JPH07314165A - Laser device - Google Patents

Laser device

Info

Publication number
JPH07314165A
JPH07314165A JP6134911A JP13491194A JPH07314165A JP H07314165 A JPH07314165 A JP H07314165A JP 6134911 A JP6134911 A JP 6134911A JP 13491194 A JP13491194 A JP 13491194A JP H07314165 A JPH07314165 A JP H07314165A
Authority
JP
Japan
Prior art keywords
reflected
laser
reflection mirror
shutter means
optical sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6134911A
Other languages
Japanese (ja)
Other versions
JP2663865B2 (en
Inventor
Keiji Okino
圭司 沖野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP6134911A priority Critical patent/JP2663865B2/en
Publication of JPH07314165A publication Critical patent/JPH07314165A/en
Application granted granted Critical
Publication of JP2663865B2 publication Critical patent/JP2663865B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Lasers (AREA)
  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To maintain the light quantity of an incident laser beam on an optical sensor approximately constant regardless of the opening and closing state of a shutter. CONSTITUTION:A reflection mirror 10 which perpendicularly reflects a part of the transmission beam T transmitted through a partial reflection mirror 2 is located at a shutter means 5. The reflectivity of the reflection mirror 10 is approximately equal to the reflectivity by an optical system 6 and a work piece 7. The reflected light which is reflected by falling onto the reflection mirror 10 and is made incident on the optical sensor 3 when the shutter means 5 is held closed and the reflected light which is reflected to return the original route by falling onto the optical system 6 and the work piece 7 and is made incident on the optical sensor 3 are equal to each other in the light quantity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レーザ光出力を測定し
ながらシャッタの開閉により被加工物を断続的に加工す
るレーザ装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser device for intermittently processing a workpiece by opening and closing a shutter while measuring laser light output.

【0002】[0002]

【従来の技術】従来、シャッタの開閉操作によってレー
ザ光出力を間欠的に遮断し被加工物を加工するこの種の
レーザ装置としては図2に示す如く構成されたものが知
られている。これを概略説明すると、1はレーザ発振器
で、このレーザ発振器1から出射したレーザ光Lは、ビ
ームスプリッター等の部分反射ミラー2によって反射ビ
ームLR と透過ビームLT とに分割される。反射ビーム
LR は光センサ3によって受光されて電気信号に変換さ
れ、この電気信号が出力表示回路4に出力表示されると
共に、レーザ光出力の安定化を図るためレーザ発振器1
の出力値制御に用いられる。一方、透過ビームLT は、
シャッタ手段5および光学系6を経て被加工物7を間欠
的に照射加工する。つまり、透過ビームLT は、シャッ
タ手段5により光学系6への入射を制御されるもので、
シャッタ手段5が開いている時のみ光学系6に入射し、
被加工物7を加工する。
2. Description of the Related Art Conventionally, there is known a laser device of this type configured to intermittently interrupt a laser light output by opening and closing a shutter to process a workpiece, as shown in FIG. This will be briefly described. Reference numeral 1 is a laser oscillator, and a laser beam L emitted from the laser oscillator 1 is split into a reflected beam LR and a transmitted beam LT by a partial reflection mirror 2 such as a beam splitter. The reflected beam LR is received by the optical sensor 3 and converted into an electric signal. The electric signal is output and displayed on the output display circuit 4, and the laser oscillator 1 is provided for stabilizing the laser light output.
It is used to control the output value of. On the other hand, the transmitted beam LT is
The workpiece 7 is intermittently subjected to irradiation processing through the shutter means 5 and the optical system 6. That is, the transmission beam LT is controlled to enter the optical system 6 by the shutter means 5,
The light enters the optical system 6 only when the shutter means 5 is open,
The workpiece 7 is processed.

【0003】この他、例えば特開昭58−204585
号公報に開示されたレーザ装置が知られている。このレ
ーザ装置は、上記の部分反射ミラー2を省略し、シャッ
タに当たって反射した反射ビームを出力センサによって
検出し、この出力値でレーザ管を制御するフィードバッ
ク手段を設けたものである。このようなレーザ装置にお
いては、シャッタ手段が反射器としての機能を有してい
るので、ビームスプリッタを省略することができる。
In addition to this, for example, Japanese Unexamined Patent Publication No. 58-204585.
The laser device disclosed in the publication is known. In this laser device, the partial reflection mirror 2 is omitted, and a feedback means for detecting the reflected beam reflected by the shutter and reflected by the output sensor and controlling the laser tube with this output value is provided. In such a laser device, since the shutter means has a function as a reflector, the beam splitter can be omitted.

【0004】[0004]

【発明が解決しようとする課題】上記したように図2に
示した従来のレーザ装置においては、レーザ光出力の一
部を光センサ3で検出し、その出力値を出力表示回路4
で表示すると共に、レーザ発振器にフィードバックする
ことによりレーザ光出力の安定化を図っている。しかし
ながら、実際に加工を行なった場合、光学系6や被加工
物7に当たった透過ビームLT の一部は、反射して同一
経路を戻るため、シャッタ手段5が閉じている場合と、
シャッタ手段が開いている場合とでは、光センサ3に入
射するレーザ光の値が異なる。すなわち、シャッタ手段
5が開いている場合、光学系6および被加工物7に当た
って反射し戻ってくる戻り光は、レーザ発振器1に戻
り、再度レーザ発振器1の反射ミラー9で反射し、光セ
ンサ3に入射するため、閉じている場合に部分反射ミラ
ー2で反射し光センサ3に入射するレーザ光の光量とが
異なる。その結果、正確な出力制御ができず、安定した
出力を得ることができないという問題があった。また、
特開昭58−204585号公報に開示されたレーザ装
置は、シャッタ手段5が閉じている非加工時しかレーザ
光の光量を検出することができず、加工時の光量をモニ
タすることができないという問題があった。
As described above, in the conventional laser device shown in FIG. 2, a part of the laser light output is detected by the optical sensor 3, and the output value is output by the output display circuit 4.
The output of the laser beam is displayed and is fed back to the laser oscillator to stabilize the laser light output. However, when the processing is actually performed, a part of the transmitted beam LT which hits the optical system 6 and the workpiece 7 is reflected and returns along the same path, so that when the shutter means 5 is closed,
The value of the laser light incident on the optical sensor 3 is different from when the shutter means is open. That is, when the shutter means 5 is open, the return light that is reflected by the optical system 6 and the workpiece 7 and returns, returns to the laser oscillator 1, is reflected again by the reflection mirror 9 of the laser oscillator 1, and the optical sensor 3 is returned. Therefore, the amount of laser light reflected by the partial reflection mirror 2 and incident on the optical sensor 3 when it is closed is different. As a result, there is a problem in that accurate output control cannot be performed and stable output cannot be obtained. Also,
The laser device disclosed in Japanese Unexamined Patent Publication No. 58-204585 can detect the light amount of the laser light only when the shutter means 5 is closed and is not processed, and cannot monitor the light amount during processing. There was a problem.

【0005】したがって、本発明は上記したような従来
の問題点に鑑みてされたもので、その目的とするところ
は、光センサに入射するレーザ光の光量をシャッタの開
閉状態に関係なく略一定にすることができるようにした
レーザ装置を提供することにある。
Therefore, the present invention has been made in view of the above-mentioned conventional problems, and an object thereof is to make the amount of laser light incident on the optical sensor substantially constant regardless of the open / close state of the shutter. Another object of the present invention is to provide a laser device capable of achieving the following.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、請求項1記載の発明は、レーザ光源から出射したレ
ーザ光の一部を反射するミラーと、前記ミラーにより反
射した反射ビームの光量を検出する光センサと、前記ミ
ラーを透過した透過ビームを間欠的に遮断するシャッタ
手段を有し、シャッタ手段が開いている時、前記透過ビ
ームを光学系を経て被加工物に入射させ加工を行うレー
ザ装置において、前記シャッタ手段にレーザ光の一部を
垂直反射する光学部品を備えたことを特徴とする。請求
項2記載の発明は、上記請求項1記載の発明において、
前記光学部品の反射率が、光学系と被加工物による反射
率と略等しいことを特徴とする。
In order to achieve the above object, the invention according to claim 1 provides a mirror for reflecting a part of laser light emitted from a laser light source, and a light amount of a reflected beam reflected by the mirror. An optical sensor for detecting and a shutter means for intermittently blocking a transmitted beam transmitted through the mirror are provided, and when the shutter means is opened, the transmitted beam is incident on a workpiece through an optical system for processing. In the laser device, the shutter means is provided with an optical component that vertically reflects a part of the laser light. The invention according to claim 2 is the same as the invention according to claim 1,
The reflectance of the optical component is substantially equal to the reflectance of the optical system and the workpiece.

【0007】[0007]

【作用】本発明において、光学部品は、シャッタ手段が
閉じている時、ミラーを透過した透過ビームの一部を反
射し、光センサに入射させる。この光学部品の反射率を
光学系と被加工物による反射率と略等しくしておくと、
光学部品による反射光と、シャッタ手段が開いている
時、光学系と被加工物により反射し光センサに入射する
反射光の光量とを略同一にすることができる。
In the present invention, the optical component reflects a part of the transmitted beam transmitted through the mirror and makes it incident on the optical sensor when the shutter means is closed. If the reflectance of this optical component is made approximately equal to the reflectance of the optical system and the work piece,
The amount of light reflected by the optical component and the amount of light reflected by the optical system and the workpiece and incident on the optical sensor when the shutter is open can be made substantially the same.

【0008】[0008]

【実施例】以下、本発明を図面に示す実施例に基づいて
詳細に説明する。図1は本発明に係るレーザ装置の一実
施例を示す概略構成図である。なお、図中図2と同一構
成部品のものに対しては同一符号をもって示し、その説
明を省略する。同図において、本実施例はシャッタ5の
レーザ発振器1側面に部分反射ミラー2を透過した透過
ビームLT の一部を略垂直に、つまり光軸方向に反射す
る光学部品としての反射ミラー10を配設したものであ
る。その他の構成は図2に示した従来装置と同様であ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the embodiments shown in the drawings. FIG. 1 is a schematic configuration diagram showing an embodiment of a laser device according to the present invention. In the figure, the same components as those in FIG. 2 are designated by the same reference numerals, and the description thereof will be omitted. In the figure, in this embodiment, a reflection mirror 10 as an optical component is provided on the side of the laser oscillator 1 of the shutter 5 so as to reflect a part of the transmitted beam LT transmitted through the partial reflection mirror 2 substantially vertically, that is, in the optical axis direction. It was set up. Other configurations are the same as those of the conventional device shown in FIG.

【0009】このような構成において、レーザ発振器1
から出射したレーザ光Lは、部分反射ミラー2によって
1%程度反射されて反射ビームLR となり、残り99%
が透過ビームLT となる。反射ビームLR は光センサ3
によって受光されて電気信号に変換され、出力表示回路
4によってレーザ光の相対出力値を表示する。また、レ
ーザ発振器1の出力制御のためフィードバックされる。
透過ビームLT は、シャッタ手段5が開いている時、光
学系6に入射し、被加工物7を照射加工する。この時、
透過ビームLT の10%程度が光学系6および被加工物
7に当たって反射することにより戻り光となり、元きた
経路を通ってレーザ発振器1に戻る。そして、この戻り
光はレーザ発振器1の反射ミラー9に当たって反射され
た後、部分反射ミラー2により反射されて光センサ3に
入射し、外乱を与える。そこで、この外乱の量を予め測
定し、同じ反射率(10%)の反射ミラー10をシャッ
タ手段5に配設しておくと、シャッタ手段5が閉じた状
態の時でも、レーザ加工を行っている時と同じ光量のレ
ーザ光を反射ミラー10によって光センサ3に入射させ
ることができる。したがって、光センサ3の出力値は、
シャッタ手段5の開閉状態に拘らず常に同じ値となり、
レーザ出力を高精度に制御することができる。
In such a configuration, the laser oscillator 1
The laser light L emitted from is reflected by the partial reflection mirror 2 by about 1% to become a reflected beam LR, and the remaining 99%.
Becomes the transmitted beam LT. The reflected beam LR is the light sensor 3
Is received and converted into an electric signal, and the output display circuit 4 displays the relative output value of the laser light. Further, it is fed back for controlling the output of the laser oscillator 1.
The transmitted beam LT is incident on the optical system 6 to irradiate the workpiece 7 when the shutter means 5 is open. At this time,
About 10% of the transmitted beam LT strikes the optical system 6 and the workpiece 7 and is reflected to become return light, which returns to the laser oscillator 1 through the original path. Then, the return light strikes the reflection mirror 9 of the laser oscillator 1, is reflected, and then is reflected by the partial reflection mirror 2 to enter the optical sensor 3 to give a disturbance. Therefore, if the amount of this disturbance is measured in advance and the reflection mirror 10 having the same reflectance (10%) is arranged in the shutter means 5, laser processing is performed even when the shutter means 5 is closed. The same amount of laser light as when the laser light is present can be made incident on the optical sensor 3 by the reflection mirror 10. Therefore, the output value of the optical sensor 3 is
Regardless of whether the shutter means 5 is open or closed, the value is always the same,
The laser output can be controlled with high accuracy.

【0010】[0010]

【発明の効果】以上説明したように本発明に係るレーザ
装置は、シャッタ手段にレーザ光の一部を反射する光学
部品を配設し、この光学部品に当たって反射した光を光
センサに入射させるようにしたので、シャッタ手段の開
閉状態に拘らず、光センサに入射するレーザ光の量を略
同じ値とすることができる。したがって、レーザ出力を
安定に制御することができ、加工品質を向上させ、生産
性に寄与するという効果を有する。また、光学部品とし
て、反射率が光学系と被加工物における反射率と略同じ
反射率の反射ミラーを配設するだけでよいので、構造が
簡単で、従来製品に対しても簡単に改造することができ
る。
As described above, in the laser device according to the present invention, the shutter means is provided with the optical component for reflecting a part of the laser light, and the light reflected by the optical component is incident on the optical sensor. Therefore, the amount of laser light incident on the optical sensor can be made substantially the same regardless of whether the shutter means is open or closed. Therefore, it is possible to stably control the laser output, improve the processing quality, and contribute to the productivity. Further, as an optical component, it is only necessary to dispose a reflection mirror having a reflectance substantially the same as that of the optical system and the workpiece, so that the structure is simple and the conventional product can be easily modified. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明に係るレーザ装置の一実施例を示す概
略構成図である。
FIG. 1 is a schematic configuration diagram showing an embodiment of a laser device according to the present invention.

【図2】 レーザ装置の従来例を示す概略構成図であ
る。
FIG. 2 is a schematic configuration diagram showing a conventional example of a laser device.

【符号の説明】[Explanation of symbols]

1…レーザ発振器、2…部分反射ミラー、3…光セン
サ、4…出力表示装置、5…シャッタ手段、6…光学
系、7…被加工物、10…反射ミラー。
DESCRIPTION OF SYMBOLS 1 ... Laser oscillator, 2 ... Partial reflection mirror, 3 ... Optical sensor, 4 ... Output display device, 5 ... Shutter means, 6 ... Optical system, 7 ... Workpiece, 10 ... Reflection mirror.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 レーザ光源から出射したレーザ光の一部
を反射するミラーと、前記ミラーにより反射された反射
ビームの光量を検出する光センサと、前記ミラーを透過
した透過ビームを間欠的に遮断するシャッタ手段を有
し、シャッタ手段が開いている時、前記透過ビームを光
学系を経て被加工物に入射させ加工を行うレーザ装置に
おいて、 前記シャッタ手段にレーザ光の一部を垂直反射する光学
部品を備えたことを特徴とするレーザ装置。
1. A mirror for reflecting a part of a laser beam emitted from a laser light source, an optical sensor for detecting a light quantity of a reflected beam reflected by the mirror, and a transmission beam transmitted through the mirror intermittently interrupted. In a laser device for performing processing by causing the transmitted beam to enter a workpiece through an optical system when the shutter means is opened, an optical device that vertically reflects a part of the laser light to the shutter means is provided. A laser device comprising parts.
【請求項2】 請求項2記載のレーザ装置において、前
記光学部品の反射率が、光学系と被加工物による反射率
と略等しいことを特徴とするレーザ装置。
2. The laser device according to claim 2, wherein the reflectance of the optical component is substantially equal to the reflectance of the optical system and the workpiece.
JP6134911A 1994-05-26 1994-05-26 Laser device Expired - Fee Related JP2663865B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6134911A JP2663865B2 (en) 1994-05-26 1994-05-26 Laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6134911A JP2663865B2 (en) 1994-05-26 1994-05-26 Laser device

Publications (2)

Publication Number Publication Date
JPH07314165A true JPH07314165A (en) 1995-12-05
JP2663865B2 JP2663865B2 (en) 1997-10-15

Family

ID=15139417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6134911A Expired - Fee Related JP2663865B2 (en) 1994-05-26 1994-05-26 Laser device

Country Status (1)

Country Link
JP (1) JP2663865B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096808A (en) * 2009-10-29 2011-05-12 Sumitomo Heavy Ind Ltd Laser processing device, and laser processing method
WO2013094758A1 (en) * 2011-12-22 2013-06-27 住友化学株式会社 Laser light irradiation system, laser light irradiation method, and recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011096808A (en) * 2009-10-29 2011-05-12 Sumitomo Heavy Ind Ltd Laser processing device, and laser processing method
WO2013094758A1 (en) * 2011-12-22 2013-06-27 住友化学株式会社 Laser light irradiation system, laser light irradiation method, and recording medium

Also Published As

Publication number Publication date
JP2663865B2 (en) 1997-10-15

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