JPH07254656A - Fabrication of semiconductor device - Google Patents

Fabrication of semiconductor device

Info

Publication number
JPH07254656A
JPH07254656A JP4353494A JP4353494A JPH07254656A JP H07254656 A JPH07254656 A JP H07254656A JP 4353494 A JP4353494 A JP 4353494A JP 4353494 A JP4353494 A JP 4353494A JP H07254656 A JPH07254656 A JP H07254656A
Authority
JP
Japan
Prior art keywords
stem
cap
contact
electrode
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4353494A
Other languages
Japanese (ja)
Inventor
Minoru Komatsu
稔 小松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Ltd
Hitachi Tohbu Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Tohbu Semiconductor Ltd filed Critical Hitachi Ltd
Priority to JP4353494A priority Critical patent/JPH07254656A/en
Publication of JPH07254656A publication Critical patent/JPH07254656A/en
Pending legal-status Critical Current

Links

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  • Connections Arranged To Contact A Plurality Of Conductors (AREA)

Abstract

PURPOSE:To prevent rusting of copper by bringing an electrode into contact with the flat peripheral part of a stem on the stem side and with the flange of a cap on the cap side and then sealing the stem and cap by electric welding. CONSTITUTION:A substantially rectangular electrode 1 conforming with the peripheral profile of a stem is brought into contact with the periphery of the stem 3 on the stem side and brought into contact with the flange 7a of a tubular electrode 2 conforming with the profile of a cap 7 on the cap 7 side. In this regard, the electrode 1 is prevented from coming into contact with the part 5 of the stem 3 having a copper underlying layer. The stem 3 and the cap 7 are brought into contact with each other under that state and then they are sealed by electric welding. Since the underlying material is not subjected to any machining and the electrode 1 touches the stem 3 at a flat part on the outside thereof, no discharge takes place and thereby no copper is exposed thus protecting the copper against rusting.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置の製造方法に
かかわり、特に金属材料によって半導体素子を封止する
ものに適用して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a semiconductor device, and more particularly to a technique effective when applied to a method of sealing a semiconductor element with a metal material.

【0002】[0002]

【従来の技術】半導体装置の封止方法のうち、一般的に
金属のステムとキャップを使用するキャンタイプにおい
ては、電気溶接によって封止する。このようなもののう
ちチップを搭載するステムに熱伝導効率を良くするため
に一度ステムに穴を空け、銅板あるいはモリブデンを嵌
め込み、さらにその上にニッケルめっきを施したものを
使用するものがある。このようなものを示したものとし
て「表面実装型LSIパッケージの実装技術と信頼性向
上」1988年11月16日刊、応用技術出版発行、村
上元監修、4頁から8頁がある。
2. Description of the Related Art Among semiconductor device sealing methods, the can type, which generally uses a metal stem and a cap, is sealed by electric welding. Among these, there is one in which a hole is once bored in the stem, a copper plate or molybdenum is fitted, and a nickel plating is further applied on the stem to improve heat conduction efficiency in the stem on which the chip is mounted. Examples of such products are "Mounting Technology and Reliability Improvement of Surface Mount LSI Package" published on November 16, 1988, published by Applied Technology Publishing, supervised by Moto Murakami, pages 4 to 8.

【0003】[0003]

【発明が解決しようとする課題】前記公知例には記述さ
れていないが、本発明者による検討の結果、上記したよ
うな技術においては、ステムの中央部に穴を空け、さら
に銅板等の別の材料を埋め込むため、ステムの中央部の
平坦度が低下するという問題があることが判った。この
ような平坦度の低下は封止時に電極とステムとの間に非
接触部分を生じ、平坦度の悪いステムの中央部と電極間
に非接触部分があると、封止時に放電が発生し、ステム
上に形成されたニッケルメッキをつぶし銅等の埋め込ん
だ材料が露出してさびが発生してしまい、不良となるこ
とがあるという課題となる。
Although not described in the above-mentioned publicly known example, as a result of examination by the present inventor, in the technique described above, a hole is formed in the central portion of the stem, and a copper plate or the like is used. It was found that there is a problem that the flatness of the central part of the stem is lowered because the material of (1) is embedded. Such a decrease in flatness causes a non-contact portion between the electrode and the stem during sealing, and if there is a non-contact portion between the center of the stem and the electrode, which has poor flatness, discharge occurs during sealing. The problem is that the nickel plating formed on the stem is crushed and the embedded material such as copper is exposed to generate rust, which may cause a defect.

【0004】本願発明の目的は、上記したような課題を
解決し、銅のさびの発生しないキャンタイプの半導体装
置を提供することにある。
An object of the present invention is to solve the above problems and to provide a can type semiconductor device in which copper rust does not occur.

【0005】[0005]

【課題を解決するための手段】本願において開示される
発明のうち代表的な手段について説明すれば下記のとお
りである。
The typical means of the invention disclosed in the present application will be described below.

【0006】すなわち所望の位置に半導体素子が取付け
られた略矩形状のステムと円筒形のキャップを電気溶接
により接続封止するにおいて、前記ステム側においては
電極をほぼステムの周縁部の平坦度の良好な部分に接触
させ、キャップ側においてはキャップのつばに接触さ
せ、電気溶接によって封止するものである。
That is, in connecting and sealing a substantially rectangular stem having a semiconductor element mounted at a desired position and a cylindrical cap by electric welding, the electrode is substantially flat on the periphery of the stem on the side of the stem. A good part is brought into contact with the brim of the cap on the side of the cap, and sealing is performed by electric welding.

【0007】[0007]

【作用】上記した手段によれば、溶接封止時の電極がス
テムの平坦度の良いところと接触するため、非接触部が
なく放電が発生しない。そのためメッキがつぶれず、め
っき下の銅等の材料が露出しないため、さびが発生しな
い。
According to the above-mentioned means, since the electrode at the time of welding and sealing comes into contact with the portion of the stem having good flatness, there is no non-contact portion and no discharge occurs. Therefore, the plating does not collapse, and the material such as copper under the plating is not exposed, so that rust does not occur.

【0008】[0008]

【実施例】図1は本願発明の実施例である封止方法を説
明するための概略斜視図であり、図2は封止時の電極の
接触状況を説明するための一部断面側面図である。
1 is a schematic perspective view for explaining a sealing method according to an embodiment of the present invention, and FIG. 2 is a partial sectional side view for explaining a contact state of electrodes during sealing. is there.

【0009】図1に示したように、本願において対象と
なる半導体装置は、金属のステムおよびキャップにて半
導体素子を封止するキャンタイプの半導体装置で、例え
ばTO−3Pタイプのものである。
As shown in FIG. 1, the semiconductor device of interest in the present application is a can type semiconductor device in which a semiconductor element is sealed with a metal stem and a cap, for example, a TO-3P type.

【0010】本実施例において使用されるステム3は鉄
系の材料からなり、略矩形状をなしている。中央部には
穴が空けられた後、熱伝導効率を向上させるため銅板5
が埋めこまれその上面をニッケルによってめっきされて
いる。前記銅板5が埋め込まれている部分の両側には外
部リード4がガラス材にてステム5を貫通して取り付け
られている。図示しないがキャップ取付け面には半導体
素子が取り付けられており、各リード4とワイヤにより
接続されている。
The stem 3 used in this embodiment is made of an iron material and has a substantially rectangular shape. After making a hole in the center, copper plate 5 is used to improve the heat transfer efficiency.
Is embedded and its upper surface is plated with nickel. External leads 4 are attached to both sides of the portion where the copper plate 5 is embedded by penetrating the stem 5 with a glass material. Although not shown, a semiconductor element is attached to the cap attachment surface and is connected to each lead 4 by a wire.

【0011】キャップ7は円筒型をなし、封止のための
つば7aを持ち、鉄により形成されている。
The cap 7 has a cylindrical shape, has a collar 7a for sealing, and is made of iron.

【0012】本実施例における電極1はステム側であ
り、ステム5の略矩形状の周縁外形にあわせ、略矩形状
に形成されている。キャップ側の電極2はキャップ5の
外形およびつばにあわせ、円形を成している。
The electrode 1 in this embodiment is on the stem side, and is formed in a substantially rectangular shape so as to match the outer peripheral shape of the substantially rectangular shape of the stem 5. The electrode 2 on the cap side has a circular shape according to the outer shape and the collar of the cap 5.

【0013】次ぎに封止時について説明する。本実施例
では、まず上記半導体素子が取り付けられ、さらにリー
ドとのワイヤボンディングの終了した略矩形状のステム
5とキャップ7を用意する。
Next, the sealing will be described. In this embodiment, first, the semiconductor element is attached, and the substantially rectangular stem 5 and the cap 7 which have been wire-bonded to the leads are prepared.

【0014】次に図示しない位置決め治具により位置決
めし、キャップ7側はキャップ形状に対応した円筒型の
電極2をつば7aに接触させ、ステム3側はステムの周
縁形状に合わせた略矩形状の電極1をステム3の周縁に
接触させる。このとき下地が銅で形成されているステム
3の部分5には電極1が接触しないようになっている。
この状態でキャップ7およびステム3を接触させ、電流
を流し電気溶接にてキャップ7およびステム3を接続封
止する。
Next, positioning is carried out by a positioning jig (not shown), the cylindrical electrode 2 corresponding to the cap shape is brought into contact with the collar 7a on the cap 7 side, and the stem 3 side is of a substantially rectangular shape conforming to the peripheral shape of the stem. The electrode 1 is brought into contact with the peripheral edge of the stem 3. At this time, the electrode 1 does not come into contact with the portion 5 of the stem 3 whose base is made of copper.
In this state, the cap 7 and the stem 3 are brought into contact with each other, an electric current is caused to flow, and the cap 7 and the stem 3 are connected and sealed by electric welding.

【0015】この際、ステム3側の電極1はステム3の
外側でめっき下の材料が特に加工されていないために平
坦度の高い部分で接触するため、放電は発生しない。
At this time, since the electrode 1 on the side of the stem 3 is in contact with the outside of the stem 3 at a portion having a high flatness because the material under plating is not specially processed, no discharge occurs.

【0016】以上、本願における発明を本願の背景とな
った技術に基づいて説明したが、本願は上記実施例に限
定されることなく、その技術を逸脱しない範囲において
種々変形可能であることはいうまでもない。
Although the invention of the present application has been described above based on the technique which is the background of the present application, the present application is not limited to the above-described embodiments, and various modifications can be made without departing from the technique. There is no end.

【0017】すなわち本実施例では略矩形状の電極を用
いるものについて説明したが、ステム形状に合わせて他
の形状にしてもかまわない。ステムの各種形状に合わせ
種々変更できる。またステムに埋め込む材料は銅でなく
モリブデンのようなもの伝導効率の高いものを使用する
ものにも適用できる。
That is, in this embodiment, the electrode using the substantially rectangular electrode has been described, but other shapes may be adopted depending on the shape of the stem. Various changes can be made according to various shapes of the stem. The material to be embedded in the stem is not limited to copper but may be molybdenum or the like, which has high conductivity.

【0018】[0018]

【発明の効果】本願において開示される発明のうち、代
表的なものの効果について説明すれば下記のとおりであ
る。
The effects of typical ones of the inventions disclosed in this application will be described below.

【0019】すなわち平坦度の高いステム部分に電極を
接触させ、電極との間に非接触部がないため放電が発生
せず、銅が露出しないのでさびの発生しない半導体装置
が提供できる。
That is, the electrode is brought into contact with the stem portion having high flatness, and since there is no non-contact portion between the electrode and the electrode, discharge is not generated and copper is not exposed, so that a semiconductor device in which rust is not generated can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本願発明の実施例である封止方法を説明するた
めの概略斜視図。
FIG. 1 is a schematic perspective view for explaining a sealing method that is an embodiment of the present invention.

【図2】封止時の電極の接触状況を説明するための一部
断面側面図。
FIG. 2 is a partial cross-sectional side view for explaining a contact state of electrodes at the time of sealing.

【符号の説明】[Explanation of symbols]

1..電極(ステム側) 2..電極(キャップ側) 3..ステム 4..リード 5..銅板 6..穴 7..キャップ 7a..つば 1. . Electrode (stem side) 2. . Electrode (cap side) 3. . Stem 4. . Lead 5. . Copper plate 6. . Hole 7. . Cap 7a. . Brim

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ステム上の所望の位置に取り付けられた半
導体素子をキャップにて覆い、ステムとキャップを電気
溶接によって接続し、前記半導体素子を封止する半導体
装置の製造方法において、前記ステム側はステムの平坦
度の良好な部分に接触させ、キャップ側においてはキャ
ップの外側のつばに接触させ、電気溶接によって接続封
止することを特徴とする半導体装置の製造方法。
1. A method of manufacturing a semiconductor device, wherein a semiconductor element attached at a desired position on a stem is covered with a cap, the stem and the cap are connected by electric welding, and the semiconductor element is sealed. Is in contact with a portion of the stem having good flatness, and is in contact with an outer flange of the cap on the cap side, and is connected and sealed by electric welding.
【請求項2】ステム上の所望の位置に取り付けられた半
導体素子をつばを有するキャップにて覆い、ステムとキ
ャップを電気溶接によって接続し、前記半導体素子を封
止する半導体装置の製造方法において、前記ステム側に
おいては電極をほぼステムの周縁に接触させ、キャップ
側においてはキャップのつばに接触させ、電気溶接によ
って接続封止することを特徴とする半導体装置の製造方
法。
2. A method of manufacturing a semiconductor device, wherein a semiconductor element attached at a desired position on a stem is covered with a cap having a collar, the stem and the cap are connected by electric welding, and the semiconductor element is sealed. A method for manufacturing a semiconductor device, wherein the electrode is brought into contact with substantially the peripheral edge of the stem on the stem side, and is brought into contact with the brim of the cap on the cap side, and is connected and sealed by electric welding.
JP4353494A 1994-03-15 1994-03-15 Fabrication of semiconductor device Pending JPH07254656A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4353494A JPH07254656A (en) 1994-03-15 1994-03-15 Fabrication of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4353494A JPH07254656A (en) 1994-03-15 1994-03-15 Fabrication of semiconductor device

Publications (1)

Publication Number Publication Date
JPH07254656A true JPH07254656A (en) 1995-10-03

Family

ID=12666410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4353494A Pending JPH07254656A (en) 1994-03-15 1994-03-15 Fabrication of semiconductor device

Country Status (1)

Country Link
JP (1) JPH07254656A (en)

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