JPH07236468A - Culture device - Google Patents
Culture deviceInfo
- Publication number
- JPH07236468A JPH07236468A JP2970994A JP2970994A JPH07236468A JP H07236468 A JPH07236468 A JP H07236468A JP 2970994 A JP2970994 A JP 2970994A JP 2970994 A JP2970994 A JP 2970994A JP H07236468 A JPH07236468 A JP H07236468A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- culture
- mixing tank
- sensor
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Apparatus Associated With Microorganisms And Enzymes (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は動植物の細胞、組織、器
官あるいは微生物の細胞等を培養するための培養装置に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a culturing device for culturing cells, tissues, organs or microbial cells of animals and plants.
【０００２】[0002]
【従来の技術】図３は従来の培養装置の系統図である。
図において、６は培養槽、７はガス交換器、８は同ガス
交換器の内部を２室に仕切る疎水性多孔膜、１０は前記
培養槽とガス交換器の一方の室との間に設けられている
培養液循環ライン、４は気体混合槽、９は前記ガス交換
器の他方の室と気体混合槽との間に設けられているガス
循環ライン、１３は３本のガス供給ライン、１１は同各
ライン上に設けられたガス供給バルブである。これらの
各バルブとラインを経て、Ｏ2 （酸素），ＣＯ2（炭酸
ガス），Ｎ2 （窒素）の各ガスが気体混合槽に供給され
る。１２は前記培養槽の中の培養液中に浸されている培
養液センサである。図にはセンサが３本描かれている
が、これはそれぞれ溶存酸素濃度計、水素イオン濃度
（pH）計、および温度計である。１は培養液センサに連
るガス供給バルブ制御装置であり、前記ガス供給バルブ
１１の開閉を制御するものである。2. Description of the Related Art FIG. 3 is a system diagram of a conventional culture device.
In the figure, 6 is a culture tank, 7 is a gas exchanger, 8 is a hydrophobic porous membrane that divides the interior of the gas exchanger into two chambers, and 10 is provided between the culture tank and one chamber of the gas exchanger. The culture solution circulation line, 4 is a gas mixing tank, 9 is a gas circulation line provided between the other chamber of the gas exchanger and the gas mixing tank, 13 is three gas supply lines, 11 Is a gas supply valve provided on each line. O 2 (oxygen), CO 2 (carbon dioxide gas), and N 2 (nitrogen) gases are supplied to the gas mixing tank through these valves and lines. Reference numeral 12 is a culture solution sensor immersed in the culture solution in the culture tank. Although three sensors are shown in the figure, they are a dissolved oxygen concentration meter, a hydrogen ion concentration (pH) meter, and a thermometer, respectively. Reference numeral 1 denotes a gas supply valve control device connected to the culture solution sensor, which controls the opening and closing of the gas supply valve 11.
【０００３】培養槽によって微生物や動植物組織や細
胞、あるいは小形動植物を培養する際に、培養液の成分
は生物の代謝によって常時変動する。一方、培養される
生物にとって、培養液中の環境は常に一定でなければな
らない。培養液の環境因子として重要な要素は、生物が
必要とする栄養素と生物が排出する有害な老廃物の濃
度、呼吸のための溶存酸素濃度、および水素イオン濃度
である。When culturing microorganisms, animal and plant tissues and cells, or small animals and plants in a culture tank, the components of the culture solution constantly fluctuate due to the metabolism of organisms. On the other hand, for the organism to be cultivated, the environment in the culture medium must always be constant. Important factors as environmental factors of the culture solution are the concentration of nutrients required by the organism and harmful waste products discharged by the organism, the dissolved oxygen concentration for respiration, and the hydrogen ion concentration.
【０００４】従来は培養液に浸された培養液センサ１２
の溶存酸素濃度計と水素イオン濃度計の検出値に基づい
て、制御装置１によってガス供給バルブ１１の開閉を制
御し、Ｏ2 ，ＣＯ2 ，Ｎ2 の各ガスを、前記気体混合槽
４、ガス循環ライン９、ガス交換器７、培養液循環ライ
ン１０を介して、培養槽６に供給し、溶存酸素濃度およ
び水素イオン濃度を一定に保つようにしていた。ガス交
換器７に供給されたガスは疎水性多孔膜８を介して循環
している培養液の中へ移行し、培養槽６に供給される。Conventionally, the culture solution sensor 12 immersed in the culture solution 12
Based on the detected values of the dissolved oxygen concentration meter and the hydrogen ion concentration meter, the control device 1 controls the opening and closing of the gas supply valve 11 so that each gas of O 2 , CO 2 , and N 2 is supplied to the gas mixing tank 4, The solution was supplied to the culture tank 6 through the gas circulation line 9, the gas exchanger 7, and the culture solution circulation line 10 to keep the dissolved oxygen concentration and the hydrogen ion concentration constant. The gas supplied to the gas exchanger 7 is transferred into the culture solution circulating through the hydrophobic porous membrane 8 and supplied to the culture tank 6.
【０００５】なお、上記環境因子のうち、栄養素の補給
と老廃物の除去は上記各濃度保持とは独立に行われる制
御であり、本発明の範囲外であるので述べない。また、
培養液センサ１２の中の温度センサは上記制御には関係
がなく、別の制御に用いられるものであるので、以後は
これに関することは述べない。Of the above environmental factors, supplementation of nutrients and removal of waste products are controls that are carried out independently of maintaining the above concentrations, and are outside the scope of the present invention. Also,
The temperature sensor in the culture solution sensor 12 is not related to the above-mentioned control and is used for another control, and therefore the related matter will not be described hereinafter.
【０００６】[0006]
【発明が解決しようとする課題】上記従来の装置におい
ては、ガスが供給されても、培養槽内の培養液における
溶存ガス濃度が上昇し、それが検出されるまでに時間遅
れがあるため、時間遅れの間、余分のガスが供給され続
け、その分のガスが供給過剰となる。この過剰供給され
たガスの影響で、溶存ガス濃度が設定値を越えてしま
う、いわゆるオーバーシュートするという欠点があっ
た。In the above conventional apparatus, even if gas is supplied, the concentration of dissolved gas in the culture solution in the culture tank rises, and there is a time delay until it is detected. During the time delay, the excess gas continues to be supplied, and the corresponding amount of gas becomes excessive. Due to the influence of the excessively supplied gas, there is a drawback that the dissolved gas concentration exceeds a set value, that is, so-called overshoot.
【０００７】また、従来の装置では、上記のガスの過剰
供給によって、ガスが多量に消費され、ボンベ交換等の
人手も多くかかるという欠点があった。Further, the conventional apparatus has a drawback in that a large amount of gas is consumed by the above-mentioned excessive supply of gas and a lot of manpower is required for replacing the cylinder.
【０００８】本発明は上記従来技術の欠点を解消し、オ
ーバーシュートが無く、かつガスの消費量の少ない培養
装置を提供しようとするものである。The present invention is intended to solve the above-mentioned drawbacks of the prior art, and to provide a culture device which has no overshoot and consumes less gas.
【０００９】[0009]
【課題を解決するための手段】本発明は上記課題を解決
したものであって、培養液を貯留した培養槽、内部に疎
水性多孔膜を備え同膜によって内部が２室に仕切られて
いるガス交換器、気体混合槽、前記ガス交換器の疎水性
多孔膜で仕切られた一方の室と前記培養槽との間に設け
られた培養液循環ライン、前記ガス交換器の疎水性多孔
膜で仕切られた他方の室と前記気体混合槽との間に設け
られたガス循環ライン、前記気体混合槽へ酸素・炭酸ガ
ス・窒素を供給するためそれぞれのガス毎に設けられた
ガス供給ライン、及び同各ガス供給ライン上に設けられ
たガス供給バルブを備えた培養装置において、次の特徴
を有する培養装置に関するものである。 （１）前記気体混合槽に設けられ酸素濃度と炭酸ガス濃
度を検出するガスセンサ、及び同センサに連なるガス供
給バルブ制御装置を備え、同センサの検出値によって前
記各ガス供給バルブの開閉を制御し、予備培養によって
予め決められた所定組成のガスを前記気体混合槽の中に
混合調整する。 （２）前記培養槽内に設けられ溶存酸素濃度及び水素イ
オン濃度を検出する培養液センサ、同培養液センサに連
なり同培養液センサの検出値を処理する培養制御装置、
同培養制御装置に連なり同装置の処理値の変化から適正
なガス組成を算出する培養環境予測プログラム、前記気
体混合槽に設けられ酸素濃度と炭酸ガス濃度を検出する
ガスセンサ、前記培養環境予測プログラムと前記ガスセ
ンサとに連なるガス供給バルブ制御装置を備え、前記ガ
スセンサの検出値によって各ガス供給バルブの開閉を制
御し、前記算出された組成のガスを前記気体混合槽の中
に混合調整する。Means for Solving the Problems The present invention has been made to solve the above-mentioned problems, and a culture tank in which a culture solution is stored, a hydrophobic porous membrane is provided inside, and the inside is partitioned into two chambers. A gas exchanger, a gas mixing tank, a culture solution circulation line provided between the culture tank and one chamber partitioned by the hydrophobic porous membrane of the gas exchanger, and a hydrophobic porous membrane of the gas exchanger. A gas circulation line provided between the other partitioned chamber and the gas mixing tank, a gas supply line provided for each gas to supply oxygen, carbon dioxide, and nitrogen to the gas mixing tank, and The present invention relates to a culture device equipped with a gas supply valve provided on each gas supply line, having the following characteristics. (1) A gas sensor provided in the gas mixing tank for detecting the oxygen concentration and the carbon dioxide concentration, and a gas supply valve control device connected to the sensor are provided, and the opening and closing of each gas supply valve is controlled by the detection value of the sensor. First, a gas having a predetermined composition determined by preliminary culture is mixed and adjusted in the gas mixing tank. (2) A culture solution sensor provided in the culture tank for detecting a dissolved oxygen concentration and a hydrogen ion concentration, a culture control device connected to the culture solution sensor and processing a detection value of the culture solution sensor,
A culture environment prediction program that is connected to the culture control device and calculates an appropriate gas composition from a change in a processing value of the device, a gas sensor provided in the gas mixing tank to detect oxygen concentration and carbon dioxide concentration, and the culture environment prediction program A gas supply valve control device connected to the gas sensor is provided, and the opening and closing of each gas supply valve is controlled by the detection value of the gas sensor to mix and adjust the gas having the calculated composition in the gas mixing tank.
【００１０】[0010]
【作用】前記（１）項の発明においては、気体混合槽に
設けられたガスセンサが検知した信号をガス供給バルブ
制御装置で処理し、ガス供給バルブの開閉によって気体
混合槽内でガスが混合され、ガス組成が一定に保たれ、
所定組成のガスがガス循環ライン、ガス交換器、培養液
循環ラインを経て培養槽へ送られる。In the invention of the above item (1), the signal detected by the gas sensor provided in the gas mixing tank is processed by the gas supply valve controller, and the gas is mixed in the gas mixing tank by opening and closing the gas supply valve. , The gas composition is kept constant,
A gas having a predetermined composition is sent to the culture tank through a gas circulation line, a gas exchanger, and a culture solution circulation line.
【００１１】前記（２）項の発明においては、前項のよ
うにして送られた気体が、気相と液相との間を移行する
ことによって生じるガス組成の変動は、培養液センサに
よって検出され、同検出値が培養制御装置によって処理
され、培養環境予測プログラムによってガスの適正組成
が算出され、気体混合槽内のガスが前記の算出された適
正な組成となるようガス供給バルブ制御装置によってガ
ス供給バルブの開閉が制御される。その結果ガス交換器
へ送られるガス組成は適正な値に維持される。In the invention of the above item (2), a change in the gas composition caused by the gas sent as described in the above item moving between the gas phase and the liquid phase is detected by the culture solution sensor. , The detected value is processed by the culture control device, the proper composition of gas is calculated by the culture environment prediction program, and the gas in the gas mixing tank is controlled by the gas supply valve control device so that the gas has the calculated proper composition. The opening and closing of the supply valve is controlled. As a result, the gas composition sent to the gas exchanger is maintained at an appropriate value.
【００１２】[0012]
【実施例】図１は本発明の第１実施例に係る培養装置の
系統図である。図において、培養槽６、培養液循環ライ
ン１０、ガス交換器７、疎水性多孔膜８、ガス循環ライ
ン９、気体混合槽４、ガス供給ライン１３、ガス供給バ
ルブ１１、および供給されるガスは従来技術と同じであ
る。５は気体混合槽４内に設けられたガスセンサであ
り、酸素濃度センサと炭酸ガス濃度センサとからなって
いる。１Ａは同ガスセンサに連り、ガス供給バルブ１１
の開閉を制御するガス供給バルブ制御装置である。EXAMPLE 1 FIG. 1 is a systematic diagram of a culture apparatus according to a first example of the present invention. In the figure, the culture tank 6, the culture solution circulation line 10, the gas exchanger 7, the hydrophobic porous membrane 8, the gas circulation line 9, the gas mixing tank 4, the gas supply line 13, the gas supply valve 11, and the supplied gas are It is the same as the prior art. Reference numeral 5 denotes a gas sensor provided in the gas mixing tank 4, which is composed of an oxygen concentration sensor and a carbon dioxide gas concentration sensor. 1A is connected to the same gas sensor, gas supply valve 11
It is a gas supply valve control device for controlling the opening and closing of the.
【００１３】本装置においては、供給ガスの組成は予備
培養で予め決定され、ガスセンサ５とガス供給バルブ制
御装置１Ａとによってガス供給バルブ１１の開閉が制御
され、所定の組成のガスが気体混合槽４の中に混合調整
され、ガス交換器７を介して培養槽６に供給される。In the present apparatus, the composition of the supply gas is determined in advance by preculture, the opening and closing of the gas supply valve 11 is controlled by the gas sensor 5 and the gas supply valve control device 1A, and the gas of the predetermined composition is mixed in the gas mixing tank. 4 is mixed and adjusted in 4 and supplied to the culture tank 6 via the gas exchanger 7.
【００１４】図２は本発明の第２実施例に係る培養装置
の系統図である。図において、１２は従来技術と同じ構
成の培養液センサ、２は同センサに連なる培養制御装
置、３は同培養制御装置に連なる培養環境予測プログラ
ム、１Ｂは同培養環境予測プログラムと、気体混合槽４
の中のガスセンサ５とに連なり、ガス供給バルブ１１の
開閉を制御するガス供給バルブ制御装置である。上記以
外の構成は第１実施例と同じである。FIG. 2 is a system diagram of a culture device according to a second embodiment of the present invention. In the figure, 12 is a culture solution sensor having the same configuration as the conventional technology, 2 is a culture control device connected to the same sensor, 3 is a culture environment prediction program connected to the culture control device, 1B is the same culture environment prediction program, and a gas mixing tank. Four
Is a gas supply valve control device that is connected to the gas sensor 5 in the above and controls the opening and closing of the gas supply valve 11. The configuration other than the above is the same as that of the first embodiment.
【００１５】本実施例は第１実施例より高度な制御をな
しうる装置であって、培養液センサ１２で検知した値を
培養制御装置２で処理し、その変化から培養環境予測プ
ログラム３で適正なガス組成を算出してガス供給バルブ
制御装置１Ｂに送る。同制御装置１Ｂは気体混合槽４に
あるガスセンサ５の値によってガス供給バルブ１１を開
閉し、前記の算出された適正なガス組成を実現する。気
体混合槽４内の気体はガス循環ライン９を通ってガス交
換器７に送られ疎水性多孔膜８を通過して培養液に移行
する。これにより細胞等の代謝による培養液の溶存酸素
濃度および水素イオン濃度の変化は補正され一定の範囲
に保たれる。This embodiment is an apparatus capable of performing a higher degree of control than the first embodiment, and the value detected by the culture solution sensor 12 is processed by the culture control apparatus 2, and the change is made appropriate by the culture environment prediction program 3 from the change. A different gas composition is calculated and sent to the gas supply valve control device 1B. The control device 1B opens and closes the gas supply valve 11 according to the value of the gas sensor 5 in the gas mixing tank 4 to realize the calculated appropriate gas composition. The gas in the gas mixing tank 4 is sent to the gas exchanger 7 through the gas circulation line 9, passes through the hydrophobic porous membrane 8, and is transferred to the culture solution. As a result, changes in the dissolved oxygen concentration and hydrogen ion concentration of the culture solution due to the metabolism of cells and the like are corrected and kept within a certain range.
【００１６】以上詳述したように、上記各実施例の装置
においては、予め決められた組成、又は予測された組成
のガスを気体混合槽内に混合調整して供給し、平衡を保
つようにしているので、ガス供給過剰となるいわゆるオ
ーバーシュートが無くなり、細胞等へのダメージの要因
が無くなる。またガスの無駄が無いので、ガスの消費量
が少なくてすむという利点がある。As described in detail above, in the apparatus of each of the above-mentioned embodiments, the gas of the predetermined composition or the predicted composition is mixed and adjusted in the gas mixing tank and supplied to maintain the equilibrium. Therefore, the so-called overshoot, which is an excessive gas supply, is eliminated, and the cause of damage to cells and the like is eliminated. Further, since there is no waste of gas, there is an advantage that the gas consumption amount can be small.
【００１７】[0017]
【発明の効果】本発明の培養装置においては、気体混合
槽に設けられ酸素と炭酸ガス濃度を検出するガスセン
サ、及び同センサに連なるガス供給バルブ制御装置を備
え、同センサの検出値によって各ガス供給バルブの開閉
を制御し、予備培養によって予め決められた所定組成の
ガスを気体混合槽の中に混合調整し、あるいは、培養槽
内に設けられ溶存酸素濃度及び水素イオン濃度を検出す
る培養液センサ、同培養液センサに連なり同培養液セン
サの検出値を処理する培養制御装置、同培養制御装置に
連なり同装置の処理値の変化から適正なガス組成を算出
する培養環境予測プログラム、気体混合槽に設けられ酸
素濃度と炭酸ガス濃度を検出するガスセンサ、前記培養
環境予測プログラムと前記ガスセンサとに連なるガス供
給バルブ制御装置を備え、前記ガスセンサの検出値によ
って各ガス供給バルブの開閉を制御し、前記算出された
組成のガスを前記気体混合槽の中に混合調整するので、
培養されている動植物の細胞等にダメージを与えるガス
の過剰供給、いわゆるオーバーシュートを無くし、かつ
ガスの消費量を低減することができる。In the culture device of the present invention, a gas sensor provided in the gas mixing tank for detecting oxygen and carbon dioxide concentration, and a gas supply valve control device connected to the sensor are provided, and each gas is detected by the value detected by the sensor. A culture solution that controls the opening and closing of a supply valve to mix and adjust a gas having a predetermined composition by a preliminary culture in a gas mixing tank, or is provided in the culture tank and detects dissolved oxygen concentration and hydrogen ion concentration. Sensor, culture control device connected to the culture solution sensor to process the detection value of the culture solution sensor, culture environment prediction program connected to the culture control device to calculate an appropriate gas composition from the change in the process value of the device, gas mixture A gas sensor provided in the tank for detecting oxygen concentration and carbon dioxide concentration, and a gas supply valve control device connected to the culture environment prediction program and the gas sensor. For example, to control the opening and closing of the gas supply valve by the detection value of the gas sensor, since the mixing to adjust the gas composition the calculated into the gas mixing chamber,
It is possible to eliminate an excessive supply of gas that damages cells and the like of cultured animals and plants, so-called overshoot, and to reduce gas consumption.
【図１】本発明の第１実施例に係る培養装置の系統図。FIG. 1 is a systematic diagram of a culture device according to a first embodiment of the present invention.
【図２】本発明の第２実施例に係る培養装置の系統図。FIG. 2 is a system diagram of a culture device according to a second embodiment of the present invention.
【図３】従来の培養装置の系統図。FIG. 3 is a system diagram of a conventional culture device.
１，１Ａ，１Ｂ ガス供給バルブ制御装置 ２ 培養制御装置 ３ 培養環境予測プログラム ４ 気体混合槽 ５ ガスセンサ ６ 培養槽 ７ ガス交換器 ８ 疎水性多孔膜 ９ ガス循環ライン １０ 培養液循環ライン １１ ガス供給バルブ １２ 培養液センサ １３ ガス供給ライン 1, 1A, 1B Gas supply valve control device 2 Culture control device 3 Culture environment prediction program 4 Gas mixing tank 5 Gas sensor 6 Culture tank 7 Gas exchanger 8 Hydrophobic porous membrane 9 Gas circulation line 10 Culture liquid circulation line 11 Gas supply valve 12 Culture solution sensor 13 Gas supply line
Claims (2)
多孔膜を備え同膜によって内部が２室に仕切られている
ガス交換器、気体混合槽、前記ガス交換器の疎水性多孔
膜で仕切られた一方の室と前記培養槽との間に設けられ
た培養液循環ライン、前記ガス交換器の疎水性多孔膜で
仕切られた他方の室と前記気体混合槽との間に設けられ
たガス循環ライン、前記気体混合槽へ酸素・炭酸ガス・
窒素を供給するためそれぞれのガス毎に設けられたガス
供給ライン、及び同各ガス供給ライン上に設けられたガ
ス供給バルブを備えた培養装置において、前記気体混合
槽に設けられ酸素濃度と炭酸ガス濃度を検出するガスセ
ンサ、及び同センサに連なるガス供給バルブ制御装置を
備え、同センサの検出値によって前記各ガス供給バルブ
の開閉を制御し、予備培養によって予め決められた所定
組成のガスを前記気体混合槽の中に混合調整することを
特徴とする培養装置。1. A culture tank in which a culture solution is stored, a gas exchanger having a hydrophobic porous membrane inside, and the interior of which is divided into two chambers, a gas mixing tank, and a hydrophobic porous membrane of the gas exchanger. A culture solution circulation line provided between one of the chambers and the culture tank, which is provided between the gas mixing tank and the other chamber of the gas exchanger partitioned by the hydrophobic porous membrane. Gas circulation line, oxygen / carbon dioxide gas to the gas mixing tank
In a culture device equipped with a gas supply line provided for each gas for supplying nitrogen, and a gas supply valve provided on each gas supply line, oxygen concentration and carbon dioxide gas provided in the gas mixing tank A gas sensor for detecting the concentration, and a gas supply valve control device connected to the sensor are provided, and the opening and closing of each gas supply valve is controlled by the detection value of the sensor, and a gas having a predetermined composition predetermined by pre-culture is used as the gas. A culture device characterized by mixing and adjusting in a mixing tank.
多孔膜を備え同膜によって内部が２室に仕切られている
ガス交換器、気体混合槽、前記ガス交換器の疎水性多孔
膜で仕切られた一方の室と前記培養槽との間に設けられ
た培養液循環ライン、前記ガス交換器の疎水性多孔膜で
仕切られた他方の室と前記気体混合槽との間に設けられ
たガス循環ライン、前記気体混合槽へ酸素・炭酸ガス・
窒素を供給するためそれぞれのガス毎に設けられたガス
供給ライン、及び同各ガス供給ライン上に設けられたガ
ス供給バルブを備えた培養装置において、前記培養槽内
に設けられ溶存酸素濃度及び水素イオン濃度を検出する
培養液センサ、同培養液センサに連なり同培養液センサ
の検出値を処理する培養制御装置、同培養制御装置に連
なり同装置の処理値の変化から適正なガス組成を算出す
る培養環境予測プログラム、前記気体混合槽に設けられ
酸素濃度と炭酸ガス濃度を検出するガスセンサ、前記培
養環境予測プログラムと前記ガスセンサとに連なるガス
供給バルブ制御装置を備え、前記ガスセンサの検出値に
よって各ガス供給バルブの開閉を制御し、前記算出され
た組成のガスを前記気体混合槽の中に混合調整すること
を特徴とする培養装置。2. A culture tank storing a culture solution, a gas exchanger having a hydrophobic porous membrane inside and partitioning the interior into two chambers, a gas mixing tank, and a hydrophobic porous membrane of the gas exchanger. A culture solution circulation line provided between one of the chambers and the culture tank, which is provided between the gas mixing tank and the other chamber of the gas exchanger partitioned by the hydrophobic porous membrane. Gas circulation line, oxygen / carbon dioxide gas to the gas mixing tank
In a culture device equipped with a gas supply line provided for each gas for supplying nitrogen, and a gas supply valve provided on each gas supply line, dissolved oxygen concentration and hydrogen provided in the culture tank A culture fluid sensor that detects the ion concentration, a culture control device that is connected to the culture fluid sensor and processes the detection values of the culture fluid sensor, and that is connected to the culture control device that calculates the appropriate gas composition from the change in the treatment value of the device A culture environment prediction program, a gas sensor provided in the gas mixing tank for detecting oxygen concentration and carbon dioxide concentration, a gas supply valve control device connected to the culture environment prediction program and the gas sensor, and each gas according to the detection value of the gas sensor A culture characterized by controlling the opening and closing of a supply valve to mix and adjust the gas of the calculated composition in the gas mixing tank. Location.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2970994A JPH07236468A (en) | 1994-02-28 | 1994-02-28 | Culture device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2970994A JPH07236468A (en) | 1994-02-28 | 1994-02-28 | Culture device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07236468A true JPH07236468A (en) | 1995-09-12 |
Family
ID=12283644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2970994A Withdrawn JPH07236468A (en) | 1994-02-28 | 1994-02-28 | Culture device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07236468A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007004445A1 (en) * | 2005-07-01 | 2007-01-11 | Nikon Corporation | Incubator |
| JP2018504931A (en) * | 2015-02-09 | 2018-02-22 | ユニバーセルズ エヌブイＵｎｉｖｅｒｃｅｌｌｓ Ｎｖ | Cell and / or cell product manufacturing system, manufacturing apparatus, and manufacturing method |
| JP2020089304A (en) * | 2018-12-05 | 2020-06-11 | 株式会社日立ハイテク | Cell culture apparatus, and method for controlling gas concentration in culture solution |
| CN114292748A (en) * | 2022-01-18 | 2022-04-08 | 冰山松洋生物科技(大连)有限公司 | CO (carbon monoxide)2CO for incubator2Control structure |
-
1994
- 1994-02-28 JP JP2970994A patent/JPH07236468A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007004445A1 (en) * | 2005-07-01 | 2007-01-11 | Nikon Corporation | Incubator |
| US8192983B2 (en) | 2005-07-01 | 2012-06-05 | Nikon Corporation | Incubator |
| JP2018504931A (en) * | 2015-02-09 | 2018-02-22 | ユニバーセルズ エヌブイＵｎｉｖｅｒｃｅｌｌｓ Ｎｖ | Cell and / or cell product manufacturing system, manufacturing apparatus, and manufacturing method |
| JP2020089304A (en) * | 2018-12-05 | 2020-06-11 | 株式会社日立ハイテク | Cell culture apparatus, and method for controlling gas concentration in culture solution |
| CN114292748A (en) * | 2022-01-18 | 2022-04-08 | 冰山松洋生物科技(大连)有限公司 | CO (carbon monoxide)2CO for incubator2Control structure |
| CN114292748B (en) * | 2022-01-18 | 2023-07-25 | 冰山松洋生物科技(大连)有限公司 | CO (carbon monoxide) 2 CO for incubator 2 Control structure |
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