JPH07239553A - Film peeling device - Google Patents

Film peeling device

Info

Publication number
JPH07239553A
JPH07239553A JP6056587A JP5658794A JPH07239553A JP H07239553 A JPH07239553 A JP H07239553A JP 6056587 A JP6056587 A JP 6056587A JP 5658794 A JP5658794 A JP 5658794A JP H07239553 A JPH07239553 A JP H07239553A
Authority
JP
Japan
Prior art keywords
film
peeling
substrate
contact
peeling device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6056587A
Other languages
Japanese (ja)
Other versions
JP3353021B2 (en
Inventor
Katsuya Sannomiya
宮 勝 也 三
Junji Oguma
熊 淳 司 小
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adtec Engineering Co Ltd
Original Assignee
Adtec Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Engineering Co Ltd filed Critical Adtec Engineering Co Ltd
Priority to JP05658794A priority Critical patent/JP3353021B2/en
Priority to TW083105592A priority patent/TW307885B/zh
Priority to GB9415285A priority patent/GB2286990A/en
Priority to KR1019940019348A priority patent/KR100311777B1/en
Publication of JPH07239553A publication Critical patent/JPH07239553A/en
Application granted granted Critical
Publication of JP3353021B2 publication Critical patent/JP3353021B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B43/00Operations specially adapted for layered products and not otherwise provided for, e.g. repairing; Apparatus therefor
    • B32B43/006Delaminating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/0004Component parts, details or accessories; Auxiliary operations
    • B29C63/0013Removing old coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B38/10Removing layers, or parts of layers, mechanically or chemically
    • B32B38/105Removing layers, or parts of layers, mechanically or chemically on edges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H41/00Machines for separating superposed webs
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/161Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2067/00Use of polyesters or derivatives thereof, as moulding material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2367/00Polyesters, e.g. PET, i.e. polyethylene terephthalate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards

Abstract

PURPOSE:To easily peel a cover film at a high speed by providing this device with peeling means having projecting parts which hook and lift a film by coming into contact with the film surface and recessed parts which hold the part of the lifted film and sticking roller which sticks the peeled part by coming into contact with this part and peels the film from an object. CONSTITUTION:This end part peeling device 15 for supporting 10b, a pilot roller 13 and a lifting device 15 for supporting these knurlings and roller freely movably forward and backward relative to the substrate W and peels a part of the film F by coming into contact with the film F of the substrate W at need. The peeling device is also provided with substrate front end sensors 16, 17 for obtaining the timing for advance and retreat by the lifting device 15. The pawl-shaped projections 11 of the knurls 10 are brought into contact with the end of the film F of the substrate W by the lifting device 15 and the end of the film F is hooked by these projections, by which the end is partly lifted and the lifted part is housed and held in the recessed part 12. The film F superposed double protects a photoresist R.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、ドライフィルムフォ
トレジストの表面に装着されているポリエステルカバー
フィルム等のフィルムを剥離するための装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for peeling a film such as a polyester cover film mounted on the surface of a dry film photoresist.

【0002】[0002]

【従来の技術】基板などに回路を形成する際に、IC製
造技術に用いられているリソグラフィ法が近年用いられ
るようになってきている。その際に基板上に塗布される
フォトレジストとしてドライフィルムフォトレジストが
使用されるようになってきている。図8はその一例を示
すもので、基板Wの表裏にフォトレジストRが塗布され
ており、このフォトレジストRの上にポリエステル製の
保護用のカバーフィルムFが貼着されている。
2. Description of the Related Art In forming a circuit on a substrate or the like, a lithographic method used in an IC manufacturing technique has been recently used. At that time, a dry film photoresist has been used as a photoresist coated on the substrate. FIG. 8 shows an example thereof. A photoresist R is applied to the front and back of the substrate W, and a protective cover film F made of polyester is stuck on the photoresist R.

【0003】[0003]

【発明が解決しようとする課題】このフィルムFは、フ
ォトレジストR上に回路パターンを焼き付ける露光工程
の後に剥す必要があり、従来よりこの種のフィルムを自
動的に効率よく剥離する装置の開発が試みられている。
しかしフィルムFを剥離する際には、フォトレジストR
に傷をつけてはならないことや、フィルムFの表面が円
滑である等の条件があり、満足な自動剥離装置はいまだ
開発されていない。即ち従来提案されたものの一つとし
て、フィルムにキズをつけた後エアで吹くことによって
剥離する方法があるが、フォトレジストのテント破れが
発生し、その破片が基板に再付着する問題がある。また
従来方式では一旦停止させて作業するためタクトタイム
が長くなり、又装置が長大化する欠点があり、通常は人
手により剥離作業を行っているのが現状である。本発明
は、このような従来技術の問題点を解決することを目的
とする。
This film F needs to be peeled off after the exposure step of printing a circuit pattern on the photoresist R, and a device for automatically and efficiently peeling this type of film has been developed. Being tried.
However, when the film F is peeled off, the photoresist R
Satisfactory automatic peeling device has not been developed yet, because there are conditions such as not to be scratched, and the surface of the film F is smooth. That is, as one of the conventional proposals, there is a method of peeling by scratching the film and then blowing it with air, but there is a problem that the tent tears of the photoresist occur and the fragments are reattached to the substrate. Further, in the conventional method, there is a drawback that the tact time becomes long because the work is temporarily stopped and the apparatus becomes long, and normally the peeling work is normally performed manually. The present invention aims to solve the problems of the prior art.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に本発明は、対象物に貼着されたフィルムを剥離するフ
ィルム剥離装置であって、フィルム表面に当接してフィ
ルムを引っ掛けて持ち上げる突起部と、該持ち上げられ
たフィルムの部分を保持する凹部とを備えた剥離手段
と、該剥離手段により剥離された部分に当接し、粘着し
て該フィルムを対象物から剥離する粘着ローラと、を備
えたことを特徴とする。
In order to achieve the above object, the present invention is a film peeling device for peeling a film adhered to an object, the protrusion being in contact with the film surface and hooking and lifting the film. And a peeling means having a concave portion for holding the lifted portion of the film, and an adhesive roller that abuts on the portion peeled by the peeling means and adheres to peel the film from an object. It is characterized by having.

【0005】[0005]

【作用】剥離手段によりフィルムの一部分が対象物から
浮き上がる。粘着ローラによりこの部分から剥離して、
フィルム全体を対象物から剥離する。
The part of the film is lifted from the object by the peeling means. Peel from this part with an adhesive roller,
Peel the entire film from the object.

【0006】[0006]

【実施例】以下本発明の実施例を図面に基づいて説明す
る。図1は本発明の一実施例を示す平面図である。この
実施例において、基板Wは表裏にフォトレジストRとフ
ィルムFを装着しており、表裏のフィルムFを同時に剥
離できるようになっている。基板Wはベルトコンベア5
により搬送され、その両端を送りローラ3、3により表
裏から挟持されて、更に矢印方向に移送されるようにな
っている。送りローラ3の下流側に端部剥離装置1と粘
着ローラ2が設けられており、これらは基板Wの両端に
表裏から基板Wを挟持するように設けられている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a plan view showing an embodiment of the present invention. In this embodiment, the substrate W is provided with the photoresist R and the film F on the front and back surfaces so that the film F on the front and back surfaces can be peeled off at the same time. Substrate W is belt conveyor 5
Is conveyed, and both ends thereof are sandwiched between the front and back sides by the feed rollers 3 and 3 and further conveyed in the arrow direction. An edge peeling device 1 and an adhesive roller 2 are provided on the downstream side of the feed roller 3, and these are provided at both ends of the substrate W so as to sandwich the substrate W from the front and back sides.

【0007】端部剥離装置1はこの実施例では表裏に一
対づつ、合計4個設けられている。端部剥離装置1は図
2に示すように、ローレット10a,10bとパイロッ
トローラ13とこれらを基板Wに対して進退可能に支持
する昇降装置15、15とを備えており、必要に応じて
基板WのフィルムFに当接してフィルムFの一部を剥離
するようになっている。また昇降装置15による進退の
タイミングをとるための基板先端センサ16、17が備
えられている。
In this embodiment, the end peeling device 1 is provided on each of the front and back sides, a total of four. As shown in FIG. 2, the edge peeling device 1 includes knurls 10a and 10b, a pilot roller 13, and elevating devices 15 and 15 that support these components so that they can move back and forth with respect to the substrate W. A part of the film F is peeled off by contacting the film F of W. In addition, substrate tip sensors 16 and 17 for timing the advance / retreat by the elevating device 15 are provided.

【0008】パイロットローラ13は図3に示すように
基板Wに当接し、上から基板Wを押圧つけるようになっ
ている。ローレット10aは該パイロットローラ13よ
りフィルムF厚さにほぼ相当する長さだけ下方に下がっ
ており、フィルムFに適正に当接するようになってい
る。ローレット10aの基板W移動方向下流側には、下
側のフィルムFに当接するローレット10bが設けられ
ている。該パイロットローラ13とローレット10a及
びローレット10bは昇降装置15により昇降可能であ
るが、これら自体上下動可能であり、バネ等の押圧手段
(図示せず)によりフィルムF方向に押し付けられるよ
うになっている。
As shown in FIG. 3, the pilot roller 13 contacts the substrate W and presses the substrate W from above. The knurl 10a is lowered from the pilot roller 13 by a length substantially corresponding to the thickness of the film F, and is adapted to properly contact the film F. On the downstream side of the knurl 10a in the moving direction of the substrate W, there is provided a knurl 10b that comes into contact with the lower film F. The pilot roller 13, the knurls 10a, and the knurls 10b can be moved up and down by an elevating device 15, but they can move up and down by themselves and are pressed in the film F direction by a pressing means (not shown) such as a spring. There is.

【0009】基板先端センサ16はローレット10aの
下流側、基板先端センサ17はローレット10bの下流
側に設けられており、これらはいずれも基板W移動方向
に可動になっている。基板先端センサ16と基板先端セ
ンサ17は基板W先端を検出し、この検出信号により昇
降装置15を駆動して端部剥離装置1を基板Wから離す
ようにしている。依って、基板先端センサ16と基板先
端センサ17の位置を調整することによりローレット1
0によるフィルムF剥離部の長さを調整することが可能
になる。
The substrate tip sensor 16 is provided on the downstream side of the knurl 10a, and the substrate tip sensor 17 is provided on the downstream side of the knurl 10b, both of which are movable in the substrate W moving direction. The substrate leading edge sensor 16 and the substrate leading edge sensor 17 detect the leading edge of the substrate W, and drive the lifting device 15 by this detection signal to separate the edge peeling device 1 from the substrate W. Therefore, by adjusting the positions of the substrate leading edge sensor 16 and the substrate leading edge sensor 17, the knurl 1
It is possible to adjust the length of the peeled portion of the film F by 0.

【0010】ローレット10は図4に示すように円板状
をなし、その周囲に爪状突起11を波型状に形成してい
る。この波型状の爪状突起11と11との間が凹部12
になっている。この実施例の場合、1つの爪状突起11
が摩耗したら、ローレット10を回転させて隣の次の爪
状突起11を使用すればよく、交換の手間を減少するこ
とができる。また図5に示すように爪状突起11の上下
方向位置が少しづつずれるため、適当な単一の爪状突起
11のみがフィルムFに接触するようになる利点があ
る。
As shown in FIG. 4, the knurl 10 has a disk shape, and a claw-shaped projection 11 is formed in a wavy shape around the disk. A concave portion 12 is provided between the corrugated claw-shaped projections 11 and 11.
It has become. In the case of this embodiment, one claw projection 11
If it wears, the knurl 10 may be rotated to use the next adjacent claw-shaped projection 11, and the time and effort for replacement can be reduced. Further, as shown in FIG. 5, since the vertical position of the claw-shaped projection 11 is slightly displaced, there is an advantage that only a suitable single claw-shaped projection 11 comes into contact with the film F.

【0011】図6によりローレット10によるフィルム
Fの剥離の機構を説明する。昇降装置15によりローレ
ット10の爪状突起11が基板WのフィルムF端部に当
接する(A)。この状態で、基板Wが矢印方向に進行す
ると、爪状突起11の先端にフィルムFの端部が引っ掛
けられて一部分が持ち上がり、該持ち上がった部分が凹
部12内に収納され保持される(B、C)。更に基板W
が進行すると、爪状突起11は上下方向可動であるため
フィルムFの上に乗り上げて、フィルムFが2重になる
(D)。この2重になったフィルムFがフォトレジスト
Rを保護するため、爪状突起11によりフォトレジスト
Rをキズつけることがない。そして、基板Wの先端が基
板先端センサ16により検出されると(E)、昇降装置
15が稼動して端部剥離装置1を上昇させる(F)。な
お、基板先端センサ16の位置を調整することにより、
例えば(C)の状態で端部剥離装置1を上昇させること
も可能であり、ユーザーのニーズに適合した動作を得る
ことができる。なお、下側のフィルムFをローレット1
0bにより剥離する動作も上記と同様であるので説明を
省略する。
The mechanism of peeling the film F by the knurl 10 will be described with reference to FIG. The claw-shaped projection 11 of the knurl 10 is brought into contact with the end of the film F of the substrate W by the lifting device 15 (A). In this state, when the substrate W advances in the direction of the arrow, the end of the film F is caught by the tip of the claw-shaped projection 11 and a part is lifted, and the lifted part is stored and held in the recess 12 (B, C). Further substrate W
, The claw-shaped projection 11 is movable in the vertical direction, so that it rides on the film F and the film F is doubled (D). Since the doubled film F protects the photoresist R, the nail R does not scratch the photoresist R. Then, when the front end of the substrate W is detected by the front end sensor 16 (E), the elevating device 15 operates to raise the edge peeling device 1 (F). By adjusting the position of the board front end sensor 16,
For example, it is also possible to raise the end peeling device 1 in the state of (C), and it is possible to obtain an operation that meets the needs of the user. In addition, the lower film F is knurled 1
The operation of peeling by 0b is also similar to the above, and thus the description thereof is omitted.

【0012】以上のように端部剥離装置1を通過した基
板WのフィルムFには、図7に示すように端部に剥離部
Tが形成され、フィルムFの端部を基板Wから浮いた状
態とすることが出来る。
As described above, the film F of the substrate W that has passed through the edge peeling device 1 is formed with the peeling portion T at the edge as shown in FIG. 7, and the edge of the film F is floated from the substrate W. It can be in a state.

【0013】端部剥離装置1の下流側には、粘着ローラ
2が設けられている。この粘着ローラ2はこの実施例で
は表裏に2個づつ、合計4個設けられている。粘着ロー
ラ2は端部剥離装置1の直線上の位置に設けられてお
り、端部剥離装置1により形成された剥離部Tに粘着し
て、フィルムFを基板WのフォトレジストRから剥離す
るようになっている。粘着ローラ2は、その表面に粘着
材が設けられており、フィルムFに粘着してフィルムF
をフォトレジストRから剥離するようになっている。
An adhesive roller 2 is provided on the downstream side of the edge peeling device 1. In this embodiment, two adhesive rollers 2 are provided on each of the front and back sides, for a total of four adhesive rollers 2. The adhesive roller 2 is provided at a position on the straight line of the edge peeling device 1, and adheres to the peeling portion T formed by the edge peeling device 1 to peel the film F from the photoresist R of the substrate W. It has become. The adhesive roller 2 is provided with an adhesive material on its surface and adheres to the film F to form the film F.
Is peeled from the photoresist R.

【0014】なお、粘着ローラ2及び送りローラ3も基
板Wに対して接離可能に設けてある。
The adhesive roller 2 and the feed roller 3 are also provided so as to be able to come into contact with and separate from the substrate W.

【0015】次に動作を説明する。ベルトコンベア5に
より移送される基板Wは、送りローラ3に両端を挟持さ
れる端部剥離装置1及び粘着ローラ2方向に移送され
る。基板Wが端部剥離装置1の位置に来ると、昇降装置
15が稼働してローレット10が基板Wの表裏から当接
し、ローレット10の爪状突起11が基板Wのフィルム
Fの端部を剥離し、図7に示すようにフィルムFに剥離
部Tを形成する。次に基板Wの先端が粘着ローラ2の位
置に来ると、粘着ローラ2がフィルムFに粘着する。フ
ィルムFの粘着ローラ2当接部には剥離部Tが形成され
ているから、フィルムFは粘着ローラ2の粘着力により
フォトレジストRから剥される。そして、この剥離部T
から剥離が進行し、基板Wの進行に伴って、粘着ローラ
2によりフィルムFが全面的に剥離する。
Next, the operation will be described. The substrate W transferred by the belt conveyor 5 is transferred in the direction of the edge peeling device 1 and the adhesive roller 2 whose both ends are held by the feed roller 3. When the substrate W comes to the position of the edge peeling device 1, the elevating device 15 operates and the knurls 10 come into contact with the front and back of the substrate W, and the claw-shaped projections 11 of the knurls 10 peel the edges of the film F of the substrate W. Then, as shown in FIG. 7, the peeled portion T is formed on the film F. Next, when the tip of the substrate W reaches the position of the adhesive roller 2, the adhesive roller 2 adheres to the film F. Since the peeling portion T is formed in the contact portion of the film F with the adhesive roller 2, the film F is peeled from the photoresist R by the adhesive force of the adhesive roller 2. Then, this peeling portion T
The peeling progresses, and the film F is entirely peeled off by the adhesive roller 2 as the substrate W advances.

【0016】以上説明したように上記した構成によれ
ば、端部剥離装置1によりフィルムFが基板Wのフォト
レジストRから部分的に剥離して剥離部Tが形成され、
次いで粘着ローラ2により全体的にフィルムFが剥離さ
れる。また、この動作は基板Wを停止させることなく、
連続的に行えるから作業効率が極めて高い等の利点があ
る。
As described above, according to the above configuration, the film F is partially peeled from the photoresist R on the substrate W by the edge peeling device 1 to form the peeled portion T,
Next, the adhesive roller 2 peels the film F entirely. In addition, this operation does not stop the substrate W,
Since it can be performed continuously, there are advantages such as extremely high work efficiency.

【0017】[0017]

【発明の効果】以上説明したように、本発明は対象物に
貼着されたフィルムを剥離するフィルム剥離装置であっ
て、フィルム表面に当接してフィルムを引っ掛けて持ち
上げる突起部と、該持ち上げられたフィルムの部分を保
持する凹部とを備えた剥離手段と、該剥離手段により剥
離された部分に当接し、粘着して該フィルムを対象物か
ら剥離する粘着ローラと、を備えているため、簡単にし
かも高速でドライフィルムフォトレジストのカバーフィ
ルムを剥離することができる。また、フォトレジストに
キズをつけることもない等の効果がある。
As described above, the present invention is a film peeling device for peeling a film attached to an object, which comprises a protrusion for abutting the film surface and hooking the film to lift the film. Since it is provided with a peeling means having a concave portion for holding a portion of the film, and an adhesive roller that comes into contact with the portion peeled by the peeling means and adheres to peel the film from the object, Moreover, the cover film of the dry film photoresist can be peeled off at high speed. Further, there is an effect that the photoresist is not scratched.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す概略平面図。FIG. 1 is a schematic plan view showing an embodiment of the present invention.

【図2】本発明の一実施例を示す概略側面図。FIG. 2 is a schematic side view showing an embodiment of the present invention.

【図3】図2の部分拡大図。FIG. 3 is a partially enlarged view of FIG.

【図4】ローレット10の拡大図であり、(A)は側面
図、(B)は正面図。
FIG. 4 is an enlarged view of the knurling, (A) is a side view and (B) is a front view.

【図5】ローレット10の爪状突起11の拡大図。FIG. 5 is an enlarged view of a claw-shaped projection 11 of the knurled body 10.

【図6】本発明におけるローレット10による剥離の動
作説明図。
FIG. 6 is an explanatory diagram of an operation of peeling by the knurl 10 in the present invention.

【図7】本発明の一実施例の動作説明図。FIG. 7 is an operation explanatory diagram of the embodiment of the present invention.

【図8】ドライフィルムフォトレジストを施した回路基
板Wの構造を示す断面図。
FIG. 8 is a cross-sectional view showing the structure of a circuit board W provided with a dry film photoresist.

【符号の説明】[Explanation of symbols]

1:端部剥離装置、2:粘着ローラ、3:送りローラ、
5:ベルトコンベア、10:ローレット、11:爪状突
起、12:凹部、13:パイロットローラ、15:昇降
装置、16:基板先端センサ、17:基板先端センサ。
1: Edge peeling device, 2: Adhesive roller, 3: Feed roller,
5: belt conveyer, 10: knurl, 11: claw-like protrusion, 12: recess, 13: pilot roller, 15: lifting device, 16: substrate tip sensor, 17: substrate tip sensor.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 対象物に貼着されたフィルムを剥離する
フィルム剥離装置であって、 フィルム表面に当接してフィルムを引っ掛けて持ち上げ
る突起部と、該持ち上げられたフィルムの部分を保持す
る凹部とを備えた剥離手段と、 該剥離手段により剥離された部分に当接し、粘着して該
フィルムを対象物から剥離する粘着ローラと、 を備えたことを特徴とするフィルム剥離装置。
1. A film peeling device for peeling a film adhered to an object, comprising: a protrusion that abuts on the surface of the film to catch and lift the film; and a recess that holds the lifted portion of the film. A film peeling apparatus comprising: a peeling unit including: and a pressure-sensitive adhesive roller that comes into contact with a portion peeled by the peeling unit and adheres to peel the film from an object.
【請求項2】 前記対象物が剥離装置に対し相対的に移
動し、前記突起部が相対的に移動するフィルムを引っ掛
けて持ち上げ、 前記粘着ローラが相対的に移動するフィルムに粘着して
剥離する、 請求項1に記載のフィルム剥離装置。
2. The object moves relative to the peeling device, the projection moves relative to the film and is lifted, and the adhesive roller adheres to and peels the film relatively moving. The film peeling device according to claim 1.
【請求項3】 前記突起部が上下動可能に設けられ、か
つ該突起部をフィルム表面に対して押圧する手段を備
え、 該突起部がフィルム表面の上下方向の変位に対応して上
下動可能である、 請求項1又は2に記載のフィルム剥離装置。
3. The projection is provided so as to be movable up and down, and is provided with a means for pressing the projection against the film surface, and the projection is movable up and down in response to the vertical displacement of the film surface. The film peeling device according to claim 1 or 2.
【請求項4】 前記突起部が円板の周側面に所定間隔で
規則的に複数配設され、 該突起部と突起部の間を前記凹部とした、 請求項1又は2又は3に記載のフィルム剥離装置。
4. The protrusion according to claim 1, 2 or 3, wherein a plurality of the protrusions are regularly arranged on the peripheral side surface of the disc at a predetermined interval, and the recesses are provided between the protrusions. Film peeling device.
【請求項5】 前記剥離手段を対象物に対して接離させ
る駆動装置を備えた、 請求項1又は2又は3又は4に記載のフィルム剥離装
置。
5. The film peeling device according to claim 1, further comprising a driving device for bringing the peeling means into and out of contact with an object.
【請求項6】 フィルムが対象物の表裏に貼着され、 前記剥離手段と粘着ローラが対象物の表裏に対向して夫
々一対以上設けられている、 請求項1又は2又は3又は4又は5に記載のフィルム剥
離装置。
6. The film is adhered to the front and back of the object, and the peeling means and the adhesive roller are provided in a pair or more so as to face the front and back of the object, and 1 or 2 or 3 or 4 or 5, respectively. The film peeling apparatus according to.
【請求項7】 対象物が回路基板と、該基板上に設けら
れたフォトレジストであり、該フォトレジスト上にフィ
ルムが貼着されている、 請求項1又は2又は3又は4又は5又は6に記載のフィ
ルム剥離装置。
7. The object is a circuit board and a photoresist provided on the board, and a film is stuck on the photoresist, 1 or 2 or 3 or 4 or 5 or 6 The film peeling apparatus according to.
JP05658794A 1994-03-01 1994-03-01 Film peeling device Expired - Lifetime JP3353021B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP05658794A JP3353021B2 (en) 1994-03-01 1994-03-01 Film peeling device
TW083105592A TW307885B (en) 1994-03-01 1994-06-21
GB9415285A GB2286990A (en) 1994-03-01 1994-07-27 Film removing apparatus
KR1019940019348A KR100311777B1 (en) 1994-03-01 1994-08-05 Film remover

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05658794A JP3353021B2 (en) 1994-03-01 1994-03-01 Film peeling device

Publications (2)

Publication Number Publication Date
JPH07239553A true JPH07239553A (en) 1995-09-12
JP3353021B2 JP3353021B2 (en) 2002-12-03

Family

ID=13031321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05658794A Expired - Lifetime JP3353021B2 (en) 1994-03-01 1994-03-01 Film peeling device

Country Status (4)

Country Link
JP (1) JP3353021B2 (en)
KR (1) KR100311777B1 (en)
GB (1) GB2286990A (en)
TW (1) TW307885B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002284127A (en) * 2001-03-21 2002-10-03 Ricoh Co Ltd Release paper separating device
WO2010061885A1 (en) * 2008-11-28 2010-06-03 シャープ株式会社 Film peeling apparatus and film peeling method
KR20150046597A (en) * 2013-10-22 2015-04-30 삼성디스플레이 주식회사 Film peeling apparatus

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH105684A (en) * 1996-04-23 1998-01-13 Fuji Heavy Ind Ltd Stripping method for strippable coating film
CN107444725B (en) * 2017-08-07 2019-10-25 台州市黄岩康亿丰塑业有限公司 A kind of full-automatic coat peeling unit and its dyestripping method
CN117283279B (en) * 2023-11-27 2024-01-23 中电科风华信息装备股份有限公司 Light sheet diaphragm pre-stripping manipulator

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724032A (en) * 1985-10-02 1988-02-09 Thomas Kay Sheet separating machine and method
JPS6316980A (en) * 1986-07-04 1988-01-23 Fuji Photo Film Co Ltd Polishing tape
FR2606759B3 (en) * 1986-11-14 1989-04-28 Limon Claude DEVICE FOR CONTINUOUSLY AND RUNNING PLASTIC FILMS ON A PLATE, IN PARTICULAR A PRINTED CIRCUIT PLATE
US5102491A (en) * 1988-12-09 1992-04-07 Morton International, Inc. Wet lamination process and apparatus
IT1246493B (en) * 1990-12-04 1994-11-19 Cedal Srl MACHINE FOR THE AUTOMATIC REMOVAL OF PROTECTIVE FILMS, FROM THE SHEETS FOR PRINTED CIRCUITS.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002284127A (en) * 2001-03-21 2002-10-03 Ricoh Co Ltd Release paper separating device
WO2010061885A1 (en) * 2008-11-28 2010-06-03 シャープ株式会社 Film peeling apparatus and film peeling method
JP2010150040A (en) * 2008-11-28 2010-07-08 Sharp Corp Film peeling apparatus and film peeling method
KR20150046597A (en) * 2013-10-22 2015-04-30 삼성디스플레이 주식회사 Film peeling apparatus

Also Published As

Publication number Publication date
GB2286990A (en) 1995-09-06
GB9415285D0 (en) 1994-09-21
TW307885B (en) 1997-06-11
KR950028589A (en) 1995-10-18
JP3353021B2 (en) 2002-12-03
KR100311777B1 (en) 2001-12-15

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