JPH07294897A - Production of dot matrix type liquid crystal display device - Google Patents

Abstract

PURPOSE:To easily form black stripes (films) having a high optical density at a low cost with high accuracy by irradiating a transparent substrate with light from the side opposite to the coated surface with a transparent conductive film as a mask, thereby forming the back stripes only between the striped transparent conductive films. CONSTITUTION:A coating liquid 3 of a negative photosetting resin compsn. for a black light shielding layer having an electrical insulating characteristic is applied by a method, such as spin coating on the transparent conductive substrate 1 formed with the transparent conductive films 2 on its one surface. After the solvent is evaporated away by prebaking, the coating is irradiated with UV rays from the rear surface. The unexposed parts (the parts on the transparent conductive films 2) are dissolved away by a developer consisting of an alkaline aq. soln. and the substrate is rinsed with pure water; thereafter, the substrate is subjected to drying and post baking, by which the light shielding layers 4 are formed. The transparent conductive films 2 do not allow transmission of the greater part of the light if the wavelength of the light is 300 to 320nm in the case the transparent conductive films 2 are ITO (cured matter of indium/oxide of tin oxide). The transparent conductive films are thus usable as a photomask. The negative type photosetting resin compsn. may contain an alkaline-soluble copolymer, radiation sensitive compd. and color materials.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a high definition dot matrix liquid crystal display. For more details,
The present invention relates to a method for manufacturing a high-definition and high-contrast simple matrix type dot matrix liquid crystal display device having a black stripe which is an electrically insulating black light-shielding layer formed between striped transparent conductive films. The transparent conductive substrate is a high-performance substrate that can be applied to other display devices such as EL.

2. Description of the Related Art In recent years, since dot matrix type liquid crystal display devices are thin and lightweight and have good display quality, their applications as liquid crystal TVs, display devices for portable personal computers, and display devices for measuring instruments are rapidly expanding. , Its performance has reached the same level as that of cathode ray tubes. The dot matrix liquid crystal display devices that have been developed and used include active matrix type, TN (twisted nematic) type, STN (super twisted nematic) type, and strong There is a simple matrix type liquid crystal display device using a dielectric type liquid crystal and an antiferroelectric type liquid crystal. The active matrix type liquid crystal display device can display the highest quality such as color, operation speed of a picture, and contrast, but the process is complicated because a switching element such as a TFT or a diode is formed in each pixel on the transparent substrate. Therefore, the manufacturing cost becomes high. On the other hand, the other simple matrix type liquid crystal display device has a simple structure and thus the manufacturing cost is low. However, as the number of pixels, in particular, the duty ratio (the reciprocal of the number of scanning lines of a simple matrix LCD that performs time-division driving) increases, the ratio of effective voltage when ON and OFF that can be applied to one pixel decreases.
The contrast ratio of the display decreases and it becomes difficult to see
In the mold, the duty ratio of about 1/30 is a practical limit.
On the other hand, the STN type liquid crystal display device in which the light transmission / blocking characteristic of the liquid crystal with respect to the applied voltage change is made steep to improve the contrast of the image at a high duty ratio, the liquid crystal itself has a memory property without the switching element of each pixel. Therefore, ferroelectric type liquid crystals and anti-ferroelectric type liquid crystals capable of high-contrast display have been developed, and high-quality image display has become possible even with a simple matrix type. In particular, the STN type liquid crystal is an inexpensive and high-quality display device, and the display device of a portable personal computer or a portable word processor is most widely used as a typical application. However, the STN display device which is a simple matrix type has disadvantages such as lower contrast than a cathode ray tube or an active matrix type liquid crystal display device, a narrow viewing angle, and large eye fatigue when used for a long time. There has been a demand for improvement in display quality.

[0002]

In the STN type liquid crystal, when only the pixel portion sandwiched by the transparent electrodes is targeted, it is turned on / off in the black and white type using the compensation cell or the retardation film.
An OFF contrast ratio of 40 to 50 can be achieved. However, a portion (hereinafter referred to as a matrix portion) between the stripe-shaped transparent conductive films (ITO or the like) formed on the opposing substrates occupies 15 to 40% of the area of the display device. This matrix portion usually acts in the direction of lowering the contrast ratio, and the average contrast ratio of the matrix portion and the pixel portion of the display device is lowered to about 5 to 20, resulting in poor display quality. Especially for high duty ratio,
For example, when the duty ratio is 1/200 or more, it is remarkable. In a high-definition dot matrix STN type liquid crystal display device, the film thickness of the transparent conductive film such as ITO is 0.1.
In many cases, it is designed to maximize the contrast ratio of the pixel portion having the transparent conductive film on both surfaces of the transparent substrate. At that time, especially retardation (△
n × D, Δn: difference in photorefractive index of liquid crystal with and without application of drive voltage, D: cell gap (thickness of liquid crystal layer))
In the STN type, which requires precise control, it is difficult to control the light transmittance in the matrix portion because the retardation differs from that in the pixel portion by the amount corresponding to the difference in the film thickness of the transparent conductive film. In the matrix portion where there is no transparent conductive film on both the counter substrates, a voltage is not applied even when the pixel portion is moved, so in many cases, it is often designed to become black when no voltage is applied. The light leaks due to the difference in retardation and becomes brighter than the pixel portion. As a result, the contrast ratio of the display device as a whole is significantly lower than the design value of only the pixel portion. In order to prevent such a phenomenon, a flattening film of an organic material such as a transparent varnish, an inorganic material or an organic / inorganic composite material is formed on a transparent substrate on which a stripe-shaped transparent conductive film is formed to form a transparent conductive film. Although a method of making the surface level of the part that is formed and the part that is not formed uniform is also used, it is not possible to completely eliminate the difference in surface level, and it is said that the above problem has been sufficiently solved. I can't say. Further, there is also a method in which another transparent electrode is formed in a portion corresponding to black matrix without using a light-shielding layer, and liquid crystal is aligned to some extent and a voltage is constantly applied so as to turn black (Japanese Patent Laid-Open No. 4-350625). However, it has a drawback that the structure of the display device becomes very complicated.
There is also a method (Japanese Patent Laid-Open No. 4-3121) in which a resist is applied to the surface of a transparent conductive film of ITO and patterned, and then a portion without the resist is chemically reduced to blacken it to form a black matrix, but black. Since the converted portion is conductive, it cannot be used in the case of a transparent conductive film having a stripe pattern because adjacent stripes are electrically connected to each other.

There is also a method of obtaining a black matrix by printing an ink mixed with a black colorant such as carbon black or a pigment. As for the printing method, the development of high-definition printing technology has progressed in recent years, and it has become possible to print a pattern of several μm in a small area. However, due to uneven leakage of ink and the plate material, deformation of the plate material due to stress when printing (transferring), etc., the finer the pattern and the larger the area, the more the pattern shape of the ink in the plane or the cross section is changed. It is difficult to obtain uniformity, and there is a drawback that a good transferred image cannot be obtained. In the case of a photolinography method using a photocrosslinkable liquid mixed with a black colorant such as a pigment, a photomask is usually used and light is exposed from the surface coated with the photocrosslinkable liquid (for example, Japanese Patent Laid-Open No. Hei 4). No. 40420) is well known. As this method, there are known a method of exposing by batch or division by projection, proximity (contact), etc., and a method of exposing by scanning a beam of light, X-rays or electron beams. There are drawbacks such as difficulty in aligning the substrate (work) and the need for expensive equipment.

In order to solve the above-mentioned drawbacks, light of a wavelength range which does not pass through the filter material in the color filter is used to expose from the back surface of the substrate coated with the photocrosslinkable liquid (JP-A-5-203807). Depending on the method, the mask may be omitted and self-alignment may be performed.
For a transparent conductive film substrate without a color filter, a metal film is formed only on the patterned transparent conductive film by vapor deposition or electroless plating, and this is used as a mask to apply a photo-crosslinking liquid to expose from the back side. (JP-A-2-20471
No. 7, JP-A-3-246516), a method for producing a transparent conductive film substrate having a black matrix formed by self-alignment without using a mask is known. The steps of forming a metal film and removing it later are complicated, resulting in reduced yield and increased costs. Thus, a method for improving the contrast ratio of a high-definition simple matrix liquid crystal display device,
More specifically, there has not been found a method of forming a black stripe (film) of high optical density in a matrix portion other than the display portion of a transparent conductive substrate with high accuracy and ease, at low cost.

According to the present invention, there is provided a dot-matrix type liquid crystal display device having transparent transparent conductive films substantially orthogonal to each other on opposing inner surfaces of two transparent substrates facing each other. An object of the present invention is to provide a simple dot matrix type liquid crystal display device having an electrically insulating black light shielding layer between conductive films. Further, the electrically insulating black light-shielding layer formed between the striped transparent conductive films of the present invention is formed of the negative photocurable resin composition in which a color material is dispersed to form the transparent conductive film of the transparent substrate. Liquid crystal with high display quality by a method of applying only the transparent conductive film as a mask and irradiating light from the opposite side of the transparent substrate to form only between the stripe-shaped transparent conductive films. A display device can be provided. That is, the transparent conductive film on the transparent substrate is used as an exposure mask, and accurate position accuracy and a black stripe having a good pattern shape can be easily and easily formed without the need for an expensive device and a difficult alignment operation as described above. It can be formed at low cost. Moreover, according to the present invention,
Even if the transparent conductive film has a pattern defect (a defect in the area where the area is reduced), the black stripe film blocks that portion, so that the defect does not become a conspicuous bright spot during display operation and the defect is conspicuous. The advantage of disappearing is also great. The forming process will be described more specifically with reference to FIG. A transparent conductive substrate having a transparent conductive film formed on one surface (FIG. 1-1) is coated with a coating liquid of a negative light-curable resin composition of an electrically insulating black light-shielding layer as described later by a method such as spin coating. After coating and evaporating and removing the solvent by pre-baking, ultraviolet light is irradiated from the back surface (Fig. 1-2). The unexposed area (portion on the transparent conductive film) is dissolved and removed with a developer of an alkaline aqueous solution, rinsed with pure water, dried and post-baked to form a light-shielding layer (Fig. 1-
3). The transparent conductive film used in the present invention is, for example, the most popular ITO (oxide of indium oxide / tin oxide).
In this case, most of the light does not pass at wavelengths of about 300 to 320 nm and can be used as an optical mask.

The photocrosslinkable negative-type photocurable resin composition used in the present invention comprises (A) an alkali-soluble copolymer,
It may contain (B) a radiation-sensitive compound and (C) a coloring material.

The alkali-soluble resin (A) is prepared by combining a monomer having an acid group such as an ethylenically unsaturated carboxylic acid and an ethylenically unsaturated sulfonic acid with a monomer having no acid group capable of copolymerization. It consists of a copolymer. The monomer having an acid group is preferably an ethylenically unsaturated carboxylic acid because the degree of polymerization can be easily controlled. Examples of the ethylenically unsaturated carboxylic acid include (meth) acrylic acid, crotonic acid, itaconic acid,
Maleic acid, fumaric acid, maleic acid monoalkyl ester and fumaric acid monoalkyl ester can be mentioned as preferable ones. Examples of the ethylenically unsaturated sulfonic acid include isoprene sulfonic acid and styrene sulfonic acid. Examples of the monomer (A) having no copolymerizable acid group include aromatic vinyl compounds such as styrene, α-methylstyrene and vinyltoluene, methyl (meth) acrylate, ethyl (meth) acrylate, butyl. Ethylenically unsaturated carboxylic acid esters such as (meth) acrylate, 2-hydroxyethyl (meth) acrylate, benzyl (meth) acrylate, vinyl acetate, carboxylic acid vinyl esters such as vinyl propionate, (meth) acrylonitrile, α-chloro. Vinyl cyanide such as acrylonitrile, 1,3
Examples thereof include aliphatic conjugated dienes such as butadiene, 2-methyl-1,3-butadiene, and isoprene. Further, ethylenically unsaturated carboxylic acid aminoalkyl ester such as aminoethyl acrylate, unsaturated fatty acid glycidyl ester such as glycidyl (meth) acrylate, polystyrene having a (meth) acryloyl group at the terminal, polymethyl (meth) acrylate, polybutyl (meth) It is also possible to use a macromonomer containing acrylate or polysilicone. As a method for obtaining the copolymer, an ordinary well-known method, for example, a radical polymerization method can be adopted.

The radiation-sensitive compound (B) is, for example, a photopolymerization initiator which is decomposed by radiation to liberate an active compound such as a radical, and thereby a chain reaction of unsaturated double bonds is caused. , A combination of (meth) acrylic oligomers (hereinafter referred to as “three-dimensional acrylic oligomers”) that become three-dimensionally cross-linked compounds, or irradiation with radiation dissociates molecules into active compounds such as radicals, resulting in C = C bonds. Another example is a compound that bonds to a C—H bond by an insertion reaction to form a three-dimensional crosslinked structure by itself acting as a crosslinking agent. Examples of the photopolymerization initiator include carbonyl compounds, azo compounds or azide compounds, peroxides or trihalomethane compounds. Specific examples of the carbonyl compound include diacetyl, benzyl, benzoin, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1
-(4-Isopropylphenyl) -2-hydroxy-2
-Methylpropan-1-one, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl)
Ketone, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- [4- (methylthio) phenyl] -2
-Morpholino-1-propan-1-one, 2-benzyl-2-dimethylamino-1- (4-monofolinophenyl) -butan-1-one, benzophenone, 4,4 '
-Bis (dimethylamino) benzophenone, 4,4'bis (diethylamino) benzophenone, 2,4-diethylthioxanthone, 3,3-dimethyl-4-methoxybenzophenone and the like.

As the azo compound and the azide compound,
Azoisobutyronitrile, diazonium, 4-azidobenzaldehyde, 4-azidoacetophenone, 4-azidobenzalacetophenone, 4-azidobenzalacetone, azidopyrene, 4-diazodiphenylamine, 4-
Examples thereof include diazo-4'-methoxydiphenylamine and 4-diazo-3'-methoxydiphenylamine.
Examples of peroxides include diethyl ether peroxide. As the trihalomethane compound, 1,
3-bis (trichloromethyl) -5- (2'-chlorophenyl) -s-triazine, 1,3-bis (trichloromethyl) -5- (4'-methoxyphenyl) -s-triazine and the like can be mentioned. As a three-dimensional acrylic oligomer, trimethylolpropane triacrylate,
Polyerythrates such as pentaerythritol triacrylate, trisacryloyloxyethylphosphade, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, condensate of 4-azidobenzaldehyde and polyvinyl alcohol, 4-azidobenzaldehyde and Condensate of phenol novolac resin,
Examples thereof include polymers or copolymers of 4-acryloylphenylcinnamoyl ester. The compounds that form the three-dimensional crosslinked structure of diad chalcone, 2,
6-bis (4'-azidobenzal) cyclohexanone,
2,6-bis (4'-azidobenzal) -4-methylcyclohexanone, 1,3-bis (4'-azidobenzal) -2-propane, 1,3-bis (4'-azidocinnamylidene) -2- Examples include propane and 4,4'-diazidostilbene. Among these radiation-sensitive compounds, it is preferable to use, as a photopolymerization initiator, a compound that generates a radical upon irradiation with radiation and a polyvalent acrylate.
Furthermore, the sensitivity to light above 300 nm is 300 nm.
Those having lower sensitivity to light of the following wavelengths are preferable, and the following are examples of combinations thereof. For example, 2-methyl- [4- (methylthio) phenyl]-
2-morpholino-1-propan-1-one (CIBA
GEIGY Co., Ltd. Irgacure 907), 2,2-dimethoxy-2-phenylacetophenone (Irgacure-651), 1-hydroxycyclohexyl phenyl ketone (Irgacure-184), or benzophenone is used as a photopolymerization initiator, and pentaerythritol tritium is used. Acrylate or dipentaerythritol hexaarylate is used as the three-dimensional acrylic oligomer. In this case, the photopolymerization initiator is the three-dimensional acrylic oligomer 1
0.01 to 200, preferably 1 to 100 polymer parts
120 parts by weight are used.

As the colorant (C), both organic pigments and inorganic pigments that turn black can be used. The organic pigment is preferably a dye or pigment insoluble in water or an organic solvent. Specifically, the Color Index (The Society of Dyers a
The compounds classified as Pigment of nd Colorists publication) can be mentioned. It is also possible to use carbon black. Further, as the inorganic pigment,
A metal-containing compound represented by a metal oxide or a metal complex is preferable. Specifically, iron, cobalt, silver, cadmium,
Examples thereof include metal compounds such as lead, copper, chromium and antimony (oxides, complex oxides, sulfides, etc.).
Specific examples of the pigment (C) include C.I. I. Pigment
Yellow 24, C.I. I. Pigment Ye
low 31, C.I. I. Pigment Yellow
w 53, C.I. I. Pigment Yellow 8
3, C.I. I. Pigment Orange 43,
C. I. Pigment Red 105, C.I. I. P
igment Red 149, C.I. I. Pigmen
t Red 176, C.I. I. Pigment Red
177, C.I. I. Pigment Violet 1
4, C.I. I. Pigment Violet 23,
C. I. Pigment Violet 29, C.I.
I. Pigment Blue 15, C.I. I. Pig
ment Blue 15: 3 C.I. I. Pigment Blue 22, C.I. I. P
igment Blue 28, C.I. I. Pigmen
t Green 15, C.I. I. Pigment Gr
een 25, C.I. I. Pigment Green
36, C.I. I. Pigment Brown 28,
C. I. Pigment Black 1, C.I. I. P
igment Black 7 and the like.

In the present invention, in addition to the above, a surfactant, an adhesion promoter (coupling agent), an antioxidant, and
An ultraviolet absorber, an anticoagulant, a sensitizer, other polymer compounds, a filler, a drying accelerator, etc. can be added.

[0011]

EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples.

Example 1 (a) Copolymerization of 50% by weight of methyl methacrylate, 25% by weight of methacrylic acid, 23% by weight of macromonomer of α-methylstyrene and 2% by weight of azoisobutyronitrile in ethyl cellosolve acetate. Combined 100 parts by weight, (b) dipentaerythritol hexaacrylate 10
0 parts by weight (c) 10% carbon black and Pigment Re
d 177, Pigment Yellow 83, P
300 parts by weight of a pigment prepared by mixing IGMENT GREEN 36 into black (d) 2-methyl- [4- (methylthio) phenyl]-
80 parts by weight of 2-morpholino-1-propan-1-one (e) 50 parts by weight of nonionic surfactant (f) 2500 parts by weight of cellosolve acetate were mixed with a homomixer to prepare a radiation-sensitive coating liquid. .

The above coating solution was applied to a soda glass substrate with a SiO ₂ coat having a width of 300 μm, a space of 40 μm, a film thickness of 0.25 μm, and an ITO film of 30 Ω / □ formed thereon.
Spin coating was performed at 000 to 3000 rpm, and prepaking was performed on a hot plate at 80 ° C. for 5 minutes. High pressure mercury lamp from the back side without mask, 10mj / cm ² , 1se
c exposed. Develop with a 0.1% aqueous solution of tetramethylammonium hydroxide, rinse with water, and then
It was dried at 80 ° C. for 1 hour. In the obtained substrate, I
The coating film on the TO film was completely removed, and a black stripe with an optical density of 1.2 having a film thickness of 0.50 μm was formed in the space portion. A compensation cell type STN display device having a 240 ° twist and a duty ratio of 1/200 was prepared using the transparent conductive substrate described above. The contrast ratio including the black stripe was 38 on the normal line.

Example 2 (a) A block copolymer obtained by polymerizing 50% by weight of methyl methacrylate, 25% by weight of methacrylic acid, 23% by weight of α-methylstyrene and 2% by weight of azoisobutyronitrile in ethyl cellosolve acetate. 100 parts by weight, (b) dipentaerythritol heptaacrylate 10
0 parts by weight (c) 10% carbon black and Pigment Re
d 177, Pigment Yellow 83, P
390 parts by weight of a pigment prepared by mixing IGMENT GREEN 36 with black (d) 4- (2-hydroxyethoxy) phenyl- (2
30 parts by weight of (hydroxy-2-propyl) ketone (e) 50 parts by weight of nonionic surfactant (f) 2500 parts by weight of cellosolve acetate were mixed with a homomixer to prepare a radiation-sensitive coating solution. Spin coating 3500 rpm using the above coating solution
Other conditions were the same as in Example 1 to form a black stripe. In the obtained substrate, the coating film on the ITO film was completely removed, and a black stripe with an optical density of 1.4 having a film thickness of 0.51 μm was formed in the space portion. Further, since the light blocking film was formed also on the defective portion of ITO, a display device in which the portion was not conspicuous as a bright spot was obtained. 240 ° twist using the above transparent conductive substrate,
A compensation cell type STN display device having a duty ratio of 1/200 was created. The contrast ratio including the black stripe was 40 on the normal line.

Example 3 (a) A block copolymer 100 obtained by polymerizing 64% by weight of methyl methacrylate, 25% by weight of methacrylic acid, 10% by weight of polystyrene macromonomer and 2% by weight of azoisobutyronitrile in ethyl cellosolve acetate. Parts by weight, (b) dipentaerythritol heptaacrylate 10
0 parts by weight (c) 10% carbon black and Pigment Re
d 177, Pigment Yellow 83, P
380 parts by weight of a pigment prepared by mixing IGMENT GREEN 36 into black (d) 4- (2-hydroxyethoxy) phenyl- (2
50 parts by weight of (hydroxy-2-propyl) ketone (e) 50 parts by weight of nonionic surfactant (f) 3000 parts by weight of cellosolve acetate were mixed with a homomixer to prepare a radiation-sensitive coating solution. Spin coating 3000 rpm using the above coating solution
Other conditions were the same as in Example 1 to form a black stripe. In the obtained substrate, the coating film on the ITO film was completely removed, and a black stripe having an optical density of 1.5 and a film thickness of 0.55 μm was formed in the space portion. Further, since the light blocking film was formed also on the defective portion of ITO, a display device in which the portion was not conspicuous as a bright spot was obtained. 240 ° twist using the above transparent conductive substrate,
A compensation cell type STN display device having a duty ratio of 1/200 was created. The contrast ratio including the black stripe was 28 on the normal line.

Comparative Example 1 Using the same transparent conductive substrate as that used in Examples 1 to 3, the same 240 ° twist compensation cell type STN display device was prepared without forming the black strat sweep. . The contrast ratio of the panel including the pixel gap portion was 21 on the normal line.

Comparative Example 2 The same transparent conductive substrate as that used in Examples 1 to 3 was used, the steps up to exposure were the same as in Example 1, and the exposure step was performed using an exposure mask. UV rays are radiated from the above to form black stratipes
A twisted compensation cell type STN display device was created. The contrast ratio of the panel in the part where the alignment is good is 3
6 was obtained, but in the portion where the alignment was not sufficient, there was light leakage from the stripe portion and the contrast ratio was significantly reduced.

[0018]

According to the method of the present invention, since a black stripe can be formed with high alignment accuracy in a portion without a transparent conductive film without using a mask, a simple matrix liquid crystal display device having a high duty ratio also includes a stripe portion. It is possible to display with a high contrast ratio, and since the light blocking layer is formed even in the portion where the transparent conductive film is lacking, that portion does not become a defect as a bright spot, preventing quality deterioration and preventing manufacturing. The yield is also greatly improved.

[Brief description of drawings]

FIG. 1 is an explanatory diagram sequentially showing a substrate forming process.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Base plate 2 Transparent conductive film 3 Negative photocurable resin composition coating liquid 4 Light-shielding layer

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Uta Tadashi 2-11-24 Tsukiji, Chuo-ku, Tokyo Within Nippon Synthetic Rubber Co., Ltd.

Claims (1)

[Claims] 1. A dot-matrix liquid crystal display device having stripe-shaped transparent conductive films which are substantially orthogonal to each other on the inner surfaces of two transparent substrates facing each other. A method of manufacturing a dot-matrix liquid crystal display device having an insulating black light-shielding layer, wherein an electrically insulating black light-shielding layer formed between stripe-shaped transparent conductive films has a negative color material dispersed therein. After applying the photocurable resin composition on the entire surface of the transparent substrate on which the transparent conductive film is formed, the transparent conductive film is used as a mask to irradiate light from the opposite side of the transparent substrate to form a stripe pattern. A method of manufacturing a dot matrix type liquid crystal display device, which is characterized in that it is formed only between transparent conductive films.