JPH07254307A - Conductive polymeric composition - Google Patents

Conductive polymeric composition

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Publication number
JPH07254307A
JPH07254307A JP1984595A JP1984595A JPH07254307A JP H07254307 A JPH07254307 A JP H07254307A JP 1984595 A JP1984595 A JP 1984595A JP 1984595 A JP1984595 A JP 1984595A JP H07254307 A JPH07254307 A JP H07254307A
Authority
JP
Japan
Prior art keywords
doping
solvent
silicon
compound
dopant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1984595A
Other languages
Japanese (ja)
Inventor
Motoo Fukushima
基夫 福島
Mikio Aramata
幹夫 荒又
Shigeru Mori
滋 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP1984595A priority Critical patent/JPH07254307A/en
Publication of JPH07254307A publication Critical patent/JPH07254307A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To provide high moldability and electrical conductivity by doping an oxidizing dopant into a high molecular compound containing silicon blended with an amine compound. CONSTITUTION:A high molecular compound containing silicon and an amine compound are dissolved and mixed in a solvent ensuring the the solubility thereof and, then, molded, while the solvent being vaporized. Furthermore, the mixed compounds are molded, while the solvent being rotated at high speed, thereby providing a thin film and electrically conductive material. Also, the compounds after mixed are shelved at room temperature and kept in standing state in dry environment and fed with a dopant. As a result, the high molecular compound containing silicon, regardless of the inherent insulating quality thereof, is improved in terms of electrical conductivity, when doped with an oxidizing dopant. At the same time, a material held in stable state can be provided.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、賦形性に優れた高導電
の導電性重合体組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a highly conductive conductive polymer composition having excellent shapeability.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】近年、
ポリアセチレンに電子受容性物質あるいは電子供与性物
質をドーピングすると電荷移動形成反応が起こり、電子
伝導に基づく高い電気伝導性が発現することが見い出さ
れてから、導電性有機高分子化合物が注目を浴びてい
る。こうした有機高分子化合物の代表例としては、ポリ
アセチレン、ポリフェニレン、ポリピロール、ポリフェ
ニレンビニレン、ポリアニリン、ポリチオフェン等が挙
げられる。
2. Description of the Related Art In recent years,
Conducting organic polymer compounds have attracted attention since it has been found that when polyacetylene is doped with an electron-accepting substance or an electron-donating substance, a charge-transfer formation reaction occurs and high electrical conductivity based on electron conduction is expressed. There is. Representative examples of such organic polymer compounds include polyacetylene, polyphenylene, polypyrrole, polyphenylene vinylene, polyaniline, polythiophene and the like.

【0003】しかし、これらの高分子化合物は、不溶不
融のため賦形性に乏しかったり、気相重合法や電解重合
法による生成フィルムの形状が反応容器や電極の形状に
より制約されたり、ドーピング時により著しい劣化を伴
ったりして、実用上の障害になっていた。
However, these polymer compounds have poor shapeability because they are insoluble and infusible, the shape of the film produced by the gas phase polymerization method or the electrolytic polymerization method is restricted by the shape of the reaction vessel or the electrode, and the doping. At times, it was accompanied by significant deterioration, which was a practical obstacle.

【0004】一方、ポリシランは、炭素に比べてそのケ
イ素のもつ金属性と電子非局在性、高い耐熱性と柔軟
性、良好な薄膜形成特性から非常に興味深いポリマーで
あるが、高導電のものは殆んど知られていなかった。わ
ずかに、Westらはポリシラスチレン系の高分子化合
物をSbF5,AsF5等のフッ素化合物でドーピングす
ることで、高導電の高分子化合物を得ているが、毒性も
強く取り扱いも煩雑なドーパントが必要であった(R.
West,et.al.,J.Am.Chem.So
c.,103,7352(1981))。
On the other hand, polysilane is a polymer which is very interesting in comparison with carbon because of its metallicity and electron delocalization of silicon, high heat resistance and flexibility, and good thin film forming characteristics. Was almost unknown. Slightly, West et al. By doping the polymer compound of polysilastyrene system with SbF 5, AsF fluorine compounds such as 5, but to obtain a polymer compound of high conductivity, high toxicity handle even complicated dopant Was required (R.
West, et. al. J. Am. Chem. So
c. , 103, 7352 (1981)).

【0005】このため、より安全で取り扱いの易しいヨ
ウ素や塩化第二鉄でドーピングすることが望まれていた
が、必ずしも満足のいく高導電の導電性高分子化合物は
得られていない。
For this reason, it has been desired to dope with iodine or ferric chloride, which is safer and easier to handle, but a satisfactory high-conductivity conductive polymer compound has not always been obtained.

【0006】本発明は、こうした欠点を克服するために
なされたもので、賦形性に優れ、ヨウ素や塩化第二鉄等
の酸化性ドーパントでドーピングすることで高導電を与
える導電性重合体組成物を提供することを目的とする。
The present invention has been made in order to overcome these drawbacks, and is a conductive polymer composition having excellent shapeability and giving high conductivity by doping with an oxidizing dopant such as iodine or ferric chloride. The purpose is to provide things.

【0007】[0007]

【課題を解決するための手段及び作用】本発明者らは、
上記目的を達成するため鋭意検討を行った結果、アミン
化合物を配合したケイ素含有高分子化合物は、溶剤可溶
で、任意の形状のフィルムや塗膜に賦形でき、かつ酸化
性ドーパントをドーピングすることにより導電性が著し
く向上し、かつドーピング後も脆化することもなく可撓
性を維持する高導電性重合体が得られることを見い出し
たものである。そして、本発明により得られるアミン化
合物を配合したケイ素含有高分子化合物にドーピングし
た組成物は、賦形性に優れる高導電性フィルムあるいは
塗膜を容易に得ることができ、バッテリー電極、太陽電
池、電磁シールド用筺体等に応用可能な有用な素材で、
電気、電子、通信分野に広く用いられることを知見し、
本発明をなすに至った。
Means and Actions for Solving the Problems The present inventors have
As a result of intensive studies to achieve the above object, a silicon-containing polymer compound containing an amine compound is soluble in a solvent, can be formed into a film or coating film of any shape, and is doped with an oxidizing dopant. It has been found that, by doing so, a highly conductive polymer is obtained in which the conductivity is remarkably improved and the flexibility is maintained without becoming brittle after doping. Then, the composition obtained by doping the silicon-containing polymer compound containing the amine compound obtained by the present invention can easily obtain a highly conductive film or coating film having excellent shapeability, battery electrode, solar cell, It is a useful material that can be applied to the housing for electromagnetic shield, etc.
Knowing that it is widely used in the fields of electricity, electronics, and communication,
The present invention has been completed.

【0008】以下、本発明につき更に詳しく説明する
と、本発明の導電性重合体組成物は、アミン化合物を配
合したケイ素含有高分子化合物に酸化性ドーパントをド
ーピングしてなるものである。
The present invention will be described in more detail below. The conductive polymer composition of the present invention is obtained by doping a silicon-containing polymer compound containing an amine compound with an oxidizing dopant.

【0009】ここで、ケイ素含有高分子化合物として
は、特に主鎖にSi−Si結合を持つもの又は主鎖にS
i−Si結合とC−C多重結合を持つものが好ましく、
より具体的には、ポリシラン類、ポリ(ジシラニレンフ
ェニレン)類、ポリ(ジシラニレンエチニレン)類等の
高分子化合物が挙げられる。
Here, as the silicon-containing polymer compound, one having a Si-Si bond in the main chain or S in the main chain is particularly preferable.
Those having an i-Si bond and a C-C multiple bond are preferable,
More specifically, polymer compounds such as polysilanes, poly (disilanylene phenylene) s, and poly (disilanylene ethynylene) s can be mentioned.

【0010】この場合、ポリシラン類は一般式(1)又
は(2)で表わされるもの、ポリ(ジシラニレンフェニ
レン)類、ポリ(ジシラニレンエチニレン)類は一般式
(3)で表わされるものが好適に用いられる。 (R12Si)n …(1) (R12Si)n(R34Si)m …(2) 〔(R12Si) −A−(R34Si) m …(3)
In this case, the polysilanes are represented by the general formula (1) or
Is represented by (2), poly (disilanylene phenyl)
Lens) and poly (disilanylene ethynylene) s have the general formula
Those represented by (3) are preferably used. (R1R2Si)n … (1) (R1R2Si)n(R3RFourSi)m … (2) [(R1R2Si) -A- (R3RFourSi) ]m … (3)

【0011】但し、R1〜R4はそれぞれ水素原子又は非
置換又は置換の炭素数1〜14、特に1〜10の一価炭
化水素基で、メチル、エチル、プロピル、ヘキシルなど
のアルキル基、フェニル基などのアリール基、アルキル
置換フェニル基などの置換アリール基、シクロヘキシル
などのシクロアルキル基等が挙げられる。なお、R1
4は互に同一でも異なっていてもよい。
However, R 1 to R 4 are each a hydrogen atom or an unsubstituted or substituted monovalent hydrocarbon group having 1 to 14 carbon atoms, particularly 1 to 10 carbon atoms, and an alkyl group such as methyl, ethyl, propyl or hexyl, Examples thereof include an aryl group such as a phenyl group, a substituted aryl group such as an alkyl-substituted phenyl group, and a cycloalkyl group such as cyclohexyl. In addition, R 1 ~
R 4 may be the same or different from each other.

【0012】また、Aはオルソ、メタ又はパラ位置換の
フェニレン基(−C64−),アセチレン基(−C≡C
−)又はこれらの基が複数個結合したもの(例えば、−
C≡C−C64−C≡C−など)を示す。
Further, A is ortho, meta or para position substituent of the phenylene group (-C 6 H 4 -), an acetylene group (-C≡C
-) Or a combination of a plurality of these groups (for example,-
C≡C—C 6 H 4 —C≡C—, etc.).

【0013】更に、nは2以上の整数、好ましくは10
〜1,000,000、より好ましくは50〜500,
000であり、mは1以上の整数、好ましくは1〜1,
000,000、より好ましくは50〜500,000
であり、上記ケイ素含有高分子化合物の数平均分子量は
通常300〜30,000,000の範囲、特に1,5
00〜1,500,000の範囲であることが好まし
い。
Further, n is an integer of 2 or more, preferably 10
~ 1,000,000, more preferably 50-500,
000 and m is an integer of 1 or more, preferably 1 to 1,
, 000,000, more preferably 50 to 500,000
And the number average molecular weight of the silicon-containing polymer compound is usually in the range of 300 to 30,000,000, particularly 1,5.
It is preferably in the range of 00 to 1,500,000.

【0014】なお、上記ケイ素含有高分子化合物は公知
の方法によって合成し得、例えば相当するジクロロシラ
ン等をアルカリ金属によるウルツ型の縮合反応すること
で容易に製造することができる。
The silicon-containing polymer compound can be synthesized by a known method, and can be easily produced, for example, by subjecting the corresponding dichlorosilane or the like to a wurtz-type condensation reaction with an alkali metal.

【0015】一方、アミン化合物としては、下記一般式
(4)又は(5)のものが好適に用いられる。 NR567 …(4) R89N−R10−NR1112 …(5)
On the other hand, as the amine compound, those having the following general formula (4) or (5) are preferably used. NR 5 R 6 R 7 (4) R 8 R 9 N-R 10 -NR 11 R 12 (5)

【0016】但し、R5〜R9及びR1112はそれぞれ水
素原子又は炭素数1〜24、特に1〜20の一価有機基
であり、具体的には、メチル、エチル、プロピル、ヘキ
シルなどのアルキル基、フェニル基などのアリール基、
アルキル置換フェニル基などの置換アリール基、ベンジ
ル、フェネチルなどのアラルキル基、シクロヘキシルな
どのシクロアルキル基等の非置換又は置換一価炭化水素
基や=N−N=結合を介在する非置換又は置換一価炭化
水素基などが挙げられる。なお、R5〜R7及びR8
9,R11,R12は互に同一でも異なっていてもよい。
However, R 5 to R 9 and R 11 R 12 are each a hydrogen atom or a monovalent organic group having 1 to 24 carbon atoms, particularly 1 to 20 carbon atoms, and specifically, methyl, ethyl, propyl and hexyl. Alkyl groups such as, aryl groups such as phenyl groups,
A substituted aryl group such as an alkyl-substituted phenyl group, an aralkyl group such as benzyl or phenethyl, an unsubstituted or substituted monovalent hydrocarbon group such as a cycloalkyl group such as cyclohexyl, or an NN-bond-unsubstituted or substituted monovalent hydrocarbon group. Examples thereof include a valent hydrocarbon group. In addition, R 5 to R 7 and R 8 ,
R 9 , R 11 and R 12 may be the same or different from each other.

【0017】また、R10は炭素数1〜24、特に1〜2
0の二価の炭化水素基で、メチレン、エチレンなどの炭
素数1〜8、特に1〜6のアルキレン基やシクロアルキ
レン基、フェニレンなどの炭素数6〜12のアリーレン
基、アルキレン基、シクロアルキレン基間にアリーレン
基が介在する基、アリーレン基間にアルキレン基、シク
ロアルキレン基が介在する基などが例示される。
R 10 has 1 to 24 carbon atoms, especially 1 to 2 carbon atoms.
A divalent hydrocarbon group of 0, an alkylene group or a cycloalkylene group having 1 to 8 carbon atoms, such as methylene or ethylene, or a cycloalkylene group having 1 to 6 carbon atoms, an arylene group having 6 to 12 carbon atoms such as phenylene, an alkylene group or a cycloalkylene. Examples thereof include a group in which an arylene group is present between the groups, and an group in which an alkylene group and a cycloalkylene group are interposed between the arylene groups.

【0018】上記アミン化合物としては、特にケイ素含
有高分子化合物との混和性等の点から3級アミンが望ま
しい。また、トリフェニルアミンや、下記式で示される
ようなアリールアミン、アミノ基置換ビニル化合物、ア
ミノ基置換ヒドラゾン化合物などの芳香環を有するもの
も有効に用いられる。
As the amine compound, a tertiary amine is particularly preferable from the viewpoint of miscibility with a silicon-containing polymer compound. Further, those having an aromatic ring such as triphenylamine, an arylamine represented by the following formula, an amino group-substituted vinyl compound, and an amino group-substituted hydrazone compound are also effectively used.

【0019】[0019]

【化1】 [Chemical 1]

【0020】上記アミン化合物の配合量は、アミン化合
物の種類とケイ素含有高分子化合物の種類によって異な
るが、ケイ素含有高分子化合物100重量部に対し1〜
200重量部、より望ましくは5〜100重量部がよ
く、この量より少量の添加では、ドーピングを行ったと
きの導電率の向上効果が十分でなく、またこれ以上の添
加でも導電率の向上効果よりも成膜性の悪化という負の
効果が現われる。
The compounding amount of the above amine compound varies depending on the kind of the amine compound and the kind of the silicon-containing polymer compound, but is 1 to 100 parts by weight of the silicon-containing polymer compound.
200 parts by weight, more preferably 5 to 100 parts by weight is preferable, and if the amount is smaller than this amount, the effect of improving the conductivity when doping is not sufficient, and the addition of more than this amount has the effect of improving the conductivity. The negative effect is that the film-forming property deteriorates.

【0021】ケイ素含有高分子化合物とアミン化合物の
混合方法は、それぞれを配合して機械的に混練したり、
より均一な混合を望む場合は、必要に応じて両者可溶の
溶媒に溶解させて混合後、溶媒を蒸発させながら成型し
たりする方法を採用することができる。特に薄膜の導電
材料を得るためには、この溶媒を高速で回転させながら
成型するスピンコート法が好適に用いられる。
The silicon-containing polymer compound and the amine compound can be mixed by mechanically kneading them,
When more uniform mixing is desired, a method of dissolving the both in a solvent in which both are soluble and mixing and then molding while evaporating the solvent can be adopted as necessary. In particular, in order to obtain a thin film conductive material, a spin coating method in which this solvent is molded while rotating at high speed is preferably used.

【0022】この場合、溶媒の例としては、ベンゼン、
トルエン、キシレンなどの芳香族系炭化水素、テトラヒ
ドロフラン、ジブチルエーテルなどのエーテル系溶剤が
好適に用いられる。また、ケイ素含有高分子化合物とア
ミン化合物の混合後、しばらく乾燥雰囲気下で静置する
(ねかせ)とか、40〜60℃程度の温度下に放置(エ
ージング)することも効果的である。なお、ケイ素含有
高分子化合物とアミン化合物の混合後、室温で3〜20
日程度放置し、その後、ドーピングを行うことによって
導電率を改良することができる。この場合、温度を上げ
ることによって放置時間は短縮されるが、150℃以上
に上げるのはポリマーの劣化が起こり、好ましくない。
In this case, examples of the solvent include benzene and
Aromatic hydrocarbons such as toluene and xylene, and ether solvents such as tetrahydrofuran and dibutyl ether are preferably used. After mixing the silicon-containing polymer compound and the amine compound, it is also effective to leave them in a dry atmosphere for a while (nesk) or leave them at a temperature of about 40 to 60 ° C. (aging). It should be noted that, after mixing the silicon-containing polymer compound and the amine compound, the mixture is mixed at room temperature for 3 to 20 minutes.
The conductivity can be improved by leaving it for about a day and then performing doping. In this case, the standing time is shortened by raising the temperature, but it is not preferable to raise it to 150 ° C. or higher because the polymer is deteriorated.

【0023】本発明においては、このようにアミン化合
物を配合したケイ素含有高分子化合物に酸化性ドーパン
トをドーピングする。即ち、ケイ素含有高分子化合物
は、一般にそのままでは絶縁体で、ヨウ素、硫酸やSb
5,AsF5等のフッ素化合物をドーピングすれば導電
性ポリマーになるということは既に知られていたが、導
電性は十分でなく、本発明に従ったアミン化合物添加の
ケイ素含有高分子化合物を酸化性ドーパントでドーピン
グすることにより、良好な導電率を安定に保持した材料
を得ることができる。なお、横山らにより、こうしたア
ミン化合物をポリシランに配合してホール移動度を測定
した例(M.Yokoyama et al.,J.
C.S.,Chem.Common.,1990,80
2:M.Stolka et al.,Synth.M
etal.,54,(1)417)は報告があるが、そ
こではドーピングによる導電性の向上には何ら言及して
いない。
In the present invention, the silicon-containing polymer compound containing the amine compound is doped with an oxidizing dopant. That is, the silicon-containing polymer compound is generally an insulator as it is, and iodine, sulfuric acid or Sb
It has already been known that doping with a fluorine compound such as F 5 or AsF 5 results in a conductive polymer, but the conductivity is not sufficient, and the amine compound-added silicon-containing polymer compound according to the present invention is used. By doping with an oxidative dopant, it is possible to obtain a material in which good conductivity is stably maintained. An example in which such an amine compound is blended with polysilane and the hole mobility is measured by Yokoyama et al. (M. Yokoyama et al., J.
C. S. Chem. Common. , 1990, 80
2: M.I. Stolka et al. , Synth. M
et al. , 54, (1) 417), but there is no mention of improving conductivity by doping.

【0024】上記アミン化合物添加のケイ素含有高分子
化合物を導電化するための酸化性ドーパントとしては、
塩素、臭素、ヨウ素のようなハロゲン類、塩化スズ、塩
化第二鉄のような遷移金属塩化物、五フッ化アンチモ
ン、五フッ化砒素のようなルイス酸などが有効である
が、安全で取り扱いの易しいヨウ素や塩化第二鉄でドー
ピングすることが特に望ましい。ドーピングする方法と
しては、(1)ヨウ素や塩化第二鉄の蒸気雰囲気下にさ
らすいわゆる気相(あるいは乾式)ドーピング、(2)
ヨウ素や塩化第二鉄を不活性溶媒中に溶解した溶液中に
当ポリマーを浸漬する湿式ドーピング、(3)ヨウ素や
塩化第二鉄を溶解した溶液中に当ポリマーが溶解する場
合、当溶液から乾式成膜することによりフィルムあるい
は塗膜に賦形すると同時にドーピングする同時ドーピン
グが用いられる。
As the oxidative dopant for making the silicon-containing polymer compound added with the amine compound conductive,
Halogen such as chlorine, bromine, iodine, tin chloride, transition metal chlorides such as ferric chloride, antimony pentafluoride, Lewis acid such as arsenic pentafluoride are effective, but safe and handle Doping with iodine or ferric chloride, which is easy to do, is particularly desirable. The doping method includes (1) so-called vapor-phase (or dry-type) doping in which it is exposed to a vapor atmosphere of iodine or ferric chloride, (2)
Wet doping in which the polymer is immersed in a solution in which iodine or ferric chloride is dissolved in an inert solvent, (3) When the polymer is dissolved in a solution in which iodine or ferric chloride is dissolved, Co-doping is used in which a film or coating film is formed by dry film formation and simultaneously doped.

【0025】(2)、(3)の湿式ドーピングに用いら
れる不活性溶媒は、ヨウ素や塩化第二鉄と反応して電子
受容性化合物としての能力を失活させない溶媒である。
かかるものとして、ヘキサン、オクタン、シクロヘキサ
ンのような炭化水素類、トルエン、キシレン、ニトロベ
ンゼンのような芳香族類、エーテル、テトラヒドロフラ
ンのようなエーテル類、ジメチルホルムアミド、ジメチ
ルスルホキシド、ヘキサメチルホスホリックトリアミド
ような非プロトン性極性溶媒、その他、ニトロメタン、
アセトニトリル等が挙げられる。
The inert solvent used in the wet doping of (2) and (3) is a solvent which does not deactivate the ability as an electron-accepting compound by reacting with iodine or ferric chloride.
As such, hydrocarbons such as hexane, octane and cyclohexane, aromatics such as toluene, xylene and nitrobenzene, ethers, ethers such as tetrahydrofuran, dimethylformamide, dimethylsulfoxide and hexamethylphosphoric triamide. Aprotic polar solvent, other, nitromethane,
Acetonitrile etc. are mentioned.

【0026】なかでも、テトラヒドロフランのような溶
媒は、上記ケイ素含有高分子化合物を非常によく溶解す
るため、特に同時ドーピングに用いることが好適であ
る。この方法は、ドーパントを含む溶液にポリマーを溶
解し、この溶液をキャスティング後、乾燥することで、
ドーピングされた導電体を得ることができるものであ
る。なお、乾燥温度は、通常0〜150℃で常圧又は減
圧で行うことが好ましい。
Among them, a solvent such as tetrahydrofuran dissolves the above-mentioned silicon-containing polymer compound very well, and is therefore preferably used for co-doping. In this method, a polymer is dissolved in a solution containing a dopant, the solution is cast, and then dried,
It is possible to obtain a doped conductor. The drying temperature is usually 0 to 150 ° C. and normal pressure or reduced pressure is preferable.

【0027】ただ、湿式法ではしばしばポリマーがドー
パントにより劣化し、ゲル化や分解する場合がある。か
かる場合、(1)の気相ドーピングは溶剤も使用せず、
操作も簡単で高導電性が得られるため、特に有用であ
る。
However, in the wet method, the polymer is often deteriorated by the dopant and may be gelated or decomposed. In such a case, the gas phase doping of (1) does not use a solvent,
It is particularly useful because the operation is simple and high conductivity can be obtained.

【0028】この気相ドーピングでは、ドーパント雰囲
気の温度とドーパント分圧を制御することによりドーピ
ング速度をコントロールすることができる。一般に温度
は−30〜200℃の範囲で行うことが好ましい。それ
より低温ではドーピング速度が遅く、またそれより高温
ではドーピング時にポリマーの劣化を招き、好ましくな
い。ドーパント分圧は、0.001mmHg〜3800
mmHgの範囲で行うことが好ましい。それより低圧で
はドーピング速度が遅く、またそれより高圧では圧力を
増してもドーピング速度は増加しない。なお、ヨウ素に
おいては、常温、常圧で速やかにドーピングが進むが、
塩化第二鉄の場合、蒸気圧が低いためヨウ素とは異なっ
たドーピングの条件となる。塩化第二鉄ドーピングは一
般に温度50〜300℃の範囲で行うことが好ましい。
それより低温ではドーピング速度が遅く、またそれより
高温ではドーピング時にポリマーの劣化を招き、好まし
くない。また、ドーピングは0.001mmHg〜76
0mmHgの範囲で行うことが好ましい。それより低圧
ではその圧力に達するまでに長時間かかり、経済的では
なく、またそれより高圧では塩化第二鉄が常圧で319
℃という沸点を持っているためドーピング速度は非常に
遅い。塩化第二鉄のドーパント分圧は、ポリマーの導電
率を効果的に上げるため、より好ましくは0.1〜10
mmHgの圧力であり、また温度50〜200℃の範囲
でドーピングを行うことが好ましい。この方法により、
引火性の溶媒を使用することなく毒性の少ない塩化第二
鉄を用いて非常に簡単な操作で導電性ポリマーを製造す
ることができる。
In this vapor phase doping, the doping rate can be controlled by controlling the temperature of the dopant atmosphere and the dopant partial pressure. Generally, the temperature is preferably in the range of -30 to 200 ° C. If the temperature is lower than that, the doping rate is slow, and if it is higher than that, the polymer is deteriorated during doping, which is not preferable. The dopant partial pressure is 0.001 mmHg to 3800.
It is preferable to perform in the range of mmHg. At lower pressures, the doping rate is slower, and at higher pressures, increasing the pressure does not increase the doping rate. It should be noted that with iodine, doping proceeds rapidly at room temperature and atmospheric pressure,
In the case of ferric chloride, the vapor pressure is low, so the doping conditions differ from those of iodine. Ferric chloride doping is generally preferably performed at a temperature in the range of 50 to 300 ° C.
If the temperature is lower than that, the doping rate is slow, and if it is higher than that, the polymer is deteriorated during doping, which is not preferable. Further, the doping is 0.001 mmHg-76.
It is preferably performed in the range of 0 mmHg. At lower pressure, it takes a long time to reach that pressure, which is not economical, and at higher pressure, ferric chloride is 319 at normal pressure.
Since it has a boiling point of ℃, the doping rate is very slow. The dopant partial pressure of ferric chloride is more preferably 0.1 to 10 in order to effectively increase the conductivity of the polymer.
The doping is preferably performed at a pressure of mmHg and at a temperature in the range of 50 to 200 ° C. By this method,
It is possible to produce a conductive polymer using ferric chloride, which is less toxic, without using a flammable solvent, by a very simple operation.

【0029】[0029]

【発明の効果】本発明によれば、アミン化合物を配合し
たケイ素含有高分子化合物に酸化性ドーパント(ヨウ
素、塩化第二鉄など)をドーピングしたことにより、賦
形性に優れる高導電性組成物を得ることができ、このた
め賦形性に優れる高導電性フィルムあるいは塗膜を容易
に得ることができ、バッテリー電極、太陽電池、電磁シ
ールド用筺体等に応用可能な有用な素材となリ得るもの
である。
According to the present invention, a silicon-containing polymer compound containing an amine compound is doped with an oxidizing dopant (iodine, ferric chloride, etc.) to obtain a highly conductive composition having excellent shapeability. Therefore, it is possible to easily obtain a highly conductive film or coating film having excellent shapeability, and to obtain a useful material applicable to battery electrodes, solar cells, housings for electromagnetic shields, etc. It is a thing.

【0030】[0030]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。
EXAMPLES The present invention will be specifically described below by showing Examples and Comparative Examples, but the present invention is not limited to the following Examples.

【0031】なお、下記の例において、導電率の測定方
法は、ガラス板上に4端子部を白金蒸着により形成させ
て電極とし、この上に溶媒に溶解させたポリマー溶液を
スピンコートすることで薄膜を作り、導電率測定用サン
プルとし、これを遮光、密閉下にヨウ素や塩化第二鉄と
接触させ、直流抵抗の経時変化を追跡し、室温(25
℃)における安定値をとった抵抗値から導電率を求める
ことによって行った。
In the following examples, the method of measuring the conductivity is to form four terminals on a glass plate by platinum vapor deposition to form electrodes, and spin-coat a polymer solution dissolved in a solvent on the electrodes. A thin film was prepared and used as a sample for conductivity measurement. This was shielded from light and brought into contact with iodine or ferric chloride under airtight condition, and the change in direct current resistance with time was traced.
Conductivity was determined from the resistance value which was a stable value at (° C.).

【0032】〔合成例1〕ポリシラン及びポリ(ジシラ
ニレンフェニレン)の製造方法 金属ナトリウムをトルエンに窒素気流下に添加し、高速
で撹拌しながら120℃に加熱して分散させた。これに
ジクロルジオルガノシラン、あるいはビス(クロロジア
ルキルシリル)ベンゼンを撹拌下にゆっくり滴下した。
添加量はケイ素化合物1モルに対し、金属ナトリウム2
〜3モルである。原料が消失するまで4時間撹拌して反
応を完結させた。次いで放冷後、塩を濾過し、濃縮する
ことにより、ポリシランあるいはポリ(ジシラニレンフ
ェニレン)等を簡単に得ることができた。
[Synthesis Example 1] Method for producing polysilane and poly (disilanylenephenylene) Sodium metal was added to toluene under a nitrogen stream and heated to 120 ° C with high speed stirring for dispersion. Dichlorodiorganosilane or bis (chlorodialkylsilyl) benzene was slowly added dropwise thereto with stirring.
The amount of addition is 2 mol of sodium metal based on 1 mol of silicon compound.
~ 3 moles. The reaction was completed by stirring for 4 hours until the raw materials disappeared. Then, after allowing to cool, the salt was filtered and concentrated to easily obtain polysilane, poly (disilanylenephenylene), or the like.

【0033】〔実施例1〕表1に示す種々のケイ素含有
高分子化合物10重量部をトルエン100重量部に溶解
し、これにトリフェニルアミン3重量部を混合した。一
方、ガラス板上に4端子部を白金蒸着により形成させて
電極とし、この上に上記にて調製したポリマー溶液をス
ピンコートし、2mmHg/50℃で乾燥させ、厚さ約
1μの薄膜を作り、導電率測定用サンプル(1)とし
た。成膜直後、この膜を乾燥させた褐色ガラス瓶容器内
に取り付け、容器の底部の固体ヨウ素と密閉下に静置し
た。この定常状態にしたときの値から導電率を求めた。
比較のため、アミン無添加の導電率を求めた。結果を表
1に示す。
Example 1 10 parts by weight of various silicon-containing polymer compounds shown in Table 1 were dissolved in 100 parts by weight of toluene, and 3 parts by weight of triphenylamine was mixed therein. On the other hand, 4 terminals were formed on the glass plate by platinum vapor deposition to form electrodes, on which the polymer solution prepared above was spin coated and dried at 2 mmHg / 50 ° C. to form a thin film with a thickness of about 1 μm. The sample for conductivity measurement (1) was prepared. Immediately after the film formation, this film was mounted in a dried brown glass bottle container, and allowed to stand still with solid iodine at the bottom of the container sealed. The conductivity was calculated from the value when the steady state was set.
For comparison, the conductivity without addition of amine was determined. The results are shown in Table 1.

【0034】[0034]

【表1】 [Table 1]

【0035】〔実施例2〕ケイ素含有高分子化合物とし
て上記フェニルメチルポリシランを用い、実施例1と同
様にしてトリフェニルアミン量、フィルム作製からドー
ピングまでの時間を変えた場合の導電率を調べた。結果
を表2に示す。
Example 2 Using the above phenylmethylpolysilane as the silicon-containing polymer compound, the amount of triphenylamine and the conductivity when the time from film formation to doping was changed were examined in the same manner as in Example 1. . The results are shown in Table 2.

【0036】[0036]

【表2】 [Table 2]

【0037】〔実施例3〕フェニルメチルポリシランに
ついて表3に示す種々のアミンをポリマー100重量部
に対し30重量部混合後、トルエン溶液とし、スピンコ
ートによりフィルムを作製し、成膜直後、ヨウ素ドーピ
ングを行い、実施例1と同様にして導電挙動を調べた。
結果を表3に示す。
[Example 3] Phenylmethylpolysilane 30 parts by weight of various amines shown in Table 3 were mixed with 100 parts by weight of a polymer to prepare a toluene solution, and a film was prepared by spin coating. Immediately after film formation, iodine doping was performed. Then, the conductive behavior was examined in the same manner as in Example 1.
The results are shown in Table 3.

【0038】[0038]

【表3】 [Table 3]

【0039】〔実施例4〕フェニルメチルポリシランに
ついて、トリフェニルアミンをポリマー100重量部に
対して30重量部混合後、トルエン溶液とし、スピンコ
ートによりフィルムを作製し、このフィルムを乾燥させ
た褐色ガラス瓶容器内に取り付け、容器の底部の固体塩
化第二鉄と密閉下に静置した。これを真空ポンプに接続
し、4mmHgまで減圧した。この状態で底部の塩化第
二鉄の部分をマントルヒーターで加熱した。この操作に
より、導電率測定用サンプルは透明から黒褐色に変化し
てゆき、同時に導電率が速やかに上昇した。最終的に導
電率は一定値に落ち着き、このとき導電率測定用サンプ
ルの温度は150℃にまで達していた。ここで真空ポン
プを停止し、加熱をやめ、25℃まで放冷した。この定
常状態にしたときの値から導電率を求めた。結果を表4
に示す。
[Example 4] With respect to phenylmethylpolysilane, 30 parts by weight of triphenylamine was mixed with 100 parts by weight of a polymer to prepare a toluene solution, a film was prepared by spin coating, and the film was dried in a brown glass bottle. It was placed in a container and allowed to stand under solid sealing with solid ferric chloride at the bottom of the container. This was connected to a vacuum pump and the pressure was reduced to 4 mmHg. In this state, the ferric chloride portion at the bottom was heated with a mantle heater. By this operation, the sample for conductivity measurement changed from transparent to blackish brown, and at the same time, the conductivity rapidly increased. Finally, the conductivity settled down to a constant value, at which time the temperature of the sample for measuring conductivity reached 150 ° C. Here, the vacuum pump was stopped, heating was stopped, and the mixture was allowed to cool to 25 ° C. The conductivity was calculated from the value when the steady state was set. The results are shown in Table 4.
Shown in.

【0040】[0040]

【表4】 [Table 4]

───────────────────────────────────────────────────── フロントページの続き (72)発明者 森 滋 神奈川県川崎市高津区坂戸3丁目2番1号 信越化学工業株式会社コーポレートリサ ーチセンター内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shigeru Mori 3-2-1 Sakado, Takatsu-ku, Kawasaki-shi, Kanagawa Shin-Etsu Chemical Co., Ltd. Corporate Research Center

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 アミン化合物を配合したケイ素含有高分
子化合物に酸化性ドーパントをドーピングしてなること
を特徴とする導電性重合体組成物。
1. A conductive polymer composition comprising a silicon-containing polymer compound containing an amine compound doped with an oxidizing dopant.
【請求項2】 ケイ素含有高分子化合物が主鎖にSi−
Si結合又はSi−Si結合とC−C多重結合を有する
ものであり、アミン化合物が3級アミンである請求項1
記載の組成物。
2. A silicon-containing polymer compound having a main chain of Si-
A compound having a Si bond or a Si-Si bond and a C-C multiple bond, and the amine compound is a tertiary amine.
The composition as described.
【請求項3】 3級アミンが芳香環を含むものである請
求項2記載の組成物。
3. The composition according to claim 2, wherein the tertiary amine contains an aromatic ring.
【請求項4】 ケイ素含有高分子化合物がポリシラン
類、ポリ(ジシラニレンフェニレン)類及びポリ(ジシ
ラニレンエチニレン)類から選ばれるものである請求項
2又は3記載の組成物。
4. The composition according to claim 2 or 3, wherein the silicon-containing polymer compound is selected from polysilanes, poly (disilanylenephenylene) s, and poly (disilanyleneethynylene) s.
JP1984595A 1994-01-25 1995-01-12 Conductive polymeric composition Pending JPH07254307A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984595A JPH07254307A (en) 1994-01-25 1995-01-12 Conductive polymeric composition

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2313594 1994-01-25
JP6-23135 1994-01-25
JP1984595A JPH07254307A (en) 1994-01-25 1995-01-12 Conductive polymeric composition

Publications (1)

Publication Number Publication Date
JPH07254307A true JPH07254307A (en) 1995-10-03

Family

ID=26356712

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH07254307A (en)

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