JPH0727089A - Vacuum pump device - Google Patents
Vacuum pump deviceInfo
- Publication number
- JPH0727089A JPH0727089A JP19282293A JP19282293A JPH0727089A JP H0727089 A JPH0727089 A JP H0727089A JP 19282293 A JP19282293 A JP 19282293A JP 19282293 A JP19282293 A JP 19282293A JP H0727089 A JPH0727089 A JP H0727089A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pump
- auxiliary pump
- pressure
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、薬品工業や電子工業及
び研究所等で使用される分析装置、ＩＣ製造装置及び試
験装置等において、清浄な高真空或いは超高真空を得る
のに好適な真空ポンプ装置に関する。BACKGROUND OF THE INVENTION The present invention is suitable for obtaining a clean high vacuum or ultra-high vacuum in an analyzer, an IC manufacturing apparatus, a test apparatus, etc. used in the chemical industry, electronic industry, laboratory, etc. The present invention relates to a vacuum pump device.
【０００２】[0002]
【従来の技術】従来この種の真空ポンプ装置としては、
補助ポンプとしてドライ往復動型真空ポンプを用い、タ
ーボ分子ポンプと組合わせた形式のものが知られてい
る。2. Description of the Related Art Conventionally, as a vacuum pump device of this type,
It is known that a dry reciprocating vacuum pump is used as an auxiliary pump in combination with a turbo molecular pump.
【０００３】[0003]
【発明が解決しようとする課題】この従来の真空ポンプ
装置においては、ドライ往復動型真空ポンプの到達圧力
が１００Ｐａ前後で、ターボ分子ポンプの補助ポンプと
しては限界の性能であり、吸気ガスが水素ガスのように
軽いガスを含む場合には該ターボ分子ポンプの排気速度
が大きく阻害され、排気性能が低下する問題点を有し、
且つドライ往復動型真空ポンプの到達圧力を下げること
は技術的に難しく、又これを向上するためには費用が極
めて大きくなる等の問題点を有していた。In this conventional vacuum pump device, the ultimate pressure of the dry reciprocating vacuum pump is about 100 Pa, which is the limit performance as the auxiliary pump of the turbo molecular pump, and the intake gas is hydrogen. When a light gas such as gas is included, the exhaust speed of the turbo molecular pump is greatly hindered, and there is a problem that the exhaust performance decreases.
In addition, it is technically difficult to lower the ultimate pressure of the dry reciprocating vacuum pump, and there is a problem that the cost is extremely high to improve it.
【０００４】本発明は上記の問題点を解消し、簡易な手
段によりターボ分子ポンプの吸気口圧力を低下させ、該
ターボ分子ポンプにより水素ガス等の軽いガスの排気性
能を大巾に改善することを目的とする。The present invention solves the above problems, reduces the intake port pressure of a turbo molecular pump by a simple means, and greatly improves the exhaust performance of light gas such as hydrogen gas by the turbo molecular pump. With the goal.
【０００５】[0005]
【課題を解決するための手段】上記の目的を達成するた
め本発明は、ターボ分子ポンプに補助ポンプを連結した
真空装置において、該補助ポンプの吸気側に、分子量の
大きい特定ガスを導入する導入管を接続したことを特徴
とする。In order to achieve the above object, the present invention is directed to a vacuum device in which an auxiliary pump is connected to a turbo molecular pump, in which a specific gas having a large molecular weight is introduced to the intake side of the auxiliary pump. It is characterized by connecting a pipe.
【０００６】[0006]
【作用】補助ポンプをその性能がガス種によらない容積
移送型真空ポンプとした場合、ターボ分子ポンプの到達
圧力時に適量の窒素ガスを該真空ポンプの吸気側から導
入すると、該ターボ分子ポンプの吸気口の水素ガスの分
圧が大巾に低下し、これにより水素ガスの排気性能が大
巾に改善される。When the auxiliary pump is a positive displacement vacuum pump whose performance does not depend on the type of gas, when an appropriate amount of nitrogen gas is introduced from the suction side of the vacuum molecular pump at the ultimate pressure of the turbo molecular pump, The partial pressure of hydrogen gas at the intake port is drastically reduced, which greatly improves the exhaust performance of hydrogen gas.
【０００７】[0007]
【実施例】以下本発明の第１実施例を図１乃至図３によ
り説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS.
【０００８】１はターボ分子ポンプ（以下ＴＭＰと称す
る）を示す。Reference numeral 1 denotes a turbo molecular pump (hereinafter referred to as TMP).
【０００９】２は補助ポンプを示し、該補助ポンプ２は
例えば容積移送型真空ポンプの一種であるドライ往復動
型真空ポンプからなる。Reference numeral 2 denotes an auxiliary pump, which is composed of, for example, a dry reciprocating vacuum pump which is a kind of volume transfer vacuum pump.
【００１０】３は真空計で該真空計３はＴＭＰ１と連通
するチャンバー５内の真空度を計測する。Reference numeral 3 denotes a vacuum gauge, which measures the degree of vacuum in the chamber 5 communicating with the TMP 1.
【００１１】４は前記補助ポンプ２の吸気側に窒素ガス
を導入する導入管、６は該導入管４に介在し窒素ガスを
導入調整するマスフローコントローラ（以下ＭＦＣと称
する）を示す。Reference numeral 4 denotes an introduction pipe for introducing nitrogen gas into the intake side of the auxiliary pump 2, and reference numeral 6 denotes a mass flow controller (hereinafter referred to as MFC) interposed in the introduction pipe 4 for adjusting the introduction of nitrogen gas.
【００１２】次に本実施例の作動を説明する。Next, the operation of this embodiment will be described.
【００１３】ＴＭＰ１と補助ポンプ２を作動すると、チ
ャンバー５内の水素ガスを含むガスがＴＭＰ１で圧縮さ
れ更に補助ポンプ２により大気に排出される。When the TMP1 and the auxiliary pump 2 are operated, the gas containing hydrogen gas in the chamber 5 is compressed by the TMP1 and further discharged to the atmosphere by the auxiliary pump 2.
【００１４】このとき該チャンバー５内の圧力を真空計
３により計測し、ＭＦＣ６により該チャンバー５内の圧
力が最低になるように窒素ガスを調整して補助ポンプの
吸気側から導入する。これによりＴＭＰ１の吸気口圧力
が低下し、排気性能が大巾に改善される。At this time, the pressure in the chamber 5 is measured by the vacuum gauge 3, the nitrogen gas is adjusted by the MFC 6 so that the pressure in the chamber 5 becomes the minimum, and the nitrogen gas is introduced from the intake side of the auxiliary pump. As a result, the intake port pressure of TMP1 is lowered, and the exhaust performance is greatly improved.
【００１５】以下、上記態様を図２及び図３により説明
する。The above aspect will be described below with reference to FIGS.
【００１６】図２は補助ポンプ２の排気速度（Ｓｂ）−
吸気口圧力（Ｐｓｂ）曲線を、又図３は水素ガス３０Ｐ
ａｌ／ｓと窒素ガス３０及び９０Ｐａｌ／ｓのガスを排
気したときの該ＴＭＰ１の背圧（Ｐｂ）と吸気口圧（Ｐ
ｓ）との関係を示す。FIG. 2 shows the exhaust speed (Sb) of the auxiliary pump 2.
Intake port pressure (Psb) curve, and Fig. 3 shows hydrogen gas 30P
The back pressure (Pb) and the intake port pressure (P) of the TMP1 when the gas of al / s and nitrogen gas of 30 and 90 Pal / s are exhausted.
s) is shown.
【００１７】今、ＴＭＰ１の吸気口から水素ガス３０Ｐ
ａｌ／ｓが流入している場合には該ＴＭＰ１の背圧（Ｐ
ｂ）はこれと図２の補助ポンプの特性曲線Ｓｂとの交点
即ちＡ点の２００Ｐａであり、又図３より吸気口圧（Ｐ
ｓ）は５３Ｐａとなり、水素ガスに対するＴＭＰ１の排
気速度（ＳH2）は［数Ｉ］より０．５７ｌ／ｓとなる。Now, the hydrogen gas 30P from the intake port of TMP1
When al / s is flowing in, the back pressure (P
b) is 200 Pa at the intersection of this and the characteristic curve Sb of the auxiliary pump of FIG. 2, that is, at point A, and from FIG.
s) is the pumping speed of the TMP1 next 53 Pa, to hydrogen gas (S H2) becomes 0.57l / s from Equation I].
【００１８】次に補助ポンプ２の吸気側より窒素ガスを
３０Ｐａｌ／ｓ導入すると、ＴＭＰ１の背圧側、即ち補
助ポンプ２の吸入側には水素ガス（ＱH2）が３０Ｐａｌ
／ｓと窒素ガス（ＱN2）が３０Ｐａｌ／ｓが流れてお
り、図２においてこれと補助ポンプの排気速度曲線Ｓｂ
との交点より補助ポンプ２の吸気口圧力（Ｐｓｂ）は２
００Ｐａであるが［数II］よりＴＭＰの背圧（Ｐｂ）の
水素分圧は１００Ｐａ（図２のＢ点）であり、且つ図３
よりＴＭＰ１の吸気口圧力（Ｐｓ）は１０Ｐａに低下
し、該ＴＭＰ１の水素ガスの排気速度（ＳH2）は［数 I
II］より３ｌ／ｓに改善される。Next, when 30 Pal / s of nitrogen gas is introduced from the intake side of the auxiliary pump 2, hydrogen gas (Q H2 ) is 30 Pal on the back pressure side of the TMP 1, that is, the intake side of the auxiliary pump 2.
/ S and nitrogen gas (Q N2 ) are flowing at 30 Pal / s, and this is shown in FIG. 2 and the exhaust speed curve Sb of the auxiliary pump.
The intake port pressure (Psb) of the auxiliary pump 2 is 2 from the intersection with
Although it is 00 Pa, the hydrogen partial pressure of the back pressure (Pb) of TMP is 100 Pa (point B in FIG. 2) from [Equation II], and FIG.
More TMP1 inlet pressure (Ps) is reduced to 10 Pa, the exhaust velocity of the hydrogen gas in the TMP1 (S H2) is [number I
II] is improved to 3 l / s.
【００１９】このとき背圧側の窒素ガス分圧はほぼ０か
ら１００Ｐａに増大するが、図３により吸気口圧力は全
く影響を受けない。At this time, the nitrogen gas partial pressure on the back pressure side increases from almost 0 to 100 Pa, but the intake port pressure is not affected at all by FIG.
【００２０】同様にして補助ポンプ２の吸気側から窒素
ガスを９０Ｐａｌ／ｓを導入すると、図２の補助ポンプ
の特性曲線Ｓｂとの交点より背圧Ｐｓｂは２００Ｐａの
ままであり、［数IV］より前記ＴＭＰ１の背圧の水素ガ
ス分圧は図２のＣ点即ち５０Ｐａとなり、図３より該Ｔ
ＭＰ１の吸気口圧力（Ｐｓ）は１．３５Ｐａに低下し、
このときの排気速度（Ｓ）は［数Ｖ」により２２ｌ／ｓ
に改善される。Similarly, when 90 Pal / s of nitrogen gas is introduced from the intake side of the auxiliary pump 2, the back pressure Psb remains 200 Pa from the intersection with the characteristic curve Sb of the auxiliary pump of FIG. As a result, the hydrogen gas partial pressure of the back pressure of the TMP1 becomes point C in FIG. 2, that is, 50 Pa.
The inlet pressure (Ps) of MP1 drops to 1.35Pa,
The pumping speed (S) at this time is 22 l / s due to [several V].
To be improved.
【００２１】このように図２の補助ポンプ２と図３のＴ
ＭＰ１とを組合せた場合、水素ガスに対してはほとんど
排気能力がなかったものが、該補助ポンプ２の吸気側よ
り窒素ガスを導入することにより水素ガスに対する排気
性能が大きく改善される。Thus, the auxiliary pump 2 of FIG. 2 and the T of FIG.
When it is combined with MP1, it has almost no exhaust capability for hydrogen gas, but by introducing nitrogen gas from the intake side of the auxiliary pump 2, the exhaust performance for hydrogen gas is greatly improved.
【００２２】図４は本発明の第２実施例を示し、この実
施例においては前記真空計３と前記ＭＦＣ６との間に例
えばマイクロコンピュータからなる制御手段７を介在さ
せ、補助ポンプ２に導入する窒素ガスの流量を制御して
該ＴＭＰ１の排気性能を最大に発揮するようにしたもの
であり、排気効率を向上できる特徴を有する。FIG. 4 shows a second embodiment of the present invention. In this embodiment, a control means 7 composed of, for example, a microcomputer is interposed between the vacuum gauge 3 and the MFC 6 and introduced into the auxiliary pump 2. The flow rate of nitrogen gas is controlled so that the exhaust performance of the TMP1 is maximized, and it has a feature that the exhaust efficiency can be improved.
【００２３】尚、該制御手段６に記憶装置を付加して前
記図２に相当するＳｂ−Ｐｓｂ曲線を記憶させ、図２の
補助ポンプのＳｂ−Ｐｓｂ曲線にてＰｓｂが一定になる
範囲の流量に水素流量と窒素流量の和がなり、かつ図３
の前段ＴＭＰ１の窒素ガスに対するＰｓ−Ｐｂ曲線にて
Ｐｓが一定範囲内になるような窒素ガス流量とする。A storage device is added to the control means 6 to store the Sb-Psb curve corresponding to FIG. 2, and the flow rate in the range where Psb is constant in the Sb-Psb curve of the auxiliary pump of FIG. The sum of the flow rate of hydrogen and the flow rate of nitrogen becomes
The nitrogen gas flow rate is set so that Ps falls within a certain range in the Ps-Pb curve for the nitrogen gas in the preceding TMP1.
【００２４】この場合前記チャンバー５に水素ガスが導
入されないときは、前記ＭＦＣ６の開閉弁を閉止する。In this case, when hydrogen gas is not introduced into the chamber 5, the open / close valve of the MFC 6 is closed.
【００２５】更に上記実施例においては導入ガスとして
窒素ガスを用いたが、該窒素ガスに代えて分子量の大き
なガス、例えば空気やアルゴンガス等を導入してもよ
い。Further, although nitrogen gas was used as the introduction gas in the above embodiments, a gas having a large molecular weight such as air or argon gas may be introduced instead of the nitrogen gas.
【００２６】[0026]
【発明の効果】上記のように本発明によれば、ターボ分
子ポンプに補助ポンプを連結した真空装置において、該
補助ポンプの吸気側に分子量の大きい特定ガスを導入し
たので、該ターボ分子ポンプの吸気口圧力を低下し、タ
ーボ分子ポンプの水素ガス等の排気性能を大巾に改善す
ることができる効果を有する。As described above, according to the present invention, in a vacuum device in which an auxiliary pump is connected to a turbo molecular pump, a specific gas having a large molecular weight is introduced into the intake side of the auxiliary pump. This has the effect of lowering the intake port pressure and greatly improving the exhaust performance of hydrogen gas or the like of the turbo molecular pump.
【図１】本発明の第１実施例の概略図である。FIG. 1 is a schematic diagram of a first embodiment of the present invention.
【図２】補助ポンプのＳｂ−Ｐｓｂ曲線である。FIG. 2 is a Sb-Psb curve of an auxiliary pump.
【図３】ターボ分子ポンプのＰｓ−Ｐｂ曲線である。FIG. 3 is a Ps-Pb curve of a turbo molecular pump.
【図４】本発明の第２実施例の概略図である。FIG. 4 is a schematic diagram of a second embodiment of the present invention.
１ ターボ分子ポンプ ２ 補助ポンプ ４ 導入管 ６ マスフローコントローラー ７ 制御手段 1 turbo molecular pump 2 auxiliary pump 4 introduction pipe 6 mass flow controller 7 control means
─────────────────────────────────────────────────────
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【手続補正書】[Procedure amendment]
【提出日】平成５年１０月１５日[Submission date] October 15, 1993
【手続補正１】[Procedure Amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】発明の詳細な説明[Name of item to be amended] Detailed explanation of the invention
【補正方法】変更[Correction method] Change
【補正内容】[Correction content]
【発明の詳細な説明】Detailed Description of the Invention
【０００１】[0001]
【産業上の利用分野】本発明は、薬品工業や電子工業及
び研究所等で使用される分析装置、ＩＣ製造装置及び試
験装置等において、清浄な高真空或いは超高真空を得る
のに好適な真空ポンプ装置に関する。BACKGROUND OF THE INVENTION The present invention is suitable for obtaining a clean high vacuum or ultra-high vacuum in an analyzer, an IC manufacturing apparatus, a test apparatus, etc. used in the chemical industry, electronic industry, laboratory, etc. The present invention relates to a vacuum pump device.
【０００２】[0002]
【従来の技術】従来この種の真空ポンプ装置としては、
補助ポンプとしてドライ往復動型真空ポンプを用い、タ
ーボ分子ポンプと組合わせた形式のものが知られてい
る。2. Description of the Related Art Conventionally, as a vacuum pump device of this type,
It is known that a dry reciprocating vacuum pump is used as an auxiliary pump in combination with a turbo molecular pump.
【０００３】[0003]
【発明が解決しようとする課題】この従来の真空ポンプ
装置においては、ドライ往復動型真空ポンプの到達圧力
が１００Ｐａ前後で、ターボ分子ポンプの補助ポンプと
しては限界の性能であり、吸気ガスが水素ガスのように
軽いガスを含む場合には該ターボ分子ポンプの排気速度
が大きく阻害され、排気性能が低下する問題点を有し、
且つドライ往復動型真空ポンプの到達圧力を下げること
は技術的に難しく、又これを向上するためには費用が極
めて大きくなる等の問題点を有していた。In this conventional vacuum pump device, the ultimate pressure of the dry reciprocating vacuum pump is about 100 Pa, which is the limit performance as the auxiliary pump of the turbo molecular pump, and the intake gas is hydrogen. When a light gas such as gas is included, the exhaust speed of the turbo molecular pump is greatly hindered, and there is a problem that the exhaust performance decreases.
In addition, it is technically difficult to lower the ultimate pressure of the dry reciprocating vacuum pump, and there is a problem that the cost is extremely high to improve it.
【０００４】本発明は上記の問題点を解消し、簡易な手
段によりターボ分子ポンプの吸気口圧力を低下させ、該
ターボ分子ポンプにより水素ガス等の軽いガスの排気性
能を大巾に改善することを目的とする。The present invention solves the above problems, reduces the intake port pressure of a turbo molecular pump by a simple means, and greatly improves the exhaust performance of light gas such as hydrogen gas by the turbo molecular pump. With the goal.
【０００５】[0005]
【課題を解決するための手段】上記の目的を達成するた
め本発明は、ターボ分子ポンプに補助ポンプを連結した
真空装置において、該補助ポンプの吸気側に、分子量の
大きい特定ガスを導入する導入管を接続したことを特徴
とする。In order to achieve the above object, the present invention is directed to a vacuum device in which an auxiliary pump is connected to a turbo molecular pump, in which a specific gas having a large molecular weight is introduced to the intake side of the auxiliary pump. It is characterized by connecting a pipe.
【０００６】[0006]
【作用】補助ポンプをその性能がガス種によらない容積
移送型真空ポンプとした場合、ターボ分子ポンプの到達
圧力時に適量の窒素ガスを該真空ポンプの吸気側から導
入すると、該ターボ分子ポンプの吸気口の水素ガスの分
圧が大巾に低下し、これにより水素ガスの排気性能が大
巾に改善される。When the auxiliary pump is a positive displacement vacuum pump whose performance does not depend on the type of gas, when an appropriate amount of nitrogen gas is introduced from the suction side of the vacuum molecular pump at the ultimate pressure of the turbo molecular pump, The partial pressure of hydrogen gas at the intake port is drastically reduced, which greatly improves the exhaust performance of hydrogen gas.
【０００７】[0007]
【実施例】以下本発明の第１実施例を図１乃至図３によ
り説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIGS.
【０００８】１はターボ分子ポンプ（以下ＴＭＰと称す
る）を示す。Reference numeral 1 denotes a turbo molecular pump (hereinafter referred to as TMP).
【０００９】２は補助ポンプを示し、該補助ポンプ２は
例えば容積移送型真空ポンプの一種であるドライ往復動
型真空ポンプからなる。Reference numeral 2 denotes an auxiliary pump, which is composed of, for example, a dry reciprocating vacuum pump which is a kind of volume transfer vacuum pump.
【００１０】３は真空計で該真空計３はＴＭＰ１と連通
するチャンバー５内の真空度を計測する。Reference numeral 3 denotes a vacuum gauge, which measures the degree of vacuum in the chamber 5 communicating with the TMP 1.
【００１１】４は前記補助ポンプ２の吸気側に窒素ガス
を導入する導入管、６は該導入管４に介在し窒素ガスを
導入調整するマスフローコントローラ（以下ＭＦＣと称
する）を示す。Reference numeral 4 denotes an introduction pipe for introducing nitrogen gas into the intake side of the auxiliary pump 2, and reference numeral 6 denotes a mass flow controller (hereinafter referred to as MFC) interposed in the introduction pipe 4 for adjusting the introduction of nitrogen gas.
【００１２】次に本実施例の作動を説明する。Next, the operation of this embodiment will be described.
【００１３】ＴＭＰ１と補助ポンプ２を作動すると、チ
ャンバー５内の水素ガスを含むガスがＴＭＰ１で圧縮さ
れ更に補助ポンプ２により大気に排出される。When the TMP1 and the auxiliary pump 2 are operated, the gas containing hydrogen gas in the chamber 5 is compressed by the TMP1 and further discharged to the atmosphere by the auxiliary pump 2.
【００１４】このとき該チャンバー５内の圧力を真空計
３により計測し、ＭＦＣ６により該チャンバー５内の圧
力が最低になるように窒素ガスを調整して補助ポンプの
吸気側から導入する。これによりＴＭＰ１の吸気口圧力
が低下し、排気性能が大巾に改善される。At this time, the pressure in the chamber 5 is measured by the vacuum gauge 3, the nitrogen gas is adjusted by the MFC 6 so that the pressure in the chamber 5 becomes the minimum, and the nitrogen gas is introduced from the intake side of the auxiliary pump. As a result, the intake port pressure of TMP1 is lowered, and the exhaust performance is greatly improved.
【００１５】以下、上記態様を図２及び図３により説明
する。The above aspect will be described below with reference to FIGS.
【００１６】図２は補助ポンプ２の排気速度（Ｓｂ）−
吸気口圧力（Ｐｓｂ）曲線を、又図３は水素ガス３０Ｐ
ａ１／ｓと窒素ガス３０及び９０Ｐａ１／ｓのガスを排
気したときの該ＴＭＰ１の背圧（Ｐｂ）と吸気口圧（Ｐ
ｓ）との関係を示す。FIG. 2 shows the exhaust speed (Sb) of the auxiliary pump 2.
Intake port pressure (Psb) curve, and Fig. 3 shows hydrogen gas 30P
a1 / s, the nitrogen gas 30 and the back pressure (Pb) and the intake pressure (Pb) of the TMP1 when the gas of 90 Pa1 / s is exhausted.
s) is shown.
【００１７】今、ＴＭＰ１の吸気口から水素ガス３０Ｐ
ａ１／ｓが流入している場合には該ＴＭＰ１の背圧（Ｐ
ｂ）はこれと図２の補助ポンプの特性曲線ｓｂとの交点
即ちＡ点の２００Ｐａであり、又図３より吸気口圧（Ｐ
ｓ）は５３Ｐａとなり、水素ガスに対するＴＭＰ１の排
気速度（ＳＨ２）はNow, the hydrogen gas 30P from the intake port of TMP1
When a1 / s is flowing in, the back pressure (P
b) is 200 Pa at the intersection of this and the characteristic curve sb of the auxiliary pump of FIG. 2, that is, point A, and from FIG.
s) of 53Pa, and the pumping speed of the TMP1 to hydrogen gas (S H2) is
【００１８】[0018]
【数Ｉ】 [Number I]
【００１９】より０．５７１／ｓとなる。From the above, it becomes 0.571 / s.
【００２０】次に補助ポンプ２の吸気側より窒素ガスを
３０Ｐａ１／ｓ導入すると、ＴＭＰ１の背圧側、即ち補
助ポンプ２の吸入側には水素ガス（ＱＨ２）が３０Ｐａ
１／ｓと窒素ガス（ＱＮ２）が３０Ｐａ１／ｓが流れて
おり、図２においてこれと補助ポンプの排気速度曲線Ｓ
ｂとの交点より補助ポンプ２の吸気口圧力（Ｐｓｂ）は
２００ＰａであるがNext, when nitrogen gas of 30 Pa1 / s is introduced from the intake side of the auxiliary pump 2, 30 Pa of hydrogen gas (Q H2 ) is supplied to the back pressure side of the TMP1, that is, the intake side of the auxiliary pump 2.
1 / s and 30 Pa1 / s of nitrogen gas (Q N2 ) are flowing, and this is shown in FIG. 2 and the exhaust speed curve S of the auxiliary pump.
Although the inlet pressure (Psb) of the auxiliary pump 2 is 200 Pa from the intersection with b,
【００２１】[0021]
【数ＩＩ】 [Formula II]
【００２２】よりＴＭＰの背圧（Ｐｂ）の水素分圧（Ｐ
Ｈ２）は１００Ｐａ（図２のＢ点）であり、且つ図３よ
りＴＭＰ１の吸気口圧力（Ｐｓ）は１０Ｐａに低下し、
該ＴＭＰ１の水素ガスの排気速度（ＳＨ２）はFrom the back pressure (Pb) of TMP, the hydrogen partial pressure (P
H2 ) is 100 Pa (point B in FIG. 2), and from FIG. 3, the intake port pressure (Ps) of TMP1 drops to 10 Pa,
Pumping speed of the hydrogen gas in the TMP1 (S H2) is
【００２３】[0023]
【数ＩＩＩ】 [Formula III]
【００２４】より３１／ｓに改善される。It is improved to 31 / s.
【００２５】このとき背圧側の窒素ガス分圧はほぼ０か
ら１００Ｐａに増大するが、図３により吸気口圧力は全
く影響を受けない。At this time, the nitrogen gas partial pressure on the back pressure side increases from almost 0 to 100 Pa, but the intake port pressure is not affected at all by FIG.
【００２６】同様にして補助ポンプ２の吸気側から窒素
ガスを９０Ｐａ１／ｓを導入すると、図２の補助ポンプ
の特性曲線Ｓｂとの交点より背圧Ｐｓｂは２００Ｐａの
ままであり、Similarly, when 90 Pa1 / s of nitrogen gas is introduced from the intake side of the auxiliary pump 2, the back pressure Psb remains 200 Pa from the intersection with the characteristic curve Sb of the auxiliary pump of FIG.
【００２７】[0027]
【数ＩＶ】 [Equation IV]
【００２８】より前記ＴＭＰ１の背圧の水素ガス分圧
（ＰＨ２）は図２のＣ点即ち５０Ｐａとなり、図３より
該ＴＭＰ１の吸気口圧力（Ｐｓ）は１．３５Ｐａに低下
し、このときの排気速度（Ｓ）はFrom the TMP1 back pressure, the hydrogen gas partial pressure
(P H2) point C i.e. 50Pa next to FIG. 2, the air inlet pressure of the TMP1 from FIG 3 (Ps) is reduced to 1.35 Pa, the exhaust speed at this time (S) is
【００２９】[0029]
【数Ｖ】 [Number V]
【００３０】により２２１／ｓに改善される。Is improved to 221 / s.
【００３１】このように図２の補助ポンプ２と図３のＴ
ＭＰ１とを組合せた場合、水素ガスに対してはほとんど
排気能力がなかったものが、該補助ポンプ２の吸気側よ
り窒素ガスを導入することにより水素ガスに対する排気
性能が大きく改善される。Thus, the auxiliary pump 2 of FIG. 2 and the T of FIG.
When it is combined with MP1, it has almost no exhaust capability for hydrogen gas, but by introducing nitrogen gas from the intake side of the auxiliary pump 2, the exhaust performance for hydrogen gas is greatly improved.
【００３２】図４は本発明の第２実施例を示し、この実
施例においては前記真空計３と前記ＭＦＣ６との間に例
えばマイクロコンピュータからなる制御手段７を介在さ
せ、補助ポンプ２に導入する窒素ガスの流量を制御して
該ＴＭＰ１の排気性能を最大に発揮するようにしたもの
であり、排気効率を向上できる特徴を有する。FIG. 4 shows a second embodiment of the present invention. In this embodiment, a control means 7 composed of, for example, a microcomputer is interposed between the vacuum gauge 3 and the MFC 6 and introduced into the auxiliary pump 2. The flow rate of nitrogen gas is controlled so that the exhaust performance of the TMP1 is maximized, and it has a feature that the exhaust efficiency can be improved.
【００３３】尚、該制御手段６に記憶装置を付加して前
記図２に相当するＳｂ−Ｐｓｂ曲線を記憶させ、図２の
補助ポンプのＳｂ−Ｐｓｂ曲線にてＰｓｂが一定になる
範囲の流量に水素流量と窒素流量の和がなり、かつ図３
の前段ＴＭＰ１の窒素ガスに対するＰｓ−Ｐｂ曲線にて
Ｐｓが一定範囲内になるような窒素ガス流量とする。A storage device is added to the control means 6 to store the Sb-Psb curve corresponding to FIG. 2, and the flow rate in the range where Psb is constant in the Sb-Psb curve of the auxiliary pump of FIG. The sum of the flow rate of hydrogen and the flow rate of nitrogen becomes
The nitrogen gas flow rate is set so that Ps falls within a certain range in the Ps-Pb curve for the nitrogen gas in the preceding TMP1.
【００３４】この場合前記チャンバー５に水素ガスが導
入されないときは、前記ＭＦＣ６の開閉弁を閉止する。In this case, when hydrogen gas is not introduced into the chamber 5, the open / close valve of the MFC 6 is closed.
【００３５】更に上記実施例においては導入ガスとして
窒素ガスを用いたが、該窒素ガスに代えて分子量の大き
なガス、例えば空気やアルゴンガス等を導入してもよ
い。Further, although nitrogen gas was used as the introduction gas in the above embodiments, a gas having a large molecular weight such as air or argon gas may be introduced instead of the nitrogen gas.
【００３６】[0036]
【発明の効果】上記のように本発明によれば、ターボ分
子ポンプに補助ポンプを連結した真空装置において、該
補助ポンプの吸気側に分子量の大きい特定ガスを導入し
たので、該ターボ分子ポンプの吸気口圧力を低下し、タ
ーボ分子ポンプの水素ガス等の排気性能を大巾に改善す
ることができる効果を有する。As described above, according to the present invention, in a vacuum device in which an auxiliary pump is connected to a turbo molecular pump, a specific gas having a large molecular weight is introduced into the intake side of the auxiliary pump. This has the effect of lowering the intake port pressure and greatly improving the exhaust performance of hydrogen gas or the like of the turbo molecular pump.
Claims (3)
た真空装置において、該補助ポンプの吸気側に、分子量
の大きい特定ガスを導入する導入管を接続したことを特
徴とする真空ポンプ装置。1. A vacuum pump apparatus in which an auxiliary pump is connected to a turbo molecular pump, and an introduction pipe for introducing a specific gas having a large molecular weight is connected to an intake side of the auxiliary pump.
制御する制御手段を設けたことを特徴とする請求項１に
記載の真空ポンプ装置。2. The vacuum pump device according to claim 1, wherein the vacuum device is provided with control means for adjusting and controlling the introduction amount of the specific gas.
徴とする請求項１に記載の真空ポンプ装置。3. The vacuum pump device according to claim 1, wherein the specific gas is nitrogen gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19282293A JP3494457B2 (en) | 1993-07-07 | 1993-07-07 | Vacuum pump device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19282293A JP3494457B2 (en) | 1993-07-07 | 1993-07-07 | Vacuum pump device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0727089A true JPH0727089A (en) | 1995-01-27 |
| JP3494457B2 JP3494457B2 (en) | 2004-02-09 |
Family
ID=16297561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19282293A Expired - Fee Related JP3494457B2 (en) | 1993-07-07 | 1993-07-07 | Vacuum pump device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3494457B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6454524B1 (en) * | 1998-07-21 | 2002-09-24 | Seiko Instruments Inc. | Vacuum pump and vacuum apparatus |
| JP2008095504A (en) * | 2006-10-05 | 2008-04-24 | Agilent Technol Inc | Analysis apparatus |
| JP2008218663A (en) * | 2007-03-02 | 2008-09-18 | Mitsubishi Heavy Ind Ltd | Operating method of vacuum treatment device and vacuum treatment device |
| JP2009510321A (en) * | 2005-09-28 | 2009-03-12 | エドワーズ リミテッド | How to pump gas |
| EP2644900A3 (en) * | 2012-03-30 | 2015-08-19 | Pfeiffer Vacuum GmbH | Pump system for evacuating of gas from a plurality of chambers and method for controlling the pump system |
| CN110036204A (en) * | 2016-12-15 | 2019-07-19 | 莱宝有限公司 | Vacuum pump system and method for operated vacuum pumps system |
| WO2023007820A1 (en) * | 2021-07-30 | 2023-02-02 | 株式会社島津製作所 | Mass spectrometer |
-
1993
- 1993-07-07 JP JP19282293A patent/JP3494457B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6454524B1 (en) * | 1998-07-21 | 2002-09-24 | Seiko Instruments Inc. | Vacuum pump and vacuum apparatus |
| JP2009510321A (en) * | 2005-09-28 | 2009-03-12 | エドワーズ リミテッド | How to pump gas |
| JP2008095504A (en) * | 2006-10-05 | 2008-04-24 | Agilent Technol Inc | Analysis apparatus |
| JP2008218663A (en) * | 2007-03-02 | 2008-09-18 | Mitsubishi Heavy Ind Ltd | Operating method of vacuum treatment device and vacuum treatment device |
| EP2644900A3 (en) * | 2012-03-30 | 2015-08-19 | Pfeiffer Vacuum GmbH | Pump system for evacuating of gas from a plurality of chambers and method for controlling the pump system |
| CN110036204A (en) * | 2016-12-15 | 2019-07-19 | 莱宝有限公司 | Vacuum pump system and method for operated vacuum pumps system |
| WO2023007820A1 (en) * | 2021-07-30 | 2023-02-02 | 株式会社島津製作所 | Mass spectrometer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3494457B2 (en) | 2004-02-09 |
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