JPH0733861Y2 - Gas purification equipment - Google Patents

Gas purification equipment

Info

Publication number
JPH0733861Y2
JPH0733861Y2 JP1990066910U JP6691090U JPH0733861Y2 JP H0733861 Y2 JPH0733861 Y2 JP H0733861Y2 JP 1990066910 U JP1990066910 U JP 1990066910U JP 6691090 U JP6691090 U JP 6691090U JP H0733861 Y2 JPH0733861 Y2 JP H0733861Y2
Authority
JP
Japan
Prior art keywords
gas
cold material
container
primary
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990066910U
Other languages
Japanese (ja)
Other versions
JPH0426015U (en
Inventor
恒雄 石垣
Original Assignee
エスエムシー株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エスエムシー株式会社 filed Critical エスエムシー株式会社
Priority to JP1990066910U priority Critical patent/JPH0733861Y2/en
Publication of JPH0426015U publication Critical patent/JPH0426015U/ja
Application granted granted Critical
Publication of JPH0733861Y2 publication Critical patent/JPH0733861Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は、ガスから水分やダスト等の異物を除去するガ
ス浄化装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a gas purifying apparatus for removing foreign matters such as moisture and dust from gas.

[従来の技術] 極、超高真空を発生させる場合や、表面分析、特に真空
中での表面分析、或いは半導体の製造等においては、必
要ガス中に不純物ガスや水分が存在することを非常に嫌
うので、ガスからこれらを除去する必要がある。特に、
チャンバー等における真空圧力を早く低下させようとす
る場合には、チャンバー内の水分を極力少なくする必要
がある。
[Prior Art] When generating an extremely high vacuum, surface analysis, especially surface analysis in vacuum, or semiconductor manufacturing, it is very important that impurity gas or moisture is present in the required gas. I hate to remove them from the gas. In particular,
In order to quickly reduce the vacuum pressure in the chamber or the like, it is necessary to reduce the water content in the chamber as much as possible.

このような水分の除去には、従来から、ソープションポ
ンプにモレキュラシーブと呼ばれる多孔質の吸着剤(人
工的に作られたゼオライト)を充填し、液体窒素等の冷
材により冷却したモレキュラシーブによって、水分や不
純物ガス等を吸着除去する方法がある。しかしながら、
このモレキュラシーブは、それ自体が有する細孔の直径
よりも大きな分子直径の気体分子を殆ど吸着せず、その
ため、細孔直径よりも小さな分子直径の気体であれば、
それが必要なガスであっても吸着するため、使用上にお
いて制限がある。また、熱伝導が悪く、冷却に時間を要
するため、作業の開始に時間を要するという問題があ
る。
In order to remove such water, a sorption pump is conventionally filled with a porous adsorbent called a molecular sieve (an artificially made zeolite), and the water is removed by a molecular sieve cooled with a cooling material such as liquid nitrogen. There is a method of adsorbing and removing impurities and gas. However,
This molecular sieve hardly adsorbs gas molecules having a molecular diameter larger than the diameter of its own pores, so if the gas has a molecular diameter smaller than the pore diameter,
Even if it is a necessary gas, it is adsorbed, so there is a limitation in use. In addition, since heat conduction is poor and it takes time to cool, there is a problem that it takes time to start the work.

このような問題に対処し、本考案の考案者は、先に実願
昭63−168008号(実公平5−3473号公報参照)におい
て、ガスから水分やダストを効率よく除去できるガス浄
化装置を提案した。
In order to deal with such a problem, the inventor of the present invention has previously proposed a gas purifying device capable of efficiently removing moisture and dust from gas in Japanese Utility Model Application No. 63-168008 (see Japanese Utility Model Publication No. 5-3473). Proposed.

このガス浄化装置は、従来のモレキュラシーブによる水
分等の吸着除去と異なり、必要ガスの吸着がなく、かつ
作業の開始が早いという利点を有するが、冷材の温度管
理についての配慮に欠けるところがあり、冷材を略一定
の温度に維持するための手段が面倒である。
This gas purification device has the advantage that, unlike the conventional adsorption and removal of moisture by molecular sieves, there is no adsorption of the required gas and the start of work is quick, but there is a lack of consideration regarding the temperature control of the cold material, Means for maintaining the cold material at a substantially constant temperature are cumbersome.

[考案が解決しようとする課題] 本考案が解決しようとする課題は、冷材の温度管理が容
易なガス浄化装置を提供することにある。
[Problems to be Solved by the Invention] An object to be solved by the present invention is to provide a gas purifying apparatus in which temperature control of a cold material is easy.

[課題を解決するための手段] 上記課題を解決するため、本考案のガス浄化装置は、一
次冷材が供給される管路を有し、該一次冷材より凝固点
が高く、かつ一次冷材によって凝固点より低い温度に冷
却される二次冷材が充填された断熱性の冷材容器と、伝
熱性の良好な素材よりなる上記冷材容器内の密閉容器と
を備え、上記密閉容器が、浄化ガスの入口及び出口、並
びに該容器を流れるガスから冷却による液化で水分を除
去するための焼結金属フィルタを備えていることを特徴
としている。
[Means for Solving the Problems] In order to solve the above problems, the gas purification apparatus of the present invention has a pipe line to which the primary cold material is supplied, has a higher freezing point than the primary cold material, and has a primary cold material. A heat-insulating cold material container filled with a secondary cold material that is cooled to a temperature lower than the freezing point, and a closed container in the cold material container made of a material having good heat conductivity, the closed container, It is characterized by being provided with an inlet and an outlet of purified gas, and a sintered metal filter for removing moisture from the gas flowing through the container by cooling and liquefaction.

[作用及び考案の効果] 管路に一次冷材を供給して、冷材容器に充填した二次冷
材をその凝固点より低い温度に冷却した後、密閉容器に
浄化ガスを供給する。
[Operation and Effect of Invention] After supplying the primary cooling material to the pipeline and cooling the secondary cooling material filled in the cooling material container to a temperature lower than its freezing point, the purified gas is supplied to the closed container.

浄化ガスの供給により、該ガス内の水分が冷却による液
化で除去されるとともにダストも除去され、これによっ
て二次冷材が加温されるが、融解の潜熱によって二次冷
材が比較的長時間一定の温度を維持するため、一次冷材
による二次冷材冷却の時間間隔を長くできるので、冷材
の温度管理が簡単である。
By supplying the purified gas, moisture in the gas is removed by liquefaction by cooling and dust is also removed, thereby warming the secondary cooling material, but the latent heat of melting causes the secondary cooling material to be relatively long. In order to maintain a constant temperature for a period of time, the time interval for cooling the secondary cold material by the primary cold material can be lengthened, so the temperature control of the cold material is simple.

また、フィルタを、熱伝導の良い焼結金属で形成したこ
とにより、二次冷材によるフィルタの温度低下が早いの
で、短時間で作業を開始することができるばかりでな
く、温度降下によって吸着効率を高めることができる。
In addition, since the filter is made of sintered metal with good thermal conductivity, the temperature of the filter drops quickly due to the secondary cooling material, so not only can work be started in a short time, but also the adsorption efficiency due to the temperature drop. Can be increased.

さらに、浄化ガスが金属焼結フィルタの細かい隙間を非
常に数多く通るため、ガス分子がフィルタに衝突する確
率が高くて捕集能力が良く、しかも、モレキュラシーブ
ほど多孔質でないために、必要ガスまで吸着することが
なく、かつガスの流量が多くすることができる。
In addition, since the purified gas passes through a large number of small gaps in the sintered metal filter, there is a high probability that gas molecules will collide with the filter and the collection capacity is good, and since it is not as porous as the molecular sieve, it absorbs even the necessary gas. And the gas flow rate can be increased.

[実施例] 第1図は本考案の実施例を示し、このガス浄化装置は一
次冷材が供給される管路1を有し二次冷材2が充填され
た断熱性の冷材容器3と、上記二次冷材2中に浸漬させ
た密閉容器4とを備え、管路1と、密閉容器4に浄化ガ
スを給排する供給管5及び排出管6とは、冷材容器3の
断熱性の蓋7に形設した孔を通って冷材容器3外に延出
されており、冷材容器3内に温度センサ8を設置し、該
温度センサ8を、その出力によって管路1への一次冷材
の供給装置14を制御するコントローラ13に接続してい
る。
[Embodiment] FIG. 1 shows an embodiment of the present invention. This gas purification apparatus has a heat-insulating cold material container 3 having a pipe line 1 to which a primary cold material is supplied and filled with a secondary cold material 2. And a closed container 4 immersed in the secondary cooling material 2 described above, and the pipe line 1 and a supply pipe 5 and a discharge pipe 6 for supplying and discharging purified gas to and from the closed container 4 of the cold material container 3. The temperature sensor 8 is installed in the cold material container 3 through a hole formed in the heat insulating lid 7, and the temperature sensor 8 is installed in the cold material container 3. It is connected to a controller 13 which controls a supply device 14 for the primary cold material to the.

上記一次冷材としては、例えば液体窒素を使用すること
ができ、二次冷材はこれよりも凝固点の高い冷材、例え
ばエタノール等を使用し、一次冷材によって凝固点より
若干低い温度に冷却される。
As the primary cooling material, for example, liquid nitrogen can be used, and the secondary cooling material uses a cooling material having a higher freezing point than this, for example, ethanol, and is cooled to a temperature slightly lower than the freezing point by the primary cooling material. It

密閉容器4は、熱伝導の良好な素材で形成し、浄化ガス
の流れ方向と略直交する方向に、複数のフィルタ9a,9b,
9cが内壁に高熱伝導性を保つようにして接合されてい
る。このフィルタは、例えばステンレス鋼、真鍮等の熱
伝導の良い金属の粒子または繊維を焼結し、あるいはそ
れらの複合体を焼結することにより、浄化ガスの平均自
由行程に近いメッシュを有するように形成したものであ
る。具体的には、製造上の容易さを考慮し、それらの粒
子や繊維間に数μm程度の流体通過間隙を有するものと
して構成することができるが、例えば1μm以下のさら
に小さい間隙(望ましくは0.1μm程度)にすることが
望まれる。複数のフィルタ9a,9b,9cは、ガス流入側のフ
ィルタ9aの目を粗くし、ガス流出側のフィルタ9cに向け
て順次目を細かくするのが良く、特に水分を多量に吸着
するガス流入側のフィルタは、目を粗くするのが良い。
また、密閉容器4は、加熱流体の流通により加熱する加
熱器10を有し、作業開始前に予め高真空下で加熱して、
内部の水分を十分に放出させておく。
The closed container 4 is made of a material having good heat conduction, and is provided with a plurality of filters 9a, 9b, in a direction substantially orthogonal to the flow direction of the purified gas.
9c is joined to the inner wall so as to maintain high thermal conductivity. This filter has a mesh close to the mean free path of the purified gas, for example, by sintering particles or fibers of a metal having good heat conductivity such as stainless steel or brass, or by sintering a composite thereof. It was formed. Specifically, in consideration of easiness in production, the particles or fibers may be configured to have a fluid passage gap of about several μm, but for example, a smaller gap of 1 μm or less (preferably 0.1 μm or less). μm) is desirable. The plurality of filters 9a, 9b, 9c, the filter 9a of the gas inflow side is coarse, it is good to sequentially finer toward the filter 9c of the gas outflow side, especially the gas inflow side that adsorbs a large amount of moisture. It is better to use a coarser filter.
In addition, the closed container 4 has a heater 10 that heats by circulating a heating fluid, and heats it under high vacuum in advance before starting work.
Allow sufficient moisture to be released inside.

上記実施例は、一次冷材の供給制御装置14から管路1に
一次冷材を供給すると、内部に充填した二次冷材2が冷
却され、二次冷材2を介して密閉容器3も冷却される。
この場合、密閉容器4の温度は、外周からフィルタ9a,9
b,9cの中心に向けて低下し、フィルタ9a,9b,9cを熱伝導
の良好な素材で構成したため、モレキュラシーブに比べ
て各フィルタの温度が速やかに低下するので、短時間で
作業を始めることができる。
In the above-described embodiment, when the primary cooling material is supplied from the primary cooling material supply control device 14 to the pipe line 1, the secondary cooling material 2 filled therein is cooled, and the closed container 3 also passes through the secondary cooling material 2. To be cooled.
In this case, the temperature of the closed container 4 is from the outer periphery to the filters 9a, 9
Since the temperature of each filter drops toward the center of b, 9c and the filters 9a, 9b, 9c are made of a material with good heat conduction, the temperature of each filter will drop more quickly compared to the molecular sieve, so start the work in a short time. You can

温度センサ8が、二次冷材2がその凝固点より若干低い
温度に冷却されたことを検知すると、供給制御手段によ
り一次冷材の供給が停止され、供給管5から必要な浄化
ガスが供給される。供給されたガスは、各フィルタを通
って排出管7に流れ、二次冷材2より気化温度が高い不
純物の気体(蒸気)を液化(吸着)してフィルタ9a,9b,
9cにより捕集し、不純物ガスや水分が除去された清浄ガ
スは、排出管6から装置外に流出する。この場合、温度
が低い程分子の吸着が良くなるので、吸着効率を高める
ことができる。
When the temperature sensor 8 detects that the secondary cooling material 2 has been cooled to a temperature slightly lower than its freezing point, the supply control means stops the supply of the primary cooling material and supplies the required purified gas from the supply pipe 5. It The supplied gas flows to the exhaust pipe 7 through each filter, and liquefies (adsorbs) an impurity gas (vapor) whose vaporization temperature is higher than that of the secondary cooling material 2 to filter 9a, 9b,
The clean gas, which has been collected by 9c and from which the impurity gas and the water have been removed, flows out of the apparatus through the discharge pipe 6. In this case, the lower the temperature, the better the adsorption of molecules, so that the adsorption efficiency can be increased.

また、浄化ガスが焼結フィルタ9a,9b,9cにおけるミクロ
ン単位の隙間を数百回も通過するため、ガス分子がフィ
ルタに衝突する確率が高くて捕集能力がよく、しかも、
モレキュラシーブ程多孔質でないために、必要ガスまで
吸着することがなく、かつガスの流量を多くすることが
でき、さらに、フィルタをステンレス鋼で形成すると、
腐蝕性ガスの除湿やダスト除去を行うことができる。
Further, since the purified gas passes through the micron-shaped gaps in the sintered filters 9a, 9b, 9c several hundred times, the gas molecules have a high probability of colliding with the filter and have a good collection ability, and moreover,
Since it is not as porous as the molecular sieve, it does not adsorb the required gas, and the flow rate of the gas can be increased. Furthermore, if the filter is made of stainless steel,
It is possible to dehumidify corrosive gas and remove dust.

浄化ガスの供給によって二次冷材2が加温されるが、凝
固点より若干低い温度に冷却された二次冷材2は、融解
の潜熱によって比較的長時間略一定の温度を維持するこ
とができる。したがって、一次冷材による二次冷材2冷
却のための時間間隔を長くできるので、その温度管理が
容易である。
Although the secondary cooling material 2 is heated by the supply of the purified gas, the secondary cooling material 2 cooled to a temperature slightly lower than the freezing point may maintain a substantially constant temperature for a relatively long time due to latent heat of melting. it can. Therefore, the time interval for cooling the secondary cooling material 2 by the primary cooling material can be lengthened, and the temperature control thereof is easy.

上記実施例は、蓄積形であるから、浄化ガスを連続して
浄化する場合は、2個または2個以上設置して、一方の
浄化装置で不純物を除去している間に、他方の密閉容器
4を、該容器中の加熱器で加熱しながら真空ポンプで吸
引して除湿する。この場合も、フィルタ9a,9b,9cの熱伝
導がよいので、除湿に必要な時間を短縮できる。
Since the above embodiment is a storage type, when purifying the purifying gas continuously, two or more purifying gases are installed, and while one purifying device removes impurities, the other closed container is used. 4 is dehumidified by suction with a vacuum pump while heating with a heater in the container. Also in this case, since the heat conduction of the filters 9a, 9b, 9c is good, the time required for dehumidification can be shortened.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の実施例の縦断正面図である。 2……二次冷材、3……冷材容器、4……密閉容器、5
……供給管、6……排出管、9a,9b,9c……フィルタ。
FIG. 1 is a vertical sectional front view of an embodiment of the present invention. 2 ... Secondary cold material, 3 ... Cold material container, 4 ... Closed container, 5
…… Supply pipe, 6 …… Discharge pipe, 9a, 9b, 9c …… Filter.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】一次冷材が供給される管路を有し、該一次
冷材より凝固点が高く、かつ一次冷材によって凝固点よ
り低い温度に冷却される二次冷材が充填された断熱性の
冷材容器と、伝熱性の良好な素材よりなる上記冷材容器
内の密閉容器とを備え、 上記密閉容器が、浄化ガスの入口及び出口、並びに該容
器を流れるガスから冷却による液化で水分を除去するた
めの焼結金属フィルタを備えている、 ことを特徴とするガス浄化装置。
1. A heat insulating material having a pipe line to which a primary cold material is supplied, filled with a secondary cold material having a freezing point higher than that of the primary cold material and cooled to a temperature lower than the freezing point by the primary cold material. Of the cold material container, and a closed container in the cold material container made of a material having good heat transfer, the closed container, the purified gas inlet and outlet, and the gas flowing through the container to liquefy the moisture A gas purification device, comprising a sintered metal filter for removing the gas.
JP1990066910U 1990-06-25 1990-06-25 Gas purification equipment Expired - Lifetime JPH0733861Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990066910U JPH0733861Y2 (en) 1990-06-25 1990-06-25 Gas purification equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990066910U JPH0733861Y2 (en) 1990-06-25 1990-06-25 Gas purification equipment

Publications (2)

Publication Number Publication Date
JPH0426015U JPH0426015U (en) 1992-03-02
JPH0733861Y2 true JPH0733861Y2 (en) 1995-08-02

Family

ID=31600025

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990066910U Expired - Lifetime JPH0733861Y2 (en) 1990-06-25 1990-06-25 Gas purification equipment

Country Status (1)

Country Link
JP (1) JPH0733861Y2 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5317647Y2 (en) * 1977-06-27 1978-05-11
JPS5666685U (en) * 1979-10-23 1981-06-03
JPS56108501A (en) * 1980-01-31 1981-08-28 Ckd Corp Refrigerator for compressed air
JPS58170501A (en) * 1982-03-30 1983-10-07 Mitsubishi Electric Corp Apparatus for removing steam
JPS6042330U (en) * 1983-09-02 1985-03-25 エスエムシ−株式会社 air dehumidifier
JPS6438129A (en) * 1987-08-04 1989-02-08 Hokkaido Gas Kk Dehumidifying apparatus with ice heat accumulating function

Also Published As

Publication number Publication date
JPH0426015U (en) 1992-03-02

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