JPH07261015A - Dyestuff for black matrix, resist composition containing that dyestuff, production method of black matrix using that composition and black matrix obtained by that method - Google Patents

Abstract

PURPOSE:To obtain a black matrix having enough light-shielding effect, excellent performances such as fineness and heat resistance, and enough color density, and to obtain its production method. CONSTITUTION:This black matrix consists of a black or non-black coating film on a supporting body. This coating film is formed by lithography of a black or non-black positive resist compsn. for a black matrix as described below and a black or non-black negative resist compsn. containing a photo acid producing agent, crosslinking agent and org. solvent. The black or non- black positive resist compsn. for a black matrix contains two or more kinds of dyestuffs for a black matrix with different colors, alkali-soluble resin, quinone diazide compd. and org. solvent. The dyestuff for a black matrix has sulfoneamide groups having a substituent for one hydrogen atom and is soluble with both of an alkali developer and an org. solvent.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a dye used in a black matrix which is a light-shielding film for partitioning a color filter (pixel), a resist composition containing the dye, and a black matrix produced using the composition. Method,
And a black matrix obtained by the method.

[0002]

2. Description of the Related Art Color filters are charge-coupled devices (CCD).
Alternatively, it is used in liquid crystal display devices (LCD). Then, in order to obtain an image with good contrast, it is necessary to form a black matrix as a light shielding film between the color filters (pixels). Conventionally, regarding the formation of the black matrix, after patterning the dyeable resin,
The method of dyeing was adopted. However, this method requires complicated steps, and it is difficult to control each material. Moreover, it is difficult to obtain a sufficient black density,
There was a problem that the fineness was not sufficient. Therefore, for example, Japanese Patent Laid-Open No. 4-190362 discloses a black organic pigment and / or
Alternatively, an organic pigment composed of a mixed color organic pigment obtained by mixing at least two kinds of organic pigments selected from red, blue, green, violet, yellow, cyan, and magenta to obtain a pseudo black color, carbon black, chromium oxide, iron oxide, A resist for forming a light-shielding film, which comprises at least one light-shielding agent selected from titanium black and aniline black and a photosensitive resin in a solvent, and a pattern using the resist. The formed light shielding film is described. However, the above resist is not satisfactory in performance such as fineness.

[0003]

DISCLOSURE OF THE INVENTION The present invention provides a dye for a black matrix which has a sufficient light-shielding effect, excellent performances such as fineness and heat resistance, and a sufficient color density.
Provided are a resist composition containing the above dye, a method for producing a black matrix using the composition, and a black matrix obtained by the method.

[0004]

The present invention has a sulfonamide group in which one hydrogen atom is substituted,
And a dye for a black matrix that is soluble in both an alkaline developer and an organic solvent, i) The sulfonamide group in which one hydrogen atom is substituted is represented by the following formula —SO ₂ NH—R (wherein R is alkyl. , A cycloalkyl, an alkylcarbonylaminoalkyl, an alkylcarbonylamino, a cyclohexylalkyl, an alkoxy, an alkoxyalkyl, an aryl, an aralkyl, or an alkylcarbonyloxy group. , Ii) an alkali-soluble resin, iii) a quinonediazide compound and iv) a black positive resist composition for a black matrix, containing one or more dyes for a black matrix according to i), ii) an alkali-soluble resin Resin, iii) quinonediazide Compound and iv) a non-black positive resist composition for a black matrix, which contains an organic solvent, two or more kinds of black matrix dyes having different colors described in i), ii) an alkali-soluble resin, iii) a photo-acid generator , Iv) a black negative resist composition for a black matrix, which contains a cross-linking agent and v) an organic solvent, one or more of the black matrix dyes described in i), ii) an alkali-soluble resin, and iii) a photoacid. A non-black negative resist composition for a black matrix containing a generator, iv) a cross-linking agent and v) an organic solvent, a black matrix having a black film formed on a support or a plurality of non-black films stacked on each other. There
The black coating or the non-black coating is a black matrix which is obtained by subjecting the black positive resist composition described above or the non-black positive resist composition described above to lithography. A black matrix in which a black film is provided on a support, or a plurality of non-black films are stacked,
The black coating or the non-black coating is a black matrix characterized by being obtained by subjecting the black negative resist composition described above or the non-black negative resist composition described above to lithography. Manufacture of a black matrix having a black coating or a plurality of stacked non-black coatings obtained by lithography on the support, the black positive resist composition described above or the non-black positive resist composition described above A method of forming the adhesion layer by applying the black positive resist composition or the non-black positive resist composition on a support by the lithography and then drying the same, a predetermined portion of the adhesion layer. UV or deep UV and the exposed area is developed with an alkaline developer to give a black or non-exposed light. A step of forming a black positive type pattern; in the case of a non-black film, a step of forming the above-mentioned adhesion layer for a non-black positive type resist composition of a different color, a step of exposing and a non-black positive type pattern. A method for producing a black matrix, which comprises a step of repeating the step of forming, and by lithographically printing on the support the black negative resist composition described above or the non-black negative resist composition described above. A method for producing a black matrix having a black coating or a plurality of stacked non-black coatings, wherein the lithography coats the black negative resist composition or the non-black negative resist composition on a support, and then dry. And forming an adhesion layer by exposing the predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays. The step of heating after exposure and the step of developing the non-exposed region with an alkaline developer to form a black or non-black negative pattern; A method for producing a black matrix, which comprises the steps of forming the above-mentioned adhesion layer of the resist composition, exposing it, and forming a non-black negative pattern.

As the above-mentioned dye for black matrix, a dye having a substituted sulfonamide group represented by the formula described in i) is preferable. As this pigment,
Examples thereof include azo dyes such as monoazo, bisazo, trisazo or tetrakisazo dyes, anthraquinone dyes, coumarin dyes, styryl dyes, xanthenium dyes and phthalocyanine dyes. These dyes may be of the three primary color systems of red, blue and green, or may be of the three complementary color system of cyan, magenta and yellow. When the dye for a black matrix of the present invention is used as a resist composition for a black matrix, two or more kinds having different colors are used, like the pseudo-blackening of a pigment described in JP-A-4-190362. It is also possible to mix the dyes to make them black, or to use the above three primary color system or three complementary color system dyes singly or in a mixture to use them in a non-black color. Preferred R in the formulas described i) above, + ₁ for example the formula _{C s H 2s + 1 C s} H 2s OC t H 2t C s H 2s + 1 O C s H 2s + 1 CONHC t _Examples include groups represented by H _2t (in the formula, s and t each represent an integer of 1 or more and 20 or less, and s + t ≦ 30).

Preferred azo dyes are, for example, general formula (I) A-N = N-B-(-N = N-D-) _k- N = N-E (I) [wherein A, B , D and E each independently represent an optionally substituted benzene ring or naphthalene ring, and k
Represents 0 or 1, but at least one of the above A, B, D and E represents a benzene ring or a naphthalene ring substituted with a —SO ₂ NH—R (R represents the same meaning as above) group. Represent. ] And the bis or trisazo dyes represented by In the general formula (I), A, B, D
Examples of the substituent on the benzene ring or naphthalene ring represented by E include a carboxyl group, a carboxylate salt, a sulfonic acid group, a sulfonate salt, a hydroxyl group, an amino group,
Lower alkyl group, lower alkoxy group, lower alkylcarbonylamino group, lower alkylamino group, halogen atom, phenylamino group (phenyl may further have a suitable substituent), -CONH-R (R is the above. meaning represent) and the -SO ₂ NH-R or the like and the like. Preferred substituents, for example, a hydroxyl group, an amino group, a lower alkyl group, a lower alkoxy group, a lower alkylcarbonylamino group, a lower alkylamino group, a halogen atom, a phenylamino group and -SO ₂ NH-R, and the like. Examples of the bis or trisazo dyes represented by the general formula (I) include those represented by the general formula (III)

[0007]

[Chemical 2]

[In the formula, R ₁ represents a hydrogen atom, an alkyl group or an optionally substituted phenyl group, and A, B, D
And k have the same meanings as above, but -OH and -NH
At least _one of the naphthalene ring substituted by R ₁ , the benzene or naphthalene ring represented by A, B and D and the phenyl group represented by R ₁ is the above-SO ₂
It has a group represented by NH-R (R has the same meaning as described above) as a substituent. ] And a dye represented by the general formula (IV)

[0009]

[Chemical 3]

(In the formula, A and B have the same meanings as described above, but a naphthalene ring substituted with a hydroxyl group, a benzene ring substituted with an amino group, and a benzene or naphthalene ring represented by A and B) at least one of the dyes represented by shall have as a substituent a group represented by -SO ₂ NH-R) and the like. Examples of the dye represented by the general formula (III) include those represented by the general formula (V)

[0011]

[Chemical 4]

[In the formula, D and R ₁ have the same meanings as described above, but two benzene rings to which an azo group is bonded,
A naphthalene ring substituted with H and -NHR ₁ , a benzene or naphthalene ring represented by D, and R
_At least one of the phenyl groups represented by 1 is the above-
It has a group represented by SO ₂ NH—R (R has the same meaning as described above) as a substituent. ] The dye represented by the general formula (VI)

[0013]

[Chemical 5]

[In the formula, A and R ₁ have the same meanings as described above, but a naphthalene ring to which an azo group is bonded, a naphthalene ring substituted with -OH and -NHR ₁ , a benzene represented by A or At least one of the naphthalene ring and the phenyl group represented by R ₁ is the above-SO.
₂ It has a group represented by NH-R (R has the same meaning as described above) as a substituent. ] And a dye represented by the general formula (VII)

[0015]

[Chemical 6]

[In the formula, R ₂ represents a substituted phenyl group, and the substituent, a naphthalene ring substituted with —OH and —NHR ₂ , and a naphthalene ring and a benzene ring to which an azo group is bonded respectively. At least one of the above
SO ₂ NH—R (R has the same meaning as above). ] And the like. Examples of the dye represented by the general formula (IV) include those represented by the general formula (VII
I)

[0017]

[Chemical 7]

[In the formula, B'represents a substituted benzene or naphthalene ring, which is substituted with a substituent, a naphthalene ring to which an azo group is bonded, a naphthalene ring substituted with -OH, and an amino group. at least one in the benzene ring are is a group represented by -SO ₂ NH-R (R is as defined above). ] And the like.

As the azo dyes other than the general formula (I),
For example, general formula (IX) GJM '(IX) [In formula, M'is the following formula.

[0020]

[Chemical 8]

[0021] (wherein, R ₃ to R ₅ are each independently hydrogen atom, an alkyl group, a halogen atom, a sulfonic acid group, represents an -SO ₂ NH-R sulfonate or the, R ₃ ~
At least one of R ₅ represents —SO ₂ NH—R. )
Is a group represented by

[0022]

[Chemical 9]

(Wherein R _{6 to} R ₁₄ each independently represents a hydrogen atom, a halogen atom, a methyl group, a sulfonic acid group, a sulfonate or the above-SO ₂ NH-R). And G represents the above M ′, a hydrogen atom, or an optionally substituted phenylazophenyl, naphthylazophenyl or phenylazonaphthyl group, respectively. ] The yellow dye etc. which are shown by these are mentioned. Examples of the xanthium-based dye include the general formula (X)

[0024]

[Chemical 10]

(In the formula, R _{15 to} R ₁₈ each independently represent a hydrogen atom or an optionally substituted alkyl or aryl group, and R _{19 to} R ₂₁ each independently represent a hydrogen atom or a substituted one. Which represents an alkyl or aryl group, a sulfonic acid group, a sulfonic acid salt or the above-mentioned —SO ₂ NH—R, at least one of the substituents of the aryl group represented by R _{15 to} R ₁₈ and R _{19 to} R ₂₁ . One is -SO ₂ NH-R
Represents ) And magenta dyes.
The phthalocyanine dyes, for example the general formula _{(XI) (SO 3 M)} h - [Pc] - in _{(SO 2 -NH-R) i} (XI) ( wherein, Pc represents a phthalocyanine nucleus, h and i Each represents the average number of substitutions of SO ₃ M and SO ₂ —NH—R, R represents the same meaning as described above, SO ₃ M represents a sulfonic acid group or a sulfonate, and h and i each represent h + i ≦ 4. And h ≦
3 and i = 1 to 4 is satisfied. ) And cyan dyes. Examples of the anthraquinone dye include the general formula (XII)

[0026]

[Chemical 11]

(In the formula, V and W each independently represent a hydrogen atom or an optionally substituted alkyl or aryl group, but V and W are not simultaneously hydrogen atoms. R is the same as above. Represents a meaning, SO ₃ M represents a sulfonic acid group or a sulfonate, and p and q are SO ₂ NH, respectively.
Representing the number of substitutions of R and SO ₃ M, these substituents may be the substituents of one or both aryl groups of V and W, or the substituents of the anthraquinone nucleus.
q and p each represent an integer of 0 to 2 and 1 to 3, but p
It is assumed that + q ≦ 3 is satisfied. ) Blue-green dyes and general formula (II)

[0028]

[Chemical 12]

[Wherein R represents the same meaning as described above, and n
And m is each represents the number of substitution of -SO ₂ NH-R and -SO ₃ M (the same meaning as above), these substituents are substituents of anthraquinone nucleus, m and n are each 0 It is an integer of 4 and 1 to 6, and satisfies m + n ≦ 6. ] And the like.

The above general formulas (I), (II), (IX), (X) and (X
The dyes represented by I) and (XII) are, for example, CIAcid
A dye selected from the dyes described in Color and CIDirect Color etc. is reacted with thionyl chloride in dimethylformamide to obtain the corresponding sulfonyl chloride, and then,
It can be easily produced by reacting the sulfonyl chloride with a primary amine represented by the formula RNH ₂ .

As a method for producing a black matrix using the black matrix dye of the present invention, for example, as described in JP-A-4-14001,
A method of forming a black matrix pattern by forming a positive resist pattern on a thin film obtained by containing the dye in a resin such as acrylic or polyimide, and then etching the thin film using the pattern as a mask, or , A negative or positive type containing an acrylic resin, or a negative or positive type resist composition containing a vinyl polymer, a polyimide precursor and an alkali-soluble resin such as a novolac resin, and a black matrix formed by photolithography containing the above dye. Examples include a method of forming a pattern. The latter method is preferred, and more preferred is a method of producing a black matrix by photolithography by incorporating a dye in a resist composition containing an alkali-soluble resin.

Examples of the alkali-soluble resin include polyvinyl phenol, a polyimide precursor, a vinyl polymer such as a vinylphenol copolymer, a styrene-maleic acid copolymer, a partial ester of the styrene-maleic acid copolymer, and an anhydride. Examples thereof include maleic acid-methyl methacrylate copolymer, ester of the maleic anhydride-methyl methacrylate copolymer, and novolac resin.
Examples of the novolac resin include resins obtained by condensing phenols and aldehydes, and preferable phenols include, for example, m-cresol, p-cresol, 2,5-xylenol, 3,4-xylenol, and The following formula

[0033]

[Chemical 13]

Examples thereof include compounds represented by Preferred aldehydes include, for example, formaldehyde and the like. Preferred vinyl polymers include, for example, the following formula

[0035]

[Chemical 14]

(Wherein, Q ₁ and Q ₂ each independently represent a hydrogen atom or an alkyl group, Q ₃ represents an alkyl, aryl, alkoxy, hydroxyalkyl or alkylcarbonyloxy group, and X _{1 to} X ₅ represent And each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a hydroxyl group, and at least one of X _{1 to} X ₅ is a hydroxyl group.) And the like. The alkali-soluble resins may be used alone or in combination of two or more.

Preferred quinonediazide compounds include
Examples thereof include o-naphthoquinonediazide-5- or -4-sulfonic acid ester. These esters are added as a photosensitizer to the positive resist composition for semiconductors, and the production method thereof is known. The positive resist composition for a black matrix of the present invention may further contain a crosslinking agent in addition to the dye, the alkali-soluble resin, the quinonediazide compound and the organic solvent described later. The cross-linking agent is not particularly limited as long as it cures the above alkali-soluble resin with heat or acid. Preferred cross-linking agents include, for example, the following formula — (CH ₂ ) _u OY (wherein Y represents a hydrogen atom or a lower alkyl group, and u
Represents an integer of 1 to 4. The compound etc. which have the group shown by these are mentioned. Examples of the compound having a group represented by the above formula, for example, the general formula (XIII)

[0038]

[Chemical 15]

[In the formula, Z represents —N (R ₂₆ ) (R ₂₇ ), or an optionally substituted aryl group, and R _{22 to} R ₂₇ are each independently a hydrogen atom or the above — (CH ₂ ). _u represents OY. ] The compound shown by

[0040]

[Chemical 16]

Examples thereof include compounds represented by These cross-linking agents are known compounds described in, for example, JP-A-1-293339. The crosslinking agents may be used alone or in combination of two or more. Further, the positive resist composition for black matrix may contain a photo-acid generator described later.

The negative resist composition for black matrix of the present invention further contains a photo-acid generator in addition to the dye, the alkali-soluble resin, the crosslinking agent and the organic solvent. The photo-acid generator is not particularly limited as long as it can directly or indirectly generate an acid by light, and for example,
Trihalomethyl triazine compounds described in JP-A-4-163552, disulfone compounds described in JP-A-1-57777, the formula _{Q 4 -SO 2 -SO 2 -Q 5} -SO 2 - SO ₂ -Q ₆ (wherein, Q ₄ and Q ₆ is optionally substituted independently aryl, aralkyl, alkyl, cycloalkyl or heterocyclic group, Q ₅ is an optionally substituted aryl A compound represented by the formula: JP-A-1-29
A photoacid generator containing a sulfonic acid ester group described in JP 3339, the following formula CF ₃ —SO ₂ O— (CH ₂ ) _d —Y ₀ (wherein, Y ₀ is an aryl which may be substituted). represents a group, d represents 0 or 1.) the compound represented by the following formula CF ₃ -SO ₂ O- _{[C (Y 1) (Y 2} ) ] _e -C
(O) -Y ₃ (In the formula, Y ₁ and Y ₂ each independently represent an optionally substituted aryl, alkyl or alkoxy group,
₃ represents an optionally substituted aryl group, and e is 1
Or represents 2. ), A compound represented by the formula: CF ₃ —SO ₂ O—N (Y ₄ ) —C (O) —Y ₅ (wherein Y ₄ represents an optionally substituted alkyl group, and Y ₅ is a substituted group). A compound represented by the formula: CF ₃ —SO ₂ O—N═C (Y ₆ ) (Y ₇ ), wherein Y ₆ is a hydrogen atom or is substituted. Represents an optionally substituted aryl or alkyl group, and Y ₇ represents an optionally substituted aryl group).

[0043]

[Chemical 17]

Examples include onium salts represented by:
Examples of the organic solvent include dioxane, diethylene glycol dimethyl ether, methyl cellosolve, ethyl cellosolve, propylene glycol monomethyl ether,
Ethers such as propylene glycol monoethyl ether and ethylene glycol monoisopropyl ether,
Ketones such as methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone and cyclohexanone, ethyl acetate, butyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, methyl lactate and ethyl lactate, etc. Esters, N, N-dimethylformamide and N,
Examples thereof include amides such as N-dimethylacetamide, pyrrolidones such as N-methylpyrrolidone, lactones such as γ-butyrolactone, and sulfoxides such as dimethylsulfoxide. These organic solvents may be used alone or in 2
Used as a mixture of two or more species. The amount of organic solvent in the positive and negative resist compositions is set appropriately. The preferred amounts of the dye, the alkali-soluble resin, the quinonediazide compound, the cross-linking agent and the photo-acid generator in the positive and negative resist compositions are 1 to 50, 1 to 50 and 1 to 5 in the organic solvent, respectively.
0, 0-30 and 0-30% by weight. Examples of preferable irradiation rays used for exposure include ultraviolet rays and far ultraviolet rays.

[0045]

The black matrix dye of the present invention is soluble in both an organic solvent and an alkaline developing solution. Therefore, an alkali developable black matrix positive and negative type containing an organic solvent and an alkali-soluble resin as essential components. It can be contained at a high concentration in the resist composition. Therefore, the black matrix obtained by subjecting the resist composition to UV or deep UV lithography is suitable for blocking visible light (400 to 700 nm), and the transmittance of light in the wavelength region may be 40% or less. It is possible. The black matrix of the present invention is also excellent in various properties such as fineness and heat resistance.

[0046]

EXAMPLES Next, the present invention will be described more specifically with reference to examples. In the examples, “part” means “part by weight”. The common conditions in the examples are as follows. CC coated with acrylic resin when manufacturing the black matrix
D (support) is spin-coated with a resist composition containing a black matrix dye, an alkali-soluble resin, an organic solvent, etc., and the solvent is evaporated by heating, followed by exposure through a mask [in the case of a negative type, it is necessary. After heating (180 ° C., 20 minutes), it was developed to obtain a pattern [exposure was performed by Nikon i-line exposure stepper NIKON NSR (NA = 0.50)
Went by. The developer is SOPD manufactured by Sumitomo Chemical Co., Ltd.
Alternatively, a 3% tetramethylammonium hydroxide aqueous solution was used]. Further, in the case of the positive type, the pattern was exposed on the entire surface and then heated (180 ° C., 20 minutes) to obtain a black matrix.

Example 1 The following formula

[0048]

[Chemical 18]

Acid dye represented by [Sumitomo Chemical Co., Ltd.
A mixture of Suminol Milling Yellow MR] (20 g), thionyl chloride (100 ml) and dimethylformamide (15 g) was reacted under reflux conditions for 30 minutes, and the obtained reaction mixture was poured into ice water. The deposited sulfonyl chloride was filtered, washed and dried, and then reacted with 1,5-dimethylheptylamine in tetrahydrofuran (molar ratio 1: 2) to obtain a yellow dye.

Example 2 Suminol Milling Yellow MR

[0051]

[Chemical 19]

A magenta dye was obtained in the same manner as in Example 1 except that the acid dye represented by the formula (1) was used and the reaction molar ratio was 1: 1.

Example 3 Hexamethoxymethylolated melamine (crosslinking agent) 0.3
Parts, 1 part of cresol novolac resin obtained from a mixture of m-cresol / p-cresol / formalin (molar ratio 50/50/75), the following formula

[0054]

[Chemical 20]

0.8 parts of an o-naphthoquinonediazide-5-sulfonic acid ester of a phenolic compound represented by (wherein two hydroxyl groups are esterified on average), 0.8 parts of each of the dyes obtained in Examples 1 and 2 and oleozole A mixture of 0.8 parts of Fast Blue RL [cyan dye manufactured by Taoka Chemical Co., Ltd.] and 12 parts of ethyl lactate was pressure filtered using a 0.2 μm membrane filter to obtain a black positive resist composition. The resist composition was patterned on the support to obtain a black matrix having excellent heat resistance and having a light transmittance of 40% or less in the wavelength region of 400 to 700 nm. CCDs using this black matrix were excellent in various properties such as fineness, color reproducibility and contrast.

Example 4 Suminol Milling Yellow MR

[0057]

[Chemical 21]

Acid dye represented by [Sumitomo Chemical Co., Ltd.
A black dye was obtained in the same manner as in Example 1 except for using Suminol Milling Black 8BX manufactured by Suminol.

Example 5 A black positive resist composition was prepared in the same manner as in Example 3 except that the magenta dye obtained in Example 2 and oleosol Fast Blue RL were replaced with the black dye obtained in Example 4. Obtained. The resist composition was patterned on the support to obtain a black matrix. CCDs using this black matrix were excellent in various properties such as fineness, color reproducibility and contrast.

Example 6 A black positive resist composition was obtained in the same manner as in Example 5, except that the following dyes were used instead of the black dye obtained in Example 4.

[0061]

[Chemical formula 22]

[0062]

[Chemical formula 23]

CC using these black matrices
D was excellent in various properties such as fineness, color reproducibility and contrast.

Example 7 2 parts of the yellow dye obtained in Example 1, 1 part of the cresol novolac resin used in Example 3, 0.3 part of hexamethoxymethylolated melamine, o-naphthoquinonediazide-5.
A mixture of 0.8 part of sulfonic acid ester and 12 parts of ethyl lactate was filtered through a 0.2 μm membrane filter to obtain a non-black positive resist composition. This was patterned on the support in the same manner as in Example 3. Then, 2 parts of the magenta dye obtained in Example 2, 1 part of the cresol novolac resin, 0.3 part of hexamethoxymethylolated melamine, 12 parts of ethyl lactate and the following formula

[0065]

[Chemical formula 24]

A mixture of 0.1 part of a photo-acid generator represented by
A non-black negative resist composition was obtained by filtration through a 2 μm membrane filter. This was patterned on the yellow positive type pattern to stack a magenta negative type pattern. Furthermore, 0.8 parts of oleozole fast blue RL used in Example 3, 1 part of cresol novolac resin, 0.3 parts of hexamethoxymethylolated melamine.
Part, o-naphthoquinonediazide-5-sulfonic acid ester 0.8 part and ethyl lactate 12 parts by filtration with a 0.2 μm membrane filter to obtain a non-black positive resist composition. This was patterned on the negative magenta pattern, and cyan positive patterns were stacked to obtain a black matrix. The CCD using this black matrix was excellent in various properties such as color reproducibility and contrast.

Example 8 A mixture of the compound (a) represented by Chemical formula 13 and formalin in place of the cresol novolac resin (molar ratio 0.95 / 1)
A black matrix was obtained in the same manner as in Example 7 except that a non-black negative resist composition was obtained using the novolac resin obtained from. The CCD using this black matrix was excellent in various properties such as heat resistance, color reproducibility and contrast.

Claims (19)

[Claims] 1. A dye for a black matrix, which has a sulfonamide group in which one hydrogen atom is substituted and is soluble in both an alkaline developer and an organic solvent. 2. A sulfonamide group having one hydrogen atom substituted is represented by the following formula: —SO ₂ NH—R (wherein R is alkyl, cycloalkyl, alkylcarbonylaminoalkyl, alkylcarbonylamino, cyclohexylalkyl, alkoxy, The dye for a black matrix according to claim 1, which is a group represented by an alkoxyalkyl, aryl, aralkyl or alkylcarbonyloxy group. 3. The dye for black matrix according to claim 1, which is a bis or trisazo dye. 4. A bis or trisazo dye is represented by the general formula (I) A-N = N-B-(-N = N-D-) _k- N = N-E (I). , D and E each independently represent an optionally substituted benzene ring or naphthalene ring, and k
Represents 0 or 1, but at least one of the above A, B, D and E is —SO ₂ NH—R (R is alkyl, cycloalkyl, alkylcarbonylaminoalkyl, alkylcarbonylamino, cyclohexylalkyl, alkoxy. , An alkoxyalkyl, aryl, aralkyl or alkylcarbonyloxy group) group substituted with a benzene ring or a naphthalene ring. ] The dye for black matrices according to claim 3, which is a dye represented by the formula [4]. 5. The black matrix dye according to claim 1, which is an anthraquinone dye. 6. An anthraquinone dye is represented by the general formula (II):(In the formula, R is alkyl, cycloalkyl, alkylcarl
Bonylaminoalkyl, alkylcarbonylamino, si
Chlohexyl alkyl, alkoxy, alkoxy alk
Ru, aryl, aralkyl or alkylcarbonyl
Represents an oxy group, -SO₃M is a sulfonic acid group or
Represents phonate, n and m are each -SO ₂NH-R and
And-SO₃Represents the number of substitutions of M. These substituents are
Is a substituent of an ntraquinone nucleus, m and n are each 0 to 4
And an integer of 1 to 6 and satisfying m + n ≦ 6
And ] The dye according to claim 5, which is
Dye for black matrix. 7. A dye having different colors according to claim 2
A black positive resist composition for a black matrix, containing at least one species, an alkali-soluble resin, a quinonediazide compound and an organic solvent. 8. A non-black positive resist composition for a black matrix, containing one or more of the dyes according to claim 2, an alkali-soluble resin, a quinonediazide compound and an organic solvent. 9. The positive resist composition according to claim 7, further comprising a crosslinking agent, and the quinonediazide compound is o-naphthoquinonediazidesulfonic acid ester. 10. A black negative resist composition for a black matrix, which comprises two or more kinds of dyes having different colors described in claim 2, an alkali-soluble resin, a photoacid generator, a crosslinking agent and an organic solvent. 11. A non-black negative resist composition for a black matrix, containing one or more of the dyes according to claim 2, an alkali-soluble resin, a photoacid generator, a crosslinking agent and an organic solvent. 12. A black matrix having a black film formed on a support, the black film being obtained by subjecting the black resist composition according to claim 7 or 10 to ultraviolet or deep ultraviolet lithography. A black matrix that is characterized. 13. A method for producing a black matrix having a black film, which is obtained by lithography of the black positive resist composition according to claim 7 on a support, wherein the lithography is performed on the support. After applying the black positive resist composition, drying to form an adhesion layer, exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, and developing the exposed area with an alkaline developer. A method for producing a black matrix, comprising the step of forming a black positive pattern. 14. A method for producing a black matrix having a black film, which is obtained by lithography of the black positive resist composition according to claim 9 on a support, wherein the lithography is performed on the support. After applying the black positive resist composition and drying it to form an adhesion layer, exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, heating after exposure, and exposing the exposed area to alkalinity. A method for producing a black matrix, comprising: a step of developing with a developing solution to form a black positive pattern; a step of exposing the obtained black positive pattern on the entire surface; and a step of further heating after the entire exposure. 15. A method for producing a black matrix having a black film, which is obtained by lithography of the black negative resist composition according to claim 10 on a support, wherein the lithography is performed on the support. After applying the black negative resist composition, drying to form an adhesion layer, exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, heating after exposure, and an unexposed region A method for producing a black matrix, comprising the step of developing with an alkaline developer to form a black negative pattern. 16. A black matrix comprising a support and a plurality of non-black coatings stacked on each other, wherein each of the non-black coatings is obtained by subjecting the non-black resist composition according to claim 8 or 11 to ultraviolet or deep ultraviolet lithography. A black matrix, which is obtained by 17. A method for producing a black matrix having a plurality of stacked non-black coatings obtained by lithography of the non-black positive resist composition according to claim 8 on a support, the lithography comprising: After applying the non-black positive resist composition on a support,
A step of drying to form an adhesion layer, a step of exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, a step of developing the exposed region with an alkaline developer to form a non-black positive pattern, and A method for producing a black matrix, comprising the steps of repeating the above-mentioned three steps for non-black positive resist compositions of different colors. 18. A method for producing a black matrix having a plurality of stacked non-black coatings obtained by lithography of the non-black positive resist composition according to claim 9 on a support, said lithography comprising After applying the non-black positive resist composition on a support,
A step of drying to form an adhesion layer, a step of exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, a step of heating after exposure, a step of developing an exposed area with an alkaline developer to obtain a non-black positive type A step of forming a pattern, a step of entirely exposing the obtained non-black positive type pattern, a step of further heating after the whole surface exposure, and a step of repeating the above-mentioned 6 steps for the non-black positive type resist composition of different color , Manufacturing method of black matrix. 19. A method for producing a black matrix having a plurality of stacked non-black coatings obtained by lithography of the non-black negative resist composition according to claim 11 on a support, said lithography comprising After applying the non-black negative resist composition on a support,
A step of drying to form an adhesion layer, a step of exposing a predetermined portion of the adhesion layer to ultraviolet rays or deep ultraviolet rays, a step of heating after exposure, a non-black negative type by developing an unexposed area with an alkaline developer. A method for producing a black matrix, which comprises a step of forming a pattern and a step of repeating the above three steps for a non-black negative resist composition having different colors.