JPH07330372A - Glass having low melting point - Google Patents

Glass having low melting point

Info

Publication number
JPH07330372A
JPH07330372A JP13048794A JP13048794A JPH07330372A JP H07330372 A JPH07330372 A JP H07330372A JP 13048794 A JP13048794 A JP 13048794A JP 13048794 A JP13048794 A JP 13048794A JP H07330372 A JPH07330372 A JP H07330372A
Authority
JP
Japan
Prior art keywords
glass
melting point
low melting
sealing
teo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13048794A
Other languages
Japanese (ja)
Inventor
Nobuya Kuriyama
延也 栗山
Shigeki Morimoto
繁樹 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP13048794A priority Critical patent/JPH07330372A/en
Publication of JPH07330372A publication Critical patent/JPH07330372A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/12Silica-free oxide glass compositions
    • C03C3/23Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron

Abstract

PURPOSE:To obtain a glass of a low melting point having excellent properties for adhesion and sealing of a ceramic and a metal especially for adhesion and sealing of a magnetic head or a glass of a low melting point capable of being used as an optical glass, an acousto-optic glass, an infrared transmitting glass, etc. CONSTITUTION:This is a glass of low melting point obtained by replacing a part of oxygen in an oxide composition of TeO2 of 15-90wt.%, B2O3 of 3-50wt.%, ZnO of 3-55wt.% and Al2O3 of 0-10wt.% with fluorine and introducing 0.4-5wt.% of fluorine into 100wt.% of the glass.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は低融点ガラスにかかり、
光学ガラス、音響光学ガラス、赤外透過性ガラス等とし
て、更に金属やセラミックの接着や封止用、特に磁気ヘ
ッドの接着・封止用ガラスとして好適な低融点ガラスに
関する。
The present invention relates to a low melting point glass,
The present invention relates to a low melting point glass suitable as optical glass, acousto-optical glass, infrared transmissive glass, and the like, and also for adhesion and sealing of metals and ceramics, particularly for adhesion and sealing of magnetic heads.

【0002】[0002]

【従来技術とその問題点】例えば金属やセラミックの接
着や封止にPbO 系の低融点ガラスが広く利用されてお
り、一例として PbO−B2O3系をベースとして、 PbO−B2
O3−SiO2系、PbO −B2O3−ZnO 系、 PbO−B2O3−SiO2
Al2O3 系等のガラスはよく知られるところである。しか
しPbO 成分を含むため、加熱加工作業環境を悪化し、ま
た水と接触するとPbを溶出して公害問題を誘起するこ
と、硬度が不充分であること、耐水、耐薬品性に劣るこ
と、被接着材料とも反応し易いこと等問題点が少なくな
い。
[Prior art and its problems] For example, PbO-based low-melting glass is widely used for adhesion and sealing of metals and ceramics. As an example, PbO-B 2 O 3 based PbO-B 2
O 3 -SiO 2 system, PbO -B 2 O 3 -ZnO-based, PbO-B 2 O 3 -SiO 2 -
Glasses such as Al 2 O 3 series are well known. However, since it contains PbO component, it deteriorates the working environment of heating and processing, and when it comes into contact with water, it elutes Pb and induces pollution problems, insufficient hardness, poor water resistance and chemical resistance, There are many problems such as easy reaction with adhesive materials.

【0003】またTeO2を含むガラスにおいて、特開昭62
−288135号には必須成分としてTeO2およびBaO を、選択
必須成分としてK2O 、Rb2O、Cs2Oの一種以上から、かつ
ZnO、PbO の一種以上から選択される成分を含有し、任
意成分としてハロゲン化物を含む音響光学素子用、各種
光学用ガラスが開示されている。更に特公昭52−28454
号には、必須成分としてTeO2およびZnO を、選択必須成
分としてNa2O、Li2Oから選択される成分を含む音響光学
素子用ガラスが開示されている。加えて特開昭47−7336
号には、必須成分としてTeO2、La2O3 、Ta2O5 、GeO
2を、任意成分としてB2O3、ZnF2、Al2O3 、K2O を含む
高屈折率、高透明性光学ガラスが開示されている。
Further, in a glass containing TeO 2 , a method disclosed in Japanese Patent Laid-Open No. Sho 62-62
-288135 has TeO 2 and BaO as essential components, and one or more of K 2 O, Rb 2 O, and Cs 2 O as optional components, and
Various optical glasses for acousto-optical devices, containing a component selected from one or more of ZnO and PbO 2 and containing a halide as an optional component, are disclosed. Furthermore, Japanese Patent Publication Sho 52-28454
The publication discloses a glass for an acousto-optic device containing TeO 2 and ZnO as essential components and Na 2 O and Li 2 O as selective essential components. In addition, JP-A-47-7336
No. 4, the essential components TeO 2 , La 2 O 3 , Ta 2 O 5 , GeO
A high-refractive-index, highly-transparent optical glass containing 2 as an optional component, B 2 O 3 , ZnF 2 , Al 2 O 3 , and K 2 O is disclosed.

【0004】これら開示のTeO2系組成は本発明の組成と
著しく相違する。またこれらに開示されるアルカリ分の
存在は耐水性、耐薬品性を阻害する等本発明においては
含有すべきものではない。同様に開示されるPbO 成分の
存在は前記したように公害問題を誘発するため含有すべ
きものではない。
The TeO 2 based compositions of these disclosures are significantly different from the compositions of the present invention. In addition, the presence of the alkali components disclosed therein should not be contained in the present invention, such as impairing water resistance and chemical resistance. Similarly, the presence of the PbO 2 component disclosed should not be contained because it causes pollution problems as described above.

【0005】本発明における低融点ガラスは低い熱処理
温度でガラス製造できるものであり、特にセラミックや
金属の接着・封止に有効に利用される。その場合、熱膨
張率が被接着材料のそれとよく適合していること、作業
温度が適合していること、耐水、耐薬品性に優れるこ
と、被接着材料との相互反応がないこと、機械的強度が
高いこと等が要求され、更に磁気ヘッド封着分野におい
ては、熱膨張率の磁性材料との適合性、磁性材料との非
反応性、磁気絶縁性、透視性、硬度等も重要なファクタ
ーであるが、本発明はそれらファクターを満足する新た
な低融点ガラスを提供するものであり、勿論光学ガラ
ス、赤外透過性ガラス等としても適用できるものであ
る。
The low melting point glass in the present invention can be produced at a low heat treatment temperature, and is particularly effectively used for bonding and sealing ceramics and metals. In that case, the coefficient of thermal expansion is well matched to that of the material to be adhered, the working temperature is compatible, it is excellent in water resistance and chemical resistance, there is no interaction with the material to be adhered, mechanical High strength is required, and in the field of magnetic head sealing, compatibility of magnetic expansion coefficient with magnetic material, non-reactivity with magnetic material, magnetic insulation, transparency, hardness, etc. are also important factors. However, the present invention provides a new low melting point glass satisfying those factors, and can be applied as an optical glass, an infrared transmissive glass and the like.

【0006】[0006]

【問題点を解決するための手段】本発明は低融点ガラス
に関し、酸化物成分組成で、 TeO2 15〜90wt% B2O3 3〜50wt% Zn0 3〜55wt% Al2O3 0〜10wt% であり、上記酸素分の一部をフッ素で置換し、該フッ素
をガラス100 wt%中に0.4 〜5 wt%導入せしめたことか
ら構成される。
The present invention relates to a low-melting glass, which has an oxide composition of TeO 2 15 to 90 wt% B 2 O 3 3 to 50 wt% Zn 0 3 to 55 wt% Al 2 O 3 0 to 10 wt% %, And part of the oxygen content is replaced with fluorine, and the fluorine is introduced into 100 wt% of the glass in an amount of 0.4 to 5 wt%.

【0007】本発明においては、光学ガラス、赤外透過
性ガラス等としても好適であるが、接着・封止用ガラス
として優れた特性を有する。すなわち、適宜成分組成を
選択することにより熱膨張率を 60 ×10-7/℃オーダー
から150 ×10-7/℃オーダーのものが得られるので、金
属、セラミック、特に磁気ヘッド材料の熱膨張率に応じ
適宜採用でき、屈伏点も300 〜500 ℃台であるので 500
〜600 ℃程度で変質しないような金属、セラミック等の
被接着材料を接着・封止でき、耐水性においても優れ、
硬度も高く、また、磁気ヘッドの接着・封止においても
磁性材料との相互反応がなく、磁気的絶縁性に優れる
等、各種金属、セラミック等の接着は勿論、特に磁気ヘ
ッド封着用に適応した諸特性を備えるものである。
In the present invention, it is suitable as an optical glass, an infrared transmissive glass, etc., but has excellent properties as an adhesive / sealing glass. That is, by appropriately selecting the component composition, a thermal expansion coefficient of 60 × 10 -7 / ° C order to 150 × 10 -7 / ° C order can be obtained, so that the thermal expansion coefficient of metals, ceramics, especially magnetic head materials The yield point can be appropriately adjusted according to the
Can adhere and seal materials to be adhered such as metals and ceramics that do not deteriorate at temperatures of up to 600 ℃, and has excellent water resistance.
It has a high hardness, and it does not interact with the magnetic material when adhering and sealing the magnetic head, and it has excellent magnetic insulation properties. It is suitable not only for adhering various metals and ceramics but also for magnetic head sealing. It has various characteristics.

【0008】本成分系において、TeO2は15wt%〜90wt%
の範囲においてガラス形成が良好で安定しており、90wt
%を越えるとガラス形成を不安定にし、ガラスの硬度を
低下させ、15wt%未満であってもガラス形成を困難とす
る等不具合が生ずる。好適には19〜86wt%の範囲とする
ものである。
In this component system, TeO 2 is 15 wt% to 90 wt%
Glass formation is good and stable in the range of
If it exceeds 15%, the glass formation becomes unstable, the hardness of the glass is lowered, and even if it is less than 15 wt%, problems such as difficulty in forming the glass occur. It is preferably in the range of 19 to 86 wt%.

【0009】B2O3も同様に 3wt%〜50wt%の範囲におい
てガラス形成が良好で安定しており、50wt%を越えると
ガラス形成が不安定となり、ガラスの耐久・耐候性を悪
化させ、他方 3wt%未満であってもガラス形成を不安定
にする。好適には 4〜42wt%の範囲とするものである。
Similarly, B 2 O 3 also has good and stable glass formation in the range of 3 wt% to 50 wt%, and when it exceeds 50 wt%, the glass formation becomes unstable and the durability and weather resistance of the glass deteriorate, On the other hand, if it is less than 3% by weight, glass formation becomes unstable. It is preferably in the range of 4 to 42 wt%.

【0010】ZnO は前記TeO2−B2O3系に 3wt%〜55wt%
の範囲で導入するものであり、これによりTeO2−B2O3
のガラス化領域を拡大するとともに、ガラスの耐水性を
向上し、硬度を増大する等の作用を有するが、 3wt%未
満ではそれら作用が効果的でなく、55wt%を越えるとガ
ラス形成を困難とし、失透を生じ易くなる。好適には4
〜49wt%の範囲とするものである。
ZnO is contained in the TeO 2 —B 2 O 3 system in an amount of 3 wt% to 55 wt%.
Introduced in the range of, to expand the vitrification region of TeO 2 -B 2 O 3 system, improve the water resistance of the glass, have the effect of increasing the hardness, etc., but less than 3 wt% However, these actions are not effective, and if it exceeds 55 wt%, glass formation becomes difficult and devitrification is likely to occur. Preferably 4
The range is up to 49 wt%.

【0011】F(フッ素) はガラスの粘性、屈伏点、転移
点を下げ、ガラス溶融を容易にする上で必須とするもの
で、そのためにはガラス100 wt%中に0.4 wt%以上含有
せしめることが必要である。なお、 5wt%を越えるとガ
ラスの安定性が低下し、高温時のF の揮散も顕著となる
等不都合な点が生ずる。好適には0.4 〜 3wt%の範囲と
するのが望ましい。F の導入手段は特定しないが、特に
ZnF2等のフッ化物のかたちで原料中に含有せしめればよ
い。
F (fluorine) is essential for lowering the viscosity, yield point and transition point of glass and facilitating glass melting. For that purpose, 0.4 wt% or more should be contained in 100 wt% of glass. is necessary. If it exceeds 5% by weight, the stability of the glass is lowered and the volatilization of F 2 at high temperature becomes remarkable, which causes disadvantages. It is preferable to set it in the range of 0.4 to 3 wt%. The means of introducing F is not specified, but especially
It may be contained in the raw material in the form of a fluoride such as ZnF 2 .

【0012】Al2O3 は適宜導入するもので、TeO2−B2O3
系では、多分に相互の分相によるものと推察される透明
度が低い領域があるが、Al2O3 の若干の導入でそれを解
消することができる。但しAl2O3 の多量の導入は粘性、
屈伏点、転移点を増大する等本発明を阻害する危惧があ
るので、10wt%以下程度に留めるべきである。
Al 2 O 3 is appropriately introduced, and TeO 2 --B 2 O 3
In the system, there is a region of low transparency, which is presumably due to mutual phase separation, but it can be eliminated by introducing a small amount of Al 2 O 3 . However, introduction of a large amount of Al 2 O 3 results in viscosity,
Since there is a risk of impeding the present invention such as increasing the yield point and the transition point, the amount should be kept to about 10 wt% or less.

【0013】なお、更にガラスの硬度、耐水性等を向上
するために例えばSiO2、TiO2、SrO、BaO 、Bi2O3
を、ガラスの安定性を向上するためにV2O5等を、溶融性
の改善のためにMgO 、CaO 等を、あるいは熱膨張率を調
整するために上記したような成分を若干量導入すること
ができる。但しPbO 等有害な成分は実質的に含まない。
Further, for example, SiO 2 , TiO 2 , SrO, BaO, Bi 2 O 3 and the like are used to improve the hardness and water resistance of the glass, and V 2 O 5 and the like are used to improve the stability of the glass. , MgO, CaO 2 or the like for improving the meltability, or a small amount of the above-mentioned components for adjusting the thermal expansion coefficient. However, it does not substantially contain harmful components such as PbO.

【0014】原料の溶融は上記成分を含む酸化物原料、
フッ化物原料、あるいは水酸化物原料、炭酸塩等の化合
物原料を所定組成に沿って調合し、例えばアルミナ系炉
材または白金−金(5%) 系炉材を用いた加熱炉、あるい
は坩堝内で1000℃〜1200℃程度の温度で溶融するように
すればよい。炉内雰囲気の特別な調整は必要としない
が、雰囲気を循環する等の適宜設計工夫もできる。
The melting of the raw material is carried out by using an oxide raw material containing the above components,
Fluoride raw materials, hydroxide raw materials, compound raw materials such as carbonates are blended according to a predetermined composition, for example, a heating furnace using alumina-based furnace material or platinum-gold (5%)-based furnace material, or in a crucible Then, it may be melted at a temperature of about 1000 ° C to 1200 ° C. Although no special adjustment of the atmosphere in the furnace is required, appropriate design and ingenuity such as circulating the atmosphere can be made.

【0015】[0015]

【実施例】以下実施例を例示して本発明を詳述する。 〔試料調製〕TeO2源として二酸化テルル、B2O3源として
ほう酸、ZnO 源として亜鉛華、F 源並びに前記亜鉛華に
併用するZnO 源としてフッ化亜鉛 (4水塩) 、Al2O3
として水酸化アルミニウム (Al2O3 はアルミナ坩堝から
の混入もある) を使用し、各原料を所望割合で混合し、
アルミナ坩堝に充填後、坩堝に蓋をし、予め1050℃ない
し1200℃の適宜温度に加熱保持した電気炉内にセットし
20〜30分間溶融した。得られた溶融物をいったんカーボ
ンプレート上に流し出し、さらにこれを電気炉内で徐冷
して試料を得た。前記各試料のカチオン成分を公知の湿
式法および蛍光X線法で分析し、酸化物組成 (全体100
wt%) に換算した。またガラス中の F分について湿式分
析し、ガラス中のwt%含有率で表示した。結果を表1に
示す。
The present invention will be described in detail below with reference to examples. [Sample Preparation] Tellurium dioxide as a TeO 2 source, boric acid as a B 2 O 3 source, zinc oxide as a ZnO source, zinc fluoride as an F source and a ZnO source used in combination with the zinc oxide (tetrahydrate), Al 2 O 3 Using aluminum hydroxide (Al 2 O 3 may be mixed from the alumina crucible) as the source, mix each raw material in the desired ratio,
After filling the alumina crucible, cover the crucible and set it in an electric furnace that has been heated and maintained at an appropriate temperature of 1050 ° C to 1200 ° C in advance.
Melted for 20-30 minutes. The obtained melt was once poured onto a carbon plate and then gradually cooled in an electric furnace to obtain a sample. The cation component of each sample was analyzed by a known wet method and fluorescent X-ray method, and the oxide composition (total 100
wt%). In addition, the F content in the glass was subjected to a wet analysis and displayed as the wt% content rate in the glass. The results are shown in Table 1.

【0016】〔物性測定〕各試料を、シリカガラスを標
準物質とする示差熱膨張計により、昇温速度 5℃/min
の条件で熱膨張を測定し、30〜300 ℃の平均熱膨張率、
ガラス転移点、屈伏点を求めた。またビッカース微小硬
度計により硬度を測定し、95℃の蒸留水に20時間浸漬し
て重量減少率 (耐水性) を求めた。
[Measurement of Physical Properties] Each sample was heated with a differential thermal expansion meter using silica glass as a standard substance at a temperature rising rate of 5 ° C./min.
Measure the thermal expansion under the conditions of, the average coefficient of thermal expansion of 30 ~ 300 ℃,
The glass transition point and the yield point were determined. The hardness was measured with a Vickers micro hardness meter, and the weight loss rate (water resistance) was determined by immersing in distilled water at 95 ° C for 20 hours.

【0017】結果を表1に併せて示す。The results are also shown in Table 1.

【0018】[0018]

【表1】 [Table 1]

【0019】〔結果〕表1中実施例1〜18は本発明組成
範囲のもの、比較例1 〜5 は組成範囲を外れたものを示
す。
[Results] In Table 1, Examples 1 to 18 are in the composition range of the present invention, and Comparative Examples 1 to 5 are out of the composition range.

【0020】表示から明らかなとおり、本発明のものは
熱膨張率が 60 〜150 ×10-7/℃程度と、広い範囲で被
接着金属、セラミックと適合でき、屈伏点も300 ℃ない
し500 ℃台、従って作業温度も500 〜600 ℃程度と低く
設定できるので多くの金属、セラミックの接着・封止用
に採用でき、耐水性 (重量減少率) も0.4 %以下、殊に
0.1 %以下のものが得られる等非常に優れ、水へのPb溶
出も皆無と公害が生ずる恐れもなく、ビッカース硬度が
300 〜400 と比較的高い硬度を有する等接着・封止用ガ
ラス、特に磁気ヘッド封着用ガラスとして好適である。
As is clear from the display, the material of the present invention has a coefficient of thermal expansion of about 60 to 150 × 10 −7 / ° C., which is compatible with a wide range of metals to be adhered and ceramics, and has a yield point of 300 to 500 ° C. The table, and therefore the working temperature can be set as low as about 500 to 600 ℃, can be used for bonding and sealing many metals and ceramics, and the water resistance (weight reduction rate) is 0.4% or less, especially
It is very excellent such as 0.1% or less, there is no elution of Pb in water, there is no fear of pollution, and the Vickers hardness is
It is suitable as a glass for adhesion / sealing having a relatively high hardness of 300 to 400, particularly a glass for magnetic head sealing.

【0021】なお、比較例はいずれもガラス化し得ず、
失透が顕著でクリアーなガラスが得られないことが明白
である。
Incidentally, none of the comparative examples could be vitrified,
It is clear that devitrification is remarkable and clear glass cannot be obtained.

【0022】[0022]

【発明の効果】本発明によれば、熱膨張率が60ないし15
0 ×10-7/℃程度と、広い範囲で被接着金属、セラミッ
クと適合でき、屈伏点も300 ℃ないし500 ℃台、従って
作業温度も500 〜600 ℃程度と低く設定できるので多く
の金属、セラミックの接着・封止用に採用でき、耐水性
に優れ、公害問題の恐れもなく、ビッカース硬度が300
ないし400 と比較的高い硬度を有する等接着・封止用ガ
ラス、特に磁気ヘッド封着用ガラスとして好適であり、
あるいは光学ガラス、音響光学ガラス、赤外透過性ガラ
ス等としても採用できるという効果を奏する。
According to the present invention, the coefficient of thermal expansion is 60 to 15.
It is compatible with adherend metals and ceramics in a wide range of 0 × 10 -7 / ℃, and the yield point is in the range of 300 ℃ to 500 ℃, so the working temperature can be set as low as 500 to 600 ℃, so many metals, It can be used for adhesion and sealing of ceramics, has excellent water resistance, there is no fear of pollution problems, and Vickers hardness is 300.
To 400, which has a relatively high hardness such as 400, and is suitable as a glass for bonding and sealing, in particular, a glass for sealing a magnetic head,
Alternatively, there is an effect that it can be used as an optical glass, an acousto-optical glass, an infrared transmissive glass, or the like.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】酸化物成分組成で、TeO2 15〜90wt% B2O3 3〜50wt% Zn0 3〜55wt% Al2O3 0〜10wt% であり、上記酸素分の一部をフッ素で置換し、該フッ素
をガラス100 wt%中に0.4 〜5 wt%導入せしめたことを
特徴とする低融点ガラス。
1. Oxide component composition: TeO 2 15 to 90 wt% B 2 O 3 3 to 50 wt% Zn 0 3 to 55 wt% Al 2 O 3 0 to 10 wt%, and part of the oxygen content is fluorine. A low melting point glass, characterized in that the fluorine is replaced and 0.4 to 5 wt% is introduced into 100 wt% of the glass.
JP13048794A 1994-06-13 1994-06-13 Glass having low melting point Pending JPH07330372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13048794A JPH07330372A (en) 1994-06-13 1994-06-13 Glass having low melting point

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13048794A JPH07330372A (en) 1994-06-13 1994-06-13 Glass having low melting point

Publications (1)

Publication Number Publication Date
JPH07330372A true JPH07330372A (en) 1995-12-19

Family

ID=15035437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13048794A Pending JPH07330372A (en) 1994-06-13 1994-06-13 Glass having low melting point

Country Status (1)

Country Link
JP (1) JPH07330372A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
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US6656859B2 (en) 1999-10-12 2003-12-02 Corning Incorporated Tellurite glasses and optical components
JP2007096257A (en) * 2005-04-15 2007-04-12 Asahi Glass Co Ltd Glass-covered light emitting diode element and light emitting diode covering glass
JP2010528959A (en) * 2007-06-27 2010-08-26 株式会社ニコン Glass composition, optical member and optical apparatus using the same
US7872417B2 (en) * 2005-04-15 2011-01-18 Asahi Glass Company, Limited Glass-sealed light emitting element, circuit board with the glass-sealed light emitting element, and methods for manufacturing those
JP2014136660A (en) * 2013-01-16 2014-07-28 Shoei Chem Ind Co Glass composition for forming protective film and method of producing the same
FR3036396A1 (en) * 2015-05-22 2016-11-25 Axon Cable Sa GLASS COMPOSITION FOR MICRO-D CONNECTOR SEALING
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6656859B2 (en) 1999-10-12 2003-12-02 Corning Incorporated Tellurite glasses and optical components
JP2007096257A (en) * 2005-04-15 2007-04-12 Asahi Glass Co Ltd Glass-covered light emitting diode element and light emitting diode covering glass
US7872417B2 (en) * 2005-04-15 2011-01-18 Asahi Glass Company, Limited Glass-sealed light emitting element, circuit board with the glass-sealed light emitting element, and methods for manufacturing those
JP2010528959A (en) * 2007-06-27 2010-08-26 株式会社ニコン Glass composition, optical member and optical apparatus using the same
JP2014136660A (en) * 2013-01-16 2014-07-28 Shoei Chem Ind Co Glass composition for forming protective film and method of producing the same
FR3036396A1 (en) * 2015-05-22 2016-11-25 Axon Cable Sa GLASS COMPOSITION FOR MICRO-D CONNECTOR SEALING
WO2016189225A1 (en) * 2015-05-22 2016-12-01 Axon Cable Glass composition for micro-d connector sealing
CN107690423A (en) * 2015-05-22 2018-02-13 法国亿讯电缆集团 Glass composition for the sealing of miniature D connectors
US10723648B2 (en) 2015-05-22 2020-07-28 Axon Cable Glass composition for micro-D connector sealing
CN107690423B (en) * 2015-05-22 2021-02-19 法国亿讯电缆集团 Glass composition for micro-D connector sealing
EP3594191A1 (en) 2018-07-10 2020-01-15 Axon Cable Glass parts for sealed connector
FR3083794A1 (en) * 2018-07-10 2020-01-17 Axon Cable GLASSES FOR HERMETIC CONNECTOR

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