JPH0726200B1 - - Google Patents

Info

Publication number
JPH0726200B1
JPH0726200B1 JP3503460A JP50346091A JPH0726200B1 JP H0726200 B1 JPH0726200 B1 JP H0726200B1 JP 3503460 A JP3503460 A JP 3503460A JP 50346091 A JP50346091 A JP 50346091A JP H0726200 B1 JPH0726200 B1 JP H0726200B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3503460A
Other languages
Japanese (ja)
Other versions
JPH0726200B2 (ja
JPWO1991011328A1 (ja
Inventor
Takashi Ishigami
Mitsuo Kawai
Atsuko Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP3-503460A priority Critical patent/JPH0726200B2/ja
Priority claimed from JP3-503460A external-priority patent/JPH0726200B2/ja
Publication of JPWO1991011328A1 publication Critical patent/JPWO1991011328A1/ja
Publication of JPH0726200B2 publication Critical patent/JPH0726200B2/ja
Publication of JPH0726200B1 publication Critical patent/JPH0726200B1/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
  • Electronic Switches (AREA)
  • Powder Metallurgy (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
JP3-503460A 1990-02-01 1991-01-31 スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド Expired - Lifetime JPH0726200B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3-503460A JPH0726200B2 (ja) 1990-02-01 1991-01-31 スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2044690 1990-02-01
JP2-20446 1990-02-01
JP2-277777 1990-10-18
JP27777790 1990-10-18
JP3-503460A JPH0726200B2 (ja) 1990-02-01 1991-01-31 スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6183360A Division JPH07292464A (ja) 1990-02-01 1994-08-04 スパッタリングターゲットの製造方法、膜抵抗体の製造方法およびサーマルプリンタヘッドの製造方法

Publications (3)

Publication Number Publication Date
JPWO1991011328A1 JPWO1991011328A1 (ja) 1992-02-06
JPH0726200B2 JPH0726200B2 (ja) 1995-03-22
JPH0726200B1 true JPH0726200B1 (enExample) 1995-03-22

Family

ID=27283044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3-503460A Expired - Lifetime JPH0726200B2 (ja) 1990-02-01 1991-01-31 スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド

Country Status (1)

Country Link
JP (1) JPH0726200B2 (enExample)

Also Published As

Publication number Publication date
DE69112739D1 (de) 1995-10-12
EP0471080A1 (en) 1992-02-19
KR960006591B1 (ko) 1996-05-20
KR960006590B1 (ko) 1996-05-20
EP0471080B1 (en) 1995-09-06
DE69112739T2 (de) 1996-04-11
WO1991011328A1 (fr) 1991-08-08
EP0471080A4 (en) 1993-01-13
JPH07292464A (ja) 1995-11-07

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