JPH0726200B1 - - Google Patents
Info
- Publication number
- JPH0726200B1 JPH0726200B1 JP3503460A JP50346091A JPH0726200B1 JP H0726200 B1 JPH0726200 B1 JP H0726200B1 JP 3503460 A JP3503460 A JP 3503460A JP 50346091 A JP50346091 A JP 50346091A JP H0726200 B1 JPH0726200 B1 JP H0726200B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
- Electronic Switches (AREA)
- Powder Metallurgy (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3-503460A JPH0726200B2 (ja) | 1990-02-01 | 1991-01-31 | スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2044690 | 1990-02-01 | ||
| JP2-20446 | 1990-02-01 | ||
| JP2-277777 | 1990-10-18 | ||
| JP27777790 | 1990-10-18 | ||
| JP3-503460A JPH0726200B2 (ja) | 1990-02-01 | 1991-01-31 | スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6183360A Division JPH07292464A (ja) | 1990-02-01 | 1994-08-04 | スパッタリングターゲットの製造方法、膜抵抗体の製造方法およびサーマルプリンタヘッドの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO1991011328A1 JPWO1991011328A1 (ja) | 1992-02-06 |
| JPH0726200B2 JPH0726200B2 (ja) | 1995-03-22 |
| JPH0726200B1 true JPH0726200B1 (enExample) | 1995-03-22 |
Family
ID=27283044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3-503460A Expired - Lifetime JPH0726200B2 (ja) | 1990-02-01 | 1991-01-31 | スパッタリングターゲット、それを用いて形成した膜抵抗体およびサーマルプリンタヘッド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0726200B2 (enExample) |
-
1991
- 1991-01-31 JP JP3-503460A patent/JPH0726200B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE69112739D1 (de) | 1995-10-12 |
| EP0471080A1 (en) | 1992-02-19 |
| KR960006591B1 (ko) | 1996-05-20 |
| KR960006590B1 (ko) | 1996-05-20 |
| EP0471080B1 (en) | 1995-09-06 |
| DE69112739T2 (de) | 1996-04-11 |
| WO1991011328A1 (fr) | 1991-08-08 |
| EP0471080A4 (en) | 1993-01-13 |
| JPH07292464A (ja) | 1995-11-07 |
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