents water penetration. As a result, the dissolution start time (seconds) of the water-soluble paint after immersion is 8.5 to 20 or more, and the water washing process cannot be performed smoothly. In this case, although not shown in the table, the undissolved water-insoluble paint floated in the water tank, which hindered subsequent washing with water.
（発明の効果） この発明は、水洗方式により絶縁性金属薄膜を部分的に
付与するが、その場合に、絶縁性金属薄膜の上から厚さ
0.05〜1.0μｍの水不溶性塗料を塗布し、その後水洗す
るものであるから、水洗及び乾燥時に水不溶性塗料が該
水不溶性塗料の下の絶縁性金属薄膜の保護として機能す
ることにより、部分的に付与された絶縁性金属薄膜には
キズが発生することがなく、美麗な金属光沢を保持して
いる。(Effects of the Invention) In the present invention, an insulating metal thin film is partially applied by a water washing method.
Since a water-insoluble paint of 0.05 to 1.0 μm is applied and then washed with water, the water-insoluble paint functions as a protection of the insulating metal thin film under the water-insoluble paint at the time of water washing and drying, The applied insulating metal thin film is free from scratches and retains a beautiful metallic luster.
また、絶縁性金属薄膜の上に残存している水不溶性塗料
は、単に水洗及び乾燥時にその下の絶縁性金属薄膜の保
護として機能するばかりでなく、そのまま部分的に付与
した絶縁性金属薄膜の保護となるものである。Further, the water-insoluble paint remaining on the insulating metal thin film not only functions as a protection of the insulating metal thin film thereunder at the time of washing and drying, but also the insulating metal thin film partially provided as it is. It is a protection.
第１図は、この発明の絶縁性金属薄膜を部分的に有する
基材の一実施例を示す一部拡大断面図である。 第２図〜第４図は、絶縁性金属薄膜を部分的に有する基
材を得る際の工程の概略を示す一部拡大断面図であり、
第２図は、水溶性塗料を基材の表面に部分的に塗布した
状態の一部拡大断面図、第３図は、水溶性塗料を塗布し
た上から絶縁性金属薄膜を全面的に形成した状態の一部
拡大断面図、第４図は、絶縁性金属薄膜の上から水不溶
性塗料を塗布した状態の一部拡大断面図である。 第５図は、この発明を転写材料に使用した場合の一例を
示す一部拡大断面図である。 １……基材 ２……水溶性塗料 ３……絶縁性金属薄膜 ４……水不溶性塗料 ５……プラスチックフイルム ６……離型層 ７……保護層 ８……接着層FIG. 1 is a partially enlarged cross-sectional view showing an embodiment of a base material partially having an insulating metal thin film of the present invention. 2 to 4 are partially enlarged cross-sectional views showing the outline of steps for obtaining a base material partially having an insulating metal thin film,
FIG. 2 is a partially enlarged cross-sectional view of a state where the water-soluble paint is partially applied to the surface of the base material, and FIG. 3 is a case where the insulating metal thin film is entirely formed on the water-soluble paint applied. FIG. 4 is a partially enlarged cross-sectional view of the state, and FIG. 4 is a partially enlarged cross-sectional view of the state in which the water-insoluble paint is applied on the insulating metal thin film. FIG. 5 is a partially enlarged sectional view showing an example in which the present invention is used as a transfer material. 1 ... Substrate 2 ... Water-soluble paint 3 ... Insulating metal thin film 4 ... Water-insoluble paint 5 ... Plastic film 6 ... Release layer 7 ... Protective layer 8 ... Adhesive layer
Claims (4)
分的に塗布し、その上から絶縁性金属薄膜を全面的に形
成し、該絶縁性金属薄膜の上から厚さ0.05〜1.0μｍの
水不溶性塗料を塗布し、次にこの様にして得たものを水
洗して水溶性塗料を溶解除去することにより、水溶性塗
料上の絶縁性金属薄膜と水不溶性塗料を除去すると共
に、水溶性塗料が存在しない部分の絶縁性金属薄膜と水
不溶性塗料を残存させて得たことを特徴とする、絶縁性
金属薄膜を部分的に有する基材。1. A surface of a substrate is partially coated with a water-soluble paint by printing or the like, and an insulating metal thin film is formed on the entire surface of the substrate, and the insulating metal thin film has a thickness of 0.05 to 1.0. By applying a water-insoluble paint of μm, and then washing the thus obtained product with water to dissolve and remove the water-soluble paint, the insulating metal thin film and the water-insoluble paint on the water-soluble paint are removed, A base material partially having an insulating metal thin film, which is obtained by leaving a part of the insulating metal thin film in which the water-soluble paint does not exist and the water-insoluble paint.
全面的に塗布してなる、請求項１に記載の絶縁性金属薄
膜を部分的に有する基材。2. A base material partially having an insulating metal thin film according to claim 1, which is formed by applying a water-insoluble paint over the entire surface of the insulating metal thin film.
少なくとも水溶性塗料が存在しない部分に塗布してな
る、請求項１に記載の絶縁性金属薄膜を部分的に有する
基材。3. A base material partially having an insulating metal thin film according to claim 1, which is formed by applying a water-insoluble paint on at least a portion where the water-soluble paint is not present on the insulating metal thin film.
分的に塗布し、その上から絶縁性金属薄膜を全面的に形
成し、該絶縁性金属薄膜の上から厚さ0.05〜1.0μｍの
水不溶性塗料を塗布し、次にこの様にして得たものを水
洗して水溶性塗料を溶解除去することにより、水溶性塗
料上の絶縁性金属薄膜と水不溶性塗料を除去すると共
に、水溶性塗料が存在しない部分の絶縁性金属薄膜と水
不溶性塗料を残存させることを特徴とする、絶縁性金属
薄膜を部分的に付与する方法。4. A water-soluble paint is partially applied to the surface of a base material by printing or the like, an insulating metal thin film is entirely formed on it, and the thickness of the insulating metal thin film is 0.05 to 1.0. A water-insoluble paint of μm is applied, and then the thus obtained product is washed with water to dissolve and remove the water-soluble paint, thereby removing the insulating metal thin film and the water-insoluble paint on the water-soluble paint. A method for partially applying an insulating metal thin film, characterized in that an insulating metal thin film and a water-insoluble paint are left in a portion where no water-soluble paint is present.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1161509A JPH0737111B2 (en) | 1989-06-23 | 1989-06-23 | Substrate partially having insulating metal thin film and method of partially applying insulating metal thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1161509A JPH0737111B2 (en) | 1989-06-23 | 1989-06-23 | Substrate partially having insulating metal thin film and method of partially applying insulating metal thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0326540A JPH0326540A (en) | 1991-02-05 |
| JPH0737111B2 true JPH0737111B2 (en) | 1995-04-26 |
Family
ID=15736413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1161509A Expired - Fee Related JPH0737111B2 (en) | 1989-06-23 | 1989-06-23 | Substrate partially having insulating metal thin film and method of partially applying insulating metal thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0737111B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008149694A1 (en) | 2007-05-31 | 2008-12-11 | Nissha Printing Co., Ltd. | Process for producing electric wave-transparent transfer material |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0771880B2 (en) * | 1989-06-27 | 1995-08-02 | 株式会社麗光 | Method of manufacturing transfer material |
| JPH05755U (en) * | 1991-06-27 | 1993-01-08 | 株式会社麗光 | Insulating metal vapor deposition film |
| JP2001331116A (en) * | 2000-05-18 | 2001-11-30 | Bridgestone Corp | Display panel |
| JP5339700B2 (en) * | 2007-09-14 | 2013-11-13 | 日本写真印刷株式会社 | Radio wave transmitting transfer material and manufacturing method thereof |
| JP5153550B2 (en) * | 2008-09-30 | 2013-02-27 | 日本写真印刷株式会社 | Transfer sheet having metal thin film on part of sheet surface and having polyester anchor layer, and method for producing the same |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58116191A (en) * | 1981-12-29 | 1983-07-11 | Oike Kogyo Kk | Transfer foil |
| JPS60262959A (en) * | 1984-06-09 | 1985-12-26 | Oike Kogyo Kk | Manufacture of vapor-deposited metallic film for electronic oven |
| JPS62174189A (en) * | 1985-10-21 | 1987-07-30 | Reiko Co Ltd | Insulating transfer material |
| JPS6342597A (en) * | 1986-08-08 | 1988-02-23 | Mitsubishi Electric Corp | Digital remote controller |
| JPS63130762A (en) * | 1986-11-21 | 1988-06-02 | Dainippon Printing Co Ltd | Production of transfer sheet having partially vapor deposited metal layer |
| JPH01103500A (en) * | 1987-10-16 | 1989-04-20 | Dainippon Printing Co Ltd | Manufacture of transfer foil with partial metallic evaporated layer |
-
1989
- 1989-06-23 JP JP1161509A patent/JPH0737111B2/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58116191A (en) * | 1981-12-29 | 1983-07-11 | Oike Kogyo Kk | Transfer foil |
| JPS60262959A (en) * | 1984-06-09 | 1985-12-26 | Oike Kogyo Kk | Manufacture of vapor-deposited metallic film for electronic oven |
| JPS62174189A (en) * | 1985-10-21 | 1987-07-30 | Reiko Co Ltd | Insulating transfer material |
| JPS6342597A (en) * | 1986-08-08 | 1988-02-23 | Mitsubishi Electric Corp | Digital remote controller |
| JPS63130762A (en) * | 1986-11-21 | 1988-06-02 | Dainippon Printing Co Ltd | Production of transfer sheet having partially vapor deposited metal layer |
| JPH01103500A (en) * | 1987-10-16 | 1989-04-20 | Dainippon Printing Co Ltd | Manufacture of transfer foil with partial metallic evaporated layer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008149694A1 (en) | 2007-05-31 | 2008-12-11 | Nissha Printing Co., Ltd. | Process for producing electric wave-transparent transfer material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0326540A (en) | 1991-02-05 |
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