JPH0734222A - Formation of thin film on edge part of thin sheet member and film forming device therefor - Google Patents

Abstract

PURPOSE:To provide a method for forming thin films on the edge parts of thin sheet members in which the formation of thin films is made possible even without using masks at the edge parks of many thin sheet members. CONSTITUTION:At the time of forming thin films T by applying energy to a coating material 10 from a prescribed direction in a vacuum to stick evaporating grains 12 from the coating material 10 scattered in a prescribed direction to one end part which is the film forming parts P1 of plural thin sheet members P, the plural thin sheet members P are arranged in such a manner that they are obliquely shifted, and the film forming parts P1 of the thin sheet members P are exposed in the flying direction of the evaporating grains 12 from the coating material 10. Since the film forming parts P1 themselves of the adjacent thin sheet members P play the role of masks, special masks such as sticking preventing sheets or the like are eliminated.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a thin film on an end of a thin plate member and a film forming apparatus for forming a thin film on the end of the thin plate member by, for example, a physical vacuum deposition method.

[0002]

2. Description of the Related Art FIG. 17 shows a conventional thin film forming apparatus for forming a thin film on one end of a thin plate member by a laser evaporation method which is one of physical vacuum evaporation methods. In the figure, 1 is a coating material as an evaporation source that is rotated in the direction of the arrow, 2 is laser light that irradiates the coating material 1 from a predetermined direction, and 3 is evaporation of the coating material 1 that is scattered upward by the irradiation of the laser light 2. particle,
Reference numeral 4 denotes a mask made of an adhesion-preventing plate or an attachment material attached to the thin plate member P so as to expose the film forming portion P1 on one end side of the thin plate member P, and 5 denotes a state where the thin plate member P is abutted against the film forming portion P1. It is a tray supported by. The covering material 1 and the thin plate member P are arranged in a vacuum chamber (not shown).

The operation of this thin film forming apparatus will be described. First, a plurality of thin plate members P to which the mask 4 is attached
The tray 5 supporting the is disposed in the vacuum chamber so that the film forming portion P1 is exposed in the direction of the coating material 1. Then, the inside of the vacuum chamber is evacuated to a predetermined degree of vacuum. Then, the coating material 1 is heated by the irradiation of the laser light 2, and the evaporated particles 3 of the coating material 1 are scattered toward the thin plate member P above the coating material 1. The vaporized particles 3 adhere to the film forming portion P1 of the thin plate member P exposed toward the coating material 1 side and form a thin film T of the coating material 1 on the film forming portion P1. Then, when the film formation of the thin film T on the film forming portion P1 on the one surface side of the thin plate member P is completed, the tray 5 is rotated and the thin plate member P is rotated by 180 degrees together with the mask 4, so that the thin plate member P is rotated. Similarly, a thin film T is formed on the film forming portion P1 on the other surface side.
To form a film.

Here, FIG. 18 shows an example of the thin plate member P and an example of the shape of the thin film T formed on the thin plate member P.

18 (a), 18 (b), 18 (c) and 18 (d).
Shows the planar shape of various thin plate members P used as, for example, a rotor electrode material of an automobile distributor. The thin plate member P has a thickness of 0.5 to 2 mm and a width of 10 to 4, for example.
It has a shape of 0 mm and a length of 15 to 60 mm,
A film forming portion P1 is provided at a position such as an uneven portion on one end side thereof, and one or two hole portions P2 are provided at an intermediate portion thereof. Then, (a), (b), and (c) of FIG.
The thin plate member P shown by is not bent, and its side surface shape is flat as shown in FIG. 18E, and the thin plate member P shown in FIG. It has a 90-degree bend at a point, and its side surface shape is a crank shape as shown in FIG. 18 (f).

The range of the film forming portion P1 of the thin plate member P shown in FIGS. 18 (a), 18 (b) and 18 (c) is as shown in FIG. 18 (g). From the valley to 1
The cross-sectional shape of the thin film T formed on one protrusion is, for example, as shown in (h) of FIG.
The film thickness of the edge portion a of the convex portion is about 1 to 15 μm, and the film thickness of the central portion of the end surface b of the convex portion is 5 μm or less.

[0007]

However, in the above-mentioned conventional thin film forming apparatus, when forming the thin film T, it is necessary to cover the portions other than the film forming portion P1 of the plurality of thin plate members P with the mask 4. There is a problem that it takes time to attach the mask 4 to the thin plate member P. In particular, when the thin plate member P is small or the shape is complicated, the mask 4
However, there is a problem that the work of mounting is complicated, work efficiency is reduced, and it is difficult to form a uniform thin film T with high accuracy on the film forming portion P1.

In addition, in the method of attaching the mask 4 to the thin plate member P and simply forming the thin film T, the shape of the thin film T formed on each surface of the film forming portion P1 of the thin plate member P cannot be changed. There was a problem that was virtually difficult.

The present invention has been made in order to solve the above problems, and a thin film can be easily formed without using a mask such as an adhesion-preventing plate at the ends of many thin plate members, and An object of the present invention is to provide a film forming method and a film forming apparatus for forming a thin film on an end portion of a thin plate member, which allows various thin films to be easily formed.

[0010]

According to a first aspect of the present invention, there is provided a method for forming a thin film on an end portion of a thin plate member in which a plurality of thin plate members are formed in a direction in which vaporized particles fly from a coating material. The plurality of thin plate members are arranged in a slanted manner so that the exposed parts are exposed, and vaporized particles are attached to the exposed film forming part using the thin plate members as a mask.

According to a second aspect of the present invention, there is provided a thin film forming apparatus for depositing thin film on end portions of a thin plate member. The thin film member is inserted into openings of the thin plate member to support the thin plate members, and a supporting member for supporting the thin plate members. A plurality of thin plate members supported by the members are diagonally overlapped and positioned, and a positioning member that exposes only the film forming portion of the thin plate member toward the flying direction side of the vaporized particles from the coating material. is there.

According to a third aspect of the present invention, there is provided a thin film forming apparatus for depositing a thin film on an end portion of a thin plate member, and a plurality of first pins arranged upright in a predetermined direction at a predetermined pitch, and a plurality of the first pins. 1
The plurality of thin plate members are arranged upright at a predetermined pitch in parallel with the arrangement direction of the pins and are engaged with the plurality of thin plate members arranged between the first pins to incline the thin plate members obliquely to each other. And a second pin that exposes the film forming portion of the thin plate member toward the flying direction side of the vaporized particles from the coating material.

According to a fourth aspect of the present invention, there is provided a film forming apparatus for depositing a thin film on an end portion of a thin plate member. The first pin is arranged upright in a circular shape at a predetermined pitch, and the inside of the first pin. Are arranged upright in a concentric circular shape at a predetermined pitch, engage a plurality of thin plate members arranged between the first pins, and position the thin plate members by inclining them obliquely. The first and second pins are supported while supporting the second pin that exposes the film forming portion of the thin plate member to the outside and the first and second pins.
The holder includes a support member that rotates about the center axis of the pin and moves the thin plate member toward the flying direction of the vaporized particles from the coating material.

According to a fifth aspect of the present invention, in addition to the configuration of the fourth aspect of the invention, the thin film forming apparatus on the end of a thin plate member prevents vaporized particles from flying from the coating material toward the thin plate member. The mask member to be controlled is arranged between the holder and the covering material.

According to a sixth aspect of the present invention, in addition to the structure of the fourth aspect of the invention, a thin film forming apparatus for depositing an end portion of a thin plate member moves at least one of a holder and a covering material, And a moving means for changing the distance between the thin plate member in the holder and the covering material.

According to a seventh aspect of the present invention, there is provided a film forming apparatus for depositing a thin film on an end portion of a thin plate member. The first pins are arranged upright in a circular shape at a predetermined pitch, and the inside of the first pins. Are arranged in a concentric circular shape upright at a predetermined pitch, and are engaged with a plurality of thin plate members arranged between the first pins, and the thin plate members are obliquely inclined with respect to each other for positioning. A second pin for exposing the film forming portion of the thin plate member to the outside, a support member for supporting the first and second pins, and a direction in which the support member is provided with the first and second pins. A plurality of holders each having a cylindrical base for supporting a plurality of them and rotating the support member about the central axis of the arrangement to move the thin plate member toward the direction in which the vaporized particles fly from the coating material. It is equipped with.

According to an eighth aspect of the present invention, in addition to the configuration of the seventh aspect of the invention, a thin film deposition apparatus for depositing on the end of a thin plate member is provided on the outside of a cylindrical stand of a holder in the radial direction. A plurality of coating materials that simultaneously evaporate vaporized particles are provided on the thin plate member side in the ingredient.

According to a ninth aspect of the present invention, there is provided a thin film forming apparatus for depositing a thin film on an end portion of a thin plate member. Holder insertion position, exhaust device, heating position, film formation position, cooling position,
A rotary pretreatment device that moves the holder to the take-out position,
The holder in the processing chamber at the film forming position of the rotary pretreatment apparatus is supported, the holder is moved to the film forming chamber side, and the holder is rotated in the film forming chamber to rotate the holder. A moving mechanism for moving the thin plate member while directing it toward the flying direction of the vaporized particles from the coating material, forming a thin film on the film forming portion of the thin plate member, and again positioning the holder in the processing chamber at the film forming position; It is equipped with.

[0019]

According to the first aspect of the invention, the plurality of thin plate members are obliquely arranged so that the film forming portions of the plurality of thin plate members are exposed with respect to the direction in which the vaporized particles fly from the coating material, and the thin plate members are arranged. Since vaporized particles are made to adhere to the exposed film forming portion using the member as a mask, a thin film can be formed at a time on the film forming portions of a plurality of thin plate members. In this case, each thin plate member acts as a mask of the film forming portion of the adjacent thin plate member, and it is not necessary to attach a special mask.

Also, in the second and third inventions, the operation is the same as that of the first invention.

According to the fourth aspect of the invention, the plurality of thin plate members are inclined and overlapped with each other between the first and second pins arranged in two rows of concentric circles. It is positioned in a ring shape and is supported by the support member. In this case, since the thin plate member is positioned with its film forming portion exposed to the outside, the supporting member is rotated with the film forming portion of the thin plate member facing the direction in which the vaporized particles fly from the covering material. As a result, a uniform thin film can be formed on the film forming portion of the thin plate member.

Further, in the fifth invention, in the case of the fourth invention, by moving the mask member, the thin plate member flies to the holder side which holds the thin plate member in a ring shape through the support member. It is possible to control the amount of vaporized particles of the material and the flying direction, and it is possible to form thin films of various shapes on the film forming portion of the thin plate member.

Further, in the sixth invention, in the case of the above-mentioned fourth invention, by changing the distance between the holder and the covering material, the evaporation flying from the covering material to the thin plate member side of the holder. The density of particles and the like can be changed.
Therefore, also in the sixth aspect, thin films of various shapes can be formed on the film forming portion of the thin plate member.

Further, in the seventh invention, in the case of the fourth invention, the holder has a cylindrical base, and a plurality of supporting members for supporting the first and second pins are provided around the cylindrical base. Since it is supported, the thin film can be formed on a large number of thin plate members at one time by rotating the cylindrical base.

Further, in the eighth invention, in the case of the seventh invention, since a plurality of coating materials are provided on the outer side in the radial direction of the holder, the plurality of coating materials fly at the same time. Due to the evaporated particles, a thin film can be rapidly formed on the thin plate member in the holder, and thin films having various shapes can be formed.

Further, in the ninth invention, in the rotary pretreatment device, the plurality of treatment chambers are rotationally moved so that the seventh treatment chamber is inserted into the treatment chamber at the holder insertion position.
In the invention, the holder is inserted, the processing chamber is evacuated at the exhaust position, the holder in the processing chamber is heated at the heating position, the processing chamber is adjacent to the film forming chamber at the film forming position, and the cooling position is at the cooling position. The holder in the processing chamber is cooled, and the holder is taken out of the processing chamber at the holder taking-out position. Then, when the processing chamber reaches the film forming position, the holder in the processing chamber is moved to the film forming chamber by the moving mechanism, and while the holder is rotated in the film forming chamber, a thin film is formed on the thin plate member of the holder. To form a film. Then, the holder is again positioned in the processing chamber at the film forming position by this moving mechanism.

[0027]

Embodiments of the present invention will be described below with reference to the drawings. Example 1. The first embodiment is an embodiment according to the first invention of the present invention. 1 is a side view of a film forming apparatus for explaining a method of forming a thin film on an end portion of a thin plate member according to Embodiment 1 of the present invention.

In the figure, 10 is a coating material as an evaporation source which is rotated in the direction of the arrow, 11 is a laser beam with which the coating material 10 is irradiated from a predetermined direction, and 12 is an upward direction which is a predetermined direction due to the irradiation of the laser beam 11. The evaporated particles of the coating material 10 are scattered. The plurality of thin plate members P that form the thin film T on the film forming portion P1 at one end are oblique to each other so that the film forming portion P1 is exposed with respect to the direction in which the vaporized particles 12 from the coating material 10 fly. They are arranged in a displaced state. The covering material 10, the thin plate member P and the like are arranged in a vacuum chamber (not shown).

Next, a method for forming this thin film will be described. First, the plurality of thin plate members P are arranged in the vacuum chamber in a state in which the plurality of thin plate members P are obliquely displaced from each other so that the film forming portion P1 is exposed in the flying direction of the vaporized particles 12 from the coating material 10. Then, the inside of the vacuum chamber is evacuated to a predetermined degree of vacuum. Then, when the coating material 10 is irradiated with the laser beam 11, the vaporized particles 12 of the coating material 10 fly to the thin plate member P side, and the thin film T is formed in a predetermined shape on the film forming portion P1 of the thin plate member P. . In this case, the plurality of thin plate members P are arranged in a state in which the film forming portion P1 side is exposed with respect to the flying direction of the evaporated particles 12 and is slanted with respect to each other.
The film forming portions P1 of the thin plate member P act as masks to each other, and a special mask such as a deposition preventive plate is not required to form the thin film T on the film forming portion P1 which is one end of the thin plate member P. Become. Therefore, a mask such as a special deposition preventive plate is used for the film forming portion P.
It is not necessary to attach the thin plate member P to each thin plate member P so that 1 is exposed, and the thin film T can be deposited on the thin plate member P quickly and easily at low cost.

Further, in this case, since the plurality of thin plate members P are arranged so as to be overlapped with each other while being slightly shifted, a large number of thin plate members P are faced at a time so as to face the direction in which the vaporized particles 12 fly.
Can be arranged, the size of the device can be reduced, and also in this respect, the film formation of the thin film T can be accelerated. Further, when the thin film T is formed on the other surface side of the film forming portion P1, these thin plate members P may be tilted in the opposite direction as a whole as indicated by the chain line in the figure. The thin film T can be formed on the surface side quickly and easily.

Example 2. The second embodiment is an embodiment according to the second invention of the present invention. Second Embodiment FIG. 2 is a side view showing a thin film deposition apparatus on an end portion of a thin plate member according to a second embodiment of the present invention.

In the figure, 13 is a rod-shaped support member which is inserted into a hole P2 provided in the thin plate member P as an opening as shown in FIG. 18 to closely support a plurality of thin plate members P, and 14 Aligns a plurality of thin plate members P supported by the support member 13 in an oblique manner and exposes only the film forming portion P1 on one end side toward the flying direction side of the vaporized particles 12 from the coating material 10. It is the positioning member 14.
The other structure is the same as that of the film forming apparatus of the first embodiment.

Next, the operation of the second embodiment will be described. First, the support member 13 is inserted into the hole P2 of the thin plate member P so that the support member 13 supports a predetermined number of thin plate members P, and the pair of positioning members 14 sandwiches the thin plate member P from both sides to position and fix these thin plate members P. To do. At this time, these thin plate members P are positioned by the positioning member 14 and supported by the support member 13 in a state in which they are closely attached to each other and are stacked obliquely (to the right in the drawing). The film forming portion P1 on the one end side of each thin plate member P is exposed from the adjacent thin plate member P, and the film forming portion P1 covers the covering material 10.
The exposed particles 12 are exposed to the side in the flying direction.
Therefore, a thin film is formed in the same manner as in Example 1 above.
Further, if a thin film is required to be formed on the other surface side as well, the positioning member 14 is rotated so as to move downward in the drawing. Along with the rotation of the positioning member 14, the thin plate member P is also supported by the support member 13 so as to be tilted downward in the drawing. After that, when the coating material 10 is irradiated with the laser beam 11, a thin film is also formed on the film forming portion P1 on the other surface side of the thin plate member P.

As described above, according to the second embodiment, it is possible to obtain the same effect as that of the first embodiment, but particularly in this film forming apparatus, the supporting member in a state where the plurality of thin plate members P are closely attached to each other. Since the positioning member 14 is tilted while being supported by 13, and these thin plate members P are slanted, positioning of the thin plate member P becomes easy. Further, in this case, since the inclination angle θ of the oblique thin plate member P can be easily changed, the range of the film forming portion P1 of the thin plate member P can be easily changed. Furthermore, the positioning member 14
Since the direction of the thin plate member P can be easily changed by rotating, the thin film T can be formed on the film forming portion P1 on the other surface side of the thin plate member P quickly and easily.

Example 3. The third embodiment is an embodiment according to the third invention of the present invention. Third Embodiment FIG. 3 is a side view showing a thin film deposition apparatus on the end portion of a thin plate member according to a third embodiment of the present invention.

In the figure, reference numeral 15 is a first pin as a first pin, which is arranged in the flying space of the vaporized particles 12 of the coating material 10 in a horizontal direction at a predetermined pitch, and 16 is the first pin. A plurality of pins are arranged below the pin 15 in parallel with the arrangement direction of the first pin 15 with a predetermined pitch.
5 are engaged with a plurality of thin plate members P arranged one by one, the thin plate members P are inclined to each other in an oblique manner, and the film forming portion P1 of the thin plate member P is evaporated particles from the covering material 10. 12
2nd pin as a 2nd pin exposed toward the flying direction side. The other structure is the same as that of the thin film forming apparatus of the first embodiment.

This thin film forming apparatus can also obtain the same effect as the thin film forming apparatus of the first embodiment, but in particular, in this thin film forming apparatus, the thin plate member P has two first pins. 15 and at least one second pin 16 are diagonally positioned, and the adjacent thin plate members P are arranged in a state of being displaced by the pitch of the first and second pins 15 and 16,
The plurality of thin plate members P can be easily positioned by shifting them obliquely in a state of being separated by the diameters of the first and second pins 15 and 16. In this case, the first and second pins 15, 1
By changing the diameter and pitch of 6, the oblique thin plate member P
Since the inclination angle θ can be easily changed, the range of the film forming portion P1 of the thin plate member P can be easily changed.

Furthermore, since the direction of the thin plate member P can be easily changed by moving the whole of the plurality of second pins 16 in the arrangement direction of the first pins 15, the film on the other surface side of the thin plate member P can be easily changed. The thin film T can be quickly and easily formed on the forming portion P1.
Can be formed into a film. In this case, since the adjacent thin plate members P do not come into contact with each other, the thin films T on the one surface side formed in the previous step are not damaged. Even if the thin plate member P is of the bending type shown in (d) and (f) of FIG. 18, as shown in FIG. 4, the thin plate member P is formed by the first and second pins 15 and 16. P can be positioned by inclining each other obliquely, and the film forming portion P1 is covered with the coating material 10
Of the vaporized particles 12 can be directed toward the flying direction side.

Example 4. The fourth embodiment is an embodiment according to the fourth invention of the present invention. 5 is a side sectional view showing a thin film forming apparatus according to Embodiment 4 of the present invention, FIG. 6 is a side sectional view showing a thin plate member holding device of this thin film forming apparatus, and FIG. VII is a sectional view taken in the direction of arrow VII, FIG. 8 is an enlarged view of part A of FIG. 7, and FIG. 9 is VII of FIG.
FIG. 7 is a sectional view taken along line VII.

In the figure, reference numeral 17 indicates that the inside is kept in a vacuum state, the covering material 10 is arranged on the lower side, and
A film forming chamber in which an entrance window 17a for the laser beam 11 is formed on the lower side, and 30 is arranged on the upper side in the film forming chamber 17, holds a plurality of thin plate members P in a ring shape and rotates. It is a thin plate member holding device.

The thin plate member holding device 30 will be described in detail. In the drawing, reference numeral 31 denotes a first pin as a first pin arranged upright in a circular shape at a predetermined pitch,
32 are arranged concentrically inside the first pin 31 so as to stand up at a predetermined pitch, and engage with the thin plate members P arranged one by one between the first pins 31 to form the thin plate members. The second pins are second pins as second pins for exposing the film forming portion P1 of the thin plate member P to the outside by inclining P to each other obliquely and positioning them in a ring shape, and 33 are supports for supporting the second pin 32. The first ring member, 34 as a member, supports the first pin 31, is arranged so as to face the first ring member 33, and is arranged at the central axis L1 of the first and second pins 31, 32.
It is a second ring member as a support member rotatable about the center. The arrangement central axis L1 also serves as the central axis of the first and second ring members 33, 34.

Reference numeral 35 is a fixing bolt for fixing the first ring member 33 and the second ring member 34, and 36 is a first and a second ring member.
A fixed shaft that rotatably supports the ring members 33 and 34, 3
Reference numeral 7 denotes the rotational force of the motor 38 for the first and second ring members 3
It is a rotating member that transmits to 3, 34. Where the first pin 3
A holder for the thin plate member P is formed by the second ring member 34 having 1 and the first ring member 33 having the second pin 32, and at least this holder in the thin plate member holding device 30 is a film forming chamber. It is supposed to be arranged in 17. In addition,
The other structure is the same as that of the thin film forming apparatus of the first embodiment.

Next, the operation of the thin film forming apparatus according to the fourth embodiment will be described. First and second pins 31,
The thin plate member P supported by the first and second ring members 33 and 34 in a ring shape via the film forming portion P
1 are exposed to the outside and are positioned so as to be inclined with respect to each other.
The vaporized particles 12 of the coating material 10 are attached to the film forming portion P1 of the vaporized particles 12 positioned to face the flying direction of the vaporized particles 12 to form the thin film T. In this case, since the first and second ring members 33 and 34 rotate around the fixed shaft 36 at a constant speed via the motor 38 and the rotating member 37, they are held around the first and second ring members 33 and 34. All the thin plate members P that are formed pass through the vaporized particles 12 flying from the coating material 10 for a certain period of time. Therefore, a uniform thin film T is formed on the film forming portions P1 of all the thin plate members P held by the first and second ring members 33 and 34.

The film forming portion P1 on the one surface side of the thin plate member P
When the film formation of the thin film T on the first ring member 34 is completed, the fixing bolt 35 is loosened, the second ring member 34 is rotated by a predetermined angle with respect to the first ring member 33, and the first ring member is rotated about the arrangement central axis L1.
The pin 31 is rotated by a predetermined angle. By this,
The first pin 31 is displaced from the second pin 32,
The plurality of thin plate members P supported between the first pin 31 and the second pin 32 are tilted in opposite directions and positioned with the other surface side of the film forming portion P1 exposed to the outside. Therefore, in this state, the first and second ring members 33, 34
When is rotated, the thin film T is easily formed on the other surface side of the film forming portion P1 of the thin plate member P.

As described above, in the thin film forming apparatus according to the fourth embodiment, the plurality of thin plate members P are attached to the first and second pins 3.
Since the film forming portion P1 is positioned in a ring shape so as to be exposed to the outside via the first and second ring members 32, and the first and second ring members 33, 34 are rotated at a constant speed. The thin film T having the same shape can be uniformly formed on the film forming portions P1 of all the thin plate members P supported by the first and second pins 31 and 32. In this case, by changing the rotation speeds of the first and second ring members 33, 34, the thickness of the thin film T formed on the film forming portion P1 of the thin plate member P can be easily changed. For example, in the case of the first and second ring members 33 and 34 having an outer diameter of 80 to 100 mm, the rotation speed is appropriately set within the range of 5 to 30 rpm.

Further, since the orientations of all the thin plate members P can be changed at a time only by rotating the second ring member 34 with respect to the first ring member 33 by a predetermined angle, the film on the other surface side of the thin plate member P can be changed. The thin film T can be easily and quickly formed on the forming portion P1. Further, by changing the pitch and the pin diameter of the first pin 31 and the second pin 32, the size of the portion exposed to the outside of the thin plate member P and the thin plate member P in the flying direction of the vaporized particles 12 of the coating material 10 can be changed. The inclination angle and the interval between the adjacent thin plate members P can be easily changed, and the thin film T having various shapes can be easily formed on the film forming portion P1 of the thin plate member P. Since the thin plate member P is supported by the pins, the thin film T can be similarly formed on the bent type thin plate member P shown in (d) and (f) of FIG. Of course, it is possible to obtain the same effect as the thin film forming apparatus of the first embodiment.

A heater is provided near the fixed shaft 36 of the thin plate member holding device 30, and the thin plate member P is provided by this heater.
May be heated, and in this case, the film forming portion P1
The adhesion of the thin film formed on the substrate is improved.

Example 5. The fifth embodiment is an embodiment according to the fifth and sixth inventions of the present invention. FIG. 10 is a side view showing a thin film forming apparatus according to a fifth embodiment of the present invention.

In the figure, reference numeral 18 denotes a mask member arranged between the coating material 10 in the film forming chamber 17 and the thin plate member holding device 30. The mask member 18 is movable in the direction of the arrow in the figure, and has a function of partially blocking the flow of the vaporized particles 12 of the coating material 10 toward the thin plate member holding device 30 side.
Further, in this thin film forming apparatus, the irradiation angle and the irradiation position of the laser beam 11 with respect to the coating material 10 are changed to evaporate particles 1 from the coating material 10 to the thin plate member P side of the thin plate member holding device 30.
It is possible to change the flight direction and the flight density of 2. The other structure is the same as that of the thin film forming apparatus of the fourth embodiment.

As described above, in this thin film forming apparatus, the movement amount of the evaporation particles 12 from the coating material 10 to the thin plate member P side in the thin plate member holding device 30 is controlled by moving the mask member 18. Therefore, the amount and angle of the vaporized particles 12 flying to the film forming portion P1 side of the thin plate member P can be limited accordingly, and the shape of the thin film T formed on the thin plate member P can be easily changed. Further, in this thin film forming apparatus, the irradiation angle and the irradiation position of the laser beam 11 with respect to the coating material 10 can be changed to easily change the flying direction of the vaporized particles 12 and the like. It is possible to change the amount and angle of the vaporized particles 12 flying to the film forming portion P1 side of P, and easily change the shape of the thin film T formed on the thin plate member P.

Further, at least one of the thin plate member holding device 30 and the covering material 10 can be moved through the moving means, and the thin plate member P and the covering material 10 in the thin plate member holding device 30 can be moved.
The distance between and may be changeable. In this case, since the density of the vaporized particles 12 flying from the coating material 10 to the thin plate member P side in the thin plate member holding device 30 can be easily changed, the shape of the thin film T on which the thin plate member P is formed can also be easily changed.

Further, it is caused by variously changing the size and movement amount of the mask member 18, the irradiation angle and irradiation position of the laser beam 11 with respect to the covering material 10, and the distance between the thin plate member holding device 30 and the covering material 10. The behavior of the evaporated particles 12 may be traced by a computer simulation, and a desired thin film may be formed on the film forming portion P1 of the thin plate member P based on the traced result. In this case, the first
Alternatively, the inclination angle of the thin plate member P held between the second pins 31 and 32 may be added.

In this thin film forming apparatus, the same effect as that of the thin film forming apparatus of the fourth embodiment can be obtained.

Example 6. The sixth embodiment is an embodiment according to the seventh invention of the present invention. 11 is a side sectional view showing a thin plate member holding device of a thin film forming apparatus according to a sixth embodiment of the present invention.

In the figure, reference numeral 40 denotes a thin plate member holding device which is disposed on the upper side in the film forming chamber 17 and which supports a plurality of thin plate members P in a ring shape in a plurality of rows and rotates. The thin plate member holding device 40 will be described in detail below. In the drawing, 41 is a first pin as a first pin that is arranged upright in a circular shape at a predetermined pitch, and 42 is the first pin 41.
Are arranged upright in a concentric circular shape at a predetermined pitch inside,
By engaging a plurality of thin plate members P arranged one by one between the first pins 41, the thin plate members P are inclined with respect to each other and positioned in a ring shape, and a film is formed on the thin plate member P. A second pin as a second pin for exposing the portion P1 to the outside,
Reference numeral 43 is a ring member as a support member for supporting the first pin 41 and the second pin 42 on its side surface, and 44 is a cylindrical stand for positioning and holding the ring member 43 on its outer peripheral surface in a plurality of rows. The central axes of the ring member 43 and the cylindrical stand 44 are the first
It coincides with the central axis L2 of the arrangement of the pins 41 and the second pins 42.

Reference numeral 45 designates a cylindrical holder composed of a plurality of (in this case, five) ring members 43 having the first and second pins 41 and 42, a cylindrical stand 44, and the like, and 46 is provided on the outer peripheral surface. It is a rotating shaft that supports and rotates the holder 45 and rotates the holder 45 at a predetermined speed. The holder 45 is slidable in the front-rear direction with respect to the rotary shaft 46, and is easily attached to and removed from the rotary shaft 46. Reference numeral 47 is a rotary member that transmits the rotation of the motor 48 to the rotary shaft 46 side, and 49
Rotatably supports the rotating member 47 via a bearing 50, and moves in the direction of the arrow shown in the drawing to rotate the rotating shaft 47.
6 is a movement axis that can move back and forth. 51 is a holder 4
5 is a moving mechanism that supports and rotates 5 and moves back and forth, such as a rotating shaft 46, a rotating member 47, and a motor 4.
8, a moving shaft 49 and the like. 52 is a heater for heating the thin plate member P. The other structure is the same as that of the thin film forming apparatus of the fifth embodiment.

Next, the operation of this thin film forming apparatus will be described. The holder 45 of the thin plate member holding device 40 is arranged in the film forming chamber 17, and is held in a ring shape on the first row (for example, the left end in the drawing) of the holder 45 by the movement of the moving shaft 49. The holder 45 is aligned with P so that the vaporized particles 12 from the coating material 10 fly. Then, when the holder 45 is rotated via the motor 48, the rotating member 47, and the rotating shaft 46, the film forming portion P1 of the thin plate member P held in the ring shape in the first row of the holder 45. A uniform thin film T is formed. When the thin film T is formed on the thin plate member P in the first row, the moving shaft 4
9 is moved forward by one pitch, and the thin plate member P, which is held in a ring shape in the second row of the holder 45, is aligned with the flying direction of the vaporized particles 12 of the coating material 10, and then this holder is held. By rotating 45, the thin film T is formed on the film forming portion P1 of the thin plate member P in the second row.

Similarly, the third row and the fourth row of the holder 45.
Thin plate members P that are held in a ring shape in the fifth and fifth rows
After forming the thin film T on the film forming portion P1 of (1), the moving shaft 49 is moved to take out the holder 45 from the film forming chamber 17. Then, after replacing the thin plate member P with the holder 45 so that the other surface side of the film forming portion P1 is exposed to the outside, the holder 45 is put into the film forming chamber 17 again, and the same operation is repeated.

As described above, also in this thin film forming apparatus, the same effect as that of the thin film forming apparatus of the fifth embodiment can be obtained. In particular, in this thin film deposition apparatus, the holder 45 holds the thin plate members P in a plurality of rows positioned in a ring shape.
And the holder 45 is attached to the moving shaft 4.
Since it can be moved back and forth by means of 9, the thin film T can be deposited on a large number of thin plate members P at once by the thin film deposition apparatus of the fifth embodiment. In this case, like the thin plate member holding device 30 of the fifth embodiment, the first pin 4 is
If the 1 and the second pin 42 can be moved relative to each other,
The front and back of the thin plate member P can be easily rotated, and the thin film T can be formed on both surfaces of the film forming portion P1 of the thin plate member P more quickly.

As shown in FIG. 12, three ring members 43 holding the first pin 41 and the second pin 42 may be fixed to the cylindrical base 44. In this case, as shown in FIG. 13, if the third pin 53 is provided between the first pin 41 and the second pin 42, the bending type thin plate member P can be easily supported.

Example 7. The seventh embodiment is an embodiment according to the eighth invention of the present invention. 14 is a side sectional view showing a thin film forming apparatus according to Embodiment 7 of the present invention. In the figure, reference numeral 19 denotes a film forming chamber in which a vacuum state is maintained, two coating materials 10 are provided on the lower side, and an entrance window 19a for the laser beam 11 is formed on both sides of the lower side. is there. A holder 45 (for example, a holder that positions and holds the ring-shaped thin plate members P in five rows) of the thin plate member holding device 40 is positioned on the upper side of the film forming chamber 19, and the film is formed. Covering material 10 and holder 4 in chamber 19
A mask member 18 capable of partially blocking the vaporized particles 12 of the coating material 10 moving in the direction of the arrow in the drawing and flying toward the holder 45 is disposed between the mask member 18 and the nozzle 5.

In this thin film forming apparatus, two coating materials 1
Since the vaporized particles 12 of the coating material 10 can be made to fly from 0, the thin film T can be simultaneously formed on the thin plate member P positioned in the two rows of the ring shape in the holder 45, and the thin plate can be formed. The thin film T can be rapidly formed on the member P. Further, if a thin film T is formed by the vaporized particles 12 from the two coating materials 10 on the thin plate member P positioned in a ring in the holder 45, the thick thin film T is short. The film can be formed in a short time. In this case, two kinds of thin films T can be formed on the thin plate member P by changing the type of the covering material 10. Further, the mask member 1
By moving 8 the covering material 1 on the thin plate member P side
Since the flying amount and the flying direction of the evaporated particles 12 from 0 can be limited, the size and shape of the thin film T formed on the film forming portion P1 of the thin plate member P can be easily changed.

If the number of coating materials 10 is increased, the above effect can be further enhanced. It should be noted that this thin film deposition apparatus can also achieve the same effects as the thin film deposition apparatus of the sixth embodiment.

Example 8. The eighth embodiment is an embodiment according to the ninth invention of this arrangement. 15 is a side sectional view showing a thin film forming apparatus according to Embodiment 8 of the present invention, and FIG. 16 is a vertical sectional view of FIG.

In the figure, 20 is a cylindrical rotary pretreatment device that is rotatably supported on a base 21, and 22 are a plurality (at a predetermined pitch) around a rotary shaft 20a of the rotary pretreatment device 20. In the case of 6 processing chambers are formed. The processing chamber 22 holds the holding member 45 of the thin plate member holding device 40 therein, and the first position a, the second position b,
This processing chamber 22 is moved to the third position C and the fourth position D.
Various processes are performed on the holder 45 and the thin plate member P thereof.

That is, when the processing chamber 22 is moved to the first position B, the holder 45 is inserted into the inside thereof for preliminary evacuation, and when the processing chamber 22 is moved to the second position B, the holder 45 is moved. The inner thin plate member P is preheated. When the processing chamber 22 is moved to the third position c, the holder 45 is moved in and out of the film forming chamber side, and the holder 4 is held.
When the film formation of the thin film T on the thin plate member P in 5 is completed,
When the holder 45 is cooled and the processing chamber 22 is moved to the fourth position D, the holder 45 is taken out.
Therefore, the first position (i) serves as a holder insertion position and an exhaust position, the second position (b) serves as a heating position, the third position (c) serves as a film forming position and a cooling position, and the fourth position (d) serves as a holder removal position. Become.

The film forming chamber 23 is provided on one side of the processing chamber 22 positioned at the third position C, is kept in a vacuum state, and has incident windows 23a for the laser beam 11 formed on both sides thereof. Is. Two coating materials 10 are rotatably arranged on the lower side of the film forming chamber 23. 24
Is a laser device for irradiating the coating material 10 in the film forming chamber 23 with the laser beam 11, 25 is a waiting chamber provided on the opposite side of the film forming chamber 23 of the processing chamber 22 positioned at the third position C, and 26 is This is a support pedestal having a function of supporting the moving mechanism 51 of the thin plate member holding device 40 and moving the moving shaft 49 of the moving mechanism 51 back and forth.

The tip of the moving mechanism 51 (rotating shaft 4
6) can be moved between the standby chamber 25 and the film forming chamber 23 via the processing chamber 22 positioned at the third position C. In this case, the film forming chamber 23 and the processing chamber 22
Then, the opening and closing doors provided in these are opened and closed, respectively. Further, the configurations of the holder 45 and the moving mechanism 51 of the thin plate member holder 40 are the same as those of the thin film forming apparatus of the sixth embodiment.

Next, the operation of this thin film forming apparatus will be described. After inserting the holder 45 in which the thin plate members P for forming the thin film T are set in five rows in a ring shape into the processing chamber 22 at the first position B of the rotary pretreatment device 20, preliminary evacuation is performed, The inside of the processing chamber 22 is set to a vacuum state to some extent.
When the processing chamber 22 reaches the second position B by the rotation of the rotary pretreatment device 20, preheating is performed and the thin plate member P held by the holder 45 in the processing chamber 22 is heated. .

Next, when the processing chamber 22 reaches the third position C, the opening / closing doors of the processing chamber 22 and the film forming chamber 23 are opened, and the rotary shaft 46 of the moving mechanism 51 in the standby chamber 25 is opened.
Is in the third position C as the moving shaft 49 moves forward.
5, the holder 45 is fixed to the rotary shaft 46. After that, the moving shaft 49 further advances, and the holder 45 is positioned in the film forming chamber 23. This film forming chamber 2
In No. 3, further necessary heating (main heating) of the thin plate member P in the holder 45 is performed by the heater 52, and further evacuation is performed. Next, the laser light 11 is emitted from the two laser devices 24 and the rotary shaft 4
The holder 45 is rotated via 6 and the thin film T is sequentially formed on the film forming portion P1 of the thin plate member P in the holder 45.

When the film formation of the thin film T on the thin plate member P in the holder 45 is completed, the moving shaft 49 of the moving mechanism 51 retracts,
After housing the holder 45 in the processing chamber 22 at the third position C, the moving shaft 49 is further retracted to move the rotating shaft 46 into the standby chamber 25. Then, when the opening / closing doors of the processing chamber 22 and the film forming chamber 23 are closed, cooling of the holder 45 inside the processing chamber 22 is started. Continuing,
When the processing chamber 22 moves to the fourth position D, the holder 45 in the processing chamber 22 is taken out, and the film forming operation of the thin film T on the thin plate member P of the holder 45 is completed. In this case, since the rotary pretreatment device 20 is provided with the six processing chambers 22, the above-described respective works for the holder 45 are simultaneously performed in the six processing chambers 22, respectively.

As described above, the rotary pretreatment apparatus 20 is provided with a plurality of processing chambers 22, and the holders 45 and the thin plate members P in the holders 45 are continuously processed in each processing chamber 22. Therefore, the thin plate member P can be quickly processed even for the plurality of holders 45, and the thin film T can be deposited on a large number of thin plate members P in a short time. It should be noted that this thin film deposition apparatus can also achieve the same effects as the thin film deposition apparatus of the sixth embodiment.

Here, in the thin film forming apparatus of the eighth embodiment, the holder 45 is inserted into and taken out from one processing chamber 22, but the holding member 45 is inserted into and removed from two or more processing chambers 22. Alternatively, these operations may be performed at the same time.
Further, depending on the type of the thin film T to be formed, preheating and main heating in the film forming chamber 23 are unnecessary. Further, the holder 45 does not necessarily have to hold the thin plate members P in a ring shape over five rows, and the thin plate members P may be held in a ring shape only in one row. Further, in the processing chamber 22, the preheating may be followed by the main heating.

In the first to eighth embodiments, the physical vacuum deposition method (energy is applied to the coating material 10 in a predetermined direction in a vacuum to evaporate particles 1 of the coating material 10).
As a thin film forming method for forming a thin film T by causing 2 to fly in a predetermined direction and attaching the evaporated particles 12 to a thin film forming material (thin plate member P), a laser vapor deposition method using a laser beam 11 was used. Alternatively, an electron beam evaporation method, a resistance heating evaporation method, or a sputtering method may be used. It is also possible to use a process under reduced pressure or normal pressure such as a thermal spraying method or addition of nozzle injection.

As the laser used in the laser deposition method, various lasers such as CO ₂ laser, Nd: YAG laser and excimer laser can be used.

Further, as an example of the thin plate member P for forming the thin film T on the end portion, a vane plate material for a compressor (a wear resistant film is formed on the tip) and a contact metal fitting (conductive wear resistant material on the tip) are used. Forming a film).

Further, as the covering material 10, SiO ₂ , A
It may be a ceramic material such as 1 ₂ O ₃ , SiC, TiN, or WS ₂ , a metal material such as Cu, Al, Fe, Cr, or Ni, an organic material, or a composite material thereof.

[0078]

Since the present invention is constituted as described above, it has the following effects.

According to the first aspect of the present invention, the plurality of thin plate members are arranged so as to be slanted so that the film forming portions of the plurality of thin plate members are exposed with respect to the flying direction of the vaporized particles from the coating material. Since the vaporized particles are attached to the exposed film forming portion using the thin plate member as a mask, a thin film can be easily and quickly formed without a mask at the ends of many thin plate members.

According to the second aspect of the present invention, the support member which is inserted into the openings of the plurality of thin plate members to support these thin plate members and the plurality of thin plate members supported by the support members are inclined. Since there is a positioning member that positions the film forming portions of the thin plate members toward the flying direction side of the vaporized particles from the coating material, there is no mask at the ends of many thin plate members. However, thin films of various shapes can be formed easily and quickly, and the apparatus can be made compact.

According to the third aspect of the present invention, a plurality of first pins arranged upright in a predetermined direction at a predetermined pitch, and a predetermined number of pins parallel to the direction in which the first pins are arranged. A plurality of thin plate members arranged upright at a pitch are engaged with a plurality of thin plate members arranged between the first pins, and the thin plate members are inclined and positioned relative to each other. Since the forming portion has the second pin that exposes toward the flying direction side of the vaporized particles from the coating material, thin films of various shapes can be easily and quickly formed without a mask at the ends of many thin plate members. The film can be formed, and the device can be downsized.

According to the fourth aspect of the present invention, the first pin is arranged upright in a circular shape at a predetermined pitch, and the first pin is arranged concentrically inside the first pin at a predetermined pitch. And are engaged with a plurality of thin plate members disposed between the first pins to incline and position the thin plate members with respect to each other, and the film forming portion of the thin plate members is directed outward. The second pin to be exposed and the first and second pins are supported, and the thin plate member is rotated about the central axis of the arrangement of the first and second pins to cause the thin plate member to fly in the direction in which the vaporized particles come from the coating material. Since a holding member configured to have a supporting member that moves toward the side is provided, it is possible to easily and quickly form thin films of various shapes without a mask at the ends of many thin plate members, The device can also be small. Further, in this case, since the thin plate member is rotationally moved, a uniform thin film can be rapidly formed.

According to the fifth aspect of the present invention, the fourth aspect
In the invention described above, since the mask member for controlling the flying of the vaporized particles from the coating material to the thin plate member side is disposed between the holder and the coating material, the same effect as the fourth invention can be obtained. In addition to the provision of the mask member, thin films of various shapes can be easily formed on the film forming portion of the thin plate member.

According to the sixth aspect of the present invention, the fourth aspect
In the invention described above, since at least one of the holder and the covering material is moved, and a moving means for changing the distance between the thin plate member and the covering material in the holder is provided, the same effect as that of the fourth invention is provided. In addition, since the moving means is provided, thin films of various shapes can be easily formed on the film forming portion of the thin plate member.

According to the seventh aspect of the present invention, the first pin is arranged upright in a circular shape at a predetermined pitch, and the first pin is arranged concentrically inside the first pin at a predetermined pitch. Are engaged with a plurality of thin plate members disposed between the first pins, the thin plate members are inclined and positioned relative to each other, and the film forming portion of the thin plate member is outwardly positioned. A second pin to be exposed to the outside, a support member that supports the first and second pins, a plurality of the support members in the direction of the center axis of the first and second pins, and the center axis of the arrangement. Since the supporting member is provided with a cylindrical base that rotates the support member around the center and moves the thin plate member toward the flying direction side of the particles from the coating material, the same as the fourth invention. It is possible to obtain various effects, and the holder is provided with a cylindrical stand, Min which is supported a plurality of support members to the base, a plurality of thin plate members can be a thin film more quickly.

According to the eighth aspect of the present invention, the seventh aspect
In the invention described above, a plurality of coating materials are provided on the outer side in the radial direction of the cylindrical base of the holder so that the thin plate members in the holder simultaneously come into contact with the vaporized particles, so that the same effect as the seventh aspect of the invention can be obtained. In addition, since a plurality of coating materials are provided, thin films of various shapes and types can be easily formed on the film forming portion of the thin plate member.

According to the ninth aspect of the present invention, a plurality of processing chambers for accommodating the holders are provided and rotated about the rotation axis, and the processing chambers are respectively provided at the holder insertion position, the exhaust device, the heating position,
The rotary pretreatment device that moves to the film forming position, the cooling position, and the holder take-out position, and the holder in the processing chamber at the film forming position of the rotary pretreatment device are supported, and the holder is attached to the film forming chamber side. And the holder is rotated in the film forming chamber to move the thin plate member in the holder toward the direction in which the vaporized particles from the coating material come in, and a thin film is formed on the film forming portion of the thin plate member. After the film formation, since the holder is provided with a moving mechanism for positioning the holder again in the processing chamber at the film forming position, the same effect as the seventh invention can be obtained, and the rotary pretreatment device and the moving mechanism are provided. As a result, the plurality of holders can be quickly handled, and a large number of thin plate members can be used to quickly form a thin film.

[Brief description of drawings]

FIG. 1 is a side view of a thin film deposition apparatus for explaining a thin film deposition method according to a first embodiment of the present invention.

FIG. 2 is a side view showing a thin film forming apparatus according to a second embodiment of the present invention.

FIG. 3 is a side view showing a thin film forming apparatus according to a third embodiment of the present invention.

FIG. 4 is a view showing a state in which another thin plate member is attached to the thin film forming apparatus of FIG.

FIG. 5 is a side sectional view showing a thin film forming apparatus according to a fourth embodiment of the present invention.

6 is a side sectional view showing a thin plate member holding device of the thin film deposition apparatus of FIG.

7 is a sectional view taken along the line VII-VII in FIG.

FIG. 8 is an enlarged view of part A in FIG.

FIG. 9 is a VII-V of FIG. 6 in a state of holding a thin plate member.
FIG. 2 is a sectional view taken along line II.

FIG. 10 is a side sectional view showing a thin film forming apparatus according to a fifth embodiment of the present invention.

FIG. 11 is a side sectional view showing a thin plate member holding device of a thin film forming apparatus according to a sixth embodiment of the present invention.

FIG. 12 is a side sectional view showing a thin plate member holding device of a thin film deposition apparatus according to a modified embodiment of the sixth embodiment of the present invention.

13 is a view taken along arrow XIII-XIII in FIG.

FIG. 14 is a side sectional view showing a thin film forming apparatus according to a seventh embodiment of the present invention.

FIG. 15 is a side sectional view showing a thin film forming apparatus according to an eighth embodiment of the present invention.

FIG. 16 is a vertical sectional view showing a thin film forming apparatus according to an eighth embodiment of the present invention.

FIG. 17 is a side sectional view showing a conventional thin film forming apparatus.

FIG. 18 is a diagram showing a specific example of a thin plate member and the shape of a thin film formed on the thin plate member, and FIGS.
(C) and (d) are plan views of the thin plate member, (e) is (a),
(B) is a side view of the thin plate member of (c), (f) is a side view of the thin plate member of (d). (G) is (a), (b),
(C) is an enlarged view around the film forming portion of the thin plate member, (h) is a cross-sectional view taken along line XVIII-XVIII of (g).

[Explanation of symbols]

 10 Coating Material 12 Evaporated Particles 13 Supporting Member 14 Positioning Member 15 First Pin (First Pin) 16 Second Pin (Second Pin) 18 Mask Member 20 Rotating Pretreatment Device 22 Processing Chamber 23 Film Forming Chamber 31 1 pin (1st pin) 32 2nd pin (2nd pin) 33 1st ring member (supporting member) 34 2nd ring member (supporting member) 41 1st pin (1st pin) 42 2nd pin (Second pin) 43 Ring member (supporting member) 44 Cylindrical stand 45 Holding tool 51 Moving mechanism L1 Disposing central axis L2 Disposing central axis P Thin plate member P1 Film forming portion P2 Hole (opening) T Thin film Y 1st position (holding tool insertion position, exhaust position) b 2nd position (heating position) c 3rd position (film forming position, cooling position) d 4th position (holding tool removal position)

─────────────────────────────────────────────────── ───

[Procedure amendment]

[Submission date] December 16, 1993

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0073

[Correction method] Change

[Correction content]

Here, in the thin film forming apparatus of the eighth embodiment, the holder 45 is inserted into and taken out from one processing chamber 22, but the holding member 45 is inserted into and removed from two or more processing chambers 22. Alternatively, these operations may be performed at the same time.
Further, depending on the type of the thin film T to be formed, preheating and main heating in the film forming chamber 23 are unnecessary. Further, the holder 45 does not necessarily have to hold the thin plate members P in a ring shape over five rows, and the thin plate members P may be held in a ring shape only in one row. Further, in the processing chamber 22, the preheating may be followed by the main heating. It
In addition, the heating is performed by arranging it in the axial center like the heater 52.
Not only the heater 45
You may make it heat with a laser etc.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshinori Yagi 8-1-1 Tsukaguchihonmachi, Amagasaki City Mitsubishi Electric Corporation

Claims (9)

[Claims] 1. By applying energy to a coating material in a vacuum, vaporized particles from the coating material, which are scattered in a predetermined direction, are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. In a method of forming a thin film on a thin plate member end part for forming a thin film on a member, the plurality of thin plate members are exposed so that the film forming parts of the plurality of thin plate members are exposed in a direction in which vaporized particles fly from the coating material. A method for forming a thin film on an end portion of a thin plate member, wherein thin plate members are arranged in a slanted manner, and the vaporized particles are attached to the film forming portion exposed by using the thin plate member as a mask. . 2. By applying energy to a coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members having openings. Then, in the thin film deposition apparatus for depositing a thin film on the thin plate member, a supporting member which is inserted into the openings of the plurality of thin plate members and supports these thin plate members, and A plurality of thin plate members supported by a member are obliquely overlapped and positioned, and a positioning member that exposes only the film forming portion of the thin plate member toward the flying direction side of vaporized particles from the coating material. An apparatus for depositing a thin film on an end portion of a thin plate member. 3. By applying energy to the coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. In a thin film deposition apparatus for depositing a thin film on a member, a plurality of first pins arranged upright in a predetermined direction at a predetermined pitch, and an arrangement of the first pins. The plurality of thin plate members are arranged upright at a predetermined pitch in parallel with the installation direction, engage with the plurality of thin plate members arranged between the first pins, and the thin plate members are inclined with respect to each other for positioning. And a second pin that exposes the film forming portion of the thin plate member toward a direction in which vaporized particles fly from the coating material, the apparatus for depositing a thin film on an end portion of the thin plate member. 4. By applying energy to the coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin that is arranged upright in a circular shape at a predetermined pitch and a concentric circular shape inside the first pin. And a plurality of thin plate members arranged between the first pins to be engaged with each other, and the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member for rotating the thin plate member toward the flying direction of the vaporized particles from the coating material while supporting the first pin and the second pin and rotating about the central axis line. An apparatus for depositing a thin film on an end portion of a thin plate member, comprising a holding tool configured to have. 5. By applying energy to the coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin is arranged upright in a circular shape at a predetermined pitch, and a concentric circular shape is formed inside the first pin. And a plurality of thin plate members arranged between the first pins to be engaged with each other, and the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member for rotating the thin plate member toward the flying direction of the vaporized particles from the coating material while supporting the first pin and the second pin and rotating about the central axis line. And a mask member that is disposed between the holder and the coating material, and that controls the flying of evaporated particles from the coating material to the thin plate member side. A thin film forming device on the edge of a thin plate member. 6. By applying energy to a coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin is arranged upright in a circular shape at a predetermined pitch, and a concentric circular shape is formed inside the first pin. And a plurality of thin plate members arranged between the first pins to be engaged with each other, and the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member that rotates the first and second pins about the center axis of the arrangement of the first and second pins and rotates the support member while directing the support member toward the direction in which the evaporation particles fly from the coating material. And a moving unit that moves at least one of the holder and the covering material to change the distance between the thin plate member and the covering material in the holder. An apparatus for depositing a thin film on the edge of a thin plate member. 7. By applying energy to a coating material in a vacuum, vaporized particles scattered from the coating material in a predetermined direction are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin is arranged upright in a circular shape at a predetermined pitch, and a concentric circular shape is formed inside the first pin. And a plurality of thin plate members arranged between the first pins to be engaged with each other, and the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member for supporting the pin of the first support
While supporting a plurality of the second pins in the direction of the central axis of the arrangement and rotating the supporting member about the central axis of the arrangement, the thin plate member is directed toward the direction in which the evaporation particles fly from the coating material. An apparatus for depositing a thin film on an end portion of a thin plate member, comprising a holder configured to have a moving cylinder base. 8. By applying energy to a coating material in a vacuum, vaporized particles from the coating material, which are scattered in a predetermined direction, are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin is arranged upright in a circular shape at a predetermined pitch, and a concentric circular shape is formed inside the first pin. And a plurality of thin plate members disposed between the first pins, the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member for supporting the pin of the first support
A plurality of second pins are supported in the direction of the central axis of the arrangement, and the supporting member is rotated by rotating about the central axis of the arrangement to move the thin plate member in the direction in which the vaporized particles fly from the coating material. A holder configured to have a cylindrical base that moves while being directed toward the outer peripheral surface of the holder. A film forming apparatus for forming a thin film on an end portion of a thin plate member, comprising a plurality of the coating materials to be flown. 9. By applying energy to a coating material in a vacuum, vaporized particles from the coating material, which are scattered in a predetermined direction, are attached to one end portion which is a film forming portion of a plurality of thin plate members, and the thin plate is formed. A thin film deposition apparatus for depositing a thin film on a member, wherein a thin film is formed on an end of a thin member, and a first pin that is arranged upright in a circular shape at a predetermined pitch and a concentric circular shape inside the first pin. And a plurality of thin plate members arranged between the first pins to be engaged with each other, and the thin plate members are obliquely inclined and positioned with respect to each other. A second pin that exposes the film forming portion of the outside, and the first and second pins.
And a support member for supporting the pin of the first support
And a holder configured to have a plurality of second pins supported in the direction of the central axis of the arrangement and a cylindrical base that rotates around the central axis of the arrangement to rotate the support member; Rotation with a plurality of processing chambers in which tools are stored around a rotation axis, and the processing chambers are respectively moved to a holder insertion position, an exhaust device, a heating position, a film formation position, a cooling position, and a holder removal position. Type pretreatment device and the holder in the processing chamber at the film forming position of the rotary pretreatment device, the holder is moved to the film forming chamber side, and the holder is held in the film forming chamber. The holder is rotated to move the thin plate member in the holder while being directed toward the direction in which the vaporized particles from the covering material come in, and after forming a thin film on the film forming portion of the thin plate member, the holder For repositioning the inside of the processing chamber at the film forming position again DOO deposition apparatus of a thin film of the thin plate member end, characterized in that it comprises a.