JPH07277743A - Production of synthetic silica glass - Google Patents

Production of synthetic silica glass

Info

Publication number
JPH07277743A
JPH07277743A JP8910794A JP8910794A JPH07277743A JP H07277743 A JPH07277743 A JP H07277743A JP 8910794 A JP8910794 A JP 8910794A JP 8910794 A JP8910794 A JP 8910794A JP H07277743 A JPH07277743 A JP H07277743A
Authority
JP
Japan
Prior art keywords
gel
silica sol
sol
wet
silica glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8910794A
Other languages
Japanese (ja)
Inventor
Mitsuru Kono
充 河野
Hatsushi Inoue
初志 井上
Hidetaka Katayama
英孝 片山
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Nippon Steel Corp
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Seiko Epson Corp
Nippon Steel Corp
Nippon Steel Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Nippon Steel Corp, Nippon Steel Chemical Co Ltd filed Critical Seiko Epson Corp
Priority to JP8910794A priority Critical patent/JPH07277743A/en
Publication of JPH07277743A publication Critical patent/JPH07277743A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/02Pure silica glass, e.g. pure fused quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/20Wet processes, e.g. sol-gel process
    • C03C2203/26Wet processes, e.g. sol-gel process using alkoxides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/20Wet processes, e.g. sol-gel process
    • C03C2203/30Additives
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00Production processes
    • C03C2203/20Wet processes, e.g. sol-gel process
    • C03C2203/34Wet processes, e.g. sol-gel process adding silica powder

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To produce synthetic silica glass excellent in optical properties and applicable as, e.g. optics such as lens, prism, a beam splitter, a spectroscope and a mirror, a substrate for photomask or a TFT base plate for liquid crystal display according to the sol-gel method. CONSTITUTION:This is a method for production of synthetic silica glass by preparing a wet gel from a silica sol mixture solution composed of tetramethoxysilane or tetraethoxysilane and a silica sol solution containing silica fine particles according to the sol-gel method, drying it and heat-treating it. In this method, formation of the wet gel is carried out by blending one or more kinds of alcohols represented by ROH (provided that R is a 3 to 8C alkyl group) in the silica sol mixture solution before gelling so that the wet gel may contain the alcohols in an amount of 0.5 to 10wt.% in total and the resultant wet get is dried and heat treated to obtain synthetic silica glass. According to this method, the get can be effectively prevented from cracking during the drying process by a function of the alcohols contained in the gel and the objective synthetic silica glass free from an air bubble and excellent in optical properties can be produced in a high yield.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レンズ、プリズム、ビ
−ムスプリッタ、分光器、ミラーなどの光学部品、フォ
トマスク基板、液晶ディスプレイ用TFT基板などに応
用可能な光学特性に優れた種々のゾル−ゲル法による合
成石英ガラスの製造方法に関する。
INDUSTRIAL APPLICABILITY The present invention can be applied to various optical components such as lenses, prisms, beam splitters, spectroscopes, mirrors, optical parts, photomask substrates, TFT substrates for liquid crystal displays, etc. The present invention relates to a method for producing synthetic quartz glass by the sol-gel method.

【0002】[0002]

【従来の技術】合成石英ガラスの製造方法の一つとし
て、ゾル−ゲル法が知られている。例えば、特開昭60
−215532号公報には、シリカゾル及びシリコンア
ルコキシドの混合溶液を酸性触媒下でゲル化させてウェ
ットゲルを作成し、該ウェットゲルを乾燥してドライゲ
ルを得、該ドライゲルを焼成して透明石英ガラス体を製
造する方法が開示されている。
2. Description of the Related Art The sol-gel method is known as one of the methods for producing synthetic quartz glass. For example, JP-A-60
In JP-A-215532, a mixed solution of silica sol and silicon alkoxide is gelled under an acidic catalyst to prepare a wet gel, the wet gel is dried to obtain a dry gel, and the dry gel is fired to form a transparent quartz glass body. A method of manufacturing is disclosed.

【0003】従来のゾル−ゲル法では、前記ウェットゲ
ルの乾燥工程でゲルに割れが生じ、大型の石英ガラス、
特に厚さが大なる石英ガラスを高歩留に作製することは
極めて困難であった。ウェットゲルが乾燥工程で割れる
原因としては、多孔質であるゲルの細孔中にある溶液分
の毛細管力による応力が第一に挙げられる。つまり、ゲ
ルの溶液分が蒸発する過程で、ゲル中の異なる直径の細
孔中にある溶液分がそれぞれ異なる毛細管力を持ち、こ
れによりゲルに不均一に応力を与え、その結果ゲルに割
れが生じるものである。このゲルの割れを防ぐ方法とし
て、例えば原料中に表面張力の低いエチレングリコール
やグリセリンを添加してゲルを作製し、溶液分の毛細管
力による応力を低減させる方法がある(特開平2−14
1432号公報、特開平2−141433号公報)。し
かし、この方法では、溶液の表面張力を下げるために多
量のエチレングリコールやグリセリンを添加する必要が
あり、これら高粘性の高沸点化合物はゲルを高温下で加
熱しても完全には除去されず、合成した石英ガラス中に
気泡を生成する原因となったり、残留した炭素によって
石英ガラスの光学的品質を劣化させる場合があった。
In the conventional sol-gel method, gel is cracked in the wet gel drying step, and large silica glass,
In particular, it has been extremely difficult to manufacture quartz glass having a large thickness with a high yield. The first reason that the wet gel breaks in the drying step is the stress due to the capillary force of the solution component in the pores of the porous gel. In other words, in the process of evaporating the solution of the gel, the solutions in the pores of different diameters in the gel have different capillary forces, which causes the gel to be unevenly stressed, resulting in cracking of the gel. It happens. As a method of preventing the cracking of the gel, for example, there is a method of adding ethylene glycol or glycerin having a low surface tension to the raw material to prepare a gel and reducing the stress due to the capillary force of the solution (Japanese Patent Laid-Open No. 2-14).
1432, JP-A-2-141433). However, in this method, it is necessary to add a large amount of ethylene glycol or glycerin in order to reduce the surface tension of the solution, and these high-viscosity high-boiling compounds are not completely removed even when the gel is heated at high temperature. In some cases, it may cause bubbles in the synthesized quartz glass, or the residual carbon may deteriorate the optical quality of the quartz glass.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的はゾル−
ゲル法による合成石英ガラスの製造方法において、乾燥
工程でのゲルの割れを防止し、且つ合成した石英ガラス
の光学的品質を劣化させることのない石英ガラスの製造
方法を提供することにある。
The object of the present invention is to provide a sol-
It is an object of the present invention to provide a method for producing synthetic quartz glass by the gel method, which prevents gel breakage in the drying step and does not deteriorate the optical quality of the synthesized quartz glass.

【0005】[0005]

【課題を解決するための手段】本発明は、テトラメトキ
シシラン又はテトラエトキシシランと、シリカ微粒子を
含むシリカゾル溶液とから構成されるシリカゾル混合溶
液からゾル−ゲル法によりウエットゲルを得、これを乾
燥、加熱処理して合成石英ガラスを製造する方法におい
て、前記ウエットゲル中にROH(RはC3 〜C8 のア
ルキル基)で表されるアルコールの少なくとも1種類以
上が合計0.5〜10重量%存在するように、ゲル化前
のシリカゾル混合溶液中に前記アルコールを存在させる
ことを特徴とする合成石英ガラスの製造方法である。
According to the present invention, a wet gel is obtained by a sol-gel method from a silica sol mixed solution composed of tetramethoxysilane or tetraethoxysilane and a silica sol solution containing silica fine particles and dried. In the method of producing synthetic quartz glass by heat treatment, at least one kind of alcohol represented by ROH (R is a C 3 to C 8 alkyl group) in the wet gel is 0.5 to 10 weight in total. %, So that the alcohol is present in the silica sol mixed solution before gelation so that the synthetic quartz glass is produced.

【0006】本発明において使用するシリカ微粒子を含
むシリカゾル溶液は、水性溶媒にシリカ微粒子を分散さ
せたものであり、シリカ微粒子としては、例えば、水、
アンモニアと、メタノールあるいはエタノールとの混合
溶液にテトラメトキシシランあるいはテトラエトキシシ
ランを滴下して合成した粒子直径が0.1〜0.5μm
の球状のシリカ微粒子が好適なものとして挙げられる。
こうして得られたシリカ微粒子は水を含む溶媒に分散し
たシリカゾルの状態にあり、シリカ微粒子の合成で使用
したメタノールあるいはエタノールや、テトラメトキシ
シランあるいはテトラエトキシシランの加水分解で生成
したメタノールあるいはエタノールが含まれている。こ
のシリカゾル溶液の溶媒を蒸発させたり、あるいは水を
加えるなどして、シリカゾル中のこれらメタノールある
いはエタノールの濃度を好ましくは10重量%以下、よ
り好ましくは1重量%以下にし、シリカゾル溶液中のシ
リカ微粒子の濃度を20〜40重量%に調節する。メタ
ノールやエタノールは沸点が低いため、ゲル中に取り込
まれたとしてもゲルの乾燥工程でほとんど蒸発し除去さ
れるが、シリカゾル溶液中のメタノールあるいはエタノ
ール濃度が10重量%を超えると、合成した石英ガラス
中に炭素が残留し易くなり、光学特性を劣化させる原因
となる場合もある。
The silica sol solution containing fine silica particles used in the present invention is a dispersion of fine silica particles in an aqueous solvent. Examples of the fine silica particles include water,
Particle diameter of 0.1-0.5 μm synthesized by adding tetramethoxysilane or tetraethoxysilane to a mixed solution of ammonia and methanol or ethanol
Preferred are spherical silica fine particles.
The silica fine particles thus obtained are in the state of silica sol dispersed in a solvent containing water, and contain methanol or ethanol used in the synthesis of silica fine particles, or methanol or ethanol produced by hydrolysis of tetramethoxysilane or tetraethoxysilane. Has been. The concentration of the methanol or ethanol in the silica sol is preferably 10% by weight or less, more preferably 1% by weight or less by evaporating the solvent of the silica sol solution or adding water. Is adjusted to 20 to 40% by weight. Methanol and ethanol have low boiling points, so even if they are taken into the gel, they are mostly evaporated and removed in the gel drying process. However, when the concentration of methanol or ethanol in the silica sol solution exceeds 10% by weight, the synthetic quartz glass is used. Carbon is likely to remain inside, which may cause deterioration of optical characteristics.

【0007】シリカゾル溶液と、テトラメトキシシラン
又はテトラエトキシシランの混合方法には格別の制限は
ないが、好ましくは次のようにして混合する。まず、シ
リカゾル溶液を撹拌条件下、酸性水溶液にてpHを約2
に調節する。次いで、テトラメトキシシランあるいはテ
トラエトキシシランを、シリカゾル溶液中のシリカ微粒
子1モルに対して、0.1〜1.0モル加え、シリカゾ
ル混合溶液を作製し、加えたテトラメトキシシランある
いはテトラエトキシシランを加水分解させる。その後、
撹拌条件下で塩基性水溶液にてpHを4〜5に調節し、
加水分解されたテトラメトキシシランあるいはテトラエ
トキシシランの脱水縮重合を行わせてゲル化を開始させ
る。
There is no particular limitation on the method of mixing the silica sol solution and tetramethoxysilane or tetraethoxysilane, but preferably they are mixed as follows. First, the pH of the silica sol solution is adjusted to about 2 with an acidic aqueous solution under stirring conditions.
Adjust to. Then, tetramethoxysilane or tetraethoxysilane is added to 0.1 mol of silica fine particles in the silica sol solution in an amount of 0.1 to 1.0 mol to prepare a silica sol mixed solution, and the added tetramethoxysilane or tetraethoxysilane is added. Hydrolyze. afterwards,
Adjust the pH to 4-5 with a basic aqueous solution under stirring conditions,
The hydrolyzed tetramethoxysilane or tetraethoxysilane is dehydrated and polycondensed to initiate gelation.

【0008】重合が進むと数時間後にゲル化するが、ゲ
ル化前のシリカゾル混合溶液に、プロパノール、ブタノ
ール、ペンタノール、ヘキサノール、ヘプタノール、オ
クタノールなどのROH(但し、RはC3 〜C8 のアル
キル基)で表されるアルコールの少なくとも1種類以上
を、ゲル化前のシリカゾル混合溶液の総重量に対し、上
記の場合であれば塩基性水溶液を加えた後のシリカゾル
混合溶液の総重量に対し合計0.5〜10重量%となる
量を存在させる。これらアルコールはゲル化前に添加す
ればよく、シリカゾル混合溶液とする前であっても、後
であってもよい。例えば、酸性水溶液を添加する前のシ
リカゾル溶液に添加する方法、酸性水溶液を添加してp
Hを調節した後に添加する方法、テトラメトキシシラン
あるいはテトラエトキシシランを加えた後に添加する方
法、テトラメトキシシランあるいはテトラエトキシシラ
ンに添加する方法あるいは塩基性水溶液を添加した後に
添加する方法などがある。また、ROHで表されるアル
コ−ルは、直鎖状アルコ−ルに限らず、分岐状アルコ−
ルであることもでき、種類は1種であっても、2種以上
であっても差し支えない。
When the polymerization proceeds, gelation occurs after several hours, but ROH such as propanol, butanol, pentanol, hexanol, heptanol, and octanol is added to the silica sol mixed solution before gelation (where R is C 3 to C 8 ). At least one kind of alcohol represented by (alkyl group) is added to the total weight of the silica sol mixed solution before gelling, and in the above case, to the total weight of the silica sol mixed solution after addition of the basic aqueous solution. It is present in an amount to add up to 0.5-10% by weight. These alcohols may be added before gelation, and may be added before or after forming the silica sol mixed solution. For example, a method of adding to the silica sol solution before adding the acidic aqueous solution,
There are a method of adding after adjusting H, a method of adding after adding tetramethoxysilane or tetraethoxysilane, a method of adding to tetramethoxysilane or tetraethoxysilane, a method of adding after adding a basic aqueous solution, and the like. Further, the alcohol represented by ROH is not limited to a linear alcohol, but a branched alcohol.
The type may be one type or two or more types.

【0009】塩基性水溶液を添加した後のシリカゾル混
合溶液を適当な容器に注ぎ、室温で保持すると、アルコ
ールなどを含むシリカゾル混合溶液全体が数時間でゲル
化し、アルコールを含んだウエットゲルが得られる。こ
のようにして炭素数3〜8のアルコールをウエットゲル
中に存在させることにより、ゲルの割れが発生し易い5
0〜200℃の温度域での乾燥工程において、ゲルから
の溶液分の蒸発を連続的に制御して蒸発がある温度で一
度に起こることを防止し、ゲルの割れを防止することが
できる。特に、沸点の異なる、好ましくは沸点差が50
℃以上ある炭素数3〜8のアルコール2種類以上を選択
してゲル中に存在させると、より効果的にゲルの割れを
防止することができる。加えるアルコールの沸点が20
0℃を超えたり、加えるアルコールの量が10重量%を
超えたりした場合や、アルコール以外の化合物、特に
C、H、O、Si以外の元素を含む化合物や、環式化合
物あるいは不飽和化合物をウエットゲル中に存在させた
場合は、合成した石英ガラス中に炭素や異種元素が残留
し、光学特性を劣化させる原因となる。加えるアルコー
ルの量が0.5重量%未満であると、ゲルの割れを効果
的に防止することができない。
When the silica sol mixed solution after addition of the basic aqueous solution is poured into a suitable container and kept at room temperature, the entire silica sol mixed solution containing alcohol and the like gels in several hours to obtain a wet gel containing alcohol. . By allowing the alcohol having 3 to 8 carbon atoms to exist in the wet gel in this manner, gel cracking easily occurs.
In the drying step in the temperature range of 0 to 200 ° C., the evaporation of the solution component from the gel can be continuously controlled to prevent the evaporation from occurring at a certain temperature at a time, and to prevent the gel from cracking. In particular, the boiling points are different, preferably 50
When two or more kinds of alcohols having a carbon number of 3 to 8 and having a temperature of not less than 0 ° C. are selected and allowed to exist in the gel, cracking of the gel can be more effectively prevented. The boiling point of the added alcohol is 20
When the temperature exceeds 0 ° C. or the amount of added alcohol exceeds 10% by weight, compounds other than alcohol, particularly compounds containing elements other than C, H, O and Si, cyclic compounds or unsaturated compounds When it is present in the wet gel, carbon and a different element remain in the synthesized quartz glass, which causes deterioration of optical characteristics. If the amount of alcohol added is less than 0.5% by weight, the gel cracking cannot be effectively prevented.

【0010】ウエットゲル中には、テトラメトキシシラ
ンあるいはテトラエトキシシランの加水分解により生成
する沸点がそれぞれ略65℃、略78℃のメタノールあ
るいはエタノールが含まれ、これは添加した炭素数3〜
8のアルコールと共にあってゲルの割れを防止する効果
を持つが、メタノールやエタノールだけではゲルの割れ
を防止することはできない。また、シリカゾル溶液に加
えるテトラメトキシシランあるいはテトラエトキシシラ
ンの代わりに、例えばテトラプロポキシシラン、テトラ
ブトキシシラン、テトラペントキシシランなどのC3
上のアルコキシ基を持つシリコンアルコキシドを用いて
ゲルを合成すれば、合成したウエットゲル中にプロパノ
ール、ブタノール、ペンタノールなどのC3 以上のアル
キル基を持つアルコールを含有させることができるが、
これらのシリコンアルコキシドを完全に加水分解させる
ことは困難であり、未加水分解のアルコキシ基は石英ガ
ラス中の気泡の原因となったり残留炭素による石英ガラ
スの光学特性劣化の原因となる。したがって、前記RO
Hで表されるアルコ−ルは炭素数3〜8のアルコ−ルと
して添加される必要がある。
The wet gel contains methanol or ethanol having boiling points of about 65 ° C. and about 78 ° C., which are produced by the hydrolysis of tetramethoxysilane or tetraethoxysilane, respectively, which has 3 to 3 carbon atoms added.
Although it has the effect of preventing the gel from breaking with the alcohol of No. 8, methanol or ethanol alone cannot prevent the gel from breaking. In addition, instead of tetramethoxysilane or tetraethoxysilane added to the silica sol solution, a silicon alkoxide having a C 3 or more alkoxy group such as tetrapropoxysilane, tetrabutoxysilane, or tetrapentoxysilane may be used to synthesize the gel. Although the synthesized wet gel can contain an alcohol having an alkyl group of C 3 or more such as propanol, butanol, and pentanol,
It is difficult to completely hydrolyze these silicon alkoxides, and the unhydrolyzed alkoxy groups cause bubbles in the quartz glass and deteriorate the optical properties of the quartz glass due to residual carbon. Therefore, the RO
The alcohol represented by H must be added as an alcohol having 3 to 8 carbon atoms.

【0011】ウエットゲルの乾燥は乾燥器中にて大気中
もしくは減圧下で300時間以上、好ましくは400時
間以上かけて200℃まで段階的に加熱し乾燥する。ゲ
ルの割れをより効果的に防止するために、ゲルの乾燥を
開始する前にゲルを密閉容器中で50〜100℃で処理
するいわゆるゲルの熟成を行うことが好ましい。また、
ゲルの乾燥工程で、ゲルの割れをより効果的に防止する
ために、ゲルからの溶液分の蒸発量を制御できる容器、
例えば蓋に小孔を有する密閉容器にゲルを入れて乾燥す
ることが好ましい。
The wet gel is dried by heating in a dryer in the air or under reduced pressure for 300 hours or longer, preferably for 400 hours or longer to 200 ° C. in stages to dry. In order to prevent the gel from cracking more effectively, it is preferable to perform so-called gel aging by treating the gel at 50 to 100 ° C. in a closed container before starting the drying of the gel. Also,
A container that can control the evaporation amount of the solution from the gel in order to prevent the gel from cracking more effectively in the gel drying process,
For example, it is preferable to put the gel in a closed container having a small hole in the lid and dry it.

【0012】乾燥工程の処理を終了したゲルを、約18
00℃まで加熱して焼結、ガラス化することにより、透
明な石英ガラスが得られる。アルコールからくる炭素を
効率的に除去するために、例えば200℃から1200
℃までの加熱を酸素雰囲気中で行い、1800℃までの
加熱を不活性ガス雰囲気で行う方法が挙げられる。この
ような方法によるとゲルの割れを防止でき、気泡の無
い、光学特性の優れた合成石英ガラスを高歩留で製造で
きる。
The gel which has been subjected to the drying step is treated with about 18
Transparent quartz glass can be obtained by heating to 00 ° C., sintering and vitrification. In order to efficiently remove carbon coming from alcohol, for example from 200 ° C to 1200
A method of heating up to 1800C in an oxygen atmosphere and heating up to 1800C in an inert gas atmosphere can be mentioned. According to such a method, it is possible to prevent cracking of the gel, and it is possible to produce a synthetic quartz glass having no bubbles and excellent optical characteristics with a high yield.

【0013】[0013]

【作用】ゲル中にROH(RはC3 〜C8 のアルキル
基)で表されるアルコールの少なくとも1種類以上を合
計0.5〜10重量%存在させることにより、ゲルの割
れが発生し易い50〜200℃の温度域での乾燥工程に
おいて、ゲルからの溶液分の蒸発が一度に起こることを
防止し、ゲルの割れを防止できると考えられる。
The presence total from 0.5 to 10 wt% of at least one or more alcohols [acting] ROH in the gel (R is an alkyl group of C 3 -C 8) represented by the easy cracking of the gel occurs It is considered that in the drying step in the temperature range of 50 to 200 ° C., evaporation of the solution component from the gel can be prevented from occurring at one time, and cracking of the gel can be prevented.

【0014】[0014]

【実施例】以下、実施例、比較例に基づいて、本発明を
具体的に説明する。 実施例1 メタノ−ル溶液1リットル中に、水8モル、アンモニア
1モルを含む溶液中に撹拌条件下で、テトラメトキシシ
ランを前記メタノール溶液1リットルに対し1モルを滴
下し、シリカ微粒子を含むシリカゾル溶液を合成した。
シリカゾル溶液中の溶媒を蒸発させ、水を加えることに
より、シリカ微粒子分を30重量%に調節したシリカゾ
ル溶液を得た。このシリカゾル溶液中のメタノール濃度
は略1重量%であった。このシリカゾル溶液4500g
に撹拌条件下で、1−プロパノール、1−ペンタノー
ル、1−オクタノールそれぞれ100gを添加した。次
いで、塩酸水溶液を加えpHを2.0に調節した後、撹
拌条件下でテトラメトキシシラン略1500gを加え、
シリカゾル混合溶液を作製した。加えたテトラメトキシ
シランは水が存在する酸性条件下で加水分解された。そ
の後、このシリカゾル混合溶液にアンモニア水溶液を加
えてpHを4.8に調節した後、密閉可能な円筒型容器
にすばやく注型して静置すると略2時間でゲル化し、前
記3種類のアルコールを合計で略4.5重量%含んだ、
直径略200mm、高さ略200mmのウエットゲルを
得た。このウエットゲルを合計20個作製した。密閉容
器中のウエットゲルを室温で2日間、その後70℃に昇
温して4日間放置すると、ゲルの脱水縮重合によってゲ
ルから水が放出された。この水を容器の外に捨てた後、
密閉容器の蓋の代わりに、小孔を開けた蓋をし、乾燥器
中70℃にて340時間かけてゲルの乾燥を行った。次
いで、ゲルを容器から取り出し、大気中にて70℃から
200℃まで70時間かけて昇温してゲルの乾燥を行っ
た。
EXAMPLES The present invention will be specifically described below based on Examples and Comparative Examples. Example 1 1 mol of tetramethoxysilane was added dropwise to 1 liter of the methanol solution in a solution containing 8 mol of water and 1 mol of ammonia in 1 liter of a methanol solution under stirring conditions to contain fine silica particles. A silica sol solution was synthesized.
The solvent in the silica sol solution was evaporated and water was added to obtain a silica sol solution having a silica fine particle content adjusted to 30% by weight. The concentration of methanol in this silica sol solution was about 1% by weight. 4500g of this silica sol solution
Under stirring conditions, 100 g of 1-propanol, 1-pentanol and 1-octanol were added. Next, after adding an aqueous hydrochloric acid solution to adjust the pH to 2.0, about 1500 g of tetramethoxysilane is added under stirring conditions,
A silica sol mixed solution was prepared. The added tetramethoxysilane was hydrolyzed under acidic conditions in the presence of water. Then, an aqueous ammonia solution was added to the silica sol mixed solution to adjust the pH to 4.8, and then the mixture was quickly poured into a sealable cylindrical container and allowed to stand, and then gelled in about 2 hours. It contained about 4.5% by weight in total,
A wet gel having a diameter of about 200 mm and a height of about 200 mm was obtained. A total of 20 wet gels were produced. When the wet gel in the closed container was kept at room temperature for 2 days and then heated to 70 ° C. and left for 4 days, water was released from the gel by dehydration polycondensation of the gel. After throwing this water out of the container,
Instead of the lid of the closed container, a lid with small holes was placed, and the gel was dried in a dryer at 70 ° C. for 340 hours. Then, the gel was taken out of the container and heated in the air from 70 ° C. to 200 ° C. over 70 hours to dry the gel.

【0015】続いて、酸素気流中にて900℃まで約3
80時間かけて段階的に加熱し、アルコールや水等のゲ
ルに残留する成分の除去を行った。更に、900℃から
1100℃まで、1×10-2Torr以下の減圧下で約
3時間かけて加熱した後、1800℃まで、2時間かけ
て段階的に加熱し、直径120mm、高さ120mmの
透明な合成石英ガラスを作成した。ゲルの70℃までの
乾燥工程、200℃までの乾燥工程、900℃までの加
熱工程、及び1800℃まで加熱してガラス化する工程
のそれぞれの工程において割れの生じたゲルの個数を表
1に示した。得られた石英ガラスを光学研磨し、ガラス
中の気泡の個数を実体顕微鏡により観察した結果を表1
に示した。
Then, in an oxygen stream up to 900 ° C., about 3
The components that remained in the gel such as alcohol and water were removed by heating stepwise over 80 hours. Further, from 900 ° C. to 1100 ° C., it is heated under a reduced pressure of 1 × 10 −2 Torr or less for about 3 hours, and then gradually heated to 1800 ° C. for 2 hours, with a diameter of 120 mm and a height of 120 mm. A transparent synthetic quartz glass was prepared. Table 1 shows the number of gels with cracks in each step of drying the gel up to 70 ° C, drying up to 200 ° C, heating up to 900 ° C, and heating up to 1800 ° C to vitrify. Indicated. The obtained quartz glass was optically polished and the number of bubbles in the glass was observed with a stereomicroscope.
It was shown to.

【0016】実施例2 実施例1のシリカゾル溶液4500gに、撹拌条件下、
1−プロパノール650gを添加した。次いで、実施例
1と同様にしてゲル化させて1−プロパノールを略9.
2重量%含む直径略200mm、高さ略200mmのウ
エットゲルを得た。ウェットゲルは合計20個作製し
た。ゲルの乾燥以降を実施例1と同様に行った。実施例
1と同様に各工程において割れの生じたゲルの個数、及
びガラス中の気泡の観察結果を表1に示した。
Example 2 To 4500 g of the silica sol solution of Example 1 was added under stirring conditions.
650 g of 1-propanol was added. Then, gelation was performed in the same manner as in Example 1 to give 1-propanol approximately 9.
A wet gel containing 2% by weight and having a diameter of about 200 mm and a height of about 200 mm was obtained. A total of 20 wet gels were produced. After the gel was dried, the same procedure as in Example 1 was performed. As in Example 1, the number of cracked gels in each step and the observation results of bubbles in glass are shown in Table 1.

【0017】実施例3 実施例1のシリカゾル溶液4500gに、撹拌条件下、
1−オクタノール300gを添加した。次いで、実施例
1と同様にしてゲル化させ、1−オクタノールを略4.
5重量%含む直径略200mm、高さ略200mmのウ
エットゲルを得た。ウェットゲルは合計20個作製し
た。ゲルの乾燥以降を実施例1と同様に行った。実施例
1と同様に各工程において割れの生じたゲルの個数、及
びガラス中の気泡の観察結果を表1に示した。
Example 3 4500 g of the silica sol solution of Example 1 was added under stirring conditions.
300 g of 1-octanol was added. Then, gelation was performed in the same manner as in Example 1, and 1-octanol was added to about 4.
A wet gel containing 5% by weight and having a diameter of about 200 mm and a height of about 200 mm was obtained. A total of 20 wet gels were produced. After the gel was dried, the same procedure as in Example 1 was performed. As in Example 1, the number of cracked gels in each step and the observation results of bubbles in glass are shown in Table 1.

【0018】比較例1 実施例1のシリカゾル溶液4500gに、塩酸水溶液を
加えpHを2.0に調節した後、撹拌条件下でテトラメ
トキシシラン略1500gを加え、シリカゾル混合溶液
を作製した。シリカゾル混合溶液にアンモニア水溶液を
加えてpHを4.8に調節した後、密閉可能な円筒型容
器にすばやく注型して静置すると略2時間でゲル化し、
直径略200mm、高さ略200mmのウエットゲルを
得た。ウェットゲルは合計20個作製した。ゲルの乾燥
以降を実施例1と同様に行った。実施例1と同様に各工
程において割れの生じたゲルの個数、及びガラス中の気
泡の観察結果を表1に示した。
Comparative Example 1 To 4500 g of the silica sol solution of Example 1 was added an aqueous hydrochloric acid solution to adjust the pH to 2.0, and then about 1500 g of tetramethoxysilane was added under stirring conditions to prepare a silica sol mixed solution. Aqueous ammonia solution was added to the silica sol mixed solution to adjust the pH to 4.8, and then it was quickly cast into a sealable cylindrical container and allowed to stand, and then gelled in about 2 hours.
A wet gel having a diameter of about 200 mm and a height of about 200 mm was obtained. A total of 20 wet gels were produced. After the gel was dried, the same procedure as in Example 1 was performed. As in Example 1, the number of cracked gels in each step and the observation results of bubbles in glass are shown in Table 1.

【0019】比較例2 実施例1のシリカゾル溶液4500gに、撹拌条件下、
1−ドデカノール300gを添加した。これを、実施例
1と同様にしてゲル化させ、1−ドデカノールを略4.
5重量%含む直径略200mm、高さ略200mmのウ
エットゲルを得た。ウェットゲルは合計20個作製し
た。ゲルの乾燥以降を実施例1と同様に行った。実施例
1と同様に各工程において割れの生じたゲルの個数、及
びガラス中の気泡の観察結果を表1に示した。
Comparative Example 2 4500 g of the silica sol solution of Example 1 was added under stirring conditions.
300 g of 1-dodecanol was added. This was gelled in the same manner as in Example 1, and 1-dodecanol was added to about 4.
A wet gel containing 5% by weight and having a diameter of about 200 mm and a height of about 200 mm was obtained. A total of 20 wet gels were produced. After the gel was dried, the same procedure as in Example 1 was performed. As in Example 1, the number of cracked gels in each step and the observation results of bubbles in glass are shown in Table 1.

【0020】[0020]

【表1】 [Table 1]

【0021】[0021]

【発明の効果】ゾル−ゲル法による石英ガラスの製造に
おいて、ゲルの割れを効果的に防止し、気泡の無い光学
特性の優れた、レンズ、プリズム、ビ−ムスプリッタ、
分光器、ミラーなどの光学部品、フォトマスク基板、液
晶ディスプレイ用TFT基板などに応用可能な合成石英
ガラスを、特に大型の石英ガラスを高歩留で製造するこ
とができる。
INDUSTRIAL APPLICABILITY In the production of quartz glass by the sol-gel method, a lens, a prism, a beam splitter, which effectively prevents breakage of gel and has excellent optical characteristics without bubbles,
It is possible to manufacture a synthetic quartz glass applicable to a spectroscope, an optical component such as a mirror, a photomask substrate, a liquid crystal display TFT substrate, and the like, particularly a large quartz glass with a high yield.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 井上 初志 東京都杉並区下井草2−18−17 (72)発明者 片山 英孝 福岡県北九州市小倉南区新路寺701 (72)発明者 竹内 哲彦 長野県諏訪市大和3−3−5 セイコーエ プソン株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hatsushi Inoue 2-18-17 Shimogusa, Suginami-ku, Tokyo (72) Inventor Hidetaka Katayama 701 Shinroji, Kokuraminami-ku, Kitakyushu-shi, Fukuoka (72) Inventor Tetsuhiko Takeuchi Nagano 3-3-5 Yamato, Suwa-shi, Japan Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 テトラメトキシシラン又はテトラエトキ
シシランと、シリカ微粒子を含むシリカゾル溶液とから
構成されるシリカゾル混合溶液からゾル−ゲル法により
ウエットゲルを得、これを乾燥、加熱処理して合成石英
ガラスを製造する方法において、前記ウエットゲル中に
ROH(但し、RはC3 〜C8 のアルキル基)で表され
るアルコールが0.5〜10重量%存在するように、ゲ
ル化前のシリカゾル混合溶液中に前記アルコールの少な
くとも1種類を存在させることを特徴とする合成石英ガ
ラスの製造方法。
1. A synthetic silica glass is obtained by a wet gel obtained by a sol-gel method from a silica sol mixed solution composed of tetramethoxysilane or tetraethoxysilane and a silica sol solution containing silica fine particles, which is dried and heat-treated. a process for preparing, ROH in the wet gel (wherein, R represents an alkyl group of C 3 -C 8) as the alcohol represented by the presence of 0.5 to 10 wt%, prior to gelling the silica sol mixture A method for producing synthetic quartz glass, characterized in that at least one kind of the alcohol is present in a solution.
JP8910794A 1994-04-04 1994-04-04 Production of synthetic silica glass Withdrawn JPH07277743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8910794A JPH07277743A (en) 1994-04-04 1994-04-04 Production of synthetic silica glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8910794A JPH07277743A (en) 1994-04-04 1994-04-04 Production of synthetic silica glass

Publications (1)

Publication Number Publication Date
JPH07277743A true JPH07277743A (en) 1995-10-24

Family

ID=13961676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8910794A Withdrawn JPH07277743A (en) 1994-04-04 1994-04-04 Production of synthetic silica glass

Country Status (1)

Country Link
JP (1) JPH07277743A (en)

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