JPH07300458A - Polymerizable imide compound and photocurable composition - Google Patents

Polymerizable imide compound and photocurable composition

Info

Publication number
JPH07300458A
JPH07300458A JP6125644A JP12564494A JPH07300458A JP H07300458 A JPH07300458 A JP H07300458A JP 6125644 A JP6125644 A JP 6125644A JP 12564494 A JP12564494 A JP 12564494A JP H07300458 A JPH07300458 A JP H07300458A
Authority
JP
Japan
Prior art keywords
meth
imide compound
acrylate
polymerizable imide
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6125644A
Other languages
Japanese (ja)
Inventor
Yuko Nishiyama
祐幸 西山
Hiroyuki Mikuni
博之 三国
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ThreeBond Co Ltd
Original Assignee
ThreeBond Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ThreeBond Co Ltd filed Critical ThreeBond Co Ltd
Priority to JP6125644A priority Critical patent/JPH07300458A/en
Publication of JPH07300458A publication Critical patent/JPH07300458A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject new compound excellent in solubility to organic solvents, and capable of improving the photocurability and heat resistance of heat-resistant photosensitive resins, thus useful for the coating materials in the electronic industry, etc., and as a raw material for heat-resistant photoresists, etc. CONSTITUTION:This compound is expressed by the formula [R<1> is a 2-20C C=C bond-contg. organic group such as vinyl, vinylidene or (meth)acrylic group], e.g. a compound where R<1> is methacryloyloxyethylene. This illustrated compound is obtained by reaction between 2-methacryloyloxyethyl isocyanate and 2,2-bis(3,4-dicarboxyphenyl)-hexafluoropropane dianhydride in DMF in the presence of tri-n-butylamine and phenothiazine.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、重合性イミド化合物及
びそれを含む光硬化性組成物に関する。
FIELD OF THE INVENTION The present invention relates to a polymerizable imide compound and a photocurable composition containing the same.

【0002】[0002]

【従来の技術】近年、耐熱性感光性樹脂は、電気・電子
工業の分野を中心に被覆材料、耐熱性フォトレジスト、
接着、ポッティング剤などとして広く利用されている。
2. Description of the Related Art In recent years, heat-resistant photosensitive resins have been used as coating materials, heat-resistant photoresists, mainly in the fields of electrical and electronic industries.
Widely used as an adhesive and potting agent.

【0003】この種の耐熱性感光性樹脂は、その本来の
特性として、光硬化性と光硬化後の耐熱性に優れている
ことが望まれる。
It is desired that the heat-resistant photosensitive resin of this kind has excellent photocurability and heat resistance after photocuring as its original characteristics.

【0004】ところが、従来公知の耐熱性感光性樹脂
は、これらの要求をいずれも満足するものは少ない。一
般に光硬化性に優れるものは光硬化後の耐熱性に劣るも
のが多い。
However, there are few conventionally known heat-resistant photosensitive resins which satisfy these requirements. In general, most of those having excellent photocurability are inferior in heat resistance after photocuring.

【0005】このような欠点を避けるためにベンゾフェ
ノン型の重合性イミド化合物が特開平3−271272
号公報に提案されている。しかしながら、この型の重合
性イミド化合物は溶解性に問題があるため、溶解希釈に
使用する有機溶媒に制限がある。更に感光性樹脂に溶解
する際、限られた有機溶媒の使用が必要となるなどの問
題を抱えている。
In order to avoid such drawbacks, a benzophenone type polymerizable imide compound is disclosed in JP-A-3-271272.
It is proposed in Japanese Patent Publication No. However, since this type of polymerizable imide compound has a problem of solubility, there is a limit to the organic solvent used for dissolving and diluting. Further, when it is dissolved in the photosensitive resin, there is a problem that it is necessary to use a limited organic solvent.

【0006】[0006]

【発明が解決しようとする課題】本発明は、上記した問
題点を解決するためになされたものであり、前記要求特
性を満足する耐熱性感光性樹脂硬化体を形成することが
でき、さらに各種有機溶媒への溶解性に優れる新規かつ
有用な重合性イミド化合物を提供することを目的とす
る。また、本発明は上記したような耐熱性感光性樹脂硬
化体を形成することができ、有機溶媒を使用しなくとも
液状化可能な光硬化性組成物を提供することを目的とす
る。
The present invention has been made to solve the above-mentioned problems, and it is possible to form a heat-resistant photosensitive resin cured product which satisfies the above-mentioned required characteristics, and further various It is an object of the present invention to provide a new and useful polymerizable imide compound having excellent solubility in an organic solvent. Another object of the present invention is to provide a photocurable composition capable of forming a heat-resistant photosensitive resin cured product as described above and capable of being liquefied without using an organic solvent.

【0007】[0007]

【課題を解決するための手段】本発明の重合性イミド化
合物は、一般式(I)
The polymerizable imide compound of the present invention has the general formula (I)

【0008】[0008]

【化2】 [Chemical 2]

【0009】(式中、Rは炭素数2〜30の炭素−炭
素二重結合含有有機基を表す)で表される単量体化合物
である。
(In the formula, R 1 represents a carbon-carbon double bond-containing organic group having 2 to 30 carbon atoms).

【0010】上記一般式におけるRは重合性の炭素−
炭素二重結合をもつ炭素数2〜30の有機基であれば特
に限定されないが、通常、ビニル基もしくはビニリデン
基又はアクリル基もしくはメタクリル基(両者を(メ
タ)アクリル基と略記する)をもつものが好ましい。具
体例としては
R 1 in the above general formula is a polymerizable carbon-
It is not particularly limited as long as it is an organic group having a carbon double bond and having 2 to 30 carbon atoms, but usually has a vinyl group, a vinylidene group, an acryl group or a methacryl group (both are abbreviated as (meth) acryl group) Is preferred. As a specific example

【0011】[0011]

【化3】 [Chemical 3]

【0012】[0012]

【化4】 [Chemical 4]

【0013】[0013]

【化5】 [Chemical 5]

【0014】[0014]

【化6】 [Chemical 6]

【0015】[0015]

【化7】 [Chemical 7]

【0016】(式中、mは0〜8の整数、nは2〜12
の整数、Rは−Hまたは−CHを表す)などが挙げ
られる。
(In the formula, m is an integer of 0 to 8 and n is 2 to 12)
, R 2 represents —H or —CH 3, and the like.

【0017】本発明の重合性イミド化合物はその二重結
合を利用して種々の重合反応に供しうるが、特に光重合
反応に好ましく利用され、通常使用される感光性樹脂と
共に光硬化性組成物として用いる場合に顕著な効果を発
現する。
The polymerizable imide compound of the present invention can be used for various polymerization reactions by utilizing its double bond, but it is particularly preferably used for photopolymerization reaction and is used together with a photopolymerizable resin which is usually used. When used as, a remarkable effect is exhibited.

【0018】従って本発明は第2に一般式(I)で表さ
れる重合性イミド化合物と感光性樹脂と光開始剤とを必
須成分とする光硬化性組成物を提供するものである。
Therefore, the present invention secondly provides a photocurable composition comprising a polymerizable imide compound represented by the general formula (I), a photosensitive resin and a photoinitiator as essential components.

【0019】本発明において感光性樹脂とは光開始剤存
在下に光照射することによって重合ないし硬化する有機
材料をいい、分子の状態はモノマー、オリゴマー、ポリ
マーのいずれでもよく、適宜公知のものが用いられる。
具体的には、例えば、感光性モノマーとしてメチル(メ
タ)アクリレート、エチル(メタ)アクリレート、ブチ
ル(メタ)アクリレート、2−エチルヘキシル(メタ)
アクリレート、ラウリル(メタ)アクリレート、2−ヒ
ドロキシエチル(メタ)アクリレート、2−ヒドロキシ
プロピル(メタ)アクリレート、2−ヒドロキシブチル
(メタ)アクリレート、4−ヒドロキシブチル(メタ)
アクリレート、2−ヒドロキシ−3−フェノキシプロピ
ル(メタ)アクリレート、フェニル(メタ)アクリレー
ト、フェノキシエチル(メタ)アクリレート、フェノキ
シジエチレングリコール(メタ)アクリレート、ジメチ
ルアミノエチル(メタ)アクリレート、ジエチルアミノ
エチル(メタ)アクリレート、テトラヒドロフルフリル
(メタ)アクリレート、シクロヘキシル(メタ)アクリ
レート、イソボルニル(メタ)アクリレート、ジシクロ
ペンテニルオキシエチル(メタ)アクリレート、ジシク
ロペンテニル(メタ)アクリレート、ジシクロペンタニ
ル(メタ)アクリレート、エチレングリコールジ(メ
タ)アクリレート、ジエチレングリコールジ(メタ)ア
クリレート、トリエチレングリコールジ(メタ)アクリ
レート、テトラエチレングリコールジ(メタ)アクリレ
ート、トリプロピレングリコールジ(メタ)アクリレー
ト、トリシクロデカンジメタノールジ(メタ)アクリレ
ートなどの(メタ)アクリレート単量体やジメチル(メ
タ)アクリルアミド、N−メチル(メタ)アクリルアミ
ド、(メタ)アクリロイルモルホルリンなどの(メタ)
アクリルアミド単量体のほか、ビニル単量体などを例示
することができる。更に、公知の感光性ポリアミック
酸、感光性ポリイミド、感光性ポリアミドイミドなどの
ポリマーを例示することができる。また上記のモノマー
やポリマーはオリゴマーの形で用いてもよい。また2種
以上を併用してもよい。
In the present invention, the photosensitive resin means an organic material which is polymerized or cured by irradiation with light in the presence of a photoinitiator, and the molecular state may be any of a monomer, an oligomer and a polymer. Used.
Specifically, for example, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) as a photosensitive monomer.
Acrylate, lauryl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth)
Acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, phenyl (meth) acrylate, phenoxyethyl (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, dimethylaminoethyl (meth) acrylate, diethylaminoethyl (meth) acrylate, Tetrahydrofurfuryl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentanyl (meth) acrylate, ethylene glycol di (Meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethyl (Meth) acrylate monomers such as glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, tricyclodecane dimethanol di (meth) acrylate, dimethyl (meth) acrylamide, N-methyl (meth) acrylamide , (Meth) acryloylmorpholine and other (meth)
In addition to acrylamide monomers, vinyl monomers and the like can be exemplified. Further, known polymers such as photosensitive polyamic acid, photosensitive polyimide and photosensitive polyamideimide can be exemplified. The above-mentioned monomers and polymers may be used in the form of oligomers. Moreover, you may use together 2 or more types.

【0020】光開始剤としては、例えば、アセトフェノ
ン、ジエトキシアセトフェノン、2−メチル−1−〔4
−(メチルチオ)フェニル〕−2−モルホリノプロパン
−1、ベンゾイン、ベンゾインエチルエーテル、ベンゾ
インイソプロピルエーテル、ベンジルジメチルケター
ル、ベンゾフェノン、ベンジル、メチルベンゾイルフォ
ルメート、チオキサントン、ジエチルチオキサントン、
2,2−ジメトキシ−2−フェニルアセトフェノン、1
−ヒドロキシシクロヘキシルフェニルケトン、2−ヒド
ロキシ−2−メチル−1−フェニルプロパン−1−オン
などを挙げることができる。これらは単独で用いても2
種以上を併用してもよい。
As the photoinitiator, for example, acetophenone, diethoxyacetophenone, 2-methyl-1- [4
-(Methylthio) phenyl] -2-morpholinopropane-1, benzoin, benzoin ethyl ether, benzoin isopropyl ether, benzyl dimethyl ketal, benzophenone, benzyl, methyl benzoyl formate, thioxanthone, diethyl thioxanthone,
2,2-dimethoxy-2-phenylacetophenone, 1
-Hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one and the like can be mentioned. These can be used alone 2
You may use together 1 or more types.

【0021】一般式(I)で表される重合性イミド化合
物(A)と感光性樹脂(B)は、(A)/(B)(重量
比)が5/95〜80/20の範囲で用いられることが
好ましい。
The polymerizable imide compound (A) represented by the general formula (I) and the photosensitive resin (B) have a ratio (A) / (B) (weight ratio) of 5/95 to 80/20. It is preferably used.

【0022】光開始剤は、(A)成分及び(B)成分1
00重量部に対して0.01〜30重量部の範囲で用い
ることが好ましく、0.05〜10重量部の範囲で用い
ることがより好ましい。この量が少なすぎると、感度が
低下する傾向があり、多すぎると安定性が低下する傾向
がある。
The photoinitiator is a component (A) and a component (B) 1
It is preferably used in the range of 0.01 to 30 parts by weight, more preferably 0.05 to 10 parts by weight with respect to 00 parts by weight. If this amount is too small, the sensitivity tends to decrease, and if it is too large, the stability tends to decrease.

【0023】本発明の光硬化性組成物は、適量の有機溶
媒に溶解して使用してもよい。有機溶媒としては、本発
明の一般式(I)で表される重合性イミド化合物及び用
いる光開始剤を溶解でき、かつ塗布などの作業性を阻害
しない限りその種類には特に制限はない。具体的には、
例えば、スルホラン、N,N−ジメチルアセトアミド、
N,N−ジメチルホルムアミド、N−メチル−2−ピロ
リドン、酢酸エチル、アセトン、メタノール、クロロホ
ルム、テトラヒドロフランなどを例示することができ
る。
The photocurable composition of the present invention may be dissolved in an appropriate amount of an organic solvent before use. The organic solvent is not particularly limited in type as long as it can dissolve the polymerizable imide compound represented by the general formula (I) of the present invention and the photoinitiator to be used and does not impair workability such as coating. In particular,
For example, sulfolane, N, N-dimethylacetamide,
Examples thereof include N, N-dimethylformamide, N-methyl-2-pyrrolidone, ethyl acetate, acetone, methanol, chloroform and tetrahydrofuran.

【0024】本発明の光硬化性組成物を調整するにあた
り、一般式(I)で表されるイミド化合物、感光性樹脂
及び光開始剤の混合順序、混合方法などには特に制限が
なく、従来技術に準じて行うことができる。
In preparing the photocurable composition of the present invention, there is no particular limitation on the mixing order, mixing method, etc. of the imide compound represented by the general formula (I), the photosensitive resin and the photoinitiator. It can be performed according to the technique.

【0025】本発明の光硬化性組成物は、使用方法によ
り適宜、必要に応じて適量の有機溶媒に溶解した後、例
えば、接着、コーティング、ポッティングなどの用途に
使用することができる。
The photocurable composition of the present invention can be used in applications such as adhesion, coating, potting, etc. after being dissolved in an appropriate amount of an organic solvent as needed depending on the method of use.

【0026】本発明の光硬化性組成物は、活性光線を照
射することにより、照射部において重合が起こり、耐熱
性のある感光性樹脂硬化体を形成する。活性光線として
は、通常紫外線が用いられるが、場合により、電子線、
放射線のような電離性放射線を用いることもできる。
When the photocurable composition of the present invention is irradiated with an actinic ray, polymerization occurs in the irradiated part to form a heat-resistant photosensitive resin cured product. Ultraviolet rays are usually used as the actinic rays, but in some cases, electron beams,
Ionizing radiation such as radiation can also be used.

【0027】本発明の光硬化性組成物は、有機溶媒を使
用することも可能であるが、重合性イミド化合物以外の
成分系が液状である限り、特に溶媒を使用しなくとも容
易に安定な液状を形成でき、基材に対する接着性に優れ
ると共に、光硬化後、加熱処理することにより、より高
い耐熱性をもった耐熱性感光性樹脂硬化体を形成するこ
とができる。
The photocurable composition of the present invention may use an organic solvent, but as long as the component system other than the polymerizable imide compound is liquid, it is easily stable without using a solvent. A heat-resistant photosensitive resin cured product having higher heat resistance can be formed by forming a liquid and having excellent adhesiveness to a substrate, and performing heat treatment after photocuring.

【0028】[0028]

【実施例】次に、本発明を実施例により詳しく説明する
が、本発明はこれら実施例により限定されるものではな
い。
EXAMPLES Next, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples.

【0029】実施例1 冷却器、温度計を備えた30ml容量の2つ口フラスコ
に2−メタクリロイルオキシエチルイソシアネート1.
240g(8mmol)、2,2−ビス(3,4−ジカ
ルボキシフェニル)−ヘキサフルオロプロパン2無水物
1.752g(4mmol)、トリ−n−ブチルアミン
0.037g(0.2mmol)、フェノチアジン7m
g、N,N−ジメチルホルムアミド10mlを仕込み、
温度を100℃に保ちながら5時間マグネチックスター
ラーで攪拌する。反応終了後、クロロホルムで抽出を行
い、続いて酢酸エチル:n−ヘキサン=2:1展開溶媒
を用いカラム分取を行い目的物の単離精製を行う。その
後、真空乾燥を行い黄色の固形物を得た。
Example 1 2-methacryloyloxyethyl isocyanate was added to a 30 ml two-necked flask equipped with a condenser and a thermometer.
240 g (8 mmol), 2,2-bis (3,4-dicarboxyphenyl) -hexafluoropropane dianhydride 1.752 g (4 mmol), tri-n-butylamine 0.037 g (0.2 mmol), phenothiazine 7 m.
g, 10 ml of N, N-dimethylformamide was charged,
Stir with a magnetic stirrer for 5 hours while maintaining the temperature at 100 ° C. After completion of the reaction, extraction with chloroform is carried out, and then column fractionation is carried out using an ethyl acetate: n-hexane = 2: 1 developing solvent to isolate and purify the desired product. Then, vacuum drying was performed to obtain a yellow solid.

【0030】得られた固形物の赤外吸収スペクトル(日
本分光工業(株)製IR−700型赤外分光光度計、K
Rs法)による分析結果を図1に示し、H−NMR
(日本電子(株)製FX−200型核磁気共鳴スペクト
ロメーター)による分析結果を図2に示した。図1にお
いてNo.1(2952cm−1)の−CH−、−C
に基づく吸収、No.3、4(1779、1719
cm−1)のイミドカルボニルに基づく吸収、No.5
(1637cm−1)のC=Cに基づく吸収が認められ
た。また、図2に示した通り全てのプロトンピークは帰
属され、それぞれの積分強度比も Aromat
ic H、H=6、 −C −N−、H=4、
−O−C −、H=4、 −C 、H=6、
=C 、H=4となり理論値と一致した。さらに、元
素分析を行ったところ、測定値はN:C:H=4.1
2:55.76:3.50となり、理論値N:C:H=
4.20:55.86:3.62とほぼ一致した。以上
のことより、一般式(I)(R:−CH−CH
O−CO−C(CH)=CH)で表される重合性イ
ミド化合物が得られたことが確認された。
Infrared absorption spectrum of the solid obtained (IR-700 infrared spectrophotometer manufactured by JASCO Corporation, K
Analytical results by Rs method) shown in FIG. 1, 1 H-NMR
The analysis results by (JEOL Ltd. FX-200 type nuclear magnetic resonance spectrometer) are shown in FIG. No. 1 in FIG. 1 (2952 cm −1 ) of —CH 2 —, —C
Absorption based on H 3 , No. 3, 4 (1779, 1719)
cm −1 ) based on imidocarbonyl absorption, No. 5
Absorption based on C = C at (1637 cm −1 ) was observed. Further, as shown in FIG. 2, all the proton peaks are assigned, and their integrated intensity ratios are also Aromat.
ic H, H = 6, -C H 2 -N-, H = 4,
-O-C H 2 -, H = 4, -C H 3, H = 6,
= C H 2 , H = 4, which was in agreement with the theoretical value. Furthermore, when elemental analysis was performed, the measured value was N: C: H = 4.1.
2: 55.76: 3.50 and theoretical value N: C: H =
It almost coincided with 4.20: 55.86: 3.62. From the above, the general formula (I) (R 1 : —CH 2 —CH 2
It was confirmed that a polymerizable imide compound represented by O—CO—C (CH 3 ) ═CH 2 ) was obtained.

【0031】実施例2 得られた一般式(I)(R:−CH−CH−O−
CO−C(CH)=CH)で表される重合性イミド
化合物の有機溶媒溶解性を確認するため、一般式(I)
(R:−CH−CH−O−CO−C(CH)=
CH)で表される重合性イミド化合物30mgを有機
溶媒1mlに添加し、室温で5分間マグネチックスター
ラーで攪拌した。使用した有機溶媒及び有機溶媒溶解性
試験の結果を表1に示す。
Example 2 Obtained general formula (I) (R 1 : --CH 2 --CH 2 --O--
In order to confirm the solubility of the polymerizable imide compound represented by CO—C (CH 3 ) ═CH 2 ) in the organic solvent, the compound represented by the general formula (I)
(R 1: -CH 2 -CH 2 -O-CO-C (CH 3) =
30 mg of a polymerizable imide compound represented by CH 2 ) was added to 1 ml of an organic solvent, and the mixture was stirred with a magnetic stirrer for 5 minutes at room temperature. Table 1 shows the organic solvent used and the results of the organic solvent solubility test.

【0032】実施例3 得られた一般式(I)(R:−CH−CH−O−
CO−C(CH)=CH)で表される重合性イミド
化合物の感光性樹脂溶解性を確認するため、一般式
(I)(R:−CH−CH−O−CO−C(CH
)=CH)で表される重合性イミド化合物10mg
を感光性樹脂0.5mlに添加し、室温で5分間マグネ
チックスターラーで攪拌した。使用した感光性樹脂及び
感光性樹脂溶解性試験の結果を表2に示す。
Example 3 The obtained general formula (I) (R 1 : --CH 2 --CH 2 --O--
In order to confirm the solubility of the polymerizable imide compound represented by CO—C (CH 3 ) ═CH 2 in the photosensitive resin, the compound represented by the general formula (I) (R 1 : —CH 2 —CH 2 —O—CO— C (CH
3 ) = CH 2 ) polymerizable imide compound 10 mg
Was added to 0.5 ml of a photosensitive resin, and the mixture was stirred with a magnetic stirrer for 5 minutes at room temperature. The photosensitive resin used and the result of the photosensitive resin solubility test are shown in Table 2.

【0033】実施例4 得られた一般式(I)(R:−CH−CH−O−
CO−C(CH)=CH)で表される重合性イミド
化合物0.2g、感光性樹脂として2−ヒドロキシエチ
ルメタクリレート0.2g、光開始剤として1−フェニ
ル−2−ヒドロキシ−2−メチルプロパン−1−オン
0.02g、クロロホルム2gを攪拌混合後、ガラス板
上に塗布し、真空乾燥により樹脂塗膜を得た。その後、
2700mJ/cmの紫外線を照射し光硬化樹脂塗膜
を得た。
Example 4 The obtained general formula (I) (R 1 : --CH 2 --CH 2 --O--
CO-C (CH 3 ) = CH 2 ) 0.2 g of a polymerizable imide compound, 0.2 g of 2-hydroxyethyl methacrylate as a photosensitive resin, and 1-phenyl-2-hydroxy-2- as a photoinitiator. Methylpropan-1-one (0.02 g) and chloroform (2 g) were stirred and mixed, and then coated on a glass plate and vacuum dried to obtain a resin coating film. afterwards,
It was irradiated with ultraviolet rays of 2700 mJ / cm 2 to obtain a photocurable resin coating film.

【0034】光硬化した樹脂塗膜のTG測定により熱分
解温度(10%重量減温度)を測定し、その結果を表3
に示す。
The thermal decomposition temperature (10% weight loss temperature) was measured by TG measurement of the photocured resin coating film, and the results are shown in Table 3.
Shown in.

【0035】実施例5 得られた一般式(I)(R:−CH−CH−O−
CO−C(CH)=CH)で表される重合性イミド
化合物0.2g、感光性樹脂としてイソボルニルメタク
リレート0.2g、光開始剤として1−フェニル−2−
ヒドロキシ−2−メチルプロパン−1−オン0.02
g、クロロホルム2gを攪拌混合後、ガラス板上に塗布
し、真空乾燥により樹脂塗膜を得た。その後、2700
mJ/cmの紫外線を照射し光硬化樹脂塗膜を得た。
Example 5 The obtained general formula (I) (R 1 : --CH 2 --CH 2 --O--
CO-C (CH 3) = CH 2) polymerizable imide compound represented by 0.2g, isobornyl methacrylate 0.2g as a photosensitive resin, as a photoinitiator 1-phenyl-2-
Hydroxy-2-methylpropan-1-one 0.02
g and 2 g of chloroform were mixed by stirring, then applied on a glass plate and vacuum dried to obtain a resin coating film. Then 2700
Ultraviolet rays of mJ / cm 2 were irradiated to obtain a photocurable resin coating film.

【0036】光硬化した樹脂塗膜のTG測定により熱分
解温度(10%重量減温度)を測定し、その結果を表3
に示す。
The thermal decomposition temperature (10% weight loss temperature) was measured by TG measurement of the photocured resin coating film, and the results are shown in Table 3.
Shown in.

【0037】比較例1 冷却器、温度計を備えた30ml容量の2つ口フラスコ
に2−メタクリロイルオキシエチルイソシアネート1.
240g(8mmol)、3,3’,4,4’−ベンゾ
フェノンテトラカルボン酸2無水物1.289g(4m
mol)、トリ−n−ブチルアミン0.037g(0.
2mmol)、フェノチアジン7mg、N,N−ジメチ
ルホルムアミド10mlを仕込み、温度を100℃に保
ちながら5時間マグネチックスターラーで攪拌する。反
応終了後、クロロホルムで抽出を行い、続いてアセトン
により再結晶を行い、濾過後真空乾燥を行い白色の固形
物を得た。
Comparative Example 1 2-methacryloyloxyethyl isocyanate was added to a 30 ml capacity two-necked flask equipped with a condenser and a thermometer.
240 g (8 mmol), 3,3 ', 4,4'-benzophenone tetracarboxylic acid dianhydride 1.289 g (4 m
mol), 0.037 g of tri-n-butylamine (0.
2 mmol), phenothiazine 7 mg, and N, N-dimethylformamide 10 ml are charged, and the mixture is stirred with a magnetic stirrer for 5 hours while maintaining the temperature at 100 ° C. After completion of the reaction, extraction with chloroform was carried out, followed by recrystallization with acetone, filtration and vacuum drying to obtain a white solid.

【0038】得られた固形物は、元素分析、赤外吸収ス
ペクトル分析及びH−NMR分析により一般式(I
I)で表される重合性イミド化合物が得られたことが確
認された。
The solid obtained was analyzed by elemental analysis, infrared absorption spectrum analysis and 1 H-NMR analysis to obtain the compound of the general formula (I
It was confirmed that the polymerizable imide compound represented by I) was obtained.

【0039】[0039]

【化8】 [Chemical 8]

【0040】比較例2 得られた一般式(II)で表される重合性イミド化合物
の有機溶媒溶解性を確認するため、一般式(II)で表
される重合性イミド化合物30mgを有機溶媒1mlに
添加し、室温で5分間マグネチックスターラーで攪拌し
た。使用した有機溶媒及び有機溶媒溶解性試験の結果を
表1に示す。
Comparative Example 2 To confirm the solubility of the obtained polymerizable imide compound represented by the general formula (II) in an organic solvent, 30 mg of the polymerizable imide compound represented by the general formula (II) was added to 1 ml of an organic solvent. And stirred with a magnetic stirrer for 5 minutes at room temperature. Table 1 shows the organic solvent used and the results of the organic solvent solubility test.

【0041】比較例3 得られた一般式(II)で表される重合性イミド化合物
の感光性樹脂溶解性を確認するため、一般式(II)で
表される重合性イミド化合物10mgを感光性樹脂0.
5mlに添加し、室温で5分間マグネチックスターラー
で攪拌した。使用した感光性樹脂及び感光性樹脂溶解性
試験の結果を表2に示す。
Comparative Example 3 In order to confirm the solubility of the obtained polymerizable imide compound represented by the general formula (II) in a photosensitive resin, 10 mg of the polymerizable imide compound represented by the general formula (II) was used as a photosensitive compound. Resin 0.
It was added to 5 ml and stirred with a magnetic stirrer for 5 minutes at room temperature. The photosensitive resin used and the result of the photosensitive resin solubility test are shown in Table 2.

【0042】比較例4 感光性樹脂として2−ヒドロキシエチルメタクリレート
0.4g、光開始剤として1−フェニル−2−ヒドロキ
シ−2−メチルプロパン−1−オン0.02g、クロロ
ホルム2gを攪拌混合後、ガラス板上に塗布し、真空乾
燥により樹脂塗膜を得た。その後、2700mJ/cm
の紫外線を照射し光硬化樹脂塗膜を得た。
Comparative Example 4 0.4 g of 2-hydroxyethyl methacrylate as a photosensitive resin, 0.02 g of 1-phenyl-2-hydroxy-2-methylpropan-1-one as a photoinitiator, and 2 g of chloroform were stirred and mixed. It was applied on a glass plate and vacuum dried to obtain a resin coating film. After that, 2700 mJ / cm
It was irradiated with ultraviolet rays of 2 to obtain a photocurable resin coating film.

【0043】光硬化した樹脂塗膜のTG測定により熱分
解温度(10%重量減温度)を測定し、その結果を表3
に示す。
The thermal decomposition temperature (10% weight loss temperature) was measured by TG measurement of the photocured resin coating film, and the results are shown in Table 3.
Shown in.

【0044】比較例5 感光性樹脂としてイソボルニルメタクリレート0.4
g、光開始剤として1−フェニル−2−ヒドロキシ−2
−メチルプロパン−1−オン0.02g、クロロホルム
2gを攪拌混合後、ガラス板上に塗布し、真空乾燥によ
り樹脂塗膜を得た。その後、2700mJ/cmの紫
外線を照射し光硬化樹脂塗膜を得た。
Comparative Example 5 Isobornyl methacrylate 0.4 as a photosensitive resin
g, 1-phenyl-2-hydroxy-2 as a photoinitiator
-Methylpropan-1-one (0.02 g) and chloroform (2 g) were stirred and mixed, and then coated on a glass plate and vacuum dried to obtain a resin coating film. Then, it was irradiated with 2700 mJ / cm 2 of ultraviolet rays to obtain a photocurable resin coating film.

【0045】光硬化した樹脂塗膜のTG測定により熱分
解温度(10%重量減温度)を測定し、その結果を表3
に示す。
The thermal decomposition temperature (10% weight loss temperature) was measured by TG measurement of the photocured resin coating film, and the results are shown in Table 3.
Shown in.

【0046】[0046]

【表1】 [Table 1]

【0047】[0047]

【表2】 [Table 2]

【0048】[0048]

【表3】 [Table 3]

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1で得た重合性イミド化合物の赤外吸収
スペクトル。
FIG. 1 is an infrared absorption spectrum of the polymerizable imide compound obtained in Example 1.

【図2】実施例1で得た重合性イミド化合物の核磁気共
鳴スペクトル。
2 is a nuclear magnetic resonance spectrum of the polymerizable imide compound obtained in Example 1. FIG.

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 G03F 7/027 514 Continuation of front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location G03F 7/027 514

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一般式(I) 【化1】 (式中、Rは炭素数2〜30の炭素−炭素二重結合含
有有機基を表す)で表される重合性イミド化合物。
1. A compound represented by the general formula (I): (In the formula, R 1 represents a carbon-carbon double bond-containing organic group having 2 to 30 carbon atoms).
【請求項2】 請求項1記載の重合性イミド化合物、感
光性樹脂及び光開始剤からなることを特徴とする光硬化
性組成物。
2. A photocurable composition comprising the polymerizable imide compound according to claim 1, a photosensitive resin and a photoinitiator.
JP6125644A 1994-04-28 1994-04-28 Polymerizable imide compound and photocurable composition Pending JPH07300458A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6125644A JPH07300458A (en) 1994-04-28 1994-04-28 Polymerizable imide compound and photocurable composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6125644A JPH07300458A (en) 1994-04-28 1994-04-28 Polymerizable imide compound and photocurable composition

Publications (1)

Publication Number Publication Date
JPH07300458A true JPH07300458A (en) 1995-11-14

Family

ID=14915129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6125644A Pending JPH07300458A (en) 1994-04-28 1994-04-28 Polymerizable imide compound and photocurable composition

Country Status (1)

Country Link
JP (1) JPH07300458A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999036369A1 (en) * 1998-01-16 1999-07-22 Rockwool International A/S Use of a water soluble binder system for the production of glass or stone wool
WO2000027895A1 (en) * 1998-11-10 2000-05-18 Teijin Seiki Co., Ltd. Photocurable resin composition and method of optically forming three-dimensional shape
KR100780505B1 (en) * 1999-12-28 2007-11-29 가부시키가이샤 가네카 Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide
JP2010534651A (en) * 2007-07-26 2010-11-11 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Alcohols containing imide moieties and reactive oligomers produced therefrom
KR20230057444A (en) 2020-09-29 2023-04-28 후지필름 가부시키가이샤 Resin composition, cured product, laminate, method for producing cured product, and semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999036369A1 (en) * 1998-01-16 1999-07-22 Rockwool International A/S Use of a water soluble binder system for the production of glass or stone wool
WO1999036368A1 (en) * 1998-01-16 1999-07-22 Rockwool International A/S Compound for use as a mineral fibre binder and process for providing such
WO2000027895A1 (en) * 1998-11-10 2000-05-18 Teijin Seiki Co., Ltd. Photocurable resin composition and method of optically forming three-dimensional shape
US6432607B1 (en) 1998-11-10 2002-08-13 Teijin Seiki Co., Ltd. Photocurable resin composition and method of optically forming three-dimensional shape
KR100780505B1 (en) * 1999-12-28 2007-11-29 가부시키가이샤 가네카 Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide
JP2010534651A (en) * 2007-07-26 2010-11-11 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Alcohols containing imide moieties and reactive oligomers produced therefrom
KR20230057444A (en) 2020-09-29 2023-04-28 후지필름 가부시키가이샤 Resin composition, cured product, laminate, method for producing cured product, and semiconductor device

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