JPH07244384A - Processing method of photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE:To stably process a photosensitive planographic printing plate without exchanging a rinse solution for a long time by adding a rinse replenishing solution having specific concentration to the rinse solution. CONSTITUTION:An automatic developing device is constituted of an inserting part A for inserting a photosensitive planographic printing plate, a developing part B, a water washing part C, a rinse processing part D and a drying part E and rinse solution vessel 30 is provided in the rinse processing part D. The concentrated rinse replenishing solution and a dilution water are individually fed to the rinse solution vessel 30 and are mixed in the rinse solution vessel 30 to make the rinse replenishing solution. The rinse replenishing solution having >=0.2 times to <=0.8 times concentration (W/V%) of the new rinse solution is added to the rinse solution, or the rinse replenishing solution having >=0.8 times concentration of the new rinse solution is added to the rinse solution and water is individually added to the rinse solution. When the concentration is <0.2 times, the rinse solution is useless because of repeated replenishing and when the concentration is >=0.8 times, precipitates are easily generated in the rinse solution.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a method for processing a photosensitive lithographic printing plate.

[0002]

2. Description of the Related Art Conventionally, after developing a photosensitive lithographic printing plate, a rinsing solution has been used to remove the developing solution components and photosensitive layer components remaining on the plate surface. The rinse solution is generally used repeatedly from the economical viewpoint. However, if the rinse liquid is used without replacement for a long period of time, the developer component and the photosensitive layer component are brought into the rinse liquid and accumulated to generate an insoluble matter, and the shower pipe of the automatic developer may be clogged. There is a problem that insoluble matter adheres to the printing plate to cause stains.

[0003]

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems when a conventional rinse liquid is used for a long time without being replaced, and the rinse liquid is replaced for a long time. It is to be able to perform stable processing without doing.

[0004]

The above object of the present invention is to provide a method for processing a photosensitive lithographic printing plate, which comprises developing the photosensitive lithographic printing plate using an automatic processor and then treating with a rinse liquid. A method for treating a photosensitive lithographic printing plate, characterized in that a rinse replenisher having a concentration (W / V%) 0.2 times or more and 0.8 times or less than that of a new rinse is added to the rinse, or automatic development After developing the photosensitive lithographic printing plate using a machine, the photosensitive lithographic printing plate is processed with a rinse liquid.
A method of treating a photosensitive lithographic printing plate comprising adding a rinse replenisher having a concentration (W / V%) more than double and adding water to the rinse separately from the rinse replenisher. .

In the present invention, the concentration (W / V%) of the rinse replenishing solution is the concentration of the rinse solution (hereinafter referred to as rinse solution new solution or simply new solution) initially charged in the automatic processor. 0.2 times or more (preferably 0.5 times or more)
It may be 0.8 times or less, and the composition thereof may be the same as that of the rinse solution new solution or may be a solution having a different composition. The concentration of the rinse replenisher and rinse solution (W
/ V%) represents the weight of the solid content contained in a unit volume of the rinse liquid (rinse replenisher) as a percentage.
For example, if 1 liter of rinse liquid contains 100 g of solid content, the concentration of this rinse liquid will be 10 W / V%.

When the concentration of the rinse replenisher is less than 0.2 times that of the rinse, the concentration of the rinse remarkably decreases due to repeated replenishment, making it useless as a rinse. Further, if the concentration of the rinse replenisher is more than 0.8 times that of the rinse, a precipitate is likely to be generated in the rinse. However,
Even in this case, it is possible to suppress the generation of precipitates by adding water to the rinse liquid separately from the replenisher of the rinse liquid. In this case, the total concentration (W / V%) of the rinse replenisher and the water added separately from the rinse replenisher is preferably 0.2 times or more (particularly 0.5 times or more) the concentration of the new rinse solution,
Moreover, 0.8 times or less is preferable. The total concentration of the rinse replenisher and water added separately from the rinse replenisher (W
/ V%) is the concentration (W / V) of the liquid obtained by mixing the rinse replenisher and water added separately from this rinse replenisher.
%).

As the rinse replenishing solution, for example, a fresh rinse solution diluted with water can be used. The rinse replenisher is preferably prepared as a concentrated solution and diluted with water at the time of use from the viewpoints of handleability and space efficiency. Also, the replenishment amount of the rinse replenisher is the PS plate 1 to be treated.
1 ml or more per m ² is preferable, and 100 ml or less (especially 5
0 ml or less) is preferable.

By the way, in the present invention, it is preferable to carry out a water washing treatment between the developing treatment and the treatment with the rinse liquid in order to use the rinse liquid without replacement for a long period of time. The washing water used for the washing treatment is preferably used repeatedly from the economical aspect, and at that time, it is more preferable to add a replenisher to the washing water. The replenishing amount of washing water is preferably 1 ml or more (particularly 10 ml or more) per 1 m ^{2 of the} PS plate to be treated, and 500 m
It is preferably 1 or less (particularly 100 ml or less).

The rinse solution used in the present invention may be an aqueous solution of a surfactant. It is considered that the rinsing solution has an effect of dispersion-stabilizing a developer component adhering to a developed lithographic printing plate and brought in, a dissolved photosensitive layer composition, and the like, and not fixing the lithographic printing plate surface even after drying.

Examples of such surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene polystyryl phenyl ether, polyoxyethylene polyoxypropylene alkyl ether, glycerin fatty acid partial esters, and sorbitan fatty acid. Partial esters, pentaerythritol fatty acid partial esters, propylene glycol monofatty acid esters, sucrose fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene sorbitol fatty acid partial esters, polyethylene glycol fatty acid esters, polyglycerin fatty acid moieties Esters, polyoxyethylenated castor oil, polyoxyethylene glycerin fatty acid partial esters, fatty acid die Nonamides, N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamines, triethanolamine fatty acid esters, non-ionic surfactants such as trialkylamine oxides, fatty acid salts, abithienates, hydroxyalkanes Sulfonates, alkane sulfonates, dialkylsulfosuccinic acid ester salts, linear alkylbenzene sulfonates, branched chain alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkylphenoxy polyoxyethylene propyl sulfonates, polyoxyethylene alkyl Sulfophenyl ether salts, N-methyl-N-oleyl taurine sodium salts, N-alkylsulfosuccinic acid monoamide disodium salts, petroleum sulfonates, sulfated castor oil, sulfated cattle foot oil, Sulfuric acid ester salts of fatty acid alkyl esters, alkyl sulfuric acid ester salts, polyoxyethylene alkyl ether sulfuric acid ester salts, fatty acid monoglyceride sulfuric acid ester salts, polyoxyethylene alkylphenyl ether sulfuric acid ester salts, polyoxyethylene styryl phenyl ether sulfuric acid ester salts, alkyl phosphorus Acid ester salts, polyoxyethylene alkyl ether phosphate ester salts,
Anions such as polyoxyethylene alkyl phenyl ether phosphate ester salts, partially saponified products of styrene-maleic anhydride copolymers, partially saponified products of olefin-maleic anhydride copolymers, and naphthalene sulfonate formalin condensates Surfactants, alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamine salts, cationic surfactants such as polyethylene polyamine derivatives, carboxybetaines, aminocarboxylic acids, sulfobetaines, aminosulfates, Examples include amphoteric surfactants such as imidazolines.

Among the above-mentioned surfactants, those having polyoxyethylene can be read as polyoxyalkylenes such as polyoxymethylene, polyoxypropylene and polyoxybutylene, and these surfactants are also included. The same applies to the following description.

Of these, polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene polyoxypropylene alkyl ethers, glycerin fatty acid partial esters, sorbitan fatty acid moieties Esters, pentaerythritol fatty acid partial esters, propylene glycol monofatty acid esters, polyoxyethylene sorbitan fatty acid partial esters, polyoxyethylene glycerin fatty acid partial esters, polyethylene glycol fatty acid esters, polyoxyethylenated castor oil, dialkylsulfo amber Acid salts, alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfate ester salts, fatty acid salts Alkyl phosphoric acid ester salts, naphthalene sulfonic acid salt formalin condensates, polyoxyethylene alkylamine salts, alkylamine salts, and quaternary ammonium salts are preferable because they tend to suppress deterioration of the oil sensitivity of the image area of the lithographic printing plate. Among them, polyoxyethylene alkyl phenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene alkyl ethers, glycerin fatty acid partial esters, sorbitan fatty acid partial esters, polyoxyethylene sorbitan fatty acid partial esters, pentaerythritol fatty acid Partial esters, propylene glycol monofatty acid esters, polyethylene glycol fatty acid esters, dialkyl sulfone succinic acid ester salts, alkyl sulfate ester salts, Kill benzenesulfonic acid salts are particularly preferred.

Most preferred are alkylbenzene sulfonates and dialkyl sulfosuccinic acid ester salts having strong dispersive power.

The above-mentioned surfactants can be used alone or in combination of two or more kinds, and about 0.
1% to about 20% by weight, more preferably 0.5% by weight
Used in the range of 10% by weight.

The pH of the rinse liquid in the present invention is preferably 1 or more (particularly 2 or more), and is preferably 8 or less (particularly 6 or less). In order to adjust the pH of the aqueous solution, it is preferable to include either or both of an acid and a water-soluble salt as a buffer. As a result, when the lithographic printing plate is subjected to the rinsing liquid, the developer component remaining on the plate is neutralized, and the non-image area becomes more hydrophilic.

Details of the buffering agent can be found in, for example, "Chemical Handbook Basic Edition".
II ”edited by The Chemical Society of Japan, 5th edition, February 20, 1972, published by Maruzen Co., Ltd., pages 1312 to 1320, and these can be applied as they are.

Suitable acids and water-soluble salts include inorganic acids such as molybdic acid, boric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, acetic acid, oxalic acid, tartaric acid, benzoic acid, succinic acid, citric acid, malic acid. , Acids such as water-soluble organic acids such as lactic acid and p-toluenesulfonic acid, and salts thereof. More preferred salts are water-soluble alkali metal salts and ammonium salts, particularly preferred are molybdates such as ammonium molybdate, phosphates such as sodium phosphate, polyphosphates such as potassium tetrapolyphosphate and sodium trimetaphosphate, oxalic acid. These include oxalates such as sodium, tartrates such as potassium tartrate, succinates such as sodium succinate, and citrates such as ammonium citrate. These acids and water-soluble salts can be used alone or in combination of two or more.

Further, in the method of the present invention, since the developing component is brought into the rinse solution, in order to neutralize it, an amount of salt and / or acid depending on the intended processing area of the PS plate is previously contained. It is preferable to set.

The addition amount of the acid and salt contained in the rinse liquid is not particularly limited, but it is preferable that the total amount of the acid and salt is about 10% by weight or less based on the total weight of the rinse liquid. It is more preferably used in the range of 0.01 to 6% by weight.

The rinsing solution in the present invention further includes sorbic acid, preservatives such as ethyl p-oxybenzoate, antifungal agents, propyl gallate, 2,6-di-t-butyl-4-ethylphenol, 2, An antioxidant such as 6-di-t-butyl-4-methylphenol may be included.

Preservatives and antifungal agents as these preservatives,
By adding a small amount of the antioxidant, it is possible to prevent the rinsing liquid from being deteriorated due to storage, but the preferable addition amount is 0.001 to 5% by weight.

It is preferable that the rinse liquid in the present invention contains a lipophilic substance. As a result, the image area of the lithographic printing plate becomes more oil-sensitive, and not only the development ink buildup becomes easier, but when the plate surface protective agent treatment is carried out after the treatment with the rinse solution, A decrease in oil sensitivity can be strongly suppressed. Preferred lipophilic substances include, for example, organic carboxylic acids having 5 to 25 carbon atoms such as oleic acid, lauric acid, valeric acid, nonylic acid, capric acid, mistyric acid, palmitic acid, castor oil and the like. These lipophilic substances can be used alone or in combination of two or more. The content of the lipophilic substance contained in the rinse liquid in the present invention is preferably 0.005% by weight or more, more preferably 0.05% by weight or more, and 10% by weight or less (particularly 5% by weight or less).

A typical developing solution to which the present invention is applied is an alkaline developing solution containing water as a main solvent (50% by weight or more of the solvent of the developing solution is water). The composition of the developer may be a composition of a developer usually used for developing a photosensitive lithographic printing plate containing an o-quinonediazide compound or a diazo resin as a photosensitive component, and in addition to an alkali agent, for example, an organic carboxylic acid. And a salt thereof, an anionic type, a nonionic type, a cation type surfactant, an organic solvent and the like.

Examples of the alkali agent contained in the above developing solution include sodium silicate, potassium silicate, sodium hydroxide, lithium hydroxide, sodium triphosphate, dibasic sodium phosphate, dibasic potassium phosphate, and dibasic sodium phosphate. Inorganic alkaline agents such as potassium phosphate, ammonium triphosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, mono-, di- or triethanolamine and water Organic alkali agents such as tetraalkylammonium oxide and organic ammonium silicates are useful. The content of the alkaline agent in the developer is preferably 0.05% by weight or more, and preferably 20% by weight or less.

The developer may contain water-soluble or alkali-soluble organic and inorganic reducing agents. Examples of the organic reducing agent include phenol compounds such as hydroquinone, metol and methoxyquinone, amine compounds such as phenylenediamine and phenylhydrazine, and examples of the inorganic reducing agent include sodium sulfite, potassium sulfite, ammonium sulfite and hydrogen sulfite. Sodium, sulfites such as potassium bisulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, potassium hydrogen phosphite, sodium dihydrogen phosphite, phosphates such as dipotassium hydrogen phosphite , Hydrazine, sodium thiosulfate, sodium dithionite and the like. The content of these water-soluble or alkali-soluble reducing agents in the developer is preferably 0.1% by weight or more, and preferably 10% by weight or less.

The organic carboxylic acid contained in the developer includes an aliphatic carboxylic acid having 6 to 20 carbon atoms and an aromatic carboxylic acid having a benzene ring or a naphthalene ring substituted with a carboxyl group. The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples thereof include caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mistyric acid,
There are palmitic acid, stearic acid and the like, and particularly preferred are alkanoic acids having 6 to 12 carbon atoms. Also, a fatty acid having a double bond in the carbon chain or a branched carbon chain may be used. The aliphatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt.

Specific compounds of the aromatic carboxylic acid include benzoic acid, o-chlorobenzoic acid, p-chlorobenzoic acid,
o-hydroxybenzoic acid, p-hydroxybenzoic acid, p-tert
-Butylbenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3 , 5-Dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-
There are hydroxy-1-naphthoic acid, 1-naphthoic acid, 2-naphthoic acid and the like. The aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt. Content of aliphatic and aromatic carboxylic acids is 30% by weight
The following are preferred.

The above-mentioned developing solution is an anionic type,
A nonionic or cationic surfactant and an organic solvent may be contained.

The surfactant contained in the developer according to the present invention may be any of nonionic, cationic, anionic and amphoteric, but is preferably a nonionic surfactant or a cationic surfactant, more preferably a nonionic surfactant. Is. The nonionic surfactants are of polyethylene glycol type and polyhydric alcohol type, but both can be used. From the viewpoint of developing performance, a polyethylene glycol type nonionic surfactant is preferable, and among them, it has 3 or more ethyleneoxy groups (—CH ₂ CH ₂ O—) and has an HLB value (H
LB has a Hydropile-Lipophile Balance of 5 or more (more preferably 8 or more (particularly 15 or more)), and preferably 20 or less. Nonionic surfactants are more preferable, and among the nonionic surfactants, ethylene is preferable. Those having both an oxy group and a propyleneoxy group are particularly preferable,
Among them, those having an HLB value of 8 or more are more preferable. As a preferred example of the nonionic surfactant, the following general formula [1]
To the compound represented by [8].

[0030]

[Chemical 1]

In the formulas [1] to [8], R represents a hydrogen atom or a monovalent organic group. The organic group is, for example, a linear or branched alkyl group having 1 to 30 carbon atoms, which may have a substituent {for example, an aryl group (phenyl etc.)}, an alkylcarbonyl in which the alkyl moiety is the above alkyl group. Examples thereof include a group and a phenyl group which may have a substituent (for example, a hydroxyl group, the above-mentioned alkyl group and the like). a, b, c, m, n, x and y are each 1 to 40
Represents the integer.

Next, specific examples of the nonionic surfactant will be shown.

Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether,
Polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene behenyl ether, polyoxyethylene nonyl phenyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene stearyl amine, polyoxyethylene oleyl amine, polyoxyethylene stearic acid amide, Polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene Glycer monostearate,
Polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol polyoxyethylene polyoxypropylene adduct, glycerol monostearate, sorbitan monolaurate Rate, polyoxyethylene sorbitan monolaurate, etc.

The weight average molecular weight of the nonionic surfactant is 30.
0 or more (particularly 500% or more) is preferable, and 10,000 or less (particularly 5000 or less) is preferable. The nonionic surfactants may be contained alone or in combination of two or more. Cationic surfactants are roughly classified into amine type and quaternary ammonium salt type, and any of these can be used.

Examples of amine type include polyoxyethylene alkylamine, N-alkyl propylene amine, N-alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkyl imidazoline, 1- Hydroxyethyl-2-alkylimidazoline, 1-acetylaminoethyl-2-alkylimidazoline, 2-alkyl-4-methyl
-4-hydroxymethyloxazoline and the like.

Examples of the quaternary ammonium salt type are long-chain primary amine salt, alkyltrimethylammonium salt, dialkyldimethylethylammonium salt, alkyldimethylammonium salt, alkyldimethylbenzylammonium salt, alkylpyridinium salt, and alkylquinone. Norinium salt, alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidomethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylamino Ethyl viridinium salt, acyl cholaminoformylmethyl pyridinium salt, stearooxymethyl pyridinium salt, fatty acid triethanolamine, fat Acid triethanolamine formate, trioxyethylene fatty acid triethanolamine,
Examples include fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-isooctylphenoxyethoxyethyldimethylbenzylammonium salt and the like. ("Alkyl" in the examples of the above compounds represents a straight chain or partially substituted alkyl group having 6 to 20 carbon atoms, specifically,
Straight-chain alkyl such as hexyl, octyl, cetyl and stearyl is preferably used. Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among them, alkyl trimethyl ammonium salt, alkyl dimethyl benzyl ammonium salt, ethylene oxide addition ammonium salt and the like are preferable. Further, a polymer having a cation component as a repeating unit is also a cationic surfactant in a broad sense and is included in the cationic surfactant of the present invention. In particular,
A polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be preferably used.

The weight average molecular weight of the polymer is preferably 300 or more (particularly 500 or more), and preferably 50,000 or less (particularly 5000 or less). These cationic surfactants may be used alone or in combination of two or more.

As the anionic surfactant, higher alcohol (C ₈ -C ₂₂ ) sulfate ester salts [for example, sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "Teepol" -81 "
(Trade name, manufactured by Ciel Chemical Co., Ltd.), secondary sodium alkyl sulfate, etc.], aliphatic alcohol phosphate ester salts (eg, cetyl alcohol phosphate ester sodium salt), alkylaryl sulfonates (eg, dodecylbenzene sulfonic acid) Sodium salt, isopropyl naphthalene sulfonic acid sodium salt, dinaphthalene disulfonic acid sodium salt, metanitrobenzene sulfonic acid sodium salt, etc., alkyl amide sulfonates (eg, C ₁₇ H ₃₃ CON (CH ₃ ) CH ₂ SO ₃ Na) and sulfonates of dibasic fatty acid ester (for example, dioctyl sodium sulfosuccinate, dihexyl sodium sulfosuccinate, etc.). Of these, sulfonates are particularly preferably used.

Examples of the amphoteric surfactant include N-methyl.
Compounds such as -N-pentadecylaminoacetate sodium can be used.

The content of the surfactant in the developing solution is preferably 0.01% by weight or more, and preferably 10% by weight or less.

Examples of the organic solvent include those having a solubility in water at 20 ° C. of not more than 10% by weight, such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl ether, butyl lactate, and butyl repurate. Carboxylic acid esters; ketones such as ethyl butyl ketone, methyl isobutyl ketone, cyclohexanone; ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol,
Alcohols such as methylphenylcarbinol, n-amyl alcohol and methylamyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; halogenated hydrocarbons such as methylene dichloride, ethylene dichloride and monochlorobenzene. One or more of these organic solvents may be used.

The following additives may be added to the developing solution in order to enhance the developing performance. For example
Neutral salts such as NaCl, KCl, and KBr described in JP-A-58-75152, chelating agents such as EDTA and NTA described in JP-A-59-190952, and [Co (NH ₃ )] ₆ Cl _{3 and} other complexes, amphoteric polymer electrolytes such as copolymers of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528, JP-A-58-59444 Inorganic lithium compounds such as lithium chloride, Japanese Patent Publication No. 50-344
Organic lithium compounds such as lithium benzoate described in JP-A-42, organometallic surfactants containing Si, Ti, etc. described in JP-A-59-75255, and organic boron compounds described in JP-A-59-84241. Can be mentioned.

FIG. 1 is a schematic configuration diagram showing an example of an automatic developing machine to which the present invention is applied. The automatic developing machine includes an inserting section A for inserting a photosensitive lithographic printing plate, a developing section B for developing, a rinsing section C for rinsing, and a rinsing section D for rinsing.
It is mainly composed of a drying section E for drying, a sensor for detecting insertion of the photosensitive lithographic printing plate into the automatic developing machine, and a sensor for detecting the area of the inserted photosensitive lithographic printing plate, and a control mechanism (not shown). . In the figure, PS is a photosensitive lithographic printing plate or its transport path.

The insertion portion A includes an insertion table 1 for guiding the insertion of the photosensitive lithographic printing plate, an optical sensor 2 for detecting the photosensitive lithographic printing plate by reflected light, and a nip conveyance for nipping and conveying the photosensitive lithographic printing plate. The rollers 3A and 3B are provided.

In the developing section B, the developing solution contained in the developing tank 5 is curved and conveyed by the nip conveying rollers 3A, 3B and the conveying rollers 4 which are conveying means for conveying the photosensitive lithographic printing plate. The developing solution is sent to the processing solution discharge nozzles 6A and 6B and the processing solution discharge nozzles 6A and 6B, which are means for spraying the developing solution onto the photosensitive layer surface of the photosensitive lithographic printing plate during immersion development in the developing tank 5. A magnet pump 7 that is a discharge processing liquid supply unit, a brush roller 8 that is a unit that scrapes the surface of the photosensitive lithographic printing plate to accelerate development, and the action of the brush roller 8 to rub the surface of the photosensitive lithographic printing plate is maintained. In order to support the photosensitive lithographic printing plate, a plate pressing roller 9, which is a plate pressing roller, a heater 10 for maintaining the temperature of the developing solution within a predetermined temperature range, a concentrated developing replenisher tank containing a concentrated developing replenisher. 14, a bellows pump 12, which is a developing replenisher supplying means for sending the concentrated developing replenisher to the developing tank 5, a water tank 15 for containing water, and a bellows pump for diluting water supplying means for supplying diluting water from the water tank 15 to the developing tank 5. 13, mainly from a bellows pump 11 which is a means for returning the developer overflowing from the developing tank 5 to the developing tank 5, a developing waste liquid tank 17, and a replenishing circuit (not shown) for replenishing in accordance with the processing of the photosensitive lithographic printing plate. It is configured.

The washing section C is a washing water tank 20 for containing washing water,
Rinsing water discharge nozzles 6A and 6B, which are means for supplying washing water to the lithographic printing plate, to supply the washing water in the washing water tank 20 to the washing water discharge nozzles 6A and 6B. A magnet pump 21, a water tank 15 containing water, a bellows pump 34 which is a means for supplying a washing water replenisher from the water tank 15 to the washing water tank 20, and a conveying means for conveying a photosensitive lithographic printing plate. The nip transport rollers 3A and 3B are mainly included.

The rinsing section D includes a rinsing liquid tank 30 containing a rinsing liquid, rinsing liquid discharge nozzles 6A and 6B serving as rinsing liquid supplying means for jetting and supplying the rinsing liquid to the lithographic printing plate,
The rinse liquid in the rinse liquid tank 30 is discharged from the rinse liquid discharge nozzle 6A,
A magnet pump 31, which is a discharge rinse solution supply means for supplying to the 6B, nip transfer rollers 3A and 3B which is a transfer means for transferring the photosensitive lithographic printing plate, and a concentrated rinse replenisher tank.
16, bellows pump 33 which is a rinse replenisher supplying means for sending concentrated rinse replenisher to rinse tank 30, water tank 15, bellows pump 32 which is a diluting water supplying means for sending diluting water to rinse tank 30, photosensitive lithographic plate It is mainly composed of a replenishing circuit (not shown) that replenishes according to the processing of the printing plate.

In the figure, the concentrated rinse replenishing solution and the diluting water are separately sent to the rinse solution tank 30 and mixed in the rinse solution tank 30 to form the rinse replenishing solution. The rinse replenisher is prepared by mixing the concentrated rinse replenisher and the diluting water in advance in the tank.
It can also be configured to send to 30.

The drying section E is mainly composed of drying air discharge nozzles 40A, 40B and nip conveying rollers 3A, 3B which are drying means for applying a drying air to the planographic printing plate.

A large number of optical sensors 2 as photosensitive lithographic printing plate width detecting means provided in the insertion portion A of the automatic developing machine are arranged at equal intervals in the width direction of the automatic developing machine. The sensor detects the light reflected by the surface of the photosensitive lithographic printing plate, integrates the detection signal by an unillustrated replenishing circuit to obtain an integrated signal, and the required replenishment amount proportional to the integrated area is replenished. Thus, the operation of the bellows pumps 12, 13, 32, 33 is configured to be controlled. Further, it is preferable that the replenishing circuit has a function of replenishing a fixed amount of replenishing liquid per unit time regardless of the treatment of the photosensitive lithographic printing plate.

[0051]

EXAMPLES The present invention will be described below with reference to examples.

Example 1 60 L of a developing solution having the following composition was charged into the developing tank 5 of the automatic developing machine shown in FIG. 1 and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

<Developer composition> β-anilinoethanol 2.6 parts by weight Propylene glycol 124 parts by weight p-tert-Butylbenzoic acid 33.5 parts by weight 50% aqueous potassium hydroxide solution 150 parts by weight Emulgen 147 (Nonion, manufactured by Kao Corporation) Surfactant) 1.1 parts by weight Perex NB-L (Kao Corp., nonionic surfactant) 31 parts by weight A Potassium silicate (Nippon Kagaku Kogyo KK, potassium silicate aqueous solution) 125 parts by weight 40% potassium sulfite aqueous solution 267 parts by weight 50% aqueous gluconic acid solution 59 parts by weight Triethanolamine 62 parts by weight Water 5300 parts by weight To the concentrated development replenisher tank 14, 10 L of concentrated development replenisher having the composition shown below is charged. 1:
Bellows pump so that the developer tank 5 is replenished at a rate of 3
12 and 13 were adjusted.

<Concentrated developer replenisher composition> β-anilinoethanol 1.7 parts by weight Propylene glycol 80 parts by weight p-tert-butylbenzoic acid 44 parts by weight 50% potassium hydroxide aqueous solution 250 parts by weight Emulgen 147 (manufactured by Kao Corporation) , Nonionic surfactant) 8.2 parts by weight Perex NB-L (manufactured by Kao Corporation, anionic surfactant) 21 parts by weight A potassium silicate (manufactured by Nippon Chemical Industry Co., Ltd., potassium silicate aqueous solution) 240 parts by weight sulfite 40% Potassium aqueous solution 275 parts by weight 50% gluconic acid aqueous solution 39 parts by weight Triethanolamine 64 parts by weight Water 231 parts by weight 18 L of water is put in the washing water tank 20, and the rinse liquid tank 30 is a concentrated rinse liquid having the following composition with water. 15 liters of the 8-fold diluted solution were added. Further, 10 L of concentrated rinse replenisher having the following composition is placed in the concentrated rinse replenisher tank 16, and the bellows pump 32 is provided so that the concentrated rinse replenisher and water are replenished to the rinse tank 30 at a ratio of 1: 2. , 33 was adjusted.

<Concentrated rinse composition> 75% phosphoric acid 62 parts by weight Sodium hydroxide 21 parts by weight Nikkor SLS (manufactured by Nikko Chemicals Co., Ltd., anionic surfactant) 13 parts by weight Nikkor OTP-100 (manufactured by Nikko Chemicals Co., Ltd.) , Anionic surfactant) 73 parts by weight Water 891 parts by weight <Concentrated rinse replenisher composition> 75% phosphoric acid 15 parts by weight Sodium hydroxide 5 parts by weight Nikkor SLS (manufactured by Nikko Chemicals Co., Ltd., anionic surfactant) 3 parts by weight Nikkor OTP-100 (manufactured by Nikko Chemicals Co., Ltd., anionic surfactant) 18 parts by weight Water 973 parts by weight Next, the developing replenisher is replenished every 5 m ^{2 of the} PS plate.
150ml, 152 every time the operating time of the automatic processor reaches 1 hour
ml, automatic development machine stop time is 240 ml per hour, and the rinse solution replenishment amount is 150 ml every 5 m ^{2 of} PS plate processed, 1 every time the automatic development machine operation time reaches one hour.
A control circuit (not shown) was set so that the volume was 7 ml and the stop time of the automatic processor was 17 ml per hour. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corporation) having a size of 1003 mm × 800 mm (with a positive film adhered thereto, using a 2 kW metal halide lamp)
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

Further, when printing was carried out with a Heidelberg GTO printing machine using the printing plate obtained in the first month, good printed matter was obtained.

Example 2 To the developing tank 5 of the automatic developing machine shown in FIG. 1, 60 L of the same developing solution as used in Example 1 was charged and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds. The concentrated development replenisher tank 14 is filled with 10 L of the same concentrated development replenisher solution used in Example 1, and the bellows pump 12 is used so that the concentrated development replenisher solution and water are replenished in the developing tank 5 at a ratio of 1: 3. , 13 were adjusted. 18 L of water was put into the washing water tank 20, and 15 L of the same concentrated rinse solution as that used in Example 1 diluted with water 8 times was put into the rinse tank 30. Further, 10 L of the same concentrated rinse replenisher as used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1: 1.5. Adjusted bellows pumps 32, 33. Next, the replenishment amount of the developing replenisher is 150 ml per 5 m ^{2 of} PS plate,
152 ml each time the operating time of the automatic processor reaches 1 hour, 240 ml per hour of stopping the automatic processor,
In addition, the replenishing amount of the rinse liquid is 150 m for each 5 m ² treatment of the PS plate.
l, 17ml each time the operating time of the automatic processor reaches 1 hour,
The stop time of the automatic processor is 17 ml per hour,
A control circuit (not shown) is set. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corp.) of 1003 mm × 800 mm size (a positive film was adhered to it, and a 2 kW metal halide lamp was used.
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30. Further, when printing was performed using a printing plate obtained in the first month with a Heidelberg GTO printing machine, good printed matter was obtained.

Example 3 The developing tank 5 of the automatic developing machine shown in FIG. 1 was charged with 60 L of the same developing solution as used in Example 1 and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

The concentrated development replenisher tank 14 was charged with 10 L of the same concentrated development replenisher solution used in Example 1, and the concentrated development replenisher solution and water were replenished to the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 L of water is put in the washing water tank 20 and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1: 3. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the developing replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 2 hours per hour of stopping the automatic developing machine
40 ml, and the replenishment amount of rinse liquid is 5 for PS plate.
150 ml per m ² processing, 17 ml each time the operating time of the automatic developing machine reaches 1 hour, per 1 hour downtime of the automatic developing machine
A control circuit (not shown) was set so as to be 17 ml. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corporation) with a size of 1003 mm × 800 mm (with a positive film adhered thereto and using a 2 kW metal halide lamp)
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

Further, when printing was carried out by a Heidelberg GTO printing machine using the printing plate obtained in the first month, a good printed matter was obtained.

Example 4 To the developing tank 5 of the automatic developing machine shown in FIG. 1, 60 L of the same developing solution as used in Example 1 was charged and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

10 L of the same concentrated development replenisher as used in Example 1 was placed in the concentrated development replenisher tank 14, and the concentrated development replenisher and water were replenished to the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 L of water is put in the washing water tank 20, and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as that used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished in the rinse tank 30 at a ratio of 1: 9. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the developing replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 240 ml per 1 hour of automatic developing machine stoppage, and the replenishing amount of the rinse solution is PS
A control circuit (not shown) was set so that each time the plate was processed for 5 m ² it was 150 ml, when the operating time of the automatic processor reached 1 hour, it was 17 ml, and the stop time of the automatic processor was 17 ml per hour. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corporation) having a size of 1003 mm × 800 mm (with a positive film adhered thereto, using a 2 kW metal halide lamp)
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

Further, when printing was carried out by a Heidelberg GTO printing machine using the printing plate obtained in the first month, some background stain was found in the non-image area at the beginning,
After that, good printed matter was obtained.

Example 5 To the developing tank 5 of the automatic developing machine shown in FIG. 1, 60 L of the same developing solution as used in Example 1 was charged, and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

The concentrated developing replenisher tank 14 was charged with 10 L of the same concentrated developing replenisher solution used in Example 1, and the concentrated developing replenisher solution and water were added to the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 L of water is put in the washing water tank 20, and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as that used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1: 1. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the developing replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 2 hours per hour of stopping the automatic developing machine
The replenishing amount of the rinse solution is 150 ml every 5 m ² treatment of the PS plate, 17 ml every time the operating time of the automatic developing machine reaches 1 hour, and 17 ml per 1 hour of stopping the automatic developing machine so that it becomes 40 ml.
The control circuit (not shown) was set so that 110 ml of water was replenished to the rinse tank 30 every time the operating time of the automatic processor reached 1 hour. The total concentration of the rinse replenisher and the water added separately from the rinse replenisher was 0.5 times or more and 0.8 times or less that of the rinse solution in the fresh solution. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corporation) having a size of 1003 mm × 800 mm (a positive film was adhered, and a 2 kW metal halide lamp was used.
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

Further, when printing was carried out by a Heidelberg GTO printing machine using the printing plate obtained in the first month, good printed matter was obtained.

Example 6 To the developing tank 5 of the automatic developing machine shown in FIG. 1, 60 L of the same developing solution as used in Example 1 was charged and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

10 L of the same concentrated development replenisher as used in Example 1 was placed in the concentrated development replenisher tank 14 so that the concentrated development replenisher and water were replenished in the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 liters of water is put in the washing water tank 20 and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as used in Example 1 was added to the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1: 2. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the development replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 2 hours per hour of stopping the automatic developing machine
The replenishing amount of the rinse solution is 150 ml every 5 m ² treatment of the PS plate, 17 ml every time the operating time of the automatic developing machine reaches 1 hour, and 17 ml per 1 hour of stopping the automatic developing machine so that it becomes 40 ml.
Water tank for every 5m ^{2 of} PS plate
A control circuit (not shown) was set to replenish 20 with 350 ml of water.

Under these conditions, a positive PS plate KM (manufactured by Konica Corp.) having a size of 1003 mm × 800 mm (with a positive film adhered thereto and using a 2 kW metal halide lamp)
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for one month, a small amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

When printing was carried out by a Heidelberg GTO printing machine using the printing plate obtained in the first month, good printed matter was obtained.

Comparative Example 1 60 L of the same developing solution as that used in Example 1 was charged into the developing tank 5 of the automatic developing machine shown in FIG. 1 and the solution temperature was adjusted to 30.degree. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

10 L of the same concentrated development replenisher as used in Example 1 was placed in the concentrated development replenisher tank 14 so that the concentrated development replenisher and water were replenished to the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 L of water is put in the washing water tank 20, and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as that used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1: 1. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the developing replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 2 hours per hour of stopping the automatic developing machine
40 ml, and the replenishment amount of rinse liquid is 5 for PS plate.
150 ml per m ² processing, 17 ml each time the operating time of the automatic developing machine reaches 1 hour, per 1 hour downtime of the automatic developing machine
A control circuit (not shown) was set so as to be 17 ml. The water in the wash water tank was changed every day.

Under these conditions, a positive PS plate KM (manufactured by Konica Corp.) with a size of 1003 mm × 800 mm (with a positive film adhered thereto and using a 2 kW metal halide lamp)
Exposed for 30 seconds from a distance of 60 cm) 180 plates / day, negative PS plate SWN-X (manufactured by Konica Corp.) of size 1003 mm x 800 mm (negative film is adhered and a 2 kW metal halide lamp is used. Exposed for 30 seconds from a distance of 60 cm)
When 20 plates / day was treated for 1 month, a large amount of precipitate was generated in the rinse liquid in the rinse liquid tank 30.

Comparative Example 2 To the developing tank 5 of the automatic developing machine shown in FIG. 1, 60 L of the same developing solution as used in Example 1 was charged and the solution temperature was adjusted to 30 ° C. Further, the transport speed of the PS plate was adjusted so that the developing time was 12 seconds.

10 L of the same concentrated development replenisher as used in Example 1 was put in the concentrated development replenisher tank 14 so that the concentrated development replenisher and water were replenished in the developing tank 5 at a ratio of 1: 3. Adjusted bellows pumps 12 and 13.

18 L of water is put in the washing water tank 20, and the rinse liquid tank 30
The same concentrated rinse solution as that used in Example 1 was diluted 8 times with water, and 15 L thereof was put in the container. Further, 10 L of the same concentrated rinse replenisher as used in Example 1 was placed in the concentrated rinse replenisher tank 16 so that the concentrated rinse replenisher and water were replenished to the rinse tank 30 at a ratio of 1:19. Bellows pump 32,
Adjusted 33.

Next, the replenishment amount of the developing replenisher was 5 m ^{2 for the} PS plate.
150 ml each time processing, 152 ml each time the operating time of the automatic developing machine reaches 1 hour, 2 hours per hour of stopping the automatic developing machine
40 ml, and the replenishment amount of rinse liquid is 5 for PS plate.
150 ml per m ² processing, 17 ml each time the operating time of the automatic developing machine reaches 1 hour, per 1 hour downtime of the automatic developing machine
A control circuit (not shown) was set so as to be 17 ml. The water in the wash water tank was changed every day. Under these conditions, a 180 mm positive PS plate KM (made by Konica Corporation) with a size of 1003 mm × 800 mm (a positive film was adhered and exposed with a 2 kW metal halide lamp from a distance of 60 cm for 30 seconds) was used.
Version / day, negative PS version SWN-X (manufactured by Konica Corporation) 10
03mm x 800mm size (Negative film is adhered and a 2kW metal halide lamp is used from a distance of 60cm.
It was exposed for 30 seconds) and processed at a rate of 20 plates / day for 1 month.

When the printing plate obtained in the first month was used for printing with a Heidelberg GTO printing machine, scumming occurred in the non-image area.

[0094]

The treatment method of the present invention enables stable treatment without exchanging the rinse liquid for a long period of time, and the photosensitive lithographic printing plate obtained by the treatment method of the present invention is Good printed matter can be obtained.

[Brief description of drawings]

FIG. 1 is a drawing showing an automatic developing machine for a photosensitive lithographic printing plate.

[Explanation of symbols]

 1 Insertion Table 2 Optical Sensors 3A, 3B Nip Conveying Roller 4 Conveying Roller 5 Developing Tank 6A, 6B Discharge Nozzle 7, 21, 31 Magnet Pump 8 Brush Roller 9 Plate Pressing Roller 10 Heater 11, 12, 13, 32, 33, 34 Bellows pump 14 Concentrated developer replenisher tank 15 Water tank 16 Concentrated rinse replenisher tank 17 Development waste solution tank 20 Rinsing water tank 30 Rinsing tank 40A, 40B Dry air discharge nozzle A Insert section B Developing section C Rinsing section D Rinse processing section E Drying Department

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tomohisa Ota, Konica Stock Market, Hino City, Tokyo 1 Konica Stock Company (72) Inventor, Iku Fukumuro, Kino Stock Market, Hino City, Tokyo Konica Stock Company

Claims (12)

[Claims] 1. A method of processing a photosensitive lithographic printing plate, which comprises developing a photosensitive lithographic printing plate using an automatic processor and then treating it with a rinse liquid. A method for treating a photosensitive lithographic printing plate comprising adding a rinse replenisher having a concentration (W / V%) of 0.2 times or more and 0.8 times or less. 2. The method for processing a photosensitive lithographic printing plate according to claim 1, wherein a water washing treatment is performed between the developing treatment and the treatment with the rinse liquid. 3. The method for treating a photosensitive lithographic printing plate as claimed in claim 2, wherein the replenishing amount of the washing water in the washing treatment is 1 ml or more and 500 ml or less per 1 m ^{2 of the} PS plate to be treated. 4. The photosensitivity according to claim 1, wherein the concentration (W / V%) of the rinse replenisher is 0.5 times or more and 0.8 times or less that of the rinse solution in the new solution. How to process planographic printing plates. 5. The processing of the photosensitive lithographic printing plate as claimed in claim 1, wherein the replenishing amount of the rinse replenisher is 1 ml or more and 100 ml or less per 1 m ^{2 of the} PS plate to be treated. Method. 6. The method for treating a photosensitive lithographic printing plate as claimed in claim 1, wherein the pH of the rinse liquid is 1 or more and 8 or less. 7. A method for processing a photosensitive lithographic printing plate, which comprises developing a photosensitive lithographic printing plate using an automatic processor and then treating it with a rinsing liquid, wherein the rinsing liquid contains 0.8% of the rinsing liquid when a new liquid is used. A method for treating a photosensitive lithographic printing plate, comprising adding a rinse replenisher having a concentration (W / V%) more than double and adding water to the rinse separately from the rinse replenisher. 8. The method of treating a photosensitive lithographic printing plate according to claim 7, wherein a washing treatment is performed between the developing treatment and the treatment with the rinse liquid. 9. The method for treating a photosensitive lithographic printing plate as claimed in claim 8, wherein the replenishing amount of the washing water in the washing process is 1 ml or more and 500 ml or less per 1 m ^{2 of the} PS plate to be treated. 10. The total concentration (W / V%) of the rinse replenisher and water added separately from the rinse replenisher is 0.2 times or more and 0.8 times or less that of the rinse solution in the fresh solution. 10. The method for treating a photosensitive lithographic printing plate according to claim 7, 8 or 9. 11. The processing of a photosensitive lithographic printing plate as claimed in claim 7, 8, 9 or 10, wherein the replenishing amount of the rinse replenishing solution is 1 ml or more and 100 ml or less per 1 m ^{2 of the} PS plate to be treated. Method. 12. The method of treating a photosensitive lithographic printing plate as claimed in claim 7, 8, 9, 10 or 11, wherein the rinse liquid has a pH of 1 or more and 8 or less.